JP2000114720A - Manufacture of layered printed wiring board - Google Patents
Manufacture of layered printed wiring boardInfo
- Publication number
- JP2000114720A JP2000114720A JP27999298A JP27999298A JP2000114720A JP 2000114720 A JP2000114720 A JP 2000114720A JP 27999298 A JP27999298 A JP 27999298A JP 27999298 A JP27999298 A JP 27999298A JP 2000114720 A JP2000114720 A JP 2000114720A
- Authority
- JP
- Japan
- Prior art keywords
- printed wiring
- wiring board
- laminated
- laminated printed
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 27
- 239000002184 metal Substances 0.000 claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims abstract description 54
- 239000011888 foil Substances 0.000 claims abstract description 43
- 230000003746 surface roughness Effects 0.000 claims abstract description 27
- 238000000034 method Methods 0.000 claims abstract description 22
- 238000010438 heat treatment Methods 0.000 claims description 13
- 238000003825 pressing Methods 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 82
- 239000011889 copper foil Substances 0.000 abstract description 51
- 239000010949 copper Substances 0.000 abstract description 29
- 229910052802 copper Inorganic materials 0.000 abstract description 29
- 230000008602 contraction Effects 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 description 32
- 239000011347 resin Substances 0.000 description 32
- 238000012545 processing Methods 0.000 description 15
- 238000007731 hot pressing Methods 0.000 description 11
- 239000004020 conductor Substances 0.000 description 7
- 239000002131 composite material Substances 0.000 description 6
- 238000010030 laminating Methods 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 102100037888 DnaJ homolog subfamily B member 12 Human genes 0.000 description 1
- 101000805849 Homo sapiens DnaJ homolog subfamily B member 12 Proteins 0.000 description 1
- 101150000971 SUS3 gene Proteins 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- -1 etc.) Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】この発明は、絶縁層と配線層
を積層した積層プリント配線板の製造方法に関し、特
に、介挿体で挟んで加熱プレスして形成する積層プリン
ト配線板の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a laminated printed wiring board in which an insulating layer and a wiring layer are laminated, and more particularly, to a method for manufacturing a laminated printed wiring board formed by sandwiching an interposed member and hot pressing. .
【0002】[0002]
【従来の技術】従来より、電子機器の小型化、高速化な
どの要請から、積層プリント配線板についても、薄型
化、多層化、導体パターンのピッチの縮小化などが求め
られ、導体層及び絶縁層の薄型化やその積層方法、導体
パターンの形成方法などが検討されている。まず、図8
から図11を参照しつつ、積層プリント配線板の従来の
製造方法について説明する。図8に示すように、銅板1
01の表面101A及び裏面101Bに、それぞれプリ
プレグ102,103を介して銅箔104,105を重
ね、当接面KS1B,KS2Aをそれぞれ鏡面研磨した
2つの介挿体KS1,KS2の間に挟んで、上型PUと
下型PDによって真空加熱プレスして、プリプレグ10
2,103の樹脂を硬化させてそれぞれ樹脂絶縁層11
2,113とする。そして、図9に示すように、銅箔1
04,105に、エッチングなどを施して所定パターン
の配線層114,115を形成して、積層プリント配線
板110とする。2. Description of the Related Art Conventionally, in order to reduce the size and speed of electronic devices, it has been required to reduce the thickness, increase the number of layers, and reduce the pitch of conductor patterns, etc. for laminated printed wiring boards. Thinning of layers, a method of laminating the layers, a method of forming a conductor pattern, and the like are being studied. First, FIG.
A conventional method for manufacturing a laminated printed wiring board will be described with reference to FIGS. As shown in FIG.
The copper foils 104 and 105 are overlapped on the front surface 101A and the back surface 101B of the first through the prepregs 102 and 103, respectively. The prepreg 10 is vacuum-pressed with the upper die PU and the lower die PD.
2103 resin is cured to form a resin insulation layer 11
2,113. Then, as shown in FIG.
The layers 04 and 105 are etched to form wiring layers 114 and 115 having a predetermined pattern.
【0003】さらに、上記と同様にして、樹脂絶縁層と
配線層を積層する。即ち、図10に示すように、この積
層プリント配線板110を被積層プリント配線板とし
て、その表裏面110A,110Bに、それぞれプリプ
レグ106,107を介して銅箔108,109を重ね
る。さらに、2つの介挿体KS1,KS2の間に挟んで
上型PUと下型PDによって真空加熱プレスして、プリ
プレグ106,107の樹脂を硬化させてそれぞれ樹脂
絶縁層126,127とする。そして、図11に示すよ
うに、銅箔108,109にエッチング等を施して所定
パターンの配線層128,129を形成する。また、レ
ーザ加工などによって、樹脂絶縁層126,127に盲
孔を形成し、配線層128と配線層114とを、あるい
は配線層129と配線層115とを接続するため、ブラ
インドビア121,122を形成して、配線層114,
115に形成した受けランド114U,115Uと接続
させるなどの加工により、所定の回路を形成して、積層
プリント配線板120を製造する。Further, in the same manner as above, a resin insulating layer and a wiring layer are laminated. That is, as shown in FIG. 10, this laminated printed wiring board 110 is used as a laminated printed wiring board, and copper foils 108 and 109 are superimposed on front and back surfaces 110A and 110B via prepregs 106 and 107, respectively. Further, the upper and lower molds PU and PD are sandwiched between the two inserts KS1 and KS2, and are subjected to vacuum heating press to harden the resin of the prepregs 106 and 107 to form resin insulating layers 126 and 127, respectively. Then, as shown in FIG. 11, the copper foils 108 and 109 are etched or the like to form wiring layers 128 and 129 of a predetermined pattern. Further, blind holes 121 and 122 are formed in the resin insulating layers 126 and 127 by laser processing or the like in order to connect the wiring layers 128 and 114 or the wiring layers 129 and 115 with each other. Forming the wiring layer 114,
A predetermined circuit is formed by processing such as connection with the receiving lands 114U and 115U formed on the 115, and the laminated printed wiring board 120 is manufactured.
【0004】なお、さらに積層したい場合には、上記工
程を繰り返すことによって、所望の数の樹脂絶縁層や配
線層を積層した積層プリント配線板を製造する。また、
図示しなかったが、積層プリント配線板120のうち、
銅板101の表面101A側の配線層114,128と
裏面101B側の配線層115,129とを接続したい
場合には、銅板101や樹脂絶縁層112,113,1
26,127を貫通する貫通孔を形成し、その内周に銅
メッキ等によってスルーホール導体を形成して接続する
ことが行われる。[0004] When further lamination is desired, the above steps are repeated to produce a laminated printed wiring board in which a desired number of resin insulating layers and wiring layers are laminated. Also,
Although not shown, of the laminated printed wiring board 120,
When it is desired to connect the wiring layers 114, 128 on the front surface 101A side of the copper plate 101 and the wiring layers 115, 129 on the rear surface 101B side, the copper plate 101 or the resin insulating layers 112, 113, 1
A through hole penetrating through holes 26 and 127 is formed, and a through-hole conductor is formed on the inner periphery of the through-hole by copper plating or the like for connection.
【0005】[0005]
【発明が解決しようとする課題】ところが、このように
して、加熱プレスにより積層プリント配線板110,1
20を製造すると、積層プリント配線板110,120
の面(表面や裏面)に沿う方向の寸法が小さくなる、つ
まり積層プリント配線板110,120が面に沿う方向
に収縮して形成されることが判明した。この原因は明確
ではないが、プリプレグ102等の硬化時の硬化収縮の
挙動やその後の冷却時の収縮に関係し、プリプレグ10
6等が硬化する際に、大きく硬化収縮するとともに、プ
リプレグ(樹脂絶縁層)に引っ張られて銅箔108等や
被積層プリント配線板110(あるいは銅板101)も
収縮するためと考えられる。However, in this way, the laminated printed wiring boards 110, 1 are heated by a press.
