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JP2000073196A - Production method of electrolytic copper - Google Patents

Production method of electrolytic copper

Info

Publication number
JP2000073196A
JP2000073196A JP10242012A JP24201298A JP2000073196A JP 2000073196 A JP2000073196 A JP 2000073196A JP 10242012 A JP10242012 A JP 10242012A JP 24201298 A JP24201298 A JP 24201298A JP 2000073196 A JP2000073196 A JP 2000073196A
Authority
JP
Japan
Prior art keywords
electrolytic copper
anode
electrolytic
ppm
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10242012A
Other languages
Japanese (ja)
Inventor
Kimio Funaki
希実夫 舟木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Mining Holdings Inc
Original Assignee
Nippon Mining and Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining and Metals Co Ltd filed Critical Nippon Mining and Metals Co Ltd
Priority to JP10242012A priority Critical patent/JP2000073196A/en
Publication of JP2000073196A publication Critical patent/JP2000073196A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Electrolytic Production Of Metals (AREA)

Abstract

(57)【要約】 【課題】 電流密度を500〜1000A/m2 として
電解を行い、品位がAs<5ppm,Sb<4ppm,
Bi<2ppm,Pb<5ppm,S<15ppmの電
気銅を電解精製もしくは電解採取により製造する。 【解決手段】 気泡撹拌を採用する高電流密度電解法に
おいて、気泡を電極1,2の下端より10cm以上離れ
た下方位置より1.5mm以下のノズル孔部4より放出
させる。
(57) [Problem] To perform electrolysis at a current density of 500 to 1000 A / m 2 and obtain a grade of As <5 ppm, Sb <4 ppm,
Electrocopper with Bi <2 ppm, Pb <5 ppm, and S <15 ppm is produced by electrolytic refining or electrolytic sampling. SOLUTION: In a high current density electrolysis method employing bubble stirring, bubbles are discharged from a nozzle hole 4 of 1.5 mm or less from a lower position at least 10 cm away from lower ends of electrodes 1 and 2.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電解精製もしくは
電解採取による電気銅の製造方法に関するものである。
電解精製は転炉により溶製された粗銅を鋳造したアノー
ド粗銅を精製するために行われている。我が国における
電解精製による電気銅の製造の現況は「資源と素材」1
993.vol.109.No.12(非鉄製錬号)に
て紹介されているとおりである。一方電解採取は、電解
精製工程における銅濃度の調整、あるいは電解尾液で鉱
石を浸出する場合などにで行われている。例えば出願人
の電解精製の操業例は同誌第951頁に示されている。
また、多くの電解工場における電流密度は電解精製及び
電解採取とも200〜300A/m2 程度であり、また
電流効率は95〜99%程度である。
The present invention relates to a method for producing electrolytic copper by electrolytic refining or electrolytic extraction.
Electrolytic refining is performed to purify anode blister copper obtained by casting blister copper melted by a converter. The current status of electrolytic copper production by electrolytic refining in Japan is "resources and materials" 1.
993. vol. 109. No. 12 (non-ferrous smelting and refining). On the other hand, electrowinning is performed when adjusting the copper concentration in the electrorefining step, or when leaching ore with an electrolysis tail solution. For example, an operation example of the applicant's electrolytic refining is shown on page 951 of the same journal.
The current density in many electrolytic factories is about 200 to 300 A / m 2 for both electrolytic refining and electrolytic sampling, and the current efficiency is about 95 to 99%.

【0002】[0002]

【従来の技術】銅電解プロセスにおいて電流密度を高く
することの重要性は広く知られているが、電流密度を高
くすると陽極が不働態化する、陰極における電着状況が
不良になるなどの不都合の現象が表れる。この対策とし
て電解液をポンプで高速循環することが提案されている
(資源・素材97,「素材プロセッシング」(平成9年
9月23〜25日、札幌)第17〜20頁)。
2. Description of the Related Art The importance of increasing the current density in a copper electrolysis process is widely known. However, when the current density is increased, the anode becomes inactive and the electrodeposition at the cathode becomes poor. Phenomenon appears. As a countermeasure, it has been proposed to circulate the electrolyte at a high speed with a pump (resources / materials 97, "material processing" (Sept. 23-25, 1997, Sapporo), pp. 17-20).

