JP2000340036A - Anisotropic conductive connection body - Google Patents
Anisotropic conductive connection bodyInfo
- Publication number
- JP2000340036A JP2000340036A JP11148261A JP14826199A JP2000340036A JP 2000340036 A JP2000340036 A JP 2000340036A JP 11148261 A JP11148261 A JP 11148261A JP 14826199 A JP14826199 A JP 14826199A JP 2000340036 A JP2000340036 A JP 2000340036A
- Authority
- JP
- Japan
- Prior art keywords
- connection
- anisotropic conductive
- particles
- wiring board
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims abstract description 56
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 26
- 229910000679 solder Inorganic materials 0.000 claims abstract description 25
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 19
- 239000000956 alloy Substances 0.000 claims abstract description 19
- 229920005989 resin Polymers 0.000 claims abstract description 12
- 239000011347 resin Substances 0.000 claims abstract description 12
- 239000011230 binding agent Substances 0.000 claims abstract description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 20
- 239000004332 silver Substances 0.000 claims description 19
- 229910052709 silver Inorganic materials 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 17
- 239000002923 metal particle Substances 0.000 claims description 3
- 239000002313 adhesive film Substances 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 17
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052737 gold Inorganic materials 0.000 abstract description 12
- 239000010931 gold Substances 0.000 abstract description 12
- 229920001187 thermosetting polymer Polymers 0.000 abstract description 3
- 239000012790 adhesive layer Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 26
- 239000010408 film Substances 0.000 description 14
- 229910052759 nickel Inorganic materials 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 4
- 229910001128 Sn alloy Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000002788 crimping Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 229910001316 Ag alloy Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000012787 coverlay film Substances 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- OAMZXMDZZWGPMH-UHFFFAOYSA-N ethyl acetate;toluene Chemical compound CCOC(C)=O.CC1=CC=CC=C1 OAMZXMDZZWGPMH-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009689 gas atomisation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical group NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001420 photoelectron spectroscopy Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Non-Insulated Conductors (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ポリイミドフィル
ム等からなるフレキシブルプリント配線基板(FPC基
板)とプリント配線基板(PC基板)とを電気的に接続
する異方導電性接続体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anisotropic conductive connector for electrically connecting a flexible printed wiring board (FPC board) made of a polyimide film or the like to a printed wiring board (PC board).
【0002】[0002]
【従来の技術】フレキシブルプリント配線板を配線基板
上の配線パターン接合する方法としては、一般的に以下
の2種の方法が知られている。一つは配線基板上の配線
パターンとフレキシブルプリンス配線板の対応する配線
パターンとをハンダ付けする方法である。もう一つは、
異方導電性フィルムを介して熱圧着する方法である。こ
の場合、配線基板の配線及び、フレキシブルプリント配
線板の配線は銅配線上にニッケルメッキ、金メッキを施
したものが用いられている。また、異方導電性フィルム
中の導電性粒子としては、ニッケル粒子、プラスチック
粒子に金メッキしたものが通常用いられている。2. Description of the Related Art The following two methods are generally known as methods for joining a flexible printed wiring board to a wiring pattern on a wiring board. One is a method of soldering a wiring pattern on a wiring board and a corresponding wiring pattern on a flexible printed wiring board. the other one is,
This is a method of thermocompression bonding via an anisotropic conductive film. In this case, the wiring of the wiring board and the wiring of the flexible printed wiring board are formed by applying nickel plating and gold plating on copper wiring. As the conductive particles in the anisotropic conductive film, nickel particles and plastic particles obtained by plating gold are usually used.
【0003】[0003]
【発明が解決しようとする課題】配線基板上の配線パタ
ーンとフレキシブルプリント配線板を接合する方法とし
て、ハンダ付けを用いた場合は、導通抵抗値、及び、導
通信頼性が共に優れているが、端子ピッチ間が狭くなっ
た場合は、ハンダ付けが困難であり、また、端子間で絶
縁性の低下が起こりやすいという問題点がある。When soldering is used as a method for joining a wiring pattern on a wiring board to a flexible printed wiring board, both the conduction resistance value and the conduction reliability are excellent. When the pitch between the terminals becomes narrow, there is a problem that it is difficult to solder and that the insulation between the terminals is likely to be reduced.
