JP2000321594A - Cog type liquid crystal display device - Google Patents
Cog type liquid crystal display deviceInfo
- Publication number
- JP2000321594A JP2000321594A JP12859299A JP12859299A JP2000321594A JP 2000321594 A JP2000321594 A JP 2000321594A JP 12859299 A JP12859299 A JP 12859299A JP 12859299 A JP12859299 A JP 12859299A JP 2000321594 A JP2000321594 A JP 2000321594A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- terminal
- pattern
- display device
- crystal display
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 60
- 238000007747 plating Methods 0.000 claims abstract description 57
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000011521 glass Substances 0.000 claims abstract description 33
- 238000005520 cutting process Methods 0.000 claims abstract description 14
- 210000002858 crystal cell Anatomy 0.000 claims description 3
- 230000002950 deficient Effects 0.000 abstract 1
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000002184 metal Substances 0.000 description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 239000010931 gold Substances 0.000 description 13
- 229910052737 gold Inorganic materials 0.000 description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 9
- 229910003437 indium oxide Inorganic materials 0.000 description 9
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 8
- 229910001887 tin oxide Inorganic materials 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- BEQNOZDXPONEMR-UHFFFAOYSA-N cadmium;oxotin Chemical compound [Cd].[Sn]=O BEQNOZDXPONEMR-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- 102100033007 Carbonic anhydrase 14 Human genes 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101000867862 Homo sapiens Carbonic anhydrase 14 Proteins 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- -1 gold ions Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【産業上の技術分野】この発明は、液晶表示装置に関
し、特にガラス基板上に金属配線端子を有するCOG型
(Chip On Glass)の液晶表示装置の配線
端子の金属メッキを、抜けが無いように安定に施す液晶
表示装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device having a metal wiring terminal on a glass substrate. The present invention relates to a liquid crystal display device to be stably applied.
【0002】[0002]
【従来の技術】近年、液晶表示装置において、コスト、
工程数や信頼性等からガラス基板上に液晶駆動用LSI
チップを実装するCOG型(Chip On Glas
s)の液晶表示装置が多く用いられている。2. Description of the Related Art Recently, cost,
LSI for driving liquid crystal on a glass substrate due to the number of processes and reliability
COG type (Chip On Glass) for mounting a chip
The liquid crystal display device of s) is often used.
【0003】図5にCOG型液晶表示装置の基本的な構
成図を示す。図5においてCOG型液晶表示装置21
は、ガラス基板2、透明導電膜のパターン3a,3b、
液晶14、樹脂等のシール15、外部電極6、偏光フィ
ルタ17、液晶駆動用LSI18、金属メッキ9で構成
し、上下2枚のガラス基板2の位置合せを行い、2枚の
ガラス基板間にギャップを設けてギャップに液晶14を
封入し、周囲に樹脂等のシール15で封止され、ガラス
基板2の表面には、ネサ膜やITO膜(酸化インジウム
膜)等の透明導電膜のパターン3a,3bを形成してい
る。FIG. 5 shows a basic configuration diagram of a COG type liquid crystal display device. In FIG. 5, a COG type liquid crystal display device 21 is shown.
Are the glass substrate 2, the transparent conductive patterns 3a and 3b,
It is composed of a liquid crystal 14, a seal 15 made of resin or the like, an external electrode 6, a polarizing filter 17, a liquid crystal driving LSI 18, and a metal plating 9. The upper and lower two glass substrates 2 are aligned, and a gap is formed between the two glass substrates. The liquid crystal 14 is sealed in the gap, and the periphery is sealed with a seal 15 such as a resin. On the surface of the glass substrate 2, a pattern 3a of a transparent conductive film such as a Nesa film or an ITO film (indium oxide film) is formed. 3b.
【0004】さらに、COG型液晶表示装置21の表面
には、偏光フィルタ17が貼られている。また、液晶駆
動用LSI18が液晶14の外部の配線端子に設置され
ており、外部電極6から電源と表示命令信号を取入れ
て、液晶表示装置用の信号を表示部に供給している。Further, a polarizing filter 17 is attached to the surface of the COG type liquid crystal display device 21. Further, a liquid crystal driving LSI 18 is provided at a wiring terminal outside the liquid crystal 14, receives a power supply and a display command signal from the external electrode 6, and supplies a signal for a liquid crystal display device to a display unit.
【0005】さらに、外部電極6および液晶駆動用LS
I18のパターン全体を金属メッキ9で覆っている。な
お、透明導電膜のパターン3a,3b等の形成時に同時
に形成された液晶14の外部の部分を外部電極6および
配線端子とする。Further, an external electrode 6 and a liquid crystal driving LS
The entire pattern of I18 is covered with metal plating 9. The portions outside the liquid crystal 14 formed at the same time as the formation of the patterns 3a and 3b of the transparent conductive film are used as the external electrodes 6 and the wiring terminals.
