JP2000096255A - Body of magnesium-containing metal treated with low electric resistance coating and its surface treatment - Google Patents
Body of magnesium-containing metal treated with low electric resistance coating and its surface treatmentInfo
- Publication number
- JP2000096255A JP2000096255A JP26556698A JP26556698A JP2000096255A JP 2000096255 A JP2000096255 A JP 2000096255A JP 26556698 A JP26556698 A JP 26556698A JP 26556698 A JP26556698 A JP 26556698A JP 2000096255 A JP2000096255 A JP 2000096255A
- Authority
- JP
- Japan
- Prior art keywords
- solution
- treatment
- chemical conversion
- magnesium
- containing metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 title claims description 37
- 239000011777 magnesium Substances 0.000 title claims description 37
- 229910052749 magnesium Inorganic materials 0.000 title claims description 37
- 229910052751 metal Inorganic materials 0.000 title claims description 11
- 239000002184 metal Substances 0.000 title claims description 11
- 238000000576 coating method Methods 0.000 title abstract description 36
- 239000011248 coating agent Substances 0.000 title abstract description 34
- 238000004381 surface treatment Methods 0.000 title description 3
- 238000011282 treatment Methods 0.000 claims abstract description 91
- 239000000126 substance Substances 0.000 claims abstract description 61
- 238000006243 chemical reaction Methods 0.000 claims abstract description 59
- 239000007769 metal material Substances 0.000 claims abstract description 26
- 239000003513 alkali Substances 0.000 claims abstract description 15
- 239000002253 acid Substances 0.000 claims abstract description 14
- 238000005530 etching Methods 0.000 claims abstract description 14
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 11
- 230000003647 oxidation Effects 0.000 claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 11
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001424 calcium ion Inorganic materials 0.000 claims abstract description 10
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 8
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 7
- WAEMQWOKJMHJLA-UHFFFAOYSA-N Manganese(2+) Chemical compound [Mn+2] WAEMQWOKJMHJLA-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000007739 conversion coating Methods 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 33
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 10
- 239000011572 manganese Substances 0.000 claims description 10
- 229910001437 manganese ion Inorganic materials 0.000 claims description 9
- 239000012670 alkaline solution Substances 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 8
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 7
- 239000011575 calcium Substances 0.000 claims description 7
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 6
- 239000011574 phosphorus Substances 0.000 claims description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims description 4
- 229940085991 phosphate ion Drugs 0.000 claims description 4
- 239000013043 chemical agent Substances 0.000 claims 1
- 239000007800 oxidant agent Substances 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 36
- 238000005260 corrosion Methods 0.000 abstract description 36
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 21
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 20
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 9
- 239000003795 chemical substances by application Substances 0.000 abstract description 9
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 abstract description 6
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 abstract description 5
- 229940048086 sodium pyrophosphate Drugs 0.000 abstract description 5
- 235000019818 tetrasodium diphosphate Nutrition 0.000 abstract description 5
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 abstract description 5
- 230000003405 preventing effect Effects 0.000 abstract 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 20
- 239000000463 material Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000000956 alloy Substances 0.000 description 12
- 238000005406 washing Methods 0.000 description 10
- 235000011007 phosphoric acid Nutrition 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 8
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 229960005069 calcium Drugs 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 238000007654 immersion Methods 0.000 description 5
- 230000002265 prevention Effects 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- -1 amine compound Chemical class 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 3
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 3
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 3
- 239000004137 magnesium phosphate Substances 0.000 description 3
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 3
- 229960002261 magnesium phosphate Drugs 0.000 description 3
- 235000010994 magnesium phosphates Nutrition 0.000 description 3
- 239000000615 nonconductor Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 description 1
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910018131 Al-Mn Inorganic materials 0.000 description 1
- 229910018137 Al-Zn Inorganic materials 0.000 description 1
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 1
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 229910018461 Al—Mn Inorganic materials 0.000 description 1
- 229910018573 Al—Zn Inorganic materials 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-L Phosphate ion(2-) Chemical compound OP([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-L 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- YYRMJZQKEFZXMX-UHFFFAOYSA-L calcium bis(dihydrogenphosphate) Chemical compound [Ca+2].OP(O)([O-])=O.OP(O)([O-])=O YYRMJZQKEFZXMX-UHFFFAOYSA-L 0.000 description 1
- 229940062672 calcium dihydrogen phosphate Drugs 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- FAYYUXPSKDFLEC-UHFFFAOYSA-L calcium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [Ca+2].[O-]S([O-])(=O)=S FAYYUXPSKDFLEC-UHFFFAOYSA-L 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- LPLMZAJYUPAYQZ-UHFFFAOYSA-N diazanium;difluoride Chemical compound [NH4+].[NH4+].[F-].[F-] LPLMZAJYUPAYQZ-UHFFFAOYSA-N 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CPSYWNLKRDURMG-UHFFFAOYSA-L hydron;manganese(2+);phosphate Chemical compound [Mn+2].OP([O-])([O-])=O CPSYWNLKRDURMG-UHFFFAOYSA-L 0.000 description 1
- 150000002680 magnesium Chemical class 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000011656 manganese carbonate Substances 0.000 description 1
- 229940093474 manganese carbonate Drugs 0.000 description 1
- 235000006748 manganese carbonate Nutrition 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 229910000016 manganese(II) carbonate Inorganic materials 0.000 description 1
- XMWCXZJXESXBBY-UHFFFAOYSA-L manganese(ii) carbonate Chemical compound [Mn+2].[O-]C([O-])=O XMWCXZJXESXBBY-UHFFFAOYSA-L 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 235000019691 monocalcium phosphate Nutrition 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- RAFRTSDUWORDLA-UHFFFAOYSA-N phenyl 3-chloropropanoate Chemical compound ClCCC(=O)OC1=CC=CC=C1 RAFRTSDUWORDLA-UHFFFAOYSA-N 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 229940048084 pyrophosphate Drugs 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
- 229910000165 zinc phosphate Inorganic materials 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、マグネシウム含有
金属表面に、裸耐蝕性、防錆性、塗膜密着性及び塗膜耐
蝕性で、かつ低電気抵抗性の皮膜を有する処理物及びそ
の処理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a treated product having a coating having low corrosion resistance and low electric resistance on a magnesium-containing metal surface with bare corrosion resistance, rust prevention, coating film adhesion and coating corrosion resistance. About the method.
【0002】[0002]
【従来の技術】近年、携帯電話器、ノートパソコン、ビ
テオカメラ等がめざましく普及してきたが、その普及に
伴い、その電磁波による通信障害や人体への影響が問題
視されている。この問題に対しては、その筺体の構成材
について一定の電磁波シールド性の対策が求められてい
る。また、これらの筺体の形成材としては、プラスチッ
ク材製のものに代わり、軽さや物理的強度、さらにはリ
サイクル性の観点から、マグネシウム合金材製のものが
多く使用されるに至っている。2. Description of the Related Art In recent years, portable telephones, notebook personal computers, video cameras, and the like have been remarkably popularized. In order to solve this problem, it is required to take measures against the electromagnetic wave shielding property of the components of the housing. In addition, as a material for forming these housings, a material made of a magnesium alloy material has been widely used from the viewpoint of lightness, physical strength, and recyclability, instead of a material made of a plastic material.