【0004】一方、異方導電性フィルムを介して熱圧着
する場合、接続抵抗値を下げ、かつ接続部分の信頼性を
高めるため銅配線上にニッケルメッキ、金メッキを施さ
なければならず、高コストであった。ニッケルメッキ、
金メッキの代わりにハンダ合金層を形成したフレキシブ
ルプリント配線板については、異方導電性フィルムを介
して接合した場合、以下の問題点があった。On the other hand, in the case of thermocompression bonding via an anisotropic conductive film, nickel plating and gold plating must be applied to copper wiring in order to reduce the connection resistance value and to increase the reliability of the connection portion, resulting in high cost. Met. Nickel plating,
A flexible printed wiring board on which a solder alloy layer is formed instead of gold plating has the following problems when joined via an anisotropic conductive film.
【0005】すなわち、異方導電性フィルム中の導電性
粒子として金メッキ樹脂粒子を用いた場合、ハンダ合金
中への金の拡散が生じ、接続信頼性が低下してしまう。
また、前記導電性粒子として、ニッケル粒子を用いた場
合、ニッケルの固有抵抗値が高いため、接続抵抗値が高
くなるという問題点がある。本発明は、高価なニッケ
ル、金メッキの代わりに安価なハンダ合金層を形成した
配線パターンのフレキシブルプリント配線板を用いて、
接続抵抗値、接続信頼性に優れる異方導電性接続体を提
供することを目的とする。That is, when gold-plated resin particles are used as the conductive particles in the anisotropic conductive film, gold is diffused into the solder alloy, and the connection reliability is reduced.
In addition, when nickel particles are used as the conductive particles, there is a problem that the connection resistance value is increased because nickel has a high specific resistance value. The present invention uses a flexible printed wiring board of a wiring pattern in which an inexpensive solder alloy layer is formed instead of expensive nickel and gold plating,
An object of the present invention is to provide an anisotropic conductive connection body having excellent connection resistance and connection reliability.
【0006】[0006]
【課題を解決するための手段】本発明者らは、上記課題
を解決すべく、鋭意検討した結果、下記組成により、接
続抵抗値、接続信頼性に優れた異方導電性接続体が得ら
れることを見いだし本発明を完成したものである。即
ち、請求項1に係る異方導電性接続体は、プリント配線
基板(PC基板)とフレキシブルプリント配線基板(F
PC基板)とが電気的に接続された異方導電性接続体で
あって、該異方導電性接続体は面内方向にはバインダー
樹脂で電気的に絶縁され厚み方向には金属粒子で導通
し、該金属粒子は前記FPC基板の接続端子のハンダ層
と合金を形成した銅合金粒子であることを特徴とする。Means for Solving the Problems The present inventors have conducted intensive studies in order to solve the above problems, and as a result, an anisotropic conductive connector excellent in connection resistance and connection reliability can be obtained by the following composition. That is, the present invention has been completed. In other words, the anisotropic conductive connector according to claim 1 includes a printed wiring board (PC board) and a flexible printed wiring board (F
(PC board) electrically connected to each other, and the anisotropic conductive connector is electrically insulated by a binder resin in an in-plane direction and conductive by metal particles in a thickness direction. The metal particles are copper alloy particles that form an alloy with the solder layer of the connection terminal of the FPC board.
【0007】また、請求項2に係る異方導電性接続体
は、請求項1記載の異方導電性接続体において、前記銅
合金粒子が、一般式AgxCuy(0.01≦x≦0.4、0.
6≦y≦0.99(原子比))で表され、かつ粒子表面
の銀濃度が粒子の平均の銀濃度より高いことを特徴とす
る。また、請求項3に係る異方導電性接続体の接続方法
は、請求項1または2記載の異方導電性接続体の接続方
法において、前記異方導電性接続体は異方導電性接着フ
ィルムを介して接続することを特徴とする。Further, in the anisotropically conductive connector according to claim 2, in the anisotropically conductive connector according to claim 1, the copper alloy particles have a general formula AgxCuy (0.01 ≦ x ≦ 0.4, 0 .
