JP2000169973A - Surface treatment agent for grain-oriented electrical steel sheet containing no chromium and method for producing grain-oriented electrical steel sheet using the same - Google Patents
Surface treatment agent for grain-oriented electrical steel sheet containing no chromium and method for producing grain-oriented electrical steel sheet using the sameInfo
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- JP2000169973A JP2000169973A JP10346045A JP34604598A JP2000169973A JP 2000169973 A JP2000169973 A JP 2000169973A JP 10346045 A JP10346045 A JP 10346045A JP 34604598 A JP34604598 A JP 34604598A JP 2000169973 A JP2000169973 A JP 2000169973A
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- grain
- oriented electrical
- electrical steel
- steel sheet
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/73—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
- C23C22/74—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process for obtaining burned-in conversion coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/20—Orthophosphates containing aluminium cations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
- C23C22/08—Orthophosphates
- C23C22/22—Orthophosphates containing alkaline earth metal cations
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Treatment Of Metals (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
(57)【要約】
【課題】 クロムを含まない燐酸塩−コロイダルシリカ
系の方向性電磁鋼板用張力付与型絶縁皮膜における耐蝕
性、耐焼鈍性、及び鉄心加工性を向上する。
【解決手段】 固形分換算でAl,Mg,Caの第一燐
酸塩の1種または2種以上100重量部とコロイダルシ
リカ35〜70重量部に対し、ほう素化合物1〜25重
量部含有することを特徴とする方向性電磁鋼板用表面処
理剤。PROBLEM TO BE SOLVED: To improve corrosion resistance, annealing resistance, and core workability of a tension-containing insulating film for directional magnetic steel sheets of a phosphate-colloidal silica-based material containing no chromium. SOLUTION: In terms of solid content, 1 to 25 parts by weight of a boron compound is contained with respect to 100 parts by weight of one or more kinds of primary phosphates of Al, Mg and Ca and 35 to 70 parts by weight of colloidal silica. A surface treating agent for grain-oriented electrical steel sheets, characterized by that:
Description
【0001】[0001]
【発明の属する技術分野】本発明は方向性電磁鋼板用の
絶縁皮膜形成技術に関わり、特に、クロムを含有しない
処理液を提供すると共にそれを用いて耐蝕性、耐焼鈍
性、皮膜張力、絶縁性、密着性及び鉄心加工性等の等の
優れた絶縁皮膜形成方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for forming an insulating film for grain-oriented electrical steel sheets, and more particularly to a processing solution containing no chromium and using the same to use it for corrosion resistance, annealing resistance, film tension, and insulation. The present invention relates to a method for forming an insulating film having excellent properties, adhesion, core workability, and the like.
【0002】[0002]
【従来の技術】方向性電磁鋼板は、Siをたとえば2〜
4%含有する珪素鋼スラブを熱延し、焼鈍した後、1回
或いは中間焼鈍を挟む2回以上の冷延を施して最終板厚
とし、次いで脱炭焼鈍した後MgOを主成分とする焼鈍
分離剤を塗布し、仕上げ焼鈍を行ってゴス方位を持つ二
次再結晶を発達させ、さらにS、N等の不純物を除去す
ると共にグラス皮膜を形成し、次いで絶縁皮膜剤を塗布
し、焼き付けとヒートフラットニング処理を施して最終
製品とされる。このようにして得られる方向性電磁鋼板
は主として電気機器、トランス等の鉄心材料として使用
され、磁束密度が高く、鉄損が優れるものが要求され
る。2. Description of the Related Art Grain-oriented electrical steel sheets are formed by adding Si, for example, from 2 to 2.
A 4% silicon steel slab is hot-rolled, annealed, and then cold-rolled once or twice or more with intermediate annealing to a final thickness, then decarburized and then annealed mainly with MgO. Applying a separating agent, performing finish annealing to develop secondary recrystallization having Goss orientation, further removing impurities such as S and N, forming a glass film, then applying an insulating film agent, and baking. Heat-flattening treatment is performed to obtain the final product. The grain-oriented electrical steel sheet obtained in this way is mainly used as an iron core material for electrical equipment, transformers and the like, and is required to have a high magnetic flux density and an excellent iron loss.
【0003】方向性電磁鋼板がトランス鉄心として用い
られる際には、方向性電磁鋼板コイルはスリットされて
所定の幅にされた後、所定長さに切断され積み重ねられ
て積み鉄心とされ、或いは巻き加工されて巻き鉄心とさ
れる。巻き鉄心の場合にはさらに圧縮成型、歪み取り焼
鈍を経てレーシングと呼ばれる巻き線作業を行ってトラ
ンスとされる。When a grain-oriented magnetic steel sheet is used as a transformer core, the grain-oriented magnetic steel sheet coil is slit into a predetermined width, and then cut into a predetermined length and stacked to form a piled core or wound. It is processed into a wound iron core. In the case of a wound iron core, it is further transformed into a transformer by performing winding work called racing through compression molding and strain relief annealing.