【0003】このマグネシウム合金材は、腐食性が激し
いという欠点がある。このため、水酸化アルカリ溶液に
よる前処理後にクロム系溶液による化成処理を施す方法
や、無電解ニッケルメッキ等により、マグネシウム合金
の表面に皮膜を形成させることが一般的に行われてい
る。しかし、クロム系溶液の使用は地球環境にとって有
害性が大きく、ノンクロム系の化成処理剤による処理方
法の開発が望まれるところである。[0003] This magnesium alloy material has the disadvantage of being highly corrosive. For this reason, it is common practice to form a film on the surface of a magnesium alloy by a method of performing a chemical conversion treatment with a chromium-based solution after a pretreatment with an alkali hydroxide solution, or by electroless nickel plating. However, the use of a chromium-based solution is highly harmful to the global environment, and it is desired to develop a treatment method using a non-chromium-based chemical conversion treatment agent.
【0004】また、マグネシウム合金表面処理用のノン
クロム系の化成処理剤による処理方法としては、従来、
マグネシウム合金の表面に、高温の水酸化ナトリウム溶
液を接触させる方法(特開昭61−90776号公
報)、ピロリン酸塩溶液及び水酸化アルカリ溶液で処理
する方法(特開平6−116740号公報)、酸性PH
下で、リン酸、マンガンイオン及びアミン化合物を含む
水性液を接触させる方法(特開平7−126858号公
報)、リン酸、カルシウムイオンあるいはアルミニウム
イオン及びアミン化合物を含む水性液を酸性PH値下で
接触させる方法(特開平8−176842号公報)など
が開発されている。しかし、これら従来のノンクロム系
の化成処理剤によるいずれの処理方法によっても、形成
皮膜の裸耐蝕性について十分なものが得られない。[0004] Further, as a treatment method using a non-chromium-based chemical conversion treating agent for treating a magnesium alloy surface, a conventional method is as follows.
A method in which a high-temperature sodium hydroxide solution is brought into contact with the surface of a magnesium alloy (Japanese Patent Application Laid-Open No. 61-90776), a method of treating with a pyrophosphate solution and an alkali hydroxide solution (Japanese Patent Application Laid-Open No. 6-116740), Acid PH
A method of contacting an aqueous liquid containing phosphoric acid, manganese ions and an amine compound (JP-A-7-126858), an aqueous liquid containing phosphoric acid, calcium ions or aluminum ions and an amine compound under an acidic pH value. A contacting method (Japanese Patent Laid-Open No. 8-176842) and the like have been developed. However, none of these conventional methods using a non-chromium-based chemical conversion treatment agent can provide sufficient bare corrosion resistance of the formed film.
【0005】[0005]
【発明が解決しようとする課題】このため、本発明者ら
は、マグネシウム合金表面処理用のノンクロム系の化成
処理剤につき、鋭意研究した結果、カルシウムイオン、
マンガンイオン及びリン酸イオンを含み、さらに酸化促
進剤を含有する水性液剤によれば、その化成処理によっ
てマグネシウム合金表面に得られる化成皮膜は、裸耐蝕
性、防錆性、塗装密着性及び塗装耐蝕性のいずれについ
ても優れたものが得られる、との知見を得た。The inventors of the present invention have conducted intensive studies on a non-chromium-based chemical conversion treating agent for treating the surface of a magnesium alloy.
According to the aqueous solution containing manganese ions and phosphate ions and further containing an oxidation promoter, the chemical conversion film obtained on the surface of the magnesium alloy by the chemical conversion treatment has a bare corrosion resistance, a rust prevention property, a paint adhesion property and a paint corrosion resistance. It has been found that excellent properties can be obtained for both sexes.
【0006】しかし、上記した新規開発に係る化成処理
溶液を、水酸化アルカリ溶液による前処理後の化成処理
工程に使用する前記した従来の処理方法にそのまま適用
する場合、マグネシウム合金表面では皮膜の形成により
電気抵抗率が106 Ω・cmを超える電気絶縁物の値と
なる。このように高い電気抵抗率の皮膜を有するマグネ
シウム合金が携帯電話器等の筺体の構成材などとして利
用されるとき、その生じる電磁波に対し十分なシールド
性能を保持させることができない。However, when the above-mentioned newly developed chemical conversion treatment solution is directly applied to the above-mentioned conventional treatment method used in the chemical conversion treatment step after pretreatment with an alkali hydroxide solution, formation of a film on the surface of the magnesium alloy. Thus, the electrical resistivity becomes a value of an electrical insulator exceeding 10 6 Ω · cm. When a magnesium alloy having a film with such a high electrical resistivity is used as a constituent material of a housing of a mobile phone or the like, it is not possible to maintain sufficient shielding performance against electromagnetic waves generated.
【0007】そこで、本発明では、マグネシウム含有金
属材に対し、一定の裸耐蝕性、防錆性、塗膜密着性及び
塗膜耐蝕性を保持すると共に、電磁波シールド性を有効
に保持する低電気抵抗率を有する化成皮膜を形成でき
る、ノンクロム系化成処理溶液による表面処理物及びそ
の処理方法の提供を目的とした。In view of the above, the present invention provides a magnesium-containing metal material having a low electrical resistance that maintains a certain level of bare corrosion resistance, rust prevention, coating film adhesion and coating film corrosion resistance, and effectively maintains electromagnetic wave shielding properties. An object of the present invention is to provide a surface-treated product using a non-chromium-based chemical conversion treatment solution, which can form a chemical conversion film having resistivity, and a method for treating the same.
【0008】[0008]
【課題を解決するための手段】上記した目的を達成する
ため、本発明は、マグネシウム含有金属の低電気抵抗性
皮膜処理物につき、次の組成とした。即ち、マグネシウ
ム含有金属表面の化成処理皮膜が、1乃至500mg/
m2 のカルシウム、1乃至500mg/m2 のマンガン
及び1乃至1000mg/m2 のリンを含み、かつ電気
抵抗率が0.1Ω・cm以下であることを特徴とする。Means for Solving the Problems In order to achieve the above-mentioned object, the present invention provides the following composition for a low electrical resistance coating of a magnesium-containing metal. That is, the chemical conversion coating on the surface of the magnesium-containing metal is 1 to 500 mg /
m 2 calcium, 1 to 500 mg / m 2 manganese and 1 to 1000 mg / m 2 phosphorus, and an electrical resistivity of 0.1 Ω · cm or less.
【0009】マグネシウム含有金属材表面に上記した所
定量のカルシウム、マンガン及びリンを含むように化成
皮膜が形成されることにより、一定の裸耐蝕性、防錆
性、塗膜密着性及び塗膜耐蝕性を保持するものとして得
られる。特に、カルシウム及びリンは化成皮膜の裸耐蝕
性の向上、またマンガンは塗膜密着性の向上に寄与する
ものと考えられる。また、マグネシウム含有金属表面の
電気抵抗率が0.1Ω・cm以下であることによって、
その構成材について有効な電磁波シールド性を保持させ
ることができる。By forming a chemical conversion film on the surface of the magnesium-containing metal material so as to contain the above-mentioned predetermined amounts of calcium, manganese and phosphorus, a certain bare corrosion resistance, rust prevention, coating film adhesion and coating film corrosion resistance are obtained. Obtained to maintain the properties. In particular, calcium and phosphorus are considered to contribute to the improvement of the bare corrosion resistance of the chemical conversion film, and manganese contributes to the improvement of the adhesion of the coating film. Further, by the electrical resistivity of the magnesium-containing metal surface is 0.1 Ω · cm or less,
Effective electromagnetic wave shielding properties of the constituent material can be maintained.