6 ≦ y ≦ 0.99 (atomic ratio)), and the silver concentration on the surface of the particle is higher than the average silver concentration of the particle. The method for connecting an anisotropic conductive connector according to claim 3 is the method for connecting an anisotropic conductive connector according to claim 1 or 2, wherein the anisotropic conductive connector is an anisotropic conductive adhesive film. The connection is made via
【0008】[0008]
【発明の実施の形態】本発明に用いられるフレキシブル
プリント配線板としては、接続される配線基板の配線パ
ターンに対応する接続端子が形成され、接続端子表面に
ハンダ合金層が形成されていれば、いかなる構造、材質
でも差し支えない。また、ベースフィルムの材質は、耐
熱性の点からポリイミドであることが好ましい。ベース
フィルムの厚みは、十分な強度を得るためには、20μ
m以上が好ましく、より好ましくは25μm以上であ
る。フレキシブルプリント配線板の構造としては、片面
構造でも、両面構造でも構わないが、カバーレイ付き構
造が好ましい。BEST MODE FOR CARRYING OUT THE INVENTION As a flexible printed wiring board used in the present invention, if connection terminals corresponding to a wiring pattern of a wiring board to be connected are formed and a solder alloy layer is formed on the connection terminal surface, Any structure or material is acceptable. The material of the base film is preferably polyimide from the viewpoint of heat resistance. The thickness of the base film should be 20 μm in order to obtain sufficient strength.
m or more, more preferably 25 μm or more. The structure of the flexible printed wiring board may be a single-sided structure or a double-sided structure, but a structure with a coverlay is preferred.
【0009】フレキシブルプリント配線板の接続端子の
材質は、必要とされる電気抵抗値により、どのような金
属材料であっても構わないが、電気抵抗値の点から銅で
あることが好ましい。フレキシブルプリント配線基板の
接続端子表面のハンダ合金層は、例えば、電解ハンダメ
ッキ、無電解ハンダメッキ、ハンダレベラー、蒸着、ス
パッタリング等で形成することができる。平滑性の点か
ら、ハンダメッキ法あるいは蒸着法で形成することが好
ましい。ハンダ合金としては、接続部分の銅合金粒子と
合金を形成するものであれば、構わないが、少なくとも
錫を含み、融点が350℃未満であることが好ましく、
融点200℃以下であることが特に好ましい。前述のハ
ンダ合金層は、0.1〜10μmの厚みが好ましく、
0.5〜3μmが特に好ましい。接続端子の厚みは、1
0μm〜35μm以上が好ましく、15μm〜20μm
が特に好ましい。The material of the connection terminals of the flexible printed wiring board may be any metal material depending on the required electric resistance value, but is preferably copper in terms of electric resistance value. The solder alloy layer on the connection terminal surface of the flexible printed wiring board can be formed by, for example, electrolytic solder plating, electroless solder plating, solder leveler, vapor deposition, sputtering, or the like. From the viewpoint of smoothness, it is preferable to form by a solder plating method or a vapor deposition method. The solder alloy is not particularly limited as long as it forms an alloy with the copper alloy particles of the connection portion, but preferably contains at least tin and has a melting point of less than 350 ° C.,
It is particularly preferable that the melting point is 200 ° C. or lower. The aforementioned solder alloy layer preferably has a thickness of 0.1 to 10 μm,
Particularly preferred is 0.5 to 3 μm. The thickness of the connection terminal is 1
0 μm to 35 μm or more, preferably 15 μm to 20 μm
Is particularly preferred.
【0010】本発明に用いるプリント配線基板の材質
は、例えば、エポキシ樹脂、ポリイミド樹脂、ポリフェ
ニレンエーテル樹脂、フッ素樹脂、ポリアミド樹脂等の
絶縁樹脂を単独、あるいは、ガラスクロス、ガラス不織
布、アラミド不織布等とのコンポジット材料として用い
ることができる。配線基板の配線材質としては、電気抵
抗値の点から金属が好ましく、銅が特に好ましい。配線
表面の酸化防止のため、ニッケルメッキ、金メッキを行
っても構わない。また、ハンダ合金層を形成することも
可能である。The material of the printed wiring board used in the present invention may be, for example, an insulating resin such as an epoxy resin, a polyimide resin, a polyphenylene ether resin, a fluororesin, a polyamide resin alone, or a glass cloth, a glass nonwoven fabric, or an aramid nonwoven fabric. Can be used as a composite material. As a wiring material of the wiring board, a metal is preferable in terms of an electric resistance value, and copper is particularly preferable. Nickel plating or gold plating may be performed to prevent oxidation of the wiring surface. It is also possible to form a solder alloy layer.
