JP2000063549A - Thin article having abrasion resistant thin membrane, and optical disk - Google Patents
Thin article having abrasion resistant thin membrane, and optical diskInfo
- Publication number
- JP2000063549A JP2000063549A JP10237516A JP23751698A JP2000063549A JP 2000063549 A JP2000063549 A JP 2000063549A JP 10237516 A JP10237516 A JP 10237516A JP 23751698 A JP23751698 A JP 23751698A JP 2000063549 A JP2000063549 A JP 2000063549A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- parts
- meth
- component
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005299 abrasion Methods 0.000 title claims abstract description 32
- 230000003287 optical effect Effects 0.000 title claims description 19
- 239000012528 membrane Substances 0.000 title 1
- -1 acryloyloxy group Chemical group 0.000 claims abstract description 62
- 239000007787 solid Substances 0.000 claims abstract description 32
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 28
- 239000003960 organic solvent Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 239000008119 colloidal silica Substances 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 19
- 239000000178 monomer Substances 0.000 claims abstract description 19
- 239000010419 fine particle Substances 0.000 claims abstract description 17
- 238000006482 condensation reaction Methods 0.000 claims abstract description 10
- 239000003999 initiator Substances 0.000 claims abstract description 8
- 239000010408 film Substances 0.000 claims description 42
- 239000000203 mixture Substances 0.000 claims description 16
- 239000010409 thin film Substances 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 230000000379 polymerizing effect Effects 0.000 claims 2
- 239000008199 coating composition Substances 0.000 abstract description 33
- 239000000126 substance Substances 0.000 abstract description 12
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 230000003301 hydrolyzing effect Effects 0.000 abstract description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 61
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 33
- 238000000034 method Methods 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 239000012454 non-polar solvent Substances 0.000 description 11
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- 229910000077 silane Inorganic materials 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 7
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 7
- 150000005846 sugar alcohols Polymers 0.000 description 7
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 6
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 6
- 229920000193 polymethacrylate Polymers 0.000 description 6
- 229920003002 synthetic resin Polymers 0.000 description 6
- 239000000057 synthetic resin Substances 0.000 description 6
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000002612 dispersion medium Substances 0.000 description 5
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 5
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 4
- 239000005456 alcohol based solvent Substances 0.000 description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 4
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 150000002430 hydrocarbons Chemical class 0.000 description 4
- 229960004592 isopropanol Drugs 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 4
- 239000011164 primary particle Substances 0.000 description 4
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- 239000005058 Isophorone diisocyanate Substances 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 229920005672 polyolefin resin Polymers 0.000 description 3
- 229920005990 polystyrene resin Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- GRJISGHXMUQUMC-UHFFFAOYSA-N silyl prop-2-enoate Chemical compound [SiH3]OC(=O)C=C GRJISGHXMUQUMC-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 210000002268 wool Anatomy 0.000 description 3
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- 229940008841 1,6-hexamethylene diisocyanate Drugs 0.000 description 2
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 2
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 2
- ROWKJAVDOGWPAT-UHFFFAOYSA-N Acetoin Chemical compound CC(O)C(C)=O ROWKJAVDOGWPAT-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000005453 ketone based solvent Substances 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229960002447 thiram Drugs 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 239000013638 trimer Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- SWFHGTMLYIBPPA-UHFFFAOYSA-N (4-methoxyphenyl)-phenylmethanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 SWFHGTMLYIBPPA-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- UNVGBIALRHLALK-UHFFFAOYSA-N 1,5-Hexanediol Chemical compound CC(O)CCCCO UNVGBIALRHLALK-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- FGSFVBRPCKXYDI-UHFFFAOYSA-N 2-triethoxysilylethyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCOC(=O)C(C)=C FGSFVBRPCKXYDI-UHFFFAOYSA-N 0.000 description 1
- PSLRXNFNXYNXEK-UHFFFAOYSA-N 2-triethoxysilylethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCOC(=O)C=C PSLRXNFNXYNXEK-UHFFFAOYSA-N 0.000 description 1
- RDCTZTAAYLXPDJ-UHFFFAOYSA-N 2-trimethoxysilylethyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCOC(=O)C(C)=C RDCTZTAAYLXPDJ-UHFFFAOYSA-N 0.000 description 1
- BUJVPKZRXOTBGA-UHFFFAOYSA-N 2-trimethoxysilylethyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCOC(=O)C=C BUJVPKZRXOTBGA-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- MCDBEBOBROAQSH-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C=C MCDBEBOBROAQSH-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- OVGGTPGNHOHWSN-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate;3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C.CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C OVGGTPGNHOHWSN-UHFFFAOYSA-N 0.000 description 1
- BVEYJWQCMOVMAR-UHFFFAOYSA-N 5-Hydroxy-4-octanone Chemical compound CCCC(O)C(=O)CCC BVEYJWQCMOVMAR-UHFFFAOYSA-N 0.000 description 1
- PGDIJTMOHORACQ-UHFFFAOYSA-N 9-prop-2-enoyloxynonyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCCCCOC(=O)C=C PGDIJTMOHORACQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 101000701286 Pseudomonas aeruginosa (strain ATCC 15692 / DSM 22644 / CIP 104116 / JCM 14847 / LMG 12228 / 1C / PRS 101 / PAO1) Alkanesulfonate monooxygenase Proteins 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 101000983349 Solanum commersonii Osmotin-like protein OSML13 Proteins 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 102100031083 Uteroglobin Human genes 0.000 description 1
- 108090000203 Uteroglobin Proteins 0.000 description 1
- RVWADWOERKNWRY-UHFFFAOYSA-N [2-(dimethylamino)phenyl]-phenylmethanone Chemical compound CN(C)C1=CC=CC=C1C(=O)C1=CC=CC=C1 RVWADWOERKNWRY-UHFFFAOYSA-N 0.000 description 1
- TUOBEAZXHLTYLF-UHFFFAOYSA-N [2-(hydroxymethyl)-2-(prop-2-enoyloxymethyl)butyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(CC)COC(=O)C=C TUOBEAZXHLTYLF-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- XTKDAFGWCDAMPY-UHFFFAOYSA-N azaperone Chemical compound C1=CC(F)=CC=C1C(=O)CCCN1CCN(C=2N=CC=CC=2)CC1 XTKDAFGWCDAMPY-UHFFFAOYSA-N 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CNFBMGRFDFYJFY-UHFFFAOYSA-N butane-1,4-diol;ethyl carbamate Chemical compound CCOC(N)=O.OCCCCO CNFBMGRFDFYJFY-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- PODOEQVNFJSWIK-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethoxyphenyl)methanone Chemical compound COC1=CC(OC)=CC(OC)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 PODOEQVNFJSWIK-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- QKLCQKPAECHXCQ-UHFFFAOYSA-N ethyl phenylglyoxylate Chemical compound CCOC(=O)C(=O)C1=CC=CC=C1 QKLCQKPAECHXCQ-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- GFAZHVHNLUBROE-UHFFFAOYSA-N hydroxymethyl propionaldehyde Natural products CCC(=O)CO GFAZHVHNLUBROE-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003791 organic solvent mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
(57)【要約】
【課題】 硬化膜厚が3μm未満の極薄で、かつ特に耐
摩耗性に優れた、透明性、表面平滑性、耐熱性、耐薬品
性、耐久性、および基材との密着性が良好な薄型物品を
得る。
【解決手段】 (A)(a−1)コロイダルシリカ微粒
子(固形分)と、(a−2)特定化合物を加水分解し、
縮合反応して得られる光硬化性シリコーンの固形分と、
(B)1分子中に少なくとも1個の(メタ)アクリロイ
ルオキシ基を有する単量体の少なくとも1種の合計量1
00重量部に対して、(C)光重合開始剤、及び(D)
有機溶剤の少なくとも1種からなる光感応性被覆材組成
物を基材上に塗布した後、含有する有機溶剤(D)を揮
発させ、光エネルギー照射により重合硬化させた、膜厚
3μm未満の硬化被膜を形成する。PROBLEM TO BE SOLVED: To provide an ultrathin cured film having a thickness of less than 3 μm and particularly excellent abrasion resistance, transparency, surface smoothness, heat resistance, chemical resistance, durability, and base material. To obtain a thin article having good adhesion. SOLUTION: (A) hydrolyzing (a-1) colloidal silica fine particles (solid content) and (a-2) a specific compound,
Solid content of the photocurable silicone obtained by the condensation reaction,
(B) the total amount of at least one monomer having at least one (meth) acryloyloxy group in one molecule,
(C) a photopolymerization initiator and (D)
After coating a photosensitive coating composition comprising at least one organic solvent on a substrate, the organic solvent (D) contained therein is volatilized, and polymerized and cured by irradiation with light energy. Form a coating.
Description
【0001】[0001]
【発明の属する技術分野】本発明は、基材表面の耐摩耗
性を向上させた物品に関し、より詳しくは、光エネルギ
ーの照射により、基材表面に、硬化膜厚が3μm未満と
いう極薄で、かつ特に耐摩耗性に優れた、透明性、表面
平滑性、耐熱性、耐薬品性、耐久性、および基材との密
着性が良好な架橋硬化被膜を形成させた薄型物品に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an article having improved abrasion resistance on the surface of a substrate, and more particularly, to an ultrathin article having a cured film thickness of less than 3 μm on the surface of the substrate by irradiation of light energy. The present invention relates to a thin article formed with a crosslinked cured film having excellent transparency, surface smoothness, heat resistance, chemical resistance, durability, and adhesion to a substrate, which is particularly excellent in abrasion resistance.
【0002】[0002]
【従来の技術】ポリメチルメタクリレート樹脂、ポリメ
タクリルイミド樹脂、ポリカーボネート樹脂、ポリスチ
レン樹脂、ポリオレフィン樹脂などから製造された合成
樹脂成形品は、ガラス製品に比べて軽量で耐衝撃性に優
れるばかりでなく、透明性も良好で成形加工が容易であ
るなどの種々の利点を生かして、近年、光学ディスクや
家電部品、自動車用プラスチック材料、各種フィルム材
料等、種々の分野で利用されている。2. Description of the Related Art A synthetic resin molded article manufactured from a polymethyl methacrylate resin, a polymethacrylimide resin, a polycarbonate resin, a polystyrene resin, a polyolefin resin, etc. is not only lighter and more excellent in impact resistance than glass products, In recent years, it has been used in various fields such as optical discs, home electric parts, plastic materials for automobiles, and various film materials, taking advantage of various advantages such as good transparency and easy molding.
【0003】しかし反面、これらの合成樹脂成形品は、
その表面の耐摩耗性が不足しているため、他の硬い物体
との接触、摩擦、ひっかきなどによって表面に損傷を受
けやすく、表面に発生した損傷はその商品価値を著しく
低下させたりする。そのため、該成形品表面の耐摩耗性
を改良することが強く要求されている。However, on the other hand, these synthetic resin molded products are
Due to the lack of abrasion resistance of the surface, the surface is easily damaged by contact, friction, scratching, etc. with other hard objects, and the damage generated on the surface significantly lowers its commercial value. Therefore, it is strongly required to improve the wear resistance of the surface of the molded article.
