JP2000032733A - Planar motor device and exposure device - Google Patents

Abstract

(57) [Problem] To provide a planar motor device that effectively suppresses thermal influence on the surrounding environment. SOLUTION: When a current is supplied to an armature coil 38 facing a magnet of a mover 51, the mover 51 is driven along a moving surface 21a by an electromagnetic force. When the mover 51 continues to be driven in a certain direction, current is supplied to the armature coil 38 facing the magnet at each movement position of the mover 51.
As a result, the armature coils 38 to which the respective currents are supplied generate heat. In this case, the armature coil 38 is housed in a vacuum chamber 41 inside the base 21 and the vacuum chamber 41
Are arranged in contact with the stator yoke 43 via a predetermined gap between the ceramic yoke 43 and the ceramic plate 36 forming the same. For this reason, since heat transfer from the armature coil 38 to the moving surface 21a side is performed almost exclusively by heat radiation, thermal influence on the surrounding environment can be effectively suppressed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a planar motor device and an exposure apparatus, and more particularly, to a planar motor device for driving a mover including a magnet unit in a two-dimensional direction by electromagnetic force, and to a planar motor device. The present invention relates to an exposure apparatus used for a substrate stage device.

[0002]

2. Description of the Related Art Conventionally, in a lithography process for manufacturing a semiconductor device, a liquid crystal display device, or the like, a pattern formed on a mask or a reticle (hereinafter, collectively referred to as a “reticle”) is resisted through a projection optical system. There is used an exposure apparatus that transfers the image onto a substrate such as a wafer or a glass plate coated with a substrate.

In this exposure apparatus, it is necessary to position the wafer at the exposure position with high precision, and the wafer is held on a wafer holder by vacuum suction or the like, and the wafer holder is fixed on a wafer table.

Recently, in order to position the wafer at a higher speed with higher accuracy without being affected by the accuracy of the mechanical guide surface, etc., and to avoid mechanical friction and extend the life of the wafer, the wafer is mounted. A stage device that positions a wafer by driving a placed table in a two-dimensional direction without contact has been developed. As a drive source of such a stage device of non-contact drive, a planar motor having a structure in which a variable pulse driving linear pulse motor is coupled for two axes is known.

At present, the mainstream structure of a variable magnetoresistive driving type planar motor is a structure in which two variable-resistance driving linear pulse motors are coupled like a soyer motor. The variable pulse motor of the variable reluctance drive system includes, for example, a stator formed of a plate-shaped magnetic body having uneven teeth formed at regular intervals along a longitudinal direction, and a stator having an uneven shape. And a mover having a plurality of armature coils connected to each other through permanent magnets, the plurality of armature coils having protrusions and recesses opposite to the protrusions and recesses having different phases from the protrusions and recesses. Then, the mover is driven by using a force generated in an attempt to minimize the magnetic resistance between the stator and the mover at each time. That is, by adjusting and controlling the current value and the phase of the pulse current supplied to each armature coil, the mover is caused to move in a stepwise manner.

[0006]

In order to realize high-speed positioning by using the above-described variable motor driven flat motor for precise positioning, it is necessary to obtain a large driving force. Inevitably, a large current must flow through the armature coil. Therefore, heat generation of the armature coil becomes a serious problem.

A flat motor driven by Lorentz electromagnetic force in which a linear motor is developed in a two-dimensional direction has also been developed (for example, see US Pat. No. 5,196,745). Such a Lorentz electromagnetic force type planar motor,
Because of its excellent controllability, thrust linearity, and positioning, it is said to be a promising stage drive source in the future. However, even in such a Lorentz electromagnetic force driven planar motor, a large current must be passed through the armature coil to obtain a large thrust, and the armature coil becomes a heat source.

Therefore, considering the environment of the precision positioning device, a cooling design is indispensable for realizing a planar motor that reduces thermal effects.

The present invention has been made under such circumstances, and a first object of the present invention is to provide a flat motor device capable of suppressing a thermal influence on a surrounding environment.

It is a second object of the present invention to provide an exposure apparatus capable of performing highly accurate exposure while maintaining high throughput.

[0011]

Means for Solving the Problems Heat is transmitted between objects mainly by heat conduction, heat transfer and heat radiation (radiation), all of which change due to a temperature difference between the objects. Of these,
Heat conduction is heat transfer due to the movement of electrons having molecular vibrations and energy due to heat, and heat transfer is heat transfer due to convection between a solid surface and a fluid. Can hardly occur in the interior. On the other hand, since heat radiation is heat transfer by electromagnetic waves radiating from an object, it occurs even in a vacuum where there is no heat transfer medium, but the amount of heat transfer is smaller than that of heat conduction and heat transfer.

The present invention focuses on this point and employs the following configuration.

A first planar motor device according to the present invention has at least one magnet (54a to 54d) and a magnet unit (52, 53) which moves in a two-dimensional direction along a predetermined moving surface (21a). The base (2) having the moving surface formed on the side facing the magnet unit, and having a vacuum chamber (41) capable of holding a vacuum state therein.
1) and; two-dimensionally arranged along the moving surface in the vacuum chamber via a predetermined gap between the first wall (36) on the moving surface side forming the vacuum chamber and the first wall (36). A plurality of armature coils (38).

