JP2000214320A - Color filter substrate, method of manufacturing the same, and display device - Google Patents

Abstract

(57) [Problem] To provide a color filter substrate provided with a color filter and an electromagnetic shielding layer on one surface of a base substrate used on the display surface side of a display device. Provided is a color filter substrate which can be manufactured relatively inexpensively. SOLUTION: A color filter and an electromagnetic shielding layer are provided on one surface of a base substrate, which is used on a display surface side of a display device which generates harmful electromagnetic waves by combining each cell of a color filter for each light emitting cell. A color filter substrate on the display surface side of the display provided with
At least the first electromagnetic shielding layer is made of a good conductive material, and has an opening and a color filter provided below or above the opening, and the first electromagnetic shielding layer has a color for separating each color. In the form of a matrix including the separation region, or in the form of a mesh in the color separation region and the light transmission region, or in the form of a matrix including the color separation region, and
The mesh is provided in the light transmission region.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color display device for generating harmful electromagnetic waves, and a display device provided with a color filter cell for each light emitting cell corresponding to a light emitting color of the light emitting cell, and the display. The present invention relates to a color filter used in an apparatus. In particular, the present invention relates to a color filter capable of shielding harmful electromagnetic waves, and a display device using the color filter.

[0002]

2. Description of the Related Art In various types of discharge-type displays, for example, cathode ray tubes (also called CRTs), electronic display tubes, plasma displays (also called PDPs), and other displays, color development performance is improved, and display colors are beautiful and color. Various attempts have been made to increase the reproduction area. For example,
CRTs and PDPs that display color only with R, G, B emission colors,
Other full-color displays have their own advanced color expression function by improving the three primary color (RGB) phosphors, etc. However, in order to further color-display R, G, and B of the emission colors, respectively, A method using a color filter in combination has also been proposed. The method using this color filter together has the following advantages.
Luminescent materials such as phosphors used for various displays are
In general, when light is not emitted, the color is white or lightly colored, and reflects the external light that enters, thereby lowering the saturation of the emitted color.However, this can be prevented by using a color filter in combination, and as a result, a high contrast is obtained. Color display. In addition, unnecessary light emitted from each color phosphor is selectively removed by a filter, so that more pure RGB primary color light can be used, and the color development of each color phosphor is remarkably improved, so that a higher quality color display is possible. . In recent years, a display having a configuration in which a color filter is incorporated in an RGB light-emitting device has also come to the market.

On the other hand, CRTs, PDPs, and other discharge-type displays suffer from leakage of harmful electromagnetic waves that are likely to affect the human body and systems, and emit electromagnetic waves that are considered harmful to these display devices. Shielding has been required. Therefore, a method of installing an electromagnetic wave shielding plate on the front surface of the display to absorb and remove leaked electromagnetic waves has also been used. The electromagnetic wave shielding plate is formed by forming a transparent conductive film or a mesh-shaped metal screen on the surface of a transparent substrate such as glass, and is installed on the front surface of the display to absorb and remove leakage electromagnetic waves. In general, the electromagnetic wave shielding plate is installed so as to be close to or in contact with the front surface of the display panel. Therefore, the electromagnetic wave shielding plate is usually manufactured as an independent component under an arbitrary design separately from the color filter.

Further, in order to improve the color display quality of the light emitting type display and shield harmful electromagnetic waves, FIG.
As shown in (a), there is a method of adding a color filter and an electromagnetic wave shielding plate to a display device. FIG.
(A) shows a cross-sectional structure of a display device in which a color filter 620 is incorporated in a plasma display panel (also referred to as a PDP) 610 and further an electromagnetic wave shielding plate 640 is provided. This will be briefly described. PD
P610 basically includes a back plate 611 composed of a rib (also referred to as a barrier) 617 for forming an electrode and a discharge space and a phosphor for light emission, a transparent conductive film (ITO) on the transparent substrate surface, and the like. ) And a front plate 615 on which a counter electrode is formed, and a luminous gas is sealed in a space formed by overlapping the two.
L and blue light emitting cells BL are formed. Normally, a PDP of general quality is completed only with this basic structure. However, in the system shown in FIG. 9A, a color filter 62 is attached to a panel PDP 610 having this basic structure.
By adding 0, the color development quality is improved, and the influence of the reflection of external light is removed. In the display device illustrated in FIG. 9A, the protection plate 630 is further disposed so as to cover the observer side of the color filter 620, and the electromagnetic wave shielding plate 640 approaches or comes into contact with the protection plate 630, and thus the observer can observe the image. It is arranged on the side. The electromagnetic wave shielding plate 6
Reference numeral 40 denotes a mesh-shaped or matrix-shaped conductive layer 645 provided on one or both surfaces of the base substrate 641, which has a predetermined transparency and shields harmful electromagnetic waves. The conductive layer 645 is provided in a mesh shape, for example, as shown in FIG. 9B. FIG. 9 (b) is the same as FIG. 9 (a).
FIG. 4 is a view as viewed from the F1 side.

However, the display device of the type shown in FIG. 9A is improved in color display quality and shields harmful electromagnetic waves as compared with a display device comprising a single PDP 610 (FIG. 9A). Although the effect is extremely large, adding a color filter to the PDP 610 alone increases the panel cost. However, there is a problem that the manufacturing cost must be further increased due to the combined use of an electromagnetic wave shielding plate. This problem does not occur when the electromagnetic wave shielding plate is made of a transparent conductive film such as ITO. However, when the electromagnetic wave shielding plate is made of a metal mesh or the like, the cell array structure (and scanning lines) of the panel is used. There is also a problem that moire is likely to occur due to light interference due to the relationship between the mesh and mesh lines (or meshes). The above moiré can be minimized by properly combining the angle between the cell array of the panel and the mesh line, but it cannot be eliminated in principle and does not lower the visibility in principle. It is important to keep the degree of occurrence (not noticeable).

[0006]

As described above, there is a need for a method capable of providing a display device which is excellent in terms of color display quality and shielding harmful electromagnetic waves, in terms of productivity and relatively inexpensively. Had been. The present invention corresponds to this, and specifically, a color filter substrate used on a display surface side of a display device that generates harmful electromagnetic waves, wherein a color filter substrate is provided on one surface of a base substrate. An object of the present invention is to provide a color filter substrate having a structure provided with a filter and an electromagnetic shielding layer, which is excellent in productivity, relatively inexpensive, and practical in quality.

