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JP2000323974A - Semiconductor element short-circuit protection circuit - Google Patents

Semiconductor element short-circuit protection circuit

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Publication number
JP2000323974A
JP2000323974A JP11131451A JP13145199A JP2000323974A JP 2000323974 A JP2000323974 A JP 2000323974A JP 11131451 A JP11131451 A JP 11131451A JP 13145199 A JP13145199 A JP 13145199A JP 2000323974 A JP2000323974 A JP 2000323974A
Authority
JP
Japan
Prior art keywords
circuit
semiconductor element
short
emitter
protection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11131451A
Other languages
Japanese (ja)
Inventor
Norio Arikawa
典男 有川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP11131451A priority Critical patent/JP2000323974A/en
Publication of JP2000323974A publication Critical patent/JP2000323974A/en
Withdrawn legal-status Critical Current

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Abstract

(57)【要約】 【課題】電流検出用エミッタ付半導体素子の短絡保護回
路で短絡電流を急激に抑え込むと、回路の浮遊インダク
タンスにより過大な誘導電圧が発生し半導体素子が破壊
する恐れがある。 【解決手段】複数個の電流検出用抵抗51、52と複数
個の保護用半導体素子41、42を接続し、保護用半導
体素子41、42を順次導通させ、短絡電流の絞り込み
を多段階で行い急激な電流変化を抑えることで誘導電圧
の発生を抑え、半導体素子1の破壊を防ぐ。
(57) Abstract: When a short-circuit current is rapidly suppressed by a short-circuit protection circuit for a semiconductor element with a current detection emitter, an excessive induced voltage is generated due to a floating inductance of the circuit, and the semiconductor element may be destroyed. A plurality of current detection resistors (51, 52) and a plurality of protection semiconductor elements (41, 42) are connected, and the protection semiconductor elements (41, 42) are sequentially turned on to narrow down a short-circuit current in multiple stages. By suppressing a sudden current change, generation of an induced voltage is suppressed, and destruction of the semiconductor element 1 is prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は絶縁ゲート型バイポ
ーラトランジスタ(IGBT)などの半導体素子の短絡
保護回路に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a short-circuit protection circuit for a semiconductor device such as an insulated gate bipolar transistor (IGBT).

【0002】[0002]

【従来の技術】従来の電流検出用エミッタを有する半導
体素子の短絡保護回路としては、例えば特開平2−13
0951号公報に記載されたものがある。このような短
絡保護回路の従来の1例を図3に示す。図3の回路にお
いて、半導体素子1の接続される回路が短絡状態となっ
た場合に、半導体素子1の定格を越える過大な電流が半
導体素子1に流れて破壊することを防ぐために、エミッ
タ2の一部を分離した電流検出用エミッタ3と電流検出
用抵抗5とによって半導体素子1のコレクタからエミッ
タに流れる電流を検出し、素子破壊につながる過大な電
流が流れたことを検知した場合には保護用半導体素子4
を導通させ、ゲート抵抗6と保護用半導体素子4とでゲ
ート入力電圧を分圧し、半導体素子1のゲート・エミッ
タ間にかかる電圧を抑えることで短絡電流を抑制するこ
とが行われる。この半導体素子1については図示しない
が、P型のコレクタ領域を共通とし、該P型のコレクタ
領域上のN型層内の表面に分散して形成されたPベース
領域内の表面に分散して形成されたNエミッタ領域を有
するIGBTにおいて、Pベース領域とNエミッタ領域
の一部を主のエミッタ電極とは分離した検出用エミッタ
電極に接続することにより、電流検出用エミッタを備え
た半導体素子1が形成される。
2. Description of the Related Art A conventional short-circuit protection circuit for a semiconductor device having a current detecting emitter is disclosed, for example, in Japanese Patent Application Laid-Open No. 2-13 / 1990.
No. 0951 is disclosed. FIG. 3 shows a conventional example of such a short-circuit protection circuit. In the circuit of FIG. 3, when the circuit to which the semiconductor element 1 is connected is short-circuited, an excessive current exceeding the rating of the semiconductor element 1 is prevented from flowing into the semiconductor element 1 and destroyed. A current flowing from the collector to the emitter of the semiconductor element 1 is detected by the current detection emitter 3 and the current detection resistor 5 which are partially separated, and protection is performed when an excessive current that leads to element destruction is detected. Semiconductor element 4
Is conducted, the gate input voltage is divided by the gate resistor 6 and the protection semiconductor element 4, and the voltage applied between the gate and the emitter of the semiconductor element 1 is suppressed to suppress the short-circuit current. Although not shown, the semiconductor element 1 has a common P-type collector region and is dispersed on a surface in a P-base region formed on the surface of the N-type layer on the P-type collector region. In the IGBT having the formed N emitter region, the semiconductor element 1 having the current detecting emitter is formed by connecting a part of the P base region and the N emitter region to the detecting emitter electrode separated from the main emitter electrode. Is formed.