According to this, when current is supplied to the armature coil facing the magnet of the magnet unit, the magnet unit is driven along the moving surface by the electromagnetic force. When the magnet unit continues to be driven in a certain direction, an electric current is supplied to the armature coil facing the magnet at each movement position of the magnet unit. As a result, the armature coils supplied with the respective currents generate heat. In this case, the armature coil is housed in a vacuum chamber inside the base, and is inserted into the vacuum chamber along the moving surface via a predetermined gap between the armature coil and the first wall on the moving surface side forming the vacuum chamber. They are arranged in the dimension direction. For this reason, since heat transfer from the armature coil to the moving surface side is performed almost exclusively by heat radiation, it is possible to effectively suppress the thermal influence on the surrounding environment.

In this case, even if the vacuum chamber is in a vacuum state, air is present, so that heat conduction and heat transfer cannot be completely eliminated, and the degree depends on the degree of vacuum. In this sense, it is desirable that the degree of vacuum is high. However, if the degree of vacuum is higher than a certain level, the base may be deformed due to a pressure difference between the atmospheric pressure and the vacuum chamber. Therefore, in order to prevent such deformation, the vacuum condition is applied between the first wall (36) forming the vacuum chamber (41) and the second wall (43) opposed to the first wall. It is desirable to provide a deformation preventing member (39) for preventing deformation of the base. However, in such a case, the heat generated by the armature coil is transmitted to the first wall side, that is, the moving surface side by heat conduction via the second wall and the deformation preventing member. Therefore, in order to suppress or prevent this heat conduction, at least a part of the deformation preventing member may be formed of a heat insulating material, or the deformation preventing member may be formed so that the area of the contact surface with the second wall is reduced. It is desirable to form it into a shape that is smaller than the cross-sectional area of the other part of the member.

In the above case, the base (21)
May further include a fluid passageway (65a, 66, 42, 66, 65b) in contact with the vacuum chamber via the second wall (43) on the opposite side of the moving surface of the vacuum chamber (41). More desirable. In such a case, heat exchange is performed between the fluid in the fluid passage and the second wall, and the armature coil is cooled from the second wall side (the side opposite to the moving surface). In this case, a temperature control device (79) for controlling the temperature of the fluid flowing in the fluid passage may be provided. It is sufficient that the temperature control device controls the temperature of the fluid to at least a temperature lower than the temperature of the second wall when the armature coil generates heat, but controls the fluid to a temperature lower than the ambient temperature of the base. Is also good. In such a case, the armature coil can be efficiently cooled from the side opposite to the moving surface.

A second planar motor device according to the present invention has at least one magnet (54a to 54d) and a magnet unit (52, 53) that moves in a two-dimensional direction along a predetermined moving surface (21a). A base on which the moving surface is formed on a side facing the magnet unit and which has a vacuum chamber (41) capable of maintaining a vacuum state therein and a fluid passage located on the moving surface side of the vacuum chamber; And (21); a plurality of armature coils (38) arranged in the vacuum chamber in a two-dimensional direction at predetermined intervals along the moving surface.

According to this, when current is supplied to the armature coil facing the magnet of the magnet unit, the magnet unit is driven along the moving surface by the electromagnetic force. When the magnet unit continues to be driven in a certain direction, an electric current is supplied to the armature coil facing the magnet at each movement position of the magnet unit. As a result, the armature coils supplied with the respective currents generate heat. In this case, the armature coil is disposed in a vacuum chamber inside the base, and a fluid passage is provided on a moving surface forming the vacuum chamber. For this reason, in the vacuum part in the vacuum chamber, heat transfer from the armature coil is almost exclusively performed by heat radiation, and heat transmitted to the moving surface side in the vacuum chamber is exchanged with the fluid in the fluid passage by heat exchange. The heat is removed. Therefore, thermal effects on the surrounding environment can be effectively suppressed. In this case, the fluid in the fluid passage is desirably at a lower temperature than the base atmosphere.

An exposure apparatus according to the present invention is an exposure apparatus for transferring a predetermined pattern onto a substrate. The exposure apparatus according to the present invention includes a substrate stage device for driving the substrate, and
Characterized in that one of the planar motor devices is used.

According to this, since the plane motor device according to the present invention is used for the substrate stage, the substrate can be driven two-dimensionally by electromagnetic force without contact.
Further, since the thermal influence on the substrate side due to the heat generated by the armature coil can be effectively reduced, air fluctuation of the interferometer beam for measuring the position of the substrate can be suppressed. Therefore, high-speed and high-accuracy substrate position control can be performed, and as a result, exposure can be performed with high exposure accuracy while improving throughput.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. FIG. 1 schematically shows an overall configuration of an exposure apparatus 100 according to one embodiment. The exposure apparatus 100 is a so-called step-and-scan exposure type scanning exposure apparatus.

The exposure apparatus 100 includes an illumination system 10, a reticle stage RST for holding a reticle (mask) R,
The apparatus includes a projection optical system PL, a substrate stage device 30 for driving a wafer W as a substrate in an XY two-dimensional direction in an XY plane, and a control system thereof.

The illumination system 10 is, for example, disclosed in
As disclosed in Japanese Unexamined Patent Publication No. 0956, the optical system includes a light source unit, a shutter, a secondary light source forming optical system, a beam splitter, a condenser lens system, a reticle blind, and an imaging lens system (all not shown). Illuminating light for exposure having a substantially uniform illuminance distribution is emitted toward the mirror M. The light path of the illumination light is bent vertically downward by the mirror M, and illuminates the rectangular (or arc-shaped) illumination area IAR on the reticle R with uniform illuminance. .

A reticle R is fixed on the reticle stage RST by, for example, vacuum suction. Also,
The reticle stage RST is driven on a reticle base (not shown) at a scanning speed designated in a predetermined scanning direction (here, the Y-axis direction) by a reticle driving unit (not shown) constituted by a linear motor or the like. It is possible.

