JP2000183388A - Sealing film for solar cell - Google Patents
Sealing film for solar cellInfo
- Publication number
- JP2000183388A JP2000183388A JP10359333A JP35933398A JP2000183388A JP 2000183388 A JP2000183388 A JP 2000183388A JP 10359333 A JP10359333 A JP 10359333A JP 35933398 A JP35933398 A JP 35933398A JP 2000183388 A JP2000183388 A JP 2000183388A
- Authority
- JP
- Japan
- Prior art keywords
- film
- solar cell
- depth
- sealing
- sealing film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007789 sealing Methods 0.000 title claims abstract description 43
- 239000011342 resin composition Substances 0.000 claims abstract description 10
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 7
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 claims description 31
- 238000004049 embossing Methods 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- 239000005038 ethylene vinyl acetate Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 230000006378 damage Effects 0.000 abstract description 5
- 238000004132 cross linking Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000010248 power generation Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 3
- 150000001451 organic peroxides Chemical class 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- UWNADWZGEHDQAB-UHFFFAOYSA-N 2,5-dimethylhexane Chemical compound CC(C)CCC(C)C UWNADWZGEHDQAB-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- ZQBAKBUEJOMQEX-UHFFFAOYSA-N phenyl salicylate Chemical compound OC1=CC=CC=C1C(=O)OC1=CC=CC=C1 ZQBAKBUEJOMQEX-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- -1 t-butylperoxy Chemical group 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- BOCBOJPUWMTAJB-UHFFFAOYSA-N (2-butylphenyl) 2-hydroxybenzoate Chemical compound CCCCC1=CC=CC=C1OC(=O)C1=CC=CC=C1O BOCBOJPUWMTAJB-UHFFFAOYSA-N 0.000 description 1
- VVUWYXJTOLSMFV-UHFFFAOYSA-N (2-hydroxy-4-octylphenyl)-phenylmethanone Chemical compound OC1=CC(CCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 VVUWYXJTOLSMFV-UHFFFAOYSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- NALFRYPTRXKZPN-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane Chemical compound CC1CC(C)(C)CC(OOC(C)(C)C)(OOC(C)(C)C)C1 NALFRYPTRXKZPN-UHFFFAOYSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- ZNCDSAZBKYUMAB-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)octane Chemical compound CCCCCCCC(OOC(C)(C)C)OOC(C)(C)C ZNCDSAZBKYUMAB-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- HQOVXPHOJANJBR-UHFFFAOYSA-N 2,2-bis(tert-butylperoxy)butane Chemical compound CC(C)(C)OOC(C)(CC)OOC(C)(C)C HQOVXPHOJANJBR-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- ODBCKCWTWALFKM-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhex-3-yne Chemical compound CC(C)(C)OOC(C)(C)C#CC(C)(C)OOC(C)(C)C ODBCKCWTWALFKM-UHFFFAOYSA-N 0.000 description 1
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000000981 basic dye Substances 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- FENNUTZYPOEXMW-UHFFFAOYSA-N bis(3,3,5,5-tetramethylpiperazin-1-yl) decanedioate Chemical compound C1C(C)(C)NC(C)(C)CN1OC(=O)CCCCCCCCC(=O)ON1CC(C)(C)NC(C)(C)C1 FENNUTZYPOEXMW-UHFFFAOYSA-N 0.000 description 1
- 230000005779 cell damage Effects 0.000 description 1
- 208000037887 cell injury Diseases 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QUAMTGJKVDWJEQ-UHFFFAOYSA-N octabenzone Chemical compound OC1=CC(OCCCCCCCC)=CC=C1C(=O)C1=CC=CC=C1 QUAMTGJKVDWJEQ-UHFFFAOYSA-N 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- QRMPKOFEUHIBNM-UHFFFAOYSA-N p-dimethylcyclohexane Natural products CC1CCC(C)CC1 QRMPKOFEUHIBNM-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229960000969 phenyl salicylate Drugs 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Photovoltaic Devices (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は太陽電池用封止膜に
係り、特に、架橋剤を含む透明軟質樹脂組成物を成膜し
て得られるフィルムにエンボス加工を施してなる太陽電
池用封止膜であって、太陽電池作製時の封止工程におけ
る太陽電池用セルの破損の問題のない太陽電池用封止膜
に関する。The present invention relates to a sealing film for a solar cell, and more particularly to a sealing film for a solar cell obtained by embossing a film obtained by forming a transparent soft resin composition containing a crosslinking agent. The present invention relates to a sealing film for a solar cell, which does not have a problem of damage to a cell for a solar cell in a sealing step at the time of manufacturing a solar cell.