[0007]

A color filter substrate according to the present invention is used by placing each cell of a color filter in a light emitting cell unit on a display surface side of a display device for generating harmful electromagnetic waves. A color filter substrate on the display surface side of a display having a color filter and an electromagnetic shielding layer provided on one surface of a base substrate, wherein at least the first electromagnetic shielding layer is made of a good conductive material, A color filter is provided below or above the first electromagnetic shielding layer, and the first electromagnetic shielding layer includes a color separation region for separating each color in a matrix shape, or a mesh shape in the color separation region and the light transmission region. Alternatively, they are provided in a matrix including the color separation regions and in a mesh shape in the light transmission regions. And in the above, it is a color filter substrate for a plasma display panel, and in use, it is disposed on the observer side of the front plate of the plasma display panel, with the color filter forming surface side being the front plate side. It is characterized by being a thing. Further, in the above, a transparent conductive layer serving as a second electromagnetic shielding layer is provided on the entire surface including the color separation region and the light transmitting region by directly contacting above or below the first electromagnetic shielding layer. It is a feature. In the above, the color filter is characterized by comprising a photosensitive colored layer in which a resin is dyed or a pigment is dispersed in the resin. In the above, the good conductive material is made of a metal film or metal particles. Further, in the above, at least one surface of the first electromagnetic shielding layer is black. In the above, the color filter substrate also serves as a front plate of the plasma display panel.

The display device of the present invention is characterized in that the color filter substrate of the present invention is provided on the display surface side of a display.

The method of manufacturing a color filter substrate according to the present invention is characterized in that the cells of the color filter are combined in units of light emitting cells, and the harmful electromagnetic waves are generated. A color filter substrate on the display surface side of a display provided with a color filter and an electromagnetic shielding layer, wherein at least the first electromagnetic shielding layer is made of a good conductive material and has an opening and a color filter on the lower or upper side thereof. And the first electromagnetic shielding layer has a matrix shape including a color separation region for separating each color, or a mesh shape including the color separation region and the light transmission region, or a matrix including the color separation region. In the form, and a method of manufacturing a color filter substrate provided in a mesh shape in the light transmission region,
After the first electromagnetic shielding layer is formed of a good conductive material on a transparent substrate, a filter material of each color is disposed in accordance with a light emitting cell unit. A transparent conductive layer, which is a second electromagnetic shielding layer, is provided before and after the formation of the shielding layer and before the filter materials of each color are arranged according to the light emitting cell unit. In addition, the method of manufacturing a color filter substrate of the present invention includes the steps of: combining each cell of the color filter in a light emitting cell unit; placing a color filter on one surface of a base substrate; A color filter substrate on the display surface side of a display provided with a filter and an electromagnetic shielding layer, wherein at least the first electromagnetic shielding layer is made of a good conductive material, and has an opening and a color filter on the lower or upper side thereof. The first electromagnetic shielding layer is provided in a matrix shape including a color separation region for separating each color, or in a mesh shape in the color separation region and the light transmission region, or in a matrix shape including the color separation region. And a method of manufacturing a color filter substrate provided in a light transmission region in a mesh shape, wherein a filter of each color is provided on a transparent substrate. The first electromagnetic shielding layer is formed of the good conductive material after disposing the filter material in accordance with the light emitting cell unit, and the filter material of each color is adjusted in accordance with the light emitting cell unit. After the disposition, a transparent conductive layer as a second electromagnetic shielding layer is provided before and after the formation of the first electromagnetic shielding layer. In the above, the color filter substrate is a color filter substrate for a plasma display panel, and in use, the color filter forming surface side is set to the front plate side on the observer side of the front plate of the plasma display panel. And are arranged.

[0010]

When the color filter substrate of the present invention is placed on the display surface side of a display device and used, the color filter substrate of the present invention improves the display color image quality of the display device and reduces the electromagnetic wave shielding effect. Further, the present invention has made it possible to provide a color filter substrate which is excellent in productivity and can be manufactured relatively inexpensively. Specifically, the color filter and the electromagnetic shielding are arranged on one surface of a base substrate, which is used by being arranged on the display surface side of a display device that generates harmful electromagnetic waves by matching each cell of the color filter in units of light emitting cells. A color filter substrate on the display surface side of a display provided with a layer, wherein at least the first electromagnetic shielding layer is made of a good conductive material, and an opening thereof, and a color filter is provided on the lower side or the upper side thereof. The first electromagnetic shielding layer includes a color separation region for separating each color in a matrix shape, or a mesh shape in the color separation region and the light transmission region, or in a matrix shape including the color separation region, In addition, by providing the light transmitting area in a mesh shape, the display color image quality of the display device is improved, and harmful electromagnetic waves are transmitted to the observer. Thereby preventing the motor.

More specifically, the present invention relates to a color filter substrate for a plasma display panel, and in use, a color filter forming surface side is set to a front plate side on an observer side of a front plate of the plasma display panel. The color filter substrate of the present invention can be manufactured independently of the plasma display panel itself shown in FIG. The material of the color filter can be selected without being affected. For this reason, it can be manufactured easily and with good productivity, and as a result, the display color image quality of the plasma display device can be improved and the electromagnetic shielding effect can be imparted to the plasma display device at low cost. In addition, such a color filter substrate for a plasma display passes through the front plate 710 of the plasma display panel shown in FIG. 10, and the emission colors of the respective light emitting cells are respectively incident on the color filters of the same color, and emitted by the color filters. Although the color distribution area is limited so as to improve the quality by removing the impure colored light, a part of the light from the light emitting cells is diffused while passing through the front plate and passes through the color filter of the same color. Some are not. However, since the diffused light is absorbed by other color filters, the color characteristics do not deteriorate. Under normal viewing conditions, most of the color light passes through the color filters corresponding to the emission of each color. Therefore, the provision of the color filters improves the display color image quality as compared with the case where no color light is provided. In particular, by reducing the thickness of the front plate, this effect is enhanced, approaching a case where the display device is provided on the light emitting cell side inside the front plate of the display device. That is, the color filter for a plasma display of the present invention can effectively improve the display color quality. In addition, when a color filter is provided on the light emitting cell side of the front plate, since the material requires heat treatment (firing), a material mainly including a pigment and a low melting point glass frit is used. Figure 1 shows the color filter substrate.
0, which is separate from the plasma display itself and is arranged on the observer side of the front plate, and is not limited to those mainly including pigments and low-melting glass frit, but dyed resin.
Alternatively, a photosensitive colored layer in which a pigment is dispersed in a resin may be used. For this reason, even in the manufacturing method, a method of forming a predetermined shape using photolithography after applying a photosensitive colored layer material, a method of forming a colored layer material by a direct printing method, and applying a photosensitive resin After that, a method of forming into a predetermined shape by using photolithography and dyeing the resin layer can be adopted. Basically, high accuracy is not required, so that a manufacturing method suitable for mass production can be adopted.

