JP2000261116A - Hardening conductive paste for bump connecting printed wiring board layers - Google Patents
Hardening conductive paste for bump connecting printed wiring board layersInfo
- Publication number
- JP2000261116A JP2000261116A JP11059624A JP5962499A JP2000261116A JP 2000261116 A JP2000261116 A JP 2000261116A JP 11059624 A JP11059624 A JP 11059624A JP 5962499 A JP5962499 A JP 5962499A JP 2000261116 A JP2000261116 A JP 2000261116A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- conductive paste
- curing agent
- wiring board
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Epoxy Resins (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は硬化性導電ペースト
に関し、特に基材との接着力、耐熱性や硬度が要求され
る電子回路成形用に使用する、プリント配線板層間接続
バンプ用硬化性導電ペーストに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a curable conductive paste, and more particularly to a curable conductive paste for use in an electronic circuit molding which requires adhesion to a substrate, heat resistance and hardness. Regarding paste.
【0002】[0002]
【従来の技術】硬化性導電ペーストは、エレクトロニク
ス分野において、IC回路用、導電性接着剤、電磁波シ
ール等、多くの用途に使用されている。特に最近では、
少なくとも一方の面の所定位置に導電ペーストで作った
円錐状導電バンプが設けられた第一の基板と、少なくと
も一方の面に配線パターンが設けられた第二の基板と
を、前記導電バンプが設けられた面および前記配線パタ
ーンが設けられた面を内側にして対向させ、前記第一の
基板と前記第二の基板との間に絶縁体層を配置して積層
体を構成し、該積層体を積層プレスすることにより絶縁
体層の厚さ方向に前記バンプを貫通させて、導電配線部
を形成するプリント配線板の製造方法が提案されてい
る。2. Description of the Related Art Curable conductive pastes are used in the electronics field for many applications such as IC circuits, conductive adhesives, and electromagnetic wave seals. Especially recently,
A first substrate provided with a conical conductive bump made of a conductive paste at a predetermined position on at least one surface and a second substrate provided with a wiring pattern on at least one surface are provided with the conductive bump. The surface provided with the wiring pattern and the surface on which the wiring pattern is provided are opposed to each other, and an insulator layer is arranged between the first substrate and the second substrate to form a laminate. There has been proposed a method of manufacturing a printed wiring board in which conductive bumps are formed by stacking and pressing through the bumps in the thickness direction of the insulator layer to form conductive wiring portions.
【0003】上記の導電バンプの形成には、例えばメラ
ミン樹脂、フェノール樹脂、ポリイミド樹脂等のバイン
ダー成分と、例えば銀、金、銅、半田粉等の導電性粉末
およびこれらの合金粉末と混合して調整された硬化性導
電ペーストが使用されている。In order to form the conductive bumps, a binder component such as melamine resin, phenol resin and polyimide resin is mixed with a conductive powder such as silver, gold, copper, solder powder and alloy powder thereof. A conditioned curable conductive paste is used.
【0004】[0004]
【発明が解決しようする課題】上記プリント配線基板の
製造において、上記硬化性導電ペーストを使用した場
合、次のような問題があった。When the above-mentioned curable conductive paste is used in the production of the above-mentioned printed wiring board, there are the following problems.
【0005】第一の問題は、硬化性導電ペーストから形
成した円錐状バンプの絶縁体層の貫通不良により、接続
不良が生じることである。導電バンプの貫通温度は、各
種絶縁体層により最適な範囲に設定されねばならない
が、例えば比較的軟化点の低いFR−4(米国NEM
A:national electrical manufacuturers associatio
n規格)タイプのガラスクロス入りプリプレグでは、8
0〜120℃の温度範囲で貫通する。このため、この温
度範囲で変形しないレベルのバンプ軟化点、硬度が必要
であり、変形した場合バンプが絶縁体層を貫通できない
ため、層間に接続不良が生じる。[0005] The first problem is that connection failure occurs due to poor penetration of the insulating layer of the conical bump formed from the curable conductive paste. The penetration temperature of the conductive bumps must be set in an optimum range depending on the type of the insulating layers. For example, FR-4 having a relatively low softening point (NEM, USA)
A: national electrical manufacuturers associatio
n standard) type prepreg with glass cloth
It penetrates in a temperature range of 0 to 120 ° C. For this reason, the bump must have a softening point and hardness that do not deform within this temperature range, and if deformed, the bump cannot penetrate the insulator layer, resulting in poor connection between layers.
【0006】第二の問題は、積層プレス時にバンプの割
れによる接続不良や、バンプ先端部の飛びによる回路の
ショートが起きることである。これは、バインダー樹脂
が脆い場合や、導電粉、チクソ付与剤等の充填剤が適切
に配合されていない場合に起きる傾向があった。[0006] The second problem is that a defective connection occurs due to cracking of the bump at the time of laminating press, and a short circuit of the circuit occurs due to a jump of the tip of the bump. This tended to occur when the binder resin was brittle or when fillers such as conductive powder and thixotropy were not properly blended.
【0007】第三の問題は、バンプ突き当て部と配線パ
ターン間の、積層プレス後の接着不良である。バインダ
ー自体の接着力が弱い場合の他、バンプの硬化度が進み
過ぎた場合に起きる傾向があった。[0007] The third problem is poor adhesion between the bump contact portion and the wiring pattern after the laminating press. In addition to the case where the adhesive force of the binder itself is weak, the tendency tends to occur when the degree of curing of the bump is excessively advanced.