【0006】このCOG型液晶表示装置21は、電極部
に液晶駆動用LSI18を設置した小型モジュールであ
り、表示容量が大きい場合に使用する細密パターンで
は、配線端子が細くなり、特に端子部上に設置される液
晶駆動用LSI18の周辺では、配線の線幅は100μ
m以下と細いため配線の抵抗も大きくなる。この抵抗値
を小さくするためには金属配線が有効であり、従来の液
晶表示装置では、細密パターンを金属膜の蒸着やスパッ
タリング等で形成するパターニング法を用いていた。The COG type liquid crystal display device 21 is a small module in which a liquid crystal driving LSI 18 is provided in an electrode portion. In a fine pattern used when a display capacity is large, a wiring terminal becomes thin, and especially, a wiring terminal becomes thin. Around the liquid crystal driving LSI 18 to be installed, the line width of the wiring is 100 μm.
m or less, the wiring resistance also increases. A metal wiring is effective for reducing the resistance value, and a conventional liquid crystal display device uses a patterning method of forming a fine pattern by vapor deposition or sputtering of a metal film.
【0007】また、従来のCOG型液晶表示装置は、透
明導電膜のITO膜上にNi-P、Auを無電界メッキ
する方法であり、ITO膜のみに選択的にNi-Pを付
着させ、その上にAuを置換メッキあるいは自己触媒メ
ッキさせることができ、パターニングが不要であり、I
TO膜の無いガラス上にはメッキを付着させないという
特徴があった。Further, the conventional COG type liquid crystal display device is a method in which Ni-P and Au are electrolessly plated on an ITO film of a transparent conductive film, and Ni-P is selectively deposited only on the ITO film. Au can be subjected to displacement plating or autocatalytic plating thereon, and patterning is not required.
There was a feature that plating was not adhered on glass having no TO film.
【0008】さらに、特開平5−53128号公報に
は、ガラス基板上に無電界メッキ法で金属配線を行い、
金属配線のある領域の配線に対してその一番外側を囲む
ようにダミーパターンまたは幅の広い電源線を設けて、
それより内側のメッキ抜けを防ぐ発明が開示されてい
る。Further, Japanese Patent Application Laid-Open No. 5-53128 discloses that a metal wiring is formed on a glass substrate by an electroless plating method.
Provide a dummy pattern or a wide power supply line so as to surround the outermost part of the wiring in the area with the metal wiring,
There is disclosed an invention that prevents plating from being removed from the inner side.
【0009】[0009]
【発明が解決しようとする課題】細密パターンを金属膜
の蒸着やスパッタリング等で形成する従来のCOG型液
晶表示装置は、蒸着やスパッタリング等の工程を行うた
めに蒸着やスパッタリング装置の設備費が高価で製造コ
ストが高くなるという課題がある。In a conventional COG type liquid crystal display device in which a fine pattern is formed by vapor deposition or sputtering of a metal film, the equipment cost of the vapor deposition or sputtering device is high because the processes such as vapor deposition and sputtering are performed. Therefore, there is a problem that the manufacturing cost increases.
【0010】また、透明導電膜のITO膜上にNi-
P、Auを無電界メッキする従来のCOG型液晶表示装
置は、コストが安く製造できるが、連続したパターンの
うち1つだけのパターンにメッキされないパターンが出
ることがあり、また特に孤立した細かなパターンでメッ
キ抜けすることが多く起こる。1つのパターンの中でメ
ッキされる部分とメッキされない部分が生じるのではな
く、メッキされないパターンは、全ての部分でメッキさ
れないというパターン抜けがおこる課題がある。[0010] Further, Ni- on the ITO film of the transparent conductive film.
A conventional COG type liquid crystal display device in which P and Au are electrolessly plated can be manufactured at a low cost, but only one of continuous patterns may be unplated, and in particular, isolated fine patterns may be produced. Plating often occurs in the pattern. There is a problem that not a plated portion and a non-plated portion are generated in one pattern, but a pattern that is not plated is not plated at all portions.
【0011】さらに、特開平5−53128号公報に開
示されている、ある領域の配線に対してその一番外側を
囲むようにダミーパターンまたは電源線を設けて内側の
メッキ抜けを防ぐ従来の液晶表示装置は、メッキの電位
に原因があるようで、外側のダミーパターンまたは電源
線だけでなく内側のパターンも同時にメッキ抜けになる
ことがあるという課題がある。Further, a conventional liquid crystal disclosed in Japanese Patent Application Laid-Open No. 5-53128 is provided with a dummy pattern or a power supply line surrounding a wiring in a certain area so as to surround the outermost part, thereby preventing plating from being removed inside. The display device seems to be caused by the potential of the plating, and there is a problem that not only the outer dummy pattern or the power supply line but also the inner pattern may be plated simultaneously.
【0012】[0012]
【課題を解決するための手段】前記課題を解決するため
本発明に係るCOG型液晶表示装置のセグメント基板
は、配線端子部の端子からそれぞれ細い導電性のパター
ンを延長して接続する端子パターン集合部と、配線端子
部と端子パターン集合部との間を切断するための切断部
とを備え、配線端子部を同電位としてメッキを施し、メ
ッキ終了後に、配線端子部と端子パターン集合部との間
を切断部で切断したことを特徴とするAccording to the present invention, there is provided a segment substrate of a COG type liquid crystal display device according to the present invention, comprising a terminal pattern group for extending and connecting thin conductive patterns from terminals of a wiring terminal portion. And a cutting portion for cutting between the wiring terminal portion and the terminal pattern gathering portion, plating the wiring terminal portion with the same potential, and after plating, the wiring terminal portion and the terminal pattern gathering portion. It is characterized by having been cut at the cutting part
【0013】本発明に係るCOG型液晶表示装置のセグ
メント基板は、配線端子部を同電位としたので、安定的
にメッキが施され、メッキ終了後、端子パターン部を分
離する。In the segment substrate of the COG type liquid crystal display device according to the present invention, since the wiring terminal portions are set to the same potential, plating is stably performed, and after plating, the terminal pattern portion is separated.