A movable mirror 15 for reflecting a laser beam from a reticle laser interferometer (hereinafter, referred to as a "reticle interferometer") 16 is fixed on the reticle stage RST. Is, for example, 0.5 to 1 nm by the reticle interferometer 16.
It is always detected with a resolution of the order.

The position information of the reticle stage RST from the reticle interferometer 16 is sent to the stage control system 19 and to the main controller 20 via the reticle stage RST. R
Reticle drive unit (not shown) based on ST position information
Drives the reticle stage RST via the.

The projection optical system PL is arranged below the reticle stage RST in FIG. 1 and its optical axis AX
The direction (corresponding to the optical axis IX of the illumination optical system) is defined as the Z-axis direction, and here, a plurality of lens elements arranged at predetermined intervals along the optical axis AX direction so as to have a telecentric optical arrangement on both sides. Refractive optics are used. The projection optical system PL has a predetermined projection magnification, for example, 1 /
This is a reduction optical system having 5 (or 1/4). Therefore, when the illumination area IAR of the reticle R is illuminated by the illumination light from the illumination system 10, the illumination light passing through the reticle R causes the circuit pattern in the illumination area IAR of the reticle R to pass through the projection optical system PL. (Partially inverted image) is formed in an exposure area IA conjugate to an illumination area IAR on a wafer W having a surface coated with a photoresist.

The substrate stage device 30 includes a base 21
And a substrate table 18 which is levitated and supported by an air slider, which will be described later, via a clearance of about several μm above the upper surface of the base 21.
And a driving device 50 that drives two-dimensionally in the Y plane. Here, as the driving device 50, a planar motor including a stator 60 provided (embedded) on the upper portion of the base 21 and a movable member 51 fixed on the bottom portion (base facing surface side) of the substrate table 18 is used. Is used. The mover 51, the base 21, and the driving device 50 constitute a planar motor device. In the following description, the driving device 50 is referred to as a planar motor 50 for convenience.

A wafer W is fixed on the substrate table 18 by, for example, vacuum suction. A movable mirror 27 for reflecting a laser beam from a wafer laser interferometer (hereinafter, referred to as a “wafer interferometer”) 31 is fixed on the substrate table 18. The position of the table 18 in the XY plane is always detected with a resolution of, for example, about 0.5 to 1 nm. Here, in practice, as shown in FIG. 2, the movable mirror 27 </ b> Y having a reflection surface orthogonal to the Y-axis direction, which is the scanning direction, is perpendicular to the X-axis direction, which is the non-scanning direction, on the substrate table 18. A moving mirror 27X having a reflecting surface is provided, and the wafer interferometer 31 is provided with one axis in the scanning direction and two axes in the non-scanning direction. This is shown as a total 31. The position information (or speed information) of the substrate table 18 is sent to the stage control system 19 and the main controller 20 via the stage control system 19, and the stage control system 19 sends the position information (or speed information) in response to an instruction from the main controller 20. Based on the information, the movement of the substrate table 18 in the XY plane is controlled via the plane motor 50.

Here, the components of the substrate stage device 30 will be described in further detail with reference to FIGS. 2 to 4, focusing on the planar motor 50 and the components in the vicinity thereof. FIG. 2 is a plan view of the substrate stage device 30.
FIG. 3 is an enlarged cross-sectional view taken along the line AA of FIG.

As shown in FIGS. 2 and 3, the substrate table 18 has a support including a voice coil motor and the like on the upper surface (the surface opposite to the surface facing the base 21) of the mover 51 constituting the planar motor 50. It is supported at three different points by the mechanisms 32a, 32b, and 32c, and can be tilted with respect to the XY plane and driven in the Z-axis direction. Support mechanism 32a
1 to 32c are not shown in FIG. 1, but are actually connected to a stage control system 19 in FIG.
Are independently driven.

The mover 51 is a perspective view of FIG.
As shown in an exploded perspective view of (B), an air slider 57 which is a kind of aerostatic pressure bearing device having a cross-sectional shape in a plan view, and a part of the air slider 57 is fitted from above. The plate-shaped magnetic body 53 is provided with a magnetic member 52 made of a magnetic material and engaged with the plate-shaped magnetic body 53 from above. Among them, the magnet unit is constituted by the magnetic member 52 and the plate-shaped magnetism 53. The support mechanisms 32 a to 32
The substrate table 18 is provided via 32c.

The air slider 57 has a supply passage for compressed air, a passage for vacuum, and the like formed therein. The supply path of the pressurized air is connected to an air pump 59 (see FIG. 1) via a tube 33.
A vacuum passage is connected to a vacuum pump (not shown) via a tube 34. On the other hand, an air pad connected to the supply path of the pressurized air and an air pocket connected to the vacuum path are provided on the bottom surface of the air slider 57.

For this reason, in the present embodiment, the overall weight of the mover 51 and the substrate table 18 and the like, the plate-shaped magnet 53 constituting the magnet unit, and the stator yoke 43 described later
And a downward force corresponding to the sum of a magnetic attraction force between the above and a vacuum attraction force (pressurized force) by a vacuum pump (not shown);
An upward force due to the pressure of the pressurized air supplied from the air pump 59 and blown out toward the upper surface of the base 21 via the air pad, that is, the static pressure of the air layer between the movable element 51 bottom surface and the base 21 upper surface (so-called The thickness of the air layer, that is, the bearing clearance is maintained at a desired value by the balance with the internal pressure (gap). As described above, the air slider 57 constitutes a kind of a vacuum pressurized air static pressure bearing, and the whole of the movable element 51 and the substrate table 18 is formed on the base 2 by the air slider 57.
1 is floated and supported above the upper surface thereof through a clearance of, for example, about 5 μm (see FIGS. 1 and 3).