【0004】このトランス製造工程においては切断、巻
き加工、成形作業が容易に行えることが重要である。特
に巻きコア製造においては、切断や巻き成型時に絶縁皮
膜の密着性が優れて発粉等の作業環境を損なわないこと
や、巻き加工性、耐焼鈍性が優れて皮膜性能、磁気特性
及び作業性を損なわないことが重要である。方向性電磁
鋼板の表面皮膜は、通常、最終仕上げ焼鈍中に形成され
た通常グラス皮膜と呼ばれるフォルステライト皮膜とそ
の上に処理される絶縁皮膜とからなる。この絶縁皮膜の
形成技術としては、特公昭53−28375号公報に本
発明者らによってコロイダルシリカと燐酸塩及びクロム
化合物からなる張力皮膜の発明が開示され、工業化され
た。また特開昭61−41778号公報に、第一燐酸塩
に粒子径8nm以下の微粒子コロイダルシリカとクロム
化合物からなる、張力付与性及びスベリ性の優れた処理
剤が開示されている。In the transformer manufacturing process, it is important that cutting, winding, and forming operations can be easily performed. Especially in the production of wound cores, the insulation film has excellent adhesion during cutting and winding molding, and does not impair the working environment such as dusting, and also has excellent winding workability and annealing resistance, and film performance, magnetic properties and workability. It is important not to impair. The surface film of a grain-oriented electrical steel sheet usually consists of a forsterite film usually called a glass film formed during the final annealing and an insulating film to be treated thereon. As a technique for forming the insulating film, Japanese Patent Publication No. 53-28375 discloses the invention of a tension film comprising colloidal silica, a phosphate and a chromium compound, and has been industrialized. Japanese Patent Application Laid-Open No. 61-41778 discloses a treating agent which is excellent in tension imparting property and sliding property, comprising a first phosphate comprising fine colloidal silica having a particle diameter of 8 nm or less and a chromium compound.
【0005】また、特開平3−39484号公報では、
Al,Mg,Ca,Znの第一燐酸塩とクロム化合物に
対し粒径20nm以下のコロイダルシリカと粒径80〜
2000nmのコロイダルシリカを混合することによ
り、絶縁皮膜表面に均一な突起効果を得て、巻き鉄心加
工工程における巻き加工性(滑り性)、耐焼鈍性、皮膜
張力の向上を実現する技術が示されている。In Japanese Patent Application Laid-Open No. 3-39484,
Colloidal silica having a particle size of 20 nm or less with respect to primary phosphates of Al, Mg, Ca, and Zn and a chromium compound,
A technique has been shown in which by mixing 2000 nm of colloidal silica, a uniform projection effect is obtained on the surface of the insulating film to improve winding workability (slipperiness), annealing resistance, and film tension in the winding core processing step. ing.
【0006】更に、耐熱性、滑り性向上技術として、特
開平4−165082号公報には、粒径50nm以下の
コロイダルシリカをSiO2として100重量部に対
し、Al,Mg,Ca,Znの燐酸塩の1種または2種
以上130〜250重量部と、無水クロム酸、クロム酸
塩、重クロム酸塩の1種または2種以上を10〜40重
量部と、Fe,Co,Ba,Zn,Al,Ni,Sn,
Cu,Cr,Cd,Nb,Mn,Mo,Si,Ti,
W,Bi,Srの酸化物、炭化物、窒化物、硫化物、珪
酸塩、炭酸塩、ほう酸塩、硫酸塩、硝酸塩または塩化物
でかつその粒子径が0.5〜2000nmの非コロイド
状固形分の1種または2種以上を0.5〜25重量部と
を配合する処理剤を用いて絶縁皮膜を形成する方法が提
案されている。Further, as a technique for improving heat resistance and slipperiness, Japanese Patent Application Laid-Open No. 4-165082 discloses a phosphate of Al, Mg, Ca, Zn per 100 parts by weight of colloidal silica having a particle size of 50 nm or less as SiO2. 130 to 250 parts by weight of one or more of the following, 10 to 40 parts by weight of one or more of chromic anhydride, chromate, and dichromate, and Fe, Co, Ba, Zn, Al , Ni, Sn,
Cu, Cr, Cd, Nb, Mn, Mo, Si, Ti,
Non-colloidal solids of oxides, carbides, nitrides, sulfides, silicates, carbonates, borates, sulfates, nitrates or chlorides of W, Bi, Sr and having a particle size of 0.5 to 2000 nm There has been proposed a method of forming an insulating film by using a treating agent containing 0.5 to 25 parts by weight of one or more of the above.