【0002】[0002]
【従来の技術】近年、資源の有効利用や環境汚染の防止
等の面から、太陽光を直接電気エネルギーに変換する太
陽電池が注目され、開発が進められている。2. Description of the Related Art In recent years, solar cells which directly convert sunlight into electric energy have been attracting attention from the viewpoints of effective use of resources and prevention of environmental pollution, and their development has been promoted.
【0003】太陽電池は、一般に、図2に示す如く、表
面側透明保護部材としてのガラス基板11と裏面側保護
部材(バックカバー)12との間にEVAフィルム13
A,13Bの封止膜により、シリコン発電素子14等の
太陽電池用セルを封止した構成とされている。As shown in FIG. 2, a solar cell generally has an EVA film 13 between a glass substrate 11 as a front-side transparent protective member and a back-side protective member (back cover) 12.
The solar cell such as the silicon power generation element 14 is sealed with the sealing films A and 13B.
【0004】このような太陽電池は、ガラス基板11、
封止膜用EVAフィルム13A、シリコン発電素子1
4、封止膜用EVAフィルム13B及びバックカバー1
2をこの順で積層し、加熱加圧して、EVAを架橋硬化
させて接着一体化することにより製造される。[0004] Such a solar cell comprises a glass substrate 11,
EVA film 13A for sealing film, silicon power generation element 1
4. EVA film 13B for sealing film and back cover 1
2 are laminated in this order, and heated and pressurized to crosslink and cure the EVA to bond and integrate it.
【0005】なお、封止膜用EVAフィルム13A,1
3Bは、一般に溶融樹脂を直線状スリットを有するダイ
から押し出し、冷却ロール又は水槽で急冷固化するTダ
イ法、カレンダー法等により成膜されている。[0005] The EVA film 13A, 1
3B is generally formed by a T-die method, a calendar method, or the like in which a molten resin is extruded from a die having a linear slit and rapidly cooled and solidified by a cooling roll or a water tank.
【0006】また、各種の接着用フィルムにあっては、
溶着性、加圧接着性を向上させる目的で成膜されたフィ
ルムにエンボス加工を施して、表面に凹凸を付与するこ
とが行われる場合もある。In addition, in various types of adhesive films,
In some cases, a film formed for the purpose of improving the welding property and the pressure-sensitive adhesive property is subjected to embossing to impart unevenness to the surface.
【0007】従来、封止膜用EVAフィルムについて
は、エンボス加工は行われていないか、或いは、エンボ
ス加工を行う場合であっても、形成される凹凸面の深さ
は高々5μm程度であった。Conventionally, EVA films for sealing films have not been embossed, or even when embossing is performed, the depth of the uneven surface formed is at most about 5 μm. .
【0008】[0008]
【発明が解決しようとする課題】太陽電池の作製時にあ
っては、その封止工程の加熱加圧の際に、未溶融状態の
EVAフィルムが太陽電池用セルに押し付けられるた
め、この押圧力で太陽電池が割れるという問題があっ
た。At the time of manufacturing a solar cell, the unmelted EVA film is pressed against the solar cell at the time of heating and pressing in the sealing step. There was a problem that the solar cell cracked.
【0009】本発明は上記従来の問題点を解決し、この
太陽電池作製時の封止工程における太陽電池用セルの破
損を防止し、太陽電池を歩留り良く効率的に作製するこ
とができる太陽電池用封止膜を提供することを目的とす
る。The present invention solves the above-mentioned conventional problems and prevents a solar cell from being damaged in a sealing step during the production of the solar cell, thereby enabling a solar cell to be efficiently produced with high yield. It is intended to provide a sealing film for use.