【0010】つまり、この電磁波シールド性は、入射電
磁波が、マグネシウム含有金属材表面の化成皮膜におけ
る低電気抵抗率性により吸収され、この吸収された電磁
波エネルギーは熱に変化して消耗される原理に基づくも
のであると考えられる。In other words, this electromagnetic wave shielding property is based on the principle that incident electromagnetic waves are absorbed by the low electrical resistivity of the chemical conversion film on the surface of the magnesium-containing metal material, and the absorbed electromagnetic wave energy is converted into heat and consumed. It is thought that it is based on.
【0011】また、本発明において、マグネシウム含有
金属としては、Mg−Al−Zn合金、Mg−Zn合
金、Mg−Al−Mn合金等のマグネシウム合金のほ
か、マグネシウム自体をも含む。また、マグネシウム含
有金属材としては、この金属材自体のほか、そのダイカ
スト製品材をも含む。In the present invention, the magnesium-containing metal includes magnesium itself, in addition to magnesium alloys such as Mg-Al-Zn alloy, Mg-Zn alloy and Mg-Al-Mn alloy. The magnesium-containing metal material includes not only the metal material itself but also a die-cast product material.
【0012】次に、上記した組成乃至性能を保持する本
発明に係る低電気抵抗性皮膜のマグネシウム含有金属表
面の処理方法は、次のとおりである。Next, a method for treating the magnesium-containing metal surface of the low electric resistance film according to the present invention which maintains the above-mentioned composition and performance is as follows.
【0013】先ず、本発明に係る第一の処理方法は、マ
グネシウム含有金属材に対して、酸及び/又は弱アルカ
リ溶液によるエッチング処理後に、高アルカリ溶液によ
る処理を行い、しかる後にカルシウムイオン、マンガン
イオン及びリン酸イオンを含み、さらに酸化処理剤を含
有する化成処理剤溶液による化成処理を行う工程を含む
ことを特徴とする。First, in a first treatment method according to the present invention, a magnesium-containing metal material is subjected to a treatment with a high alkali solution after an etching treatment with an acid and / or a weak alkali solution, followed by a treatment with calcium ions and manganese. The method is characterized by including a step of performing a chemical conversion treatment using a chemical conversion treatment solution containing ions and phosphate ions and further including an oxidation treatment agent.
【0014】この本発明に係る処理方法において、酸溶
液とは、リン酸や酸性フッ化アンモニウム、硝酸、硫酸
等の水溶液、また、弱アルカリ溶液とは、ピロリン酸ナ
トリウム等の水溶液を挙げることができる。また、高ア
ルカリ溶液とは、水酸化ナトリウムの水溶液等を挙げる
ことができる。In the treatment method according to the present invention, the acid solution may be an aqueous solution of phosphoric acid, ammonium acid fluoride, nitric acid, sulfuric acid or the like, and the weak alkaline solution may be an aqueous solution of sodium pyrophosphate or the like. it can. The high alkali solution includes an aqueous solution of sodium hydroxide.
【0015】この処理方法では、次のような作用が生じ
るものと考えられる。先ず、酸及び/又は弱アルカリ溶
液中でのエッチング作用によって、マグネシウム含有金
属材に含まれるマグネシウムやアルミニウムや亜鉛等が
酸あるいは弱アルカリと化学反応して溶出する。この
際、例えば、過剰に生成した粉末状のリン酸マグネシウ
ム、リン酸アルミニウム、リン酸亜鉛、その他マグネシ
ウムの溶出成分等がスマットとして付着状態となる。次
いで、このマグネシウム含有金属材表面のスマットは、
その大部分が高アルカリ溶液中で溶解除去されるが、そ
の一部は残留する。この際、この残留スマットの一部は
溶解して水酸化マグネシウムとなり、これがマグネシウ
ム含有金属材表面に不導態化膜を形成すると共に、残留
スマットの成分であるリン酸マグネシウムやリン酸アル
ミニウム等が混在した化成皮膜がマグネシウム含有金属
材表面に形成されることになる。これらのリン酸マグネ
シウムやリン酸アルミニウム等は非常に小さいものであ
り、これらの存在がマグネシウム含有金属材表面の低電
気抵抗率性を保持させているものと考えられる。In this processing method, it is considered that the following effects occur. First, magnesium, aluminum, zinc, and the like contained in a magnesium-containing metal material are eluted by a chemical reaction with an acid or a weak alkali by an etching action in an acid and / or a weak alkali solution. At this time, for example, excessively generated powdery magnesium phosphate, aluminum phosphate, zinc phosphate, and other components eluted with magnesium, etc., are attached as smut. Then, the smut of this magnesium-containing metal material surface is
Most of them are dissolved and removed in a highly alkaline solution, but some of them remain. At this time, a part of the residual smut dissolves into magnesium hydroxide, which forms a passivation film on the surface of the magnesium-containing metal material, and the components of the residual smut, magnesium phosphate and aluminum phosphate, are removed. A mixed chemical conversion film is formed on the surface of the magnesium-containing metal material. These magnesium phosphate and aluminum phosphate are very small, and it is considered that their presence keeps the low electrical resistivity of the surface of the magnesium-containing metal material.
【0016】従って、この処理方法において、酸あるい
は弱アルカリ溶液によるエッチング処理工程では、上記
した作用に適う処方で実行することが必要となる。この
エッチング処理における好ましい処方は、例えば、リン
酸溶液について、0.5〜10重量%の濃度のリン酸水
溶液とし、常温下に10秒間〜10分間の浸漬処理を行
うことである。このリン酸の濃度が0.5重量%未満で
あったり、又は処理時間が10秒未満であるとエッチン
グ処理が不完全となる。このエッチング処理が不完全で
あると、スマットの発生が足りず、表面抵抗の小さい皮
膜が得られず、また形成皮膜についての裸耐蝕性や塗膜
密着性等について不良の原因となる。また、このリン酸
の濃度が10重量%を超えたり、又は処理時間が10分
を超えると、形成皮膜が不均一となり、また皮膜形成後
に過剰に残留し、形成皮膜についての裸耐蝕性、塗膜密
着性等について不良の原因となる。Therefore, in this treatment method, it is necessary to perform the etching treatment step using an acid or a weak alkali solution with a recipe suitable for the above-mentioned action. A preferable prescription in this etching treatment is, for example, that a phosphoric acid solution is a phosphoric acid aqueous solution having a concentration of 0.5 to 10% by weight, and immersion treatment is performed at room temperature for 10 seconds to 10 minutes. If the concentration of the phosphoric acid is less than 0.5% by weight or the treatment time is less than 10 seconds, the etching process is incomplete. If the etching treatment is incomplete, smut is not generated sufficiently, and a film having a small surface resistance cannot be obtained. Further, the formed film may be defective in bare corrosion resistance, film adhesion, and the like. If the concentration of the phosphoric acid exceeds 10% by weight or the processing time exceeds 10 minutes, the formed film becomes non-uniform and excessively remains after the film is formed. This causes a defect in film adhesion and the like.