【0007】これらの技術により張力効果と鉄心加工性
向上効果が得られ、磁気特性や磁歪特性が優れる方向性
電磁鋼板が得られるようになった。[0007] By these techniques, a tensile effect and an improvement in workability of the iron core can be obtained, and a grain-oriented electrical steel sheet having excellent magnetic properties and magnetostrictive properties has been obtained.
【0008】[0008]
【発明が解決しようとする課題】これらの絶縁皮膜は、
いずれも燐酸塩による皮膜焼き付け処理後における吸湿
性や歪み取り焼鈍時の皮膜焼き付き性を抑制すること等
を考慮して、何れもクロム化合物が添加配合されてき
た。しかし、処理液に無水クロム酸、クロム酸塩或いは
重クロム酸塩を用い6価クロムを含有する場合、塗布作
業時の作業環境や廃液処理作業の問題がある。更に、焼
き付け処理後の皮膜においてはCrは3価クロムに還元
されており有害性は少ないもの、鉄心加工工程において
発粉が生じる場合には作業環境を汚染する恐れもある。SUMMARY OF THE INVENTION These insulating films are:
In all cases, a chromium compound has been added and blended in consideration of, for example, moisture absorption after phosphate baking treatment and suppression of film seizure during strain relief annealing. However, in the case where the treatment liquid contains hexavalent chromium using chromic anhydride, chromate or dichromate, there is a problem of a working environment at the time of coating operation and a waste liquid treatment operation. Further, Cr is reduced to trivalent chromium in the film after the baking treatment and is less harmful. However, if powdering occurs in the iron core processing step, there is a possibility of contaminating the working environment.
【0009】この対策としてクロム化合物を含有しない
絶縁皮膜剤の研究もなされてきた。特公昭57−963
1号公報にはコロイド状シリカをSiO2で20重量
部、燐酸Al10〜120重量部、ほう酸2〜10重量
部とMg,Al,Fe,Co,Ni,Znの硫酸塩のう
ちから選ばれる何れか1種または2種合計で4〜40重
量部とを含有する処理液を300℃以上で焼き付け処理
する絶縁皮膜形成法が提案されている。また特開平7−
180064号公報には、M2+1−xM3+x(OH)2
+x−nyAn−y・mH2 Oの一般式で表される平均
粒子径1μm以下の固溶型複合水酸化物組成である処理
剤が開示されている。[0009] As a countermeasure, studies have been made on an insulating film agent containing no chromium compound. Japanese Patent Publication No. 57-963
No. 1 discloses that colloidal silica is selected from the group consisting of 20 parts by weight of SiO2, 10 to 120 parts by weight of Al phosphate, 2 to 10 parts by weight of boric acid, and sulfates of Mg, Al, Fe, Co, Ni and Zn. There has been proposed an insulating film forming method in which a treatment solution containing 4 to 40 parts by weight of one or two kinds in total is baked at 300 ° C. or more. Also, Japanese Patent Application Laid-Open
No. 180064 discloses M 2+ 1-xM 3+ x (OH) 2
Disclosed is a treating agent having a solid solution composite hydroxide composition having an average particle diameter of 1 μm or less represented by a general formula of + x-nyAn-y · mH 2 O.
【0010】これらは何れも皮膜張力効果を発揮できる
技術であり、それなりに効果を発揮している。しかしな
がら、従来のクロム含有絶縁皮膜剤に比較すると総合的
には十分に皮膜性能が改善されているものとは言い難
く、更なる改善が望まれていた。本発明はクロム化合物
を含有しない絶縁皮膜剤組成を有することで環境問題を
解決すると共に、磁気特性、磁歪特性を改善することが
でき、従来の燐酸塩−コロイダルシリカ系皮膜における
クロム化合物を含有しない場合の耐吸湿性、耐焼鈍性不
良問題を解決する皮膜性能の優れた方向性電磁鋼板用絶
縁皮膜剤とそれを用いた方向性電磁鋼板の製造方法を提
供する。[0010] These are all technologies capable of exhibiting the effect of film tension, and exhibit their effects as such. However, compared with the conventional chromium-containing insulating film agent, it cannot be said that the film performance is generally sufficiently improved, and further improvement has been desired. The present invention solves environmental problems by having an insulating coating agent composition not containing a chromium compound, and can improve magnetic properties and magnetostriction properties, and does not contain a chromium compound in a conventional phosphate-colloidal silica-based coating. The present invention provides an insulating coating agent for a grain-oriented electrical steel sheet having excellent film performance to solve the problems of poor moisture absorption resistance and annealing resistance in such a case, and a method for producing a grain-oriented electrical steel sheet using the same.