【0014】また、本発明に係るセグメント表示部およ
びセグメント表示部に接続した端子パターン集合部は、
透明絶縁膜で覆われメッキが施されない領域であること
を特徴とする。[0014] The segment display section and the terminal pattern collecting section connected to the segment display section according to the present invention may include:
The region is covered with a transparent insulating film and is not plated.
【0015】本発明に係るセグメント表示部およびセグ
メント表示部に接続した端子パターン集合部は、メッキ
が施されない領域なのでメッキが付着されるのを防ぎ、
また、シール外部の端子間での汚れや結露水によるショ
ートを防ぐことができる。The segment display portion and the terminal pattern collecting portion connected to the segment display portion according to the present invention prevent the plating from being adhered because the region is not plated.
In addition, it is possible to prevent contamination between terminals outside the seal and short circuit due to dew condensation water.
【0016】さらに、本発明に係る位置合せマーク部
は、細い導電性のパターンにより端子パターン集合部に
接続し、接続されたパターン全部に金属メッキしたこと
を特徴とする。Further, the alignment mark portion according to the present invention is characterized in that the alignment mark portion is connected to the terminal pattern collecting portion by a thin conductive pattern, and all the connected patterns are metal-plated.
【0017】本発明に係る位置合せマーク部は、液晶駆
動用LSIを機械で自動的に設置する場合に位置合せマ
ーク部がメッキによりはっきり表示され自動画像認識の
検出マークとして利用できる。The alignment mark portion according to the present invention can be used as a detection mark for automatic image recognition because the alignment mark portion is clearly displayed by plating when the liquid crystal driving LSI is automatically installed by a machine.
【0018】[0018]
【発明の実施の形態】以下、この発明の実施の形態を添
付図面に基づいて説明する。図1に、この発明に係るC
OG型液晶表示装置のセグメント基板図を示す。図1に
おいてCOG型液晶表示装置のセグメント基板1は、ガ
ラス基板2、配線端子部(セグメント側電極)6a、配
線端子部(制御側電極)6b、配線端子部(入力側電
極)6c、セグメント表示部3e、位置合せマーク部
4、切断部5、透明絶縁膜の塗布領域7、端子パターン
集合部8(8a、8b、8c)とで構成する。Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 shows the C according to the present invention.
1 shows a segment substrate diagram of an OG type liquid crystal display device. In FIG. 1, a segment substrate 1 of a COG type liquid crystal display device includes a glass substrate 2, a wiring terminal (segment-side electrode) 6a, a wiring terminal (control-side electrode) 6b, a wiring terminal (input-side electrode) 6c, and a segment display. A portion 3e, an alignment mark portion 4, a cutting portion 5, a transparent insulating film application region 7, and a terminal pattern collecting portion 8 (8a, 8b, 8c).
【0019】ガラス基板2は、ガラス成分としてソーダ
ライムガラスを主成分とする。また、ガラス基板2は、
平坦度に対し、偏肉、反り、うねり、表面粗さ等が少な
く、傷、ピット、汚れ等の点で高品位なガラスから成
り、場合によっては、表面研磨を施すものもある。な
お、このガラス基板2には、無アルカリガラスを用いて
もよい。The glass substrate 2 contains soda lime glass as a main component as a glass component. In addition, the glass substrate 2
It is made of high-quality glass with little unevenness, warpage, undulation, surface roughness, etc., in terms of flatness, scratches, pits, dirt, and the like. In some cases, the surface is polished. Note that the glass substrate 2 may be made of non-alkali glass.
【0020】配線端子部(セグメント側電極)6aは、
複数の配線端子からなり、セグメント電極に電位を与え
液晶の表示をする。また、配線端子部(セグメント側電
極)6aは、酸化錫(SnO2)や酸化インジウム(I
n2O3)を主な成分とし、酸化インジウムと酸化錫との
混合物、酸化カドミウム錫(Cd2SnO4)等からなる
化合物を真空、化学蒸着等で透明導電膜を形成する。The wiring terminal portion (segment side electrode) 6a
It is composed of a plurality of wiring terminals and gives a potential to the segment electrodes to display liquid crystal. The wiring terminal (segment side electrode) 6a is made of tin oxide (SnO 2 ) or indium oxide (I
n 2 O 3 ) is used as a main component, and a compound made of a mixture of indium oxide and tin oxide, cadmium tin oxide (Cd 2 SnO 4 ), or the like is used to form a transparent conductive film by vacuum, chemical vapor deposition, or the like.