【0008】[0008]
【課題を解決するための手段】本発明者らは、上記課題
を解決すべく鋭意研究を重ねた。その結果、硬化性導電
ペーストのバインダー成分として、高接着力のエポキシ
樹脂と温度依存が大きい潜在性硬化剤を使用し、かつ絶
縁層貫通前の導電バンプの硬化度を任意に制御すること
で、本発明を完成するに至った。Means for Solving the Problems The present inventors have intensively studied to solve the above problems. As a result, as a binder component of the curable conductive paste, by using a high adhesive strength epoxy resin and a latent curing agent having a large temperature dependence, and by arbitrarily controlling the degree of curing of the conductive bump before penetrating the insulating layer, The present invention has been completed.
【0009】即ち本発明は、エポキシ樹脂、硬化剤、導
電粉及び溶剤を含み、エポキシ樹脂が、3官能以上の多
官能エポキシ樹脂40〜100重量%と2官能エポキシ
樹脂0〜60重量%とからなり、かつMETTLER FP-90自
動軟化点測定装置で1℃/分の昇温速度で測定した軟化
点が80〜130℃の範囲にあるエポキシ樹脂であり、
硬化剤が潜在性硬化剤であるプリント配線板層間接続バ
ンプ用硬化性導電ペーストに関するものである。That is, the present invention comprises an epoxy resin, a curing agent, a conductive powder, and a solvent, wherein the epoxy resin comprises 40 to 100% by weight of a trifunctional or higher polyfunctional epoxy resin and 0 to 60% by weight of a bifunctional epoxy resin. And an epoxy resin having a softening point in the range of 80 to 130 ° C. measured by a METTLER FP-90 automatic softening point measuring apparatus at a rate of 1 ° C./min.
The present invention relates to a curable conductive paste for a printed wiring board interlayer connection bump, wherein the curing agent is a latent curing agent.
【0010】本発明に用いられるエポキシ樹脂は、ME
TTLER FP−90自動軟化点測定装置で測定した
軟化点が80〜130℃のエポキシ樹脂であり、好まし
くは85〜125℃のエポキシ樹脂である。エポキシ樹
脂の軟化点がこのようであると、バンプの絶縁体貫通性
が良好であり、かつバンプの割れがない点から好まし
い。The epoxy resin used in the present invention is ME
An epoxy resin having a softening point of 80 to 130 ° C., preferably 85 to 125 ° C., as measured by a TTLER FP-90 automatic softening point measuring device. It is preferable that the epoxy resin has such a softening point because the insulator has good penetration of the bumps and there is no crack in the bumps.
【0011】全エポキシ樹脂100重量%中の3官能以
上の多官能エポキシ樹脂の混合割合は、40〜100重
量%が好ましく、特には60〜100重量%が好まし
い。従って2官能のエポキシ樹脂の混合割合は、0〜6
0重量%が好ましく、特には0〜40重量%が好まし
い。3官能以上の多官能エポキシ樹脂の混合割合が上記
のようであると、バンプの硬度が不足せず、また耐熱性
も低下しない。The mixing ratio of the polyfunctional epoxy resin having three or more functional groups in 100% by weight of the total epoxy resin is preferably 40 to 100% by weight, particularly preferably 60 to 100% by weight. Therefore, the mixing ratio of the bifunctional epoxy resin is 0-6.
0% by weight is preferable, and particularly preferably 0 to 40% by weight. When the mixing ratio of the trifunctional or higher polyfunctional epoxy resin is as described above, the hardness of the bump does not become insufficient, and the heat resistance does not decrease.
【0012】上記3官能以上の多官能エポキシ樹脂とし
ては、トリスグリシジル型、テトラグリシジル型及びノ
ボラック型が好ましく、特にノボラック型エポキシ樹脂
が好ましい。また上記2官能エポキシ樹脂としては、例
えばビスフェノール型エポキシ樹脂が好ましく、特に軟
化点100℃以上のビスフェノール型エポキシ樹脂が好
ましい。The trifunctional or higher polyfunctional epoxy resin is preferably a trisglycidyl type, a tetraglycidyl type or a novolak type, particularly preferably a novolak type epoxy resin. As the bifunctional epoxy resin, for example, a bisphenol-type epoxy resin is preferable, and a bisphenol-type epoxy resin having a softening point of 100 ° C. or more is particularly preferable.
【0013】本発明において使用される硬化剤は、潜在
性硬化剤である。潜在性硬化剤とは、エポキシ樹脂に配
合して室温に放置する限りにおいては長時間にわたって
安定であるが、熱の作用で掛け金が外れると直ちに硬化
反応を開始する硬化剤である。このような潜在性硬化剤
としては、ジシアンジアミド、ジアミノジフェニルスル
ホン、多価フェノール、潜在性のイミダゾール等があ
る。潜在性のイミダゾールの例としては、2−フェニル
ー4,5−ヒドロキシメチルイミダゾール、2−フェニ
ルー4−メチルー5−ヒドロキシメチルイミダゾール、
2.4−ジアミノー6−[2′メチルイミダゾールー
(1′)]−エチル−S−トリアジンイソシアヌル酸付
加物、2−ヘプタデシルイミダゾール等がある。上記潜
在硬化剤の中では、2−フェニルー4,5−ヒドロキシ
メチルイミダゾールが好ましい。[0013] The curing agent used in the present invention is a latent curing agent. A latent curing agent is a curing agent that is stable for a long time as long as it is blended with an epoxy resin and left at room temperature, but starts a curing reaction immediately after the latch is released by the action of heat. Such latent curing agents include dicyandiamide, diaminodiphenylsulfone, polyhydric phenols, latent imidazole, and the like. Examples of latent imidazoles include 2-phenyl-4,5-hydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole,
2. 4-Diamino-6- [2'-methylimidazole- (1 ')]-ethyl-S-triazine isocyanuric acid adduct, 2-heptadecylimidazole and the like. Among the latent curing agents, 2-phenyl-4,5-hydroxymethylimidazole is preferred.
