JP2000268709A - Ferroelectrtic electron emission cold cathode - Google Patents
Ferroelectrtic electron emission cold cathodeInfo
- Publication number
- JP2000268709A JP2000268709A JP7034899A JP7034899A JP2000268709A JP 2000268709 A JP2000268709 A JP 2000268709A JP 7034899 A JP7034899 A JP 7034899A JP 7034899 A JP7034899 A JP 7034899A JP 2000268709 A JP2000268709 A JP 2000268709A
- Authority
- JP
- Japan
- Prior art keywords
- ferroelectric
- electrode
- cold cathode
- electron emission
- electrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims abstract description 18
- 230000001681 protective effect Effects 0.000 claims description 19
- 230000010287 polarization Effects 0.000 claims description 12
- 230000002269 spontaneous effect Effects 0.000 claims description 2
- 229910007541 Zn O Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 6
- 230000001965 increasing effect Effects 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 23
- 230000005684 electric field Effects 0.000 description 11
- 230000000694 effects Effects 0.000 description 6
- 239000007772 electrode material Substances 0.000 description 5
- 229910052451 lead zirconate titanate Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- -1 r and W Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Cold Cathode And The Manufacture (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子源として利用
する電子放出冷陰極に関するものであり、特に強誘電体
を用いた電子放出冷陰極の構造に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron emission cold cathode used as an electron source, and more particularly to a structure of an electron emission cold cathode using a ferroelectric material.
【0002】[0002]
【従来の技術】強誘電体には、平行または反平行に並ん
だ永久双極子によって生じる自発分極が存在しており、
外部から摂動を与えることによってこれを変化させるこ
とが可能である。例えば、電場による分極変化は分極履
歴現象(ヒステリシス)として観測され、また応力や温
度変化を与えるとそれぞれ圧電効果や焦電効果となって
現れる。これらの現象は、強誘電体上に形成された電極
への電荷の出入りによって観測されるが、電極の形状あ
るいは形成位置、膜厚等を適切に選択することにより、
強誘電体からの電子の放出も可能となる。2. Description of the Related Art A ferroelectric has spontaneous polarization caused by permanent dipoles arranged in parallel or antiparallel.
It is possible to change this by applying an external perturbation. For example, a polarization change due to an electric field is observed as a polarization hysteresis (hysteresis), and when a stress or a temperature change is given, it appears as a piezoelectric effect or a pyroelectric effect, respectively. These phenomena are observed by the transfer of charges to and from the electrodes formed on the ferroelectric, but by appropriately selecting the shape or position of the electrodes, the film thickness, etc.
It is also possible to emit electrons from the ferroelectric.
【0003】上述の強誘電体からの電子放出現象につい
ては、従来より様々な研究が行われており、例えばBa
TiO3等の代表的な強誘電体単結晶に、外部から電界
の印加、温度変化、光照射等の摂動を与えて分極変化を
誘起すると言った各種の実験が行われていた。しかしこ
れらの実験は比較的緩やかな分極変化を用いたものであ
り、放出される電子の電流密度も10-9A/cm2と極
めて小さなものであったため、実用的なデバイスへの応
用は困難であると考えられていた。ところが、近年にな
ってチタン酸ジルコン酸鉛(以下、PZTと略す)や、
これに少量のLaを添加したPLZTなどの強誘電体セ
ラミックに高速パルス電界を印加することにより、10
〜102A/cm2程度の電子放出がなされることがH.
Gundelらによって報告されて以来、この現象を電
子デバイスへ応用しようとする機運が高まっている。[0003] Various researches have been conducted on the above-mentioned phenomenon of electron emission from a ferroelectric substance.
Various experiments such as inducing a polarization change by applying a perturbation such as application of an electric field, a temperature change, and light irradiation to a typical ferroelectric single crystal such as TiO 3 from the outside have been performed. However, in these experiments, a relatively gradual change in polarization was used, and the current density of emitted electrons was extremely small at 10 -9 A / cm 2 , so that application to practical devices was difficult. Was thought to be. However, recently, lead zirconate titanate (hereinafter abbreviated as PZT),
By applying a high-speed pulse electric field to a ferroelectric ceramic such as PLZT to which a small amount of La is added,
It is known that electron emission of about 10 2 A / cm 2 is performed.