【0003】米国特許第3875041号にて電解精製
及び電解採取の両方に関して提案された高電流密度で品
質が優れた電気銅を製造する方法は、陰極表面において
電解液を連続的に気泡で撹拌する方法に関する。この明
細書の説明によると、電解液を気体により撹拌する方法
は従来からあったが、電解液を十分に対流させることが
できず、したがって電流密度を高くすることができない
ために、(a)陽極・陰極間隔を狭くする;(b)絶縁
性の邪魔板を陽極の両側縁に上下方向に設ける;(c)
陽極・陰極間隙に板状気泡を放出することを提案してい
る。この結果電流密度は20〜30ASF(216〜3
24A/dm2 ),電流効率は62〜70%(表II,
実施例1〜4)が得られている。
[0003] A method for producing high quality electrolytic copper with high current density proposed in US Patent No. 3,875,041 for both electrolytic refining and electrowinning is to continuously agitate the electrolytic solution with bubbles on the cathode surface. About the method. According to the description in this specification, a method of stirring an electrolytic solution with a gas has been conventionally used. However, since the electrolytic solution cannot be sufficiently convected and the current density cannot be increased, (a) (B) Insulating baffles are provided on both sides of the anode in the vertical direction; (c)
It has been proposed to release plate-like bubbles into the anode-cathode gap. As a result, the current density was 20 to 30 ASF (216 to 3 ASF).
24 A / dm 2 ), and the current efficiency is 62 to 70% (Table II,
Examples 1 to 4) have been obtained.

【0004】[0004]

【発明が解決しようとする課題】前掲「非鉄製錬号」第
951頁、表2に示される電解槽の内容積は1槽当り約
9m3 であり、電解工場の槽数は509である。すると
全体の内容積は約4600m3 となる。この電解液全部
をポンプで循環させて電流密度を高める方法を電解工場
で採用すると、適当な流速で循環を行うためのポンプ能
力は極めて大きくなり、現実的でない。
The internal volume of the electrolytic cell shown in Table 2 in "Non-Ferrous Smelting No.", page 951, is about 9 m 3 per cell, and the number of cells in the electrolytic factory is 509. Then, the total internal volume becomes about 4600 m 3 . If a method of increasing the current density by circulating the entire electrolytic solution with a pump is adopted in an electrolytic plant, the pumping capacity for circulating at an appropriate flow rate becomes extremely large, which is not practical.

【0005】一方、米国特許第3875041号にて提
案された気泡による撹拌法は、ポンプにより液全体を高
速流動させない面で優れた方法であると言える。しかし
ながら、良好な電着表面が得られる電流効率が70%以
下であるので、十分に高い電流効率での操業が行われて
いるとは言い難い。
On the other hand, the agitation method using bubbles proposed in US Pat. No. 3,875,041 can be said to be an excellent method in that the whole liquid does not flow at high speed by a pump. However, since the current efficiency at which a good electrodeposition surface can be obtained is 70% or less, it cannot be said that the operation is performed with sufficiently high current efficiency.

【0006】また、我が国の電解工場の操業条件は電流
効率は95%以上と高いが、電流密度が300A/m2
程度に抑えられているために生産性が十分ではない。よ
って、本発明は、これらの現況に鑑みて、気泡撹拌法を
改良することによって、一層高い電流効率で品位が良好
な電気銅を製造する高生産性電解精製もしくは採取操業
法を提供することを目的とする。
The operating conditions of an electrolytic plant in Japan are such that the current efficiency is as high as 95% or more, but the current density is 300 A / m 2.
Productivity is not enough because it is suppressed to the extent. Accordingly, the present invention has been made in view of these circumstances, and provides a high-productivity electrolytic refining or extraction operation method for producing high-quality electrolytic copper with higher current efficiency by improving the bubble stirring method. Aim.