An electromagnetic shielding layer made of a good conductive material may be provided in a matrix form as a color separation region for separating each color of the color filter and also as a color separation light shielding portion, or a color separation of the color filter. In a mesh shape in the region and the light transmission region, or in a matrix shape also serving as a color separation light-shielding portion in the color separation region, and provided in a mesh shape in the other light transmission regions, the display device of the By being placed on the display surface side, leakage of electromagnetic waves from the display device to the observer side can be prevented without affecting display color image quality. Then, by directly contacting the upper or lower part of the electromagnetic shielding layer and providing the transparent conductive layer over the entire surface of the color separation area and other light transmitting areas, the sheet resistance of the entire electromagnetic shielding layer is reduced. In addition, it is possible to make the absorption wavelength band of the shielded electromagnetic wave wider.

Regarding the moire unevenness when the electromagnetic shielding layer is provided in a mesh shape in the light transmitting area, each light of the light emitting cell is
Since the light passes through the mesh provided in the color filter region of the corresponding color, unlike the case where a separate electromagnetic shielding plate 640 as shown in FIG. 9 is used, it is difficult to recognize moiré unevenness.

As a good conductive material for the first electromagnetic shielding layer, a material made of a metal film or metal particles can be used. Further, by making at least one surface of the mesh-shaped conductive layer black, it is possible to prevent a decrease in contrast due to the influence of external light when light enters the display panel from the observer side (incident of external light). It is assumed. In addition, a conductive layer is provided at the boundary of each color filter cell region, and the conductive layer and the mesh-shaped conductive layer for shielding electromagnetic waves are electrically connected, so that the mesh-shaped conductive layer is formed. Has an easy structure for electrical grounding. Further, by providing the conductive layer provided at the boundary of each color filter cell region to have a linear shape or a matrix shape along the boundary, the conductive layer is provided at the boundary of each color filter cell region. The conductive layer may have a color separation function between color filter cells of each color.

As described above, the display device of the present invention uses the color filter substrate of the present invention to provide a display device which is excellent in display color quality and has electromagnetic wave shielding at low cost. .
In addition, the system can be used for mass production.

The method for producing the color filter substrate of the present invention includes the above-mentioned methods. In particular, the color filter substrate is a color filter substrate for a plasma display panel. The color filter forming surface side is arranged on the front side of the panel on the observer side of the front panel.
When the display is separate from the plasma display itself, the degree of freedom of the color filter material is large,
There are few restrictions on processing, and a method for forming a color filter can be selected for mass production.

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described with reference to the drawings. FIG. 1A is a schematic plan view showing the entire first embodiment of the color filter substrate of the present invention, and FIG. 1B is an enlarged view of a part (A0 part) thereof. 1C is a cross-sectional view taken along line A1-A2 in FIG. 1B, and FIG. 2A, FIG. 2B, and FIG.
Are cross-sectional views of characteristic portions each showing a modification of the color filter substrate of the first example of the embodiment shown in FIG.
FIG. 3A is a schematic plan view of a part of a color filter forming region of a second example of the color filter substrate according to the embodiment of the present invention, and FIG. FIG. 3C is an enlarged cross-sectional view taken along a line B2 in FIG.
FIG. 4 is an enlarged plan view showing an electromagnetic shielding layer in a partial region between B4. FIG. 4 is a cross-sectional view of a characteristic portion showing a modification of the color filter substrate of the second example of the embodiment shown in FIG. ,
FIG. 5A is a schematic cross-sectional view of a part of a color filter forming region according to a third embodiment of the color filter substrate of the present invention, and FIG. 5B is a partial region between D1 and D2. 6A and 6A are plan views showing the electromagnetic shielding layer in FIG.
(B) is the schematic which showed an example of embodiment of the display apparatus of this invention, respectively. 7 and 8
1 is a process diagram showing one example of a method for manufacturing a color filter substrate of the present invention. 1 to 8, 110,
110A, 110B, 110C are color filter substrates, 111 is an R filter, 112 is a G filter,
13 is a B filter, 115 is a base substrate (base substrate), 116 is a color filter forming portion, 120 is a conductive layer also serving as a color separation band, 130 is a conductive layer, 140 is a resin layer,
141 is a protective resin layer, 210 is a color filter substrate, 211 is an R filter, 212 is a G filter,
13 is a B filter, 215 is a base substrate (base substrate), 220 is a conductive layer also serving as a color separation band, 230, 230
A is a conductive layer, 240 is a resin layer, 241 is a protective resin layer, 311 is an R filter, 312 is a G filter,
13 is a B filter, 315 is a base substrate (base substrate), 330 is a conductive layer, 410 is a plasma display panel (also called PDP), 411 is an R color light emitting cell,
412 is a G light emitting cell, 413 is a B light emitting cell, 415
Is a back plate, 416 is a front plate, 417 is a barrier (also referred to as a rib), 440 and 441 are adhesive layers. FIG.
(B), R, G, and B in FIG.
The color, G color, and B color are shown. Here, each cell of the color filter (also referred to as a color filter cell) is a color-forming region of the minimum unit of R, G, and B shown in FIG. 3A, or R, G, and B shown in FIG. G,
B means a stripe region. In addition, B5 in FIG.
The state of the cross section at the position B6 is indicated by B3-B4 in FIG.
The state of the section at the position D3-D4 in FIG. 5B corresponds to the state of the section between D1 and D2 in FIG. 4A.

First, an embodiment of the color filter substrate of the present invention will be described. First, a first embodiment of a color filter substrate according to the present invention will be described with reference to FIG. The color filter substrate 110 of the first example shown in FIG. 1 is a color filter substrate used for a plasma display that generates harmful electromagnetic waves,
In use, it is arranged on the observer side of the front plate 710 of the plasma display panel shown in FIG. 10, with the color filter forming surface side facing the front plate side. A color filter of a corresponding color is provided at a position corresponding to the light emitting cell of each color of the plasma display panel. As shown in FIG. 1A, a color filter (1) is formed on one surface of a base substrate 115 made of a transparent substrate.
11, 112, 113) and an electromagnetic shielding layer in which a light-shielding conductive layer 130 made of a metal film is formed in a matrix, and FIG. 1B shows a partially enlarged view thereof. Further, the conductive layers 130 are provided in a matrix so as to straddle the color separation region of each color of the color filter and the stripe-shaped color filter. Since the conductive layer 130 provided in the separation region of each color of the color filter also serves as color separation of each color, the conductive layer 130 is herein referred to as a conductive layer 120 also serving as a color separation band. Although not shown, a ground terminal for electrically connecting the conductive layers 130 in a matrix is provided. As shown in FIG. 1C, the conductive layer 130 (including 120) serving as an electromagnetic shielding layer and the color filter 1 are viewed from the base substrate 115 side.
11, 112, 113, and the conductive layer 130
A resin layer 140 is provided between (120).