Since the report by Gundel et al., There has been increasing motivation to apply this phenomenon to electronic devices.
【0004】例えば、H.Gundelらによって報告
された強誘電体電子放出冷陰極1は、図1に示すよう
に、下面電極2、強誘電体3、上面電極4をその主たる
構成要素とし、また例えば特開平5−325777号公
報に記載された強誘電体電子放出冷陰極5は、図2に示
すように、下面電極2、強誘電体3、上面電極4に加え
て絶縁膜6、補助電極7をその主たる構成要素としてい
る。これら図1、図2に示された構成の強誘電体電子放
出冷陰極は、下面電極と上面電極との間に交番電界を印
加することにより、その電界の急激な変化に伴い強誘電
体内部に分極の変化(分極反転)を生ぜしめ、その際に
上面電極の近傍に存在する電子をクーロン力によっては
じき飛ばし、電子の放出を行うものであると考えられ
る。[0004] For example, H. The ferroelectric electron-emitting cold cathode 1 reported by Gundel et al., As shown in FIG. As shown in FIG. 2, the ferroelectric electron emission cold cathode 5 described in the publication includes an insulating film 6 and an auxiliary electrode 7 as main components in addition to a lower electrode 2, a ferroelectric 3, and an upper electrode 4. I have. The ferroelectric electron-emitting cold cathode having the structure shown in FIGS. 1 and 2 applies an alternating electric field between the lower electrode and the upper electrode, thereby causing a sudden change in the electric field to cause the ferroelectric internal cold cathode. This causes a change in polarization (polarization reversal), and at that time, electrons existing near the upper surface electrode are repelled by Coulomb force to emit electrons.
【0005】[0005]
【発明が解決しようとする課題】しかしながら上述の強
誘電体電子放出冷陰極は、以下のような問題点を有して
いた。However, the above-mentioned ferroelectric electron-emitting cold cathode has the following problems.
【0006】すなわち従来の冷陰極にあっては、下面電
極と上面電極との間に交番電界を印加して強誘電体内に
分極反転を生ぜしめる動作を繰り返すと、強誘電体表面
および/または上面電極内部に疲労および劣化が生じ、
次第に電子の放出が行われなくなる。この劣化は通常、
数回〜数十回程度のパルス電圧の印加で生じるため、本
冷陰極をそのまま実用に供することは不可能であった。
この劣化を抑制するために印加するパルス電圧の絶対値
を小さくすることも考えられるが、この場合、放出され
る電子の電流密度が小さくなるという問題が新たに生じ
る。また従来の冷陰極では、未だ充分満足のゆくだけの
電子放出量が得られておらず、かつその放出量も不安定
であると言う問題点を有していた。That is, in the conventional cold cathode, when an operation of applying an alternating electric field between the lower electrode and the upper electrode to cause polarization inversion in the ferroelectric material is repeated, the surface and / or the upper surface of the ferroelectric material are reduced. Fatigue and deterioration occur inside the electrode,
The emission of electrons gradually stops. This degradation is usually
Since this occurs when a pulse voltage is applied several to several tens of times, it is impossible to use the present cold cathode as it is.
Although it is conceivable to reduce the absolute value of the pulse voltage applied in order to suppress this deterioration, in this case, a new problem arises in that the current density of the emitted electrons decreases. Further, the conventional cold cathode has a problem that a sufficiently satisfactory electron emission amount has not yet been obtained, and the emission amount is unstable.