【0021】さらに、配線端子部(制御側電極)6b
は、複数の配線端子からなり、コモン電極に電位を与え
液晶の表示をする。また、配線端子部(制御側電極)6
bは、酸化錫や酸化インジウムを主な成分とし、酸化イ
ンジウムと酸化錫との混合物、酸化カドミウム錫等から
なる化合物を真空、化学蒸着等で透明導電膜を形成す
る。Further, a wiring terminal (control electrode) 6b
Is composed of a plurality of wiring terminals and applies a potential to the common electrode to display a liquid crystal. Also, a wiring terminal (control-side electrode) 6
b forms a transparent conductive film by using, as a main component, tin oxide or indium oxide, a mixture of indium oxide and tin oxide, cadmium tin oxide, or the like, by vacuum, chemical vapor deposition, or the like.
【0022】さらに、配線端子部(入力側電極)6c
は、複数の配線端子からなり、液晶駆動用LSIの電源
供給および接地のための電流の供給を行う。また、配線
端子部(入力側電極)6cは、酸化錫や酸化インジウム
を主な成分とし、酸化インジウムと酸化錫との混合物、
酸化カドミウム錫等からなる化合物を真空、化学蒸着等
で透明導電膜を形成する。Further, a wiring terminal portion (input side electrode) 6c
Is composed of a plurality of wiring terminals and supplies current for power supply and grounding of the liquid crystal driving LSI. The wiring terminal portion (input side electrode) 6c is mainly composed of tin oxide or indium oxide, and is a mixture of indium oxide and tin oxide;
A transparent conductive film is formed from a compound made of cadmium tin oxide or the like by vacuum, chemical vapor deposition, or the like.
【0023】セグメント表示部3eは、配線端子部(セ
グメント側電極)6aに接続し、そのパターンはセグメ
ント側電極6aよりも面積が大きく、酸化錫や酸化イン
ジウムを主な成分とし、酸化インジウムと酸化錫との混
合物、酸化カドミウム錫等からなる化合物を真空、化学
蒸着等で表示電極を形成し、表示電極の上部を透明絶縁
膜で覆い、その上部に配向膜を配置し、さらにその上に
は液晶を搭載する。The segment display section 3e is connected to a wiring terminal section (segment-side electrode) 6a, and its pattern is larger in area than the segment-side electrode 6a, and contains tin oxide or indium oxide as a main component. A mixture of tin and a compound composed of cadmium tin oxide or the like is formed in a display electrode by vacuum, chemical vapor deposition, or the like, an upper portion of the display electrode is covered with a transparent insulating film, an alignment film is disposed thereon, and an alignment film is further disposed thereon. Equipped with liquid crystal.
【0024】位置合せマーク部4は、液晶駆動用LSI
を配置する時にその位置と方向とを知らせるためのマー
クで、位置合せマーク部4のパターンを細いパターンで
延長して端子パターン集合部8cおよび配線端子部(入
力側電極)6cに接続したので、位置合せマーク部4に
も金属メッキを同時に行う。The alignment mark section 4 is a liquid crystal driving LSI
This is a mark for notifying the position and the direction when arranging, and the pattern of the alignment mark portion 4 is extended with a thin pattern and connected to the terminal pattern collecting portion 8c and the wiring terminal portion (input side electrode) 6c. Metal plating is also performed on the alignment mark portion 4 at the same time.
【0025】切断部5は、金属メッキ処理の後、切断部
5の位置でガラス基板2を切断して配線端子部6a,6
b,6cと端子パターン集合部8(8a、8b、8c)
とを電気的に切り離す。After the metal plating, the cutting section 5 cuts the glass substrate 2 at the position of the cutting section 5 to form the wiring terminal sections 6a, 6a.
b, 6c and terminal pattern gathering section 8 (8a, 8b, 8c)
And is electrically disconnected.
【0026】透明絶縁膜の塗布領域7は、セグメント表
示部3eおよび端子パターン集合部8aの透明導電膜の
上に透明絶縁膜を塗布しているので、メッキがされな
い。また、この透明絶縁膜の塗布によりセグメント表示
部3eにメッキが付着するのを防ぎ、また、セグメント
表示部3eのパターンを延長した細いパターンは、同様
に透明絶縁膜が塗布されているのでパターン間での汚れ
や結露水によるショートを防ぐ。さらに、透明絶縁膜の
塗布領域7のセグメント表示部3eの上部には、配向膜
を介して液晶セルが形成される。Since the transparent insulating film is applied on the transparent conductive film of the segment display portion 3e and the terminal pattern collecting portion 8a, the transparent insulating film is not plated in the application region 7 of the transparent insulating film. Further, the coating of the transparent insulating film prevents the plating from adhering to the segment display portion 3e, and the thin pattern obtained by extending the pattern of the segment display portion 3e has the same pattern as that of the transparent insulating film. To prevent short circuit due to dirt or dew condensation. Further, a liquid crystal cell is formed above the segment display portion 3e in the application region 7 of the transparent insulating film via an alignment film.