【0010】[0010]
【課題を解決するための手段】本発明の太陽電池用封止
膜は、架橋剤を含む透明軟質樹脂組成物を成膜して得ら
れるフィルムにエンボス加工を施してなる太陽電池用封
止膜において、該エンボス加工により形成される凹凸面
の深さが15μm以上であることを特徴とする。Means for Solving the Problems A sealing film for a solar cell according to the present invention is obtained by embossing a film obtained by forming a transparent soft resin composition containing a crosslinking agent. Wherein the depth of the uneven surface formed by the embossing is 15 μm or more.
【0011】このように深さ15μm以上の凹凸面を形
成することにより、フィルムに良好なクッション性が付
与されるため、封止工程において、未溶融状態のフィル
ムが押し付けられても太陽電池用セルに加えられる圧力
が緩和され、セルの損傷が防止されるようになる。By forming the uneven surface having a depth of 15 μm or more in this manner, a good cushioning property is imparted to the film. Therefore, even if the unmelted film is pressed in the sealing step, the solar cell The pressure applied to the cell is reduced, and the cell is prevented from being damaged.
【0012】なお、本発明におけるエンボス加工の凹凸
面の深さ(以下、単に「深さ」と称す。)とは、図1に
おけるエンボス加工によるフィルム1の凹凸面の凸部2
の最頂部2Aと凹部3の最深部3Aとの高低差Dを指
す。In the present invention, the depth of the embossed surface (hereinafter, simply referred to as "depth") refers to the convex portion 2 of the embossed surface of the film 1 in FIG.
Is the height difference D between the top 2A and the deepest portion 3A of the recess 3.
【0013】本発明において、フィルムを構成する透明
軟質樹脂はEVA樹脂であることが好ましい。In the present invention, the transparent soft resin constituting the film is preferably an EVA resin.
【0014】特に、本発明では、エンボス加工により、
形成される凹凸面の深さが15〜50μmであることが
好ましく、特に、エンボス加工がフィルムの片面のみに
施されている場合、該深さは、15〜50μmであるこ
とが、また、エンボス加工がフィルムの両面に施されて
いる場合には、該一方の面の深さが15〜50μmであ
り、両面の合計の深さが30〜100μmであることが
好ましい。In particular, in the present invention, embossing
The depth of the uneven surface to be formed is preferably 15 to 50 μm, and in particular, when embossing is performed only on one side of the film, the depth is preferably 15 to 50 μm. When processing is performed on both surfaces of the film, it is preferable that the depth of the one surface is 15 to 50 μm and the total depth of both surfaces is 30 to 100 μm.
【0015】[0015]
【発明の実施の形態】以下に図面を参照して本発明の実
施の形態を詳細に説明する。Embodiments of the present invention will be described below in detail with reference to the drawings.
【0016】図1は本発明の太陽電池用封止膜の実施の
形態を示す断面図である。FIG. 1 is a sectional view showing an embodiment of a solar cell sealing film of the present invention.
【0017】図示の如く、本発明の太陽電池用封止膜
(フィルム)1は、エンボス加工により、フィルムに凹
凸を付与したものである。本発明において、このフィル
ム1のエンボス加工による深さDが15μm未満では、
十分なクッション性が得られず、封止工程におけるセル
の破損を防止し得ない。従って、深さDは15μm以上
とする。ただし、この深さDが過度に大きいと封止時に
空気を巻き込んで、得られる太陽電池内に空気が残留し
易くなることから、深さDは50μm以下とするのが好
ましい。As shown in the figure, the sealing film (film) 1 for a solar cell of the present invention is obtained by embossing a film to have irregularities. In the present invention, when the depth D of the film 1 by embossing is less than 15 μm,
Sufficient cushioning properties cannot be obtained, and damage to cells in the sealing step cannot be prevented. Therefore, the depth D is set to 15 μm or more. However, if the depth D is excessively large, air is entrapped at the time of sealing and air tends to remain in the obtained solar cell. Therefore, the depth D is preferably set to 50 μm or less.
【0018】なお、このエンボス加工はフィルムの片面
にのみ施しても、両面に施しても良い。フィルムの片面
にのみエンボス加工を行う場合には、深さDは15〜5
0μmの範囲であることが好ましく、フィルムの両面に
エンボス加工を行う場合には、片面のエンボス加工の深
さが15〜50μmで、両面の合計が30〜100μm
であることが好ましい。The embossing may be performed only on one side of the film or on both sides. When embossing is performed only on one side of the film, the depth D is 15 to 5
When embossing is performed on both sides of the film, the embossing depth on one side is 15 to 50 μm, and the total of both sides is 30 to 100 μm.