【0014】これらの硬化剤は、各々単独でまたは併用
して使用することができる。これらの硬化剤はポットラ
イフが長い、バンプ硬化度のコントロールがし易い、プ
リント配線版と同等な硬化温度である、ボイドの原因と
なるような副生成物の量が極めて少ないなどの理由か
ら、本発明の硬化剤として適している。These curing agents can be used alone or in combination. These curing agents have a long pot life, easy control of the degree of bump curing, a curing temperature equivalent to that of a printed wiring board, and an extremely small amount of by-products that cause voids. Suitable as the curing agent of the present invention.
【0015】上記硬化剤の添加量は、使用する硬化剤の
種類に応じて、通常使用される量を選択すれば良い。一
般にエポキシ樹脂のエポキシ基1当量に対して0.3〜
1.1当量、好ましくは0.4〜1.0当量である。硬
化剤の添加量が上記のようであると、得られる硬化体の
架橋密度が小さくならず、且つ十分な耐熱性、硬度およ
び良好な導電性が得られる。The amount of the curing agent to be added may be selected in a usual amount according to the type of the curing agent to be used. Generally, 0.3 to 1 equivalent of epoxy group of epoxy resin.
1.1 equivalent, preferably 0.4 to 1.0 equivalent. When the addition amount of the curing agent is as described above, the crosslinked density of the obtained cured product does not decrease, and sufficient heat resistance, hardness, and good conductivity are obtained.
【0016】導電性ペーストの耐熱性の指標であるガラ
ス転移点(Tg)は、好ましくは135〜200℃、更
には150〜180℃が好ましい。また硬度は、30〜
45程度が好ましい。硬度がこの程度であると、導電性
バンプが絶縁体層を貫通することができ、かつ脆くなら
ない。The glass transition point (Tg), which is an index of the heat resistance of the conductive paste, is preferably 135 to 200 ° C., more preferably 150 to 180 ° C. The hardness is 30 ~
About 45 is preferable. When the hardness is at this level, the conductive bump can penetrate the insulator layer and does not become brittle.
【0017】本発明においては、イミダゾール、アミン
アダクト等の硬化促進剤を併用することが好ましい。バ
ンプ印刷後、溶剤を除去するためバンプを乾燥するが、
この乾燥中に絶縁層を貫通できるバンプ硬度にするとと
もに、貫通後FR4と同じプレス条件で、突き当て部の
配線パターンとバンプが強く接着できる硬化度に制御す
る必要がある。硬化剤と硬化促進剤を併用することで、
硬化度の制御がし易さくなる。硬化促進剤の使用量は、
エポキシ樹脂及び硬化剤の種類により異なるが、エポキ
シ樹脂100重量部に対し0.05〜3重量部程度が適
当である。In the present invention, it is preferable to use a curing accelerator such as imidazole or amine adduct in combination. After printing the bump, dry the bump to remove the solvent,
It is necessary to have a bump hardness that allows the insulating layer to penetrate during the drying, and to control the degree of curing that allows the wiring pattern of the abutting portion and the bump to strongly adhere under the same pressing conditions as FR4 after the penetration. By using a curing agent and a curing accelerator together,
It becomes easy to control the degree of curing. The amount of curing accelerator used is
Depending on the type of the epoxy resin and the curing agent, about 0.05 to 3 parts by weight is appropriate for 100 parts by weight of the epoxy resin.
【0018】本発明においては、導電粉としては例え
ば、銀、金、銅、半田粉等の金属粉末、これらの合金粉
末もしくは混合金属粉末を使用できる。これらのなかで
は、硬度の点で銀および銅が好ましい。使用される導電
粉量は、エポキシ樹脂と硬化剤との合計量100重量部
に対して、300〜1900重量部、好ましくは400
〜1000重量部の割合で用いられる。In the present invention, as the conductive powder, for example, metal powder such as silver, gold, copper, solder powder, alloy powder or mixed metal powder thereof can be used. Among these, silver and copper are preferred in terms of hardness. The amount of the conductive powder used is 300 to 1900 parts by weight, preferably 400 parts by weight, based on 100 parts by weight of the total amount of the epoxy resin and the curing agent.
It is used in a proportion of up to 1000 parts by weight.
【0019】導電粉割合が上記のようであると、良好な
導電性が得られると同時に、ペーストの流動性が低下し
ないので印刷性が悪くならず、また得られる硬化体の金
属粉の結合力が十分なのでバンプの割れやバンプ先端部
の飛びが生じにくくなり、接続不良や短絡も発生しない
ので好ましい。When the proportion of the conductive powder is as described above, good conductivity can be obtained, and at the same time, the fluidity of the paste does not decrease so that the printability does not deteriorate. Is sufficient because cracking of the bump and jumping of the tip of the bump are less likely to occur, and connection failure and short circuit do not occur.
【0020】本発明における溶剤としては、公知のもの
が特に制限なく使用できる。例えば、酢酸エチル、酢酸
ブチル等のエステル類、エチルセロソルブ、ブチルセロ
ソルブ等のセロソルブ類、エチルカルビトール、ブチル
カルビトール等のカルビトール類、イソプロパノール、
ブタノール等のアルコール類が挙げられる。上記溶剤は
単独でも、あるいは2種類以上を混合して使用しても良
いが、スクリーン印刷でバンプを形成する場合は、版乾
きを考慮してカルビトール類及びセロソルブ類が好まし
い。溶剤の使用量は目標粘度により変化するが、通常は
ペースト全体の5%から15%程度である。As the solvent in the present invention, known solvents can be used without any particular limitation. For example, ethyl acetate, esters such as butyl acetate, ethyl cellosolve, cellosolves such as butyl cellosolve, ethyl carbitol, carbitols such as butyl carbitol, isopropanol,
Alcohols such as butanol. The above-mentioned solvents may be used alone or as a mixture of two or more kinds. However, when bumps are formed by screen printing, carbitols and cellosolves are preferable in consideration of plate drying. The amount of the solvent used varies depending on the target viscosity, but is usually about 5% to 15% of the whole paste.
