JP2000036382A - Light emitting element and manufacture thereof - Google Patents
Light emitting element and manufacture thereofInfo
- Publication number
- JP2000036382A JP2000036382A JP11128167A JP12816799A JP2000036382A JP 2000036382 A JP2000036382 A JP 2000036382A JP 11128167 A JP11128167 A JP 11128167A JP 12816799 A JP12816799 A JP 12816799A JP 2000036382 A JP2000036382 A JP 2000036382A
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- light
- gas
- sealing
- moisture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
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- PVADDRMAFCOOPC-UHFFFAOYSA-N oxogermanium Chemical compound [Ge]=O PVADDRMAFCOOPC-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 150000005041 phenanthrolines Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- FIZIRKROSLGMPL-UHFFFAOYSA-N phenoxazin-1-one Chemical compound C1=CC=C2N=C3C(=O)C=CC=C3OC2=C1 FIZIRKROSLGMPL-UHFFFAOYSA-N 0.000 description 1
- UOMHBFAJZRZNQD-UHFFFAOYSA-N phenoxazone Natural products C1=CC=C2OC3=CC(=O)C=CC3=NC2=C1 UOMHBFAJZRZNQD-UHFFFAOYSA-N 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003216 pyrazines Chemical class 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 150000005255 pyrrolopyridines Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000004322 quinolinols Chemical class 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- AKEJUJNQAAGONA-UHFFFAOYSA-N sulfur trioxide Inorganic materials O=S(=O)=O AKEJUJNQAAGONA-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- QKTRRACPJVYJNU-UHFFFAOYSA-N thiadiazolo[5,4-b]pyridine Chemical class C1=CN=C2SN=NC2=C1 QKTRRACPJVYJNU-UHFFFAOYSA-N 0.000 description 1
- NZFNXWQNBYZDAQ-UHFFFAOYSA-N thioridazine hydrochloride Chemical class Cl.C12=CC(SC)=CC=C2SC2=CC=CC=C2N1CCC1CCCCN1C NZFNXWQNBYZDAQ-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電気エネルギーを
光に変換できる素子であって、表示素子、フラットパネ
ルディスプレイ、バックライト、照明、インテリア、標
識、看板、電子写真機、光信号発生器などの分野に利用
可能な発光素子に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an element capable of converting electric energy into light, and relates to a display element, a flat panel display, a backlight, lighting, an interior, a sign, a sign, an electrophotographic device, an optical signal generator, and the like. The present invention relates to a light emitting element that can be used in the field of (1).
【0002】[0002]
【従来の技術】負極から注入された電子と正極から注入
された正孔が両極に挟まれた有機蛍光体内で再結合する
際に発光する有機積層薄膜発光素子の研究が近年活発に
行われている。この素子は、薄型、低駆動電圧下での高
輝度発光、蛍光材料を選ぶことによる多色発光が特徴で
ある。2. Description of the Related Art In recent years, active research has been conducted on organic thin-film light emitting devices that emit light when electrons injected from a negative electrode and holes injected from a positive electrode recombine in an organic phosphor sandwiched between both electrodes. I have. This element is characterized by thinness, high luminance light emission under a low driving voltage, and multicolor light emission by selecting a fluorescent material.
【0003】有機積層薄膜素子が高輝度に発光すること
は、コダック社のC.W.Tangらによって初めて示
された(Appl.Phys.Lett.51(12)
21、p.913、1987)。コダック社の提示した
有機積層薄膜発光素子の代表的な構成は、ITOガラス
基板上に正孔輸送性のジアミン化合物、発光層であり、
電子輸送性も併せ持った8−ヒドロキシキノリンアルミ
ニウム、そして負極としてMg:Agを順次設けたもの
であり、10V程度の駆動電圧で1000カンデラ/平
方メートルの緑色発光が可能であった。現在の有機積層
薄膜発光素子は、上記の素子構成要素の他に、電子輸送
層を別に設けているものなど構成を変えているものもあ
るが、基本的にはコダック社の構成を踏襲している。[0003] It is known from Kodak's C.I. W. Tang et al. (Appl. Phys. Lett. 51 (12)
21, p. 913, 1987). A typical configuration of the organic laminated thin-film light emitting device presented by Kodak Company is a hole transporting diamine compound and a light emitting layer on an ITO glass substrate,
8-Hydroxyquinoline aluminum, which also has an electron transporting property, and Mg: Ag as a negative electrode were sequentially provided, and green light emission of 1000 candela / m 2 was possible at a driving voltage of about 10 V. The current organic laminated thin-film light-emitting device has a different configuration, such as a device provided with an electron transport layer, in addition to the above-described device components, but basically follows the configuration of Kodak. I have.
【0004】ところで有機薄膜積層素子の陰極材料に
は、駆動電圧を下げて高発光効率を得るために低仕事関
数の金属がしばしば用いられるが、これらの材料は大気
中の水分により容易に特性が劣化する。また、素子を構
成する有機材料においても水分による特性の劣化が避け
がたい。具体的にはダークスポット(DS)と呼ばれる
ドット状の非発光部分が生じる。劣化が進むと非発光部
分はしみ状に拡がり、ついには発光しなくなってしま
う。このように水分の耐久性に与える影響を防ぐため
に、素子作製に一般的に用いられる抵抗加熱蒸着法で
は、ITO基板上に正孔輸送層、発光層、必要ならば電
子輸送層、そして陰極と作製していくにあたり、真空一
貫で蒸着して外気に触れないようにする工夫が成されて
きた。しかし、実用的な耐久性を有するためには、作製
後も外気と遮断するための封止が必要であり、これまで
様々な試みがなされてきた。By the way, low work function metals are often used as a cathode material of an organic thin film laminated element in order to obtain a high luminous efficiency by lowering a driving voltage. However, these materials have characteristics easily due to moisture in the atmosphere. to degrade. In addition, deterioration of characteristics due to moisture is unavoidable even in an organic material constituting an element. Specifically, a dot-shaped non-light-emitting portion called a dark spot (DS) is generated. As the deterioration progresses, the non-light-emitting portion spreads like a spot, and eventually stops emitting light. In order to prevent the influence of moisture on durability as described above, a resistance heating evaporation method generally used for device fabrication employs a hole transport layer, a light emitting layer, an electron transport layer if necessary, and a cathode on an ITO substrate. In manufacturing, a device has been devised so as not to be exposed to the outside air by vacuum deposition. However, in order to have practical durability, it is necessary to provide a seal for shutting off outside air even after production, and various attempts have been made so far.