【0027】端子パターン集合部8aは、1本の細い導
電性のパターンで構成し、配線端子部(セグメント側電
極)6aに接続するセグメント表示部3eから延長した
細いパターンに接続し、配線端子部の電位を全て同じに
する。また、端子パターン集合部8bは、1本の細い導
電性のパターンで構成し、配線端子部(制御側電極)6
bのコモン電極パターンの全ての配線端子から延長した
細いパターンに接続し、配線端子部の電位を全て同じに
する。さらに、端子パターン集合部8cは、1本の細い
導電性のパターンで構成し、配線端子部(入力側電極)
6cの全ての配線端子から延長した細いパターンに接続
し、配線端子部の電位を全て同じにする。The terminal pattern collecting portion 8a is formed of one thin conductive pattern, and is connected to a thin pattern extending from the segment display portion 3e connected to the wiring terminal portion (segment side electrode) 6a. Are all the same. The terminal pattern collecting portion 8b is formed of one thin conductive pattern, and the wiring terminal portion (control electrode) 6
The connection is made to a thin pattern extending from all the wiring terminals of the common electrode pattern b, and the potentials of the wiring terminal portions are all equalized. Further, the terminal pattern collecting portion 8c is formed of one thin conductive pattern, and the wiring terminal portion (input side electrode)
6c is connected to a thin pattern extending from all the wiring terminals, and all the potentials of the wiring terminal portions are made equal.
【0028】なお、端子パターン集合部8をそれぞれの
電極パターン毎に分けないで全部の配線端子を1本の端
子パターン集合部のパターンに接続して配線端子の全て
の電位が同じになるようにしてもよい。It should be noted that all the wiring terminals are connected to one pattern of the terminal pattern gathering portion without dividing the terminal pattern gathering portion 8 for each electrode pattern so that all the potentials of the wiring terminals become the same. You may.
【0029】図2にこの発明に係るセグメント基板のメ
ッキ処理工程図を示す。図2の(a)は、パターニング
されたITO膜付き基板の状態を示す。ソーダライムシ
リカガラス等からなるガラス基板2にエッチング等によ
り酸化スズや酸化インジウム等で表示電極(図1のセグ
メント基板3eに相当する)領域、表示部への配線端子
部(図1のセグメント側電極6aに相当)および外部電
極6(図1の入力側電極6cに相当)の端子から、それ
ぞれ細いパターンを延長して接続する1本の導電性のパ
ターンを有する端子パターン集合部等にITO膜3によ
る透明導電膜を形成する。また、メッキを付着させない
領域には、透明絶縁膜7を設けておく。FIG. 2 is a view showing a plating process of a segment substrate according to the present invention. FIG. 2A shows a state of a patterned substrate with an ITO film. A display electrode (corresponding to the segment substrate 3e in FIG. 1) is formed on a glass substrate 2 made of soda lime silica glass or the like by etching or the like with tin oxide or indium oxide, and a wiring terminal portion to the display portion (segment side electrode in FIG. 6a) and the terminal of the external electrode 6 (corresponding to the input-side electrode 6c in FIG. 1). To form a transparent conductive film. Further, a transparent insulating film 7 is provided in a region where plating is not attached.
【0030】図2の(b)は、金属メッキ(ニッケル)
9−aを施した状態を示す。図2の(b)において液晶
部への配線部やバンプ部以外に金属メッキを施すため
に、初めに表面の汚れの除去や脱脂等の目的のために、
アルカリ性の溶液でクリーニングを行い、次に塩酸等の
酸でアルカリ性を中和する。FIG. 2B shows metal plating (nickel).
9 shows a state where 9-a is performed. In FIG. 2B, in order to apply metal plating to portions other than the wiring portion and the bump portion to the liquid crystal portion, first, for the purpose of removing dirt on the surface or degreasing,
Cleaning is performed with an alkaline solution, and then alkalinity is neutralized with an acid such as hydrochloric acid.
【0031】さらに、触媒化処理を行う。まず、キャタ
リストとして、塩化第一錫と塩化パラジウム等からなる
金属塩化物、および塩酸を同時に含んだ触媒化処理液に
2〜3分間程浸積する。Further, a catalytic treatment is performed. First, as a catalyst, it is immersed for about 2 to 3 minutes in a catalyzed treatment solution containing simultaneously a metal chloride composed of stannous chloride and palladium chloride and hydrochloric acid.
【0032】さらに、ニッケルイオンを含む塩化ニッケ
ル溶液または硫酸ニッケル溶液のような化学ニッケルメ
ッキ液に浸して無電解ニッケルメッキを生成し、下地の
ニッケルメッキ層9−aを形成する。Further, the substrate is immersed in a chemical nickel plating solution such as a nickel chloride solution or a nickel sulfate solution containing nickel ions to generate electroless nickel plating, thereby forming an underlying nickel plating layer 9-a.
【0033】図2の(c)は、金属メッキ(金メッキ)
9−bをニッケルメッキ9−a上に選択的に施した状態
を示す。図2の(b)の処理工程と同様に、始めに表面
の汚れの除去や脱脂等のためにアルカリ性の溶液でクリ
ーニングを行い、次に硫酸等の酸でアルカリ性を中和す
るとともに、ニッケル表面を活性化する。FIG. 2C shows metal plating (gold plating).
9B shows a state where 9-b is selectively applied on the nickel plating 9-a. As in the treatment process of FIG. 2B, first, cleaning is performed with an alkaline solution for removing stains and degreasing of the surface, and then neutralizing the alkalinity with an acid such as sulfuric acid and the like. Activate.