【0011】[0011]
【課題を解決するための手段】本発明はクロム化合物を
含有しない方向性電磁鋼板用絶縁皮膜剤組成と絶縁皮膜
処理方法として以下の構成を要旨とする。 (1)固形分換算でAl,Mg,Caの第一燐酸塩10
0重量部とコロイダルシリカ35〜100重量部に対
し、ほう素化合物の1種または2種以上を1〜25重量
部含有することを特徴とするクロム化合物を含まない方
向性電磁鋼板用表面処理剤。The gist of the present invention is as follows, as a composition of an insulating film agent for a grain-oriented electrical steel sheet containing no chromium compound and a method of treating an insulating film. (1) Primary phosphate of Al, Mg, Ca in terms of solid content 10
A surface treatment agent for grain-oriented electrical steel sheets containing no chromium compound, characterized in that it contains 1 to 25 parts by weight of one or more boron compounds based on 0 parts by weight and 35 to 100 parts by weight of colloidal silica. .
【0012】(2)ほう素化合物がほう素の他にLi,
Na,K,Mg,Mn,Ca,Ba,Sr,Zr,F
e,Co,Ni,Cu,Zn,Al,Oのいずれか1 種
または2 種以上の元素からなることを特徴とする(1)
に記載のクロム化合物を含まない方向性電磁鋼板用表面
処理剤。 (3)珪素鋼スラブを熱延し、焼成後1回または中間焼
成を挟む2回以上の冷延して最終板厚とし、脱炭焼鈍
し、焼鈍分離剤を塗布した後最終仕上げ焼鈍し、次いで
絶縁皮膜剤を塗布し焼き付け処理とヒートフラットニン
グを施す方向性電磁鋼板の製造方法において、絶縁皮膜
剤として(1)または(2)に記載の表面処理剤を塗布
し、次いで350℃以上の温度で焼き付け処理を行うこ
とを特徴とする方向性電磁鋼板の製造方法。(2) In addition to boron, the boron compound is Li,
Na, K, Mg, Mn, Ca, Ba, Sr, Zr, F
e, Co, Ni, Cu, Zn, Al, O, or one or more of them. (1)
The surface treating agent for grain-oriented electrical steel sheets which does not contain a chromium compound according to the above. (3) The silicon steel slab is hot-rolled, cold-rolled once or two or more times with intermediate firing after firing to a final thickness, decarburized annealing, applied with an annealing separating agent, and then subjected to final finish annealing, Next, in the method for producing a grain-oriented electrical steel sheet to which an insulating film agent is applied and subjected to baking treatment and heat flattening, the surface treating agent described in (1) or (2) is applied as an insulating film agent, and then 350 ° C. or higher. A method for producing a grain-oriented electrical steel sheet, comprising performing a baking treatment at a temperature.
【0013】[0013]
【発明の実施の形態】本発明者等は燐酸塩、コロイダル
シリカ及びクロム化合物を主成分とする従来の張力付与
型絶縁皮膜における無クロム組成化に取り組んだ。即
ち、従来組成で無クロム化を行った燐酸塩とコロイダル
シリカのみの組成の場合の欠点であった皮膜焼き付け処
理後の吸湿性(ベタツキや錆発生)と歪み取り焼鈍にお
ける焼き付き性を改善するための皮膜組成の開発に取り
組んだ。その結果、燐酸塩とコロイダルシリカを主成分
とする張力付与型皮膜成分において、ほう素化合物の1
種または2種以上を添加することにより、従来の無クロ
ム化における問題を解決し、耐蝕性、耐焼鈍性、密着
性、滑り性、絶縁性等が優れ、磁気特性と磁歪特性が優
れる絶縁皮膜剤とその処理方法の完成に成功した。以
下、詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have worked on a chromium-free composition in a conventional tension-imparting insulating film mainly containing a phosphate, colloidal silica and a chromium compound. That is, in order to improve the hygroscopicity (stickiness and rust generation) after the film baking treatment and the seizure in the strain relief annealing, which were disadvantages in the case of the composition of only the phosphate and colloidal silica which had been made chromium-free in the conventional composition. We worked on the development of the film composition. As a result, in the tension-imparting film component mainly composed of phosphate and colloidal silica, one of boron compounds
Insulation film that solves the problem of conventional chromium-free by adding seeds or two or more kinds, has excellent corrosion resistance, annealing resistance, adhesion, slipperiness, insulation, etc., and has excellent magnetic properties and magnetostriction properties. The agent and its treatment were successfully completed. The details will be described below.
【0014】本発明による表面処理剤の適用に当たって
は、出発材として最終仕上げ焼鈍された方向性電磁鋼板
を用い、連続処理焼き付けラインにおいて余剰焼鈍分離
剤を除去し、軽酸洗の後、本発明の処理剤を鋼板表面に
塗布し焼き付け処理が行われる。本発明においては、先
ず、その皮膜組成に特徴がある。即ち、固形分重量でA
l,Mg,Caの第一燐酸塩100重量部とコロイダル
シリカ35〜100重量部からなるベース液に対し、ほ
う素化合物の1種または2種以上1〜25重量部が添加
される。In applying the surface treatment agent according to the present invention, a finish-annealed grain-oriented electrical steel sheet is used as a starting material, an excess annealing separating agent is removed in a continuous treatment baking line, and after light pickling, the present invention is applied. Is applied to the surface of the steel sheet and a baking treatment is performed. The present invention is first characterized by its film composition. That is, A in solid weight
One or more boron compounds are added in an amount of 1 to 25 parts by weight to a base liquid composed of 100 parts by weight of a primary phosphate of 1, Mg and Ca and 35 to 100 parts by weight of colloidal silica.