【0011】本発明に用いる異方導電性接続体に用いる
熱硬化性樹脂としては、エポキシ樹脂が好ましい。エポ
キシ樹脂は、1分子中に2個以上のエポキシ基を有する
化合物であり、具体的には、グリシジルエーテル基、グ
リシジルエステル基、グリシジルアミン基、脂環式エポ
キシ基を有する化合物、それらの置換基を2種以上有す
る化合物である。エポキシ樹脂の硬化剤は、酸無水物
系、アミン系、カチオン系硬化剤等を用いることができ
るが、硬化速度の速いアミン系硬化剤が好ましい。その
中でもマイクロカプセル化したアミン系硬化剤が特に好
ましい。As the thermosetting resin used for the anisotropic conductive connector used in the present invention, an epoxy resin is preferable. The epoxy resin is a compound having two or more epoxy groups in one molecule, specifically, a compound having a glycidyl ether group, a glycidyl ester group, a glycidylamine group, an alicyclic epoxy group, and a substituent thereof. Is a compound having two or more kinds of As the curing agent for the epoxy resin, an acid anhydride-based, amine-based, or cationic curing agent can be used, but an amine-based curing agent having a high curing speed is preferred. Among them, a microencapsulated amine-based curing agent is particularly preferred.
【0012】前述の異方導電性接続体には、熱硬化性樹
脂以外に熱可塑性樹脂を混合しても構わない。この場合
の熱可塑性樹脂としては、フェノキシ樹脂、ポリビニル
アセタール樹脂、ポリビニルブチラール樹脂、アルキル
化セルロース樹脂、ポリエステル樹脂、アクリル樹脂、
ウレタン樹脂等である。本発明の異方導電性接続体に用
いる銅合金粒子は球形であることが好ましく、その粒子
径は、0.1〜20μmであることが好ましい。粒子径
が小さすぎる場合は、端子の表面粗さのバラツキに影響
され、接続が不安定になりやすく、大きすぎる場合は、
隣接する端子間の短絡が起こりやすくなる。The above-described anisotropic conductive connector may be mixed with a thermoplastic resin in addition to the thermosetting resin. As the thermoplastic resin in this case, phenoxy resin, polyvinyl acetal resin, polyvinyl butyral resin, alkylated cellulose resin, polyester resin, acrylic resin,
Urethane resin and the like. The copper alloy particles used for the anisotropic conductive connector of the present invention are preferably spherical, and the particle diameter is preferably 0.1 to 20 μm. If the particle size is too small, the connection is likely to be unstable, affected by variations in the surface roughness of the terminals.If the particle size is too large,
Short circuits between adjacent terminals are likely to occur.
【0013】異方導電性接続体中の銅合金粒子の配合量
は、隣接する端子間の絶縁性を確保しつつ、接続方向の
導通が可能となる範囲が好ましい。好ましくは、異方導
電性接続体中の樹脂成分に対して、0.03〜20体積
%の範囲、より好ましくは、0.1〜10体積%の範囲
である。銅合金粒子に含まれる銅以外の元素としては、
銀、金、パラジウム、白金等を用いることができるが、
銀が好ましい。銅合金粒子が、一般式AgxCuy(0.
01≦x≦0.4、0.6≦y≦0.99(原子比))
で表され、かつ粒子表面の銀濃度が粒子の平均の銀濃度
より高い場合、フレキシブルプリント配線基板の接続端
子表面のハンダ合金層と合金を形成しやすく、良好な接
続抵抗値、及び接続信頼性が得られるため、特に好まし
い。The compounding amount of the copper alloy particles in the anisotropic conductive connector is preferably in a range where conduction in the connection direction is possible while ensuring insulation between adjacent terminals. Preferably, it is in the range of 0.03 to 20% by volume, more preferably 0.1 to 10% by volume, based on the resin component in the anisotropic conductive connector. As elements other than copper contained in the copper alloy particles,
Silver, gold, palladium, platinum and the like can be used,
Silver is preferred. When the copper alloy particles have the general formula AgxCuy (0.