It is preferred that
【0019】このような本発明の太陽電池用封止膜は、
架橋剤を含む透明軟質樹脂組成物、好ましくはEVA樹
脂組成物を常法に従って成膜し、更に、所定の深さの凹
凸面が形成されるように、エンボス加工を施すことによ
り、容易に製造することができる。The sealing film for a solar cell according to the present invention as described above,
Easily manufactured by forming a transparent soft resin composition containing a crosslinking agent, preferably an EVA resin composition, into a film according to a conventional method, and then embossing the film so as to form an uneven surface having a predetermined depth. can do.
【0020】なお、本発明の太陽電池用封止膜の厚さ
は、通常の場合50μm〜2mm程度とされる。The thickness of the solar cell sealing film of the present invention is usually about 50 μm to 2 mm.
【0021】次に、本発明に係る成膜原料として好適な
EVA樹脂組成物について説明する。Next, an EVA resin composition suitable as a film forming raw material according to the present invention will be described.
【0022】本発明で用いられるEVA樹脂は、メルト
フローレートが0.7〜40、特に1.5〜20である
ことが好ましい。The EVA resin used in the present invention preferably has a melt flow rate of 0.7 to 40, particularly preferably 1.5 to 20.
【0023】本発明で用いるEVA樹脂組成物には、耐
候性の向上のために架橋剤を配合して架橋構造を持たせ
るが、この架橋剤としては、一般に、100℃以上でラ
ジカルを発生する有機過酸化物が用いられ、特に、配合
時の安定性を考慮に入れれば、半減期10時間の分解温
度が70℃以上であるものが好ましい。このような有機
過酸化物としては、例えば2,5−ジメチルヘキサン;
2,5−ジハイドロパーオキサイド;2,5−ジメチル
−2,5−ジ(t−ブチルパーオキシ)ヘキサン;3−
ジ−t−ブチルパーオキサイド;t−ジクミルパーオキ
サイド;2,5−ジメチル−2,5−ジ(t−ブチルパ
ーオキシ)ヘキシン;ジクミルパーオキサイド;α,
α’−ビス(t−ブチルパーオキシイソプロピル)ベン
ゼン;n−ブチル−4,4−ビス(t−ブチルパーオキ
シ)ブタン;2,2−ビス(t−ブチルパーオキシ)ブ
タン;1,1−ビス(t−ブチルパーオキシ)シクロヘ
キサン;1,1−ビス(t−ブチルパーオキシ)3,
3,5−トリメチルシクロヘキサン;t−ブチルパーオ
キシベンゾエート;ベンゾイルパーオキサイド等を用い
ることができる。これらの有機過酸化物の配合量は、一
般にEVA樹脂100重量部に対して5重量部以下、好
ましくは1〜3重量部である。The EVA resin composition used in the present invention has a cross-linking structure by blending a cross-linking agent for improving weather resistance. The cross-linking agent generally generates radicals at 100 ° C. or higher. Organic peroxides are used, and those having a half-life of 10 hours and a decomposition temperature of 70 ° C. or more are particularly preferable in consideration of stability at the time of compounding. Such organic peroxides include, for example, 2,5-dimethylhexane;
2,5-dihydroperoxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexane; 3-
Di-t-butyl peroxide; t-dicumyl peroxide; 2,5-dimethyl-2,5-di (t-butylperoxy) hexyne; dicumyl peroxide;
α'-bis (t-butylperoxyisopropyl) benzene; n-butyl-4,4-bis (t-butylperoxy) butane; 2,2-bis (t-butylperoxy) butane; 1,1- Bis (t-butylperoxy) cyclohexane; 1,1-bis (t-butylperoxy) 3,
3,5-trimethylcyclohexane; t-butylperoxybenzoate; benzoyl peroxide and the like can be used. The compounding amount of these organic peroxides is generally 5 parts by weight or less, preferably 1 to 3 parts by weight, based on 100 parts by weight of the EVA resin.