As the base substrate 115, a transparent substrate such as a glass substrate or a resin substrate can be used. Examples of the material of the resin substrate include an acrylic resin substrate, a polyester resin substrate, and the like, and further include a mixed resin substrate, a composite substrate, and the like. As the conductive layer 130, a metal film of copper or the like or metal particles of copper, silver or the like can be given, and a layer having good conductivity is preferable. It is preferable that at least one surface of the conductive layer 130 is black from the viewpoint of preventing a reduction in display contrast due to external light. Conductive layer 13
When copper is used as the material of No. 0, it is preferable to perform a blackening process for oxidizing or sulfurizing the surface of the copper to blacken it. The color filter substrate 110 of this example is the plasma display itself (the PDP shown in FIG. 10) in which it is used.
Separate from the color filters 111, 112, 11
Since the material of 3 is not affected by the manufacturing process conditions of the plasma display itself, it is mainly composed of a pigment, a low melting glass frit, a resin colored or a photosensitive colored layer in which the pigment is dispersed in the resin. Can be applied. R filter 111, G filter 112,
As the B filter 113, one having a predetermined transmittance characteristic corresponding to each emission color of the plasma display to be used is used.

Next, a modified example of this embodiment will be described. FIG.
In the first modified example shown in (a), the color filters 111, 112, and 113 are provided on the base substrate 115, the protective resin layer 141 is provided thereon, and the electromagnetic filters are further provided thereon as in the present example. It is provided with a layer. In the second modification shown in FIG. 2B, an ITO film is formed on the surface of the first modification, and the ITO film also has an electromagnetic shielding effect.
With respect to the first electromagnetic shielding layer made of the conductive layer 130, the second
It can be said that this is an electromagnetic shielding layer. The third modified example shown in FIG. 2C is a first example of the embodiment, in which the resin layer 140 is not provided and the color filters 111, 1 are provided between the conductive layers 130.
12 and 113 are provided.

Next, a second embodiment of the color filter substrate according to the present invention will be described with reference to FIG.
The color filter 210 of the second example shown in FIG.
As in the case of the above, a color filter substrate used for a plasma display that generates harmful electromagnetic waves. In use, a color filter substrate is provided on the observer side of the front plate 710 of the plasma display panel shown in FIG. Are arranged with the front side. Then, a color filter of a corresponding color is provided at a position corresponding to the light emitting cell of each color of the plasma display panel. In this example, as shown in a partially enlarged view of FIG. 2A, the color filters are arranged in a predetermined arrangement in which the respective colors are alternately arranged. A conductive layer 230 made of a conductive metal film is provided, and a conductive layer 230 is provided in a light-transmitting region of each of the color filters (211, 212, 213) in a mesh shape. The conductive layers 230 provided in a matrix along the color separation region also serve as color separation bands for the respective colors, and are also referred to herein as the color separation band / conductive layer 220. Mesh conductive layer 230
The conductive layer 220 is electrically connected to the matrix-like conductive layer 220 for color separation band, and both have a function of shielding harmful electromagnetic waves. Although not shown, a ground terminal for electrically connecting the mesh-shaped conductive layer 230 and the matrix-shaped conductive layer 120 for color separation band is provided.

In this example, as shown in FIG. 3C, the mesh-shaped conductive layer 230 is provided below the R filter 211, the G filter 212, and the B filter 213 (the base substrate 215 side). , And is electrically connected to the conductive and light-shielding color-separating-band conductive layer 220.
The resin layer 240 is made of a transparent resin, and fills the gap between the matrix-shaped conductive layer 230 (also serving as the color-striping conductive layer 220) and the mesh-shaped conductive layer 230. ) Plays a role of a flattening layer at the time of fabrication. FIG. 3 (c)
Is a partially enlarged plan view showing a mesh-like conductive layer 230 and a matrix-like color separation band / combination conductive layer 220. The mesh is a linear two-way conductive layer 230.
Are crossing each other at a predetermined angle, but the shape is not limited to this.

As the material of each part, the same material as in the first example of the embodiment can be applied. It is preferable that at least one surface of the mesh-shaped conductive layer 230 provided in the light transmitting region is black from the viewpoint of preventing a decrease in display contrast.

A modification of the second example of the embodiment will be described.
The first modified example shown in FIG. 4 is different from the second example of the embodiment in that, in order from the base substrate 215 side, a filter of each color, a protective resin layer 241, a mesh-shaped conductive layer 230 and a matrix. Color separation band combined conductive layer 220
Is arranged. Although the second modification is not shown, in the second example of the embodiment, it has a structure in which the resin layer 240 is not provided, and has a matrix-like conductive layer 230 (conductive layer also serving as a color separation band), Mesh conductive layer 2
The filters of each color are embedded in the gaps between the 30 filters. Note that the shapes of the mesh-shaped conductive layer 230 and the matrix-shaped conductive layer / color-separating layer 220 viewed from C1-C2 in FIG. 2 are the same as in the second example of the embodiment. become that way.

Next, a third embodiment of the color filter substrate according to the present invention will be described with reference to FIG.
The color filter substrate 310 of the third example shown in FIG.
Similar to the first and second examples, this is a color filter substrate used for a plasma display that generates harmful electromagnetic waves. When used, the color filter substrate is used on the observer side of the front plate 710 of the plasma display panel shown in FIG. The third example, in which the color filter forming surface side is disposed on the front side, covers the color separation region of each color of the color filter and the entire light transmission / transmission region as shown in FIG. This is provided with a mesh-shaped conductive layer 330. A filter corresponding to the resin layer 140 of the first example or the resin layer 240 of the second example is not provided, and a filter of each color is provided on the gap between the mesh-shaped conductive layers 330 and above. FIG.
(A) Mesh-shaped conductive layer 3 viewed from D1-D2
The shape of 30 is as shown in FIG. FIG.
FIG. D shows the state of the cross section at the position D3-D4 in FIG.
This corresponds to the cross-sectional state of FIG.

Next, an embodiment of the display device of the present invention will be described. FIG. 6 shows a plasma display panel (PD) that generates harmful electromagnetic waves.
The light emitting cells (41) of the plasma display panel (PDP) 410 are provided on the viewer's side of the front plate surface 416 of the P) 410.
1, 412, 413) is a display device in which the color filter substrate 210 of the second example of the embodiment shown in FIG. With such a configuration, display quality can be improved and harmful electromagnetic waves can be shielded, as compared with the configuration of the plasma display panel (PDP) 410 alone.