20 are manufactured, the laminated printed wiring boards 110, 120
It has been found that the size in the direction along the surface (front surface or back surface) becomes smaller, that is, the laminated printed wiring boards 110 and 120 are formed to contract in the direction along the surface. Although the cause is not clear, it is related to the curing shrinkage behavior during curing of the prepreg 102 and the like and the subsequent shrinkage during cooling.
It is considered that when 6 and the like are cured, they are largely cured and shrunk, and are also pulled by the prepreg (resin insulating layer) to shrink the copper foil 108 and the like and the laminated printed wiring board 110 (or the copper plate 101).
【0006】特に、この積層プリント配線板120の収
縮量が大きい場合には、例えば、この配線板120の基
準点(図示しない)から測った平面寸法が大きく狂う。
しかも、プレス直後(配線層128,129の形成前)
には、銅箔108,109が表面を覆っているため、配
線層114,115の位置は判らない。このため、図1
2に示すように、成形した積層プリント配線板120の
所定の位置にブラインドビア121を形成しても、被積
層プリント配線板110の表面110Aに形成した受け
ランド114Uが所定の位置からズレているため(図中
d)、ブラインドビア121が受けランド114Uから
外れ、接続不良が発生することもあった。特に、このよ
うな不具合は、微細な配線やビアを形成する高精度なプ
リント配線板に顕著に生じ易い。僅かなずれで、接続不
良となり易いからである。[0006] In particular, when the amount of shrinkage of the laminated printed wiring board 120 is large, for example, the planar dimension of the wiring board 120 measured from a reference point (not shown) greatly deviates.
Moreover, immediately after pressing (before forming the wiring layers 128 and 129).
Since the copper foils 108 and 109 cover the surface, the positions of the wiring layers 114 and 115 cannot be determined. Therefore, FIG.
As shown in FIG. 2, even when the blind via 121 is formed at a predetermined position of the formed laminated printed wiring board 120, the receiving land 114U formed on the surface 110A of the laminated printed wiring board 110 is shifted from the predetermined position. As a result (d in the figure), the blind via 121 may come off the receiving land 114U, and a connection failure may occur. In particular, such inconvenience tends to occur remarkably on a high-precision printed wiring board in which fine wirings and vias are formed. This is because a slight displacement easily causes a connection failure.
【0007】これに対し、収縮率(収縮量)が予め判っ
ている場合には、収縮率を考慮して寸法を補正して製造
することで対応ができる。しかし、上記加熱プレス工程
での収縮は、収縮率(収縮量)が一定でなく、バラツキ
が大きいため、予め収縮率(収縮量)を予測、考慮し
て、ブラインドビアの位置決めなどの積層プリント配線
板120の設計をすることが困難であり、高精度なプリ
ント配線板ほど歩留まりの低下が著しい。On the other hand, when the shrinkage ratio (shrinkage amount) is known in advance, it can be dealt with by manufacturing by correcting the dimensions in consideration of the shrinkage ratio. However, since the shrinkage in the heating press process has a large shrinkage ratio (shrinkage amount) and a large variation, the shrinkage ratio (shrinkage amount) is predicted and taken into consideration in advance, and the laminated printed wiring such as the positioning of the blind via is determined. It is difficult to design the board 120, and the higher the precision of the printed wiring board, the lower the yield is.
【0008】この発明は上記の問題点に鑑みてなされた
ものであって、その目的は、加熱プレス工程を備える積
層プリント配線板の製造方法において、加熱プレス工程
における収縮率(収縮量)を低減させ、また収縮率(収
縮量)のバラツキをも低減させることができる、さらに
は、配線層を高い寸法精度で形成できる上、製造歩留り
が高く、信頼性の高い積層プリント配線板の製造方法を
提供することにある。The present invention has been made in view of the above problems, and an object of the present invention is to reduce a shrinkage rate (shrinkage amount) in a heating press step in a method of manufacturing a laminated printed wiring board having a heating press step. In addition, it is possible to reduce the variation in the shrinkage rate (shrinkage amount). Furthermore, it is possible to form a wiring layer with high dimensional accuracy, and to provide a method for manufacturing a multilayer printed wiring board with high manufacturing yield and high reliability. To provide.
【0009】[0009]
【課題を解決するための手段、作用及び効果】その解決
手段は、金属板または被積層プリント配線板の表裏面
に、それぞれプリプレグを介して金属箔を重ね、表面粗
さがそれぞれRz=0.4μm以上、Rz=5μm未満
の2つの当接面で、上記金属箔を当接させつつ挟んで加
熱プレスする加熱プレス工程を備える積層プリント配線
板の製造方法である。Means for Solving the Problems, Actions and Effects The means for solving the problem is that a metal foil is laminated via a prepreg on the front and back surfaces of a metal plate or a laminated printed wiring board, respectively, and the surface roughness is Rz = 0. This is a method for manufacturing a laminated printed wiring board, comprising a heating press step of hot-pressing while sandwiching the metal foil between two contact surfaces of 4 μm or more and Rz = less than 5 μm.
【0010】本発明によれば、金属板または被積層プリ
ント配線板の表面及び裏面に、それぞれプリプレグを介
して金属箔を重ね、これを2つの当接面で、金属箔をそ
れぞれ当接させつつ挟んで加熱プレスをする工程を備え
る。しかも、当接面の表面粗さは、それぞれRz=0.
4μm以上5μm未満の範囲内とされている。このよう
にすると、加熱プレス後の積層プリント配線板の収縮率
を減少させ、しかも収縮率のバラツキも抑制することが
できる。これは、加熱プレス工程において、プリプレグ
が硬化収縮する際、金属箔を収縮させる方向に引っ張る
のに対し、金属箔に当接する当接面が摩擦によって金属
箔の収縮を阻止するため、結果として、金属箔やプリプ
レグ(樹脂絶縁層)、被積層プリント配線板(あるいは
金属板)の収縮を抑制するものと考えられる。その上、
上記表面粗さにしたため、金属箔と当接面との間で摩擦
力が安定して発生して、金属箔を固定するため、収縮率
のバラツキも抑制できたものと考えられる。According to the present invention, a metal foil is placed on the front and back surfaces of a metal plate or a printed wiring board to be laminated via a prepreg, and the metal foils are brought into contact with the two contacting surfaces. And a step of hot-pressing the sheet. Moreover, the surface roughness of the contact surface is Rz = 0.
The range is 4 μm or more and less than 5 μm. In this case, the shrinkage ratio of the laminated printed wiring board after the hot pressing can be reduced, and the variation in the shrinkage ratio can be suppressed. This is because, in the heating press step, when the prepreg cures and shrinks, the metal foil is pulled in the direction of shrinking, whereas the contact surface in contact with the metal foil prevents shrinkage of the metal foil due to friction. It is considered that it suppresses shrinkage of the metal foil, prepreg (resin insulating layer), and laminated printed wiring board (or metal plate). Moreover,
It is considered that because the surface roughness was set, a frictional force was stably generated between the metal foil and the contact surface, and the metal foil was fixed.