In this embodiment, as described above, the air slider 57 is provided with the supply path of the pressurized air and the passage for the vacuum, and the air pad and the air pocket connected to these, respectively, but the passage for the vacuum is provided. Need not necessarily be provided.

As shown in FIG. 4B, the plate-shaped magnet 53 has four thrust generating members arranged in a matrix of 2 rows and 2 columns so that the polarities of adjacent magnetic pole surfaces are different from each other. The magnets 54a, 54b, 54c, 54d and two adjacent thrust generating magnets (54a, 54b), (54b, 5)
4c), (54c, 54d), and (54d, 54a) are composed of interpolation magnets 55a, 55b, 55c, and 55d disposed in a magnetic flux path formed on the magnetic member 52 side.

Each of the thrust generating magnets 54a to 54d constituting the plate-shaped magnet 53 is made of a permanent magnet having the same thickness and the same shape, and has a square pole face.
And these thrust generating magnets 54a to 54d are X,
The magnets are arranged in a matrix of 2 rows and 2 columns on the same plane so that the gap between the thrust generating magnets adjacent in both Y directions has a predetermined width. In the thrust generating magnets 54a and 54b and the thrust generating magnets 54c and 54d adjacent in the X direction, the polarities of the adjacent magnetic pole surfaces are opposite to each other.
Also, thrust generating magnets 54a, 54d adjacent in the Y direction
And the thrust generating magnets 54b and 54c, the polarities of adjacent magnetic pole surfaces are opposite to each other.

Each of the interpolation magnets 55a to 55d is formed of a rectangular permanent magnet having the same thickness, and two adjacent thrust generating magnets (54a, 54a) when viewed in a plan view.
b), (54b, 54c), (54c, 54d), (5
4d, 54a) so as to fill the gaps between them,
In addition, they are arranged on a virtual plane formed by the upper surfaces of the thrust generating magnets 54a to 54d when viewed from the side. These interpolation magnets 55a to 55d have magnetic pole surfaces orthogonal to the magnetic pole surfaces of the thrust generating magnets 54a to 54d, and each of these magnetic pole surfaces is adjacent to the thrust generating magnets 54a to 54d in plan view.
It is arranged so as to have the opposite polarity to the pole face of d.

As shown in FIGS. 2 and 3, the base 21 has a square base body 22 in plan view and a pair of joint mounting members mounted on both ends of the base body 22 in the Y direction. 23A and 23B.

The base body 22 is engaged with a hollow box-shaped container 35 having a small thickness with an open upper surface and a first step portion 35a formed on the inner side of the peripheral wall of the container 35 from above.
A high thermal conductivity, specifically having a thermal conductivity of 30 [W / m · K], is arranged in parallel with the bottom wall of the container 35 with a predetermined gap (for example, a gap of about 2 mm) separated from the bottom wall. A flat plate-shaped stator yoke 43 made of the above magnetic material, and a second stator yoke 43 formed inside the upper end (opening end) of the peripheral wall of the container 35.
And a ceramic plate 36 that engages with the step 35b from above to close the opening. The moving surface 21a of the mover 51 is formed on the surface (upper surface) of the ceramic plate 36 on the side facing the mover 51.

An inner space of the base 21 formed by the container 35 and the ceramic plate 36 is vertically divided by a stator yoke 43, and a first chamber as a vacuum chamber is provided above the first yoke 43.
A chamber 41 is formed, and a second chamber 42 is formed below the chamber 41. In this case, the stator yoke 43 and the moving surface 21a are parallel.

As shown in FIG. 3, a predetermined gap (for example, 2 m) is provided between the first chamber 41 and the ceramic plate 36.
(a gap of about m) and in contact with the stator yoke 43, along the moving surface 21a, in nine rows and nine rows in the XY two-dimensional direction.
9 × 9 = 81 armature coils 38 in a matrix of columns
Are arranged (see FIG. 2). That is, in the present embodiment, the plurality of armature coils 3
A first wall is formed to form a first chamber 41 as a vacuum chamber in which the first chamber 4 is accommodated.
2 is formed. As shown in FIG. 2, a hollow square coil is used as the armature coil 38.

In this embodiment, the stator yoke 43, the armature coil 38, and the ceramic plate 36 constitute the above-described stator 60 of the planar motor 50.

On the opposite side (lower surface side) of the moving surface 21a of the ceramic plate 36, as shown in FIG.
Are formed. As shown in FIG. 2, when the ceramic plate 36 is assembled to the container 35, 9 × 9 = 81 projections 36a are located at positions corresponding to the center of the hollow portion of each armature coil 38, as shown in FIG. 8 × 8 = 64 are provided at positions corresponding to the spaces between the four armature coils 38.

Further, columns 39 are provided between the respective protrusions 36a of the ceramic plate 36 forming the first chamber 41 and the stator yoke 43 as a deformation preventing member made of a heat insulating material.

As shown in FIG. 5, the ceramic plate 36 is a completely flat plate, and a columnar deformation preventing member including a heat insulating material 40 is provided between the flat plate 36 and the stator yoke 43. 39 may be provided.