【0017】また、ピロリン酸ナトリウム溶液について
は、0.5〜10重量%の垂溶液濃度で、50〜60℃
の温度条件下で、1〜5分間浸漬することである。この
ピロリン酸ナトリウム濃度が0.5重量%未満であった
り、又は処理時間が1分未満であると、エッチングが不
完全となり、形成皮膜について裸耐蝕性や塗膜密着性の
不良の原因となったり、また前記した残留付着物量が不
十分となる。このため、表面抵抗の低い皮膜をえること
ができない。また、ピロリン酸ナトリウム濃度が10重
量%を超えたり、又は処理時間が10分を超えると、形
成皮膜が不均一となる。The sodium pyrophosphate solution is prepared at a concentration of 0.5 to 10% by weight at a concentration of 50 to 60 ° C.
Under the temperature condition of 1 to 5 minutes. If the concentration of sodium pyrophosphate is less than 0.5% by weight or the treatment time is less than 1 minute, the etching becomes incomplete and causes poor corrosion resistance and poor adhesion of the formed film. And the amount of residual deposits described above becomes insufficient. For this reason, a film with low surface resistance cannot be obtained. If the concentration of sodium pyrophosphate exceeds 10% by weight or the processing time exceeds 10 minutes, the formed film becomes non-uniform.
【0018】また、高アルカリ溶液による処理において
は、脱脂処理のほか、前工程における酸を中和し除去す
る作用を発揮する。この作用に適う高アルカリ溶液は、
例えば、水酸化ナトリウム水溶液の場合、1〜10重量
%で、この溶液を50〜60℃の加温条件下に1〜5分
間浸漬処理を行うことが好ましい。このアルカリの濃度
が1重量%未満であったり、処理時間が1分未満である
と、不働態化膜の生成が十分でなく、また皮膜に過剰の
スマットが残留し、形成皮膜の裸耐蝕性が不十分とな
る。また、このアルカリの濃度が10重量%を超えた
り、処理時間が5分を超えると、残留スマットの量が少
なくなり、処理後のマグネシウム含有金属材表面につい
て十分な電気抵抗の低下が不十分となる。In addition, the treatment with a highly alkaline solution exerts not only the degreasing treatment but also the action of neutralizing and removing the acid in the preceding step. A highly alkaline solution suitable for this effect is
For example, in the case of an aqueous solution of sodium hydroxide, it is preferable that the solution is immersed in 1 to 10% by weight under a heating condition of 50 to 60 ° C. for 1 to 5 minutes. If the concentration of the alkali is less than 1% by weight or the treatment time is less than 1 minute, the formation of the passivation film is not sufficient, and excess smut remains in the film, resulting in the bare corrosion resistance of the formed film. Becomes insufficient. On the other hand, if the alkali concentration exceeds 10% by weight or the treatment time exceeds 5 minutes, the amount of residual smut decreases, and it is insufficient to sufficiently reduce the electric resistance on the surface of the magnesium-containing metal material after the treatment. Become.
【0019】次に、本発明に係る第二の処理方法は、マ
グネシウム含有金属材に対して、酸又は弱アルカリ溶液
によるエッチング処理後に、フッ化物溶液による処理を
行い、しかる後にカルシウムイオン、マンガンイオン及
びリン酸イオンを含み、さらに酸化処理剤を含有する化
成処理剤溶液による化成処理を行う工程を含むことを特
徴とする。Next, in a second treatment method according to the present invention, a magnesium-containing metal material is treated with a fluoride solution after an etching treatment with an acid or weak alkali solution, and thereafter, with calcium ions and manganese ions. And a step of performing a chemical conversion treatment with a chemical conversion treatment solution containing an oxidation treatment agent.
【0020】この第二の処理方法における作用は、酸又
は弱アルカリ溶液において、マグネシウム含有金属材か
ら主としてマグネシウムが溶出し、その過剰成分が表面
にスマット状に再付着する。この付着物の大部分は、次
工程のフッ化物溶液中で溶解除去されるが、その一部は
残留する。これが第一の処理方法の場合と同様にマグネ
シウム含有金属材表面の電気抵抗の低下に寄与すること
になると考えられる。The effect of the second treatment method is that magnesium is mainly eluted from the magnesium-containing metal material in an acid or weakly alkaline solution, and the excess component is reattached to the surface in a smut form. Most of the deposits are dissolved and removed in the fluoride solution in the next step, but a part thereof remains. It is considered that this contributes to a decrease in electric resistance on the surface of the magnesium-containing metal material as in the case of the first treatment method.
【0021】このような作用に適う好ましい処方は、酸
又は弱アルカリ溶液については、前記した第一の処理方
法と同じである。A preferable formulation suitable for such an action is the same as that of the first treatment method for an acid or weak alkali solution.
【0022】また、フッ酸溶液及び酸性フッ化アンモニ
ウム等のフッ化物溶液について好ましい処方は、いずれ
についても、1〜10重量%の水溶液濃度で、常温条件
下、1〜10分間浸漬することである。このフッ酸ある
いは酸性フッ化アンモニウム濃度が1重量%未満であっ
たり、処理時間が1分未満であると、エツチング処理が
不完全となる。またフッ酸あるいは酸性フッ化アルミニ
ウム濃度が10重量%を超えたり、又は処理時間が10
分を超えると、形成皮膜が不均一となり、また残留付着
物の量が少なくなり、マグネシウム含有金属材表面の電
気抵抗の低下が不十分となる。A preferred formulation for the hydrofluoric acid solution and the fluoride solution such as ammonium acid fluoride is to soak the solution in an aqueous solution concentration of 1 to 10% by weight for 1 to 10 minutes at room temperature. . If the hydrofluoric acid or ammonium ammonium fluoride concentration is less than 1% by weight or the treatment time is less than 1 minute, the etching treatment is incomplete. Further, the concentration of hydrofluoric acid or acidic aluminum fluoride exceeds 10% by weight, or
If the amount exceeds the limit, the formed film becomes non-uniform, the amount of residual deposits decreases, and the decrease in the electrical resistance on the surface of the magnesium-containing metal material becomes insufficient.
【0023】また、上記した第一及び第二の各処理方法
における、酸又は弱アルカリ浴液によるエッチング処理
工程は、処理対象材がマグネシウム合金ダイカストのよ
うに、その表面にある種の離型剤を伴うような場合で
も、次工程の化成処理工程で裸耐蝕性等について優れた
化成皮膜を得ることを可能とする。In the above-described first and second treatment methods, the etching treatment step using an acid or a weak alkaline bath solution is performed in such a manner that the material to be treated is a certain release agent on its surface, such as a magnesium alloy die-cast. Even in such a case, it becomes possible to obtain a chemical conversion film excellent in bare corrosion resistance and the like in the next chemical conversion treatment step.