【0011】従って、配線層を高い寸法精度で形成で
き、例えば、成形した積層プリント配線板の所定の位置
にブラインドビアを形成しても、従来のようにブライン
ドビアが受けランドから外れた位置に形成され、電気的
な不良が発生することはなく、確実に接続させることが
できる。あるいは、成形した積層プリント配線板に貫通
孔を形成し、スルーホール導体を形成する場合でも、金
属板(または被積層プリント配線板)の所定の位置に形
成した貫通孔から外れた位置にスルービアが形成される
こともなく、確実に配線層間を接続させることができ
る。従って、収縮による接続不良等の不具合を解消して
歩留まりと信頼性を向上させることができる。また、収
縮率(量)見込んだ設計が可能となり、より微細な配線
等を有する高精度の積層プリント配線板を製造すること
ができる。Therefore, the wiring layer can be formed with high dimensional accuracy. For example, even if a blind via is formed at a predetermined position on a molded laminated printed wiring board, the blind via is located at a position off the receiving land as in the conventional case. It is formed, and no electrical failure occurs, and the connection can be made reliably. Alternatively, even when a through hole is formed in a molded laminated printed wiring board and a through-hole conductor is formed, a through via is formed at a position deviated from a through hole formed at a predetermined position on a metal plate (or a laminated printed wiring board to be laminated). It is possible to reliably connect the wiring layers without being formed. Therefore, it is possible to eliminate a defect such as a connection failure due to shrinkage and to improve yield and reliability. In addition, it is possible to design in consideration of the shrinkage (amount), and it is possible to manufacture a high-precision laminated printed wiring board having finer wiring and the like.
【0012】ここで、2つの当接面の表面粗さは、それ
ぞれRz=0.4μm以上で、Rz=5μm未満である
必要がある。Rz=0.4μm未満であると、収縮率が
大きくなり、収縮のバラツキも大きくなるからである。
これは、当接面と金属箔との間で十分な摩擦抵抗が得ら
れないため、金属箔がプリプレグの収縮により引っ張ら
れると、当接面と金属箔との間で滑りが生じて、金属箔
がプリプレグの収縮に従って収縮するため、プリプレグ
も金属板も被積層プリント配線板も大きく縮んで、積層
プリント配線板全体の収縮率が大きくなるためと考えら
れる。また、滑りの量は一定ではなくバラツキを持つの
で、収縮率のバラツキも大きくなるためと考えられる。
一方、Rz=5μmを超えると、当接面に存在する凹凸
が大きくなりすぎて、金属箔にその凹凸が転写され、ま
た、金属箔が部分的に破れる等の不具合を生じるためで
ある。Here, the surface roughness of the two contact surfaces needs to be Rz = 0.4 μm or more and Rz = less than 5 μm, respectively. This is because if Rz is less than 0.4 μm, the shrinkage rate increases, and the variation in shrinkage also increases.
This is because sufficient frictional resistance cannot be obtained between the contact surface and the metal foil, so that when the metal foil is pulled by the shrinkage of the prepreg, slippage occurs between the contact surface and the metal foil, It is considered that because the foil shrinks in accordance with the shrinkage of the prepreg, the prepreg, the metal plate, and the printed wiring board to be laminated shrink greatly, and the shrinkage rate of the entire laminated printed wiring board increases. Further, it is considered that the amount of slip is not constant but has a variation, so that the variation in the shrinkage ratio also increases.
On the other hand, when Rz exceeds 5 μm, the irregularities existing on the contact surface become too large, and the irregularities are transferred to the metal foil, and the metal foil is partially broken.
【0013】なお、この表面粗さを上記範囲にするに
は、公知の加工技術を利用して当接面を仕上げればよ
く、例えば平面研削やラップ研磨、バフ研磨等で、砥粒
の番手を適宜選択することによって表面粗さを調整すれ
ば良い。ここで、当接面とは、金属箔と当接し加圧する
面を指し、例えばプレス金型(上型および下型)のう
ち、プレス面を挙げることができる。また、プレス金型
と金属箔との間に介挿体を介在させる場合には、この介
挿体のうち金属箔と当接させる面を指す。In order to keep the surface roughness in the above range, the contact surface may be finished by using a known processing technique. May be adjusted as appropriate to adjust the surface roughness. Here, the contact surface refers to a surface that comes into contact with and presses the metal foil, and may be, for example, a press surface of a press die (upper die and lower die). In the case where an interposer is interposed between the press die and the metal foil, it refers to the surface of the interposer that comes into contact with the metal foil.
【0014】金属板は、導電性、加工性その他を考慮し
て選択すればよいが、例えば、銅板、銅合金板等が挙げ
られる。また、製造する積層プリント配線板の剛性等を
考慮して適当な厚さのものを用いれば良い。被積層プリ
ント配線板としては、表裏面に樹脂絶縁層や配線層を積
層可能なプリント配線板であればよく、例えば、ガラス
エポキシ等の複合材料からなる板の両面に配線層を形成
したものや、配線層及び絶縁層を交互に複数層積層した
積層プリント配線板等が挙げられる。この被積層プリン
ト配線板は、本発明の製造方法あるいは他の製造方法の
いずれによって製造したものを用いても良い。The metal plate may be selected in consideration of conductivity, workability, and the like, and examples thereof include a copper plate and a copper alloy plate. In addition, a laminate having a suitable thickness may be used in consideration of the rigidity and the like of the laminated printed wiring board to be manufactured. The printed wiring board to be laminated may be any printed wiring board capable of laminating a resin insulating layer and a wiring layer on the front and back surfaces, for example, a wiring board formed on both sides of a board made of a composite material such as glass epoxy or And a laminated printed wiring board in which a plurality of wiring layers and insulating layers are alternately laminated. The printed wiring board to be laminated may be one manufactured by the manufacturing method of the present invention or another manufacturing method.
【0015】プリプレグとしては、硬化後の樹脂絶縁層
の絶縁性、耐湿性、耐熱性その他を考慮して適宜選択す
ればよい。例えば、エポキシ樹脂、ポリイミド樹脂等の
熱硬化性樹脂やこれらの樹脂とガラス繊維(ガラス織
布、ガラス不織布)との複合材料、ポリエステルやアラ
ミド繊維などの有機繊維(アラミド布など)との複合材
料、連続多孔質PTFEなどの三次元網目構造のフッ素
系樹脂基材にエポキシ樹脂等の熱硬化性樹脂を含浸させ
た複合材料、熱硬化性樹脂とセラミック粉末等の無機粉
末等の複合材料などが挙げられる。さらに、金属箔とし
ては、導電性やエッチングその他の容易さ等を考慮して
選択すればよいが、例えば、銅箔が挙げられる。またそ
の厚さは、例えば、配線層を形成するのに適当な厚さを
選ぶなど、積層プリント配線板の設計に合わせて適宜選
択すれば良い。The prepreg may be appropriately selected in consideration of the insulating property, moisture resistance, heat resistance and the like of the cured resin insulating layer. For example, thermosetting resins such as epoxy resins and polyimide resins, composite materials of these resins with glass fibers (glass woven fabric, glass non-woven fabric), and composite materials of organic fibers such as polyester and aramid fibers (aramid cloth, etc.) , Composite materials in which a thermosetting resin such as an epoxy resin is impregnated into a fluororesin base material having a three-dimensional network structure such as continuous porous PTFE, and a composite material such as a thermosetting resin and an inorganic powder such as a ceramic powder. No. Further, the metal foil may be selected in consideration of conductivity, easiness of etching, and the like, and examples thereof include a copper foil. The thickness may be appropriately selected according to the design of the laminated printed wiring board, for example, by selecting an appropriate thickness for forming a wiring layer.
【0016】ここで、上記積層プリント配線板の製造方
法であって、前記金属箔とプレス金型との間にそれぞれ
介挿体が介在し、前記当接面は、それぞれ2つの上記介
挿体のうち上記金属箔と当接させる面であることを特徴
とする積層プリント配線板の製造方法とすると良い。Here, in the above-mentioned method for manufacturing a laminated printed wiring board, an intervening body is interposed between the metal foil and the press die, and the abutting surfaces are respectively provided with the two interposed bodies. It is preferable to use a method of manufacturing a laminated printed wiring board, characterized in that the surface is a surface to be brought into contact with the metal foil.