【0007】これらの問題点から、強誘電体を用いた電
子放出冷陰極は未だ実用化されていないのが現状であ
る。従って本発明の目的は、上述の技術的問題点を克服
し、寿命が長く、大きな電子の放出量を安定して得られ
る強誘電体電子放出冷陰極を提供することにある。Due to these problems, at present, an electron emission cold cathode using a ferroelectric has not been put to practical use yet. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a ferroelectric electron-emitting cold cathode which has a long life and can stably obtain a large amount of emitted electrons, overcoming the above technical problems.
【0008】[0008]
【課題を解決するための手段】上述の問題点を解決する
ために、本発明の強誘電体電子放出冷陰極は、強誘電体
の両主面に裏面電極と上面電極とを有してなる強誘電体
電子放出冷陰極において、上面電極の形成された強誘電
体の他方主面上に、電子放出能の高い材料、例えばMg
O、ZnO、CeO2、Y2O3、BaO、CaO、Sr
O等からなる保護膜を形成した。In order to solve the above-mentioned problems, a ferroelectric electron-emitting cold cathode according to the present invention has a back electrode and an upper electrode on both main surfaces of a ferroelectric. In the ferroelectric electron-emitting cold cathode, a material having a high electron-emitting ability, such as Mg, is formed on the other main surface of the ferroelectric on which the upper electrode is formed.
O, ZnO, CeO 2 , Y 2 O 3 , BaO, CaO, Sr
A protective film made of O or the like was formed.
【0009】このように、電子の放出される主面上に電
子放出能の高い材料からなる保護膜を形成することによ
り、寿命および放出電子量の安定性のいずれの面におい
ても、従来の冷陰極よりも格段に優れた強誘電体電子放
出冷陰極を得られることを本発明者らは見い出し、本発
明を完成させるにいたった。本発明の構成を採用するこ
とにより上述の効果が得られる詳細なメカニズムは現時
点では明らかでないが、おそらく分極を急激に反転させ
ることによって強誘電体表面に集中して生じていた作用
が、保護膜側に分散、緩和されつつ電子放出能の高い保
護膜からの電子放出が行われることにより、冷陰極の長
寿命化、放出量の安定化が図られるものと考えられる。As described above, by forming the protective film made of a material having a high electron-emitting ability on the main surface from which electrons are emitted, the conventional cold-cooling method can be used in both aspects of the life and the stability of the amount of emitted electrons. The present inventors have found that a ferroelectric electron-emitting cold cathode that is much better than the cathode can be obtained, and have completed the present invention. The detailed mechanism by which the above-described effects can be obtained by employing the configuration of the present invention is not clear at present, but the action that has been concentrated on the ferroelectric surface due to the sudden reversal of the polarization is likely to be caused by the protective film. It is considered that the electron emission from the protective film having a high electron emission ability is performed while being dispersed and relaxed on the side, thereby prolonging the life of the cold cathode and stabilizing the emission amount.
【0010】なお本発明に用いる強誘電体としては、P
ZT、PLZT、BaTiO3等のセラミック強誘電
体、PVDF等の高分子強誘電体等を用いることができ
る。強誘電体の厚みは、20nm〜2000μm、より
好ましくは100nm〜200μmが好ましい。これ
は、使用条件にもよるが、強誘電体の厚みが20nmよ
り薄くなるとその両面に形成される電極同士が短絡する
恐れが高くなり、また、2000μmより厚くなると動
作電界を非常に大きなものにする必要が生じるからであ
る。また、使用する強誘電体は、バルク状のものを用い
ても良いし、成膜された薄膜状のものを用いても良い。[0010] The ferroelectric used in the present invention is P
Ceramic ferroelectrics such as ZT, PLZT, and BaTiO 3 , and polymer ferroelectrics such as PVDF can be used. The thickness of the ferroelectric is preferably 20 nm to 2000 μm, more preferably 100 nm to 200 μm. This depends on the conditions of use, but if the thickness of the ferroelectric material is less than 20 nm, there is a high possibility that the electrodes formed on both surfaces of the ferroelectric material will be short-circuited. It is necessary to do so. The ferroelectric used may be a bulk material or a thin film formed.