【0003】[0003]

【発明が解決しようとする課題】図3の回路において短
絡保護を行う場合、電流検出用抵抗5と保護用半導体素
子4の選定された定数によっては保護用半導体素子4が
導通した瞬間に半導体素子1のゲート電圧を急激に絞り
込むこととなり、それにあわせ半導体素子1に流れる短
絡電流を急激に抑え込むこととなる。この短絡電流の急
激な絞り込みによるdi/dtと回路に浮遊するインダ
クタンスLにより、過大な誘導電圧V(V=L・di/
dt)が発生し、半導体素子1の定格耐圧を越えて破壊
に到らしめる場合がある。
When short-circuit protection is performed in the circuit of FIG. 3, depending on the selected constants of the current detecting resistor 5 and the protective semiconductor element 4, the semiconductor element is turned on at the moment when the protective semiconductor element 4 becomes conductive. Thus, the gate voltage of the semiconductor device 1 is sharply reduced, and accordingly, the short-circuit current flowing through the semiconductor element 1 is rapidly suppressed. Due to the di / dt caused by the rapid narrowing of the short-circuit current and the inductance L floating in the circuit, an excessive induced voltage V (V = L · di /
dt), which may exceed the rated withstand voltage of the semiconductor element 1 and lead to destruction.

【0004】[0004]

【課題を解決するための手段】この課題を解決するため
に、複数個の電流検出用抵抗と複数個の保護用半導体素
子を接続し、保護用半導体素子を順次導通させて短絡電
流の絞り込みを多段階で行い、急激な電流変化を抑える
ことで前記誘導電圧Vを小さく抑え込み半導体素子の破
壊を防ぐものである。
In order to solve this problem, a plurality of current detecting resistors and a plurality of protective semiconductor elements are connected, and the protective semiconductor elements are sequentially turned on to narrow the short-circuit current. This step is performed in multiple stages to suppress the abrupt current change, thereby suppressing the induced voltage V to a small value and preventing the semiconductor element from being destroyed.

【0005】[0005]

【発明の実施の形態】図1に請求項1に関する実施例
を、図2に請求項2に関する実施例を示す。図1におい
ては2個の電流検出用抵抗51および52が直列に接続
されて電流検出用エミッタに接続されている。そして、
保護用半導体素子41のゲートが電流検出用エミッタ3
と電流検出用抵抗51との間に接続され、保護用半導体
素子42のゲートが電流検出用抵抗51と52との間に
接続される。保護用半導体素子41と42とは半導体素
子1のゲート・エミッタ間に並列に接続される。保護用
半導体素子41および42は異なった特性のものでもよ
いが、かりに同一の特性のものとした場合には、短絡電
流が流れると、まず保護用半導体素子41が導通状態に
なり、続いて保護用半導体素子42が導通状態になる。
保護用半導体素子が段階的に導通状態になることで、半
導体素子1のゲート電圧を段階的に絞り込み、それにあ
わせて短絡電流をも段階的に抑えることが可能となる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an embodiment according to claim 1, and FIG. 2 shows an embodiment according to claim 2. In FIG. 1, two current detection resistors 51 and 52 are connected in series and connected to a current detection emitter. And
The gate of the protection semiconductor element 41 is the emitter 3 for current detection.
And the current detection resistor 51, and the gate of the protection semiconductor element 42 is connected between the current detection resistors 51 and 52. The protection semiconductor elements 41 and 42 are connected in parallel between the gate and the emitter of the semiconductor element 1. The protection semiconductor elements 41 and 42 may have different characteristics. However, if the protection semiconductor elements 41 and 42 have the same characteristic, when a short-circuit current flows, the protection semiconductor element 41 is first turned on, and then the protection semiconductor element 41 is turned on. Semiconductor element 42 becomes conductive.
When the protective semiconductor element is turned on stepwise, the gate voltage of the semiconductor element 1 can be narrowed down stepwise, and the short-circuit current can be suppressed stepwise accordingly.