【0017】本発明によれば、金属板または被積層プリ
ント配線板の表面及び裏面に、それぞれプリプレグを介
して金属箔を重ね、これを2つの介挿体で、金属箔をそ
れぞれ当接させつつ挟んで、プレス金型(上型および下
型)で加熱プレスをする工程を備える。しかも、この介
挿体のうち金属箔と当接させる面の表面粗さは、それぞ
れRz=0.4μm以上5μm未満の範囲内である。こ
の介挿体は、プレス金型とは別に用意され、当接面の表
面粗さは、上記した公知の加工技術を利用して仕上げら
れる。一般に、プレス金型は、プレス機の構造に合わせ
て設計されるため、大型で複雑な形状になりやすく、そ
のプレス面を所定の表面粗さに仕上げたり、あるいは修
復・維持したりするには、多くの手間やコストがかか
る。これに対し、プレス金型のプレス面を加工するのに
代えて、プレス金型と金属箔との間に介挿体を介在させ
るようにした場合には、介挿体の当接面は容易に加工す
ることができるので、手間やコストなどの負担を低減さ
せることができる。According to the present invention, the metal foil is laminated on the front and back surfaces of the metal plate or the laminated printed wiring board via the prepreg, and the metal foil is brought into contact with each of the two inserts. A step of performing hot pressing with a press die (upper die and lower die) between them. In addition, the surface roughness of the surface of the interposed body that comes into contact with the metal foil is in the range of Rz = 0.4 μm or more and less than 5 μm. This interposed body is prepared separately from the press die, and the surface roughness of the contact surface is finished using the above-mentioned known processing technique. In general, press dies are designed according to the structure of the press machine, so they tend to have large and complex shapes.To finish or maintain or maintain the press surface to a predetermined surface roughness It takes a lot of trouble and cost. On the other hand, in the case where an insert is interposed between the press die and the metal foil instead of processing the press surface of the press die, the contact surface of the insert is easy. Therefore, the burden such as labor and cost can be reduced.
【0018】さらに、この介挿体は、プレス金型とは別
設計であるため、製造する積層プリント配線板に合わせ
て形状や材質を自由に設計できる利点がある。即ち、金
属箔と近似した熱膨張率を持つ材質を選択すると、加熱
・冷却時の挙動を金属箔に近づけることができ、金属箔
との間での滑りをさらに抑制できるため、より積層プリ
ント配線板の収縮やそのバラツキを抑えることができる
ので好ましい。例えば、下記するように、金属箔として
銅箔を用いる場合には、介挿体として同材質の銅や熱膨
張率の近似したステンレス(SUS304、SUS30
2等)を用いると良い。また、介挿体の厚さ等の寸法
は、加熱プレス時の熱容量や熱伝達、製造する積層プリ
ント配線板の大きさ、厚さ等を考慮して適宜設計すれば
良い。また、介挿体は、プレス金型(上型および下型)
とは別体とし、プレスの都度重ねて加圧するようにして
も良いが、プレス金型に貼り付けるなどして一体として
おいても良い。Further, since this interposer is designed separately from the press die, there is an advantage that the shape and the material can be freely designed according to the laminated printed wiring board to be manufactured. In other words, when a material having a coefficient of thermal expansion similar to that of the metal foil is selected, the behavior during heating and cooling can be made closer to the metal foil, and the slip between the metal foil and the metal foil can be further suppressed. It is preferable because shrinkage of the plate and its variation can be suppressed. For example, as described below, when a copper foil is used as the metal foil, copper of the same material or stainless steel (SUS304, SUS30
2 etc.). The dimensions such as the thickness of the interposer may be appropriately designed in consideration of the heat capacity and heat transfer at the time of hot pressing and the size and thickness of the laminated printed wiring board to be manufactured. The insert is a press mold (upper and lower dies)
Alternatively, the pressure may be applied repeatedly by pressing each time, or may be integrated with the press die.
【0019】[0019]
【発明の実施の形態】以下、本発明の積層プリント配線
板の製造方法を具体化した実施形態を、図面を参照しつ
つ説明する。まず、図1に示すように、厚さ35μmの
略板状で、所定の位置に複数の貫通孔1Hを形成した銅
板1の表面1A及び裏面1Bに、それぞれ連続多孔質P
TFEにエポキシ樹脂を含浸させた複合材料からなるプ
リプレグ2,3を介して、厚さ12μmの銅箔4,5を
重ね、当接面KT1B,KT2Aをそれぞれ所定の表面
粗さに仕上げた2つの介挿体KT1,KT2の間に挟
む。さらにこれを上型PUと下型PDの間に挟み、上型
PUを下降させて上型PUと下型PDによって真空加熱
プレスして、プリプレグ2,3の樹脂を硬化させてそれ
ぞれ樹脂絶縁層12,13とする。この加熱プレス工程
では、プレスをしながら真空状態で加熱し、プリプレグ
2,3の樹脂を硬化させて、銅板1と樹脂絶縁層12,
13、及び樹脂絶縁層12,13と銅箔4,5を接合さ
せる。その後、プレスしたまま冷却する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments embodying a method for manufacturing a laminated printed wiring board according to the present invention will be described below with reference to the drawings. First, as shown in FIG. 1, a continuous porous P is formed on a front surface 1A and a back surface 1B of a copper plate 1 having a substantially plate shape having a thickness of 35 μm and having a plurality of through holes 1H formed at predetermined positions.
Copper foils 4 and 5 each having a thickness of 12 μm are stacked via prepregs 2 and 3 made of a composite material in which TFE is impregnated with an epoxy resin, and the contact surfaces KT1B and KT2A are each finished to a predetermined surface roughness. It is sandwiched between the inserts KT1 and KT2. Further, this is sandwiched between the upper die PU and the lower die PD, the upper die PU is lowered, and the upper die PU and the lower die PD are vacuum-heat-pressed to harden the resin of the prepregs 2 and 3 so that the resin insulating layers are respectively formed. 12, and 13. In this heating press step, the resin of the prepregs 2 and 3 is cured by heating in a vacuum state while pressing, and the copper plate 1 and the resin insulating layers 12 and 3 are cured.
13, and the resin insulating layers 12, 13 and the copper foils 4, 5 are joined. Then, it cools, pressing.
【0020】ここで、銅板1、プリプレグ2,3及び銅
箔4,5は、330×330mmの略板状である。ま
た、介挿体KT1,KT2には、銅箔4,5とほぼ同じ
膨張率であるステンレスSUS304を用い、その当接
面KT1B,KT2Aは、表面粗さがRz=2.0μm
? となるように仕上げられている。なお、SUS3
04は、熱膨張率が銅箔4,5とほぼ同じであるため、
加熱・冷却時の介挿体KT1,KT2の挙動を銅箔4,
5のそれに近づけることができ、銅箔4,5との間での
滑りを抑制できるため、積層プリント配線板の収縮やそ
のバラツキを抑えることができる。この介挿体KT1,
KT2の当接面KT1B,KT2Aの仕上げについては
後述する。Here, the copper plate 1, the prepregs 2, 3 and the copper foils 4, 5 have a substantially plate shape of 330 × 330 mm. The inserts KT1 and KT2 are made of stainless steel SUS304 having the same expansion coefficient as the copper foils 4 and 5, and the contact surfaces KT1B and KT2A have a surface roughness of Rz = 2.0 μm.
? It is finished to become. In addition, SUS3
04 has almost the same coefficient of thermal expansion as copper foils 4 and 5,
The behavior of inserts KT1 and KT2 during heating and cooling was
5 and the slip between the copper foils 4 and 5 can be suppressed, so that the contraction and the variation of the laminated printed wiring board can be suppressed. This insert KT1,
The finishing of the contact surfaces KT1B and KT2A of KT2 will be described later.