【0004】上記した合成樹脂成形品の欠点を改良する
方法については、従来より種々検討されてきており、例
えば、アルキルトリアルコキシシランを主成分としたシ
ラン混合物の部分加水分解縮合物とコロイダルシリカと
からなる塗料を成形品表面に塗布し、次いでこれを加熱
処理し、架橋硬化被膜を形成させて耐摩耗性を改良する
方法(米国特許第4,006,271号)が開示されて
いる。この方法では、高度な耐摩耗性は得られるが、成
形品表面との密着性が不十分な場合が多く、この密着性
を改良するためにアクリル系またはシリコン系等からな
るポリマーをプライマーとして用いる必要があり、該被
膜の形成工程が複雑となる問題点がある。また、硬化時
間が長いため、経済的にも不利であり、生産性も劣る。Various methods for improving the above-mentioned drawbacks of synthetic resin molded articles have been studied in the past. For example, a partially hydrolyzed condensate of a silane mixture containing an alkyltrialkoxysilane as a main component and colloidal silica are used. (US Pat. No. 4,006,271) discloses a method of applying a coating consisting of the following to a surface of a molded article and then subjecting the coating to heat treatment to form a crosslinked cured film to improve abrasion resistance. In this method, a high degree of abrasion resistance is obtained, but the adhesion to the surface of the molded product is often insufficient, and a polymer made of an acrylic or silicon-based material is used as a primer to improve the adhesion. Therefore, there is a problem that the process of forming the coating is complicated. Further, since the curing time is long, it is economically disadvantageous and productivity is poor.
【0005】この欠点を改善する方法として、特表昭5
7−500984号、米国特許第4,438,462号
には、コロイダルシリカとメタクリロイルオキシ基また
はグリシジル基の官能基を有するアルコキシシラン、非
シリルアクリレートからなる紫外線硬化性塗料を成形品
表面に塗布し、次いでこれに紫外線を照射し、耐摩耗性
合成樹脂成形品を得る方法が、そして特開昭58−17
56号には、ロイダルシリカとシリルアクリレートの加
水分解物、多官能アクリレートおよび光重合開始剤とか
らなる実質的に有機溶剤を含有しない被覆材組成物およ
びその製法が、さらに特開平4−214743号には、
アクリレート修飾したコロイダルシリカ、多官能アクリ
レート及び限定構造の多官能ウレタンアクリレートから
なる実質的に有機溶剤を含有しない被覆材組成物がそれ
ぞれ開示されている。これらの方法は、シリコン系被膜
を紫外線照射により硬化させる方法であり、従来から課
題であった該被膜の硬化時間を大幅に短縮できる利点が
あり、また合成樹脂成形品の耐摩耗性改良についても有
利なものである。As a method for improving this disadvantage, Japanese Patent Application Laid-Open
No. 7,500,984 and U.S. Pat. No. 4,438,462 disclose an ultraviolet-curable coating composed of colloidal silica, an alkoxysilane having a methacryloyloxy group or a glycidyl group functional group, and a non-silyl acrylate on the surface of a molded article. And then irradiating it with ultraviolet light to obtain a wear-resistant synthetic resin molded article.
No. 56 discloses a coating composition substantially free of an organic solvent comprising a hydrolyzate of a silyl acrylate and a silyl acrylate, a polyfunctional acrylate and a photopolymerization initiator, and a production method thereof. Is
A coating composition substantially free of an organic solvent, comprising acrylate-modified colloidal silica, polyfunctional acrylate, and polyfunctional urethane acrylate having a limited structure, is disclosed. These methods are methods of curing a silicon-based coating by ultraviolet irradiation, and have the advantage that the curing time of the coating, which has been a problem in the past, can be significantly shortened. It is advantageous.
【0006】[0006]
【発明が解決しようとする課題】近年、光学ディスク等
の分野では、その高密度化の要求がなされていることか
ら、比較的薄肉の基材が使用されるようになり、基材に
そりが発生せず、かつ表面平滑性を維持させることが重
要な課題となっている。ところが、上記した従来方法で
は、硬化膜厚が3〜100μmの膜厚の厚い被覆膜は形
成できるものの、薄肉基材からなる光学ディスクやフィ
ルム、シート等の薄肉の基材に適用した場合には、膜厚
が厚いために硬化収縮に伴う応力により該被覆膜付与側
へ基材がそるという不具合が生じてしまう。このそりが
微少であったとしても、それは、特に高密度化した光学
ディスクに適用する場合、そのまま光学ディスクの性能
低下に結びつくので、重要な課題である。In recent years, in the field of optical discs and the like, demands for higher density have been made, so that relatively thin base materials have been used, and warpage has occurred in the base materials. It is an important subject to prevent the occurrence of the problem and to maintain the surface smoothness. However, in the above-mentioned conventional method, although a thick coating film having a cured film thickness of 3 to 100 μm can be formed, when applied to a thin-walled substrate such as an optical disc, film, or sheet made of a thin-walled substrate. However, since the film thickness is large, there is a problem that the substrate is warped toward the coating film application side due to the stress accompanying the curing shrinkage. Even if the warpage is very small, it is an important problem, especially when applied to an optical disk with a high density, since it directly leads to a decrease in the performance of the optical disk.
【0007】このそりの原因となる被覆組成物の硬化収
縮は、ラジカル重合性組成物の場合、一般に6%〜十数
%になる。この硬化収縮を0%とすることは不可能なた
め、そりを最小限にとどめるためには、硬化膜厚をでき
る限り薄くする必要がある。ところが、通常、光等の活
性エネルギー線で重合が開始されるラジカル重合は、特
殊な不活性ガス雰囲気下、または真空下でなければ空気
中の酸素による重合阻害のために、上記のような従来方
法による耐摩耗性被膜では、3μm未満の薄膜状態で硬
化させるのは困難である。まして該薄膜の状態で耐摩耗
性と耐久性等の各種性能をバランスよく付与することは
できないのが現状である。[0007] Curing shrinkage of the coating composition, which causes this warpage, is generally 6% to more than 10% in the case of a radical polymerizable composition. Since it is impossible to reduce the curing shrinkage to 0%, it is necessary to reduce the cured film thickness as much as possible in order to minimize the warpage. However, radical polymerization, in which polymerization is normally initiated by active energy rays such as light, is not performed under a special inert gas atmosphere or under a vacuum unless the oxygen in the air inhibits polymerization. It is difficult to cure a thin film of less than 3 μm with a wear-resistant coating by the method. Further, at present, it is impossible to impart various performances such as abrasion resistance and durability in a state of the thin film in a well-balanced state.
【0008】本発明の目的は、優れた耐摩耗性を有し、
かつ透明性、表面平滑性、耐熱性、耐薬品性、耐久性及
び基材との密着性等の各種性能をバランスよく有する膜
厚の薄い架橋硬化被膜で基材表面が被覆された、そりの
ない薄型物品を提供することにある。An object of the present invention is to have excellent abrasion resistance,
In addition, the base material surface is coated with a thin cross-linked cured film having a good balance of various properties such as transparency, surface smoothness, heat resistance, chemical resistance, durability and adhesion to the base material. There is no thin article to provide.
【0009】[0009]
【課題を解決するための手段】そこで、本発明者らは上
記課題について鋭意検討した結果、コロイダルシリカ微
粒子と特定のラジカル重合性シラン化合物を加水分解
し、縮合反応して得られる光硬化性シリコーンと1分子
中に少なくとも1個の(メタ)アクリロイルオキシ基を
有する単量体を併用することにより、3μm未満の薄膜
状態でも硬化できる光感応性被覆材組成物を用いること
により、非常に優れた性能を有する薄型物品が得られる
ことを見い出し、本発明を完成するに至った。The inventors of the present invention have conducted intensive studies on the above problems, and as a result, have found that a photocurable silicone obtained by hydrolyzing colloidal silica fine particles and a specific radically polymerizable silane compound and subjecting it to a condensation reaction. By using together with a monomer having at least one (meth) acryloyloxy group in one molecule, a light-sensitive coating material composition that can be cured even in a thin film less than 3 μm is very excellent. The inventors have found that a thin article having performance can be obtained, and have completed the present invention.
【0010】すなわち、本発明は、(A)(a−1)コ
ロイダルシリカ微粒子(固形分)40〜90重量部と、
(a−2)下記の一般式(I)That is, the present invention provides (A) (a-1) 40 to 90 parts by weight of colloidal silica fine particles (solid content);
(A-2) The following general formula (I)
【化3】
(式中、Xはメタクリロイルオキシ基、アクリロイルオ
キシ基、又はビニルオキシ基をR1は炭素数0〜8の直
鎖型又は分岐型アルキル基を、R2、R3は炭素数1〜8
の直鎖型又は分岐型アルキル基を、aは1〜3の正の整
数を、bは0〜2の正の整数を示し、a+bは1〜3の
正数である。)で示される単量体(固形分)10〜60
重量部(ただし、(a−1)成分と(a−2)成分との
合計量を100重量部とする)を加水分解し、縮合反応
して得られる光硬化性シリコーンの固形分10〜70重
量%と、(B)1分子中に少なくとも1個の(メタ)ア
クリロイルオキシ基を有する単量体の少なくとも1種3
0〜90重量%の合計量100重量部に対して、(C)
光重合開始剤0.01〜10重量部、(D)有機溶剤の
少なくとも1種30〜2000重量部からなる光感応性
被覆材組成物を基材上に塗布した後、含有する有機溶剤
(D)を揮発させ、光エネルギー照射により重合硬化さ
せた、膜厚3μm未満の硬化被膜を有する薄型物品、
(A)(a−1)コロイダルシリカ微粒子(固形分)4
0〜90重量部と、(a−3)下記の一般式(II)Embedded image (Wherein X is a methacryloyloxy group, acryloyloxy group, or vinyloxy group, R 1 is a linear or branched alkyl group having 0 to 8 carbon atoms, and R 2 and R 3 are 1 to 8 carbon atoms.
A is a positive integer of 1 to 3, b is a positive integer of 0 to 2, and a + b is a positive number of 1 to 3. A) (solid content) of 10 to 60
Parts by weight (provided that the total amount of the components (a-1) and (a-2) is 100 parts by weight) and the solid content of the photocurable silicone obtained by the condensation reaction is 10 to 70 parts. % By weight, and (B) at least one kind of a monomer having at least one (meth) acryloyloxy group in one molecule.
(C) with respect to 100 parts by weight of the total amount of 0 to 90% by weight.
After applying a photosensitive coating composition comprising 0.01 to 10 parts by weight of a photopolymerization initiator and 30 to 2000 parts by weight of at least one kind of an organic solvent (D) on a substrate, the organic solvent (D A) a thin article having a cured film with a thickness of less than 3 μm, which is volatilized and polymerized and cured by irradiation with light energy;
(A) (a-1) Colloidal silica fine particles (solid content) 4
0 to 90 parts by weight, and (a-3) the following general formula (II)
【化4】
(式中、Xはメタクリロイルオキシ基、アクリロイルオ
キシ基、又はビニルオキシ基をR1は炭素数0〜8の直
鎖型又は分岐型アルキル基を、 R2は炭素数1〜8の直
鎖型又は分岐型アルキル基を、aは1〜3の正の整数
を、bは0〜2の正の整数を示し、a+bは1〜3の正
数である。)で示される単量体の加水分解物(固形分)
10〜60重量部(ただし、(a−1)成分と(a−
3)成分との合計量を100重量部とする)を加水分解
し、縮合反応して得られる光硬化性シリコーンの固形分
10〜70重量%と、(B)1分子中に少なくとも1個
の(メタ)アクリロイルオキシ基を有する単量体の少な
くとも1種30〜90重量%の合計量100重量部に対
して、(C)光重合開始剤0.01〜10重量部、
(D)有機溶剤の少なくとも1種30〜2000重量部
からなる光感応性被覆材組成物を基材上に塗布した後、
含有する有機溶剤(D)を揮発させ、光エネルギー照射
により重合硬化させた、膜厚3μm未満の硬化被膜を有
する薄型物品、光学ディスク、及び厚さ1.5mm未満
の耐摩耗性薄膜を有する薄型物品である。Embedded image (Wherein, X is a methacryloyloxy group, acryloyloxy group, or vinyloxy group; R 1 is a linear or branched alkyl group having 0 to 8 carbon atoms; R 2 is a linear or branched alkyl group having 1 to 8 carbon atoms; A is a positive integer of 1 to 3; b is a positive integer of 0 to 2; a + b is a positive number of 1 to 3; Object (solid content)
10 to 60 parts by weight (provided that the component (a-1) and the component (a-
3) The total amount of the components is 100 parts by weight), a solid content of 10 to 70% by weight of the photocurable silicone obtained by hydrolysis and condensation reaction, and at least one component (B) per molecule. (C) 0.01 to 10 parts by weight of a photopolymerization initiator, based on 100 parts by weight of a total amount of 30 to 90% by weight of at least one kind of a monomer having a (meth) acryloyloxy group;
(D) After applying a photosensitive coating composition comprising at least one kind of organic solvent of 30 to 2,000 parts by weight on a substrate,
A thin article having a cured film having a film thickness of less than 3 μm, an optical disc, and a thin article having a wear-resistant thin film having a thickness of less than 1.5 mm, wherein the organic solvent (D) contained is volatilized and polymerized and cured by irradiation with light energy. Goods.