【0024】次に、上記した本発明に係る各処理方法に
おける化成処理は、前記したようにカルシウムイオン、
マンガンイオン及びリン酸イオンを含み、さらに酸化促
進剤を含有する水性液剤を化成処理液剤とし、この化成
処理液剤の浴液にマグネシウム含有金属材を浸漬するこ
とにより実行できる。Next, the chemical conversion treatment in each of the above-described treatment methods according to the present invention is performed by using calcium ions,
An aqueous solution containing manganese ions and phosphate ions and further containing an oxidation promoter is used as a chemical conversion treatment solution, and the magnesium-containing metal material can be immersed in a bath of the chemical conversion treatment solution.
【0025】この化成処理液剤について、カルシウムイ
オンは、硝酸カルシウム、亜硝酸カルシウム、チオ硫酸
カルシウム、リン酸二水素カルシウムなどの一種又は二
種以上の配合によることができる。また、マンガンイオ
ンは、炭酸マンガン、硝酸マンガン、リン酸水素マンガ
ン、重リン酸マンガン、ホウフッ化マンガンなどの一種
又は二種以上の配合によることができる。また、リン酸
イオンは、オルソリン酸、縮合リン酸、亜リン酸、次亜
リン酸などの一種又は二種以上の配合によることができ
る。In this chemical conversion treatment liquid, the calcium ions may be a mixture of one or more of calcium nitrate, calcium nitrite, calcium thiosulfate, calcium dihydrogen phosphate and the like. Further, the manganese ion can be obtained by mixing one or more of manganese carbonate, manganese nitrate, manganese hydrogen phosphate, manganese biphosphate, manganese borofluoride, and the like. Further, the phosphate ion may be formed by one or more of orthophosphoric acid, condensed phosphoric acid, phosphorous acid, hypophosphorous acid, and the like.
【0026】この化成処理液剤の各成分の好ましい配合
量は次のとおりである。即ち、カルシウムイオンが1〜
20重量%、マンガンイオンが1〜4重量%及びリン酸
イオンが20重量%以上、並びに酸化促進剤が0.02
〜2重量%の割合で配合することである。これらの各成
分について、上記した範囲の配合量であるとき、マグネ
シウム含有金属材の表面に裸耐蝕性や塗膜密着性等につ
いて良好な化成皮膜を安定的かつ経済的に、しかも、低
電気抵抗率性を保持する状態で形成することができる。The preferred compounding amounts of each component of the chemical conversion treatment liquid are as follows. That is, calcium ion is 1 to
20% by weight, 1 to 4% by weight of manganese ion and 20% by weight or more of phosphate ion, and 0.02% of oxidation promoter
22% by weight. When the amount of each of these components is within the above range, a chemical conversion film having good corrosion resistance and good adhesion to the coating film on the surface of the magnesium-containing metal material is stably and economically produced, and has a low electric resistance. It can be formed while maintaining the efficiency.
【0027】なお、カルシウムイオンが不足する場合、
裸耐蝕性や塗膜密着性等が低下し、またマンガンイオン
やリン酸イオンが不足する場合には、特に、塗膜密着性
の低下に加えて、酸化促進剤からの塩素イオンによる白
錆が発生する原因となる。When calcium ions are insufficient,
When the corrosion resistance and coating film adhesion etc. decrease, and the manganese ion and phosphate ion are deficient, in addition to the decrease in coating film adhesion, white rust due to chlorine ions from the oxidation promoter is particularly increased. Cause it to occur.
【0028】また、酸化促進剤としては、塩素酸ナトリ
ウム、次亜塩素酸ナトリウム等を挙げることができる。
この酸化促進剤は、化成処理時に、前記した各成分イオ
ンとの反応性を高め、裸耐蝕性等が良好な化成皮膜を得
ることができる。また、この酸化促進剤の好ましい配合
量は、上記の性能の化成皮膜を安定的に得るために、
0.02〜2.0重量%の範囲の割合である。Examples of the oxidation promoter include sodium chlorate, sodium hypochlorite and the like.
This oxidation promoter enhances the reactivity with the above-mentioned respective component ions during the chemical conversion treatment, and can provide a chemical conversion film having good bare corrosion resistance and the like. In addition, the preferred compounding amount of the oxidation promoter is to obtain a chemical conversion film having the above performance stably.
The ratio is in the range of 0.02 to 2.0% by weight.
【0029】また、この化成処理液剤からなる化成処理
浴液は、PH1.0〜3.0に調整されていることが好
ましい。このPH値が1.0未満であると、化成処理時
においてエッチング量が過大となって、マグネシウム含
有金属材の寸法精度上の問題が生じると共に、裸耐蝕性
の低下をきたす。また、このPH値が3.0を超える
と、化成皮膜の裸耐蝕性等の性能の低下をきたすからで
ある。It is preferable that the pH of the chemical conversion treatment solution containing the chemical conversion treatment solution is adjusted to 1.0 to 3.0. If the PH value is less than 1.0, the amount of etching becomes excessive during the chemical conversion treatment, causing a problem in the dimensional accuracy of the magnesium-containing metal material, and lowering the bare corrosion resistance. Also, if the PH value exceeds 3.0, the chemical conversion film deteriorates in performance such as bare corrosion resistance.
【0030】また、この化成処理浴液は、30〜75℃
の範囲の温度に維持されれていることが好ましい。この
浴液温度が、30℃未満であると、化成皮膜の形成に長
時間を要し、化成皮膜の裸耐蝕性等について不良の原因
となったりする。この温度が75℃を超えると、化成皮
膜の裸耐蝕性等の性能が低下する。Further, the chemical conversion bath solution is used at 30 to 75 ° C.
Is preferably maintained at a temperature in the range of When the bath temperature is lower than 30 ° C., it takes a long time to form the chemical conversion film, which may cause a defect in the corrosion resistance of the chemical conversion film, such as naked corrosion resistance. When this temperature exceeds 75 ° C., performance such as bare corrosion resistance of the chemical conversion film deteriorates.
【0031】また、この化成処理浴液による化成処理の
ための時間は、この浴液温度と相関関係にある。即ち、
浴液温度が50℃未満である場合、3〜20分間浸漬す
ること、また浴液温度が50℃以上の場合、0.5〜1
0分間浸漬する条件であることが好ましい。この浴液温
度が50℃未満で、浸漬時間が短いと、化成皮膜の形成
量が不十分となる。また浴液温度が50℃以上で、浸漬
時間が長いと、形成皮膜の再溶出が生じて裸耐蝕性等の
性能の低下をきた、またスマットを皮膜が覆ってしま
い、表面抵抗が高くなることがある。The time required for the chemical conversion treatment with the chemical conversion bath solution has a correlation with the bath solution temperature. That is,
If the bath temperature is less than 50 ° C, soak for 3 to 20 minutes. If the bath temperature is 50 ° C or higher, 0.5 to 1 minute.
It is preferable that the immersion condition is 0 minutes. If the bath temperature is less than 50 ° C. and the immersion time is short, the formation amount of the chemical conversion film becomes insufficient. If the bath temperature is 50 ° C. or higher and the immersion time is long, the formed film will be re-eluted and the performance such as bare corrosion resistance will be reduced. In addition, the film will cover the smut and the surface resistance will increase. There is.