Here, an AC type plasma display panel (also referred to as PDP) alone (PDP4 in FIG. 6)
10 is shown in FIG. 10 and will be described a little more. FIG. 10 is a perspective view of the PDP structure, but shows the front plate (glass substrate 710) and the back plate (glass substrate 720) apart from the actual case for easy understanding.
As shown in FIG. 10, two glass substrates 710, 720
Are arranged in parallel and opposed to each other, and both are held at fixed intervals by barriers (also referred to as cell barriers) 730 provided in parallel on a glass substrate 720 serving as a back plate. On the back side of the glass substrate 710 serving as a front plate, composite electrodes composed of a transparent electrode 740 serving as a discharge sustaining electrode and a metal electrode 750 serving as a bus electrode are formed in parallel with each other. A layer 760 is formed, and a protective layer (MgO layer) 770 is further formed thereon.
Are formed. Also, a glass substrate 72 serving as a back plate
0, a barrier 73 is provided on the front side so as to be orthogonal to the composite electrode.
Address electrodes 780 are formed in parallel with each other, and a fluorescent surface 790 is provided so as to cover the wall surface of the barrier 730 and the cell bottom surface. The barrier 730 is for defining a discharge space, and each partitioned discharge space is called a cell or a unit light emitting region. This AC type PDP is a surface discharge type, and has a structure in which an AC voltage is applied between composite electrodes on the front panel to discharge. In this case, since the alternating current is applied, the direction of the electric field changes according to the frequency.
The fluorescent material 79 is generated by the ultraviolet light generated by the discharge.
0 is emitted, and an observer can visually recognize the light transmitted through the front plate. The DC PDP differs from the AC PDP in that the electrodes have a structure not coated with a dielectric layer, but the discharge effect is the same. 10 has a structure in which a base layer 767 is provided on one surface of a glass substrate 720 and a dielectric layer 765 is provided thereon, but the base layer 767 and the dielectric layer 765 are not necessarily required. .

As a modified example, the first example of the embodiment of the color filter substrate of the present invention shown in FIG. 1 is replaced with the third example shown in FIG. 5, or these modified examples and the second example. The color filter substrate 21 shown in FIG.
0 is replaced with a display device. The modified example is also basically the same as the display image quality and the electromagnetic wave shielding function shown in FIG.
This is the same as the example shown in FIG.

Next, an embodiment of a method for manufacturing a color filter substrate of the present invention will be described. Method 1 for manufacturing a color filter substrate according to a second example of the embodiment shown in FIG.
An example will be described with reference to FIG. First, the base substrate 215
A conductive layer is thinned on one surface by electroless plating, and a thin conductive layer is further formed thereon by electrolytic plating to form a conductive layer 230A to a predetermined thickness. (FIG. 7 (a)) If necessary, before forming the conductive layer by electroless plating, a metal thin film may be formed by vapor deposition, sputtering, or the like. As the conductive layer 230A, Cu, Ag, A
Although a metal plating layer of u or the like may be mentioned, a Cu plating layer is usually used in terms of cost. C for conductive layer 230A
In the case of a u-plated layer, then, a blackening process for blackening the Cu surface is performed using a commercially available electrolytic blackening solution, and a Cu layer and a blackening layer are formed on the base substrate 215 in this order. When the conductive layer 230A is a Cu plating layer, the total thickness of the mesh-shaped conductive layer 230 is about 5 to 50 μm. The reason why the blackening treatment is performed after the formation of the conductive layer 230A is to prevent a decrease in contrast due to light from the viewer side of the display device. Next, the conductive layer 2
Apply an etching resistant resist on 30A, dry,
After preparing a resist film having an opening in a predetermined shape,
The plate-formed resist film is etched using the etching resistant mask to form a mesh-shaped conductive layer 230 and a matrix-shaped conductive layer 220 also serving as a color separation band. (FIG. 7 (b
The plate making of the resist film is obtained by subjecting a photoresist applied on the blackening layer on the surface of the conductive layer 230A to contact exposure and development using a predetermined original plate, and developing a PDP barrier (also referred to as a rib) (see FIG. In the position of the conductive layer 220 for color separation band corresponding to the position 417), the line of the mesh-like conductive layer 230 is slightly smaller than the barrier width and in the color filter cell region corresponding to the light emitting cell. Make the width smaller.

Next, a transparent resin layer 240 is applied and cured. (FIG. 7C) This is because the thickness of the commercially available photosensitive material of each color may be reduced by the conductive layer 230 in the formation of the color filter of each color performed next. It is not necessary to provide the transparent resin layer 240 if the application of the thickness of the photosensitive material is performed without quality problems. When the transparent resin layer 240 is applied to a thickness substantially equal to that of the conductive layer 230, the transparent resin layer 240 is located below the upper surface of the conductive layer 230 after curing.

Next, a filter for each color is formed. As the color filter material, commercially available photosensitive materials of R, G, and B colors can be used. Three original plates each having a cell pattern for each of R, G, and B are prepared in advance, and the pattern size of the color filter cells of the original plate is set to be 5 to 1 times larger than the size of the region where the mesh-shaped conductive layer 230 is formed.
It is good to design it larger by 0 μm so as to facilitate alignment. First, a photosensitive material for R color is applied to the entire surface on which the mesh-shaped conductive layer 230 is formed, and is exposed and developed using a predetermined master to form an R color filter 211. (FIG. 7D) Thereafter, similarly, the G color filter 212 is formed (FIG. 7E), and the B color filter 213 is formed. (FIG. 7F) In this way, the color filter substrate 210 is manufactured. The steps are as described above. However, in order to leak the current generated by the electromagnetic wave shielding, the mesh-shaped conductive layer 230 and the matrix-shaped conductive layer 22 also function as a color separation band.
The ground terminal portion electrically connected to 0 is formed when the conductive layer 230 in the mesh shape and the conductive layer 220 also serving as the color separation band in the matrix shape are formed.

Next, an example of a method of manufacturing a color filter substrate according to a modification of the second example of the embodiment shown in FIG. 4 will be described with reference to FIG. The base substrate 215 (FIG. 8)
On one surface of (a), in the same manner as in the example shown in FIG. 7, an R color filter 211 is formed (FIG. 8B), and a G color filter 212 is formed (FIG. 8C). The B color filter 213 is formed. (FIG. 8D) As shown in FIG. 8D, the color filters of each color are
They are formed close to each other. An original plate for making a photosensitive material of each color for producing a color filter of each color is prepared in advance in such a manner. Also, as necessary, an alignment mark for facilitating the alignment of each original plate for producing a color filter of each color, or a register mark for forming a matrix-like or mesh-like conductive layer 230 in a later process, etc. Create and use.

Next, a protective resin layer 241 such as an acrylic resin is formed as a protective layer for each color filter. (FIG. 8 (e))

Next, a thin conductive layer is formed by electroless plating, and a conductive layer 230A having a predetermined thickness is formed thereon by electrolytic plating. (FIG. 8F) The conductive layer 230A is the same as in the first example.

Thereafter, a photosensitive resist (for example, OM)
R, manufactured by Tokyo Kagaku Kabushiki Kaisha), and using a pattern master for producing a mesh-shaped conductive layer, aligning with the created register mark, exposing, developing, drying and post-baking, The portion exposed from the photosensitive resist is etched with a ferric chloride solution and washed with water to obtain a mesh-shaped conductive layer 230 having a predetermined shape and a color-separating band conductive layer 220 having a matrix shape. (FIG. 8 (g)) Thus, the color filter substrate 210A is manufactured. Thereafter, the surface of the plated Cu is subjected to a blackening treatment for blackening in the same manner as in the first example.