【0015】このうち重要な役割を有するほう素化合物
としては、ほう素の他にLi,Na,K,Mg,Mn,
Ca,Ba,Sr,Zr,Fe,Co,Ni,Cu,Z
n,Al,Oから選ばれる元素からなる化合物の1種ま
たは2種以上が添加される。化合物としてはほう酸塩、
ほう素化物、酸化物あるいは他の塩との複合物が用いら
れる。Among the boron compounds having an important role, in addition to boron, Li, Na, K, Mg, Mn,
Ca, Ba, Sr, Zr, Fe, Co, Ni, Cu, Z
One or two or more compounds composed of elements selected from n, Al and O are added. As compounds, borate,
Compounds with borides, oxides or other salts are used.
【0016】本発明による表面処理剤により焼き付け処
理後の吸湿性や歪み取り焼鈍時の鋼板の焼き付き性が阻
止できる理由は明確ではないが次のように推定される。
溶液中に均一分散しているほう素化合物からのほう素や
金属元素が皮膜焼き付け時や歪み取り焼鈍時に第一燐酸
塩より発生するフリー燐酸と反応して、より安定な燐酸
化合物を生成する。即ち、従来のクロム化合物を配合し
た場合にはCrがフリー燐酸と反応してCrPO4 のよ
うな非常に安定な化合物を生成する作用が有るように、
有機酸塩中の金属元素が焼き付けや歪み取り焼鈍時の高
温域で燐酸分と反応して安定化し、分解や燐酸分による
融着性を抑制して、耐吸湿性や耐焼鈍性を向上すると考
えられる。The reason why the surface treating agent of the present invention can prevent the hygroscopicity after the baking treatment and the seizure of the steel sheet during the strain relief annealing is not clear, but is presumed as follows.
Boron and metal elements from the boron compound uniformly dispersed in the solution react with free phosphoric acid generated from the first phosphate during film baking or strain relief annealing to form a more stable phosphate compound. That is, when a conventional chromium compound is blended, Cr has the effect of reacting with free phosphoric acid to produce a very stable compound such as CrPO 4 .
When the metal element in the organic acid salt reacts with the phosphoric acid in the high temperature range during baking or strain relief annealing, it stabilizes, suppressing decomposition and the fusibility due to the phosphoric acid, and improving the moisture absorption resistance and annealing resistance Conceivable.
【0017】次に、本発明による表面処理剤の限定理由
について述べる。本発明の絶縁皮膜においては、まず、
Al,Mg,Caの第一燐酸塩とコロイダルシリカのベ
ース液の割合が重要である。固形分重量で第一燐酸塩1
00重量部に対しコロイダルシリカは35〜100重量
部でなければならない。35重量部未満では皮膜表面が
白濁して透明感と光沢のある皮膜が得られず、皮膜によ
る張力効果が失われ、良好な磁性と磁歪の改善効果が得
られない。一方、100重量部超になると耐吸湿性や耐
焼鈍性は向上するものの、皮膜の張力効果が失われるた
め好ましくない。Next, the reasons for limiting the surface treatment agent according to the present invention will be described. In the insulating film of the present invention, first,
The ratio of primary phosphate of Al, Mg, Ca and base liquid of colloidal silica is important. Primary phosphate 1 by weight of solids
Colloidal silica should be 35 to 100 parts by weight based on 00 parts by weight. If the amount is less than 35 parts by weight, the surface of the film becomes cloudy and a transparent and glossy film cannot be obtained, the tension effect by the film is lost, and good magnetism and magnetostriction improvement effects cannot be obtained. On the other hand, if it exceeds 100 parts by weight, although the moisture absorption resistance and the annealing resistance are improved, the tension effect of the film is lost, which is not preferable.
【0018】本発明の最も特徴となる添加剤であるほう
素化合物としては、ほう素の他にLi,Na,K,M
g,Mn,Ca,Ba,Sr,Zr,Fe,Co,N
i,Cu,Zn,Al,Oから選ばれる元素からなる化
合物の1種または2種以上が添加される。これらのほう
素化合物の添加量は、第一燐酸塩100重量部とコロイ
ダルシリカ35〜100重量部のベース液に対し、1〜
25重量部が配合される。1重量部未満では皮膜中のフ
リーのPO4 との反応によるPの安定化が得られず、耐
吸湿性や耐焼鈍性向上効果が十分に得られなくなるため
制限される。一方、25重量部超では、過剰のほう素化
合物による融着が生じたり、処理溶液の不安定化をもた
らすため制限される。より好ましい添加量の範囲は5〜
15重量部である。The boron compound which is the most characteristic additive of the present invention includes, in addition to boron, Li, Na, K, M
g, Mn, Ca, Ba, Sr, Zr, Fe, Co, N
One or more compounds of the elements selected from i, Cu, Zn, Al and O are added. The amount of the boron compound added is 1 to 100 parts by weight of the first phosphate and 35 to 100 parts by weight of the colloidal silica.