【0005】具体的には、封止層としてポリパラキシレ
ン膜を気相重合法により形成する方法(特開平4−13
7483号公報)やシリカの保護膜を形成する方法(特
開平4−73886号公報)があげられる。しかし、封
止効果が充分でなかったり、封止効果を上げようと膜厚
を厚くするとヒビ割れが生じるなどの問題を抱えてい
た。Specifically, a method of forming a polyparaxylene film as a sealing layer by a gas phase polymerization method (Japanese Patent Laid-Open No.
7483) and a method of forming a silica protective film (JP-A-4-73886). However, there has been a problem that the sealing effect is not sufficient, and cracks occur when the film thickness is increased to increase the sealing effect.
【0006】また樹脂をコーティングする方法も考案さ
れたが、含まれる溶剤が有機薄膜積層構造をに影響を与
えたり、熱硬化性樹脂や光硬化性樹脂の場合でも、熱の
影響や硬化に伴う樹脂の収縮による素子の破壊が生じて
しまう。A method of coating a resin has also been devised. However, even when a solvent contained affects the organic thin-film laminated structure, or when a thermosetting resin or a photo-setting resin is used, the effect of heat or the curing may be accompanied. The element is destroyed due to the shrinkage of the resin.
【0007】より封止効果の高い方法として、有機薄膜
積層素子封止材による容器内に入れたり、有機薄膜積層
素子が形成されている基板とガラス板やステンレス板な
どの封止材で、有機薄膜積層素子を挟み込んで接着剤で
接着し、外気と遮断する方法(特開平4−212284
号公報)があげられる。しかし、これらも十分満足でき
るものではなく、さらなる耐久性の向上が望まれてい
た。As a method having a higher sealing effect, an organic thin-film laminated element is sealed in a container, or a substrate on which the organic thin-film laminated element is formed and a sealing material such as a glass plate or a stainless steel plate are used. A method of sandwiching a thin-film laminated element, bonding the thin-film laminated element with an adhesive, and blocking the outside air (Japanese Patent Laid-Open No. 4-212284)
Publication). However, these are not sufficiently satisfactory, and further improvement in durability has been desired.
【0008】[0008]
【発明が解決しようとする課題】本発明は、かかる従来
技術の問題を解決し、耐久性の向上した発光素子および
その製造方法を提供することを目的とするものである。SUMMARY OF THE INVENTION It is an object of the present invention to solve the problems of the prior art and to provide a light emitting device with improved durability and a method for manufacturing the same.
【0009】[0009]
【課題を解決するための手段】本発明は上記目的を達成
するために、正極と負極の間に発光を司る物質が存在
し、電気エネルギーにより発光する素子であって、該素
子は封止材により封止されており、該素子と該封止材の
間に露点が0℃以下の気体を含むことを特徴とする発光
素子とするものである。According to the present invention, there is provided an element which emits light by electric energy, wherein a substance which controls light emission is present between a positive electrode and a negative electrode. And a gas having a dew point of 0 ° C. or less between the element and the sealing material.
【0010】[0010]
【発明の実施の形態】本発明における正極は、光を取り
出すために透明であれば、酸化錫、酸化インジウム、酸
化錫インジウム(ITO)などの導電性金属酸化物、あ
るいは、金、銀、クロムなどの金属、ヨウ化銅、硫化銅
などの無機導電性物質、ポリチオフェン、ポリピロー
ル、ポリアニリンなどの導電性ポリマなど特に限定され
るものでないが、ITOガラスやネサガラスを用いるこ
とが望ましく、特にITOガラスを用いることが望まし
い。透明電極の抵抗は素子の発光に十分な電流が供給で
きればよいので限定されないが、素子の消費電力の観点
からは低抵抗であることが望ましい。例えば300Ω/
□以下のITOガラス基板であれば素子電極として機能
するが、現在では10Ω/□程度の基板の供給も可能に
なっていることから、20Ω/□以下の低抵抗の基板を
使用することが特に望ましい。ITOの厚みは抵抗値に
合わせて任意に選ぶ事ができるが、通常100〜300
nmの間で用いられることが多い。また、ガラス基板は
ソーダライムガラス、無アルカリガラスなどが用いら
れ、また厚みも機械的強度を保つのに十分な厚みがあれ
ばよいので、0.7mm以上あれば十分である。ガラス
の材質については、ガラスからの溶出イオンが少ない方
がよいので無アルカリガラスの方が好ましいが、SiO
2などのバリアコートを施したソーダライムガラスも市
販されているのでこれを使用できる。ガラス以外の基板
を用いる場合でも、透明で封止効果の高いものであれば
構わない。ITO膜形成方法は、電子ビーム蒸着法、ス
パッタリング法、化学反応法など特に制限を受けるもの
ではない。ITOガラス基板はよく洗浄されていること
が望ましく、またよく乾燥されていることが望ましい。BEST MODE FOR CARRYING OUT THE INVENTION A positive electrode according to the present invention is made of a conductive metal oxide such as tin oxide, indium oxide, indium tin oxide (ITO), or gold, silver, chromium, if it is transparent to extract light. Such metals, copper iodide, inorganic conductive substances such as copper sulfide, and conductive polymers such as polythiophene, polypyrrole, and polyaniline are not particularly limited. However, it is preferable to use ITO glass or Nesa glass. It is desirable to use. The resistance of the transparent electrode is not limited as long as a current sufficient for light emission of the element can be supplied, but is preferably low from the viewpoint of power consumption of the element. For example, 300Ω /
If it is an ITO glass substrate of □ or less, it functions as an element electrode, but it is now possible to supply a substrate of about 10 Ω / □, so it is particularly preferable to use a low-resistance substrate of 20 Ω / □ or less. desirable. The thickness of the ITO can be arbitrarily selected according to the resistance value.
Often used between nm. Further, as the glass substrate, soda lime glass, non-alkali glass or the like is used, and the thickness only needs to be sufficient to maintain the mechanical strength. As for the material of the glass, alkali-free glass is preferred because it is better that ions eluted from the glass are small.
Soda lime glass with a barrier coat such as 2 is also commercially available and can be used. Even when a substrate other than glass is used, any substrate may be used as long as it is transparent and has a high sealing effect. The method of forming the ITO film is not particularly limited, such as an electron beam evaporation method, a sputtering method, and a chemical reaction method. It is desirable that the ITO glass substrate be well cleaned and well dried.