【0011】本発明に用いる電極材料としては、一般的
な電極材料をいずれも用いることが可能である。具体的
には、Pt、Au、Cu、Al、Ni、Ir、Cs、C
r、W等の金属、およびこれらの合金が挙げられる。な
かでも、電子の放出しやすさの面からはIr、Cs等の
仕事関数の低い電極材料が望ましい。電極の形成方法は
任意の成膜方法を用いることができるが、蒸着法、スパ
ッタリング法等の成膜技法を用いることが好ましい。こ
れは、後述の通り、本構造の冷陰極においては電極の膜
厚が厚くなると電子が放出されにくくなる傾向を有して
いるからである。As the electrode material used in the present invention, any general electrode material can be used. Specifically, Pt, Au, Cu, Al, Ni, Ir, Cs, C
Metals such as r and W, and alloys thereof. Among them, an electrode material having a low work function, such as Ir or Cs, is desirable from the viewpoint of easy electron emission. Although any film formation method can be used as a method for forming the electrode, it is preferable to use a film formation technique such as an evaporation method or a sputtering method. This is because, as described later, in the cold cathode having this structure, when the thickness of the electrode is large, electrons are less likely to be emitted.
【0012】本発明の冷陰極で形成される電極(特に上
面電極)の膜厚としては、5000Å以下、より好まし
くは500Å以下が好ましい。電極の膜厚が5000Å
よりも厚くなると、その厚みのため電子の放出が妨げら
れるためである。この値は使用する電極材料によって若
干の変動はあるが、例えば電極材料としてPtを用いる
場合、100〜500Å程度が最も好適である。The thickness of the electrode (particularly, the upper electrode) formed by the cold cathode of the present invention is preferably 5000 ° or less, more preferably 500 ° or less. The electrode thickness is 5000mm
If the thickness is larger than that, emission of electrons is hindered due to the thickness. Although this value slightly varies depending on the electrode material used, for example, when Pt is used as the electrode material, it is most preferably about 100 to 500 °.
【0013】本発明で印加する動作電界は、正あるいは
負のいずれでも良く、またいずれの場合もその絶対値に
おいて300kV/cm程度以下の範囲が好ましい。3
00kV/cm程度を越える電界を印加すると、その高
電界のため電極および強誘電体が破壊されるという問題
が生じるからである。また、動作電界のパルス時間は、
正あるいは負どちらとも0.01〜1000μ秒、より
好ましくは5〜200μ秒の範囲が好ましい。0.01
μ秒未満ではパルス時間が短いため充分な電子放出量が
得られず、また1000μ秒を越えて電界を印加しても
1000μ秒以下のパルス時間で放出する電子放出量と
ほとんど変わらないからである。The operating electric field applied in the present invention may be either positive or negative, and in any case, its absolute value is preferably in the range of about 300 kV / cm or less. 3
This is because, when an electric field exceeding about 00 kV / cm is applied, a problem arises in that the electrode and the ferroelectric are broken by the high electric field. The pulse time of the operating electric field is
Both positive and negative are preferably in the range of 0.01 to 1000 μsec, more preferably 5 to 200 μsec. 0.01
If the time is less than μ seconds, the pulse time is short, so that a sufficient amount of electrons cannot be obtained, and even if an electric field is applied for more than 1000 μ seconds, the amount of electrons emitted is almost the same as the amount of electrons emitted in a pulse time of 1000 μ seconds or less. .
【0014】[0014]
【発明の実施の形態】本発明の一実施例の強誘電体電子
放出冷陰極11は主として、図3に示すように、薄板形
状の強誘電体12と、強誘電体12の裏面全面に形成さ
れる下面電極13と、強誘電体12の表面にストライプ
状に形成される上面電極14と、上面電極14を含む表
(おもて)面全面に形成される保護膜15とから構成さ
れている。なお、図3は冷陰極11の断面形状しか示さ
れていないが、上面電極14および保護膜15は奥行き
方向にも延びて形成されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A ferroelectric electron emission cold cathode 11 according to an embodiment of the present invention is mainly formed on a thin ferroelectric material 12 and on the entire back surface of the ferroelectric material 12, as shown in FIG. A lower electrode 13 to be formed, an upper electrode 14 formed in a stripe shape on the surface of the ferroelectric 12, and a protective film 15 formed on the entire front surface including the upper electrode 14. I have. Although FIG. 3 shows only the cross-sectional shape of the cold cathode 11, the upper electrode 14 and the protective film 15 are formed to extend in the depth direction.