【0007】[0007]

【課題を解決するための手段】本発明者は気泡撹拌法の
実験を透明プラスチック槽を使用して行い、気泡の発生
状況を観察したところ、気泡が電解液に放出される位置
が電極に近いと、気泡の発生速度が大きくなりすぎ、電
解成績が優れないことを見出した。本発明は、陰極と対
向する位置に配置され、粗銅からなる陽極が浸漬された
電解液に気泡をこれら電極面に沿って浮上させるととも
に、気泡が電極の側方端縁から電極面外に放出されるの
を抑制しつつ電解を行う電気銅の製造方法において、前
記気泡を前記陽極の下端より10cm以上離れた下方位
置より直径もしくは最大寸法が1.5mm以下のノズル
孔部より放出させるこ電解精製もしくは電解採取を行う
ことを特徴とする電気銅の製造方法を提供するものであ
る。以下、本発明を詳しく説明する。
Means for Solving the Problems The present inventor conducted an experiment of the bubble stirring method using a transparent plastic tank and observed the generation state of the bubbles. As a result, the position where the bubbles were released into the electrolyte was close to the electrode. It was found that the generation rate of bubbles was too high, and the electrolysis results were not excellent. The present invention floats air bubbles along these electrode surfaces in an electrolytic solution in which an anode made of blister copper is disposed at a position facing the cathode, and discharges the air bubbles from the side edges of the electrodes to the outside of the electrode surface. In a method of producing electrolytic copper for performing electrolysis while suppressing the occurrence of the electrolysis, the air bubbles are discharged from a nozzle hole having a diameter or a maximum dimension of 1.5 mm or less from a position 10 cm or more away from a lower end of the anode. An object of the present invention is to provide a method for producing electrolytic copper, which is characterized by performing purification or electrolytic sampling. Hereinafter, the present invention will be described in detail.

【0008】本発明法においては、現在電解精製及び電
解採取で達成されている電気銅品位である、As<5p
pm,Sb<4ppm,Bi<2ppm,Pb<5pp
m,S<15ppmの電気銅を得ることを前提として、
電解操業の目標としては、現在の電解工場で達成され
ている電流効率である95%以上を達成する;現在の
電解工場で達成されている電流密度を大幅に上回る電流
密度を達成することを挙げる。これらの二目標を同時に
達成する方法は従来知られていなかったが、上記のよう
に気泡撹拌条件を変更することにより電解状況が劇的に
変化して達成可能となる。
In the method of the present invention, As <5p, which is the copper grade currently achieved by electrolytic refining and electrowinning.
pm, Sb <4 ppm, Bi <2 ppm, Pb <5 pp
Assuming that electrolytic copper of m, S <15 ppm is obtained,
The goal of the electrolysis operation is to achieve the current efficiency of 95% or more achieved in the current electrolysis plant; to achieve a current density much higher than that achieved in the current electrolysis plant. . A method of simultaneously achieving these two goals has not been known in the past. However, by changing the bubble stirring conditions as described above, the electrolysis situation dramatically changes and can be achieved.

【0009】以下、本発明を実施する上で好ましい条件
につき説明する。本発明においては電流密度は500〜
1000A/m2 が好ましい。電流密度が500A/m
2 未満では生産性が優れず、一方1000A/m2 を上
回ると電気銅の品位が低下しかつ電流効率も低下するの
で、上記の範囲が好ましい。さらに、気泡を放出する位
置は陽極の下端より10〜20cm離れた距離とするこ
とが好ましい。この距離が20cmを超えると、電極に
対し電解槽の深さ方向の距離が大きくなり、電解槽への
供給銅量が増すためである。気泡を発生させる気体の好
ましい流量は電極1m2 当り10〜20L(リットル、
以下同じ)/minである。また、陽極と陰極の距離は
10〜20mmとすることが好ましい。また、ノズル孔
部より放出させる気体の全量を電極対向面間に案内する
べく陽極下端と陰極下端より下方に気泡案内板を延在さ
せたことにより、気泡を電極面全体に均一に分布させる
ことが可能となる。
Hereinafter, preferable conditions for carrying out the present invention will be described. In the present invention, the current density is 500 to
1000 A / m 2 is preferred. Current density is 500A / m
If it is less than 2 , the productivity is not excellent. On the other hand, if it exceeds 1000 A / m 2 , the quality of electrolytic copper deteriorates and the current efficiency also decreases, so the above range is preferable. Further, it is preferable that the position from which the bubbles are released is a distance 10 to 20 cm away from the lower end of the anode. If the distance exceeds 20 cm, the distance in the depth direction of the electrolytic cell to the electrode increases, and the amount of copper supplied to the electrolytic cell increases. Preferred flow rates electrode 1 m 2 per 10~20L (liters of gas generating bubbles,
The same applies hereinafter) / min. Further, the distance between the anode and the cathode is preferably 10 to 20 mm. In addition, the bubble guide plate extends below the lower end of the anode and the lower end of the cathode so as to guide the entire amount of gas released from the nozzle hole between the electrode facing surfaces, so that air bubbles are uniformly distributed over the entire electrode surface. Becomes possible.