【0011】なお、本発明において「(メタ)アクリレ
ート」とは「アクリレートおよび/またはメタクリレー
ト」を、「(メタ)アクリロイルオキシ基」とは「アク
リロイルオキシ基および/またはメタアクリロイルオキ
シ基」をそれぞれ意味する。In the present invention, "(meth) acrylate" means "acrylate and / or methacrylate", and "(meth) acryloyloxy group" means "acryloyloxy group and / or methacryloyloxy group", respectively. I do.
【0012】[0012]
【発明の実施の形態】以下、本発明の好適な実施形態に
ついて説明する。まず、本発明の耐摩耗性薄膜を有する
薄型物品について、まず、その耐摩耗性薄膜を形成する
光感応性被覆材組成物(以下、被覆組成物と略記す
る。)について説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below. First, with respect to the thin article having the abrasion-resistant thin film of the present invention, first, a photosensitive coating material composition (hereinafter, abbreviated as a coating composition) for forming the abrasion-resistant thin film will be described.
【0013】本発明の薄型物品及び光学ディスクは、そ
れらの表面に付与する耐摩耗性被膜を、光硬化性シリコ
ーン(A)を含む被覆組成物で形成することを特徴とす
る。[0013] The thin article and the optical disk of the present invention are characterized in that the abrasion-resistant coating applied to their surfaces is formed of a coating composition containing a photocurable silicone (A).
【0014】この(A)成分の製法は、(a−1)成分
のコロイダルシリカ微粒子と一般式(I)で示される単
量体の加水分解物の存在下で、コロイダルシリカ微粒子
中の分散媒を常圧または減圧下でトルエン等の非極性溶
媒とともに共沸留出させ、該分散媒を非極性溶媒に置換
した後、加熱下で反応させる工程で行う。The process for producing the component (A) is carried out in the presence of the colloidal silica fine particles of the component (a-1) and the hydrolyzate of the monomer represented by the general formula (I). Is azeotropically distilled together with a non-polar solvent such as toluene under normal pressure or reduced pressure, and after replacing the dispersion medium with a non-polar solvent, the reaction is carried out under heating.
【0015】以下、(A)成分の製法について、詳細に
説明する。ここでいう(a−1)成分のコロイダルシリ
カ微粒子と一般式(I)で示される単量体の加水分解物
の存在下とは、(a−1)成分と(a−2)成分を混
合した後、加水分解触媒を加え、常温または加熱下で撹
拌する等の常法によって、一般式(I)で示される単量
体の加水分解を行った該加水分解物存在下と、予め加
水分解反応をして得た(a−2)成分の加水分解物(a
−3)と(a−1)成分を混合した該加水分解物存在下
の2通りを意味する。Hereinafter, the method for producing the component (A) will be described in detail. Here, the term “colloidal silica fine particles of the component (a-1) and the presence of the hydrolyzate of the monomer represented by the general formula (I)” means that the components (a-1) and (a-2) are mixed. After that, a hydrolysis catalyst is added, and the monomer represented by the general formula (I) is hydrolyzed by a conventional method such as stirring at room temperature or under heating. The hydrolyzate of component (a-2) obtained by the reaction (a
-3) and (a-1) in the presence of the hydrolyzate obtained by mixing the components.
【0016】この前記及びの方法ともに、加水分解
物の製法は、一般式(I)で示される単量体1モルに対
して、アルコール溶媒等有機溶媒の存在下または非存在
下において、前記の方法の場合には(a−1)成分も
存在下、0.5〜6モルの水、あるいは0.001〜
0.1規定の塩酸または酢酸水溶液等の加水分解触媒を
加え、加熱下で撹拌しつつ、加水分解で生じるアルコー
ルを系外に除去すればよい。In both of the above methods, the method for producing the hydrolyzate is based on 1 mole of the monomer represented by the general formula (I) in the presence or absence of an organic solvent such as an alcohol solvent. In the case of the method, in the presence of the component (a-1), 0.5 to 6 mol of water or 0.001 to
A hydrolysis catalyst such as a 0.1 N hydrochloric acid or acetic acid aqueous solution may be added, and the alcohol produced by the hydrolysis may be removed from the system while stirring under heating.
【0017】次いで行われる縮合反応は、以下の如く行
えばよい。具体的には、前記の方法では得られたこの
加水分解物を存在下、前記の方法ではここで(a−
1)成分を加えて、まず、コロイダルシリカ微粒子(a
−1)中の分散媒と縮合反応で生じる水を常圧または減
圧下で60〜100℃、好ましくは70〜90℃の温度
で共沸留出させ、固形分濃度を50〜90重量%とす
る。次に系内にトルエン等の非極性溶媒を加え、この非
極性溶媒、水、及びコロイダルシリカ微粒子の分散媒を
さらに共沸留出させながら60〜150℃、好ましくは
80〜130℃の温度で固形分濃度を30〜90重量
%、好ましくは50〜80重量%に保持しながら、0.
5〜10時間撹拌し縮合反応を行う。この際、反応を促
進させる目的で、水、酸、塩基、塩等の触媒を用いても
よい。これにより、光硬化性シリコーン(A)は得られ
る。The subsequent condensation reaction may be performed as follows. Specifically, in the presence of the hydrolyzate obtained by the above-described method, (a-
1) By adding the component, first, colloidal silica fine particles (a
-1) The azeotropic distillation of the water generated in the condensation reaction with the dispersion medium in 1) at a temperature of 60 to 100 ° C, preferably 70 to 90 ° C under normal pressure or reduced pressure, to obtain a solid content of 50 to 90% by weight. I do. Next, a non-polar solvent such as toluene is added into the system, and the non-polar solvent, water, and the dispersion medium of the colloidal silica fine particles are further azeotropically distilled at a temperature of 60 to 150 ° C., preferably 80 to 130 ° C. While maintaining the solid content concentration at 30 to 90% by weight, preferably 50 to 80% by weight, the solid content is adjusted to 0.1% by weight.
The mixture is stirred for 5 to 10 hours to perform a condensation reaction. At this time, a catalyst such as water, an acid, a base or a salt may be used for the purpose of accelerating the reaction. Thereby, the photocurable silicone (A) is obtained.
【0018】このように、親水性表面を有するコロイダ
ルシリカ微粒子の表面を(メタ)アクリロイル官能シリ
コーンで被覆して疎水化した光硬化性シリコ−ン(A)
を用いることにより、本発明に用いる被覆組成物中で併
用する多官能アクリレートとの相溶性が向上し、得られ
る架橋硬化被膜の透明性が良好となる。As described above, the surface of the colloidal silica fine particles having a hydrophilic surface is coated with a (meth) acryloyl-functional silicone to make the photocurable silicone (A) hydrophobic.
By using, the compatibility with the polyfunctional acrylate used in combination in the coating composition used in the present invention is improved, and the transparency of the obtained crosslinked cured film is improved.
【0019】ここで、本発明に用いる被覆組成物の
(A)成分を得るために用いる(a−1)〜(a−3)
成分について説明する。Here, (a-1) to (a-3) used for obtaining the component (A) of the coating composition used in the present invention.
The components will be described.
【0020】(a−1)成分について
(a−1)成分であるコロイダルシリカ微粒子は、一次
粒子径が1〜200nmの範囲の無水ケイ酸の超微粒子
を、水または有機溶媒に分散させた状態のものである。Regarding the component (a-1) The colloidal silica fine particles which are the component (a-1) are obtained by dispersing ultrafine silica particles having a primary particle diameter in the range of 1 to 200 nm in water or an organic solvent. belongs to.
【0021】この無水ケイ酸の超微粒子の分散に使用さ
れる分散媒としては、例えば水;メタノール、エタノー
ル、イソプロパノール、n−プロパノール、イソブタノ
ール、n−ブタノールなどのアルコール系溶剤;エチレ
ングリコールなどの多価アルコール系溶剤;エチルセロ
ソルブ、ブチルセロソルブなどの多価アルコール誘導
体;メチルエチルケトン、メチルイソブチルケトン、ジ
アセトンアルコールなどのケトン系溶剤;2−ヒドロキ
シエチルアクリレート、2−ヒドロキシプロピルアクリ
レート、テトラヒドロフルフリルアクリレートなどのモ
ノマー類が挙げられる。Examples of the dispersion medium used for dispersing the ultrafine particles of silicic anhydride include water; alcohol solvents such as methanol, ethanol, isopropanol, n-propanol, isobutanol and n-butanol; and ethylene glycol and the like. Polyhydric alcohol solvents; polyhydric alcohol derivatives such as ethyl cellosolve and butyl cellosolve; ketone solvents such as methyl ethyl ketone, methyl isobutyl ketone and diacetone alcohol; 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, tetrahydrofurfuryl acrylate and the like Monomers.
【0022】この中でも、炭素数3以下のアルコール系
溶剤が、(a−2)成分もしくは(a−3)成分との反
応工程上、特に好ましい。Among them, alcohol solvents having 3 or less carbon atoms are particularly preferable in the reaction step with the component (a-2) or the component (a-3).
【0023】このコロイダルシリカ微粒子(a−1)
は、公知の方法で製造することもできるが、市販もされ
ている。本発明において(a−1)成分の一次粒子径は
1〜200nmの範囲内であることが好ましく、5〜8
0nmの範囲が特に好ましい。この一次粒子径が1nm
に満たないものは(a−2)成分もしくは(a−3)成
分との反応工程においてゲル化を起こしやすく、目的と
する被覆組成物を得ることができず、また、一次粒子径
が200nmを超える場合には、硬化被膜の透明性が低
下する傾向にある。The colloidal silica fine particles (a-1)
Can be produced by a known method, but is also commercially available. In the present invention, the primary particle diameter of the component (a-1) is preferably in the range of 1 to 200 nm, and 5 to 8
A range of 0 nm is particularly preferred. This primary particle diameter is 1 nm
If the average particle size is less than 200 nm, gelation is likely to occur in the reaction step with the component (a-2) or the component (a-3), and the intended coating composition cannot be obtained. If it exceeds, the transparency of the cured film tends to decrease.
【0024】コロイダルシリカ微粒子(a−1)は、硬
化被膜の耐摩耗性を著しく改善でき、特に、ケイ砂等の
微粒子に対する耐摩耗性の改善効果が大きい。しかし、
コロイダルシリカを単独で硬化被膜とした場合には、合
成樹脂成形品表面に対する密着性が劣る。The colloidal silica fine particles (a-1) can remarkably improve the abrasion resistance of the cured film, and particularly have a great effect of improving the abrasion resistance against fine particles such as silica sand. But,
When colloidal silica is used alone as a cured coating, the adhesion to the surface of the synthetic resin molded product is poor.