[0036]

(Example 1) Example 1 is a color filter substrate for a plasma display. The color filter substrate of the present invention (the color filter substrate of the second example of FIG. 3) is manufactured by the manufacturing method shown in FIG. 210). Then, the produced color filter substrate was added to a plasma display panel as shown in FIG. 10 to produce a display device of the present invention shown in FIG. This embodiment will be described below with reference to FIG.
First, on one side of a transparent clean glass substrate with a thickness of 3 mm,
A black chromium oxide layer (CrOx) was formed to a thickness of 1500 °. The chromium oxide layer is formed by a sputtering method under an ordinary condition in an Ar atmosphere containing a Cr target and oxygen. Next, after activating the chromium oxide layer surface, the thickness of the electroless Cu was reduced to about 2 μm under the following conditions.
Plating was performed, and then electrolytic Cu plating was performed so that the total thickness of Cu was about 5 μm. (FIG. 7 (a))

The conditions for the electroless Cu plating and the electrolytic Cu plating are as follows. [Electroless Cu plating conditions] Electroless plating bath: OPC750M (trade name, manufactured by Okuno Pharmaceutical Co., Ltd.) used OPC750MA 100 ml / l OPC750MB 100 ml / l OPC750MC 2-5 ml / l Liquid temperature 50 ° C Plating rate 0.5 μm / min electrolytic Cu plating conditions: copper pyrophosphate bath using _{Cu 2 P 2 O 7 · 3H} 2 O 49 g / l K 4 P2 2 7 340 g / l NH 4 OH (28%) 3ml / l pH 8.8 p Ratio (P ₂ O ₇ − / Cu ₂ +) 7.0 Liquid temperature 55 ° C.

Next, after applying an OMR photosensitive resist (manufactured by Tokyo Ohka Co., Ltd.) on the conductive layer 230A and drying it, a predetermined area is exposed using a photographic original having a predetermined shape.
The Cu layer and the CrOx layer were simultaneously etched with a ferric chloride solution (specific gravity of 38 degrees Baume) using the resultant as a mask and an etching mask, and the remaining resist was stripped off. (FIG. 7 (b)) The photographic original plate has a line width 40 μm slightly narrower than the barrier (rib) width at a portion corresponding to a position on a barrier (790 μm in width 790 in FIG. 10) of the light emitting cell of the plasma display panel.
In the portion corresponding to the light emitting cell region, a narrower line width of 20 μm was set. The photographic original plate was prepared by electron beam drawing.

Next, the etching pattern of Cu was prepared in an aqueous solution containing Copper Black Cuo (trade name: Isolate Chemical Laboratory Co., Ltd.) containing solution A (20% solution) and solution B (10% solution). A chemical conversion treatment was performed by immersion at 2 ° C. for 2 to 3 minutes to blacken the Cu surface and the etched cross section. Thus, the mesh-shaped conductive layer 220 (230)
And a conductive layer 130 in the form of a matrix. Practically, it is necessary to form a ground terminal portion for leaking a current generated by electromagnetic wave shielding. When forming the mesh-shaped conductive layer 220 (230) and the matrix-shaped conductive layer 230, At the same time, a ground terminal portion was formed on these peripheral portions at the same time. In addition, since the ground terminal portion is located outside of the display portion and cannot be seen, the surface blackening process is unnecessary, and the blackened layer rather adversely affects the ground connection.
It is preferable to keep the surface.

Next, the mesh-shaped conductive layer 220 (2
In order to form three color filters of R, G and B in the gaps (concave portions) between 30) and the matrix-shaped conductive layer 230, a transparent photosensitive acrylic resin is filled in advance over the entire concave portions by a squeegee method. UV exposure and heat treatment (150 ° C,
(30 minutes) to completely cure the resin layer 240.
(FIG. 7 (c)) Although the surface on which the conductive layer 230 is formed is almost flattened by this process, the conductive layer 23 is hardened and contracted by the acrylic resin.
The surface became lower by about 1 μm than the surface of No. 0 and slightly remained as a concave portion.

Next, the entire surface is filled with a pigment dispersion type photosensitive color filter material (also referred to as a color resist) by spin coating, and exposed, developed, and heat-treated.
An R color filter 211 is formed (FIG. 7D),
Similarly, a G color filter 212 was formed (FIG. 7E), and a B color filter 213 was formed. (FIG. 7 (f)) Hereinafter, a method of forming filters of each color will be described. As the color filter material, a commercially available photosensitive material for each of R, G, and B colors, a photosensitive color material manufactured by JSR (abbreviation of Nippon Synthetic Rubber Co., Ltd.), Color Resist: CR2000R (red), CR2000G (green), CR2000B ( Blue). First, three photographic original plates having cell patterns for each of R, G, and B are prepared in advance, and the cell pattern size of this original plate is set to 5 to 10 μm larger than that of the conductive mesh.
It was designed to be large and easy to align. Next, first, a red photosensitive color material CR20000R was applied to the conductive matrix forming surface and dried. At this time, since the surface formed by the conductive layer 230 and the resin layer 240 has an intaglio shape having a height of 5 μm, the photosensitive color material is filled in the concave portions. Generally, the color material layer is 1-2 μm
If this is the case, a sufficient necessary density can be obtained. Therefore, the photosensitive color material was diluted with a solvent in advance, applied (filled), dried, and adjusted to have a predetermined transmission density of 1.2 to 2.0. The coating method adopted a squeegee method using a hard rubber squeegee plate,
A spin coating method or a bar coating method may be used. Next, using a photographic original plate for an R color filter, the photosensitive mesh is aligned with the R cell portion of the conductive mesh and exposed in close contact, and developed according to the prescription.
Drying and heat treatment (180 ° C., 30 minutes or more) were performed to form an R color filter 211. The addition of the heat treatment is a treatment to sufficiently complete the curing of the photosensitive color material and to enhance the solvent resistance in the subsequent formation of another color filter. As a result, a stable red filter layer was formed. Subsequently, a green color filter 212 was formed by the same process, and a blue color filter 213 was formed next. Thus, the R color filter 211, the G color filter 212, and the B color filter 213 were formed.

Thereafter, about 20 μm of a transparent acrylic resin was further applied to complete the color filter substrate 210 of the present invention having an electromagnetic wave shielding effect as a protective film.