【0010】[0010]

【作用】本発明者は透明プラスチック電解槽内における
気泡の流動、上昇、広がりなどの挙動について観察した
ところ、気泡発生位置から10cm上方までは定常的な
気泡が得られず、それより上方において気泡は一定流速
を保ち上昇する;また気泡の上昇速度はノズル孔部直径
もしくは矩形吹出し口などの最大寸法ノズルに依存する
ことを確認した。その後実験を行ない、気泡発生位置を
電極から遠ざけ、かつ直径もしくは寸法を特定すること
により、理想的な気泡撹拌電解法に到達した。
The present inventor observed the behavior of the flow, rise, spread, etc. of bubbles in the transparent plastic electrolytic cell. As a result, steady bubbles could not be obtained up to 10 cm above the bubble generation position, and bubbles were found above that. It has been confirmed that the rising speed of the bubble depends on the maximum size nozzle such as the diameter of the nozzle hole or the rectangular outlet. Thereafter, an experiment was performed, and the ideal bubble-stirring electrolysis method was achieved by moving the bubble generation position away from the electrode and specifying the diameter or size.

【0011】[0011]

【発明の実施形態】図1には、本発明を実施する際に電
解槽に浸漬して使用する陽極と陰極の組立図を示す。陽
極は電解精製の場合は粗銅であり、電解採取の場合は鉛
などの電気伝導性不溶解性材料からなる。図中、1は陽
極、2は陰極、3は絶縁性底板、4は底板に等間隔に穿
設されたノズル、5は陽極の底部1aを支承する絶縁性
蓋(気泡の案内板)、6は陽極・陰極の側部間隙を閉鎖
する絶縁性邪魔板である。上記のような構造を使用する
と、ノズル4と陽極底部1a及び陰極底部2bとの間隔
は蓋5の高さ(L)によって決定され、ノズル4から放
出される気体は上記1、2、3、5及び6の各種板状部
材により画成される閉空間に充満する電解液中に放出さ
れ、この空間上部の開口部より大気中に逃れる。電解液
は電解精製の場合も電解採取の場合も、主要成分につい
てはCu2+濃度が30〜55g/L,SO4 2- 濃度が1
80〜220g/L程度のものが通常使用される。な
お、7はアノード面積を確定させるために接着された絶
縁テープである。8は陽極と陰極の間隔を設定するため
に、これら電極の縦方向端縁に延在する絶縁性スペーサ
ーである。以下、実施例及び比較例によりさらに詳しく
本発明を説明する。
FIG. 1 is an assembly drawing of an anode and a cathode which are immersed in an electrolytic cell when the present invention is carried out. The anode is made of blister copper in the case of electrolytic refining, and is made of an electrically conductive insoluble material such as lead in the case of electrolytic extraction. In the figure, 1 is an anode, 2 is a cathode, 3 is an insulating bottom plate, 4 is a nozzle formed in the bottom plate at equal intervals, 5 is an insulating lid (bubble guide plate) supporting the bottom 1a of the anode, 6 Is an insulating baffle for closing the side gap between the anode and the cathode. When the above-described structure is used, the distance between the nozzle 4 and the anode bottom 1a and the cathode bottom 2b is determined by the height (L) of the lid 5, and the gas released from the nozzle 4 is the above 1, 2, 3,. It is released into the electrolyte filling the closed space defined by the various plate-like members 5 and 6, and escapes to the atmosphere from the opening at the upper part of this space. Regarding the electrolytic solution, the concentration of Cu 2+ was 30 to 55 g / L and the concentration of SO 4 2 was 1 in both cases of electrolytic refining and electrolytic sampling.
What is about 80 to 220 g / L is usually used. Reference numeral 7 denotes an insulating tape adhered to determine the anode area. Reference numeral 8 denotes an insulating spacer extending to the longitudinal edges of these electrodes to set the distance between the anode and the cathode. Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples.