Returning to FIG. 1, the base 21 has an intake pipe 61
The vacuum pump 62 is connected via the. Intake pipe 61
Is one side (+ X side) in the X direction of the base 21 shown in FIG.
The vacuum suction port 63 is connected to the first chamber 41.
Here, a turbo-molecular pump is used as the vacuum pump 62, and this turbo-molecular pump has a vacuum evacuation capability for setting the inside of the first chamber 41 to a high vacuum state of, for example, 1 × 10 ⁻⁶ [Torr] or less. .

The pair of joint mounting members 23
A and 23B are integrally attached to the base body 22 by welding or the like. These joint mounting members 23
A and 23B are formed with screw holes 64a and 64b, respectively, having a predetermined depth in the central portion in the longitudinal direction and having the Y direction as the axial direction.

As shown in FIG. 3, one joint mounting member 23A has a dimension in the height direction (Z direction) from one side in the Y direction to the other side in a side view in which one end communicates with the screw hole 64a. Are formed in a triangular groove 65a having a right angle in cross section. On the side wall on one side in the Y direction of the container 35 constituting the base main body 22, a rectangular through hole 66 having an elongated section and having the same height and the same width in the X direction as the second chamber 42 is formed. The groove 65a communicates with the second chamber 42 through the through hole 66.
The container 35 has a symmetrical shape and has a through hole 66.
Although not shown, is also formed on the side wall of the container 35 on the other side in the Y direction.

As is clear from the plan view of FIG. 2, the plane cross section of the groove 65a is an isosceles triangle in which the width in the X direction increases linearly from one side in the Y direction to the other side. Has become. That is, the cross-sectional area of the groove 65a in the XZ cross section is constant regardless of the position in the Y direction. In this case, one end of a refrigerant supply joint (not shown) having an external thread formed on an outer peripheral portion is attached to the screw hole 64a,
The other end of the refrigerant supply joint is connected to the refrigerant supply pipe 9 of FIG.
2 is connected to a refrigerant supply device provided inside a cooling device 79 as a temperature control device. Therefore, in the present embodiment, the above-described groove 65a forms the entrance side (the screw hole 6).
4a), a throttle having a constant cross-sectional area to be supplied to the second chamber 42 through the through hole 66 is formed by narrowing the liquid refrigerant as the fluid flowing in from the film into a film shape. In this embodiment,
Screw hole 64a formed in joint mounting member 23A
(More precisely, an internal passage of a refrigerant supply joint (not shown) screwed into the screw hole 64a) forms a refrigerant inlet.

The other joint mounting member 23B is formed symmetrically with the one joint mounting member 23A in the groove 65b.
A screw hole 64b is formed, and the second chamber 42 and the groove 65b are communicated with each other by a through hole 66 formed on the other side wall of the container 35 in the Y direction. One end of a refrigerant discharge joint (not shown) having an external thread formed on an outer peripheral portion is attached to the screw hole 64b. The other end of the refrigerant discharge joint is connected to the inside of the cooling device 79 via the refrigerant discharge pipe 93 of FIG. Connected to a refrigerator provided in the refrigerator. In this case, a refrigerant outlet is formed by a screw hole 64b (more precisely, an internal passage of a refrigerant discharge joint (not shown) screwed into the screw hole 64b) formed in the joint mounting member 23B.

As is clear from the above description, in the present embodiment, the base 21 is connected via the refrigerant supply joint.
After cooling the inside of the base 21, the liquid refrigerant supplied into the (second chamber 42) is returned to the cooling device 79 via the refrigerant discharging joint, cooled there, and supplied again into the base 21. The liquid refrigerant is circulated and used. As the liquid refrigerant, for example, water or Fluorinert (manufacturer: Sumitomo 3M Co., Ltd., a fluorine-based inert liquid) or the like is used.
Supplied within. Also, a refrigerant passage (65) in the base 21 from the refrigerant supply joint to the refrigerant discharge joint.
a, 66, 42, 66, 65b) are constant over the entire length of the passage.

Further, in this embodiment, the stator yoke 43
The wall surface (lower surface) on the second chamber 42 side has a rough surface. This means that the flow of the liquid refrigerant flowing along the lower surface of the stator yoke 43 is positively disturbed, and the flow of the liquid refrigerant in the second chamber 42 (particularly, the boundary layer on the lower surface of the stator yoke 43) has its Reynolds number. Is to make the turbulence larger than the critical Reynolds number.

Next, the flow of the exposure operation in the exposure apparatus 100 including the stage apparatus 30 will be briefly described.

First, under the control of the main controller 20, reticle loading and wafer loading are performed by a reticle loader and wafer loader (not shown), and a reticle microscope (not shown) and a reference mark plate (not shown) on the substrate table 18. Preparation work such as reticle alignment and baseline measurement is performed according to a predetermined procedure using an alignment detection system (not shown).

Thereafter, main controller 20 uses an alignment detection system (not shown) to detect an EGA (enhanced
Alignment measurement such as global alignment) is performed. In such an operation, when the movement of the wafer W is necessary, the main controller 20 supplies the current value supplied to the armature coil 38 facing the thrust generating magnets 54a to 54d via the stage control system 19, and By controlling at least one of the current directions, the substrate table 18 holding the wafer W integrally with the mover 51 is moved in a desired direction. After the completion of the alignment measurement, the exposure operation of the step-and-scan method is performed as follows.