【0021】本発明においては、その特性を著しく低下
させない範囲で、公知の添加剤を配合することができ
る。かかる添加剤としては、例えば、チクソトロピー付
与剤、消泡剤、分散剤、防錆剤、還元剤等が挙げられ
る。In the present invention, known additives can be blended as long as their properties are not significantly reduced. Such additives include, for example, thixotropy-imparting agents, defoamers, dispersants, rust inhibitors, reducing agents, and the like.
【0022】本発明の硬化性導電ペーストの製造方法は
特に制限されないが、たとえば上記エポキシ樹脂、硬化
剤、導電性粉及び溶剤を予備混合し、三本ロールを用い
て混練し、ペーストを得て、真空下脱泡するなどの方法
がある。The method for producing the curable conductive paste of the present invention is not particularly limited. For example, the above-mentioned epoxy resin, curing agent, conductive powder and solvent are premixed and kneaded using a three-roll mill to obtain a paste. And degassing under vacuum.
【0023】本発明において、マルコム社製スパイラル
粘度計で10回転/分、25℃で測定した硬化性導電ペ
ーストの粘度は、好ましくは1000〜3500Pa・
sであり、より好ましくは1500〜3000Pa・s
が適当である。In the present invention, the viscosity of the curable conductive paste measured at 25 ° C. at 10 rotations / minute with a spiral viscometer manufactured by Malcolm Co. is preferably 1000 to 3500 Pa · s.
s, more preferably 1500 to 3000 Pa · s
Is appropriate.
【0024】また、log(10min−1粘度/5m
in−1粘度)log(5/10)で計算するチクソ比
は、静置している間は見掛け粘度が上がって顔料の沈降
を防ぎ、激しくかき混ぜれば見掛け粘度が低下して塗り
易くなる性質を表すものであり、好ましくは0.2〜
1.0であり、さらに好ましくは0.3〜0.9であ
る。In addition, log (10 min-1 viscosity / 5 m
The thixo ratio calculated by (in-1 viscosity) log (5/10) is such that the apparent viscosity increases while standing and prevents sedimentation of the pigment, and the viscous stirring lowers the apparent viscosity to make it easier to apply. And preferably represents 0.2 to
1.0, and more preferably 0.3 to 0.9.
【0025】硬化性導電ペーストの粘度およびチクソ比
が上記のようであると、スクリーンへの濡れが良く、版
の穴も通り易く、また印刷した時十分なバンプ高さが得
られる。When the viscosity and the thixo ratio of the curable conductive paste are as described above, the screen is well wetted, the holes in the plate are easily passed, and a sufficient bump height is obtained when printing.
【0026】本発明の硬化性導電ペーストは特に限定さ
れず、スクリーン印刷、ディスペンサー等の公知の方法
で印刷することができるが、スクリーン印刷が好まし
い。The curable conductive paste of the present invention is not particularly limited, and can be printed by a known method such as screen printing or a dispenser. Screen printing is preferred.
【0027】[0027]
【発明の実施の形態】以下実施例を用いて本発明を具体
的に説明するが、本発明はこれらの実施例により限定さ
れるものではない。なお、配合割合は重量部であり、評
価や測定は次の方法に従った。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. The mixing ratio is part by weight, and the evaluation and measurement were performed according to the following methods.
【0028】(1)軟化点 エポキシ樹脂を熔融し、METTLER FP−90自
動軟化点測定装置で1℃/分の昇温速度で測定した。(1) Softening Point The epoxy resin was melted and measured at a heating rate of 1 ° C./min using a METTLER FP-90 automatic softening point measuring apparatus.
【0029】(2)ガラス転移点(Tg) ペーストを銅箔のS面(電解法銅箔の回転陰極側光沢の
ある面)に300μm厚みに塗布した後、160℃で2
0分乾燥した。塗布面にS面を下にした銅箔を載せ、プ
レスで170℃、60分間硬化しサンプルとした。ガラ
ス転移点(Tg)は、示差走査熱量測定(DSC)によ
り、昇温速度10℃/分で測定した。(2) Glass transition point (Tg) The paste was applied to the S surface of the copper foil (the glossy surface on the rotating cathode side of the electrolytic copper foil) to a thickness of 300 μm.
Dried for 0 minutes. A copper foil with the S side facing down was placed on the application surface, and cured by pressing at 170 ° C. for 60 minutes to obtain a sample. The glass transition point (Tg) was measured by differential scanning calorimetry (DSC) at a heating rate of 10 ° C./min.
【0030】(3)硬度 ペーストを銅箔のM面(電解法銅箔の電解液側光沢のな
い面)に300μm厚みに塗布した後、160℃で20
分乾燥しサンプルとした。硬度は微少硬度計MXT50
(松沢製機(株))で、試験温度23℃、試験荷重25
kgf、荷重保持時間15秒で測定した。(3) Hardness After applying the paste to the M surface of the copper foil (the surface of the electrolytic copper foil having no gloss on the electrolyte side) to a thickness of 300 μm, the paste was heated at 160 ° C. for 20 minutes.
The sample was dried to obtain a sample. Hardness is micro hardness tester MXT50
(Matsuzawa Seiki Co., Ltd.), test temperature 23 ° C, test load 25
The measurement was performed at kgf and a load holding time of 15 seconds.