【0011】本発明における発光を司る物質の構成は、
1)正孔輸送材料/発光材料、2)正孔輸送材料/発光
材料/電子輸送材料、3)発光材料/電子輸送材料、そ
して、4)以上の組合わせ物質を一層に混合した形態、
のいずれであってもよい。即ち、上記1)〜3)の多層
積層構造の他に,4)のように発光材料単独または発光
材料と正孔輸送材料、あるいは発光材料と正孔輸送材料
および電子輸送材料を含む層を一層設けるだけでもよ
い。発光材料はホスト材料のみでも、ホスト材料とドー
パント材料の組み合わせでも、いずれであってもよい。
また、ドーパント材料はホスト材料の全体に含まれてい
ても、部分的に含まれていても、いずれであってもよ
い。ドーパント材料は積層されていても、分散されてい
ても、いずれであってもよい。In the present invention, the structure of the substance that controls light emission is as follows:
1) a hole transporting material / a light emitting material, 2) a hole transporting material / a light emitting material / an electron transporting material, 3) a light emitting material / an electron transporting material, and 4) a form in which a combination of the above substances is mixed.
Any of these may be used. That is, in addition to the multi-layer structure of 1) to 3), a layer containing a luminescent material alone or a luminescent material and a hole transporting material, or a layer containing a luminescent material, a hole transporting material and an electron transporting material as in 4) is further provided. It may just be provided. The light emitting material may be either a host material alone or a combination of a host material and a dopant material.
In addition, the dopant material may be included in the entire host material, partially, or may be included. The dopant material may be stacked, dispersed, or the like.
【0012】本発明における正孔輸送材料としては、電
界を与えられた電極間において正極からの正孔を効率良
く輸送することが必要で、正孔注入効率が高く、注入さ
れた正孔を効率良く輸送することが望ましい。そのため
にはイオン化ポテンシャルが小さく、しかも正孔移動度
が大きく、さらに安定性に優れ、トラップとなる不純物
が製造時および使用時に発生しにくい物質であることが
要求される。このような条件を満たす物質として、特に
限定されるものではないが、ビスカルバゾリル誘導体、
TPD、m−MTDATA、α−NPDなどのトリフェ
ニルアミン誘導体、ピラゾリン誘導体、スチルベン系化
合物、ヒドラゾン系化合物、オキサジアゾール誘導体や
フタロシアニン誘導体に代表される複素環化合物、ポリ
ビニルカルバゾール、ポリシランなどの既知の正孔輸送
材料を使用できる。これらの正孔輸送材料は単独でも用
いられるが、異なる正孔輸送材料と積層または混合して
使用しても構わない。The hole transporting material in the present invention is required to efficiently transport holes from the positive electrode between the electrodes to which an electric field is applied, and has a high hole injection efficiency. Good transport is desirable. For that purpose, it is required that the ionization potential be small, the hole mobility be large, the stability be further improved, and impurities serving as traps be hardly generated during production and use. The substance satisfying such conditions is not particularly limited, but is a biscarbazolyl derivative,
Known triphenylamine derivatives such as TPD, m-MTDATA, α-NPD, pyrazoline derivatives, stilbene compounds, hydrazone compounds, heterocyclic compounds represented by oxadiazole derivatives and phthalocyanine derivatives, polyvinyl carbazole, polysilane and the like Hole transport materials can be used. These hole transport materials may be used alone or may be laminated or mixed with different hole transport materials.
【0013】本発明における発光材料の内、ホスト材料
としては特に限定されるものではないが、以前から発光
体として知られていたアントラセンやピレンなどの縮合
環誘導体、トリス(8−キノリノラト)アルミニウムを
始めとする金属キレート化オキシノイド化合物、ビスス
チリルアントラセン誘導体やジスチリルベンゼン誘導体
などのビススチリル誘導体、テトラフェニルブタジエン
誘導体、クマリン誘導体、オキサジアゾール誘導体、ピ
ロロピリジン誘導体、ペリノン誘導体、シクロペンタジ
エン誘導体、オキサジアゾール誘導体、チアジアゾロピ
リジン誘導体、ポリマー系では、ポリフェニレンビニレ
ン誘導体、ポリパラフェニレン誘導体、そして、ポリチ
オフェン誘導体などが使用できる。Among the luminescent materials in the present invention, the host material is not particularly limited, but tris (8-quinolinolato) aluminum, a condensed ring derivative such as anthracene or pyrene, which has been known as a luminescent material before, may be used. Metal chelated oxinoid compounds, bisstyryl derivatives such as bisstyrylanthracene derivatives and distyrylbenzene derivatives, tetraphenylbutadiene derivatives, coumarin derivatives, oxadiazole derivatives, pyrrolopyridine derivatives, perinone derivatives, cyclopentadiene derivatives, oxadiazole For derivatives, thiadiazolopyridine derivatives, and polymer systems, polyphenylenevinylene derivatives, polyparaphenylene derivatives, and polythiophene derivatives can be used.
【0014】ホスト材料に添加するドーパント材料とし
ては特に限定されるものではないが、具体的には従来か
ら知られている、ペリレン、ルブレンなどの縮合環誘導
体、キナクリドン誘導体、フェノキサゾン660、DC
M1、ペリノン、クマリン誘導体などがそのまま使用で
きる。これらのドーパント材料は単独でも、異なるドー
パント材料と併用しても構わない。The dopant material to be added to the host material is not particularly limited, but specific examples thereof include condensed ring derivatives such as perylene and rubrene, quinacridone derivatives, phenoxazone 660, DC
M1, perinone, coumarin derivatives and the like can be used as they are. These dopant materials may be used alone or in combination with different dopant materials.
【0015】本発明における電子輸送性材料としては、
電界を与えられた電極間において負極からの電子を効率
良く輸送することが必要で、電子注入効率が高く、注入
された電子を効率良く輸送することが望ましい。そのた
めには電子親和力が大きく、しかも電子移動度が大き
く、さらに安定性に優れ、トラップとなる不純物が製造
時および使用時に発生しにくい物質であることが要求さ
れる。このような条件を満たす物質として、8−ヒドロ
キシキノリンアルミニウムに代表されるキノリノール誘
導体金属錯体、トロポロン金属錯体、フラボノール金属
錯体、ペリレン誘導体、ペリノン誘導体、ナフタレン、
クマリン誘導体、オキサジアゾール誘導体、アルダジン
誘導体、ビススチリル誘導体、ピラジン誘導体、フェナ
ントロリン誘導体などがあるが特に限定されるものでは
ない。これらの電子輸送材料は単独でも用いられるが、
異なる電子輸送材料と積層または混合して使用しても構
わない。As the electron transporting material in the present invention,
It is necessary to efficiently transport electrons from the negative electrode between the electrodes to which an electric field is applied, and it is desirable that the electron injection efficiency is high and the injected electrons are transported efficiently. For this purpose, it is required that the material has a high electron affinity, a high electron mobility, a high stability, and a small amount of impurities serving as traps during production and use. Materials satisfying such conditions include quinolinol derivative metal complexes represented by 8-hydroxyquinoline aluminum, tropolone metal complexes, flavonol metal complexes, perylene derivatives, perinone derivatives, naphthalene,
There are coumarin derivatives, oxadiazole derivatives, aldazine derivatives, bisstyryl derivatives, pyrazine derivatives, phenanthroline derivatives, and the like, but are not particularly limited. Although these electron transport materials are used alone,
They may be laminated or mixed with different electron transport materials.