【0034】さらに、メッキ層の厚さが50nm程度の
フラッシュ金による金メッキを行う。金イオンを含む塩
化物溶液または硫酸塩溶液のような金属塩からなる化学
金メッキ液に室温程度で浸し、さらに金属イオンの還元
剤としてホルムアルデヒドやロッシェル塩等で還元して
無電解金メッキを生成し、下地のニッケルメッキ層9−
a上部に金メッキ層9−bを形成する。これら、ニッケ
ルメッキ層9−aと金メッキ層9−bとの全体で金属メ
ッキ9を形成する。Further, gold plating using flash gold having a plating layer thickness of about 50 nm is performed. Immerse in a chemical gold plating solution composed of a metal salt such as a chloride solution or a sulfate solution containing gold ions at about room temperature, and further reduce with formaldehyde or Rochelle salt as a metal ion reducing agent to generate electroless gold plating, Underlying nickel plating layer 9-
a) A gold plating layer 9-b is formed on the upper part a. The metal plating 9 is formed on the whole of the nickel plating layer 9-a and the gold plating layer 9-b.
【0035】このように無電界金属メッキを行う時に、
セグメント表示部および配線端子部の端子からそれぞれ
細い導電性のパターンを延長して1本のパターンで構成
する端子パターン集合部に接続し、配線端子部およびセ
グメント表示部を全て同電位としてメッキを施せば、パ
ターン抜けが無い金属メッキができる。As described above, when performing electroless metal plating,
A thin conductive pattern is extended from each of the terminals of the segment display section and the wiring terminal section and connected to a terminal pattern collecting section composed of one pattern, and the wiring terminal section and the segment display section are all set to the same potential and plated. For example, metal plating without pattern omission can be performed.
【0036】図3に切断された後のセグメント基板のパ
ターンと透明絶縁膜の塗布領域図を示す。図3において
切断されたセグメント基板51の基板上の太い実線で囲
んだ部分は、シールが印刷される領域13で、破線で示
す領域が透明絶縁膜の塗布領域7である。FIG. 3 shows a pattern of the segment substrate after cutting and an application area diagram of the transparent insulating film. In FIG. 3, a portion surrounded by a thick solid line on the cut segment substrate 51 is a region 13 where a seal is printed, and a region indicated by a broken line is a transparent insulating film application region 7.
【0037】透明絶縁膜の塗布領域7は、メッキが施さ
れない領域である。セグメント表示部と延長した細いパ
ターンの一部は、透明絶縁膜に覆われている。また、そ
れぞれの端子から延長されたパターンは、切り離されて
独立したパターンになる。透明絶縁膜の塗布領域7の上
部にシールが印刷される領域13があり、シールが印刷
される領域13内に液晶を封入する。The application area 7 of the transparent insulating film is an area where plating is not performed. The segment display portion and a part of the extended thin pattern are covered with a transparent insulating film. Further, the pattern extended from each terminal is separated and becomes an independent pattern. There is a region 13 where a seal is printed above the application region 7 of the transparent insulating film, and liquid crystal is sealed in the region 13 where the seal is printed.
【0038】図4にセグメント基板のパターンをマザー
ガラスに複数多面付けしたパターン図を示す。図4にお
いてマザーガラス41は、セグメント基板のパターンを
製造する時のベースになるガラス基板で、マザーガラス
41にセグメント基板のパターンを多数面付けし、メッ
キをした後パネルを形成し、液晶を注入してその注入口
を封止した後で、切断部5の位置で切断すれば、一度に
多数のセグメント基板のパターンが製造でき生産効率が
向上する。なお、セグメント基板パターンおよびコモン
基板パターンを同一のマザーガラスに多数面付けしてメ
ッキを行うようにしてもよい。FIG. 4 is a pattern diagram in which a plurality of segment substrate patterns are provided on a mother glass. In FIG. 4, a mother glass 41 is a glass substrate that is a base when manufacturing a pattern of a segment substrate. A large number of segment substrate patterns are imposed on the mother glass 41, a panel is formed after plating, and a liquid crystal is injected. If the injection port is sealed and then cut at the position of the cutting section 5, a large number of segment substrate patterns can be manufactured at once, thereby improving the production efficiency. Note that a large number of segment substrate patterns and common substrate patterns may be provided on the same mother glass for plating.
【0039】[0039]
【発明の効果】以上のように、本発明に係るCOG型液
晶表示装置のセグメント基板は、配線端子部の端子から
それぞれ細い導電性のパターンを延長して接続する端子
パターン集合部と、配線端子部を同電位としてメッキを
施し、メッキ終了後に、配線端子部と端子パターン集合
部との間を切断し、セグメント基板から分離したのでメ
ッキをする時は、パターンの電位を同じにすることがで
き、メッキ抜けが防止できる。また、液晶駆動用LSI
への電源配線と接地配線および昇圧用配線に金属メッキ
を施したので、端子が低抵抗になり電圧降下することな
く電流を流すことができる。As described above, the segment substrate of the COG type liquid crystal display device according to the present invention comprises a terminal pattern collecting portion for extending and connecting a thin conductive pattern from the terminal of the wiring terminal portion, and a wiring terminal. When the plating is done with the same potential, after the plating is completed, the wiring terminal part and the terminal pattern assembly part are cut and separated from the segment substrate, so when plating, the pattern potential can be the same. , Plating can be prevented. Also, LSI for driving liquid crystal
Since the power supply wiring, the ground wiring, and the boost wiring are metal-plated, the terminals have low resistance, and current can flow without voltage drop.