In this exposure operation, first, the wafer W
The substrate table 18 is moved such that the XY position of the substrate table becomes the scanning start position for exposing the first shot area (first shot) on the wafer W. At the same time, the reticle stage 18 is moved so that the XY position of the reticle R becomes the scanning start position. And main controller 2
Based on the instruction from 0, the stage control system 19 drives a reticle (not shown) based on the XY position information of the reticle R measured by the reticle interferometer 16 and the XY position information of the wafer W measured by the wafer interferometer 31. Scanning exposure is performed by synchronously moving the reticle R and the wafer W via the unit and the plane motor 50. The movement of the wafer W is performed by the main controller 20 by the stage control system 19.
Through at least one of the current value supplied to the armature coil 38 facing the thrust generating magnets 54a to 54d and the current direction.

When the transfer of the reticle pattern to one shot area is completed in this manner, the substrate table 18 is stepped by one shot area, and scanning exposure is performed for the next shot area. In this way, stepping and scanning exposure are sequentially repeated,
The required number of shot patterns are transferred onto the wafer W.

At the time of the above-described alignment and scanning exposure, current is appropriately supplied to each armature coil 38 constituting the stator 60 of the flat motor 50, so that the armature coil 38 generates heat. However, this heat is
Transmission to the side a is effectively suppressed (or prevented) as follows.

First, the inside of the first chamber 41 in the base 21 in which the plurality of armature coils 38 are housed is evacuated by the vacuum pump 62 to a high vacuum state. Accordingly, there is a highly vacuum gap between the ceramic plate 36 on the moving surface 21 a side forming the first chamber 41 and the armature coil 38 disposed on the stator yoke 43,
The heat transfer from the armature coil 38 to the moving surface 21a is performed almost exclusively by heat radiation. That is, the gap above the armature coil 38 functions as a kind of heat insulating layer, and effectively suppresses heat transfer to the moving surface side.

In this case, the higher the degree of vacuum, the higher the heat insulation (heat transfer suppressing effect) of the vacuum layer as the heat insulating layer. In the present embodiment, a high vacuum state of 1 × 10 ⁻⁶ [Torr] can be realized.
, There is almost no air, and heat conduction and heat transfer using the air as a heat transfer medium can be extremely small, and the heat transfer suppressing effect is extremely high.

In this case, even if the above-described high vacuum state is set in the base body 22, a large number of columns 39 are provided at substantially equal intervals between the ceramic plate 36 and the stator yoke 43 over the entire surface of the base body. , The ceramic plate 36 and the like are not deformed by the external air pressure, and the moving surface 21a on the upper surface of the ceramic plate 36 can be maintained flat.

When a large number of columns 39 are provided between the ceramic plate 36 and the stator yoke 43 as described above, heat generated by the armature coil 38 passes through the stator yoke 43 and the columns 39. However, in the present embodiment, since at least a part of the pillar 39 is formed of a heat insulating material, heat conduction using the pillar 39 as a medium is substantially reduced. Can be blocked.

Since the stator yoke 43 with which the armature coil 38 contacts is made of a magnetic material having high thermal conductivity, the stator yoke 43 not only functions as a magnetic circuit component, but also The heat generated by the armature coil 38 is efficiently conducted to the surface of the base body 22 opposite to the moving surface 21a.

A second chamber 42 is provided on the opposite side of the moving surface 21 a of the stator yoke 43 in the base 21 to be in contact with the vacuum chamber 41 via the stator yoke 43. The cooling device 79 communicates with a refrigerant supply joint connected to one side of the base 21 in the Y direction and a refrigerant discharge joint connected to the other side of the base 21 in the Y direction. A liquid refrigerant (fluid) whose temperature is controlled to be lower than the base atmosphere is supplied into the chamber 42. Therefore, heat exchange is performed between the stator yoke 43 and the liquid refrigerant, and the armature coils 38 can be efficiently cooled from the lower surface side, thereby suppressing the temperature rise of each armature coil 38 itself. can do.

In the present embodiment, the liquid refrigerant supplied from one side in the Y direction into the base 21 via the refrigerant supply joint is discharged through the refrigerant discharge joint on the other side in the Y direction. Since the refrigerant passage is provided, the liquid refrigerant flowing into the base via the refrigerant supply joint spreads in a film shape, spreads uniformly below each armature coil, and is developed on a plane. The heat is uniformly removed from the armature coil.

Further, the wall surface (lower surface) of the stator yoke 43 on the side of the second chamber 42 is rough and uneven, so that the wall surface (lower surface) between the stator yoke 43 and the liquid refrigerant flowing along the lower surface of the stator yoke 43 can be formed. The turbulent flow is caused by the Inols number of the flow becomes larger than the critical Reynolds number. When the flow in the flow path is turbulent, the solid-liquid heat transfer coefficient is larger than that in the case of laminar flow (it is ten to several tens times), and the flow becomes fluid and thermal quickly. Therefore, the heat removal of each armature coil 38 becomes quick and uniform. In this sense, projections may be provided on the lower surface of the stator yoke 43 at predetermined intervals.

As described above, the heat released from the entire surface of the armature coil 38 can be effectively prevented from being transmitted to the moving surface side, and the thermal influence on the surrounding environment can be suppressed as much as possible. Can be. In the present embodiment, a liquid refrigerant is supplied from the cooling device 79 into the base 21 via a refrigerant supply pipe 92 and a refrigerant supply joint, and the liquid refrigerant passes through the refrigerant passage in the base 21 to each armature coil 38.
Is cooled from the lower surface side, and the liquid refrigerant whose temperature has risen by this cooling returns to the cooling device 79 via the refrigerant discharge joint and the refrigerant discharge pipe 93, is cooled here, and is again supplied to the base 21 and The child coil 38 is cooled. That is, since the liquid refrigerant is circulated and used in this manner, the armature coil 3 always uses a substantially constant amount of liquid refrigerant.
8 can be cooled, which is economical.