【0015】具体的には強誘電体12としては10×1
5mm角、50μm厚のバルク状のPZT薄板が用いら
れる。また、下面電極13は膜厚500nmのIr電極
が、上面電極14は膜厚100nmのIr電極が、それ
ぞれスパッタリング法によって形成される。ストライプ
状の上面電極14はライン/スペースが500μm/3
00μmに形成される。保護膜15はMgO膜からな
り、EB蒸着法によって膜厚100nmに形成される。Specifically, the ferroelectric material 12 is 10 × 1
A 5 mm square, 50 μm thick bulk PZT thin plate is used. The lower electrode 13 is formed by a sputtering method, and the upper electrode 14 is formed by a sputtering method. The stripe-shaped upper electrode 14 has a line / space of 500 μm / 3.
It is formed to a thickness of 00 μm. The protective film 15 is made of an MgO film and is formed to a thickness of 100 nm by the EB evaporation method.
【0016】ここで、上述の構成の本発明の冷陰極11
と、MgO保護膜を形成されない(その他の構成は本発
明の冷陰極11と同一である)従来の冷陰極(図示せ
ず)との二種の試料につき、図4に示す測定装置を用い
て、その寿命および放出電子量の安定性を測定する。な
お、これら2種の冷陰極を構成する強誘電体には予め電
気的に分極処理を施しておく。なお、測定に際しては、
上面電極のうちの1本のストライプのみを使用する。Here, the cold cathode 11 of the present invention having the above-described structure is used.
And a conventional cold cathode (not shown) in which an MgO protective film is not formed (other structures are the same as the cold cathode 11 of the present invention) using a measuring apparatus shown in FIG. , Its lifetime and the stability of the amount of emitted electrons. The ferroelectrics constituting these two types of cold cathodes are electrically polarized in advance. When measuring,
Only one stripe of the top electrode is used.
【0017】以下、測定方法を具体的に説明する。まず
図4に示すように、試料20を真空チャンバ21内のホ
ルダ22に固定したうえで試料20の上面電極を接地す
る。次いで、パルス印加手段23によって発生する正負
のパルス電圧を下面電極13に印加する。この時、印加
パルスは±200V、パルス幅は10μsecとする。
このパルス電圧の印加によって放出される電子は、試料
20の10mm上方に配置されたコレクタ24に集めら
れる。ここで、この電流が抵抗Rを通ることによる電位
の変化をオシロスコープ25を用いて観測して放出電流
のピーク値を測定し、このピーク値をもとにオシロスコ
ープの積分演算機能を用いて時間積分することにより放
出電子量を算出する。Hereinafter, the measuring method will be specifically described. First, as shown in FIG. 4, the sample 20 is fixed to the holder 22 in the vacuum chamber 21 and then the upper electrode of the sample 20 is grounded. Next, positive and negative pulse voltages generated by the pulse applying unit 23 are applied to the lower electrode 13. At this time, the applied pulse is ± 200 V and the pulse width is 10 μsec.
Electrons emitted by the application of the pulse voltage are collected by a collector 24 arranged 10 mm above the sample 20. Here, the peak value of the emission current is measured by observing a change in potential caused by the current passing through the resistor R using the oscilloscope 25, and time integration is performed based on the peak value using the integration operation function of the oscilloscope. By doing so, the amount of emitted electrons is calculated.