【0016】以上の正孔輸送層、発光層、電子輸送層に
用いられる材料は単独で各層を形成することができる
が、高分子結着剤としてポリ塩化ビニル、ポリカ−ボネ
−ト、ポリスチレン、ポリ(N−ビニルカルバゾ−
ル)、ポリメチルメタクリレ−ト、ポリブチルメタクリ
レート、ポリエステル、ポリスルフォン、ポリフェニレ
ンオキサイド、ポリブタジエン、炭化水素樹脂、ケトン
樹脂、フェノキシ樹脂、ポリアミド、エチルセルロ−
ス、酢酸ビニル、ABS樹脂、ポリウレタン樹脂などの
溶剤可溶性樹脂や、フェノ−ル樹脂、キシレン樹脂、石
油樹脂、ユリア樹脂、メラミン樹脂、不飽和ポリエステ
ル樹脂、アルキド樹脂、エポキシ樹脂、シリコーン樹脂
などの硬化性樹脂などに分散させて用いることも可能で
ある。The above materials used for the hole transporting layer, the light emitting layer and the electron transporting layer can be used alone to form each layer. Examples of the polymer binder include polyvinyl chloride, polycarbonate, polystyrene, and the like. Poly (N-vinyl carbazo-
), Polymethyl methacrylate, polybutyl methacrylate, polyester, polysulfone, polyphenylene oxide, polybutadiene, hydrocarbon resin, ketone resin, phenoxy resin, polyamide, ethyl cellulose
Curing of solvent-soluble resins such as water, vinyl acetate, ABS resin and polyurethane resin, phenol resin, xylene resin, petroleum resin, urea resin, melamine resin, unsaturated polyester resin, alkyd resin, epoxy resin, silicone resin, etc. It is also possible to use it by dispersing it in a conductive resin or the like.
【0017】本発明における発光を司る物質の形成方法
は、抵抗加熱蒸着、電子ビーム蒸着、スパッタリング
法、分子積層法、コーティング法など特に限定されるも
のではないが、通常は、抵抗加熱蒸着、電子ビーム蒸着
が特性面で好ましい。層の厚みは発光を司る物質の抵抗
値にもよるので限定できないが、10〜1000nmの
間から選ばれる。The method for forming the substance which controls light emission in the present invention is not particularly limited, such as resistance heating evaporation, electron beam evaporation, sputtering, molecular lamination, and coating. Beam evaporation is preferred in terms of properties. The thickness of the layer depends on the resistance of the substance that controls light emission and cannot be limited, but is selected from the range of 10 to 1000 nm.
【0018】本発明における負極は、電子を効率よく、
発光を司る物質に注入できる物質であれば特に限定され
ない。一般的には白金、金、銀、銅、鉄、錫、アルミニ
ウム、インジウム、リチウム、ナトリウム、カリウム、
カルシウム、マグネシウムなどがあげられる。電子注入
効率を上げて素子特性を向上させるためには、リチウ
ム、ナトリウム、カリウム、カルシウム、マグネシウム
などの低仕事関数金属が有効である。しかし、これらの
低仕事関数金属は一般に不安定であるので、安定な金属
との合金あるいは積層構造にするのが望ましい。あるい
は発光を司る物質にドーピングする方法も有効である。
電極の作製法については、抵抗加熱蒸着法、電子ビーム
蒸着法、スパッタリング法、イオンプレーティング法、
コーティング法など導通を取ることができれば、特に制
限されるものではないが、抵抗加熱蒸着法あるいは電子
ビーム蒸着法が特性面で好ましい。The negative electrode of the present invention efficiently converts electrons,
The substance is not particularly limited as long as it can be injected into the substance that controls light emission. Generally, platinum, gold, silver, copper, iron, tin, aluminum, indium, lithium, sodium, potassium,
Examples include calcium and magnesium. In order to increase the electron injection efficiency and improve the device characteristics, a low work function metal such as lithium, sodium, potassium, calcium, and magnesium is effective. However, since these low work function metals are generally unstable, it is desirable to form an alloy or a laminated structure with the stable metal. Alternatively, a method of doping a substance which controls light emission is also effective.
For the method of manufacturing the electrodes, resistance heating evaporation, electron beam evaporation, sputtering, ion plating,
There is no particular limitation as long as conduction can be achieved by a coating method or the like, but a resistance heating evaporation method or an electron beam evaporation method is preferable in terms of characteristics.
【0019】本発明における封止の前に有機薄膜積層素
子を保護するために、保護層を設けても構わない。保護
層の材料としては、白金、金、銀、銅、鉄、錫、鉛、ア
ルミニウム、チタン、ニッケル、インジウムなどの金
属、またはこれらの金属を用いた合金、そしてシリカ、
チタニア、アルミナ、酸化マグネシウム、酸化イットリ
ウム、酸化ゲルマニウム、酸化ニッケル、酸化バリウ
ム、酸化カルシウム、酸化鉄などの金属酸化物、フッ化
マグネシウム、フッ化リチウム、フッ化アルミニウム、
フッ化カルシウムなどの金属フッ化物、フッ素系樹脂な
どの樹脂類などがあげられるが、特に限定されるもので
はない。保護層の作製法については、抵抗加熱蒸着法、
電子ビーム蒸着法、スパッタリング法、イオンプレーテ
ィング法、MBE法、CVD法など、特に制限されるも
のではないが、抵抗加熱蒸着法あるいは電子ビーム蒸着
法が特性面で好ましい。Before the sealing in the present invention, a protective layer may be provided to protect the organic thin film laminated element. As a material of the protective layer, platinum, gold, silver, copper, iron, tin, lead, aluminum, titanium, nickel, metals such as indium, or an alloy using these metals, and silica,
Metal oxides such as titania, alumina, magnesium oxide, yttrium oxide, germanium oxide, nickel oxide, barium oxide, calcium oxide, iron oxide, magnesium fluoride, lithium fluoride, aluminum fluoride,
Examples thereof include metal fluorides such as calcium fluoride and resins such as fluororesins, but are not particularly limited. For the method of forming the protective layer, a resistance heating evaporation method,
Although not particularly limited, such as an electron beam evaporation method, a sputtering method, an ion plating method, an MBE method, and a CVD method, a resistance heating evaporation method or an electron beam evaporation method is preferable in terms of characteristics.