01 ≦ x ≦ 0.4, 0.6 ≦ y ≦ 0.99 (atomic ratio)
When the silver concentration on the particle surface is higher than the average silver concentration of the particles, it is easy to form an alloy with the solder alloy layer on the connection terminal surface of the flexible printed circuit board, and the connection resistance and the connection reliability are good. Is particularly preferred because
【0014】銅合金粒子の製造方法としては、球状粒子
が得やすく、また、表面の酸化物が少なくなるため、不
活性ガスアトマイズ法で作製することが好ましい。この
銅合金粒子の表面および表面近傍の銀濃度はXPS(X
線光電子分光分析装置)で測定することができる。平均
銀濃度は、銅合金粒子を濃硝酸中で溶解し、IPC(高
周波誘導結合プラズマ発光分析計)を用いて測定するこ
とができる。この銅合金粒子は、粒子表面の銀濃度が平
均濃度より高いことが特徴であるが、粒子表面の銀濃度
が平均銀濃度の1.4倍以上であることが好ましい。As a method for producing the copper alloy particles, it is preferable to produce the particles by an inert gas atomizing method because spherical particles are easily obtained and oxides on the surface are reduced. The silver concentration at the surface and near the surface of the copper alloy particles was XPS (X
Line photoelectron spectroscopy analyzer). The average silver concentration can be measured by dissolving copper alloy particles in concentrated nitric acid and using IPC (high frequency inductively coupled plasma emission spectrometer). The copper alloy particles are characterized in that the silver concentration on the particle surface is higher than the average concentration, but it is preferable that the silver concentration on the particle surface is 1.4 times or more the average silver concentration.
【0015】本発明の異方導電性接続体の接続方法は、
異方導電性接続層を予めフィルム状に形成して熱圧着す
る方法、ペースト状にして熱圧着する方法等を用いるこ
とができるが、熱圧着時間が短いことから、フィルム状
に形成し熱圧着する方法が好ましい。この場合、シート
状に形成した異方導電性接続体は、プリント配線基板、
あるいはフレキシブルプリント配線板の接続端子上に仮
圧着し、位置合わせ後に本圧着する方法を用いることが
できる。フレキシブルプリント配線板の接続端子表面の
ハンダ合金層と接続部分の銅合金粒子が合金を形成しや
すくなるため、フレキシブルプリント配線板の接続端子
上に異方導電性接続層フィルムを仮圧着し、位置合わせ
後、本圧着する方法が好ましい。[0015] The method for connecting an anisotropic conductive connecting body of the present invention comprises:
A method in which the anisotropic conductive connection layer is formed in a film shape in advance and thermocompression bonding, a method in which a paste is formed and thermocompression bonding can be used, etc. Is preferred. In this case, the anisotropic conductive connector formed in a sheet shape is a printed wiring board,
Alternatively, a method of temporarily crimping the connection terminals on the flexible printed wiring board, and then performing the final crimping after the alignment can be used. Since the solder alloy layer on the surface of the connection terminal of the flexible printed wiring board and the copper alloy particles at the connection portion easily form an alloy, the anisotropic conductive connection layer film is temporarily pressure-bonded onto the connection terminal of the flexible printed wiring board, After the alignment, a method of performing full pressure bonding is preferable.
【0016】以下実施例に基づいて本発明を具体的に説
明する。 (銅合金粒子の製造方法)銅合金粒子は以下の方法で得
た。銅粉(純度99.99%)720g、銀粉(純度9
9.99%)180gを混合し、黒鉛坩堝(窒化ホウ素
製ノズル付き)に入れ、窒素雰囲気中で高周波誘導加熱
により熔解し、1700℃まで加熱した。この融液をヘ
リウム大気圧力化でノズルより30秒間で噴出した。同
時に、ボンベ入りヘリウムガス(ボンベ圧力150気
圧)4.2m3(25℃、1気圧時体積)を噴出する融
液に向かって周囲のノズルより噴出した。得られた粉末
を走査型電子顕微鏡で観察したところ球状であった。
(平均粒径19.3μm)この粒子の銀濃度をXPSを
用いて分析した結果、Ag/(Ag+Cu)(原子比)
は0.47であった。また、濃硝酸に粒子を溶解し、I
PCにより平均の銀濃度を測定したところ、0.13で
あった。従って、銅合金粒子表面の銀濃度は、平均の銀
濃度の3.6倍であった。得られた銅合金粒子を気流分
級機により、10μm以下の粒子を一部取り出し、実施
例に使用した。(平均粒径6.1μm)Hereinafter, the present invention will be specifically described based on examples. (Production method of copper alloy particles) Copper alloy particles were obtained by the following method. 720 g of copper powder (purity 99.99%) and silver powder (purity 9
(9.99%), 180 g were mixed, put in a graphite crucible (with a boron nitride nozzle), melted by high frequency induction heating in a nitrogen atmosphere, and heated to 1700 ° C. This melt was jetted out of the nozzle for 30 seconds under helium atmospheric pressure. At the same time, 4.2 m 3 (volume at 25 ° C., 1 atm) of helium gas in a cylinder (cylinder pressure 150 atm) was jetted from a peripheral nozzle toward the jetting melt. Observation of the obtained powder with a scanning electron microscope revealed that the powder was spherical.