25 parts by weight are blended. If the amount is less than 1 part by weight, P cannot be stabilized by the reaction with free PO 4 in the film, and the effect of improving the moisture absorption resistance and the annealing resistance cannot be sufficiently obtained. On the other hand, if it exceeds 25 parts by weight, fusion is caused by an excessive boron compound or the treatment solution is destabilized, so that it is limited. A more preferable range of the addition amount is 5 to 5.
15 parts by weight.
【0019】これらの組成物は水などの溶媒に分散させ
て鋼板に塗布される。ほう素化合物を添加する際はフリ
ー燐酸との反応を均一化させるために、予め水或いは温
水で水溶液或いは分散液とした後、ベース液の攪拌を行
いながら添加配合するのが望ましく、また塗布する際に
はベース液を十分に攪拌してから塗布処理に移行するの
が有利である。These compositions are dispersed in a solvent such as water and applied to a steel sheet. When the boron compound is added, it is desirable to add and mix while stirring the base solution after previously preparing an aqueous solution or dispersion with water or warm water in order to homogenize the reaction with free phosphoric acid. In this case, it is advantageous to sufficiently agitate the base liquid before proceeding to the coating treatment.
【0020】上記のように調整された処理剤は、連続ラ
インでコーテイングロール等を用いて塗布量を制御しな
がら塗布される。塗布量は適用される鋼板厚みや製品の
使用目的により決められる。本発明の皮膜剤の場合には
2〜7g/m2 であれば皮膜性能、外観は勿論のこと磁
気特性、磁歪特性の優れた方向性電磁鋼板が得られる。The treatment agent adjusted as described above is applied in a continuous line while controlling the application amount using a coating roll or the like. The amount of application is determined by the thickness of the steel sheet to be applied and the purpose of use of the product. In the case of the coating agent of the present invention, if it is 2 to 7 g / m 2 , a grain-oriented electrical steel sheet excellent in not only the coating performance and appearance but also the magnetic characteristics and magnetostriction characteristics can be obtained.
【0021】絶縁皮膜剤を塗布された鋼板は、引き続き
350℃以上の温度で焼き付けられる。焼き付け温度が
350℃未満では第一燐酸塩、コロイダルシリカ及びほ
う素化合物間の反応が十分に行われず、吸湿性が残る。
製品にレーザー等の磁区細分化処理を行い磁気特性の改
善効果を得る場合には350〜450℃の温度域が好ま
しい。しかし、通常の方向性電磁鋼板のように焼き付け
処理時に熱膨張差を利用して十分な張力効果と耐蝕性、
耐焼鈍性を得るためには、750℃〜900℃での焼き
付け処理が必要である。The steel sheet coated with the insulating film agent is subsequently baked at a temperature of 350 ° C. or higher. When the baking temperature is lower than 350 ° C., the reaction between the first phosphate, colloidal silica and boron compound is not sufficiently performed, and the hygroscopic property remains.
In the case where a magnetic domain refinement treatment such as a laser is performed on a product to obtain an effect of improving magnetic properties, a temperature range of 350 to 450 ° C. is preferable. However, as with ordinary grain-oriented electrical steel sheets, a sufficient tensile effect and corrosion resistance,
To obtain annealing resistance, baking treatment at 750 ° C to 900 ° C is required.
【0022】なお本発明剤の適用に際しては、仕上げ焼
鈍でグラス皮膜を形成した材料の他、焼鈍分離剤にグラ
ス皮膜形成阻止剤を用いてグラス形成を阻止したり、酸
洗によりグラス皮膜を除去した、いわゆるグラスレス材
に適用してもよい。When the agent of the present invention is applied, in addition to the material having a glass film formed by finish annealing, glass formation is prevented by using a glass film formation inhibitor as an annealing separating agent, or the glass film is removed by pickling. It may be applied to so-called glassless materials.