【0031】(4)銅箔引き剥がし強さ ペーストを銅箔のM面に300μm厚みに塗布した後、
160℃で20分乾燥した。塗布面にM面を下にして銅
箔を載せ、プレスで170℃、60分間硬化しサンプル
とした。JIS C6481に準じて、銅箔引き剥がし
強さ(N/cm)を測定した。(4) Peeling strength of copper foil After applying the paste to the M surface of the copper foil to a thickness of 300 μm,
Dried at 160 ° C. for 20 minutes. A copper foil was placed on the application side with the M side facing down, and cured with a press at 170 ° C. for 60 minutes to obtain a sample. The copper foil peeling strength (N / cm) was measured according to JIS C6481.
【0032】(5)印刷性 導電性ペーストを、直径0.3mmの孔を所定の位置に穿
設してなる厚さ0.5mmのメタルスクリーン板を通し
て、厚さ18μmの電解銅箔に印刷した。 良好:メタルスクリーンの全孔を通してバンプが印刷で
き、形状・塗布高さが揃っている。 不良:メタルスクリーンの一部の孔に詰まりがあり、全
孔で印刷できない。或いは形状・塗布高さがばらついて
いる。(5) Printability The conductive paste was printed on an 18 μm-thick electrolytic copper foil through a 0.5 mm-thick metal screen plate having holes of 0.3 mm in diameter at predetermined positions. . Good: Bumps can be printed through all holes of the metal screen, and the shape and application height are uniform. Bad: Some holes in the metal screen are clogged, and printing is not possible with all holes. Or, the shape and application height vary.
【0033】(6)貫通性 厚さ18μmの電解銅箔に、直径0.3mmの孔を所定の
位置に穿設してなる厚さ0.5mmのメタルスクリーン板
を通して、導電性ペーストを印刷した。印刷した導電ペ
ーストを、160℃で10分間乾燥処理した後、同一メ
タルスクリーン板を用いて、同一位置に印刷、乾燥処理
を3回繰り返した。3回目印刷後は160℃で20分間
乾燥し、円錐状の導電性バンプを形成した。その後、導
電性バンプを設けた電解銅箔に、エポキシ樹脂をガラス
クロスに含浸したFR4タイプのプリプレグを載せ、専
用の貫通機を通してバンプをプリプレグに貫通させ貫通
性をみた。 良好:全バンプがプリプレグを貫通し、突き出たバンプ
部分の形・高さが揃っている。 不良:プリプレグを貫通していないバンプがある。(6) Penetration A conductive paste was printed on a 18-μm-thick electrolytic copper foil through a 0.5-mm-thick metal screen plate in which holes having a diameter of 0.3 mm were formed at predetermined positions. . The printed conductive paste was dried at 160 ° C. for 10 minutes, and then printed and dried at the same position using the same metal screen plate three times. After the third printing, drying was performed at 160 ° C. for 20 minutes to form conical conductive bumps. Then, an FR4 type prepreg impregnated with an epoxy resin in a glass cloth was placed on the electrolytic copper foil provided with the conductive bumps, and the bumps were pierced through the prepreg through a special penetrating machine to check the penetrability. Good: All bumps penetrate the prepreg, and the shape and height of the protruding bumps are uniform. Bad: Some bumps do not penetrate the prepreg.
【0034】[0034]
【実施例1】軟化点95℃のナフタレンノボラック型エ
ポキシ樹脂(日本化薬(株)製NC7000)70部、
及び軟化点125℃のビスフェノールA型エポキシ樹脂
(三井化学(株)製R367)30部を、酢酸ジエチレ
ングリコールモノブチルエーテル70部に、130℃加
熱下混合し溶解する。25℃に冷却した樹脂溶液にジア
ミノジフェニルスルホン19部、2−フェニル−4,5
−ジヒドロキシメチルイミダゾール0.5部、銀粉67
7部、及びアエロジル(#200)18部を加え、万能
混合器で30分予備混合する。その後三本ロールで混練
して導電ペーストを得た。Example 1 70 parts of a naphthalene novolak type epoxy resin having a softening point of 95 ° C. (NC7000 manufactured by Nippon Kayaku Co., Ltd.)
And 30 parts of bisphenol A type epoxy resin (R367 manufactured by Mitsui Chemicals, Inc.) having a softening point of 125 ° C. are mixed and dissolved in 70 parts of diethylene glycol monobutyl ether acetate at 130 ° C. while heating. 19 parts of diaminodiphenyl sulfone and 2-phenyl-4,5 were added to the resin solution cooled to 25 ° C.
-0.5 parts of dihydroxymethyl imidazole, silver powder 67
7 parts and 18 parts of Aerosil (# 200) are added and premixed with a universal mixer for 30 minutes. Thereafter, the mixture was kneaded with three rolls to obtain a conductive paste.
【0035】得られた導電ペーストについて前記記載の
方法で、粘度、チクソ比、硬度、ピール強度、印刷性、
バンプの一回印刷高さ、及びバンプのプリプレグ貫通性
を測定した。結果を表1に示した。The viscosity, thixotropy, hardness, peel strength, printability,
The height of one-time printing of the bump and the prepreg penetration of the bump were measured. The results are shown in Table 1.
【0036】[0036]
【実施例2〜5】表1のような配合組成を有し、実施例
1と同様の操作で実施例2〜5の導電ペーストを得た。
得られた導電ペーストについて前記記載の方法で粘度・
チクソ比、硬度、ピール強度、印刷性、バンプの一回印
刷高さ、及び貫通性を測定した。結果を表1に示した。Examples 2 to 5 Conductive pastes of Examples 2 to 5 having the composition shown in Table 1 were obtained in the same manner as in Example 1.