【0025】(a−2)成分
(a−2)成分である上記一般式(I)で示される単量
体(以下、シラン化合物と略す。)は、コロイダルシリ
カ微粒子(a−1)と予め反応させることにより、
(B)成分である多官能(メタ)アクリレートとの相溶
性を向上させる成分である。Component (a-2) The monomer represented by the above general formula (I) (hereinafter abbreviated as silane compound), which is component (a-2), is preliminarily mixed with colloidal silica fine particles (a-1). By reacting
(B) A component that improves compatibility with the polyfunctional (meth) acrylate that is the component.
【0026】(a−2)成分としては、光エネルギー照
射により重合活性を示すアクリロイルオキシ基、メタク
リロイルオキシ基またはビニル基を有するシラン化合物
が用いられ、このシラン化合物を用いることにより、
(B)成分の多官能(メタ)アクリレートとの化学結合
形成が可能な光硬化性シリコーンを形成することがで
き、かつ得られる硬化被膜に強靱性を付与することがで
きる。さらに、コロイダルシリカ微粒子(a−1)と
(a−2)成分を併用することにより、得られる硬化被
膜の耐摩耗性をさらに向上させることができ、特に、ス
チールウール等の金属繊維に対する耐摩耗性の改善効果
を大きくすることができる。As the component (a-2), a silane compound having an acryloyloxy group, a methacryloyloxy group or a vinyl group which exhibits polymerization activity upon irradiation with light energy is used. By using this silane compound,
A photocurable silicone capable of forming a chemical bond with the polyfunctional (meth) acrylate of the component (B) can be formed, and toughness can be imparted to the obtained cured film. Furthermore, by using the colloidal silica fine particles (a-1) and (a-2) in combination, it is possible to further improve the wear resistance of the obtained cured film, and in particular, the wear resistance to metal fibers such as steel wool. The effect of improving the properties can be increased.
【0027】本発明において(a−2)成分としては、
具体例として、例えば、3−メタクリロイルオキシプロ
ピルトリメトキシシラン、3−アクリロイルオキシプロ
ピルトリメトキシシラン、2−メタクリロイルオキシエ
チルトリメトキシシラン、2−アクリロイルオキシエチ
ルトリメトキシシラン、3−メタクリロイルオキシプロ
ピルトリエトキシシラン、3−アクリロイルオキシプロ
ピルトリエトキシシラン、2−メタクリロイルオキシエ
チルトリエトキシシラン、2−アクリロイルオキシエチ
ルトリエトキシシラン、3−メタクリロイルオキシプロ
ピルメチルジメトキシシラン、3−アクリロイルオキシ
プロピルメチルジメトキシシラン、ビニルトリメトキシ
シラン、ビニルトリエトキシシランなどから選択され
る、少なくとも1種のシラン化合物が挙げられる。In the present invention, the component (a-2) includes
As specific examples, for example, 3-methacryloyloxypropyltrimethoxysilane, 3-acryloyloxypropyltrimethoxysilane, 2-methacryloyloxyethyltrimethoxysilane, 2-acryloyloxyethyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane 3-acryloyloxypropyltriethoxysilane, 2-methacryloyloxyethyltriethoxysilane, 2-acryloyloxyethyltriethoxysilane, 3-methacryloyloxypropylmethyldimethoxysilane, 3-acryloyloxypropylmethyldimethoxysilane, vinyltrimethoxysilane And at least one silane compound selected from vinyltriethoxysilane and the like.
【0028】上記した中でも、3−メタクリロイルオキ
シプロピルトリメトキシシラン、3−アクリロイルオキ
シプロピルトリメトキシシラン、3−メタクリロイルオ
キシプロピルトリエトキシシラン、3−アクリロイルオ
キシプロピルトリエトキシシラン、ビニルトリメトキシ
シラン、ビニルトリエトキシシランから選択される少な
くとも1種のシラン化合物が、(a−1)成分との反応
性が優れる点で特に好ましい。Among the above, 3-methacryloyloxypropyltrimethoxysilane, 3-acryloyloxypropyltrimethoxysilane, 3-methacryloyloxypropyltriethoxysilane, 3-acryloyloxypropyltriethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane At least one silane compound selected from ethoxysilane is particularly preferred in that it has excellent reactivity with the component (a-1).
【0029】また、本発明のもう1つの形態として、上
記(a−2)成分の代わりに、(a−3)成分として一
般式(II)で示される単量体(a−2)の加水分解物を
用いることができる。(a−3)成分の具体例として
は、前記した(a−2)成分のシラン化合物から選択さ
れる少なくとも1種のシラン化合物の加水分解物が挙げ
られる。この(a−3)成分である(a−2)成分の加
水分解物の製法は、前記した通り、シラン化合物に対し
て、有機溶媒の存在下または非存在下において、加水分
解触媒を加え、常温、又は加熱下で撹拌しつつ加水分解
で生じるアルコールを系外に除去すればよい。In another embodiment of the present invention, the component (a-3) is replaced with the monomer (a-2) represented by the general formula (II) instead of the component (a-2). Decomposed products can be used. Specific examples of the component (a-3) include a hydrolyzate of at least one silane compound selected from the silane compounds of the component (a-2). As described above, the method for producing the hydrolyzate of the component (a-2), which is the component (a-3), includes adding a hydrolysis catalyst to the silane compound in the presence or absence of an organic solvent, The alcohol generated by hydrolysis may be removed from the system while stirring at room temperature or under heating.
【0030】本発明において、光硬化性シリコーン
(A)の製造時に用いる非極性溶媒とは、誘電率、双極
子能率あるいは水素結合パラメータを基準として選ばれ
るものであり、広義には、中程度の極性を有する溶媒も
含むものである。例えば、20℃の誘電率が2〜10の
範囲の非極性溶媒が本発明においては好ましい溶媒であ
る。In the present invention, the non-polar solvent used in the production of the photocurable silicone (A) is selected based on the dielectric constant, dipole efficiency or hydrogen bonding parameter. It also includes a polar solvent. For example, a nonpolar solvent having a dielectric constant at 20 ° C. in the range of 2 to 10 is a preferable solvent in the present invention.
【0031】非極性溶媒の具体例としては、例えば、ベ
ンゼン、トルエン、キシレン、エチルベンゼン、シクロ
ヘキサン等の炭化水素類;トリクロルエチレン、テトラ
クロルエチレン等のハロゲン化炭化水素類;1,4−ジ
オキサン、ジブチルエーテル等のエーテル類;メチルイ
ソブチルケトン等のケトン類;酢酸n−ブチル、酢酸イ
ソブチル、酢酸エチル、プロピオン酸エチル等のエステ
ル類;1−メトキシ−2―プロパノール、エチレングリ
コールモノブチルエーテル等の多価アルコール誘導体等
を挙げることができる。また、不飽和エチレン性化合
物、例えば、1分子中に1個以上の(メタ)アクリロイ
ルオキシ基を有する単量体を非極性溶媒として用いるこ
ともできる。Specific examples of the nonpolar solvent include, for example, hydrocarbons such as benzene, toluene, xylene, ethylbenzene and cyclohexane; halogenated hydrocarbons such as trichloroethylene and tetrachloroethylene; Ethers such as butyl ether; ketones such as methyl isobutyl ketone; esters such as n-butyl acetate, isobutyl acetate, ethyl acetate and ethyl propionate; polyhydric alcohols such as 1-methoxy-2-propanol and ethylene glycol monobutyl ether Derivatives and the like can be mentioned. Further, an unsaturated ethylenic compound, for example, a monomer having one or more (meth) acryloyloxy groups in one molecule can be used as the non-polar solvent.
【0032】これらの非極性溶媒のなかでも、炭化水素
類、芳香族炭化水素類、または多価アルコール誘導体を
用いることが(a−1)成分と(a−2)成分との反応
の面から好ましく、特に好ましい非極性溶媒としては、
トルエン、1−メトキシ−2―プロパノールを挙げるこ
とができる。Among these non-polar solvents, hydrocarbons, aromatic hydrocarbons or polyhydric alcohol derivatives can be used in view of the reaction between the component (a-1) and the component (a-2). Preferred, particularly preferred non-polar solvents,
Examples thereof include toluene and 1-methoxy-2-propanol.
【0033】(A)成分の製造工程において、反応中の
固形分濃度は30〜90重量%の範囲が好ましい。この
固形分濃度が30重量%未満、すなわち溶媒が70重量
%を超える場合には、(a−1)成分と(a−2)又は
(a−3)成分との反応が不十分となり、これを用いた
被覆組成物を用いて得られる架橋硬化被膜は、透明性が
劣る傾向にある。一方、この固形分濃度が90重量%を
超えると、縮合反応が急激に起こり、反応系がゲル化状
態となる等の問題が生じるようになる。In the step of producing the component (A), the solid concentration during the reaction is preferably in the range of 30 to 90% by weight. If this solid content is less than 30% by weight, that is, if the solvent exceeds 70% by weight, the reaction between the component (a-1) and the component (a-2) or (a-3) becomes insufficient, The cross-linked cured film obtained by using the coating composition using the above tends to have poor transparency. On the other hand, if the solid content exceeds 90% by weight, the condensation reaction occurs rapidly, and problems such as the reaction system being in a gelled state occur.
【0034】(A)成分を得るための縮合反応中の温度
は60〜150℃の範囲が好ましい。これは、反応温度
が60℃未満の場合には、反応が十分に進行しないため
反応時間を長く要し、一方反応温度が150℃を超える
場合には、シラノールの縮合以外の反応が起こったり、
またはゲルが生成する等の問題が起こるようになる。The temperature during the condensation reaction for obtaining the component (A) is preferably in the range of 60 to 150 ° C. This is because when the reaction temperature is lower than 60 ° C., the reaction does not proceed sufficiently and a longer reaction time is required. On the other hand, when the reaction temperature is higher than 150 ° C., reactions other than silanol condensation occur,
Or a problem such as formation of a gel occurs.
【0035】本発明における(A)成分の製造におい
て、反応工程での(a−1)成分の固形分と、(a−
2)成分の加水分解物又は(a−3)成分の固形分(シ
ラノールとして換算)との使用割合は、重量比で(a−
1)/(a−2)又は(a−3)=40〜90/10〜
60、好ましくは50〜80/20〜50(合計100
重量部)である。In the production of the component (A) in the present invention, the solid content of the component (a-1) in the reaction step and (a-
The weight ratio of the hydrolyzate of component 2) or the solid content of component (a-3) (converted as silanol) is (a-
1) / (a-2) or (a-3) = 40-90 / 10
60, preferably 50-80 / 20-50 (100 in total)
Parts by weight).
【0036】使用割合が上記範囲外の場合、例えば、
(a−1)成分が90重量部を超えると反応系が白濁し
たり、ゲルが生成したりする等の問題が生じ、また、架
橋硬化被膜にクラックが発生し易い傾向となる。一方、
(a−1)成分が40重量部未満では硬化被膜の耐摩耗
性が低下する傾向がある。When the use ratio is out of the above range, for example,
If the amount of the component (a-1) exceeds 90 parts by weight, problems such as clouding of the reaction system and formation of a gel occur, and cracks tend to occur in the crosslinked cured film. on the other hand,
If the amount of the component (a-1) is less than 40 parts by weight, the abrasion resistance of the cured film tends to decrease.