【0018】ここで、本発明の冷陰極11および従来の
冷陰極について、上述の測定方法に従って得られた測定
結果を対比して図5に示す。図5から読みとれるよう
に、従来の冷陰極では10回程度のパルス電圧の印加に
よって電子の放出量がほぼ0となっている。これは、従
来技術欄においても説明したように、急激な分極反転の
繰り返しにより強誘電体および/または上面電極が劣化
したためと考えられる。一方、保護膜15を形成した本
発明の冷陰極11では、パルス電圧印加回数が1000
回を越えても電圧印加開始当初と同様に電子が放出され
ており、かつその放出量も充分な安定性を有している。
また、保護膜15を形成することにより放出量自体も従
来の冷陰極に比べて3割程度多くなっていることが確認
できる。FIG. 5 shows a comparison between the cold cathode 11 of the present invention and the conventional cold cathode obtained according to the above-described measuring method. As can be seen from FIG. 5, in the conventional cold cathode, the amount of emitted electrons is almost zero by application of a pulse voltage of about 10 times. It is considered that this is because the ferroelectric and / or the top electrode deteriorated due to the repetition of rapid polarization reversal, as described in the section of the prior art. On the other hand, in the cold cathode 11 of the present invention on which the protective film 15 is formed, the pulse voltage application frequency is 1000 times.
Even after the number of times, electrons are emitted as in the beginning of the voltage application, and the amount of emitted electrons is also sufficiently stable.
Further, it can be confirmed that the emission amount itself is increased by about 30% as compared with the conventional cold cathode by forming the protective film 15.
【0019】なお、本実施例では保護膜15の材料とし
てMgOを用いたが、同様に二次電子放出能の高いZn
O、CeO2、Y2O3、BaO、CaO、SrOの各材
料について測定したところ、MgO膜を形成した場合と
同様の効果が得られることが確認できた。また本実施例
では、強誘電体12の表面全面に保護膜15を形成した
が、例えば図6に示すように、強誘電体12、上面電極
13、エアの3つの境界部付近に保護膜を形成すること
によっても同種の効果が得られる。加えて、本実施例で
は強誘電体としてバルク状のPZT薄板を使用したが、
例えばプラズマCVD法等によって形成した薄膜状のP
ZT薄膜を本発明の強誘電体として使用しても構わな
い。In this embodiment, MgO is used as the material of the protective film 15. However, similarly, ZnO having a high secondary electron emission ability is used.
Measurement of each material of O, CeO 2 , Y 2 O 3 , BaO, CaO, and SrO confirmed that the same effect as when the MgO film was formed was obtained. Further, in the present embodiment, the protective film 15 is formed on the entire surface of the ferroelectric material 12, but, for example, as shown in FIG. 6, the protective film is formed near three boundaries between the ferroelectric material 12, the upper electrode 13, and the air. The same effect can be obtained by forming. In addition, in this example, a bulk PZT thin plate was used as the ferroelectric,
For example, a thin film P formed by a plasma CVD method or the like.
A ZT thin film may be used as the ferroelectric of the present invention.
【0020】[0020]
【発明の効果】このように、電子の放出される主面上に
電子放出能の高い材料からなる保護膜を形成することに
より、分極を急激に反転させることによって強誘電体内
部に集中して生じていた作用が保護膜側に分散、緩和さ
れつつ保護膜からの電子放出が行われるので、寿命およ
び放出電子量の安定性のいずれの面においても、従来の
冷陰極よりも格段に優れた強誘電体電子放出冷陰極を得
られる。As described above, by forming the protective film made of a material having a high electron emission ability on the main surface from which electrons are emitted, the polarization is suddenly reversed, so that the concentration is concentrated inside the ferroelectric. Electrons are emitted from the protective film while dispersing and mitigating the effect that has occurred on the protective film side, so that both the lifetime and the stability of the amount of emitted electrons are significantly better than conventional cold cathodes. A ferroelectric electron emission cold cathode can be obtained.
【図面の簡単な説明】[Brief description of the drawings]
【図1】 従来例の強誘電体電子放出冷陰極を示す断面
図である。FIG. 1 is a sectional view showing a conventional ferroelectric electron emission cold cathode.