The viscosity of the obtained conductive paste was determined by the method described above.
The thixo ratio, hardness, peel strength, printability, one-time printing height of the bump, and penetration were measured. The results are shown in Table 1.
【0037】[0037]
【比較例1】軟化点125℃のビスフェノールA型エポ
キシ樹脂(三井化学(株)製R367)100部を、酢
酸ジエチレングリコールモノブチルエーテル70部に、
130℃加熱下混合し溶解する。25℃に冷却した樹脂
溶液にジシアンジアミド1部、2−フェニルー4,5−
ジヒドロキシメチルイミダゾール0.25部、銀粉55
0部、及びアエロジル(#200)14部を加えた以外
は、実施例1と同様に混合し、導電ペーストを得た。得
られた導電ペーストについて前記記載の方法で、粘度、
チクソ比、硬度、ピール強度、印刷性、バンプの一回印
刷高さ、及びプリプレグ貫通性を測定した。結果を表1
に示した。Comparative Example 1 100 parts of bisphenol A type epoxy resin (R367 manufactured by Mitsui Chemicals, Inc.) having a softening point of 125 ° C. was added to 70 parts of diethylene glycol monobutyl ether acetate.
Mix and dissolve under heating at 130 ° C. To the resin solution cooled to 25 ° C., 1 part of dicyandiamide, 2-phenyl-4,5-
0.25 parts of dihydroxymethyl imidazole, silver powder 55
A conductive paste was obtained by mixing in the same manner as in Example 1 except that 0 parts and 14 parts of Aerosil (# 200) were added. By the method described above for the obtained conductive paste, the viscosity,
The thixo ratio, hardness, peel strength, printability, one-time printing height of the bump, and prepreg penetration were measured. Table 1 shows the results
It was shown to.
【0038】[0038]
【比較例2〜3】表1のような配合組成および比較例1
と同様の操作で、比較例2〜3の導電ペーストを得た。
得られた導電ペーストについて前記記載の方法で、粘
度、チクソ比、硬度、ピール強度、印刷性、バンプの一
回印刷高さ、及びプリプレグ貫通性を測定した。結果を
表1に示した。COMPARATIVE EXAMPLES 2-3 The composition shown in Table 1 and Comparative Example 1
In the same manner as in the above, conductive pastes of Comparative Examples 2 and 3 were obtained.
The obtained conductive paste was measured for viscosity, thixotropy, hardness, peel strength, printability, bump single-print height, and prepreg penetrability by the methods described above. The results are shown in Table 1.
【0039】表中の略号は、それぞれ次を意味する。エポキシ樹脂 R367:BPA型固形エホ゜キシ樹脂(SP=125℃)、三井化学
(株)製 VG3101:3官能型エホ゜キシ樹脂(SP=61℃)、三井化学
(株)製 NC7000:ナフタレン型ノホ゛ラックエホ゜キシ樹脂(SP=95℃)、日本化
薬(株)製 EOCN104S:オルソクレソ゛ール型ノホ゛ラックエホ゜キシ樹脂(SP=96℃)、
日本化薬(株)製硬化剤 PSM4326:フェノールノホ゛ラック樹脂、群栄化学(株)製 DDS:シ゛アミノシ゛フェニルスルホン Dicy:シ゛シアンシ゛アミト゛硬化促進剤 2PHZ:2-フェニルー4,5-シ゛ヒト゛ロキシメチルイミタ゛ソ゛ール、四国化成
(株)製 PN23:エホ゜キシアミンアタ゛クト、味の素(株)製The abbreviations in the table mean the following, respectively. Epoxy resin R367: BPA type solid epoxy resin (SP = 125 ° C), Mitsui Chemicals, Inc. VG3101: Trifunctional type epoxy resin (SP = 61 ° C), Mitsui Chemicals, Inc. NC7000: Naphthalene type novolak epoxy resin ( SP = 95 ° C), Nippon Kayaku Co., Ltd. EOCN104S: Orthocresol type novolak epoxy resin (SP = 96 ° C),
Curing agent PSM4326 manufactured by Nippon Kayaku Co. , Ltd .: Phenol novolac resin, DDS manufactured by Gunei Chemical Co., Ltd. Dcy: aminoaminophenyl sulphone Dicy: cyanocyanic acid amido hardening accelerator 2PHZ: 2-phenyl-4,5-thiocyanoxymethyl imitasol, Shikoku Chemicals Co., Ltd. ) PN23: Ethoxyamine Attach, manufactured by Ajinomoto Co., Inc.
【0040】[0040]
【発明の効果】本発明の硬化性導電ペーストを使用する
と、印刷性が良好であり且つバンプを高く印刷出来る。
また、バンプ貫通性が良好でありながら、貫通後のバン
プと配線パターンとの接着力が大きく、かつ高耐熱性の
貫通型の導電配線部を製造することができる。この結
果、貫通型の導電配線部を有するプリント配線板製造に
おいて、歩留まりが向上するとともに接続信頼性が向上
する。When the curable conductive paste of the present invention is used, printability is good and bumps can be printed at a high level.
In addition, it is possible to manufacture a penetrating conductive wiring portion which has a good adhesiveness between the bump and the wiring pattern after penetrating and has high heat resistance while having good bump penetration. As a result, in manufacturing a printed wiring board having a penetrating conductive wiring portion, the yield is improved and the connection reliability is improved.