【0032】本発明は、上述したような処理過程を含む
処理方法であり、上記した各処理工程後にはそれぞれ水
洗工程を含ませることが好ましく、また、化成処理に続
けては、さらに、一般的方法に従い、水洗後に、乾燥処
理をし、さらに塗装処理を施すことができる。この塗装
処理には、エポキシ樹脂材を電着塗装や吹き付け塗装の
方法により下塗りし、さらにこれにメラミン樹脂等によ
り上塗りすることによるができる。The present invention is a processing method including the above-described processing steps, and it is preferable that a water-washing step is included after each of the above-described processing steps. According to the method, after washing with water, a drying treatment can be performed, and further a coating treatment can be performed. This coating treatment can be performed by undercoating an epoxy resin material by an electrodeposition coating or spray coating method, and then overcoating it with a melamine resin or the like.
【0033】[0033]
【実施例】(実施例1)処理対象としてのチクソモール
ド法によるマグネシウム合金材(JISH5303MD
ID(ASTM AZ91D)、2×60×100m
m、日本製鋼(株)調製品)に対して、前処理として、
表1に示す実施番号1〜12の処理浴液による表面調整
1、水洗、表面調整2、水洗、表面調整3及び水洗の各
工程を浸漬法により、表2に示す処理条件下で順にそれ
ぞれ行った。(Example 1) A magnesium alloy material (JIS H5303MD) by a thixomold method as a processing object
ID (ASTM AZ91D), 2 × 60 × 100m
m, prepared by Nippon Steel Corporation)
The steps of surface conditioning 1, water washing, surface conditioning 2, water washing, surface conditioning 3 and water washing with the treatment bath liquids of the working numbers 1 to 12 shown in Table 1 are sequentially performed by the immersion method under the treatment conditions shown in Table 2. Was.
【0034】[0034]
【表1】 [Table 1]
【0035】[0035]
【表2】 [Table 2]
【0036】なお、水酸化ナトリウム浴液については、
アニオン界面活性剤を0.5重量%配合した。また、そ
の他の浴液についてはそれぞれ非イオン界面活性剤を
0.2重量%配合した。The sodium hydroxide bath solution is as follows:
0.5% by weight of an anionic surfactant was blended. In addition, each of the other bath solutions contained a nonionic surfactant in an amount of 0.2% by weight.
【0037】次いで、上記した前処理後に表3に示す成
分配合の化成処理浴液により化成処理を施こした。ま
た、この化成処理は、処理対象に対して、70℃の浴液
温度下で、2分間、5分間あるいは8分間浸漬すること
により行った。Next, after the above-mentioned pretreatment, a chemical conversion treatment was carried out using a chemical conversion bath having the components shown in Table 3. The chemical conversion treatment was performed by immersing the object to be treated at a bath temperature of 70 ° C. for 2 minutes, 5 minutes, or 8 minutes.
【0038】[0038]
【表3】 [Table 3]
【0039】さらに、水洗、脱イオン水洗の後、80
℃、10分間の水切り乾燥を行い、その後、カチオン電
着塗装法によりエポキシ系樹脂塗膜を20μm厚で形成
した。Further, after washing with water and deionized water, 80
After drying by draining at 10 ° C. for 10 minutes, an epoxy resin coating film was formed to a thickness of 20 μm by a cationic electrodeposition coating method.
【0040】このような処理工程による実施番号1〜5
の処理を2回繰り返し、その平均値として、マグネシウ
ム合金材表面の皮膜特性を表4及び表5に示した。Implementation numbers 1 to 5 by such processing steps
Was repeated twice, and the average value thereof is shown in Tables 4 and 5 for the film properties on the surface of the magnesium alloy material.
【0041】[0041]
【表4】 [Table 4]
【0042】[0042]
【表5】 [Table 5]
【0043】なお、元素付着量は、蛍光X線による定量
方法によった。また、電気抵抗率は、(株)ダイアイン
ストルメント製のロレスターMP(4端子4探針方式)
で測定した。また、塗膜耐蝕性は、常法に従い、表面に
クロスカットを設け、これを試料としてJISZ237
1に従った塩水噴霧試験(SST)を720時間行い、
塗膜の剥離幅を調べたものである。また、塗膜密着性
は、JISK5400に従い、試料表面に碁盤目模様を
描いて100個の部分に区分し、テープアップ後の格子
残存数を計数し、次の基準により判断した。つまり、そ
の残存数が100のとき○、それ以外のとき×とした。Incidentally, the amount of element attachment was determined by a quantitative method using fluorescent X-rays. In addition, the electrical resistivity is Lorester MP (4 terminal 4 probe type) manufactured by Dia Instruments Co., Ltd.
Was measured. Further, the coating film corrosion resistance is determined by providing a cross-cut on the surface according to a conventional method and using this as a sample according to JISZ237.
The salt spray test (SST) according to 1 was performed for 720 hours,
It is a result of examining a peel width of a coating film. The adhesion of the coating film was determined according to JIS K5400 by dividing the sample surface into 100 parts by drawing a grid pattern on the surface of the sample, counting the number of grids remaining after tape-up, and judging according to the following criteria. That is, when the remaining number was 100, it was evaluated as 、, and otherwise, it was evaluated as ×.
【0044】表4に示した結果によれば、実施番号1〜
4の処理工程による場合にはいずれも形成皮膜がカルシ
ウム、マンガン及びリンを所定量以上含有するものによ
ってなることが分かる。According to the results shown in Table 4, the execution numbers 1 to
It can be seen that in each of the treatment steps of No. 4, the formed film is formed of one containing calcium, manganese and phosphorus in a predetermined amount or more.
【0045】また、表5に示した皮膜性能についての結
果から、実施番号1〜5の処理工程によれば、いずれの
場合でも、電磁波シールド性に適う0.1Ω・cm以下
の低電気抵抗率性を保持すること、及び形成皮膜の塗膜
耐蝕性についても一定基準を保持していることが分か
る。また、実施番号3〜5の処理工程による場合、化成
処理時間の延長は、塗膜耐蝕性をより向上させることに
なるが、電気抵抗値を急激に高めることになることも分
かる。従って、これらの処理工程では、化成処理時間を
5分間以内とする必要がある。Also, from the results of the film performance shown in Table 5, according to the processing steps of Examples 1 to 5, in any case, a low electric resistivity of 0.1 Ω · cm or less suitable for electromagnetic wave shielding. It can be seen that the film retains a certain standard in terms of maintaining the properties and the corrosion resistance of the formed film. In addition, in the case of the treatment steps of Examples 3 to 5, it can be seen that the prolongation of the chemical conversion treatment time further improves the corrosion resistance of the coating film, but sharply increases the electric resistance value. Therefore, in these treatment steps, the chemical conversion treatment time needs to be within 5 minutes.
【0046】また、実施番号6〜11の処理工程による
場合の皮膜特性については、比較例として、表6に示し
た。Table 6 shows, as a comparative example, the film characteristics in the case of the processing steps of Examples 6 to 11.