【0023】[0023]
【実施例】<実施例1>最終仕上げ焼鈍を行った鋼板表
面にグラス皮膜を有する板厚0.23mmの高磁束密度
方向性電磁鋼板コイルからサンプルを切り出し、水洗後
850℃×4Hrの歪み取り焼鈍を行い、その後2%−
H2 SO4 水溶液中で85℃で15秒間の軽酸洗を行っ
た。このサンプルに、表1に示すようにほう酸塩の種類
と添加量を変更した処理剤溶液を、乾燥、焼き付け後の
重量で4.5g/m2 になるよう、コーテイングロール
を用いて塗布した後、850℃×30秒間の焼き付け処
理を行った。この後、この製品板からサンプルを切り出
し皮膜特性の調査を行った。結果を表2に示す。<Example 1> A sample was cut out from a 0.23 mm high magnetic flux density oriented magnetic steel sheet coil having a glass film on the surface of the steel sheet subjected to final finish annealing, washed with water, and then strained at 850 ° C x 4 hr. Anneal, then 2%-
Light acid washing was performed at 85 ° C. for 15 seconds in an H 2 SO 4 aqueous solution. A coating solution was applied to this sample using a coating roll so that the treating agent solution in which the type and amount of borate were changed as shown in Table 1 was 4.5 g / m 2 in weight after drying and baking. 850 ° C. for 30 seconds. Thereafter, a sample was cut out from the product plate and the film properties were investigated. Table 2 shows the results.
【0024】[0024]
【表1】 [Table 1]
【0025】[0025]
【表2】 この試験の結果、本発明のほう素化合物を添加した本発
明例の場合はいずれも、耐蝕性と耐焼鈍性の優れた改善
効果が得られ、従来のクロム化合物を含有する比較例3
に比し遜色のない結果であった。また潤滑性は比較例3
よりも優れる結果であった。一方、ほう素化合物を添加
しない比較例2 の場合は、耐蝕性と耐燒鈍性、さらに皮
膜張力、磁気特性においても本発明例と比して極めて悪
い結果であった。またほう酸塩添加量が少ない比較例1
においては、無添加の比較例2 と同様、耐蝕性、耐熱性
等においてかなり劣る結果であった。[Table 2] As a result of this test, in each of the examples of the present invention to which the boron compound of the present invention was added, an excellent improvement effect of corrosion resistance and annealing resistance was obtained, and Comparative Example 3 containing the conventional chromium compound was obtained.
The result was not inferior to. Lubricity is comparative example 3
It was a better result. On the other hand, in the case of Comparative Example 2 in which the boron compound was not added, the corrosion resistance and the annealing resistance, the film tension, and the magnetic properties were extremely poor as compared with the examples of the present invention. Comparative Example 1 with a small amount of borate added
As in Comparative Example 2 where no additive was added, the results were considerably inferior in corrosion resistance, heat resistance and the like.
【0026】<実施例2>実施例1と同様に最終仕上げ
焼鈍を行った板厚0.23mmの高磁束密度方向性電磁
鋼板コイルからサンプルを切り出し、水洗後850℃×
4Hrの歪み取り焼鈍を行い、その後2%−H2 SO4
水溶液中で75℃で15秒間の軽酸洗を行った。このサ
ンプルに、表3に示すようにほう素化合物の種類及及び
量を変更した処理剤を、乾燥、焼き付け後の重量で4.
5g/m2 になるようコーテイングロールを用いて塗布
し、850℃×30秒間の焼き付け処理を行った。この
後、この製品板からサンプルを切り出し皮膜特性の調査
を行った。結果を表4に示す。<Example 2> A sample was cut out from a 0.23 mm-thick magnetic steel sheet having a high magnetic flux density which had been subjected to final finish annealing in the same manner as in Example 1, washed with water at 850 ° C ×
4Hr strain relief annealing is performed, and then 2% -H 2 SO 4
Light acid pickling was performed in an aqueous solution at 75 ° C. for 15 seconds. A treating agent in which the type and amount of the boron compound were changed as shown in Table 3 was added to this sample in terms of the weight after drying and baking.
The coating was performed using a coating roll so as to have a concentration of 5 g / m 2, and a baking treatment was performed at 850 ° C. for 30 seconds. Thereafter, a sample was cut out from the product plate and the film properties were investigated. Table 4 shows the results.
【0027】[0027]
【表3】 [Table 3]
【0028】[0028]
【表4】 この試験の結果、実施例1と同様に、本発明のほう素化
合物を添加した場合には何れも耐蝕性、耐焼鈍性が優
れ、磁気特性も良好で、Cr化合物を添加した比較例3
と遜色のない結果であった。一方、ほう素化合物添加量
の多すぎる比較例1 においては絶縁皮膜表面がザラつ
き、耐蝕性、耐燒鈍性においてもやや劣る結果であっ
た。またほう素化合物を添加しない比較例2 の場合は、
耐蝕性、耐燒鈍性が本発明に比しかなり劣る結果であっ
た。[Table 4] As a result of this test, as in Example 1, when the boron compound of the present invention was added, the corrosion resistance and annealing resistance were all excellent, and the magnetic properties were good.
The result was comparable to that. On the other hand, in Comparative Example 1 in which the amount of the boron compound added was too large, the surface of the insulating film was rough and the corrosion resistance and the annealing resistance were slightly inferior. In the case of Comparative Example 2 where no boron compound was added,
Corrosion resistance and annealing resistance were significantly inferior to those of the present invention.