【図2】 また別の従来例の強誘電体電子放出冷陰極を
示す断面図である。FIG. 2 is a cross-sectional view showing another conventional ferroelectric electron emission cold cathode.
【図3】 本発明の強誘電体電子放出冷陰極を示す断面
図である。FIG. 3 is a sectional view showing a ferroelectric electron emission cold cathode according to the present invention.
【図4】 強誘電体電子放出冷陰極の特性測定装置を示
す概略断面図である。FIG. 4 is a schematic sectional view showing an apparatus for measuring the characteristics of a ferroelectric electron emission cold cathode.
【図5】 本発明の冷陰極と従来の冷陰極の電子放出特
性を比較した比較図である。FIG. 5 is a comparison diagram comparing the electron emission characteristics of the cold cathode of the present invention and a conventional cold cathode.
【図6】 本発明の別の実施例の冷陰極を示す断面図で
ある。FIG. 6 is a sectional view showing a cold cathode according to another embodiment of the present invention.
11 ・・・ 強誘電体電子放出冷陰極 12 ・・・ 強誘電体 13 ・・・ 下面電極 14 ・・・ 上面電極 15 ・・・ 保護膜 11: Ferroelectric electron emission cold cathode 12: Ferroelectric 13: Lower electrode 14: Upper electrode 15: Protective film
Claims (3)
の一方主面に形成される裏面電極と、強誘電体の他方主
面に形成される上面電極とを有してなる強誘電体電子放
出冷陰極であって、 前記上面電極の形成された強誘電体の他方主面上に、電
子放出能の高い材料からなる保護膜を形成したことを特
徴とする強誘電体電子放出冷陰極。1. A ferroelectric comprising: a ferroelectric having spontaneous polarization; a back electrode formed on one main surface of the ferroelectric; and an upper electrode formed on the other main surface of the ferroelectric. And a protective film made of a material having a high electron emission ability is formed on the other main surface of the ferroelectric on which the upper electrode is formed. cathode.
O、CeO2、Y2O3、BaO、CaO、SrOの中か
ら選ばれる少なくとも1種を用いたことを特徴とする請
求項1に記載の強誘電体電子放出冷陰極。2. The material of said protective film is MgO, Zn
O, CeO 2, Y 2 O 3, BaO, CaO, ferroelectric electron emission cold cathode as claimed in claim 1, characterized in that using at least one selected from the group consisting of SrO.
ュ状またはアレイ状に形成されていることを特徴とする
請求項1に記載の強誘電体電子放出冷陰極。3. The ferroelectric electron emission cold cathode according to claim 1, wherein the upper surface electrode is formed in a stripe shape, a mesh shape, or an array shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07034899A JP4114264B2 (en) | 1999-03-16 | 1999-03-16 | Ferroelectric electron emission cold cathode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP07034899A JP4114264B2 (en) | 1999-03-16 | 1999-03-16 | Ferroelectric electron emission cold cathode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000268709A true JP2000268709A (en) | 2000-09-29 |
| JP4114264B2 JP4114264B2 (en) | 2008-07-09 |
Family
ID=13428847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP07034899A Expired - Lifetime JP4114264B2 (en) | 1999-03-16 | 1999-03-16 | Ferroelectric electron emission cold cathode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4114264B2 (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006025175A1 (en) * | 2004-08-30 | 2006-03-09 | Kabushiki Kaisha Toshiba | Display unit |
| US7071628B2 (en) | 2002-11-29 | 2006-07-04 | Ngk Insulators, Ltd. | Electronic pulse generation device |
| JP2006185909A (en) * | 2004-11-30 | 2006-07-13 | Ngk Insulators Ltd | Electron-emitting device |
| US7129642B2 (en) | 2002-11-29 | 2006-10-31 | Ngk Insulators, Ltd. | Electron emitting method of electron emitter |
| JP2007017610A (en) * | 2005-07-06 | 2007-01-25 | Shimadzu Corp | Hydrofluoric acid-resistant protective film and optical element |
| US7187114B2 (en) | 2002-11-29 | 2007-03-06 | Ngk Insulators, Ltd. | Electron emitter comprising emitter section made of dielectric material |
| US7288881B2 (en) | 2002-11-29 | 2007-10-30 | Ngk Insulators, Ltd. | Electron emitter and light emission element |
| CN111755593A (en) * | 2020-06-16 | 2020-10-09 | 欧菲微电子技术有限公司 | Piezoelectric composite material, piezoelectric composite film, preparation method of piezoelectric composite film and piezoelectric device |