【0024】また、太陽電池の封止膜として、発電素子
との接着力向上の目的で、EVA樹脂にシランカップリ
ング剤を添加することができる。この目的に供されるシ
ランカップリング剤としては公知のもの、例えばγ−ク
ロロプロピルトリメトキシシラン;ビニルトリクロロシ
ラン;ビニルトリエトキシシラン;ビニル−トリス−
(β−メトキシエトキシ)シラン;γ−メタクリロキシ
プロピルトリメトキシシラン;β−(3,4−エトキシ
シクロヘキシル)エチルトリメトキシシラン;γ−グリ
シドキシプロピルトリメトキシシラン;ビニルトリアセ
トキシシラン;γ−メルカプトプロピルトリメトキシシ
ラン;γ−アミノプロピルトリメトキシシラン;N−β
−(アミノエチル)−γ−アミノプロピルトリメトキシ
シラン等を挙げることができる。これらのシランカップ
リング剤の配合量は、一般にEVA樹脂100重量部に
対して5重量部以下、好ましくは0.1〜2重量部であ
る。In addition, a silane coupling agent can be added to the EVA resin as a sealing film of the solar cell for the purpose of improving the adhesive strength with the power generating element. Known silane coupling agents for this purpose, for example, γ-chloropropyltrimethoxysilane; vinyltrichlorosilane; vinyltriethoxysilane; vinyl-tris-
(Β-methoxyethoxy) silane; γ-methacryloxypropyltrimethoxysilane; β- (3,4-ethoxycyclohexyl) ethyltrimethoxysilane; γ-glycidoxypropyltrimethoxysilane; vinyltriacetoxysilane; γ-mercapto Propyltrimethoxysilane; γ-aminopropyltrimethoxysilane; N-β
-(Aminoethyl) -γ-aminopropyltrimethoxysilane and the like. The amount of the silane coupling agent is generally 5 parts by weight or less, preferably 0.1 to 2 parts by weight, based on 100 parts by weight of the EVA resin.
【0025】更に、EVA樹脂のゲル分率を向上させ、
耐久性を向上するためにEVA樹脂に架橋助剤を添加す
ることができる。この目的に供される架橋助剤として
は、公知のものとしてトリアリルイソシアヌレート;ト
リアリルイソシアネート等の3官能の架橋助剤の他、N
Kエステル等の単官能の架橋助剤等も挙げることができ
る。これらの架橋助剤の配合量は、一般にEVA樹脂1
00重量部に対して10重量部以下、好ましくは1〜5
重量部である。Further, the gel fraction of the EVA resin is improved,
A crosslinking aid can be added to the EVA resin to improve durability. Examples of the crosslinking auxiliary used for this purpose include known triaryl isocyanurate; trifunctional crosslinking auxiliary such as triallyl isocyanate;
Monofunctional crosslinking assistants such as K ester can also be mentioned. The amount of these crosslinking aids is generally equal to the amount of EVA resin 1
10 parts by weight or less, preferably 1 to 5 parts by weight with respect to 00 parts by weight
Parts by weight.
【0026】更に、EVA樹脂の安定性を向上する目的
でハイドロキノン;ハイドロキノンモノメチルエーテ
ル;p−ベンゾキノン;メチルハイドロキノンなどを添
加することができ、これらの配合量は、一般にEVA樹
脂100重量部に対して5重量部以下である。Further, for the purpose of improving the stability of the EVA resin, hydroquinone; hydroquinone monomethyl ether; p-benzoquinone; methylhydroquinone and the like can be added. 5 parts by weight or less.