As described above, according to the present embodiment, since the thermal influence on the environment of the apparatus can be minimized, the air fluctuation of the interferometer beam of the interferometer 31 for measuring the position of the wafer table 18 can be achieved. Is hardly a problem, and precise positioning and position control of the wafer can be performed. Therefore, according to the exposure apparatus 100 of the present embodiment, the position of the wafer W can be accurately and quickly controlled by the substrate stage device 30 having the electromagnetic motor driven flat motor 50, and the throughput can be improved while improving the throughput. Exposure can be performed with high accuracy.

The base 21 described in the above embodiment is used.
Is an example, and the present invention is not limited to this.

For example, in the above-described embodiment, a case has been described in which a column 39 entirely or partially formed of a heat insulating material is provided between the ceramic plate 36 and the stator yoke 43, but FIG. As shown in FIG. 5, a column 80 having an end (lower end) on the stator yoke 43 side tapered so that the area of the contact surface with the stator yoke 43 is smaller than the cross-sectional area of the other portions. It may be provided as a deformation preventing member. Since the column 80 has a shape in which heat is hardly transmitted from the stator yoke 43 side, it is not always necessary to form the column with a heat insulating material.

In the above embodiment, the armature coil 3
Although the case where no inclusion is disposed in the space between the ceramic plate 8 and the ceramic plate 43 has been described, even if the space is in a vacuum state, there is a small amount of air. Therefore, heat conduction and heat transfer phenomena may occur using the air as a heat transfer medium. In order to further suppress such a phenomenon, as shown in FIG. 7, a heat insulating material 81 may be interposed in a gap between the armature coil 38 and the ceramic plate 43.

In the above embodiment, the first wall forming the first chamber 41 is provided on the moving surface 21 a
Although the case where the first wall and the moving surface forming member are constituted by the ceramic plate 36 on which the first surface is formed has been described, the first wall and the moving surface forming member may be separate members. In this case, both the first wall and the moving surface forming member need to be formed of a nonmagnetic material such as ceramic.

In the above embodiment, the stator yoke 4
Although the case where the second chamber 42 constituting the refrigerant passage as the fluid passage is provided below 3 is described, the present invention is not limited to this. That is, the armature coil 38
There is a predetermined gap between the ceramic plate 36 and the
It is sufficient that the inside of the chamber 41 is vacuum-sucked by the vacuum pump 62, and the base 21 does not necessarily need to be provided with the second chamber 42 and a joint mounting member for supplying the refrigerant into the second chamber 42. In such a case, the second wall of the container 35 (the base 21) where the armature coil 38 is in contact with the second wall is formed of a magnetic material such as iron, so that the second wall is formed.
Functions as a magnetic circuit component, heat exchange is performed between the second wall and the outside air, and the armature coil 3
8 The lower surface is cooled. In this case, it is desirable that the second wall be formed of a magnetic material having high thermal conductivity.

<< Second Embodiment >> Next, a second embodiment of the present invention will be described with reference to FIG. In the second embodiment, the internal configuration of the base body 22 is slightly different, and the configuration of the other portions is the same as that of the above-described first embodiment. Also, the same reference numerals are used for the same or equivalent components.

FIG. 8A shows a partially omitted cross-sectional view of the base body 22 according to the second embodiment. In the second embodiment, an armature coil 38 is arranged in a two-dimensional direction at a predetermined interval along a moving surface 21a in contact with a stator yoke 43 in a vacuum chamber 41 in a base body 22. Is the same as that of the first embodiment described above, except that the moving surface 21a of the vacuum chamber 41 is in contact with the moving surface of the armature coil 38, and the thin plate 82 made of a nonmagnetic material is
Is characterized in that a refrigerant passage 99 as a fluid passage is provided on the moving surface 21a side of the vacuum chamber 41.

In the refrigerant passage 99, the liquid refrigerant from the cooling device 79 in FIG. Other configurations and the like are the same as those of the first embodiment.

According to the second embodiment configured as described above, the same effects as those of the first embodiment can be obtained. That is, the armature coil 38 is disposed in the vacuum chamber 41 inside the base, and the refrigerant passage 99 is provided on the moving surface 21a side forming the vacuum chamber 41,
In the vacuum portion (specifically, between the hollow portion of each armature coil 38 and the column 80, and between the center gap between the adjacent armature coils 38 and the column 80) in the vacuum chamber 41. The heat transfer from the armature coil 38 is performed almost exclusively by heat radiation, and the heat transferred to the moving surface 21 a side in the vacuum chamber 41 is a liquid whose temperature is controlled to be lower than the base atmosphere temperature flowing in the refrigerant passage 99. Heat is removed by heat exchange with the refrigerant. Therefore, thermal effects on the surrounding environment can be effectively suppressed.

In the case of the second embodiment, the thin plate 8
It is desirable to finish the surface of the thin plate 82 with good flatness so that the boundary layer of the flow of the liquid refrigerant flowing along 2 has a laminar flow (not more than the critical Reynolds number). This way,
FIG. 8B shows the flow between the thin plate 82 and the ceramic plate 36.
As shown in (2), the flow has a boundary between the high temperature portion and the low temperature portion, and the heat of the armature coil 38 can be almost certainly prevented from being transmitted to the ceramic plate 36.