【0041】[0041]
【表1】 [Table 1]
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4J036 AA05 AD08 AF05 AF06 AF08 DA04 DA05 DA10 DB06 DC03 DC10 DC31 DC41 FA02 FA05 FA10 KA03 5E317 AA21 BB01 BB11 BB12 BB13 BB14 BB18 BB19 BB25 CC22 CD21 CD36 GG05 GG16 GG20 ──────────────────────────────────────────────────続 き Continued on front page F term (reference) 4J036 AA05 AD08 AF05 AF06 AF08 DA04 DA05 DA10 DB06 DC03 DC10 DC31 DC41 FA02 FA05 FA10 KA03 5E317 AA21 BB01 BB11 BB12 BB13 BB14 BB18 BB19 BB25 CC22 CD21 CD36 GG05 GG16GG20
Claims (4)
含み、エポキシ樹脂が、3官能以上の多官能エポキシ樹
脂40〜100重量%と2官能エポキシ樹脂0〜60重
量%とからなり、かつMETTLER FP-90自動軟化点測定装
置で1℃/分の昇温速度で測定した軟化点が80〜13
0℃の範囲にあるエポキシ樹脂であり、硬化剤が潜在性
硬化剤であるプリント配線板層間接続バンプ用硬化性導
電ペースト。1. An epoxy resin comprising an epoxy resin, a curing agent, a conductive powder and a solvent, wherein the epoxy resin comprises 40 to 100% by weight of a polyfunctional epoxy resin having three or more functions and 0 to 60% by weight of a bifunctional epoxy resin, and METTLER FP-90 automatic softening point measuring device has a softening point of 80 to 13 measured at a heating rate of 1 ° C / min.
A curable conductive paste for printed circuit board interlayer connection bumps, which is an epoxy resin at a temperature of 0 ° C. and a curing agent is a latent curing agent.
ジアミノジフェニルスルホン、多価フェノール、潜在性
イミダゾールから選ばれた少なくとも1種であることを
特徴とする、請求項1に記載のプリント配線板層間接続
バンプ用硬化性導電ペースト。2. The method according to claim 1, wherein the latent curing agent is dicyandiamide,
The curable conductive paste according to claim 1, wherein the paste is at least one selected from diaminodiphenyl sulfone, polyhydric phenol, and latent imidazole.
樹脂と硬化剤の合計量100重量部に対し、300〜1
900重量部の割合で含まれることを特徴とする、請求
項1に記載のプリント配線板層間接続バンプ用硬化性導
電ペースト。3. The conductive powder is silver powder or copper powder, and 300 to 1 parts by weight based on 100 parts by weight of the total amount of the epoxy resin and the curing agent.
The curable conductive paste for a printed wiring board interlayer connection bump according to claim 1, wherein the curable conductive paste is contained in a proportion of 900 parts by weight.
Pa・sであり、チクソ比が0.2〜1.0であること
を特徴とする、請求項1〜3のいずれかに記載のプリン
ト配線板層間接続バンプ用硬化性導電ペースト。4. A viscosity at 25 ° C. of 1,000 to 3,500.
The curable conductive paste for a printed wiring board interlayer connection bump according to any one of claims 1 to 3, wherein Pa · s and a thixotropy ratio are 0.2 to 1.0.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05962499A JP4173241B2 (en) | 1999-03-08 | 1999-03-08 | Curable conductive paste for printed circuit board interlayer connection bumps |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05962499A JP4173241B2 (en) | 1999-03-08 | 1999-03-08 | Curable conductive paste for printed circuit board interlayer connection bumps |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000261116A true JP2000261116A (en) | 2000-09-22 |
| JP4173241B2 JP4173241B2 (en) | 2008-10-29 |
Family
ID=13118595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05962499A Expired - Fee Related JP4173241B2 (en) | 1999-03-08 | 1999-03-08 | Curable conductive paste for printed circuit board interlayer connection bumps |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4173241B2 (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001266643A (en) * | 2000-03-23 | 2001-09-28 | Ibiden Co Ltd | Conductive paste |
| JP2005281488A (en) * | 2004-03-30 | 2005-10-13 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg and laminated plate |
| JP2012119549A (en) * | 2010-12-02 | 2012-06-21 | Sumitomo Bakelite Co Ltd | Conductive resin composition for bump formation |
| JP2012164696A (en) * | 2011-02-03 | 2012-08-30 | Sumitomo Bakelite Co Ltd | Conductive paste for bump formation |
| JP5018985B1 (en) * | 2011-06-17 | 2012-09-05 | パナソニック株式会社 | Wiring board and method for manufacturing wiring board |
| JP2012186254A (en) * | 2011-03-04 | 2012-09-27 | Sumitomo Bakelite Co Ltd | Manufacturing method of multilayer wiring board |
| WO2012147313A1 (en) * | 2011-04-27 | 2012-11-01 | パナソニック株式会社 | Method for producing circuit board |
| JP2012244075A (en) * | 2011-05-23 | 2012-12-10 | Sumitomo Bakelite Co Ltd | Conductive resin composition and multilayer wiring board |
| WO2013014918A1 (en) * | 2011-07-27 | 2013-01-31 | パナソニック株式会社 | Method for manufacturing reusable paste, reusable paste, and method for manufacturing wiring substrate using reusable paste |
| JP2013021019A (en) * | 2011-07-07 | 2013-01-31 | Sumitomo Bakelite Co Ltd | Conductive paste and multilayer wiring board |
| JP2020200389A (en) * | 2019-06-10 | 2020-12-17 | 株式会社Adeka | Curable resin composition |
-
1999
- 1999-03-08 JP JP05962499A patent/JP4173241B2/en not_active Expired - Fee Related
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001266643A (en) * | 2000-03-23 | 2001-09-28 | Ibiden Co Ltd | Conductive paste |
| JP2005281488A (en) * | 2004-03-30 | 2005-10-13 | Sumitomo Bakelite Co Ltd | Resin composition, prepreg and laminated plate |
| JP2012119549A (en) * | 2010-12-02 | 2012-06-21 | Sumitomo Bakelite Co Ltd | Conductive resin composition for bump formation |
| JP2012164696A (en) * | 2011-02-03 | 2012-08-30 | Sumitomo Bakelite Co Ltd | Conductive paste for bump formation |
| JP2012186254A (en) * | 2011-03-04 | 2012-09-27 | Sumitomo Bakelite Co Ltd | Manufacturing method of multilayer wiring board |