Further, the color filter substrate 210 manufactured as described above was added to the plasma display panel as follows, and a display device of the present invention having a form shown in FIG. 6 was manufactured. When attaching the color filter substrate 210 manufactured as described above to the front plate (corresponding to 710 in FIG. 10) of the plasma display panel, a transparent glass substrate (7 in FIG. 10) of the front plate is used.
After applying a transparent thermo-adhesive acrylic resin to a thickness of about 20 μm on the side of the observer 10), the produced color filter substrate 210 is placed on a thick conductive film corresponding to the barrier (790 in FIG. 10) line. Layer (conductive layer 120 also serving as color separator)
Was accurately aligned on the line of the light-emitting cell formation barrier of the plasma display panel, and attached by thermal bonding while pressing. Thereby, the display device of the present invention in the form shown in FIG. 6 was manufactured.

The plasma display panel used here will be briefly described. Front plate (71 in FIG. 10)
0), a transparent glass substrate having a thickness of 2 mm, and a transparent electrode serving as a sustaining electrode (corresponding to 740 in FIG. 10) were formed of ITO,
The metal electrode (corresponding to 750 in FIG. 10) which is a bus electrode is C
r / Cu / Cr three-layer structure, dielectric layer (760 in FIG. 10)
Is a low-melting glass paste and a protective layer (7 in FIG. 10).
(Corresponding to 70) is an MGO film. Also, the back plate (FIG. 10)
720) is a transparent glass substrate (720 in FIG. 10).
Is 2 mm thick, and the barrier (corresponding to 730 in FIG. 10) is made of glass paste. 42 inch display,
Light emitting cell pitch 0.36 mm, width 60 μm, height 12
At 0 μm, the filling gas is Ne + Xe (Penning mixed gas, filling at 500 to 600 Torr). And
The phosphor forming the phosphor screen (equivalent to 790 in FIG. 10)
The R phosphor, the G phosphor, and the B phosphor were respectively converted to KX-504A ((Y, Cd) manufactured by Kasei Optonics Co., Ltd.).
_{BO 3: Eu3 +), PI} -GIS (Zn 2 SiO 4:
Mn), KX-501A (BaMgAl ₁₄ O ₂₃ : Eu2
+), And the address electrode (equivalent to 780 in FIG. 10)
Cr / Cu / Cr (Ag may be used) with a thickness of several μm to 10
In μm, the electrode pitch is 0.13 mm. The method of manufacturing the front plate (also referred to as a front plate), the rear plate (also referred to as a back plate) itself, and the method of manufacturing the plasma display panel are generally well known and will not be described here.

In the method of manufacturing the color filter substrate 210 of the present embodiment, the color filter portion can be manufactured independently of the plasma display panel. It was easy to manufacture without having to handle.

Example 2 Similarly to Example 1, Example 2 is also a color filter substrate for a plasma display. The color filter substrate of the present invention (the color filter shown in FIG. 4) was manufactured by the manufacturing method shown in FIG. (Substrate 210A)
Was produced. Then, the produced color filter substrate 210A was added to a plasma display panel as shown in FIG. 10 to produce a display device of the present invention shown in FIG. This embodiment will be described below with reference to FIG. First, an R color filter 211 is formed on one surface of the base substrate 215, which is a transparent and clean glass substrate having a thickness of 3 mm, using the photosensitive color material (color resist) used in Example 1. (FIG. 8
(B)), a G color filter 212 is formed (FIG. 8)
(C)), a B color filter 213 was formed.
(FIG. 8D) Plate making and development were performed using a predetermined photographic original plate, and color filters of each color were prepared so as to be adjacent to each other.
Note that a register mark indicating the position of the pattern boundary of the original plate of each color was placed outside the effective area as a color filter. In addition, the photographic master used when producing the mesh-shaped conductive layer is designed so that the position of the thick line of the mesh-shaped pattern can be detected and adjusted so as to match the boundary of the color filter of each color. I had designed it.

Next, a UV-curable transparent acrylic resin is applied as a protective layer to a thickness of 2 to 5 μm, cured by UV, and further thermally cured at 180 ° C. for 30 minutes to form a protective resin layer 2.
41 was formed. (FIG. 8 (e))

Next, electroless Cu plating was applied on the color filter to a thickness of 2 μm under the following conditions.
Electrolytic Cu plating was performed to form a Cu layer with a total thickness of 5 μm. (FIG. 8 (f)) Next, a photosensitive resist OMR is applied and dried. Using a pattern original having a predetermined shape on the resist, the resist is aligned with a register mark provided at the time of producing the color filter, and is exposed, developed, and dried. After performing each process of post-baking and forming a resist pattern in a predetermined shape, the conductive layer 230A made of the plated Cu layer was etched with a ferric chloride solution using the resist as an etching resistant mask, and washed with water. (FIG. 8 (g)) [Electroless Cu plating condition] Electroless plating bath: OPC750M (trade name, manufactured by Okuno Pharmaceutical Co., Ltd.) used OPC750MA 100 ml / l OPC750MB 100 ml / l OPC750MC 2-5 ml / l Liquid temperature 50 ° C plating rate 0.5 [mu] m / min electrolytic Cu plating conditions: copper pyrophosphate bath using _{Cu 2 P 2 O 7 · 3H} 2 O 49 g / l K 4 P2 2 7 340 g / l NH 4 OH (28%) 3ml / L pH 8.8 p ratio (P ₂ O ₇ − / Cu ₂ +) 7.0 Liquid temperature 55 ° C.

Next, the Cu surface was blackened under the following conditions, washed with water and dried. [Blackening treatment conditions] Use of black nickel plating bath Nickel ammonium sulfate 60 g / l Zinc sulfate 7.5 g / l Sodium thiocyanate 15 g / l Temperature 30 ° C Current density (3 minutes of conduction time) Initial 0.1 A / dm, and the current was gradually increased to 1 A / dm at the end. Further, a UV-curable transparent acrylic resin as a protective film was applied on the surface to a thickness of about 20 μm and cured to flatten the surface, thereby completing the color filter substrate 210A of the present invention.

Next, the color filter substrate 210A manufactured as described above was mounted on a plasma display panel to manufacture a display device of the present invention. Attachment is performed by applying an adhesive made of a transparent acrylic resin to an observer side of a front plate (equivalent to 710 in FIG. 10) of the plasma display panel to a thickness of 20 to 30 μm, and then attaching the produced color filter substrate 210A. Performed with accurate alignment. In the present embodiment, the blackening of the surface of the mesh-like conductive layer on the observer side is omitted. However, since one color filter layer is formed on this conductive layer, the reddish brown of Cu does not cause any adverse effect. Of course, instead of the conductive layer 230A of the present embodiment, three conductive layers (CrOx-Cu
-Blackened copper). Further, a black matrix may be formed on the color filter surface in advance separately from the color separation band and conductive layer 220.