(Average particle size: 19.3 μm) As a result of analyzing the silver concentration of the particles by XPS, Ag / (Ag + Cu) (atomic ratio)
Was 0.47. Further, the particles are dissolved in concentrated nitric acid,
The average silver concentration measured by PC was 0.13. Therefore, the silver concentration on the surface of the copper alloy particles was 3.6 times the average silver concentration. A part of the obtained copper alloy particles having a particle size of 10 μm or less was taken out by an airflow classifier and used in Examples. (Average particle size 6.1 μm)
【0017】[0017]
【実施例1】ビスフェノールA型エポキシ樹脂(エポキ
シ当量960)50g、平均分子量25000のフェノ
キシ樹脂50gをトルエン−酢酸エチルの混合溶剤(1
対1、重量比)に溶解し、固形分50%の溶液とした。
固形重量比で樹脂成分100、マイクロカプセル化した
アミン系硬化剤30となるように配合し、更に前述の銅
合金粒子を3体積%配合し、分散させた。その後、厚さ
100μmのポリエチレンテレフタレートフィルム上に
塗布し、70℃で送風乾燥し、厚さ30μmの異方導電
性フィルムを得た。Example 1 50 g of a bisphenol A type epoxy resin (epoxy equivalent: 960) and 50 g of a phenoxy resin having an average molecular weight of 25,000 were mixed with a mixed solvent of toluene-ethyl acetate (1).
(Weight ratio: 1, weight ratio) to give a solution having a solid content of 50%.
The resin component 100 and the microencapsulated amine-based curing agent 30 were blended in a solid weight ratio, and the above-mentioned copper alloy particles were blended and dispersed at 3% by volume. Then, it applied on the 100-micrometer-thick polyethylene terephthalate film, and was air-dried at 70 degreeC, and the 30-micrometer-thick anisotropic conductive film was obtained.
【0018】配線幅100μm、配線ピッチ200μ
m、厚み18μmの銅配線上に2.0μmの共晶ハンダ
メッキを施した回路を200本有するフレキシブルプリ
ント配線板(材質:ポリイミド樹脂、厚み25μm、接
続部分以外は25μmのポリイミド樹脂のカバーレイフ
ィルム付き)の接続端子部分上に前述の異方導電性フィ
ルムを仮貼りし、2.5mm幅の圧着ヘッドを用いて、
70℃、0.5MPa、3秒間加圧した後、ポリエチレ
ンテレフタレートのフィルムを剥離する。配線幅100
μm、配線ピッチ200μm、厚み18μmの銅配線上
に0.3μmの金メッキを施した回路を200本有する
プリント配線基板(材質:ガラスエポキシ基板、厚み
1.6mm)の接続回路上に、異方導電性フィルムを仮
付けしたフレキシブルプリント配線板の接続端子を位置
合わせし、仮接続した後、170℃、20秒、3.0M
Pa加圧圧着して、異方導電性接続体を得た。Wiring width 100 μm, wiring pitch 200 μ
m, a flexible printed wiring board having 200 circuits of eutectic solder plating of 2.0 μm on copper wiring of 18 μm thickness (material: polyimide resin, thickness 25 μm, cover lay film of polyimide resin 25 μm except for connecting parts) The above-mentioned anisotropic conductive film is temporarily attached on the connection terminal portion of (attached), and using a crimping head having a width of 2.5 mm,
After pressing at 70 ° C. and 0.5 MPa for 3 seconds, the polyethylene terephthalate film is peeled off. Wiring width 100
Anisotropic conduction on a connection circuit of a printed circuit board (material: glass epoxy board, 1.6 mm thick) having 200 circuits with 0.3 μm gold plating on copper wiring with a wiring pitch of 200 μm and a wiring pitch of 200 μm and a thickness of 18 μm. After aligning the connection terminals of the flexible printed wiring board to which the functional film is temporarily attached, and temporarily connecting them, 170 ° C., 20 seconds, 3.0M
Anisotropically conductive connectors were obtained by pressure bonding with Pa.