【0040】本発明に係るセグメント表示部およびセグ
メント表示部に接続した端子パターン集合部は、透明絶
縁膜で覆われているのでセグメント表示部にメッキが付
着するのが防止され、また、シール外部の配線部の汚れ
や結露水によるショートを生じるのが防止される。The segment display section and the terminal pattern assembly section connected to the segment display section according to the present invention are covered with the transparent insulating film, so that plating is prevented from adhering to the segment display section, and the outside of the seal is prevented. The occurrence of a short circuit due to the contamination of the wiring portion or dew condensation water is prevented.
【0041】本発明に係る位置合せマーク部は、細い導
電性のパターンにより端子パターン集合部に接続し、接
続されたパターン全部に金属メッキしたので液晶駆動用
LSIを機械で自動的に設置する場合に、位置合せマー
ク部が金属メッキにより鮮明に表示され自動画像認識の
検出マークとして利用できる。The alignment mark portion according to the present invention is connected to the terminal pattern collecting portion by a thin conductive pattern, and all of the connected patterns are metal-plated, so that the liquid crystal driving LSI is automatically installed by a machine. In addition, the alignment mark portion is clearly displayed by metal plating and can be used as a detection mark for automatic image recognition.
【図1】この発明に係るCOG型液晶表示装置のセグメ
ント基板図FIG. 1 is a segment substrate view of a COG type liquid crystal display device according to the present invention.
【図2】この発明に係るセグメント基板のメッキ処理工
程図FIG. 2 is a diagram showing a plating process of a segment substrate according to the present invention.
【図3】切断された後のセグメント基板のパターンと透
明絶縁膜の塗布領域図FIG. 3 is a view showing a pattern of a segment substrate after being cut and a coating area of a transparent insulating film.
【図4】ガラス基板をマザーガラスに複数多面付けした
パターン図FIG. 4 is a pattern diagram in which a plurality of glass substrates are attached to mother glass.
【図5】COG型液晶表示装置の基本的な構成図FIG. 5 is a basic configuration diagram of a COG type liquid crystal display device.
1…COG液晶表示装置のセグメント基板、2…ガラス
基板、3a,3b…透明導電膜のパターン、3e…セグ
メント表示部、4…位置合せマーク部、5…切断部、6
…外部電極、6a…セグメント側電極、6b…制御側電
極、6c…入力側電極、7…透明絶縁膜の塗布領域、
8,8a,8b,8c…端子パターン集合部、9…金属
メッキ、9a…ニッケルメッキ(無電解ニッケルメッ
キ)、9b…金メッキ(無電解金メッキ)、10…バン
プ、13…シールが印刷される領域、14…液晶、15
…シール、17…偏向フィルタ、18…液晶駆動用LS
I、21…COG液晶表示装置、41…マザーガラス。DESCRIPTION OF SYMBOLS 1 ... Segment substrate of COG liquid crystal display device, 2 ... Glass substrate, 3a, 3b ... Transparent conductive film pattern, 3e ... Segment display part, 4 ... Alignment mark part, 5 ... Cutting part, 6
... external electrodes, 6a ... segment side electrodes, 6b ... control side electrodes, 6c ... input side electrodes, 7 ... application area of transparent insulating film,
8, 8a, 8b, 8c: terminal pattern assembly, 9: metal plating, 9a: nickel plating (electroless nickel plating), 9b: gold plating (electroless gold plating), 10: bump, 13: area on which seal is printed , 14 ... liquid crystal, 15
... Seal, 17 ... Deflection filter, 18 ... LS for driving liquid crystal
I, 21: COG liquid crystal display device, 41: mother glass.
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H092 GA41 GA43 GA44 GA57 GA60 HA19 MA11 MA12 NA15 NA28 PA01 5C094 AA32 AA38 AA42 AA43 BA43 CA14 DA09 DA14 EA04 EA05 EA07 EB02 FB12 GB01 5G435 AA16 AA17 BB12 CC05 EE33 EE37 FF05 GG11 HH12 KK03 KK05 ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) 2H092 GA41 GA43 GA44 GA57 GA60 HA19 MA11 MA12 NA15 NA28 PA01 5C094 AA32 AA38 AA42 AA43 BA43 CA14 DA09 DA14 EA04 EA05 EA07 EB02 FB12 GB01 5G435 AA16 AA17 BB12 CC37 EE12 KK05
Claims (3)
する一方の電極となるセグメント表示部と、前記液晶セ
ル外部に液晶駆動用LSIを接続する端子を持つ配線端
子部と、液晶駆動用LSIの方向および位置を合せる位
置合せマーク部と、を有するセグメント表示電極を有す
る基板を備えたCOG(チップオンガラス)型液晶表示
装置において、 前記セグメント基板は、前記配線端子部の端子からそれ
ぞれ細い導体性のパターンを延長して接続する端子パタ
ーン集合部と、前記配線端子部と前記端子パターン集合
部との間を切断するための切断部とを備え、前記配線端
子部を同電位としてメッキを施し、メッキ終了後に、前
記配線端子部と前記端子パターン集合部との間を前記切
断部で切断したことを特徴とするCOG(チップオンガ
ラス)型液晶表示装置。1. A segment display unit serving as one electrode for applying a voltage to liquid crystal sealed in a liquid crystal cell, a wiring terminal unit having a terminal for connecting a liquid crystal driving LSI outside the liquid crystal cell, and a liquid crystal driving unit. In a COG (chip-on-glass) liquid crystal display device provided with a substrate having a segment display electrode having an alignment mark portion for adjusting the direction and position of the LSI, the segment substrate is thinner than the terminal of the wiring terminal portion. A terminal pattern collecting part for extending and connecting the conductive pattern, and a cutting part for cutting between the wiring terminal part and the terminal pattern collecting part, and plating the wiring terminal part at the same potential. COG (chip-on-glass), wherein after the completion of plating, the gap between the wiring terminal portion and the terminal pattern assembly portion is cut by the cutting portion. ) Type liquid crystal display device.