【0020】本発明における封止材は有機薄膜積層素子
に水分が侵入するのを防止するものであれば、特に制限
されるものではない。具体的にはソーダ石灰ガラス、硼
硅酸塩ガラス、硅酸塩ガラス、シリカガラス、無蛍光ガ
ラス、石英、セラミックスなどの無機物や、ステンレ
ス、アルミニウム合金などの金属、フッ素系樹脂、アク
リル系樹脂、ポリカーボネート系樹脂、エポキシ系樹
脂、ポリエステル系樹脂、ポリアミド系樹脂、ポリスチ
レン系樹脂、ポリエチレン系樹脂、ポリプロピレン系樹
脂、ポリオレフィン系樹脂、シリコーン系樹脂などの樹
脂類があげられる。封止方法は特に制限されるものでは
なく、図1で示すような封止材6による容器内に有機薄
膜積層素子(基板1上に形成された正極2、有機層3、
負極4)および気体5を入れる方法や、図2で示すよう
な有機薄膜積層素子が形成された基板1と薄板状の封止
材6で有機薄膜積層素子および気体5を挟み込む方法な
どがあげられる。有機薄膜積層素子の特徴である薄型を
生かすためには、封止材を薄くすることが望ましいが、
薄すぎると外部からの衝撃により破壊される恐れがある
ので、厚みは封止材の材質に応じて設計するのが望まし
い。The sealing material in the present invention is not particularly limited as long as it prevents moisture from entering the organic thin film laminated device. Specifically, soda-lime glass, borosilicate glass, silicate glass, silica glass, non-fluorescent glass, quartz, inorganic substances such as ceramics, metals such as stainless steel and aluminum alloy, fluorine resin, acrylic resin, Resins such as polycarbonate resin, epoxy resin, polyester resin, polyamide resin, polystyrene resin, polyethylene resin, polypropylene resin, polyolefin resin, and silicone resin are exemplified. The sealing method is not particularly limited, and the organic thin-film laminated element (the positive electrode 2, the organic layer 3,
A method of inserting the negative electrode 4) and the gas 5 and a method of sandwiching the organic thin film laminated element and the gas 5 between the substrate 1 on which the organic thin film laminated element is formed as shown in FIG. . In order to make use of the thinness characteristic of the organic thin film laminated element, it is desirable to make the sealing material thinner,
If it is too thin, it may be broken by an external impact, so it is desirable to design the thickness according to the material of the sealing material.
【0021】封止に用いる接着剤は封止効果を有するも
のであれば特に制限されるものではない。具体的には、
エポキシ樹脂系接着剤、アクリレート樹脂系接着剤など
を用いることができる。また、光硬化性樹脂接着剤、熱
硬化性樹脂接着剤、嫌気性樹脂接着剤などを用いること
ができる。The adhesive used for sealing is not particularly limited as long as it has a sealing effect. In particular,
An epoxy resin-based adhesive, an acrylate resin-based adhesive, or the like can be used. In addition, a photocurable resin adhesive, a thermosetting resin adhesive, an anaerobic resin adhesive, or the like can be used.
【0022】本発明における封止の形態に特に制限はな
いが、封止材が直接発光素子と接触すると、発光素子が
破壊される恐れがあるので、封止材と有機薄膜積層素子
の間に僅かに空隙があることが望ましい。この空隙を排
気して真空にしたり、改めて乾燥した液体を充填するこ
とは煩雑であり、現実的には封止工程雰囲気の気体が含
まれることになる。この気体が湿っていては封止の効果
は著しく減少してしまうので、本発明における発光素子
と封止材の間には露点が0℃以下の気体が含まれる。耐
久性をより向上させるのには、露点が−70℃以下の気
体であることが好ましく、−100℃以下の気体である
ことがより好ましい。封入した気体が湿っていても、吸
着剤を同封すれば乾燥させることが出来るが、素子の劣
化は速やかに進行するので、あらかじめ封止工程雰囲気
の気体が乾燥していることが望ましい。発光素子の製造
過程に真空蒸着工程が含まれている場合、リーク時に湿
った気体を用いると瞬く間に水分を吸着してしまう。も
う一度排気してある程度水分を取り除くことも出来る
が、劣化の回復は望めない。故にリーク時には露点が0
℃以下の気体を用いることが重要になってくる。耐久性
をより向上させるのには、露点が−70℃以下の気体で
あることが好ましく、−100℃以下の気体であること
がより好ましい。素子作製は真空一環で行われるのが望
ましいが、素子作製途中のリークが必要な場合にも有効
である。Although there is no particular limitation on the form of sealing in the present invention, if the sealing material is directly in contact with the light emitting element, the light emitting element may be destroyed. It is desirable that there be a slight gap. Evacuating the gap to create a vacuum or refilling with a dry liquid is complicated, and actually involves the gas in the atmosphere of the sealing step. If the gas is wet, the sealing effect is significantly reduced, so that a gas having a dew point of 0 ° C. or less is included between the light emitting element and the sealing material in the present invention. In order to further improve the durability, a gas having a dew point of −70 ° C. or less is preferable, and a gas of −100 ° C. or less is more preferable. Even if the enclosed gas is wet, it can be dried by enclosing the adsorbent. However, since the deterioration of the element progresses quickly, it is desirable that the gas in the atmosphere of the sealing step be dried in advance. When a vacuum deposition process is included in the manufacturing process of a light emitting element, if a wet gas is used at the time of leakage, moisture is instantaneously adsorbed. It can be evacuated again to remove some water, but recovery from deterioration cannot be expected. Therefore, when leaking, the dew point is 0
It becomes important to use a gas at a temperature of not more than ° C. In order to further improve the durability, a gas having a dew point of −70 ° C. or less is preferable, and a gas of −100 ° C. or less is more preferable. Although it is desirable that the device is manufactured in a vacuum process, it is also effective when a leak is required during device manufacture.