【0019】各接続端子間の抵抗値を四端子法の抵抗計
で測定し、平均値を求めたところ、212.0mΩであ
った。この異方導電性接続体を120℃の熱風乾燥機内
で1000時間保持した後、同様にして抵抗値を測定し
たところ、220.0mΩであった。前述と同様の方法
で異方導電性接続体を作製し、その接続部分を引き剥が
し、銅合金粒子の接続部分表面をEDX(エネルギー分
散型X線分析装置)で測定したところ、錫と銅、および
錫と銀の合金が検出された。The resistance value between the connection terminals was measured with a four-terminal resistance meter, and the average value was found to be 212.0 mΩ. After holding the anisotropic conductive connector in a hot air dryer at 120 ° C. for 1000 hours, the resistance value was measured in the same manner, and it was 220.0 mΩ. An anisotropic conductive connector was prepared in the same manner as described above, the connection was peeled off, and the surface of the connection of the copper alloy particles was measured with an EDX (energy dispersive X-ray analyzer). And alloys of tin and silver were detected.
【0020】[0020]
【実施例2】フレキシブルプリント配線板の接続端子上
のハンダ層が共晶ハンダの代わりに、2重量%の銀入り
ハンダであること以外は、実施例1と全く同様にして異
方導電性接続体を得た。接続端子間の抵抗値を四端子法
の抵抗計で測定し、平均値を求めたところ、215.3
mΩであった。この異方導電性接続体を120℃の熱風
乾燥機内で1000時間保持した後、同様にして抵抗値
を測定したところ、219.2mΩであった。Example 2 Anisotropically conductive connection was carried out in exactly the same manner as in Example 1 except that the solder layer on the connection terminal of the flexible printed wiring board was a solder containing 2% by weight of silver instead of eutectic solder. I got a body. The resistance value between the connection terminals was measured by a four-terminal resistance meter, and the average value was determined.
mΩ. After keeping the anisotropic conductive connector in a hot air dryer at 120 ° C. for 1000 hours, the resistance was measured in the same manner, and it was 219.2 mΩ.
【0021】前述と同様の方法で異方導電性接続体を作
製し、その接続部分を引き剥がし、銅合金粒子の接続部
分表面をEDX(エネルギー分散型X線分析装置)で測
定したところ、錫と銅、および錫と銀の合金が検出され
た。An anisotropic conductive connector was prepared in the same manner as described above, the connection was peeled off, and the surface of the connection of the copper alloy particles was measured with an EDX (energy dispersive X-ray analyzer). And copper, and tin and silver alloys were detected.
【0022】[0022]
【比較例1】銅合金粒子の代わりにポリスチレン樹脂を
核とする粒子の表面に0.2μmのニッケル層を設け、
そのニッケル層の外側に厚み0.02μmの金層を設け
た平均粒径10μmの導電性粒子を用いた以外は、実施
例1と全く同様にして、異方導電性接続体を得た。接続
端子間の抵抗値を四端子法の抵抗計で測定し、平均値を
求めたところ、253.3mΩであった。この異方導電
性接続体を120℃の熱風乾燥機内で1000時間保持
した後、同様にして抵抗値を測定したところ、5kΩで
あった。Comparative Example 1 A 0.2 μm nickel layer was provided on the surface of particles having polystyrene resin as a core instead of copper alloy particles,
An anisotropic conductive connector was obtained in exactly the same manner as in Example 1, except that conductive particles having an average particle size of 10 μm, in which a gold layer having a thickness of 0.02 μm was provided outside the nickel layer, were used. The resistance value between the connection terminals was measured by a four-terminal resistance meter, and the average value was found to be 253.3 mΩ. After keeping the anisotropic conductive connector in a hot air dryer at 120 ° C. for 1000 hours, the resistance value was measured in the same manner, and it was 5 kΩ.
【0023】[0023]
【比較例2】銅合金粒子の代わりに平均単粒子径2μ
m、凝集粒径12μmのニッケル粒子を用いた以外は、
実施例1と同様にして、異方導電性接続体を得た。接続
端子間の抵抗値を四端子法の抵抗計で測定し、平均値を
求めたところ、520.3mΩであった。この異方導電
性接続体を120℃の熱風乾燥機内で1000時間保持
した後、同様にして抵抗値を測定したところ、740.
2mΩであった。[Comparative Example 2] Instead of copper alloy particles, average single particle diameter 2μ
m, except that nickel particles having an aggregate particle size of 12 μm were used.