【0029】[0029]
【発明の効果】本発明によれば、燐酸塩−コロイダルシ
リカをベースとし、クロム化合物を含有しない方向性電
磁鋼板の張力皮膜において、ほう素化合物を添加するこ
とにより、焼きつけ後皮膜の耐蝕性が向上し、歪み取り
焼鈍時における耐焼き付き性の顕著な改善効果が得られ
る。According to the present invention, the corrosion resistance of a film after baking is improved by adding a boron compound to a tensile film of a grain-oriented electrical steel sheet containing phosphate-colloidal silica and containing no chromium compound. The effect of remarkable improvement in seizure resistance during strain relief annealing is obtained.
【図1】歪み取り焼鈍における皮膜の焼き付き性を評価
する方法を示す図であり、(a)圧着状態を、(b)は
剥離力を測定する方法を示す図である。FIG. 1 is a diagram showing a method for evaluating the seizure of a film in strain relief annealing, in which (a) shows a pressure-bonded state and (b) shows a method for measuring a peeling force.
【図2】皮膜潤滑性を評価する装置の概要を示す図であ
る。FIG. 2 is a diagram showing an outline of an apparatus for evaluating film lubricity.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 岡田 慎吾 福岡県北九州市戸畑区飛幡町1−1 新日 本製鐵株式会社八幡製鐵所内 (72)発明者 田中 收 福岡県北九州市戸畑区大字中原46番地の59 日鐵プラント設計株式会社内 Fターム(参考) 4K026 AA03 AA22 BA03 BB04 BB05 BB08 BB10 CA16 CA18 CA23 CA24 CA41 DA15 EA07 EA17 EB11 4K033 AA02 HA03 JA01 JA04 LA01 TA01 TA03 UA04 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Shingo Okada, Inventor 1-1, Tobata-cho, Tobata-ku, Kitakyushu-shi, Fukuoka Prefecture Inside Nippon Steel Corporation Yawata Works (72) Inventor, Osamu Tanaka Ogata, Kitakyushu-shi, Fukuoka 46 at Nakahara 59 Nippon Steel Plant Design Co., Ltd. F-term (reference)
Claims (3)
酸塩100重量部とコロイダルシリカ35〜100重量
部に対し、ほう素化合物の1種または2種以上を1〜2
5重量部含有することを特徴とするクロム化合物を含ま
ない方向性電磁鋼板用表面処理剤。1 to 100 parts by weight of a primary phosphate of Al, Mg and Ca and 35 to 100 parts by weight of colloidal silica in terms of solid content, one or more boron compounds are added in an amount of 1 to 2 parts.
A surface treatment agent for grain-oriented electrical steel sheets containing no chromium compound, which is contained in an amount of 5 parts by weight.
a,K,Mg,Mn,Ca,Ba,Sr,Zr,Fe,
Co,Ni,Cu,Zn,Al,Oのいずれか1 種また
は2 種以上の元素からなることを特徴とする請求項1記
載のクロム化合物を含まない方向性電磁鋼板用表面処理
剤。2. The method according to claim 1, wherein the boron compound is Li, N
a, K, Mg, Mn, Ca, Ba, Sr, Zr, Fe,
2. The surface treating agent for grain-oriented electrical steel sheets according to claim 1, wherein the surface treating agent comprises one or more of Co, Ni, Cu, Zn, Al and O.
は中間焼成を挟む2回以上の冷延して最終板厚とし、脱
炭焼鈍し、焼鈍分離剤を塗布した後最終仕上げ焼鈍し、
次いで絶縁皮膜剤を塗布し焼き付け処理とヒートフラッ
トニングを施す方向性電磁鋼板の製造方法において、絶
縁皮膜剤として請求項1または2に記載の表面処理剤を
塗布し、次いで350℃以上の温度で焼き付け処理を行
うことを特徴とする方向性電磁鋼板の製造方法。3. A silicon steel slab is hot-rolled, cold-rolled once or twice or more after intermediate firing to a final thickness, decarburized annealing, coated with an annealing separator, and then final finished annealing. And
Next, in a method for producing a grain-oriented electrical steel sheet, in which an insulating film agent is applied and subjected to baking treatment and heat flattening, the surface treating agent according to claim 1 or 2 is applied as an insulating film agent, and then at a temperature of 350 ° C. or more. A method for producing a grain-oriented electrical steel sheet, comprising performing a baking process.
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|---|---|---|---|
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10346045A JP2000169973A (en) | 1998-12-04 | 1998-12-04 | Surface treatment agent for grain-oriented electrical steel sheet containing no chromium and method for producing grain-oriented electrical steel sheet using the same |
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|---|---|
| JP2000169973A true JP2000169973A (en) | 2000-06-20 |
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ID=18380770
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|---|---|---|---|
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