【0023】リーク時および封止の際に取り込まれる気
体としては、例えばアルゴン、ネオン、ヘリウム、窒
素、酸素、二酸化炭素などがあげられるが、特に限定さ
れるものではなく、単一組成であっても、空気のように
混合されていても構わない。空気のように気体の中に酸
素が含まれていると、ゴミやITOの突起・欠点による
一時的な短絡(ショート)部分が酸化されて絶縁体とな
り、恒久的な短絡の発生を抑制することが出来る。しか
も簡便に使用できることから、空気を用いることが好ま
しい。また、リーク時および封止の際に取り込まれる気
体は、同一であっても異なっていても構わない。The gas taken in at the time of leakage and at the time of sealing includes, for example, argon, neon, helium, nitrogen, oxygen, carbon dioxide and the like. May also be mixed like air. If oxygen is contained in the gas like air, the temporary short-circuit (short) due to dust and protrusions / defects of ITO is oxidized and becomes an insulator, preventing the occurrence of permanent short-circuit. Can be done. Moreover, it is preferable to use air because it can be used easily. The gas taken in at the time of leakage and at the time of sealing may be the same or different.
【0024】本発明における発光素子と封止材の間には
吸着剤を含んでも構わない。吸着剤は封止後において外
部から侵入する水分を吸着するものであれば特に限定さ
れるものではない。具体的には、活性アルミナ、珪藻
土、活性炭、五酸化リン、過塩素酸マグネシウム、水酸
化カリウム、硝酸カルシウム、臭化カルシウム、酸化カ
ルシウム、酸化バリウム、炭酸バリウム、塩化亜鉛、臭
化亜鉛、無水硫酸銅などの無機化合物、リチウム、ベリ
リウム、カリウム、ナトリウム、マグネシウム、ルビジ
ウム、ストロンチウム、カルシウムなど金属およびその
合金、アクリル系やメタクリル系吸水ポリマーなどがあ
げられる。An adsorbent may be included between the light emitting element and the sealing material in the present invention. The adsorbent is not particularly limited as long as it adsorbs moisture that enters from outside after sealing. Specifically, activated alumina, diatomaceous earth, activated carbon, phosphorus pentoxide, magnesium perchlorate, potassium hydroxide, calcium nitrate, calcium bromide, calcium oxide, barium oxide, barium carbonate, zinc chloride, zinc bromide, sulfuric anhydride Examples include inorganic compounds such as copper, metals such as lithium, beryllium, potassium, sodium, magnesium, rubidium, strontium, and calcium and alloys thereof, and acrylic and methacrylic water-absorbing polymers.
【0025】本発明における電気エネルギーとは主に直
流電流を指すが、パルス電流や交流電流を用いることも
可能である。電流値および電圧値は特に制限はないが、
素子の消費電力、寿命を考慮すると、できるだけ低いエ
ネルギーで最大の輝度が得られるようにするべきであ
る。The electric energy in the present invention mainly refers to a direct current, but it is also possible to use a pulse current or an alternating current. The current value and voltage value are not particularly limited,
In consideration of the power consumption and life of the device, it is necessary to obtain the maximum brightness with the lowest possible energy.
【0026】本発明の発光素子はマトリクスまたはセグ
メント方式、あるいはその両者を組み合わせることによ
って表示するディスプレイを構成することが好ましい。It is preferable that the light emitting device of the present invention constitutes a display for displaying by a matrix or segment system or a combination of both.
【0027】本発明におけるマトリクスは、表示のため
の画素が格子状に配置されたものをいい、画素の集合で
文字や画像を表示する。画素の形状、サイズは用途によ
って決まる。例えばパソコン、モニター、テレビの画像
および文字表示には、通常、一辺が300μm以下の四
角形の画素が用いられるし、表示パネルのような大型デ
ィスプレイの場合は、一辺がmmオーダーの画素を用い
ることになる。モノクロ表示の場合は、同じ色の画素を
配列すればよいが、カラー表示の場合には赤、緑、青の
画素を並べて表示させる。この場合典型的にはデルタタ
イプとストライプタイプがある。尚、本発明における発
光素子は、赤、緑、青色発光が可能であるので、前記表
示方法を用いれば、マルチカラーまたはフルカラー表示
もできる。そして、このマトリクスの駆動方法として
は、線順次駆動方法やアクティブマトリックスのどちら
でもよい。線順次駆動の方が構造が簡単という利点があ
るが、動作特性を考慮するとアクティブマトリックスの
方が優れる場合があるので、これも用途により使い分け
ることが必要である。The matrix in the present invention refers to a matrix in which pixels for display are arranged in a lattice, and displays a character or an image by a set of pixels. The shape and size of the pixel depend on the application. For example, for the display of images and characters on personal computers, monitors, televisions, and the like, generally square pixels with a side of 300 μm or less are used, and in the case of a large display such as a display panel, pixels with a side on the order of mm are used. Become. In the case of monochrome display, pixels of the same color may be arranged, but in the case of color display, red, green and blue pixels are displayed side by side. In this case, there are typically a delta type and a stripe type. Note that the light-emitting element of the present invention can emit red, green, and blue light, so that multi-color or full-color display can be performed by using the display method. The matrix may be driven by either a line-sequential driving method or an active matrix. The line-sequential driving has the advantage of a simpler structure, but the active matrix is sometimes superior in consideration of the operating characteristics. Therefore, it is necessary to use this depending on the application.
【0028】本発明におけるセグメントタイプは、予め
決められた情報を表示するようにパターンを形成し、決
められた領域を発光させる。例えば、デジタル時計や温
度計における時刻や温度表示、オーディオ機器や電磁調
理器などの動作状態表示、自動車のパネル表示などがあ
げられる。そして、前記マトリクス表示とセグメント表
示は同じパネルの中に共存していてもよい。In the segment type according to the present invention, a pattern is formed so as to display predetermined information, and a predetermined area emits light. For example, there are a time display and a temperature display on a digital clock or a thermometer, an operation state display of an audio device, an electromagnetic cooker, or the like, and a panel display of an automobile. The matrix display and the segment display may coexist in the same panel.