An anisotropic conductive connector was obtained in the same manner as in Example 1. The resistance value between the connection terminals was measured by a four-terminal resistance meter, and the average value was found to be 520.3 mΩ. After holding this anisotropic conductive connector in a hot air dryer at 120 ° C. for 1000 hours, the resistance was measured in the same manner.
It was 2 mΩ.
【0024】前述と同様の方法で異方導電性接続体を作
製し、その接続部分を引き剥がし、銅合金粒子の接続部
分表面をEDX(エネルギー分散型X線分析装置)で測
定したところ、錫とニッケル、および錫とニッケルの合
金は検出されなかった。このように、本発明による実施
例は、比較例に比べ、接続抵抗値が低く、かつ信頼性試
験後の接続抵抗値も低いことが示された。An anisotropically conductive connector was prepared in the same manner as described above, the connection was peeled off, and the surface of the connection of the copper alloy particles was measured with an EDX (energy dispersive X-ray analyzer). And nickel, and alloys of tin and nickel were not detected. As described above, it was shown that the connection resistance value of the example according to the present invention was lower than that of the comparative example, and that the connection resistance value after the reliability test was also lower.
【0025】[0025]
【発明の効果】本発明による異方導電性接続体は、高価
な金メッキの代わりに安価なハンダ合金層を形成した配
線パターンのフレキシブルプリント配線板を使用でき、
かつ、接続抵抗値、および、接続信頼性に優れる。The anisotropic conductive connector according to the present invention can use a flexible printed wiring board having a wiring pattern on which an inexpensive solder alloy layer is formed instead of expensive gold plating.
In addition, the connection resistance and the connection reliability are excellent.
Claims (3)
シブルプリント配線基板(FPC基板)とが電気的に接
続された異方導電性接続体であって、該異方導電性接続
体は面内方向にはバインダー樹脂で電気的に絶縁され厚
み方向には金属粒子で導通し、該金属粒子は前記FPC
基板の接続端子のハンダ層と合金を形成した銅合金粒子
であることを特徴とする異方導電性接続体。1. An anisotropic conductive connection body in which a printed wiring board (PC board) and a flexible printed wiring board (FPC board) are electrically connected, and the anisotropic conductive connection body is in an in-plane direction. Is electrically insulated by a binder resin, and is electrically conductive by metal particles in the thickness direction.
An anisotropically conductive connector comprising copper alloy particles formed of an alloy with a solder layer of a connection terminal of a substrate.
て、前記銅合金粒子が、一般式AgxCuy(0.01≦
x≦0.4、0.6≦y≦0.99(原子比))で表さ
れ、かつ粒子表面の銀濃度が粒子の平均の銀濃度より高
いことを特徴とする異方導電性接続体。2. The anisotropically conductive connector according to claim 1, wherein the copper alloy particles have a general formula of AgxCuy (0.01 ≦
x ≦ 0.4, 0.6 ≦ y ≦ 0.99 (atomic ratio), wherein the silver concentration on the surface of the particles is higher than the average silver concentration of the particles. .
体の接続方法において、前記異方導電性接続体は異方導
電性接着フィルムを介して接続することを特徴とする異
方導電性接続体の接続方法。3. An anisotropically conductive connection body according to claim 1, wherein said anisotropically conductive connection body is connected via an anisotropically conductive adhesive film. Connection method of the sexual connection body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11148261A JP2000340036A (en) | 1999-05-27 | 1999-05-27 | Anisotropic conductive connection body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11148261A JP2000340036A (en) | 1999-05-27 | 1999-05-27 | Anisotropic conductive connection body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000340036A true JP2000340036A (en) | 2000-12-08 |
Family
ID=15448831
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11148261A Pending JP2000340036A (en) | 1999-05-27 | 1999-05-27 | Anisotropic conductive connection body |
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| Country | Link |
|---|---|
| JP (1) | JP2000340036A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017066367A (en) * | 2015-09-30 | 2017-04-06 | 太陽インキ製造株式会社 | Conductive adhesive, electronic component, and method of manufacturing electronic component |
-
1999
- 1999-05-27 JP JP11148261A patent/JP2000340036A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017066367A (en) * | 2015-09-30 | 2017-04-06 | 太陽インキ製造株式会社 | Conductive adhesive, electronic component, and method of manufacturing electronic component |
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