【0037】非極性溶媒中で(a−1)成分と、(a−
2)成分又は(a−3)成分とを反応させることによ
り、得られる被覆組成物の硬化性が改善され、3μm未
満の薄膜の形成が可能となるとともに、かつ大気雰囲気
下においても透明で耐摩耗性に優れる硬化被膜の形成が
可能となる。In a nonpolar solvent, the component (a-1) and the component (a-
By reacting the component (2) or the component (a-3), the curability of the obtained coating composition is improved, a thin film of less than 3 μm can be formed, and the coating composition is transparent and resistant even in an air atmosphere. It becomes possible to form a cured film having excellent wear properties.
【0038】上記方法以外で製造された光硬化性シリコ
ーンを用いた被覆組成物は、その硬化性が十分でなく大
気雰囲気下では十分に硬化できず、3μm未満の薄膜と
した場合に、透明性の低下等、外観欠陥が起こりやす
く、また、硬化被膜の十分な耐摩耗性や耐久性等が得る
ことができない。A coating composition using a photocurable silicone produced by a method other than the above method has insufficient curability, cannot be cured sufficiently in an air atmosphere, and has a low transparency when formed into a thin film of less than 3 μm. In addition, appearance defects such as deterioration of the cured film are likely to occur, and sufficient abrasion resistance and durability of the cured film cannot be obtained.
【0039】本発明において用いる、被覆組成物の
(A)成分である光硬化性シリコーンは、架橋硬化被膜
の耐摩耗性、耐久性を改善する成分である。(A)成分
の使用割合は、(A)成分(固形分量)と(B)成分の
合計量に対して10〜70重量%の範囲、好ましくは2
0〜60重量%の範囲、さらに好ましくは25〜55重
量%の範囲となる量である。The photocurable silicone which is the component (A) of the coating composition used in the present invention is a component for improving the abrasion resistance and durability of the crosslinked cured film. The use ratio of the component (A) is in the range of 10 to 70% by weight, preferably 2%, based on the total amount of the component (A) (solid content) and the component (B).
The amount is in the range of 0 to 60% by weight, more preferably 25 to 55% by weight.
【0040】(A)成分の使用割合が10重量%未満の
場合、十分な硬化性、耐摩耗性、耐久性の改善効果が得
られず、一方、70重量%を超えるときは硬化被膜にク
ラックの発生が認められるようになる。When the use ratio of the component (A) is less than 10% by weight, sufficient effects of improving curability, abrasion resistance and durability cannot be obtained. The occurrence of is now recognized.
【0041】(B)成分について
(B)成分である1分子中に少なくとも1個の(メタ)
アクリロイルオキシ基を有する単量体としては、脂肪族
系、脂環族系または芳香族系のモノ、又はポリ(メタ)
アクリレートや、脂肪族、脂環族または芳香族のウレタ
ンポリ(メタ)アクリレート、エポキシポリ(メタ)ア
クリレート、ポリエステルポリ(メタ)アクリレートが
使用できる。Regarding the component (B) At least one (meth) component is present in one molecule of the component (B).
Examples of the monomer having an acryloyloxy group include aliphatic, alicyclic or aromatic mono- or poly (meth)
Acrylates, aliphatic, alicyclic or aromatic urethane poly (meth) acrylates, epoxy poly (meth) acrylates, and polyester poly (meth) acrylates can be used.
【0042】これらの具体例としては、例えば、メチル
(メタ)アクリレート、エチル(メタ)アクリレート、
ブチル(メタ)アクリレート、2−ヒドロキシエチル
(メタ)アクリレート、2−ヒドロキシプロピル(メ
タ)アクリレート、ポリエチレングリコールモノ(メ
タ)アクリレート、シクロヘキシル(メタ)アクリレー
ト、テトラヒドロフルフリル(メタ)アクリレート、ジ
シクロペンタニル(メタ)アクリレート、ジシクロペン
テニル(メタ)アクリレート、ベンジル(メタ)アクリ
レート、フェノキシエチル(メタ)アクリレート、無水
フタル酸と2−ヒドロキシエチル(メタ)アクリレート
との付加物などのモノ(メタ)アクリレート化合物;
1,4−ブタンジオールジ(メタ)アクリレート、1,
6−ヘキサンジオールジ(メタ)アクリレート、1,9
−ノナンジオールジ(メタ)アクリレート、ネオペンチ
ルグリコールジ(メタ)アクリレート、エチレングリコ
ールジ(メタ)アクリレート、ポリエチレングリコール
(n=2〜15)ジ(メタ)アクリレート、ポリプロピ
レングリコール(n=2〜15)ジ(メタ)アクリレー
ト、ポリブチレングリコール(n=2〜15)ジ(メ
タ)アクリレート、2,2−ビス(4−(メタ)アクリ
ロキシエトキシフェニル)プロパン、2,2−ビス(4
−(メタ)アクリロキシジエトキシフェニル)プロパ
ン、トリメチロールプロパンジアクリレート、ビス(2
−(メタ)アクリロキシエチル)−ヒドロキシエチル−
イソシアヌレートなどのジ(メタ)アクリレート化合
物;トリメチロールプロパントリ(メタ)アクリレー
ト、トリス(2−(メタ)アクリロイルオキシエチル)
イソシアヌレート、トリス(2−(メタ)アクリロイル
オキシプロピル)イソシアヌレート、ビス(2−(メ
タ)アクリロイルオキシエチル)ヒドロキシエチルイソ
シアヌレート、ビス(2−(メタ)アクリロイルオキシ
プロピル)−2−エトキシプロピルイソシアヌレート、
ペンタエリスリトールトリ(メタ)アクリレート、ペン
タエリスリト−ルテトラ(メタ)アクリレート、ジペン
タエリスリトールテトラ(メタ)アクリレート、ジペン
タエリスリトールペンタ(メタ)アクリレート、ジペン
タエリスリトールヘキサ(メタ)アクリレートなどの多
官能(メタ)アクリレート化合物;ビスフェノールA型
ジエポキシと(メタ)アクリル酸とを反応させたエポキ
シジ(メタ)アクリレート等のエポキシポリ(メタ)ア
クリレート;1,6−ヘキサメチレンジイソシアネート
の3量体に2−ヒドロキシエチル(メタ)アクリレート
を反応させたウレタントリ(メタ)アクリレート、イソ
ホロンジイソシアネートと2−ヒドロキシプロピル(メ
タ)アクリレートとを反応させたウレタンジ(メタ)ア
クリレート、イソホロンジイソシアネートとペンタエリ
スリトールトリ(メタ)アクリレートとを反応させたウ
レタンヘキサ(メタ)アクリレート、ジシクロメタンジ
イソシアネートと2−ヒドロキシエチル(メタ)アクリ
レートとを反応させたウレタンジ(メタ)アクリレー
ト、ジシクロメタンジイソシアネートとポリ(n=6−
15)テトラメチレングリコールとのウレタン化反応物
に2−ヒドロキシエチル(メタ)アクリレートとを反応
させたウレタンジ(メタ)アクリレート等のウレタンポ
リ(メタ)アクリレート;トリメチロールエタンとコハ
ク酸、(メタ)アクリル酸とを反応させたポリエステル
(メタ)アクリレート、トリメチロールプロパンとコハ
ク酸、エチレングリ、コール及び(メタ)アクリル酸と
を反応させたポリエステル(メタ)アクリレート等のポ
リエステルポリ(メタ)アクリレート等を挙げることが
できる。Specific examples of these include, for example, methyl (meth) acrylate, ethyl (meth) acrylate,
Butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, cyclohexyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, dicyclopentanyl Mono (meth) acrylate compounds such as (meth) acrylate, dicyclopentenyl (meth) acrylate, benzyl (meth) acrylate, phenoxyethyl (meth) acrylate, and adducts of phthalic anhydride and 2-hydroxyethyl (meth) acrylate ;
1,4-butanediol di (meth) acrylate, 1,
6-hexanediol di (meth) acrylate, 1,9
-Nonanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, ethylene glycol di (meth) acrylate, polyethylene glycol (n = 2 to 15) di (meth) acrylate, polypropylene glycol (n = 2 to 15) Di (meth) acrylate, polybutylene glycol (n = 2 to 15) di (meth) acrylate, 2,2-bis (4- (meth) acryloxyethoxyphenyl) propane, 2,2-bis (4
-(Meth) acryloxydiethoxyphenyl) propane, trimethylolpropane diacrylate, bis (2
-(Meth) acryloxyethyl) -hydroxyethyl-
Di (meth) acrylate compounds such as isocyanurate; trimethylolpropane tri (meth) acrylate, tris (2- (meth) acryloyloxyethyl)
Isocyanurate, tris (2- (meth) acryloyloxypropyl) isocyanurate, bis (2- (meth) acryloyloxyethyl) hydroxyethyl isocyanurate, bis (2- (meth) acryloyloxypropyl) -2-ethoxypropyl isocyanate Nurate,
Multifunctional (meta) such as pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate A) an acrylate compound; an epoxy poly (meth) acrylate such as an epoxy di (meth) acrylate obtained by reacting bisphenol A-type diepoxy with (meth) acrylic acid; 2-hydroxyethyl (trimer of 1,6-hexamethylene diisocyanate) Urethane tri (meth) acrylate obtained by reacting meth) acrylate; urethane di (meth) acrylate obtained by reacting isophorone diisocyanate with 2-hydroxypropyl (meth) acrylate; Urethane hexa (meth) acrylate obtained by reacting long diisocyanate with pentaerythritol tri (meth) acrylate, urethane di (meth) acrylate obtained by reacting dicyclomethane diisocyanate with 2-hydroxyethyl (meth) acrylate, dicyclomethane diisocyanate And poly (n = 6-
15) Urethane poly (meth) acrylate such as urethane di (meth) acrylate obtained by reacting 2-hydroxyethyl (meth) acrylate with a urethanation reaction product with tetramethylene glycol; trimethylolethane and succinic acid, (meth) acrylic Polyester (meth) acrylates such as polyester (meth) acrylate reacted with an acid, and polyester (meth) acrylate such as polyester (meth) acrylate obtained by reacting trimethylolpropane with succinic acid, ethylene glycol, coal and (meth) acrylic acid. be able to.
【0043】これらの単量体は、1種を単独で用いても
よいし、2種以上を混合して用いてもよいが、優れた耐
摩耗性を薄型物品に付与させる場合には、分子内に2個
以上の(メタ)アクリロイル基を有する化合物を(B)
成分として使用するのが好ましい。These monomers may be used alone or in combination of two or more. However, when imparting excellent wear resistance to a thin article, the molecular A compound having two or more (meth) acryloyl groups in (B)
It is preferably used as a component.
【0044】中でも(B)成分としては、ジペンタエリ
スリトールペンタ(メタ)アクリレート、ジペンタエリ
スリトールヘキサ(メタ)アクリレート、ペンタエリス
リトールトリ(メタ)アクリレート、ペンタエリスリト
ールテトラ(メタ)アクリレート、トリス(2−(メ
タ)アクリロイルオキシエチル)イソシアヌレート、ビ
ス(2−(メタ)アクリロイルオキシエチル)ヒドロキ
シエチルイソシアヌレート、トリメチロールプロパント
リ(メタ)アクリレート、1,6−ヘキサメチレンジイ
ソシアネートの3量体に2−ヒドロキシエチル(メタ)
アクリレートを反応させたウレタントリ(メタ)アクリ
レート、イソホロンジイソシアネートとペンタエリスリ
トールトリ(メタ)アクリレートとを反応させたウレタ
ンヘキサ(メタ)アクリレート、ジシクロメタンジイソ
シアネートとポリ(n=6−15)テトラメチレングリ
コールとのウレタン化反応物に2−ヒドロキシエチル
(メタ)アクリレートとを反応させたウレタンジ(メ
タ)アクリレート、トリメチロールプロパントリ(メ
タ)アクリレート、トリス(2−(メタ)アクリロキシ
エチル)イソシアヌレート、1,6−ヘキサンジオール
ジ(メタ)アクリレートから選ばれる1種以上の化合物
が特に好ましい。Among them, component (B) includes dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, and tris (2- ( 2-hydroxyethyl to a trimer of (meth) acryloyloxyethyl) isocyanurate, bis (2- (meth) acryloyloxyethyl) hydroxyethyl isocyanurate, trimethylolpropane tri (meth) acrylate and 1,6-hexamethylene diisocyanate (Meta)
Urethane tri (meth) acrylate obtained by reacting acrylate, urethane hexa (meth) acrylate obtained by reacting isophorone diisocyanate with pentaerythritol tri (meth) acrylate, dicyclomethane diisocyanate and poly (n = 6-15) tetramethylene glycol Urethane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, tris (2- (meth) acryloxyethyl) isocyanurate, One or more compounds selected from 2,6-hexanediol di (meth) acrylate are particularly preferred.