【0029】本発明の発光素子はバックライトとしても
好ましく用いられる。本発明におけるバックライトは、
主に自発光しない表示装置の視認性を向上させる目的に
使用され、液晶表示装置、時計、オーディオ装置、自動
車パネル、表示板、標識などに使用される。特に液晶表
示装置、中でも薄型化が課題となっているパソコン用途
のバックライトとしては、従来方式のものが蛍光灯や導
光板からなっているため薄型化が困難であることを考え
ると、本発明におけるバックライトは薄型、軽量が特徴
になる。The light emitting device of the present invention is also preferably used as a backlight. The backlight in the present invention,
It is mainly used for improving the visibility of a display device that does not emit light, and is used for a liquid crystal display device, a clock, an audio device, an automobile panel, a display panel, a sign, and the like. In particular, as for the backlight for liquid crystal display devices, particularly for personal computer applications where thinning is an issue, the present invention is considered to be difficult because the conventional type is made of a fluorescent lamp or a light guide plate, and it is difficult to make it thin. Is characterized by its thinness and light weight.
【0030】[0030]
【実施例】以下、実施例および比較例をあげて本発明を
説明するが、本発明はこれらの例によって限定されるも
のではない。The present invention will be described below with reference to examples and comparative examples, but the present invention is not limited to these examples.
【0031】実施例1 ITO透明導電膜を150nm堆積させたガラス基板
(旭硝子社製、15Ω/□、電子ビーム蒸着品)を30
×40mmに切断、エッチングを行った。得られた基板
をアセトン、セミコクリン56で各々15分間超音波洗
浄してから、超純水で洗浄した。続いてイソプロピルア
ルコールで15分間超音波洗浄してから熱メタノールに
15分間浸漬させて乾燥させた。この基板を素子を作製
する直前に1時間UV−オゾン処理し、真空蒸着装置内
に設置して、装置内の真空度が5×10-5Pa以下にな
るまで排気した。抵抗加熱法によって、まず正孔輸送材
料として4,4’−ビス(N−(m−トリル)−N−フ
ェニルアミノ)ビフェニルを100nm蒸着した。次に
ホスト材料としてトリスキノリノラートアルミニウム
(III)を100nm蒸着した。次にリチウムを0.
5nm、アルミニウムを200nm蒸着して陰極とし、
真空一環で5×5mm角の素子を作製した。ここで言う
膜厚は表面粗さ計での測定値で補正した水晶発振式膜厚
モニター表示値である。露点が0℃のアルゴンを用いて
リークし、露点が0℃のアルゴン雰囲気のドライボック
スに移動させ、厚さ0.4mmのステンレス製の封止材
をエポキシ樹脂を用いて接着した。空隙は2mmであっ
た。この発光素子を大気中に取り出して放置した後に発
光させた。1週間放置すると非発光部分が顕微鏡で僅か
に観察され、1ヶ月放置してもで非発光部分は肉眼で僅
かに観察されたのみであった。Example 1 A glass substrate (15 Ω / □, electron beam vapor-deposited product, manufactured by Asahi Glass Co., Ltd.) on which a 150 nm ITO transparent conductive film was deposited was used for 30
The wafer was cut into a size of 40 mm and etched. The obtained substrate was subjected to ultrasonic cleaning with acetone and semicocrine 56 for 15 minutes each, and then with ultrapure water. Subsequently, the substrate was subjected to ultrasonic cleaning with isopropyl alcohol for 15 minutes, immersed in hot methanol for 15 minutes, and dried. This substrate was subjected to UV-ozone treatment for 1 hour immediately before producing the element, placed in a vacuum evaporation apparatus, and evacuated until the degree of vacuum in the apparatus became 5 × 10 −5 Pa or less. First, 4,4′-bis (N- (m-tolyl) -N-phenylamino) biphenyl was deposited as a hole transporting material to a thickness of 100 nm by a resistance heating method. Next, 100 nm of trisquinolinolate aluminum (III) was deposited as a host material. Next, lithium was added to 0.
5 nm, 200 nm of aluminum is deposited to form a cathode,
An element having a size of 5 × 5 mm was manufactured as part of the vacuum. The film thickness referred to here is a value displayed on a crystal oscillation type film thickness monitor corrected by a value measured by a surface roughness meter. Leakage was caused using argon having a dew point of 0 ° C., moved to a dry box in an argon atmosphere having a dew point of 0 ° C., and a stainless sealing material having a thickness of 0.4 mm was bonded using an epoxy resin. The gap was 2 mm. The light emitting device was taken out into the atmosphere and allowed to emit light after being allowed to stand. When left for one week, a non-light-emitting portion was slightly observed with a microscope, and when left for one month, a non-light-emitting portion was slightly observed with the naked eye.
【0032】比較例1 露点が0℃のアルゴン雰囲気でリークし、大気中(25
℃、湿度80%)で封止を行った以外は実施例1と全く
同様にして作製した素子を大気中に取り出して放置した
後に発光させた。1日放置すると非発光部分が肉眼で観
察され、1週間放置すると非発光部分が発光部分より大
きくなった。Comparative Example 1 Leakage occurred in an argon atmosphere having a dew point of 0 ° C.
The device manufactured in exactly the same manner as in Example 1 except that sealing was performed at a temperature of 80 ° C. and a humidity of 80%) was taken out into the air and allowed to emit light after being allowed to stand. When left for one day, the non-light-emitting portion was observed with the naked eye, and when left for one week, the non-light-emitting portion became larger than the light-emitting portion.
【0033】比較例2 大気中(25℃、湿度80%)でリークし、露点が0℃
のアルゴン雰囲気で封止を行った以外は実施例1と全く
同様にして作製した素子を大気中に取り出して放置した
後に発光させた。1日放置すると非発光部分が肉眼で観
察され、1週間放置すると非発光部分が発光部分より大
きくなった。Comparative Example 2 Leakage occurred in the air (25 ° C., humidity 80%) and the dew point was 0 ° C.
A device manufactured in the same manner as in Example 1 except that the sealing was performed in an argon atmosphere was taken out into the air and allowed to stand, and then emitted light. When left for one day, the non-light-emitting portion was observed with the naked eye, and when left for one week, the non-light-emitting portion became larger than the light-emitting portion.
【0034】比較例3 大気中(25℃、湿度80%)でリークと封止を行った
以外は実施例1と全く同様にして作製した素子を大気中
に取り出して放置した後に発光させた。1日放置すると
非発光部分が肉眼で観察され、3日放置すると非発光部
分が発光部分より大きくなった。Comparative Example 3 A device produced in the same manner as in Example 1 except that leakage and sealing were performed in the air (25 ° C., humidity 80%) was taken out into the air and left to emit light. After one day, the non-light-emitting portion was observed with the naked eye, and after three days, the non-light-emitting portion became larger than the light-emitting portion.