In the first and second embodiments, the case where the liquid refrigerant as the fluid is circulated has been described, but the present invention is not limited to this. That is, the fluid is not limited to a liquid, and a gas may be used. When, for example, air or the like is used as the fluid, it is not always necessary to circulate the fluid.

Further, as described in the above embodiment, the exposure apparatus according to the present invention can precisely control the position of the substrate at high speed, and can perform exposure with high exposure accuracy while improving throughput. Then, each component constituting the device is electrically, mechanically or optically connected and assembled.

In the above embodiment, the case where the planar motor device according to the present invention is applied to a substrate stage device of a scanning type DUV exposure device has been described. However, the present invention is not limited to this, and a stationary type exposure device such as a stepper may be used. Needless to say, a charged particle beam exposure apparatus such as an electron beam exposure apparatus, an exposure apparatus such as a so-called EUVL using light in a soft X-ray region having a wavelength of about 5 to 15 nm as exposure light, an apparatus other than the exposure apparatus, for example, an inspection apparatus or a substrate The present invention can be suitably applied to a transport device and the like.

The technical idea of arranging an armature coil in a vacuum chamber of the present invention can be applied to a linear motor.

[0084]

As described above, according to the first to tenth aspects of the present invention, there is an effect that the thermal influence on the surrounding environment can be suppressed.

According to the eleventh aspect of the present invention,
There is an effect that high-precision exposure can be performed while maintaining high throughput.

[Brief description of the drawings]

FIG. 1 is a view showing a schematic configuration of an exposure apparatus according to a first embodiment.

FIG. 2 is a plan view showing the substrate stage device of FIG.

FIG. 3 is a sectional view taken along line AA of FIG. 2;

4A is a perspective view showing a mover of a planar motor included in the substrate stage device of FIG. 1, and FIG. 4B is an exploded perspective view of the mover of FIG.

FIG. 5 is a cross-sectional view of a base main body for describing a modification of a column constituting the base main body.

FIG. 6 is a cross-sectional view of a base body for explaining another modification of the pillars constituting the base body.

FIG. 7 is a cross-sectional view of a base body for explaining another modification of the base body.

FIG. 8A is a cross-sectional view of a base body according to a second embodiment, and FIG. 8B is a diagram illustrating a state of a flow of a liquid refrigerant in a refrigerant passage on an upper side of a vacuum chamber.

[Description of Signs] 21a: moving surface, 30: substrate stage device, 41: vacuum chamber, 21: base (part of the planar motor device), 36: ceramic plate (first wall), 38: armature coil, 39 ...
Columns (deformation preventing members), 42: second chamber (part of fluid passage), 43: stator yoke (second wall), 50: planar motor (part of planar motor device), 51: mover ( 52: a magnetic member (part of a magnet unit); 53: a plate-shaped magnet (part of a magnet unit);
54a, 54b, 54c, 54d ... thrust generating magnets (magnets), 65a, 65b ... grooves (part of fluid passages), 66
... through-hole (part of fluid passage), 79 ... cooling device (temperature control device), 100 ... exposure device, W ... wafer (substrate).

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Claims (12)

[Claims] 1. A magnet unit having at least one magnet and moving in a two-dimensional direction along a predetermined moving surface; wherein the moving surface is formed on a side facing the magnet unit, and inside the unit. A base having a vacuum chamber capable of maintaining a vacuum state; and a first wall on the moving surface side forming the vacuum chamber interposed between the base and the first wall along the moving surface. A plurality of armature coils arranged in a three-dimensional direction. 2. A deformation preventing member for preventing deformation of the base due to the vacuum state is provided between the first wall forming the vacuum chamber and a second wall opposed to the first wall. The planar motor device according to claim 1, wherein: 3. The flat motor device according to claim 2, wherein at least a part of the deformation preventing member is formed of a heat insulating material. 4. The deformation preventing member is formed in a shape such that an area of a contact surface with the second wall is smaller than a cross-sectional area of another portion of the deformation preventing member. 3. The planar motor device according to 2. 5. The apparatus according to claim 1, wherein the base further includes a fluid passage in contact with the vacuum chamber via the second wall on a side opposite to the moving surface of the vacuum chamber. The planar motor device according to claim 1. 6. The flat motor device according to claim 5, further comprising a temperature control device for controlling a temperature of the fluid flowing in the fluid passage. 7. The planar motor device according to claim 6, wherein the temperature control device controls the fluid to a temperature lower than the ambient temperature of the base. 8. The fluid passage according to claim 5, wherein the fluid passage has a shape such that a flow of the fluid flowing along at least the second wall of the fluid passage is turbulent.
A planar motor device according to any one of the preceding claims. 9. A flat motor device according to claim 5, wherein a cross-sectional area of said fluid passage is substantially constant over its entire length. 10. The planar motor device according to claim 1, wherein a heat insulating material is interposed between the first wall forming the vacuum chamber and each of the armature coils. 11. A magnet unit having at least one magnet and moving in a two-dimensional direction along a predetermined moving surface;
A base on which the moving surface is formed on a side facing the magnet unit, the base having a vacuum chamber capable of holding a vacuum state therein and a fluid passage located on the moving surface side of the vacuum chamber; A planar motor device comprising: a plurality of armature coils arranged two-dimensionally at predetermined intervals along the moving surface. 12. An exposure apparatus for transferring a predetermined pattern onto a substrate, wherein the substrate stage device drives the substrate.
An exposure apparatus using the planar motor device according to any one of the preceding claims.