【0027】更に、必要に応じ、上記以外に着色剤、紫
外線吸収剤、老化防止剤、変色防止剤等を添加すること
ができる。着色剤の例としては、金属酸化物、金属粉等
の無機顔料、アゾ系、フタロシアニン系、アヂ系、酸性
又は塩基染料系レーキ等の有機顔料がある。紫外線吸収
剤には、2−ヒドロキシ−4−オクトキシベンゾフェノ
ン;2−ヒドロキシ−4−メトキシ−5−スルフォベン
ゾフェノン等のベンゾフェノン系;2−(2’−ヒドロ
キシ−5−メチルフェニル)ベンゾトリアゾール等のベ
ンゾトリアゾール系;フェニルサルシレート;p−t−
ブチルフェニルサルシレート等のヒンダートアミン系が
ある。老化防止剤としては、アミン系;フェノール系;
ビスフェニル系;ヒンダートアミン系があり、例えばジ
−t−ブチル−p−クレゾール;ビス(2,2,6,6
−テトラメチル−4−ピペラジル)セバケート等があ
る。Further, if necessary, a coloring agent, an ultraviolet absorber, an antioxidant, a discoloration inhibitor and the like can be added in addition to the above. Examples of the coloring agent include inorganic pigments such as metal oxides and metal powders, and organic pigments such as azo-based, phthalocyanine-based, azo-based, acidic or basic dye-based lakes. UV absorbers include 2-hydroxy-4-octoxybenzophenone; benzophenones such as 2-hydroxy-4-methoxy-5-sulfobenzophenone; 2- (2'-hydroxy-5-methylphenyl) benzotriazole; Benzotriazoles; phenyl salicylate; pt-
There are hindered amines such as butylphenyl salicylate. As anti-aging agents, amines; phenols;
Bisphenyl type; hindered amine type, for example, di-t-butyl-p-cresol; bis (2,2,6,6
-Tetramethyl-4-piperazyl) sebacate.
【0028】このようにして成膜されたEVAフィルム
を用いて太陽電池を製造するには、図2に示す如く、ガ
ラス基板11、EVAフィルム13A、シリコン発電素
子14、EVAフィルム13B及びバックカバー12を
積層し、積層体を常法に従って、真空ラミネーターで温
度100〜150℃、脱気時間5〜12分、プレス圧力
0.5〜1kg/cm2、プレス時間8〜45分で加熱
加圧圧着すれば良く、この加熱加圧時に、EVAフィル
ム13A,13Bが架橋して耐候性に優れた封止膜を形
成することができる。この封止に当り、本発明のEVA
フィルムは、クッション性が良好であるため、未溶融の
フィルムがセルに押し付けられることによるセルの損傷
を防止して高品質の製品を歩留り良く製造することがで
きる。To manufacture a solar cell using the EVA film formed as described above, as shown in FIG. 2, a glass substrate 11, an EVA film 13A, a silicon power generation element 14, an EVA film 13B and a back cover 12 are formed. According to a conventional method, the laminate is heated and pressed by a vacuum laminator at a temperature of 100 to 150 ° C., a deaeration time of 5 to 12 minutes, a press pressure of 0.5 to 1 kg / cm 2 , and a press time of 8 to 45 minutes. At this time, the EVA films 13A and 13B are crosslinked at the time of heating and pressurization, so that a sealing film having excellent weather resistance can be formed. In this sealing, the EVA of the present invention is used.
Since the film has a good cushioning property, it is possible to prevent the cell from being damaged due to the unmelted film being pressed against the cell, and to produce a high-quality product with good yield.
【0029】[0029]
【実施例】以下に実施例及び比較例を挙げて本発明をよ
り具体的に説明する。The present invention will be described more specifically below with reference to examples and comparative examples.
【0030】実施例1〜4、比較例1,2下記配合のE
VA樹脂組成物を用いて、EVAフィルムを成膜し、エ
ンボス加工により、片面に表1に示す深さのDの凹凸を
形成したフィルムを得た。なお、フィルムの厚さは60
0μmである。Examples 1 to 4, Comparative Examples 1 and 2
Using the VA resin composition, an EVA film was formed into a film, and an embossing process was performed to obtain a film on one side of which a D-shaped unevenness having a depth shown in Table 1 was formed. The thickness of the film is 60
0 μm.