【0035】実施例2 露点が−70℃のアルゴン中でリークと封止を行った以
外は実施例1と全く同様にして作製した素子を大気中に
取り出して放置した後に発光させた。1ヶ月放置して非
発光部分が顕微鏡で僅かに観察された。Example 2 A device produced in exactly the same manner as in Example 1 except that leakage and sealing were carried out in argon at a dew point of -70 ° C. was taken out to the atmosphere, allowed to emit light, and then emitted. After leaving for one month, a non-light-emitting portion was slightly observed with a microscope.
【0036】実施例3 露点が−100℃のアルゴン中でリークと封止を行った
以外は実施例1と全く同様にして作製した素子を大気中
に取り出して放置した後に発光させた。1ヶ月放置して
も非発光部分は顕微鏡でも観察されなかった。Example 3 A device manufactured in exactly the same manner as in Example 1 except that leakage and sealing were performed in argon having a dew point of -100 ° C. was taken out into the air and allowed to emit light after leaving. The non-light-emitting portion was not observed under a microscope even after being left for one month.
【0037】実施例4 露点が−100℃の窒素中でリークと封止を行った以外
は実施例1と全く同様にして作製した素子を大気中に取
り出して放置した後に発光させた。1ヶ月放置しても非
発光部分は顕微鏡でも観察されなかった。Example 4 A device manufactured in exactly the same manner as in Example 1 except that leakage and sealing were performed in nitrogen having a dew point of -100 ° C. was taken out into the air and left to emit light. The non-light-emitting portion was not observed under a microscope even after being left for one month.
【0038】実施例5 露点が−100℃の空気中でリークと封止を行った以外
は実施例1と全く同様にして作製した素子を大気中に取
り出して放置した後に発光させた。1ヶ月放置しても非
発光部分は顕微鏡でも観察されなかった。実施例1〜4
に比べて、この素子での短絡発生割合は減少した。Example 5 A device manufactured in exactly the same manner as in Example 1 except that leakage and sealing were carried out in air having a dew point of -100 ° C. was taken out to the atmosphere, allowed to emit light, and then emitted. The non-light-emitting portion was not observed under a microscope even after being left for one month. Examples 1-4
In comparison with this, the ratio of occurrence of short circuit in this device was reduced.
【0039】[0039]
【発明の効果】本発明は、耐久性の向上した発光素子お
よびその製造方法を提供できるものである。According to the present invention, it is possible to provide a light emitting device having improved durability and a method for manufacturing the same.
【図1】封止材による容器内に有機薄膜積層素子を入れ
る方法の断面概略図。FIG. 1 is a schematic cross-sectional view of a method for putting an organic thin-film laminated element in a container with a sealing material.
【図2】有機薄膜積層素子が形成された基板と薄板状の
封止材で有機薄膜積層素子を挟み込む方法の断面概略
図。FIG. 2 is a schematic cross-sectional view of a method of sandwiching an organic thin-film laminated element between a substrate on which the organic thin-film laminated element is formed and a thin plate-like sealing material.
1、基板 2、正極 3、有機層 4、負極 5、気体 6、封止材 7、接着剤 8、導線 9、電源 1, substrate 2, positive electrode 3, organic layer 4, negative electrode 5, gas 6, sealing material 7, adhesive 8, conducting wire 9, power supply
Claims (8)
し、電気エネルギーにより発光する素子であって、該素
子は封止材により封止されており、該素子と該封止材の
間に露点が0℃以下の気体を含むことを特徴とする発光
素子。An element which emits light by electric energy between a positive electrode and a negative electrode and which emits light by electric energy, wherein the element is sealed with a sealing material. A light-emitting element comprising a gas having a dew point of 0 ° C. or lower between the two.
し、電気エネルギーにより発光する素子であって、該素
子の製造過程に真空蒸着工程が含まれ、リーク時に露点
が0℃以下の気体を用いることを特徴とする発光素子の
製造方法。2. An element which emits light by electric energy, in which a substance responsible for light emission exists between a positive electrode and a negative electrode, wherein a process of manufacturing the element includes a vacuum deposition step, and a dew point of 0 ° C. or less at the time of leakage. A method for manufacturing a light-emitting element, wherein a gas is used.
る請求項1または2記載の発光素子およびその製造方
法。3. The light emitting device according to claim 1, wherein the dew point is -70 ° C. or less.
する請求項1または2記載の発光素子およびその製造方
法。4. The light emitting device according to claim 1, wherein the dew point is -100 ° C. or lower, and a method for manufacturing the same.
は該リーク時に用いる気体が酸素を含むことを特徴とす
る請求項1〜4のいずれか記載の発光素子およびその製
造方法。5. The light emitting device according to claim 1, wherein the gas between the device and the sealing material and / or the gas used at the time of the leak contains oxygen.
とする請求項1〜4のいずれか記載の発光素子およびそ
の製造方法。6. The light emitting device according to claim 1, wherein the gas containing oxygen is air.
グメント方式によって表示するディスプレイを構成する
ことを特徴とする請求項1〜4のいずれか記載の発光素
子およびその製造方法。7. The light emitting device according to claim 1, wherein said light emitting device constitutes a display for displaying in a matrix and / or segment system.
徴とする請求項1〜4のいずれか記載の発光素子および
その製造方法。8. The light emitting device according to claim 1, wherein said light emitting device is a backlight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11128167A JP2000036382A (en) | 1998-05-14 | 1999-05-10 | Light emitting element and manufacture thereof |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10-131766 | 1998-05-14 | ||
| JP13176698 | 1998-05-14 | ||
| JP11128167A JP2000036382A (en) | 1998-05-14 | 1999-05-10 | Light emitting element and manufacture thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000036382A true JP2000036382A (en) | 2000-02-02 |
Family
ID=26463907
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11128167A Pending JP2000036382A (en) | 1998-05-14 | 1999-05-10 | Light emitting element and manufacture thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000036382A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006046679A1 (en) * | 2004-10-29 | 2006-05-04 | Pioneer Corporation | Organic electroluminescence display device and method for manufacturing the same |
| JP2008010262A (en) * | 2006-06-28 | 2008-01-17 | Kyocera Corp | Organic EL display |
-
1999
- 1999-05-10 JP JP11128167A patent/JP2000036382A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006046679A1 (en) * | 2004-10-29 | 2006-05-04 | Pioneer Corporation | Organic electroluminescence display device and method for manufacturing the same |
| JP4708360B2 (en) * | 2004-10-29 | 2011-06-22 | パイオニア株式会社 | Organic electroluminescent display device and manufacturing method thereof |
| JP2008010262A (en) * | 2006-06-28 | 2008-01-17 | Kyocera Corp | Organic EL display |
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