【0045】(B)成分の使用割合は、(A)成分(固
形分量)と(B)成分の合計量に対して30〜90重量
%の範囲である。The proportion of component (B) used is in the range of 30 to 90% by weight based on the total amount of component (A) (solid content) and component (B).
【0046】(B)成分の使用量が、30重量%未満の
場合には、得られる薄膜硬化被膜の耐久性、及び基材と
の密着性が低下し、90重量%以上では、耐摩耗性と空
気中での反応性が低下する傾向にあるためである。好ま
しくは40〜80重量%の範囲、より好ましくは45〜
75重量%の範囲である。When the amount of the component (B) is less than 30% by weight, the durability of the obtained thin cured film and the adhesion to the substrate are reduced. This is because the reactivity in air tends to decrease. Preferably in the range of 40-80% by weight, more preferably 45-80% by weight.
It is in the range of 75% by weight.
【0047】(C)成分について
本発明に用いる被覆組成物には、(C)成分として光重
合開始剤を配合する。Component (C) The coating composition used in the present invention contains a photopolymerization initiator as the component (C).
【0048】(C)成分の具体例としては、例えば、ベ
ンゾイン、ベンゾインメチルエーテル、ベンゾインエチ
ルエーテル、ベンゾインイソプロピルエーテル、ベンゾ
インイソブチルエーテル、アセトイン、ブチロイン、ト
ルオイン、ベンジル、ベンゾフェノン、p−メトキシベ
ンゾフェノン、ジエトキシアセトフェノン、2,2−ジ
メトキシ−2−フェニルアセトフェノン、メチルフェニ
ルグリオキシレート、エチルフェニルグリオキシレー
ト、4,4−ビス(ジメチルアミノベンゾフェノン)、
2−ヒドロキシ−2−メチル−1−フェニルプロパン−
1−オン、1−ヒドロキシシクロヘキシルフェニルケト
ン、1−(4−イソプロピルフェニル)−2−ヒドロキ
シ−2−メチルプロパン−1−オン等のカルボニル化合
物;テトラメチルチウラムジスルフィド、テトラメチル
チウラムジスルフィド等の硫黄化合物;アゾビスイソブ
チロニトリル、アゾビス−2,4−ジメチルバレロニト
リル等のアゾ化合物;ベンゾイルパーオキシド、ジター
シャリーブチルパーオキシド等のパーオキシド化合物;
2,4,6−トリメチルベンゾイルジフェニルホスフィ
ンオキサイド、ビス(2,6−ジメトキシベンゾイル)
−2,4,4−トリメチルペンチルホスフィンオキサイ
ド等のアシルホスフィンオキサイド化合物を挙げること
ができる。Specific examples of the component (C) include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, acetoin, butyroin, toluoin, benzyl, benzophenone, p-methoxybenzophenone, and diethoxy. Acetophenone, 2,2-dimethoxy-2-phenylacetophenone, methylphenylglyoxylate, ethylphenylglyoxylate, 4,4-bis (dimethylaminobenzophenone),
2-hydroxy-2-methyl-1-phenylpropane-
Carbonyl compounds such as 1-one, 1-hydroxycyclohexylphenyl ketone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one; sulfur compounds such as tetramethylthiuram disulfide and tetramethylthiuram disulfide Azo compounds such as azobisisobutyronitrile and azobis-2,4-dimethylvaleronitrile; peroxide compounds such as benzoyl peroxide and ditertiary butyl peroxide;
2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis (2,6-dimethoxybenzoyl)
Acyl phosphine oxide compounds such as -2,4,4-trimethylpentyl phosphine oxide can be mentioned.
【0049】このうち、光重合開始剤(C)としては、
ベンゾフェノン、1−ヒドロキシシクロヘキシルフェニ
ルケトン、2,4,6−トリメチルベンゾイルジフェニ
ルホスフィンオキサイド、メチルフェニルグリオキシレ
ートから選ばれる1種以上の化合物が特に好ましい。Among them, the photopolymerization initiator (C) includes
One or more compounds selected from benzophenone, 1-hydroxycyclohexylphenyl ketone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, and methylphenylglyoxylate are particularly preferred.
【0050】(C)成分の使用割合は、(A)成分(固
形分量)と(B)成分の合計量100重量部に対して
0.01〜10重量部、好ましくは0.1〜5重量部で
ある。(C)成分の使用割合が10重量部を超えると架
橋硬化被膜が帯色し、耐候性が低下し、0.01重量部
未満では得られる被覆組成物を硬化させることができな
い。Component (C) is used in an amount of 0.01 to 10 parts by weight, preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the total amount of component (A) (solid content) and component (B). Department. When the use ratio of the component (C) exceeds 10 parts by weight, the crosslinked cured film becomes colored and the weather resistance is reduced. When the use amount is less than 0.01 part by weight, the obtained coating composition cannot be cured.
【0051】(D)成分について
本発明においては、被覆組成物の粘度調整の他、均一溶
解性、分散安定性、さらには基材との密着性および硬化
被膜の平滑性、均一性などの面から、(D)成分として
有機溶剤を用いる。本発明に用いる被覆組成物を基材に
塗布するには、ハケ塗り、スプレーコート、ディップコ
ート、スピンコート、ロールコート、カーテンコートな
どの常法が使用可能であるが、塗布時には低粘度である
ことが望ましい。しかし、(A)成分である光硬化性シ
リコーンと(B)成分の混合物は非常に高粘度であるこ
とから、有機溶剤(D)により塗工に好適な粘度に希釈
するのが好ましい。Component (D) In the present invention, in addition to adjusting the viscosity of the coating composition, aspects such as uniform solubility, dispersion stability, adhesion to the substrate, and smoothness and uniformity of the cured film are considered. Therefore, an organic solvent is used as the component (D). To apply the coating composition used in the present invention to a substrate, brush coating, spray coating, dip coating, spin coating, roll coating, curtain coating, and other ordinary methods can be used. It is desirable. However, since the mixture of the photocurable silicone (A) and the component (B) has a very high viscosity, it is preferable to dilute the mixture with an organic solvent (D) to a viscosity suitable for coating.
【0052】この有機溶剤(D)は特に限定されるもの
ではなく、(A)成分(固形分量)と(B)成分の合計
量100重量部に対して30〜2000重量部の範囲
で、少なくとも1種の有機溶剤を配合すればよい。The organic solvent (D) is not particularly limited, but may be at least 30 to 2,000 parts by weight based on 100 parts by weight of the total of the component (A) (solid content) and the component (B). What is necessary is just to mix one kind of organic solvent.
【0053】有機溶剤(D)としては、アルコール系、
炭化水素系、ケトン系、エーテル系、エステル系、多価
アルコール誘導体、ハロゲン化炭化水素系等の有機溶剤
から選ばれる少なくとも1種以上を挙げることができ
る。As the organic solvent (D), alcohols,
At least one selected from organic solvents such as hydrocarbons, ketones, ethers, esters, polyhydric alcohol derivatives, and halogenated hydrocarbons can be used.
【0054】有機溶剤(D)の具体例としては、例え
ば、イソプロピルアルコール、n−ブタノール、イソブ
タノール、ジアセトンアルコール等のアルコール系溶
剤、ヘキサン、シクロヘキサン、トルエン、キシレン、
高沸点芳香族溶剤(スワゾール1000等)等の炭化水
素系溶剤、MEK、MIBK、DIBK、シクロヘキサ
ノン等のケトン系溶剤、エチルエーテル等のエーテル系
溶剤、酢酸エチル、酢酸n−ブチル、酢酸アミル、酢酸
メトキシプロピル、酢酸エトキシエチル等のエステル系
溶剤、メチルセロソルブ、エチルセロソルブ、ブチルセ
ロソルブ、メトキシプロパノール、メトキシブタノー
ル、エチルジグリコール等の多価アルコール誘導体溶剤
が挙げられる。これらは、単独で用いても、2種以上を
混合して用いてもよい。Specific examples of the organic solvent (D) include, for example, alcohol solvents such as isopropyl alcohol, n-butanol, isobutanol, diacetone alcohol, hexane, cyclohexane, toluene, xylene, and the like.
Hydrocarbon solvents such as high boiling aromatic solvents (Swazole 1000 etc.), ketone solvents such as MEK, MIBK, DIBK, cyclohexanone, ether solvents such as ethyl ether, ethyl acetate, n-butyl acetate, amyl acetate, acetic acid Examples include ester solvents such as methoxypropyl and ethoxyethyl acetate, and solvents of polyhydric alcohol derivatives such as methyl cellosolve, ethyl cellosolve, butyl cellosolve, methoxypropanol, methoxybutanol, and ethyldiglycol. These may be used alone or as a mixture of two or more.
【0055】これらのうち、被覆組成物の均一溶解性、
分散安定性、さらには基材との密着性および被膜の平滑
性、均一性などの面から、有機溶剤(D)として、(d
−1)アルコール系有機溶剤10〜50重量%、(d−
2)酢酸エステル系有機溶剤10〜50重量%、(d−
3)ケトン系溶剤5〜30重量%、(d−4)多価アル
コール誘導体溶剤1〜30重量%((D)成分の総量を
100重量%としたとき)の組み合わせからなるものが
特に好ましい。Among these, the uniform solubility of the coating composition,
From the viewpoints of dispersion stability, adhesion to a substrate, and smoothness and uniformity of a film, (d) as an organic solvent (D)
-1) 10 to 50% by weight of an alcoholic organic solvent, (d-
2) 10 to 50% by weight of an acetate organic solvent, (d-
Particularly preferred is a combination of 3) 5 to 30% by weight of a ketone solvent and 1 to 30% by weight of a (d-4) polyhydric alcohol derivative solvent (when the total amount of the component (D) is 100% by weight).
【0056】有機溶剤(D)の使用量は、(A)成分
(固形分量)と(B)成分の合計量100重量部に対し
て、30〜2000重量部の範囲、好ましくは50〜1
000重量部の範囲で添加するのが好ましい。The amount of the organic solvent (D) used is in the range of 30 to 2000 parts by weight, preferably 50 to 1 part by weight, based on 100 parts by weight of the total of the component (A) (solid content) and the component (B).
It is preferred to add in the range of 000 parts by weight.
【0057】以上が本発明に用いる被覆組成物を構成す
る必須成分であるが、さらに、必要に応じて、酸化防止
剤、黄変防止剤、ブルーイング剤、顔料、レベリング
剤、消泡剤、増粘剤、沈降防止剤、帯電防止剤、防曇
剤、紫外線吸収剤、光安定剤等の各種の添加剤が含まれ
ていてもよい。The above are the essential components constituting the coating composition used in the present invention. If necessary, an antioxidant, an anti-yellowing agent, a bluing agent, a pigment, a leveling agent, a defoaming agent, Various additives such as a thickener, an antisettling agent, an antistatic agent, an antifogging agent, an ultraviolet absorber, and a light stabilizer may be contained.