【0031】 [EVA樹脂組成物配合(重量部)] EVA樹脂(酢酸ビニル含有量26重量%、メルトフローレート4.0) :100 架橋剤(1,1−ビス(t−ブチルパーオキシ)3,3,5−トリメチルシ クロヘキサン) :2.0 シランカップリング剤(γ−メタクリロキシプロピルトリメトキシシラン) :1.0 架橋助剤(トリアリルイソシアヌレート) :3.0 紫外線吸着剤(2−ヒドロキシ−4−オクチルベンゾフェノン) :0.3 このフィルムを封止膜用EVAフィルム13A,13B
として用い、図2に示す如く、厚さ3mmのガラス板1
1、厚さ38μmのフッ化ポリエチレンフィルムよりな
るバックガード12との間にシリコン発電素子14を封
止して太陽電池を製造した。なお、フィルム13A,1
3Bはそのエンボス加工面が素子14側となるように配
置した。また、封止は、真空ラミネーターを用い、熱板
温度100℃、脱気時間5分、プレス圧力1atm、プ
レス時間45分間加熱圧着し、EVA樹脂を架橋するこ
とにより行った。[EVA resin composition formulation (parts by weight)] EVA resin (vinyl acetate content 26% by weight, melt flow rate 4.0): 100 Crosslinking agent (1,1-bis (t-butylperoxy) 3) , 3,5-trimethylcyclohexane): 2.0 Silane coupling agent (γ-methacryloxypropyltrimethoxysilane): 1.0 Crosslinking aid (triallyl isocyanurate): 3.0 Ultraviolet adsorbent (2 -Hydroxy-4-octylbenzophenone): 0.3 This film is used as an EVA film for sealing film 13A, 13B.
2 and a glass plate 1 having a thickness of 3 mm as shown in FIG.
1. The silicon power generation element 14 was sealed between the back guard 12 made of a fluorinated polyethylene film having a thickness of 38 μm to manufacture a solar cell. The films 13A, 1
3B was arranged such that the embossed surface was on the element 14 side. The sealing was performed by using a vacuum laminator to heat and press the hot plate at 100 ° C., a deaeration time of 5 minutes, a press pressure of 1 atm, and a press time of 45 minutes to crosslink the EVA resin.
【0032】このようにして、100個の太陽電池を作
製したときに、素子の損傷が生じた個数と、太陽電池内
に空気の残留が発生した個数を調べ、結果を表1に示し
た。In this way, when 100 solar cells were manufactured, the number of damaged elements and the number of remaining air in the solar cells were examined. The results are shown in Table 1.
【0033】[0033]
【表1】 [Table 1]
【0034】表1より、本発明の太陽電池用封止膜によ
れば、太陽電池作製時の封止工程で太陽電池用セルに封
止膜が押し付けられることによるセルの損傷を有効に防
止することができることがわかる。According to Table 1, according to the solar cell sealing film of the present invention, cell damage due to the sealing film being pressed against the solar cell in the sealing step at the time of manufacturing the solar cell is effectively prevented. We can see that we can do it.
【0035】[0035]
【発明の効果】以上詳述した通り、本発明の太陽電池用
封止膜によれば、太陽電池作製時の封止工程で太陽電池
用セルに封止膜が押し付けられることによるセルの損傷
を有効に防止することができ、太陽電池を高い歩留りで
作製することができる。As described in detail above, according to the solar cell sealing film of the present invention, the damage of the cell due to the sealing film being pressed against the solar cell in the sealing step at the time of manufacturing the solar cell. It can be effectively prevented, and a solar cell can be manufactured with a high yield.
【図1】本発明の太陽電池用封止膜の実施の形態を示す
断面図である。FIG. 1 is a cross-sectional view illustrating an embodiment of a solar cell sealing film of the present invention.
【図2】一般的な太陽電池を示す断面図である。FIG. 2 is a cross-sectional view illustrating a general solar cell.