表示部に接続した前記端子パターン集合部は、透明絶縁
膜で覆われメッキが施されない領域であることを特徴と
する請求項1記載のCOG(チップオンガラス)型液晶
表示装置。2. The COG (chip-on-chip) according to claim 1, wherein the segment display section and the terminal pattern collecting section connected to the segment display section are areas that are covered with a transparent insulating film and are not plated. Glass-type liquid crystal display.
パターンにより端子パターン集合部に接続し、接続され
たパターン全部に金属メッキしたことを特徴とする請求
項1または請求項2に記載のCOG(チップオンガラ
ス)型液晶表示装置。3. The alignment mark portion according to claim 1, wherein the alignment mark portion is connected to the terminal pattern gathering portion by a thin conductive pattern, and all the connected patterns are metal-plated. COG (chip-on-glass) liquid crystal display device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12859299A JP3480697B2 (en) | 1999-05-10 | 1999-05-10 | Method of manufacturing COG type liquid crystal display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12859299A JP3480697B2 (en) | 1999-05-10 | 1999-05-10 | Method of manufacturing COG type liquid crystal display device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000321594A true JP2000321594A (en) | 2000-11-24 |
| JP3480697B2 JP3480697B2 (en) | 2003-12-22 |
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ID=14988581
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|---|---|---|---|
| JP12859299A Expired - Lifetime JP3480697B2 (en) | 1999-05-10 | 1999-05-10 | Method of manufacturing COG type liquid crystal display device |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002094199A (en) * | 2000-09-13 | 2002-03-29 | Kyocera Corp | Flexible circuit board and electronic device |
| JP2002189427A (en) * | 2000-12-21 | 2002-07-05 | Semiconductor Energy Lab Co Ltd | Semiconductor device and its manufacturing method |
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| JP2003017818A (en) * | 2001-06-28 | 2003-01-17 | Kyocera Corp | Flexible circuit board and display device |
| JP2008090322A (en) * | 2000-12-21 | 2008-04-17 | Semiconductor Energy Lab Co Ltd | Light emitting device |
| CN100422804C (en) * | 2000-12-04 | 2008-10-01 | 株式会社日立显示器 | LCD Monitor |
| US7459352B2 (en) | 2000-12-11 | 2008-12-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and manufacturing method thereof |
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| KR20140081668A (en) * | 2012-12-21 | 2014-07-01 | 엘지디스플레이 주식회사 | Display divice |
| JP2017142537A (en) * | 2017-05-11 | 2017-08-17 | 株式会社半導体エネルギー研究所 | Semiconductor device and electronic apparatus |
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1999
- 1999-05-10 JP JP12859299A patent/JP3480697B2/en not_active Expired - Lifetime
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| JP2002094199A (en) * | 2000-09-13 | 2002-03-29 | Kyocera Corp | Flexible circuit board and electronic device |
| CN100422804C (en) * | 2000-12-04 | 2008-10-01 | 株式会社日立显示器 | LCD Monitor |
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| JP2002189427A (en) * | 2000-12-21 | 2002-07-05 | Semiconductor Energy Lab Co Ltd | Semiconductor device and its manufacturing method |
| JP2008090322A (en) * | 2000-12-21 | 2008-04-17 | Semiconductor Energy Lab Co Ltd | Light emitting device |
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| US7629618B2 (en) | 2000-12-21 | 2009-12-08 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of manufacturing the same |
| JP2002318555A (en) * | 2000-12-21 | 2002-10-31 | Semiconductor Energy Lab Co Ltd | Light emitting device and manufacturing method therefor |
| JP2002202734A (en) * | 2000-12-28 | 2002-07-19 | Semiconductor Energy Lab Co Ltd | Semiconductor device and manufacturing method therefor |
| JP2003017818A (en) * | 2001-06-28 | 2003-01-17 | Kyocera Corp | Flexible circuit board and display device |
| WO2012093468A1 (en) * | 2011-01-06 | 2012-07-12 | シャープ株式会社 | Substrate for display device and display device |
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| JP2017142537A (en) * | 2017-05-11 | 2017-08-17 | 株式会社半導体エネルギー研究所 | Semiconductor device and electronic apparatus |
| CN108648625A (en) * | 2018-02-13 | 2018-10-12 | 友达光电股份有限公司 | Display panel |
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