-
1999
- 1999-03-16 JP JP07034899A patent/JP4114264B2/en not_active Expired - Lifetime
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7071628B2 (en) | 2002-11-29 | 2006-07-04 | Ngk Insulators, Ltd. | Electronic pulse generation device |
| US7129642B2 (en) | 2002-11-29 | 2006-10-31 | Ngk Insulators, Ltd. | Electron emitting method of electron emitter |
| US7187114B2 (en) | 2002-11-29 | 2007-03-06 | Ngk Insulators, Ltd. | Electron emitter comprising emitter section made of dielectric material |
| US7288881B2 (en) | 2002-11-29 | 2007-10-30 | Ngk Insulators, Ltd. | Electron emitter and light emission element |
| WO2006025175A1 (en) * | 2004-08-30 | 2006-03-09 | Kabushiki Kaisha Toshiba | Display unit |
| JP2006185909A (en) * | 2004-11-30 | 2006-07-13 | Ngk Insulators Ltd | Electron-emitting device |
| JP2007017610A (en) * | 2005-07-06 | 2007-01-25 | Shimadzu Corp | Hydrofluoric acid-resistant protective film and optical element |
| CN111755593A (en) * | 2020-06-16 | 2020-10-09 | 欧菲微电子技术有限公司 | Piezoelectric composite material, piezoelectric composite film, preparation method of piezoelectric composite film and piezoelectric device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4114264B2 (en) | 2008-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20020049630A (en) | field emitter | |
| Benedek et al. | Electron emission from ferroelectric/antiferroelectric cathodes excited by short high-voltage pulses | |
| JP4114264B2 (en) | Ferroelectric electron emission cold cathode | |
| US7723909B2 (en) | Electron emitter formed of a dielectric material characterized by having high mechanical quality factor | |
| JP4678832B2 (en) | light source | |
| US4340840A (en) | DC Gas discharge display panel with internal memory | |
| JP2004146365A (en) | Light emitting device | |
| US10388851B2 (en) | Piezoelectric element | |
| JP2005183361A (en) | Electron emitter, electron-emitting device, display, and light source | |
| JP2017162906A (en) | Piezoelectric element | |
| US20060214557A1 (en) | Light source | |
| Benedek et al. | Correlation between emitted and polarization current in ferroelectric lead lanthanum zirconate titanate ceramics | |
| US20060043863A1 (en) | Electron emitter | |
| KR100845905B1 (en) | Image forming apparatus | |
| US5723954A (en) | Pulsed hybrid field emitter | |
| US7276462B2 (en) | Dielectric composition and dielectric film element | |
| US20080048569A1 (en) | Dielectric element and electron emitter | |
| JPH08264104A (en) | Ferroelectric electron emission cold cathode | |
| JP4753561B2 (en) | Electron emission device | |
| JP3221623B2 (en) | Cold cathode electron pulse emission device | |
| US7576479B2 (en) | Electron emitter | |
| US20050263808A1 (en) | Ferroelectric electron beam source and method for generating electron beams | |
| US20060082317A1 (en) | Electron-emitting apparatus | |
| EP1630842B1 (en) | Electron emitter | |
| US20060082318A1 (en) | Electron-emitting apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20051221 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070712 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070925 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20071011 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080325 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080407 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110425 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110425 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110425 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120425 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130425 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140425 Year of fee payment: 6 |
|
| EXPY | Cancellation because of completion of term |