【0047】[0047]
【表6】 [Table 6]
【0048】この表6に示した結果から、アルカリ溶液
による前処理のみによる場合(実施番号7)を含めて、
これらの処理工程による場合には、マグネシウム合金表
面の電気抵抗率は0.1Ω・cmをはるかに超える電気
絶縁物の値となってしまうことが分かる。また、特に、
実施番号6及び11の処理工程の場合のように、SST
(720時間)についての塗膜耐蝕性の低下も確認され
る。From the results shown in Table 6, including the case where only the pre-treatment with the alkaline solution was performed (Example No. 7),
It can be seen that when these treatment steps are performed, the electrical resistivity of the magnesium alloy surface becomes a value of an electrical insulator far exceeding 0.1 Ω · cm. Also, in particular,
As in the case of the processing steps of execution numbers 6 and 11, the SST
(720 hours), a decrease in the corrosion resistance of the coating film is also confirmed.
【0049】(実施例2)処理対象としてのモールドカ
スト法によるマグネシウム合金材(JISH5303M
DID(ASTM AZ91D)、日本マグネシウム協
会頒布品)に対して、前処理として、表7に示す実施番
号13〜25の処理浴液による表面調整1、水洗、表面
調整2、水洗、表面調整3及び水洗の各工程を浸漬法に
より表8に示す条件下で順にそれぞれ行った。Example 2 A magnesium alloy material (JIS H5303M) by a mold casting method as a processing object
For DID (ASTM AZ91D, a product distributed by the Magnesium Association of Japan), as pretreatment, surface conditioning 1, treatment with water, surface treatment 2, washing with water, surface treatment 3 with treatment numbers 13 to 25 shown in Table 7 Each step of the water washing was performed in order by the dipping method under the conditions shown in Table 8.
【0050】[0050]
【表7】 [Table 7]
【0051】[0051]
【表8】 [Table 8]
【0052】なお、水酸化ナトリウム浴液については、
アニオン界面活性剤を0.5重量%配合した。また、そ
の他の浴液についてはそれぞれ非イオン界面活性剤を
0.2重量%配合した。Incidentally, the sodium hydroxide bath solution is as follows:
0.5% by weight of an anionic surfactant was blended. In addition, each of the other bath solutions contained a nonionic surfactant in an amount of 0.2% by weight.
【0053】次いで、上記の前処理後に、表3に示す成
分配合の化成処理浴液により化成処理を施した。また、
この化成処理は、処理対象に対して、70℃の浴液温度
下で、2分間、5分間あるいは8分間浸漬することによ
り行った。その後、さらに、水洗、脱イオン水洗の後、
80℃、10分間の水切り乾燥を行い、その後に、アク
リル樹脂塗装により、20〜30μm厚の樹脂塗膜を形
成した。Next, after the above pretreatment, a chemical conversion treatment was carried out with a chemical conversion bath having the components shown in Table 3. Also,
This chemical conversion treatment was performed by immersing the object to be treated at 70 ° C. bath temperature for 2 minutes, 5 minutes or 8 minutes. Then, after further washing with water and deionized water,
Draining and drying were performed at 80 ° C. for 10 minutes, and thereafter, a resin coating film having a thickness of 20 to 30 μm was formed by acrylic resin coating.
【0054】このような処理工程による実施番号13〜
16の処理を2回繰り返し、その平均値をマグネシウム
合金材表面の皮膜特性として表9及び表10に示した。The execution numbers 13 to 13 obtained by such processing steps
The treatment of No. 16 was repeated twice, and the average value was shown in Tables 9 and 10 as the film properties of the surface of the magnesium alloy material.
【0055】[0055]
【表9】 [Table 9]
【0056】[0056]
【表10】 [Table 10]
【0057】なお、元素含有量の測定法、電気抵抗率の
測定法、塗膜耐蝕性の測定法及び塗膜密着性の測定法に
ついては、実施例1と同じである。The method for measuring the element content, the method for measuring the electric resistivity, the method for measuring the corrosion resistance of the coating film, and the method for measuring the adhesion of the coating film are the same as those in Example 1.
【0058】表9に示した結果によれば、実施番号13
〜16の処理工程による場合にはいずれも、形成皮膜が
カルシウム、マンガン及びリンを所定量維持用含有する
ものによってなることが分かる。According to the results shown in Table 9, the operation number 13
It can be seen that in any of the processing steps Nos. To 16, the formed film is formed of a material containing calcium, manganese and phosphorus for maintaining a predetermined amount.
【0059】また、表10に示した皮膜性能についての
結果から、実施番号13〜16の処理工程によれば、い
ずれの場合でも、電磁波シールド性に適う0.1Ω・c
m以下の低抵抗率性を保持すること、及び形成皮膜の塗
層耐蝕性にいても一定基準を保持していることが分か
る。また、実施番号15及び16の処理工程による場
合、実施例1の場合と同様に、化成処理時間がマグネシ
ウム合金材表面の電気抵抗と塗膜耐蝕性とに相関してい
ることが分かる。Further, from the results of the film performance shown in Table 10, according to the processing steps of Examples Nos. 13 to 16, in any case, 0.1 Ω · c suitable for the electromagnetic wave shielding property was obtained.
It can be seen that the low resistivity of not more than m is maintained and that the coating film corrosion resistance of the formed film maintains a certain standard. Further, in the case of the treatment steps of Examples 15 and 16, it is understood that the chemical conversion treatment time is correlated with the electric resistance of the surface of the magnesium alloy material and the corrosion resistance of the coating film, as in the case of Example 1.
【0060】また、実施番号17〜25の処理工程によ
る場合の皮膜特性については、比較例として、表11及
び表12に示した。Tables 11 and 12 show the film properties in the case of the processing steps of Examples Nos. 17 to 25 as comparative examples.
【0061】[0061]
【表11】 [Table 11]
【0062】[0062]
【表12】 [Table 12]
【0063】この表11及び表12に示した結果から、
アルカリ溶液による前処理のみの場合(実施番号17)
を含めて、これらの処理工程による場合には、マグネシ
ウム合金材表面の電気抵抗率が0.1Ω・cmをはるか
に超える電気絶縁物の値となってしまうことが分かる。
また、特に、実施番号17及び24の処理工程の場合の
ように、SST(720時間)についての塗膜耐蝕性の
低下も確認される。From the results shown in Tables 11 and 12,
In the case of only pretreatment with an alkaline solution (execution number 17)
It can be seen that when these treatment steps are used, the electrical resistivity of the surface of the magnesium alloy material becomes an electrical insulator value far exceeding 0.1 Ω · cm.
In addition, in particular, as in the case of the processing steps Nos. 17 and 24, a decrease in the corrosion resistance of the coating film for SST (720 hours) is also confirmed.
【0064】(試験例)実施例1の場合と同一のマグネ
シウム合金材を処理対象とし、前処理として、水酸化ナ
トリウム浴液による脱脂処理を濃度4重量%、液温55
℃、処理時間5分の条件で行い、水洗後、表13に示す
成分配合の化成処理浴液中に浸漬し、70℃、5分の条
件で処理した。その後は、水洗、脱イオン水洗、水切り
乾燥し、さらに、カチオン電着塗装法によりエポキシ系
樹脂塗膜を20μ厚で形成した。(Test Example) The same magnesium alloy material as that in Example 1 was treated, and as a pretreatment, a degreasing treatment with a sodium hydroxide bath solution was performed at a concentration of 4% by weight and a liquid temperature of 55%.