【0021】プレス成形した積層プリント配線板は、銅
板1の表裏面1A,1Bに樹脂絶縁層12,13を接合
させ、さらにその表裏面に銅箔4,5を接合させた構造
となる。次に、図2に示すように、銅箔4,5にエッチ
ングなどを施し、所定のパターンの配線層14,15を
形成する。また、表面10Aの配線層14と裏面10B
の配線層15とを接続するために、予め銅板1の所定の
位置に形成しておいた貫通孔1Hの位置する場所に、表
裏面10A,10Bを繋ぐ貫通孔を形成し、その内周に
銅メッキによってスルーホール導体16を形成し、この
孔の隙間をエポキシ17等で埋めたビアなどを形成し
て、積層プリント配線板10とする。The press-formed laminated printed wiring board has a structure in which resin insulating layers 12 and 13 are bonded to the front and back surfaces 1A and 1B of the copper plate 1, and copper foils 4 and 5 are further bonded to the front and back surfaces. Next, as shown in FIG. 2, the copper foils 4 and 5 are subjected to etching or the like to form wiring layers 14 and 15 having a predetermined pattern. Further, the wiring layer 14 on the front surface 10A and the back surface 10B
In order to connect the wiring layer 15 with the wiring layer 15, a through hole connecting the front and back surfaces 10A and 10B is formed at a position where the through hole 1H previously formed at a predetermined position of the copper plate 1 is located, and an inner periphery thereof is formed. A through-hole conductor 16 is formed by copper plating, and a via or the like is formed by filling a gap between the holes with an epoxy 17 or the like.
【0022】さらに、上記と同様にして、樹脂絶縁層と
配線層とを積層する。すなわち、図3に示すように、こ
の積層プリント配線板10を被積層プリント配線板とし
て、その表裏面10A,10Bに、それぞれプリプレグ
6,7を介して、銅箔8,9を重ね、当接面KT1B,
KT2Aをそれぞれ表面粗化した2つの介挿体KT1,
KT2の間に挟む。これを上型PUを下降させて上型P
Uと下型PDによって真空加熱プレスして、プリプレグ
6,7の樹脂を硬化させてそれぞれ樹脂絶縁層26,2
7とする。Further, a resin insulating layer and a wiring layer are laminated in the same manner as described above. That is, as shown in FIG. 3, the laminated printed wiring board 10 is used as a laminated printed wiring board, and copper foils 8 and 9 are superimposed on the front and back surfaces 10A and 10B via prepregs 6 and 7, respectively. Surface KT1B,
Two inserts KT1, each of which has a surface roughened KT2A.
Insert between KT2. Lower the upper PU to lower the upper P
U and the lower die PD are vacuum-heat-pressed to cure the resin of the prepregs 6 and 7 so that the resin insulating layers 26 and 2 are respectively formed.
7 is assumed.
【0023】そして、図4に示すように、銅箔8,9に
エッチング等を施し、所定のパターンの配線層28,2
9を形成する。また、レーザ加工などによって、樹脂絶
縁層26,27に盲孔23,24を形成し、配線層28
と配線層14、及び配線層29と配線層15とを接続す
るために、ブラインドビア21,22を形成して、配線
層14,15に形成しておいた受けランド14U,15
Uと接続させるなどの加工を施す。さらに、図示しない
が、表面20Aの配線層28と裏面20Bの配線層29
とを接続するために、予め銅板1の所定の位置に形成し
ておいた貫通孔1Hの位置する場所に、表裏面20A,
20Bを繋ぐ貫通孔を形成し、その内周に銅メッキによ
ってスルーホール導体を形成するなどをして、積層プリ
ント配線板20を製造する。上記した工程を繰り返すこ
とによって、所望の数だけ配線層及び樹脂絶縁層を積層
して、図5に示すような積層プリント配線板30を製造
する。この積層プリント配線板30は、各配線層とビア
との接続が良好であり、断線(不導通)を生じることが
なかった。Then, as shown in FIG. 4, the copper foils 8 and 9 are subjected to etching or the like so that the wiring layers 28 and 2 having a predetermined pattern are formed.
9 is formed. Also, blind holes 23 and 24 are formed in the resin insulating layers 26 and 27 by laser processing or the like, and the wiring layers 28 are formed.
In order to connect the wiring layers 14 and the wiring layer 29 and the wiring layer 15, blind vias 21 and 22 are formed, and the receiving lands 14U and 15 formed in the wiring layers 14 and 15 are formed.
Processing such as connection with U is performed. Although not shown, the wiring layer 28 on the front surface 20A and the wiring layer 29 on the rear surface 20B are not shown.
In order to connect the front and back surfaces 20A, 20A, the through holes 1H, which have been formed at predetermined positions of the copper plate 1 in advance, are located.
The laminated printed wiring board 20 is manufactured by forming a through-hole connecting the wires 20B and forming a through-hole conductor by copper plating on the inner periphery thereof. By repeating the above-described steps, a desired number of wiring layers and resin insulating layers are laminated, and a laminated printed wiring board 30 as shown in FIG. 5 is manufactured. This laminated printed wiring board 30 had good connection between each wiring layer and the via, and did not cause disconnection (disconnection).
【0024】次に、介挿体KT1,KT2のうち銅箔
4,5,8,9と当接する面KT1B,KT2Aの表面
粗さと積層プリント配線板の収縮率との関係について図
6及び表1を参照しつつ説明する。銅箔4,5,8,9
との当接面KT1B,KT2Aの表面粗さについて以下
のような調査を行った。まず、介挿体KT1,KT2の
当接面KT1B,KT2Aを、番手の異なる砥粒を用い
てバフ研磨し、表面粗さをRz=0.1〜5.0μmの
範囲で8段階にそれぞれ調整した。この当接面KT1
B,KT2Aの表面粗さは、接触式の表面粗さ測定機に
より測定した。Next, FIG. 6 and Table 1 show the relationship between the surface roughness of the surfaces KT1B and KT2A of the interposed bodies KT1 and KT2 which are in contact with the copper foils 4, 5, 8, and 9, and the shrinkage of the laminated printed wiring board. This will be described with reference to FIG. Copper foil 4,5,8,9
The following investigation was conducted on the surface roughness of the contact surfaces KT1B and KT2A. First, the contact surfaces KT1B and KT2A of the inserts KT1 and KT2 are buff-polished using abrasive grains having different numbers, and the surface roughness is adjusted in eight steps in the range of Rz = 0.1 to 5.0 μm. did. This contact surface KT1
The surface roughness of B, KT2A was measured by a contact type surface roughness measuring instrument.
【0025】そして、図6(a)に示すように、銅板1
の所定の位置に、表裏面1A,1Bを貫通する貫通孔1
MA,1MBを距離L(約250mm)あけて形成し
た。次に、図6(b)に示すように、上記した方法で、
銅板1にプリプレグ2,3を重ね、さらに厚さ12μm
の銅箔4,5を重ねた積層プリント配線板10Cを製造
した。なお、ここでは、配線層を形成する加工は行わな
い。次に、図6(c)に示すように、銅板1に予め形成
した貫通孔1MA,1MBの位置する場所付近の銅箔4
と樹脂絶縁層12とを取り除き、貫通孔1MA,1MB
間の距離Mを測定した。そして、距離L及び距離Mの測
定結果をもとに、積層プリント配線板10Cの収縮率S
を次式に従ってそれぞれ算出した。なお、同一の表面粗
さについて、各5パネル用意し、各パネルにおいて各4
箇所測定して、計20ヶのデータを得た。 収縮率S=(L−M)/L*100(%) さらに、各表面粗さ毎に、上式によるそれぞれ20ヶの
算出結果から、収縮率の平均値Sm、収縮率の最大値S
max、収縮率の最小値Smin、収縮のバラツキSr
(最大値Smaxから最小値Sminを引いた値)を求
めた。また、銅箔4,5の一部に破れを生じたものもあ
ったため、加熱プレス工程後の銅箔4,5の破れ率Tを
求めた。これらの結果をまとめて表1に、さらに表面粗
さRzと収縮率の平均値Smの関係を図7に示す。Then, as shown in FIG.
At a predetermined position, a through hole 1 penetrating the front and back surfaces 1A, 1B
MA, 1 MB was formed at a distance L (about 250 mm). Next, as shown in FIG.