[0051]

According to the present invention, as described above, when placed on the display surface side of a display device and used, the display color image quality of the display device is improved, and the display device has an electromagnetic wave shielding effect. This makes it possible to provide a color filter substrate which is excellent in terms of performance and can be manufactured relatively inexpensively.
Specifically, as compared with the conventional method of separately using a color filter and an electromagnetic wave shielding plate as shown in FIG. 9, the structure is simpler and the manufacturing is easier, and as a result, a thinner and less expensive display is provided. Made it possible.

[Brief description of the drawings]

FIG. 1 is a schematic view of a first example of an embodiment of a color filter substrate of the present invention.

FIG. 2 is a modified example of the color filter substrate according to the first example of the embodiment;

FIG. 3 is a schematic view of a second embodiment of the color filter substrate according to the present invention.

FIG. 4 is a modified example of the color filter substrate according to the second example of the embodiment;

FIG. 5 is a schematic view of a third embodiment of the color filter substrate according to the present invention.

FIG. 6 is a schematic sectional view of a display device of the present invention.

FIG. 7 shows a method 1 of manufacturing a color filter substrate of the present invention.
Example manufacturing process diagram

FIG. 8 is a manufacturing process diagram of another example of the method for manufacturing a color filter substrate of the present invention.

FIG. 9 is a schematic sectional view for explaining a conventional PDP having a color filter configuration.

FIG. 10 is a schematic diagram for explaining a configuration of a PDP alone.

[Explanation of symbols]

110, 110A, 110B, 110C Color filter substrate 111 R filter 112 G filter 113 B filter 115 Base substrate (base substrate) 116 Color filter forming part 120 Color separation band and conductive layer 130 Conductive layer 140 Resin layer 141 For protection Resin layer 210, 210A Color filter substrate 211 R filter 212 G filter 213 B filter 215 Base substrate (base material) 220 Color separation band and conductive layer 230, 230A Conductive layer 240 Resin layer 241 Protective resin layer 310 Color filter Substrate 311 R filter 312 G filter 313 B filter 315 Base substrate (base material) 330 Conductive layer 410 Plasma display (PDP) 411 R color light emitting cell 412 G color light emitting cell 413 B color light emitting cell 415 Back plate 417 Barrier (rib) 430 Protective substrate 440, 441 Adhesive layer 610 Plasma display panel (also referred to as PDP) 611 Back plate (back plate) 615 Front plate (front plate) 617 Barrier (rib) ) 620 color filter 630 protection plate 640 electromagnetic wave shielding plate 641 base substrate 645 conductive layer

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA02 BA12 BA45 BB02 BB08 BB10 BB41 5C040 FA01 FA02 GB02 GH02 GH03 MA02 MA08 5C058 AA11 AB05 BA08 BA35 5E321 AA04 BB23 BB25 CC16 GG05 GH01

Claims (13)

[Claims] 1. A color filter and an electromagnetic shield on one surface of a base substrate, which are used on a display surface side of a display device that generates harmful electromagnetic waves by combining each cell of a color filter for each light emitting cell. A color filter substrate on the display surface side of a display provided with a layer,
At least the first electromagnetic shielding layer is made of a good conductive material, and has an opening and a color filter provided below or above the opening, and the first electromagnetic shielding layer has a color for separating each color. In the form of a matrix including the separation region, or in the form of a mesh in the color separation region and the light transmission region, or in the form of a matrix including the color separation region, and
A color filter substrate provided in a mesh shape in a light transmitting region. 2. The color filter substrate for a plasma display panel according to claim 1, wherein in use, the color filter forming surface side is on the front side of the front panel of the plasma display panel. And then
A color filter substrate, which is disposed. 3. The transparent electroconductive layer as a second electromagnetic shielding layer according to claim 1, wherein the second electromagnetic shielding layer is brought into direct contact with the upper or lower part of the first electromagnetic shielding layer to cover the entire surface including the color separation region and the light transmitting region. A color filter substrate comprising a layer. 4. The color filter substrate according to claim 1, wherein the color filter comprises a photosensitive colored layer in which a resin is dyed or a pigment is dispersed in the resin. 5. The color filter substrate according to claim 1, wherein the good conductive material comprises a metal film or metal particles. 6. The color filter substrate according to claim 1, wherein at least one surface of the first electromagnetic shielding layer is black. 7. The color filter substrate according to claim 1, wherein the color filter substrate also serves as a front plate of the plasma display panel. 8. A display device, wherein the color filter substrate according to claim 1 is provided on a display surface side of a display. 9. A color filter and an electromagnetic shielding layer are provided on one surface of a base substrate which is placed on a display surface side of a display device which generates harmful electromagnetic waves by combining each cell of a color filter in units of light emitting cells. In the color filter substrate on the display surface side of the display, at least the first electromagnetic shielding layer is made of a good conductive material and has an opening and a color filter provided below or above the first electromagnetic shielding layer. The shielding layer is in a matrix shape including a color separation region for separating each color, or in a mesh shape in the color separation region and the light transmission region, or in a matrix shape including the color separation region, and in a light transmission region. A method of manufacturing a color filter substrate provided in a mesh shape, wherein a first electromagnetic shielding layer is formed of a good conductive material on a transparent substrate. A method for manufacturing a color filter substrate, comprising: forming, after forming, a filter material of each color according to a light emitting cell unit. 10. The transparent conductive layer according to claim 9, wherein the transparent conductive layer is a second electromagnetic shielding layer before and after the formation of the first electromagnetic shielding layer and before the filter materials of the respective colors are arranged in accordance with the light emitting cell units. A method for producing a color filter substrate, comprising providing a layer. 11. A color filter and an electromagnetic shielding layer are provided on one surface of a base substrate which is placed on a display surface side of a display device which generates harmful electromagnetic waves by combining each cell of a color filter in a light emitting cell unit. A color filter substrate on the display surface side of the display, wherein at least the first
The electromagnetic shielding layer is made of a good conductive material, and an opening thereof and a color filter are provided on the lower side or the upper side thereof. The first electromagnetic shielding layer has a color separation region for separating each color. A method of manufacturing a color filter substrate provided in a matrix including, in a mesh in a color separation region and a light transmission region, or in a matrix including the color separation region and in a mesh in a light transmission region. A method of manufacturing a color filter substrate, comprising: providing a filter material of each color on a transparent substrate in accordance with a light emitting cell unit; and then forming a first electromagnetic shielding layer with the good conductive material. Method. 12. The transparent conductive layer as the second electromagnetic shielding layer according to claim 11, wherein the filter material of each color is arranged in accordance with the light emitting cell unit and before and after the formation of the first electromagnetic shielding layer. A method for manufacturing a color filter substrate, comprising: providing a color filter substrate; 13. The color filter substrate according to claim 9, wherein the color filter substrate is a color filter substrate for a plasma display panel, and in use, a color filter forming surface is provided on an observer side of a front plate of the plasma display panel. A method for manufacturing a color filter substrate, wherein the color filter substrate is arranged with the side facing the front plate.