【0006】図2においては、電流検出用抵抗53,5
4のそれぞれを異なる電流検出用エミッタ33,34に
接続し、各抵抗とエミッタ間に保護用半導体素子43,
44のゲートをそれぞれ接続している。このため、保護
用半導体素子43および44が同時に導通状態にならな
いように、保護用半導体素子43および44とそれぞれ
に接続される電流検出用抵抗53および54の定数を選
定しておき、保護用半導体素子43および44を段階的
に導通させることで図1の場合と同様の効果をもたせる
ことが出来る。
In FIG. 2, current detecting resistors 53, 5
4 are connected to different current detecting emitters 33 and 34, respectively.
Forty-four gates are connected. For this reason, the constants of the current detecting resistors 53 and 54 connected to the protective semiconductor elements 43 and 44, respectively, are selected so that the protective semiconductor elements 43 and 44 are not simultaneously turned on. By conducting the elements 43 and 44 stepwise, the same effect as in the case of FIG. 1 can be obtained.

【0007】図1および図2に示す実施例における波形
例を図4に示す。図4の(a)がコレクタ電流を示して
おり、(b)がコレクタ,エミッタ間電圧を示してお
り、(c)がゲート,エミッタ間電圧を示しており、実
線は図1,図2の回路における場合であり、点線は図3
の回路の場合である。
FIG. 4 shows an example of waveforms in the embodiment shown in FIGS. 4A shows the collector current, FIG. 4B shows the voltage between the collector and the emitter, FIG. 4C shows the voltage between the gate and the emitter, and the solid lines in FIGS. In the case of the circuit, the dotted line is shown in FIG.
This is the case of the circuit of FIG.

【0008】[0008]

【発明の効果】半導体素子の接続される回路が短絡状態
になった場合に、短絡電流を段階的に絞り込むことで過
大な電流による素子破壊を防ぐとともに、回路のインダ
クタンスによる誘導電圧の発生をも押さえ、電圧に起因
する素子破壊をも防ぐ効果をもたせることが出来る。
According to the present invention, when a circuit to which a semiconductor element is connected is short-circuited, the short-circuit current is narrowed down stepwise to prevent element destruction due to an excessive current and to prevent generation of an induced voltage due to circuit inductance. It is possible to provide an effect of preventing the element breakdown caused by the pressing and the voltage.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この発明の1実施例を示す回路図。FIG. 1 is a circuit diagram showing one embodiment of the present invention.

【図2】この発明の他の実施例を示す回路図。FIG. 2 is a circuit diagram showing another embodiment of the present invention.

【図3】従来の短絡保護の例を示す回路図。FIG. 3 is a circuit diagram showing an example of conventional short-circuit protection.

【図4】図1および図2における動作波形(実線)およ
び図3における動作波形(点線)を示す図。
FIG. 4 is a diagram showing an operation waveform (solid line) in FIGS. 1 and 2 and an operation waveform (dotted line) in FIG. 3;

【符号の説明】[Explanation of symbols]