Lay the prepregs 2 and 3 on the copper plate 1 and further thickness 12 μm
The laminated printed wiring board 10C which laminated | stacked the copper foils 4 and 5 of this was manufactured. Here, processing for forming the wiring layer is not performed. Next, as shown in FIG. 6C, the copper foil 4 near the position where the through holes 1MA and 1MB previously formed in the copper plate 1 are located.
And the resin insulating layer 12 are removed, and the through holes 1MA and 1MB are removed.
The distance M between them was measured. Then, based on the measurement results of the distance L and the distance M, the shrinkage ratio S of the laminated printed wiring board 10C is determined.
Was calculated according to the following equation. In addition, 5 panels were prepared for the same surface roughness, and 4 panels were prepared for each panel.
The location was measured to obtain a total of 20 data. Shrinkage ratio S = (LM) / L * 100 (%) Further, for each surface roughness, the average value Sm of the shrinkage ratio and the maximum value S of the shrinkage ratio are calculated from the results of the 20 calculations by the above formula.
max, shrinkage minimum value Smin, shrinkage variation Sr
(The value obtained by subtracting the minimum value Smin from the maximum value Smax). In addition, since some of the copper foils 4 and 5 were torn, the tear rate T of the copper foils 4 and 5 after the hot pressing step was determined. These results are summarized in Table 1, and the relationship between the surface roughness Rz and the average value Sm of the shrinkage is shown in FIG.
【0026】[0026]
【表1】 [Table 1]
【0027】表1及び図7の結果から明らかなように、
表面粗さRzが大きくなるにつれて、急速に収縮率の平
均値Smが小さくなり、Rz=0.4以上で平均値Sm
がほぼ一定で、Rz=0.6以上では特に平均値Smが
小さくかつ一定になることが判る。一方、収縮のバラツ
キSrもやはり表面粗さRzが大きくなるにつれて、急
速に小さくなり、Rz=0.4以上でバラツキSrがほ
ぼ一定で、Rz=2.0以上では特にバラツキSrが小
さくなることが判る。さらに、銅箔の状態については、
Rz=4.0では銅箔に破れは生じないが、Rz=5.
0では、銅箔に破れが生じることが判る。このことか
ら、表面粗さRzが、0.4≦Rz<5.0の範囲で
は、平均値Sm及びバラツキSrがそれぞれほぼ一定に
小さくなり、銅箔が破れることもないことが判る。好ま
しくは、0.6≦Rz<5.0の範囲とすると良い。平
均値Smが特に小さく、バラツキSrがほぼ一定に小さ
い上、銅箔が破れることもないからである。さらに好ま
しくは、2.0≦Rz<5.0の範囲とすると良い。平
均値Sm及びバラツキSrが特に小さく、銅箔が破れる
こともないからである。さらに、2.0≦Rz≦4.0
の範囲では、平均値Sm及びバラツキSrが特に小さ
く、銅箔も破れることはない。なお、データは示さない
が、図6(b)の状態からさらに複数層積層した場合に
ついて、同様な収縮率を測定しても、ほぼ同等な結果が
得られた。As is clear from the results in Table 1 and FIG.
As the surface roughness Rz increases, the average value Sm of the shrinkage rate rapidly decreases, and the average value Sm at Rz = 0.4 or more.
Is substantially constant, and it is understood that the average value Sm is particularly small and constant when Rz = 0.6 or more. On the other hand, the variation Sr of the shrinkage also decreases rapidly as the surface roughness Rz increases, and the variation Sr is almost constant at Rz = 0.4 or more, and the variation Sr particularly decreases at Rz = 2.0 or more. I understand. Furthermore, regarding the state of the copper foil,
When Rz = 4.0, the copper foil is not broken, but Rz = 5.
At 0, it can be seen that the copper foil is torn. From this, it can be seen that when the surface roughness Rz is in the range of 0.4 ≦ Rz <5.0, the average value Sm and the variation Sr are almost constant and small, and the copper foil is not broken. Preferably, the range is 0.6 ≦ Rz <5.0. This is because the average value Sm is particularly small, the variation Sr is almost constant and the copper foil is not broken. More preferably, the range is 2.0 ≦ Rz <5.0. This is because the average value Sm and the variation Sr are particularly small, and the copper foil is not broken. Further, 2.0 ≦ Rz ≦ 4.0
In the range, the average value Sm and the variation Sr are particularly small, and the copper foil is not broken. Although data is not shown, substantially the same result was obtained even when the same shrinkage rate was measured for a case where a plurality of layers were further laminated from the state of FIG. 6B.
【0028】このように積層プリント配線板の収縮が抑
えられるのは、加熱プレス工程において、プリプレグ
2,3が硬化収縮する際、これと接した銅箔4,5を収
縮させる方向に引っ張るのに対し、銅箔4,5に当接す
る介挿体KT1,KT2が摩擦によって銅箔4,5の収
縮を阻止する。その結果として、銅箔4,5やプリプレ
グ2,3(樹脂絶縁層12,13)、銅板1(あるいは
被積層プリント配線板10,20)の収縮を抑制するも
のと考えられる。The reason that the shrinkage of the laminated printed wiring board is suppressed as described above is that when the prepregs 2 and 3 cure and shrink in the heating press step, the copper foils 4 and 5 in contact with the prepregs 2 and 3 are pulled in a direction to shrink. On the other hand, the inserts KT1 and KT2 abutting on the copper foils 4 and 5 prevent the copper foils 4 and 5 from contracting due to friction. As a result, it is considered that the shrinkage of the copper foils 4 and 5, the prepregs 2 and 3 (the resin insulating layers 12 and 13), and the copper plate 1 (or the laminated printed wiring boards 10 and 20) is suppressed.
【0029】以上より、介挿体KT1,KT2のうち、
銅箔4,5,8,9と当接する面KT1B,KT2Aの
表面粗さは、それぞれ上記範囲内とすると、加熱プレス
後の積層プリント配線板10,20,30の収縮率を減
少させ、しかも収縮率のバラツキも抑制することができ
る。従って、例えば、成形した積層プリント配線板20
の所定の位置にブラインドビア21,22を形成して
も、従来のようにブラインドビア21,22が受けラン
ド14U,15Uから外れた位置に形成され、電気的な
不良が発生することはなく、確実に接続させることがで
きる。あるいは、成形した積層プリント配線板10,2
0に貫通孔を形成し、スルーホール導体16を形成する
場合でも、銅板1(または被積層プリント配線板10)
の所定の位置に形成した貫通孔から外れた位置にスルー
ビア16が形成されることもなく、確実に配線層間を接
続させることができる。従って、収縮による接続不良等
の不具合を解消して歩留まりと信頼性を向上させること
ができる。また、収縮率(量)を見込んだ設計が可能と
なり、より微細な配線等を有する高精度の積層プリント
配線板30を製造することができる。From the above, of the interpolated bodies KT1 and KT2,
When the surface roughness of the surfaces KT1B and KT2A that are in contact with the copper foils 4, 5, 8, and 9, respectively, is within the above ranges, the shrinkage of the laminated printed wiring boards 10, 20, and 30 after hot pressing is reduced, and Variation in shrinkage can also be suppressed. Therefore, for example, the molded laminated printed wiring board 20
Even if the blind vias 21 and 22 are formed at predetermined positions, the blind vias 21 and 22 are formed at positions deviated from the receiving lands 14U and 15U as in the related art, and no electrical failure occurs. Connection can be made securely. Alternatively, the formed laminated printed wiring boards 10, 2
0, the copper plate 1 (or the printed wiring board 10 to be laminated) is formed even when the through-hole conductor 16 is formed.
The wiring layers can be reliably connected without forming the through via 16 at a position deviating from the through hole formed at the predetermined position. Therefore, it is possible to eliminate a defect such as a connection failure due to shrinkage and to improve yield and reliability. In addition, a design that allows for a shrinkage (amount) becomes possible, and a high-precision laminated printed wiring board 30 having finer wiring and the like can be manufactured.