【0012】[0012]

【実施例】以下の実験例においては図1に示す陽極・陰
極組立体1個使用して実験室規模での試験を行なった。
陽極1は鉛板、陰極2はステンレス鋼を使用し、その面
積は50×300mmであった。電解は槽電圧が150
0〜2000mVの範囲内で30時間行なった。上記以
外の試験条件を図2(表1)に示す。表中、電極下端−
ノズル距離の+及び−はそれぞれノズルが電極下端より
下方及び上方に位置することを意味する。又、ポンプ撹
拌では実際の電解工場における循環液量と同等を実現し
た。さらにNo.9(比較例)は邪魔板6を取外し、空
気気泡の一部が電極対向面外から逃れるようにしたもの
である。試験の結果を図3(表2)に示す。
EXAMPLES In the following experimental examples, tests were conducted on a laboratory scale using one anode / cathode assembly shown in FIG.
The anode 1 was made of a lead plate and the cathode 2 was made of stainless steel, and its area was 50 × 300 mm. For electrolysis, the cell voltage is 150
The test was performed in the range of 0 to 2000 mV for 30 hours. Test conditions other than the above are shown in FIG. 2 (Table 1). In the table, electrode bottom
The nozzle distances + and-mean that the nozzle is located below and above the electrode lower end, respectively. In addition, the pump agitation achieved the same amount as the circulating liquid in an actual electrolytic factory. In addition, No. Reference numeral 9 (comparative example) shows a configuration in which the baffle plate 6 is removed so that some of the air bubbles escape from outside the electrode facing surface. The test results are shown in FIG. 3 (Table 2).

【0013】表2において陰極板への電着状況は次の基
準により判定した。 ○:良 △:普通 ×:不良
In Table 2, the state of electrodeposition on the cathode plate was determined according to the following criteria. ○: good △: normal ×: bad

【0014】表1〜2のNo.1〜4が本発明の実施例
である。これに対して、比較例No.5は気泡発生位置
が電極下端に近すぎたために、電流効率及び電気銅品位
共に不良である。比較例No.6は気泡発生位置が不適
切であったため電流効率及び品位が共に不良である。比
較例7及び8はノズル径が大きく、比較例9は邪魔板を
設けないために、電流効率及び電気銅品位が共に不良で
ある。
Nos. In Tables 1 and 2 Examples 1 to 4 are examples of the present invention. On the other hand, in Comparative Example No. In No. 5, since the bubble generation position was too close to the lower end of the electrode, both the current efficiency and the copper grade were poor. Comparative Example No. In No. 6, both the current efficiency and the quality were poor because the bubble generation position was inappropriate. Comparative Examples 7 and 8 have a large nozzle diameter, and Comparative Example 9 has no current barrier and a poor copper grade because no baffle plate is provided.

【0015】[0015]

【発明の効果】以上説明したように、本発明は従来の電
解工場における電気銅と同品位の製品を約1.5〜3倍
の生産性で製造することができる。また、本発明法を実
施するために空気吹き込みのための設備新設や電極の改
造を行わなければならないが、生産量の増大に設備投資
は十分に引き合うことが期待できる。
As described above, according to the present invention, it is possible to produce a product of the same grade as electrolytic copper in a conventional electrolytic plant with about 1.5 to 3 times the productivity. Further, in order to carry out the method of the present invention, it is necessary to newly install equipment for blowing air and to remodel electrodes, but it can be expected that capital investment will be sufficiently attracted to an increase in production volume.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明法で使用させる陽極と陰極を組み立て
た装置の斜視図である。
FIG. 1 is a perspective view of an apparatus in which an anode and a cathode used in the method of the present invention are assembled.

【図2】 本発明の実施例及び比較例の試験条件を示す
図表(表1)である。
FIG. 2 is a table (Table 1) showing test conditions of Examples and Comparative Examples of the present invention.

【図3】 本発明の実施例及び比較例の試験結果を示す
図表(表2)である。
FIG. 3 is a table (Table 2) showing test results of Examples and Comparative Examples of the present invention.