After washing with water, the sample was immersed in a chemical conversion bath having the components shown in Table 13 and treated at 70 ° C. for 5 minutes. Thereafter, the resultant was washed with water, deionized water, drained and dried, and further, an epoxy resin film was formed to a thickness of 20 μm by a cationic electrodeposition coating method.
【0065】[0065]
【表13】 [Table 13]
【0066】このような処理工程による試験番号1及び
2の処理によるマグネシウム合金材表面の皮膜特性を表
14に示した。Table 14 shows the film properties of the surface of the magnesium alloy material by the treatments of Test Nos. 1 and 2 in such treatment steps.
【0067】[0067]
【表14】 [Table 14]
【0068】表14に示した結果から、化成皮膜の組成
元素としてカルシウムとマンガンのいずれかが含まれな
い場合には、形成皮膜について、ブリスターが発生した
り、また塗膜密着性について、良好なものが得られない
ことが分かる。From the results shown in Table 14, when either calcium or manganese is not contained as a composition element of the chemical conversion film, blisters are generated in the formed film, and good adhesion is observed in the coating film. It turns out that things cannot be obtained.
【0069】[0069]
【発明の効果】上述したように本発明は構成されるか
ら、次のような効果が発揮される。先ず、本発明の処理
物によれば、マグネシウム含有金属材について裸耐蝕
性、防錆性、塗膜密着性及び塗膜耐蝕性に優れた形成皮
膜の処理物を低電気抵抗のものとして提供するものであ
るから、これが携帯電話器やパソコン等の筺体構成材で
ある場合、軽量で物理的強度が大きく、しかも電磁波シ
ールド性に優れたものとして利用できる。As described above, since the present invention is constituted, the following effects are exhibited. First, according to the treated product of the present invention, a treated product of a formed film excellent in bare corrosion resistance, rust prevention, coating film adhesion and coating film corrosion resistance of a magnesium-containing metal material is provided as a material having a low electric resistance. Therefore, when this is a housing component material for a cellular phone, a personal computer, or the like, it can be used as a material that is lightweight, has high physical strength, and has excellent electromagnetic wave shielding properties.
【0070】また、本発明に係る処理方法は、従来一般
の前処理のための処理浴液を用いるものであり、上記し
たマグネシウム金属含有材の処理物を極めて容易にかつ
経済的に得ることができる。Further, the treatment method according to the present invention uses a treatment bath solution for the conventional general pretreatment, and it is possible to obtain the above-mentioned treated product of the magnesium metal-containing material very easily and economically. it can.
Claims (3)
が、1乃至500mg/m2 のカルシウム、1乃至50
0mg/m2 のマンガン及び1乃至1000mg/m2
のリンを含み、かつ電気抵抗率が0.1Ω・cm以下で
あることを特徴とするマグネシウム含有金属の低電気抵
抗性皮膜処理物。1. A chemical conversion coating on a surface of a magnesium-containing metal, comprising 1 to 500 mg / m 2 of calcium, 1 to 50 mg / m 2.
0 mg / m 2 manganese and 1 to 1000 mg / m 2
A low-resistance treated film of a magnesium-containing metal, which contains phosphorus and has an electric resistivity of 0.1 Ω · cm or less.
/又は弱アルカリ溶液によるエッチング処理後に、高ア
ルカリ溶液による処理を行い、しかる後にカルシウムイ
オン、マンガンイオン及びリン酸イオンを含み、さらに
酸化処理剤を含有する化成処理剤溶液による化成処理を
行う工程を含むことを特徴とする低電気抵抗性皮膜を有
するマグネシウム含有金属表面の処理方法。2. A magnesium-containing metal material is subjected to an etching treatment with an acid and / or a weak alkali solution, followed by a treatment with a high alkali solution, followed by a calcium ion, a manganese ion and a phosphate ion, and further an oxidation treatment. A method for treating a magnesium-containing metal surface having a low electric resistance film, comprising a step of performing a chemical conversion treatment with a chemical conversion treatment solution containing a chemical agent.
弱アルカリ溶液によるエッチング処理後に、フッ化物溶
液による処理を行い、しかる後にカルシウムイオン、マ
ンガンイオン及びリン酸イオンを含み、さらに酸化処理
剤を含有する化成処理剤溶液による化成処理を行う工程
を含むことを特徴とする低電気抵抗性皮膜を有するマグ
ネシウム含有金属表面の処理方法。3. A magnesium-containing metal material is subjected to a treatment with a fluoride solution after an etching treatment with an acid or a weak alkaline solution, and thereafter contains calcium ions, manganese ions and phosphate ions, and further contains an oxidizing agent. A method for treating a magnesium-containing metal surface having a low electrical resistance film, comprising a step of performing a chemical conversion treatment with a contained chemical conversion treatment solution.
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|---|---|---|---|
| JP26556698A JP3307882B2 (en) | 1998-09-18 | 1998-09-18 | Low electrical resistance coating of magnesium-containing metal and surface treatment method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26556698A JP3307882B2 (en) | 1998-09-18 | 1998-09-18 | Low electrical resistance coating of magnesium-containing metal and surface treatment method |
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| Publication Number | Publication Date |
|---|---|
| JP2000096255A true JP2000096255A (en) | 2000-04-04 |
| JP3307882B2 JP3307882B2 (en) | 2002-07-24 |
Family
ID=17418905
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|---|---|---|---|
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| Country | Link |
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| JP (1) | JP3307882B2 (en) |
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| JP2007269854A (en) * | 2006-03-30 | 2007-10-18 | Honda Motor Co Ltd | Antifreeze / coolant composition for magnesium or magnesium alloy |
| KR100853996B1 (en) | 2007-01-05 | 2008-08-25 | (주) 유원컴텍 | Surface treatment method of metal body based on magnesium |
| EP1950325A2 (en) | 2007-01-19 | 2008-07-30 | Nihon Hyomen Kagaku Kabushiki Kaisha | Chromium-free solution for treating metal surfaces |
| US8980016B2 (en) | 2007-01-19 | 2015-03-17 | Nihon Hyomen Kagaku Kabushiki Kaisha | Chromium-free solution for treating metal surfaces |
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| JP2015094007A (en) * | 2013-11-13 | 2015-05-18 | 富士通株式会社 | Manufacturing method of casing, and film forming device |
| JP2015096636A (en) * | 2013-11-15 | 2015-05-21 | 富士通株式会社 | Component producing method and surface treatment method |
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| CN104233247B (en) * | 2014-07-21 | 2016-08-24 | 上海翔圣化工有限公司 | High anti-corrosion low resistance magnesium alloy passivating solution |
| JPWO2017056290A1 (en) * | 2015-10-01 | 2018-05-31 | 三菱重工業株式会社 | Coating structure, impeller, compressor, metal part manufacturing method, impeller manufacturing method, and compressor manufacturing method |
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