【0030】以上において、本発明を実施形態に即して
説明したが、本発明は、上記実施形態に限定されるもの
ではなく、その要旨を逸脱しない範囲で適宜変更して適
用できることは言うまでもない。例えば、金属板として
は、厚さ35μmの銅板1を用いたが、金属板さらには
積層プリント配線板の剛性を考慮して厚さを選択すれば
良く、例えば、50μm、100μm、150μm等の
厚さのものを用いても良い。また、金属箔としては、厚
さ12μmの銅箔を用いたが、配線層の加工の容易さ等
を考慮して選択すれば良く、これよりも厚いまたは薄い
もの、例えば9μm、15μm、20μm、30μm等
の厚さのものを用いることができる。In the above, the present invention has been described with reference to the embodiments. However, it is needless to say that the present invention is not limited to the above embodiments, and can be appropriately modified and applied without departing from the gist thereof. . For example, although the copper plate 1 having a thickness of 35 μm was used as the metal plate, the thickness may be selected in consideration of the rigidity of the metal plate or the multilayer printed wiring board, for example, a thickness of 50 μm, 100 μm, 150 μm, or the like. May be used. Further, as the metal foil, a copper foil having a thickness of 12 μm was used, but it may be selected in consideration of the ease of processing of the wiring layer and the like, and a metal foil thicker or thinner, for example, 9 μm, 15 μm, 20 μm, Thicknesses such as 30 μm can be used.
【0031】また、上記実施形態では、銅板1に予め貫
通孔1Hを開けておいたものを用いたが、その他、積層
後に金属箔(銅箔)や樹脂絶縁層を含め、一挙に穿孔す
るようにしても良い。また、上記実施形態では、レーザ
加工により樹脂絶縁層に穿孔したが、ドリルにより穿孔
しても良い。また、金属板(銅板1)や金属箔(銅箔
4,5等)をも含めてレーザ加工により一挙に穿孔する
ようにしても良い。In the above embodiment, the copper plate 1 has a through hole 1H which has been opened in advance. However, after lamination, a metal foil (copper foil) or a resin insulating layer may be punched at once. You may do it. Further, in the above embodiment, the resin insulating layer is perforated by laser processing, but may be perforated by a drill. Alternatively, the holes may be formed at once by laser processing, including the metal plate (copper plate 1) and the metal foil (copper foils 4, 5 and the like).
【0032】また、上記実施形態では、上型PUや下型
PDと銅箔4,5等との間に介挿体KT1,KT2を介
在させ、積層プリント配線板30を製造しているが、介
挿体KT1,KT2を用いないで、上型PUの下面(プ
レス面)および下型PDの上面(プレス面)をそれぞれ
上記した範囲の表面粗さに仕上げ、これらの面が直接銅
箔に当接するようにして加熱プレス加工をしても良い。
また、介挿体KT1,KT2と上型PU,下型PDとを
それぞれ接着して、一体として加熱プレス加工をしても
良い。このようにしたときは、介挿体KT1,KT2を
加熱プレス加工の度に、銅箔4,8の上に重ねたり、銅
箔5,9の下に敷いたりする面倒をなくすことができ
る。In the above-described embodiment, the laminated printed wiring board 30 is manufactured by interposing the inserts KT1 and KT2 between the upper die PU or the lower die PD and the copper foils 4, 5, etc. Without using the inserts KT1 and KT2, the lower surface (press surface) of the upper die PU and the upper surface (press surface) of the lower die PD are each finished to the above-described surface roughness, and these surfaces are directly formed on the copper foil. The heat pressing may be performed so as to be in contact.
Further, the inserts KT1 and KT2 may be bonded to the upper die PU and the lower die PD, respectively, and may be subjected to heat press working integrally. In this case, it is possible to eliminate the trouble of overlaying the inserts KT1 and KT2 on the copper foils 4 and 8 or laying the inserts KT1 and KT2 under the copper foils 5 and 9 every time hot pressing is performed.
【図1】実施形態に係る積層プリント配線板の製造方法
のうち、銅板の両面にプリプレグと銅箔とを加熱プレス
により積層する工程を説明する説明図である。FIG. 1 is an explanatory view illustrating a step of laminating a prepreg and a copper foil on both surfaces of a copper plate by hot pressing in a method of manufacturing a laminated printed wiring board according to an embodiment.
【図2】実施形態に係る積層プリント配線板の製造方法
のうち、積層した銅箔を加工して配線層を形成した
(被)積層プリント配線板の部分拡大断面図である。FIG. 2 is a partially enlarged cross-sectional view of a (substrate) laminated printed wiring board in which a wiring layer is formed by processing a laminated copper foil in the method of manufacturing a laminated printed wiring board according to the embodiment.
【図3】実施形態に係る積層プリント配線板の製造方法
のうち、図2に示す被積層プリント配線板にプリプレグ
と銅箔とを加熱プレスにより積層する工程を説明する説
明図である。FIG. 3 is an explanatory view illustrating a step of laminating a prepreg and a copper foil on a laminated printed wiring board shown in FIG. 2 by a hot press in the method of manufacturing a laminated printed wiring board according to the embodiment.
【図4】実施形態に係る積層プリント配線板の製造方法
のうち、図3に示す工程で積層した銅箔を加工して配線
層を形成した(被)積層プリント配線板の部分拡大断面
図である。4 is a partially enlarged cross-sectional view of a (printed) laminated printed wiring board in which a wiring layer is formed by processing a copper foil laminated in the step shown in FIG. 3 in the method for manufacturing a laminated printed wiring board according to the embodiment; is there.
【図5】実施形態に係る積層プリント配線板の製造方法
により完成した積層プリント配線板の部分拡大断面図で
ある。FIG. 5 is a partially enlarged cross-sectional view of the laminated printed wiring board completed by the method for manufacturing a laminated printed wiring board according to the embodiment.
【図6】積層プリント配線板の収縮率の測定方法を説明
する説明図であり、(a)は加熱プレス前に銅板に形成
した貫通孔間の距離Lの測定方法、(b)は加熱プレス
後の積層プリント配線板、(c)は積層プリント配線板
において銅板に形成された貫通孔間の距離Lに対応する
距離Mの測定方法を示す。6A and 6B are explanatory diagrams illustrating a method for measuring a shrinkage ratio of a laminated printed wiring board, wherein FIG. 6A is a method for measuring a distance L between through holes formed in a copper plate before hot pressing, and FIG. (C) shows a method of measuring the distance M corresponding to the distance L between the through holes formed in the copper plate in the laminated printed wiring board.
【図7】介挿体の当接面の表面粗さRzと積層プリント
配線板の収縮率の平均値Srとの関係を示すグラフであ
る。FIG. 7 is a graph showing the relationship between the surface roughness Rz of the contact surface of the interposer and the average value Sr of the shrinkage of the laminated printed wiring board.
【図8】従来技術における積層プリント配線板の製造方
法のうち、銅板の両面にプリプレグと銅箔とを加熱プレ
スにより積層する工程を説明する説明図である。FIG. 8 is an explanatory view illustrating a step of laminating a prepreg and a copper foil on both surfaces of a copper plate by a hot press in a method of manufacturing a laminated printed wiring board in a conventional technique.
【図9】従来技術における積層プリント配線板の製造方
法のうち、積層した銅箔を加工して配線層を形成した
(被)積層プリント配線板の部分拡大断面図である。FIG. 9 is a partially enlarged cross-sectional view of a (substrate) laminated printed wiring board in which a wiring layer is formed by processing a laminated copper foil in a method of manufacturing a laminated printed wiring board in a conventional technique.