【0058】本発明において、被覆組成物の塗布量とし
ては、架橋硬化被膜の膜厚が3μm未満、好ましくは
0.5〜2.5μmの範囲に塗布するのがよい。この膜
厚が0.3μm未満の場合は十分な耐摩耗性と基材との
密着性が劣る傾向にあり、3μmを超える場合は、被覆
組成物の硬化収縮による基材のそりが増加する傾向にあ
る。In the present invention, the coating amount of the coating composition is preferably such that the thickness of the crosslinked cured film is less than 3 μm, preferably 0.5 to 2.5 μm. When the film thickness is less than 0.3 μm, sufficient abrasion resistance and adhesion to the substrate tend to be poor, and when it exceeds 3 μm, the warpage of the substrate due to curing shrinkage of the coating composition tends to increase. It is in.
【0059】基材に塗布された被覆組成物の被膜を硬化
させる手段としては、光エネルギー照射、例えばα,β
およびγ線などの活性エネルギー線を公知の方法で被覆
組成物の塗膜に照射することにより行えばよく、特に限
定されるものではない。より薄い薄型基材に適用するに
は、被覆組成物の硬化手段として紫外線を用いることが
特に好ましい。この際に用いる紫外線発生源としては、
実用性、経済性の面から一般に使用されている紫外線ラ
ンプでよい。紫外線ランプの具体例としては、例えば、
低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、
セノンランプ、メタルハライドランプなどが挙げられ
る。光エネルギー照射の雰囲気下は、空気中でもよい
し、窒素、アルゴン等の不活性ガス中でもよいが、実用
性、経済性の面からは空気中が好ましい。As means for curing the coating film of the coating composition applied to the substrate, light energy irradiation, for example, α, β
Irradiation with an active energy ray such as γ-ray or the like may be performed by irradiating the coating film of the coating composition with a known method, and is not particularly limited. For application to thinner thin substrates, it is particularly preferable to use ultraviolet light as a means for curing the coating composition. In this case, as an ultraviolet light source,
An ultraviolet lamp generally used may be used in terms of practicality and economy. Specific examples of the ultraviolet lamp include, for example,
Low pressure mercury lamp, high pressure mercury lamp, ultra high pressure mercury lamp,
Senon lamps, metal halide lamps and the like can be mentioned. The atmosphere of light energy irradiation may be in air or in an inert gas such as nitrogen or argon, but is preferably in air from the viewpoint of practicality and economy.
【0060】本発明の薄型物品を得るには、基材表面に
前記被覆組成物を塗布した後、紫外線照射エネルギーに
て硬化させる前に、該被覆組成物中に含有される有機溶
剤成分(D)を揮発除去する、あるいは硬化被膜の基材
に対する密着性向上を目的として、赤外線または熱風乾
燥炉を用いて、20〜120℃で1〜60分間の熱処理
を行ってもよい。In order to obtain the thin article of the present invention, the organic solvent component (D) contained in the coating composition is applied to the surface of the base material after the coating composition is applied and before the composition is cured by ultraviolet irradiation energy. ) May be subjected to heat treatment at 20 to 120 ° C. for 1 to 60 minutes using an infrared or hot air drying furnace for the purpose of volatilizing and removing the cured film or improving the adhesion of the cured film to the substrate.
【0061】本発明の薄型物品の基材としては、各種基
材を適用することができるが、特に、従来から耐摩耗性
や耐候性等の表面改質要望のある各種の熱可塑性樹脂や
熱硬化性樹脂などの合成樹脂が挙げられる。As the substrate of the thin article of the present invention, various substrates can be applied. In particular, various types of thermoplastic resins or thermosetting resins which have conventionally been required to have a surface modification such as abrasion resistance and weather resistance have been used. A synthetic resin such as a curable resin may be used.
【0062】基材の具体例としては、例えば、ポリメチ
ルメタクリル樹脂、ポリカーボネート樹脂、ポリエステ
ル樹脂、ポリスチレン樹脂、ポリオレフィン樹脂、アク
リロニトリル−スチレン共重合樹脂、ポリアミド樹脂、
ポリアリレート樹脂、ポリメタクリルイミド樹脂、ポリ
アリルジグリコールカーボネート樹脂などが挙げられ
る。特に、ポリメチルメタクリル樹脂、ポリカーボネー
ト樹脂、ポリスチレン樹脂、ポリオレフィン樹脂は、透
明性に優れ、かつ耐摩耗性の改良要求も強いため、本発
明の基材として用いると特に有効である。また本発明に
おける薄型物品とは特に限定されないが、これらの基材
からなる光ディスク成型品、シート状成形品、フィルム
状成形品、レンズ状成型品、および各種形状のキャスト
法、押し出し法、加圧成形法あるいは射出成形法により
得られる物品に好適である。Specific examples of the substrate include, for example, polymethyl methacrylic resin, polycarbonate resin, polyester resin, polystyrene resin, polyolefin resin, acrylonitrile-styrene copolymer resin, polyamide resin,
Polyarylate resin, polymethacrylimide resin, polyallyl diglycol carbonate resin and the like can be mentioned. In particular, a polymethyl methacrylic resin, a polycarbonate resin, a polystyrene resin, and a polyolefin resin are particularly effective when used as the base material of the present invention because they are excellent in transparency and require strong improvement in abrasion resistance. Further, the thin article in the present invention is not particularly limited, but optical disc molded articles, sheet-shaped molded articles, film-shaped molded articles, lens-shaped molded articles, and casts, extrusions, and presses of various shapes made of these substrates. It is suitable for an article obtained by a molding method or an injection molding method.
【0063】[0063]
【実施例】以下、実施例により本発明をさらに詳しく説
明する。なお、実施例および比較例における評価は次の
ような方法で行った。The present invention will be described in more detail with reference to the following examples. The evaluation in Examples and Comparative Examples was performed by the following method.
【0064】1.外観
(1)透明性
ASTM D−1003に準拠し、ヘーズメータを用い
て曇価を測定した。なお、表中の評価結果には、ヘイズ
値と併せて、光学的に問題がないヘイズ値が1未満の場
合には○を、光学的に問題が有るヘイス値が1以上の場
合には×を記している。
(2)基材のそり
直径120mm、厚さ1.2mmのCD光ディスク(ポ
リカーボネート射出成型品)のレーザー読みとり面に被
覆組成物を塗布、硬化させた後、該CD光ディスクのそ
り具合を、 光ディスク光学機械特性測定装置(DLD
−3000、ジャパンイーエム(株)製)で測定し、硬
化被膜形成前の値と形成後の値の差を記載した。なお、
表中の評価結果には、前記値と併せて、信号読みとりに
全く問題がない△mRa(ミリラシ゛アン)=0〜±3の場合に
は◎を、信号読みとりの許容範囲である△mRa(ミリラシ゛
アン)=0〜±5の場合には○を、信号読みとりに問題が
ある△mRa(ミリラシ゛アン)=±5を越える場合には×を記
している。1. Appearance (1) Transparency The haze value was measured using a haze meter according to ASTM D-1003. In addition, in the evaluation results in the table, together with the haze value, when the haze value having no optical problem is less than 1, ○ is given, and when the haze value having optical problem is 1 or more, x is given. Is written. (2) After coating and curing the coating composition on the laser reading surface of a CD optical disk (polycarbonate injection molded product) having a warp diameter of 120 mm and a thickness of 1.2 mm of the base material, the degree of warp of the CD optical disk is determined by the optical disk optical system. Mechanical property measurement device (DLD
-3000, manufactured by Japan EM Co., Ltd.), and the difference between the value before forming the cured film and the value after forming the cured film is described. In addition,
In the evaluation results in the table, in addition to the above values, there is no problem in signal reading at all △ mRa (milliradian) = 0 to ± 3, and 許 容 mRa (milliradian) which is an allowable range of signal readingに は is given when = 0 to ± 5, and x is given when △ mRa (milli-radian) = ± 5 which has a problem in signal reading.
【0065】2.耐摩耗性
(1)テーバー摩耗テスト
ASTM D−1044に準拠し、摩耗輪CS−10
F、荷重500g、回転数100サイクルの条件で摩耗
テストを行った。摩耗した後、試料を中性洗剤を用いて
洗浄し、ヘーズメータで曇価を測定した。なお、表中の
評価結果には、上記曇価のヘイズ値と併せて、耐摩耗性
は摩耗前に対する摩耗後のヘイズ増加値が、実用レベル
である10未満の場合には○を、実用に耐えられないレ
ベルである10以上を×で示している。
(2)スチールウールテスト
#000スチールウール(日本スチールウール(株)、
ボンスター(登録商標))を1cm2の円形パッドに装
着し、往復式摩耗試験機台上に保持された試料表面にこ
のパッドを置いて荷重1,000g下で50サイクル摩
耗した。この試料を中性洗剤を用いて洗浄し、ヘーズメ
ータで曇価を測定した。なお、表中の評価結果には、上
記曇価のヘイズ値と併せて、耐摩耗性は摩耗前に対する
摩耗後のヘイズ増加値が、実用レベルである5未満の場
合には○を、実用に耐えられないレベルである5以上を
×で示している。2. Abrasion resistance (1) Based on Taber abrasion test ASTM D-1044, wear wheel CS-10
A wear test was performed under the conditions of F, a load of 500 g, and a rotation number of 100 cycles. After abrasion, the samples were washed with a neutral detergent and the haze was measured with a haze meter. In addition, in the evaluation results in the table, in addition to the haze value of the haze value, the abrasion resistance, when the haze increase value after abrasion with respect to before the abrasion is less than 10 which is a practical level, ○ An unacceptable level of 10 or more is indicated by x. (2) Steel wool test # 000 steel wool (Nippon Steel Wool Co., Ltd.
Bonstar (registered trademark)) was mounted on a 1 cm 2 circular pad, and the pad was placed on the surface of a sample held on a reciprocating abrasion tester table, and worn for 50 cycles under a load of 1,000 g. This sample was washed with a neutral detergent, and the haze value was measured with a haze meter. In addition, in the evaluation results in the table, together with the haze value of the haze value, the abrasion resistance was evaluated as follows. An unacceptable level of 5 or more is indicated by x.
【0066】3.密着性
試料表面にカミソリで縦、横それぞれ11本の1.5m
m間隔で基材に達する傷を入れて100個のます目をつ
くり、セロハンテープ(巾25mm、ニチバン社製)を
ます目に対して圧着させて上方に急激にはがし、基材に
残存するます目数を数えた。なお、上記の残存するます
目数は、100個のものは密着性が良好、0−99個の
ものは密着性に問題有りを示すものである。3. Razor on the surface of the adhesive sample 11 vertical and horizontal 1.5m each
Make scratches that reach the base material at intervals of m, make 100 squares, and press down cellophane tape (25 mm width, made by Nichiban) against the squares, sharply peel upward, and remain on the base material The number of eyes was counted. As for the number of remaining squares, the number of 100 remaining squares indicates good adhesion, and the number of 0-99 indicates that there is a problem in adhesion.