1 封止膜(フィルム) 2 凸部 2A 最頂部 3 凹部 3A 最深部 11 ガラス基板 12 バックカバー 13A,13B EVAフィルム 14 シリコン発電素子 DESCRIPTION OF SYMBOLS 1 Sealing film (film) 2 Convex part 2A Top part 3 Concave part 3A Deepest part 11 Glass substrate 12 Back cover 13A, 13B EVA film 14 Silicon power generation element
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 31/04 (72)発明者 門野 晋 神奈川県横浜市港南区丸山台4−5−1− 103号 Fターム(参考) 4F209 AA10E AH33 PA09 PB01 PC06 PN09 4F213 AA10E AH33 WA12 WA87 WB01 4J002 BB061 EK006 FD146 FD200 GQ00 4M109 AA02 BA03 CA22 EA12 EB02 EB06 EB08 EB18 EC11 EC15 EE02 EE12 GA10 5F051 BA11 BA18 GA03 JA03 JA05──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification FI FI Theme Court ゛ (Reference) // C08L 31/04 (72) Inventor Susumu Susumu Kadano 4-5-1-1, Maruyamadai, Konan-ku, Yokohama, Kanagawa No. 103 F-term (reference) 4F209 AA10E AH33 PA09 PB01 PC06 PN09 4F213 AA10E AH33 WA12 WA87 WB01 4J002 BB061 EK006 FD146 FD200 GQ00 4M109 AA02 BA03 CA22 EA12 EB02 EB06 EB08 EB18 GA03 EA18 EC05
Claims (5)
して得られるフィルムにエンボス加工を施してなる太陽
電池用封止膜において、 該エンボス加工により形成される凹凸面の深さが15μ
m以上であることを特徴とする太陽電池用封止膜。1. A solar cell sealing film obtained by embossing a film obtained by forming a transparent soft resin composition containing a cross-linking agent, wherein the depth of the uneven surface formed by the embossing is reduced. 15μ
m or more.
チレン−酢酸ビニル共重合体樹脂であることを特徴とす
る太陽電池用封止膜。2. The solar cell sealing film according to claim 1, wherein the transparent soft resin is an ethylene-vinyl acetate copolymer resin.
工により形成される凹凸面の深さが15〜50μmであ
ることを特徴とする太陽電池用封止膜。3. The solar cell sealing film according to claim 1, wherein the depth of the uneven surface formed by the embossing is 15 to 50 μm.
フィルムの片面にのみ施されており、該凹凸の深さが1
5〜50μmであることを特徴とする太陽電池用封止
膜。4. The method according to claim 3, wherein the embossing is performed.
It is applied only to one side of the film, and the depth of the unevenness is 1
A solar cell sealing film having a thickness of 5 to 50 μm.
フィルムの両面に施されており、該一方の面の凹凸の深
さが15〜50μmであり、両面の合計の深さが30〜
100μmであることを特徴とする太陽電池用封止膜。5. The method according to claim 3, wherein the embossing is performed.
It is applied to both sides of the film, the depth of the irregularities on one side is 15 to 50 μm, and the total depth of both sides is 30 to 50 μm.
A solar cell sealing film having a thickness of 100 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10359333A JP2000183388A (en) | 1998-12-17 | 1998-12-17 | Sealing film for solar cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10359333A JP2000183388A (en) | 1998-12-17 | 1998-12-17 | Sealing film for solar cell |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000183388A true JP2000183388A (en) | 2000-06-30 |
Family
ID=18463983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10359333A Pending JP2000183388A (en) | 1998-12-17 | 1998-12-17 | Sealing film for solar cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000183388A (en) |
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| WO2010064821A2 (en) | 2008-12-02 | 2010-06-10 | 에스케이씨 주식회사 | Envelope material sheet for solar cell module and solar cell module including same |
| JP2010245184A (en) * | 2009-04-02 | 2010-10-28 | Toyota Motor Corp | Solar cell module |
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| WO2011040281A1 (en) * | 2009-09-29 | 2011-04-07 | 凸版印刷株式会社 | Sealing material sheet |
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| KR101318986B1 (en) | 2012-01-13 | 2013-10-16 | 도레이첨단소재 주식회사 | Low shrinkable encapsulant sheet for solar cell module with high strength and solar cell module using the same |
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| JP3473605B2 (en) | 2000-02-18 | 2003-12-08 | 株式会社ブリヂストン | Solar cell manufacturing method |
| US6660556B2 (en) | 2000-02-18 | 2003-12-09 | Bridgestone Corporation | Method of manufacturing a solar battery |
| JP2002185027A (en) * | 2000-12-18 | 2002-06-28 | Bridgestone Corp | Sealing film for solar battery |
| EP2043163A3 (en) * | 2007-09-25 | 2012-02-15 | Sanyo Electric Co., Ltd. | Method of manufacturing solar cell module and solar cell module thus manufactured |
| WO2010064821A3 (en) * | 2008-12-02 | 2010-08-26 | 에스케이씨 주식회사 | Envelope material sheet for solar cell module and solar cell module including same |
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