| JP5229438B2 (en) * | 2011-04-27 | 2013-07-03 | パナソニック株式会社 | Reuse paste manufacturing method and reuse paste |
| CN103125150A (en) * | 2011-04-27 | 2013-05-29 | 松下电器产业株式会社 | Manufacturing method of recycled paste and recycled paste |
| WO2012147314A1 (en) * | 2011-04-27 | 2012-11-01 | パナソニック株式会社 | Method for producing reuse paste and reuse paste |
| WO2012147313A1 (en) * | 2011-04-27 | 2012-11-01 | パナソニック株式会社 | Method for producing circuit board |
| US8561294B2 (en) | 2011-04-27 | 2013-10-22 | Panasonic Corporation | Method of manufacturing circuit board |
| JP5229437B2 (en) * | 2011-04-27 | 2013-07-03 | パナソニック株式会社 | Wiring board manufacturing method |
| JP2012244075A (en) * | 2011-05-23 | 2012-12-10 | Sumitomo Bakelite Co Ltd | Conductive resin composition and multilayer wiring board |
| WO2012172757A1 (en) * | 2011-06-17 | 2012-12-20 | パナソニック株式会社 | Wiring board and wiring board manufacturing method |
| JP5018985B1 (en) * | 2011-06-17 | 2012-09-05 | パナソニック株式会社 | Wiring board and method for manufacturing wiring board |
| TWI412304B (en) * | 2011-06-17 | 2013-10-11 | 松下電器產業股份有限公司 | Wiring substrate and wiring substrate manufacturing method |
| US8658910B2 (en) | 2011-06-17 | 2014-02-25 | Panasonic Corporation | Circuit board and method of manufacturing the circuit board |
| JP2013021019A (en) * | 2011-07-07 | 2013-01-31 | Sumitomo Bakelite Co Ltd | Conductive paste and multilayer wiring board |
| CN103181248A (en) * | 2011-07-27 | 2013-06-26 | 松下电器产业株式会社 | Method for manufacturing reusable paste, reusable paste, and method for manufacturing wiring substrate using reusable paste |
| JP5304963B2 (en) * | 2011-07-27 | 2013-10-02 | パナソニック株式会社 | Reuse paste manufacturing method, reuse paste, and wiring board manufacturing method using reuse paste |
| WO2013014918A1 (en) * | 2011-07-27 | 2013-01-31 | パナソニック株式会社 | Method for manufacturing reusable paste, reusable paste, and method for manufacturing wiring substrate using reusable paste |
| JP2020200389A (en) * | 2019-06-10 | 2020-12-17 | 株式会社Adeka | Curable resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4173241B2 (en) | 2008-10-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1951836B1 (en) | Anisotropic conductive adhesive compositions | |
| JP4355044B2 (en) | Curable conductive paste | |
| JP4173241B2 (en) | Curable conductive paste for printed circuit board interlayer connection bumps | |
| JP4053744B2 (en) | Adhesive composition for semiconductor device and adhesive sheet for semiconductor device using the same | |
| JP4365053B2 (en) | Conductive paste composition and printed wiring board | |
| JP5405959B2 (en) | Epoxy resin composition and adhesive film thereby | |
| JP2009212096A (en) | Multilayer wiring board and manufacturing method thereof | |
| JP2005146043A (en) | Anisotropic conductive adhesive | |
| JP4110589B2 (en) | Circuit connection member and circuit board manufacturing method | |
| JP2017203109A (en) | Resin composition containing conductive particle and electronic device including the resin composition | |
| JPH021789A (en) | Epoxy resin adhesive and electrical circuit board | |
| JP2000192000A (en) | Electrically conductive adhesive | |
| JPH10298525A (en) | Anisotropic conductive adhesive resin composition and anisotropic conductive adhesive film | |
| KR101862734B1 (en) | Material for bonding electronic component, and method for bonding electronic component | |
| JP2009299079A (en) | Connecting member for circuit, and circuit board | |
| JPWO2017043455A1 (en) | Conductive adhesive composition, conductive adhesive sheet and wiring device using the same | |
| JP2002270033A (en) | Conductive paste composition and printed wiring board | |
| JP3659348B2 (en) | Bump formation method | |
| JP5691450B2 (en) | Conductive resin composition for bump formation | |
| JP4718824B2 (en) | Epoxy-based curable composition and method for producing electronic component | |
| JP2006028521A (en) | Addhesive for circuit connection | |
| JP6716676B2 (en) | Resin composition, adhesive tape, method for producing resin composition and method for producing adhesive tape | |
| TW202519571A (en) | Conductive composition | |
| JP2900048B2 (en) | Glass cloth / epoxy sheet with adhesive layer | |
| JP3653640B2 (en) | IC card circuit board |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050715 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070817 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070904 |
|
| RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20071102 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20080318 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20080514 |
|
| A911 | Transfer of reconsideration by examiner before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20080627 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20080722 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20080813 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110822 Year of fee payment: 3 |
|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110822 Year of fee payment: 3 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110822 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120822 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130822 Year of fee payment: 5 |
|
| LAPS | Cancellation because of no payment of annual fees |