【図10】従来技術における積層プリント配線板の製造
方法のうち、図2に示す被積層プリント配線板にプリプ
レグと銅箔とを加熱プレスにより積層する工程を説明す
る説明図である。FIG. 10 is an explanatory view illustrating a step of laminating a prepreg and a copper foil on the laminated printed wiring board shown in FIG. 2 by a hot press in a method of manufacturing a laminated printed wiring board in a conventional technique.
【図11】従来技術における積層プリント配線板の製造
方法のうち、図9に説明する工程で積層した銅箔を加工
して配線層を形成した(被)積層プリント配線板の部分
拡大断面図である。FIG. 11 is a partially enlarged cross-sectional view of a (substrate) laminated printed wiring board in which a wiring layer is formed by processing copper foil laminated in the process described in FIG. is there.
【図12】従来技術に係り、積層プリント配線板の収縮
により、ブラインドビアが受けランドから外れた状態を
説明する説明図である。FIG. 12 is an explanatory view illustrating a state in which a blind via comes off a receiving land due to shrinkage of a laminated printed wiring board according to a conventional technique.
1 銅板(金属板) 1A (銅板の)表面 1B (銅板の)裏面 2,3,6,7 プリプレグ 4,5,8,9 銅箔(金属箔) 10,20 積層プリント配線板(被積
層プリント配線板) 10A (積層プリント配線板10
の)表面 10B (積層プリント配線板10
の)裏面 20A (積層プリント配線板20
の)表面 20B (積層プリント配線板20
の)裏面 12,13,26,27 樹脂絶縁層 14,15,28,29 配線層 30 積層プリント配線板 KT1,KT2 介挿体 KT1B,KT2A (介挿体の)当接面 PU 上型 PD 下型DESCRIPTION OF SYMBOLS 1 Copper plate (metal plate) 1A (copper plate) front surface 1B (copper plate) back surface 2,3,6,7 Prepreg 4,5,8,9 Copper foil (metal foil) 10,20 Laminated printed wiring board (laminated print (Wiring board) 10A (laminated printed wiring board 10)
Surface 10B (laminated printed wiring board 10)
Back) 20A (laminated printed wiring board 20)
Surface 20B (laminated printed wiring board 20)
) Back surface 12, 13, 26, 27 Resin insulating layer 14, 15, 28, 29 Wiring layer 30 Laminated printed wiring board KT1, KT2 Interposed body KT1B, KT2A (of interposed body) Contact surface PU Upper die PD Lower Type
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F100 AB01A AB17C AB17E AB33C AB33E AK18 AK53 AT00E BA05 BA06 BA10E DH01B DH01D DJ10 EC01 EJ59 EJ82 GB43 JA03 JL02 JL04 5E346 AA03 AA12 AA24 BB01 CC08 EE02 EE06 EE09 EE13 GG01 GG28 HH11 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4F100 AB01A AB17C AB17E AB33C AB33E AK18 AK53 AT00E BA05 BA06 BA10E DH01B DH01D DJ10 EC01 EJ59 EJ82 GB43 JA03 JL02 JL04 5E346 AA03 AA12 AA24 BB01 CC08 EE09 EE06
Claims (2)
面に、それぞれプリプレグを介して金属箔を重ね、表面
粗さがそれぞれRz=0.4μm以上、Rz=5μm未
満の2つの当接面で、上記金属箔を当接させつつ挟んで
加熱プレスする加熱プレス工程を備える積層プリント配
線板の製造方法。1. A metal foil is laminated on the front and back surfaces of a metal plate or a printed wiring board to be laminated via prepregs, and two contact surfaces having a surface roughness of not less than Rz = 0.4 μm and less than Rz = 5 μm, respectively. A method for manufacturing a laminated printed wiring board, comprising a heating press step of heating and pressing while holding the metal foil in contact with the metal foil.
造方法であって、 前記金属箔とプレス金型との間にそれぞれ介挿体が介在
し、 前記当接面は、それぞれ2つの上記介挿体のうち上記金
属箔と当接させる面であることを特徴とする積層プリン
ト配線板の製造方法。2. The method for manufacturing a laminated printed wiring board according to claim 1, wherein an interposed body is interposed between the metal foil and a press die, and the contact surfaces are two A method for manufacturing a laminated printed wiring board, which is a surface of the interposer that is in contact with the metal foil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27999298A JP2000114720A (en) | 1998-10-01 | 1998-10-01 | Manufacture of layered printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27999298A JP2000114720A (en) | 1998-10-01 | 1998-10-01 | Manufacture of layered printed wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000114720A true JP2000114720A (en) | 2000-04-21 |
Family
ID=17618806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27999298A Pending JP2000114720A (en) | 1998-10-01 | 1998-10-01 | Manufacture of layered printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000114720A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002314251A (en) * | 2001-04-09 | 2002-10-25 | Matsushita Electric Ind Co Ltd | Manufacturing method of ceramic multilayer substrate |
| KR100710119B1 (en) | 2003-11-14 | 2007-04-23 | 히다치 가세고교 가부시끼가이샤 | Process for forming metal layer on resin layer, print distributing board and manufacturing method thereof |
| US8058561B2 (en) | 2008-02-19 | 2011-11-15 | Unimicron Technology Corp. | Circuit board and manufacturing method thereof |
-
1998
- 1998-10-01 JP JP27999298A patent/JP2000114720A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002314251A (en) * | 2001-04-09 | 2002-10-25 | Matsushita Electric Ind Co Ltd | Manufacturing method of ceramic multilayer substrate |
| KR100710119B1 (en) | 2003-11-14 | 2007-04-23 | 히다치 가세고교 가부시끼가이샤 | Process for forming metal layer on resin layer, print distributing board and manufacturing method thereof |
| US8058561B2 (en) | 2008-02-19 | 2011-11-15 | Unimicron Technology Corp. | Circuit board and manufacturing method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1180920B1 (en) | Method of manufacturing a circuit board | |
| KR102047416B1 (en) | Manufacturing Method of Printed Board | |
| JPWO2009119027A1 (en) | Rigid-flex circuit board manufacturing method and rigid-flex circuit board | |
| CN100469215C (en) | Multilayer circuit substrate and method of manufacturing the same | |
| KR100755795B1 (en) | Method of manufacturing multi-layer circuit board | |
| JP3879158B2 (en) | Multilayer printed wiring board and manufacturing method thereof | |
| TW200522831A (en) | Method of manufacturing circuit board | |
| JP2000114720A (en) | Manufacture of layered printed wiring board | |
| JP4973202B2 (en) | Multilayer circuit board manufacturing method | |
| JP5194951B2 (en) | Circuit board manufacturing method | |
| JP3953433B2 (en) | Manufacturing method of multilayer wiring board | |
| JP2005191549A (en) | Manufacturing method of component built-in module and component built-in module | |
| JP2012243829A (en) | Multilayered printed wiring board and method of manufacturing the same | |
| JP2006313932A (en) | Multilayer circuit board and manufacturing method thereof | |
| JP2004146624A (en) | Manufacturing method of metal foil-clad laminate with inner layer circuit | |
| JP3923224B2 (en) | Multilayer printed wiring board and manufacturing method thereof | |
| JP3168870B2 (en) | Manufacturing method of multilayer laminate | |
| JP3934826B2 (en) | Manufacturing method of multilayer wiring board | |
| JP4277827B2 (en) | Manufacturing method of laminate | |
| JPH10303553A (en) | Manufacture for printed wiring board | |
| JPS63246897A (en) | Manufacture of metal base double-layer interconnection board | |
| JP4599745B2 (en) | Method for producing metal-clad laminate | |
| JP5077801B2 (en) | Manufacturing method of multilayer printed wiring board | |
| JPH0955582A (en) | Method of manufacturing thick conductor embedded circuit board | |
| JP2001237549A (en) | Multilayer wiring board and method of manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060214 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060314 |
|
| A02 | Decision of refusal |
Effective date: 20060912 Free format text: JAPANESE INTERMEDIATE CODE: A02 |