【符号の説明】[Explanation of symbols]

1−陽極 2−陰極 3−絶縁性底板 4−ノズル 5−絶縁性蓋(気泡の案内板) 6−絶縁性邪魔板 1-anode 2-cathode 3-insulating bottom plate 4-nozzle 5-insulating lid (bubble guide plate) 6-insulating baffle plate

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 陰極と対向する位置に配置され、粗銅か
らなる陽極もしくは不溶性陽極が浸漬された電解液に気
泡をこれらの電極面に沿って浮上させるとともに、気泡
が電極の側方端縁から電極面外に放出されるのを抑制し
つつ電解を行う電気銅の製造方法において、 前記気泡を前記電極の下端より10cm以上離れた下方
位置より直径もしくは最大寸法が1.5mm以下のノズ
ル孔部より放出させる電解精製もしくは電解採取を行う
ことを特徴とする電気銅の製造方法。
A bubble is floated along an electrode surface of a bleached copper anode or an insoluble anode immersed in an electrolytic solution disposed at a position facing the cathode, and the bubble is moved from the side edge of the electrode. In a method for producing electrolytic copper for performing electrolysis while suppressing discharge to the outside of an electrode surface, a nozzle hole having a diameter or a maximum dimension of 1.5 mm or less from a lower position at least 10 cm away from a lower end of the electrode. A method for producing electrolytic copper, comprising performing electrolytic refining or electrolytic sampling for more release.
【請求項2】 電流密度を500〜1000A/m2
して電解を行い、品位がAs<5ppm,Sb<4pp
m,Bi<2ppm,Pb<5ppm,S<15ppm
の電気銅を製造することを特徴とする請求項1記載の電
気銅の製造方法。
2. Electrolysis is performed at a current density of 500 to 1000 A / m 2 , and the quality is As <5 ppm and Sb <4 pp.
m, Bi <2 ppm, Pb <5 ppm, S <15 ppm
The method for producing electrolytic copper according to claim 1, wherein the electrolytic copper is produced.
【請求項3】 前記気泡を前記陽極の下端より10〜2
0cm離れた距離より放出させる請求項1又は2記載の
電気銅の製造方法。
3. The method according to claim 1, wherein the bubble is moved from the lower end of the anode by 10 to 2
3. The method for producing electrolytic copper according to claim 1, wherein the electrolytic copper is released from a distance of 0 cm.
【請求項4】 前記気泡を発生させる気体の流量を電極
面1m2 当り10〜20L(リットル)/minとする
請求項1から3までの何れか1項記載の電気銅の製造方
法。
4. The method for producing electrolytic copper according to claim 1, wherein the flow rate of the gas for generating the bubbles is 10 to 20 L (liter) / min per 1 m 2 of the electrode surface.
【請求項5】 前記陽極と陰極の距離を10〜20mm
とする請求項1から4までの何れか1項記載の電気銅の
製造方法。
5. The distance between the anode and the cathode is 10 to 20 mm.
The method for producing electrolytic copper according to any one of claims 1 to 4, wherein
【請求項6】 前記ノズル孔部より放出させる気体の全
量を電極対向面間に案内するべく陽極下端と陰極下端よ
り下方に気泡案内板を延在させたことを特徴とする請求
項1から5までの何れか1項記載の電気銅の製造方法。
6. A bubble guide plate extending below the lower end of the anode and the lower end of the cathode to guide the entire amount of gas released from the nozzle hole between the electrode facing surfaces. The method for producing electrolytic copper according to any one of the preceding claims.
【請求項7】 前記陽極の粗銅を電解精製により電気銅
とする請求項1から6までの何れか1項記載の電気銅の
製造方法。
7. The method for producing electrolytic copper according to claim 1, wherein the blister copper of the anode is electrolytic copper by electrolytic refining.
【請求項8】 前記陽極が不溶性であり、電解液を電解
採取することにより電気銅とする請求項1から6までの
何れか1項記載の電気銅の製造方法。
8. The method for producing electrolytic copper according to claim 1, wherein said anode is insoluble, and electrolytic solution is electrolytically collected to produce electrolytic copper.
JP10242012A 1998-08-27 1998-08-27 Production method of electrolytic copper Pending JP2000073196A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10242012A JP2000073196A (en) 1998-08-27 1998-08-27 Production method of electrolytic copper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10242012A JP2000073196A (en) 1998-08-27 1998-08-27 Production method of electrolytic copper

Publications (1)

Publication Number Publication Date
JP2000073196A true JP2000073196A (en) 2000-03-07

Family

ID=17082959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10242012A Pending JP2000073196A (en) 1998-08-27 1998-08-27 Production method of electrolytic copper

Country Status (1)

Country Link
JP (1) JP2000073196A (en)

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