1…半導体素子、2…エミッタ、3,33,34…電流
検出用エミッタ、4,41,42,43,44…保護用
半導体素子、5,51,52,53,54…電流検出用
抵抗、6…ゲート抵抗。
DESCRIPTION OF SYMBOLS 1 ... Semiconductor element, 2 ... Emitter, 3, 33, 34 ... Emitter for current detection, 4, 41, 42, 43, 44 ... Semiconductor element for protection, 5, 51, 52, 53, 54 ... Resistance for current detection, 6 ... Gate resistance.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ゲート,コレクタを共通とし、エミッタの
一部を分離し電流検出用エミッタとして使用する半導体
素子の短絡保護回路において、複数個の電流検出用抵抗
を電流検出用エミッタに直列に接続し、複数個の保護用
半導体素子のゲートを前記電流検出用抵抗の一端にそれ
ぞれ接続し、保護用半導体素子のドレイン(コレクタ)
は半導体素子のゲートに、保護用半導体素子のソース
(エミッタ)は半導体素子のエミッタにそれぞれ接続す
ることを特徴とする半導体素子の短絡保護回路。
In a short-circuit protection circuit for a semiconductor device in which a gate and a collector are used in common and a part of an emitter is separated and used as a current detection emitter, a plurality of current detection resistors are connected in series to the current detection emitter. The gates of the plurality of protection semiconductor elements are connected to one ends of the current detection resistors, respectively, and the drains (collectors) of the protection semiconductor elements are connected.
A short-circuit protection circuit for a semiconductor element, wherein a circuit is connected to a gate of the semiconductor element, and a source (emitter) of the semiconductor element for protection is connected to an emitter of the semiconductor element.
【請求項2】ゲート,コレクタを共通とし、エミッタの
一部を分離し複数個の電流検出用エミッタとして使用す
る半導体素子の短絡保護回路において、複数個の電流検
出用抵抗はそれぞれ異なる電流検出用エミッタに接続
し、複数個の保護用半導体素子のゲートは前記電流検出
用抵抗の一端に、保護用半導体素子のドレイン(コレク
タ)は半導体素子のゲートに、保護用半導体素子のソー
ス(エミッタ)は半導体素子のエミッタにそれぞれ接続
することを特徴とする半導体素子の短絡保護回路。
2. A short-circuit protection circuit for a semiconductor device in which a gate and a collector are used in common and a part of an emitter is separated to be used as a plurality of emitters for current detection. The gates of the plurality of protective semiconductor elements are connected to one end of the current detection resistor, the drain (collector) of the protective semiconductor element is connected to the gate of the semiconductor element, and the source (emitter) of the protective semiconductor element is connected to the emitter. A short-circuit protection circuit for a semiconductor device, wherein the short-circuit protection circuit is connected to an emitter of the semiconductor device.
JP11131451A 1999-05-12 1999-05-12 Semiconductor element short-circuit protection circuit Withdrawn JP2000323974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11131451A JP2000323974A (en) 1999-05-12 1999-05-12 Semiconductor element short-circuit protection circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11131451A JP2000323974A (en) 1999-05-12 1999-05-12 Semiconductor element short-circuit protection circuit

Publications (1)

Publication Number Publication Date
JP2000323974A true JP2000323974A (en) 2000-11-24

Family

ID=15058274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11131451A Withdrawn JP2000323974A (en) 1999-05-12 1999-05-12 Semiconductor element short-circuit protection circuit

Country Status (1)

Country Link
JP (1) JP2000323974A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002300017A (en) * 2001-04-03 2002-10-11 Mitsubishi Electric Corp Semiconductor device
JP2008042958A (en) * 2006-08-01 2008-02-21 Mitsubishi Electric Corp Semiconductor module
JP2008306807A (en) * 2007-06-06 2008-12-18 Nissan Motor Co Ltd Drive circuit for voltage-driven element
JP2010010811A (en) * 2008-06-24 2010-01-14 Mitsubishi Electric Corp Semiconductor element drive circuit
JP2017050984A (en) * 2015-09-02 2017-03-09 ルネサスエレクトロニクス株式会社 Semiconductor integrated circuit device and electronic device
CN109756116A (en) * 2019-01-30 2019-05-14 上海艾为电子技术股份有限公司 Boost chip and its short-circuit protection circuit
JP2019161806A (en) * 2018-03-12 2019-09-19 トヨタ自動車株式会社 Switching circuit
US11309788B2 (en) 2019-12-18 2022-04-19 Fuji Electric Co., Ltd. Semiconductor drive device and power conversion apparatus

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002300017A (en) * 2001-04-03 2002-10-11 Mitsubishi Electric Corp Semiconductor device
JP2008042958A (en) * 2006-08-01 2008-02-21 Mitsubishi Electric Corp Semiconductor module
JP2008306807A (en) * 2007-06-06 2008-12-18 Nissan Motor Co Ltd Drive circuit for voltage-driven element
JP2010010811A (en) * 2008-06-24 2010-01-14 Mitsubishi Electric Corp Semiconductor element drive circuit
JP2017050984A (en) * 2015-09-02 2017-03-09 ルネサスエレクトロニクス株式会社 Semiconductor integrated circuit device and electronic device
US10324114B2 (en) 2015-09-02 2019-06-18 Renesas Electronics Corporation Semiconductor integrated circuit device and electronic device for driving a power semiconductor device
JP2019161806A (en) * 2018-03-12 2019-09-19 トヨタ自動車株式会社 Switching circuit
JP7040151B2 (en) 2018-03-12 2022-03-23 株式会社デンソー Switching circuit
CN109756116A (en) * 2019-01-30 2019-05-14 上海艾为电子技术股份有限公司 Boost chip and its short-circuit protection circuit
CN109756116B (en) * 2019-01-30 2024-03-01 上海艾为电子技术股份有限公司 Boost chip and short-circuit protection circuit thereof
US11309788B2 (en) 2019-12-18 2022-04-19 Fuji Electric Co., Ltd. Semiconductor drive device and power conversion apparatus

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