【0067】4.耐久性テスト
恒温恒湿試験器(サタケ(株)製、SC−H65J−4
0型)を用い、温度80℃、湿度85%RHの試験条件
で2,000時間の加速耐久性テストを行った。このテ
スト終了後のサンプルについて、外観を目視で観察し、
さらに密着性、そりについても評価した。なお、外観
(ヘイズ値)及び密着性の評価基準は、前記した各評価
方法と同様とし、そり具合の評価は、前記のそり評価に
準ずる。4. Durability test constant temperature and humidity tester (manufactured by Satake Corporation, SC-H65J-4)
(0 type) and an accelerated durability test for 2,000 hours under the test conditions of a temperature of 80 ° C. and a humidity of 85% RH. The appearance of the sample after the test was visually observed,
Further, adhesion and warpage were also evaluated. The evaluation criteria for the appearance (haze value) and the adhesion are the same as those described above, and the evaluation of the degree of warpage conforms to the evaluation of the warpage.
【0068】(A)成分の合成
合成例1 光硬化性シリコーン(SC−1)の合成
撹拌機、温度計およびコンデンサーを備えた3リットル
の4ツ口フラスコに、イソープロパノールシリカゾル
(分散媒;イソ−プロパノール、SiO2 濃度;30
重量%、一次粒子径;12nm、商品名;IPA−S
T、日産化学工業(株))(以下、IPA−STと略記
する。)2,000部と、3−メタクリロイルオキシプ
ロピルトリメトキシシラン(商品名;TSL−837
0、東芝シリコン(株))(以下、TSL−8370と
略記する。)382部を計量し、撹拌しながら昇温さ
せ、揮発成分の還流が始まると同時に純水を150部徐
々に滴下させ、滴下終了後、還流下で2時間撹拌しなが
ら加水分解を行った。加水分解終了後、常圧状態でアル
コール、水等の揮発成分を留出させ、固形分(IPA−
STのSiO2 600部とTSL−8370の317
部の合計量917部)濃度が約60%の時点でトルエン
600部を追加し、アルコール、水等をトルエンと一緒
に共沸留出させた。Synthesis of Component (A) Synthesis Example 1 Synthesis of Photo-Curable Silicone (SC-1) Iso-propanol silica sol (dispersion medium; iso-propanol) was placed in a 3-liter four-necked flask equipped with a stirrer, a thermometer and a condenser. -Propanol, SiO2 concentration; 30
Weight%, primary particle diameter; 12 nm, trade name; IPA-S
T, Nissan Chemical Industries, Ltd. (hereinafter abbreviated as IPA-ST) 2,000 parts and 3-methacryloyloxypropyltrimethoxysilane (trade name: TSL-837)
0, Toshiba Silicon Co., Ltd. (hereinafter abbreviated as TSL-8370) weighing 382 parts, raising the temperature with stirring, and starting to reflux the volatile components, 150 parts of pure water was gradually dropped at the same time. After completion of the dropwise addition, hydrolysis was carried out with stirring for 2 hours under reflux. After completion of the hydrolysis, volatile components such as alcohol and water are distilled off under normal pressure, and the solid content (IPA-
600 parts of ST SiO2 and 317 of TSL-8370
When the concentration was about 60%, 600 parts of toluene were added, and alcohol, water and the like were azeotropically distilled together with toluene.
【0069】さらに、トルエン1,500部を数回に分
けて追加し、完全に溶媒置換を行い、トルエン分散系と
した。このときの固形分濃度は約40重量%であった。
さらに、トルエンを留出させながら110℃で4時間反
応を行ない、固形分濃度を約60重量%とした。この後
さらにメトキシプロパノール1000部を追加し、トル
エンを蒸発留出させ溶媒置換を行い、メトキシプロパノ
ール分散系とした。得られた光硬化性シリコーン(以
下、SC−1と略記する。)は、黄色状でニュートン流
体の透明、粘稠な液体であり、25℃の粘度が30mP
・sであった。また、固形分濃度は加熱残分で58重量
%であった。なお、加熱残分は、(加熱後の重量(g)
/加熱前重量(g))×100(重量%)で示し、加熱
条件は105℃で3時間である。Further, 1,500 parts of toluene was added in several portions, and the solvent was completely replaced to obtain a toluene dispersion system. At this time, the solid content concentration was about 40% by weight.
Further, the reaction was carried out at 110 ° C. for 4 hours while distilling off toluene, and the solid concentration was adjusted to about 60% by weight. Thereafter, 1000 parts of methoxypropanol was further added, and toluene was evaporated and distilled off, followed by solvent replacement to obtain a methoxypropanol dispersion system. The resulting photocurable silicone (hereinafter abbreviated as SC-1) is a yellow, transparent, viscous liquid of Newtonian fluid and has a viscosity of 30 mP at 25 ° C.
-It was s. The solids concentration was 58% by weight in terms of the residue after heating. In addition, heating residue is (weight after heating (g)
/ Weight before heating (g)) × 100 (% by weight) under heating conditions of 105 ° C. for 3 hours.
【0070】合成例2 光硬化性シリコーン(SC−
2)の合成
合成例1の3−メタクリロイルオキシプロピルトリメト
キシシランの代わりに、3−アクリロイルオキシプロピ
ルトリエトキシシランを用いる以外は、合成例1と同様
にして光硬化性シリコーン(以下、SC−2と略記す
る。)を得た。Synthesis Example 2 Photocurable silicone (SC-
2) Synthesis of Photocurable silicone (hereinafter referred to as SC-2) in the same manner as in Synthesis Example 1 except that 3-acryloyloxypropyltriethoxysilane was used instead of 3-methacryloyloxypropyltrimethoxysilane in Synthesis Example 1. Abbreviated.).
【0071】合成例3 光硬化性シリコーン(SC−
3)の合成
合成例1の3−メタクリロイルオキシプロピルトリメト
キシシランの代わりに、ビニルトリメトキシシランを用
いる以外は、合成例1と同様にして光硬化性シリコーン
(以下、SC−3と略記する。)を得た。Synthesis Example 3 Photocurable silicone (SC-
3) Synthesis Photocurable silicone (hereinafter abbreviated as SC-3) in the same manner as in Synthesis Example 1 except that vinyltrimethoxysilane was used instead of 3-methacryloyloxypropyltrimethoxysilane in Synthesis Example 1. ) Got.
【0072】[実施例1](A)成分として、SC−1
を86.2g(固形分として50g、溶剤成分として1
−メトキシ−2−プロパノールを36.2g含む)、
(B)成分として、トリス(アクリロイルオキシエチ
ル)イソシアヌレート(商品名;アロニックスM−31
5、東亜合成化学工業(株)製)20g、ビス(アクリ
ロイルオキシエチル)ヒドロキシエチルイソシアヌレー
ト(商品名;アロニックスM−215、東亜合成化学工
業(株)製)20g、1,9−ノナンジオールジアクリ
レート(商品名;ビスコート#260、大阪有機化学工
業(株)製)10g、(C)成分として、ベンゾフェノ
ン、1.5g、1−ヒドロキシシクロヘキシルフェニル
ケトン(商品名:イルガキュア184、チバスペシャリ
ティーケミカルズ(株)製)1.5g、(D)成分とし
て、1−メトキシ−2−プロパノール、155g(総計
294g、固形分35wt%)からなる組成で被覆組成
物を調製した。この被覆組成物を用いてコンパクトディ
スク(CD)射出成形品(素材、ポリカーボネート、色
調クリヤー、1.2mm厚、120mm直径)にスピン
コート法により塗布(回転数4000rpm、振り切り
時間2秒)し、40℃の温風乾燥機内で2分間乾燥した
後、空気雰囲気中において高圧水銀灯を用い、1,00
0mJ/cm2(波長320〜380nmの紫外線積算
エネルギー)の紫外線を照射し、硬化被膜の膜厚が1.
1μmである耐摩耗性薄膜が読みとり面に形成されたC
Dを得た。この性能の評価結果を表2に示した。Example 1 SC-1 was used as the component (A).
86.2 g (50 g as a solid content, 1 as a solvent component)
-Methoxy-2-propanol),
As the component (B), tris (acryloyloxyethyl) isocyanurate (trade name; ARONIX M-31)
5, 20 g of Toa Gosei Chemical Industry Co., Ltd., 20 g of bis (acryloyloxyethyl) hydroxyethyl isocyanurate (trade name; Aronix M-215, manufactured by Toa Gosei Chemical Industry Co., Ltd.), 1,9-nonanediol di 10 g of an acrylate (trade name: Biscoat # 260, manufactured by Osaka Organic Chemical Industry Co., Ltd.), benzophenone, 1.5 g, 1-hydroxycyclohexyl phenyl ketone (trade name: Irgacure 184, Ciba Specialty Chemicals (C)) Co., Ltd.) (1.5 g) and 1-methoxy-2-propanol as a component (D), and 155 g (total 294 g, solid content 35 wt%) of the coating composition were prepared. Using this coating composition, a compact disk (CD) injection-molded product (material, polycarbonate, color tone clear, 1.2 mm thick, 120 mm diameter) was applied by spin coating (rotation speed: 4000 rpm, shake-off time: 2 seconds), and 40 After drying for 2 minutes in a hot air drier at 100 ° C., use a high-pressure mercury lamp in an air atmosphere,
Ultraviolet rays of 0 mJ / cm 2 (accumulated energy of ultraviolet rays having a wavelength of 320 to 380 nm) are irradiated, and the thickness of the cured film is 1.
C having a wear-resistant thin film of 1 μm formed on the reading surface
D was obtained. Table 2 shows the evaluation results of the performance.
【0073】[実施例2〜8、比較例1〜6]表1に示
す組成で各被覆組成物を調製した。これを実施例1と同
様の方法でCD射出成形品に塗布、硬化させ、表1に記
載の膜厚のCDを得た。この性能の評価結果を表2に示
した。Examples 2 to 8 and Comparative Examples 1 to 6 Each coating composition having the composition shown in Table 1 was prepared. This was applied to a CD injection molded article in the same manner as in Example 1 and cured to obtain a CD having a film thickness shown in Table 1. Table 2 shows the evaluation results of the performance.
【0074】[参考例1]実施例及び比較例で用いた基
材であるコンパクトディスク(CD)射出成形品(素
材、ポリカーボネート、色調クリヤー、1.2mm厚、
120mm直径)の耐久性テストを行い、性能の評価結
果を表2に示した。REFERENCE EXAMPLE 1 A compact disk (CD) injection-molded article (material, polycarbonate, color tone clear, 1.2 mm thick, which is a base material used in Examples and Comparative Examples)
A 120 mm diameter durability test was performed, and the performance evaluation results are shown in Table 2.
【0075】なお、表1において示す略記号は、以下の
化合物を表わす。The abbreviations shown in Table 1 represent the following compounds.
【0076】(A)成分
SC−1:合成例1で合成した光硬化性シリコーン
SC−2:合成例1の3−メタクリロイルオキシプロピ
ルトリメトキシシランの代わりに、3−アクリロイルオ
キシプロピルトリエトキシシランを用いる以外は合成例
1と同様にして製造した光硬化性シリコーン
SC−3:合成例1の3−メタクリロイルオキシプロピ
ルトリメトキシシランの代わりに、ビニルトリメトキシ
シランを用いる以外は合成例1と同様にして製造した光
硬化性シリコーン(A) Component SC-1: Photocurable silicone SC-2 synthesized in Synthesis Example 1 3-acryloyloxypropyltriethoxysilane was used instead of 3-methacryloyloxypropyltrimethoxysilane in Synthesis Example 1. Photocurable silicone SC-3 produced in the same manner as in Synthesis Example 1 except that it is used: In the same manner as in Synthesis Example 1 except that vinyltrimethoxysilane is used instead of 3-methacryloyloxypropyltrimethoxysilane in Synthesis Example 1. Curable silicone
【0077】(B)成分
(B−1):下記モノマー混合物(計100g中)
・トリス(アクリロイルオキシエチル)イソシアヌレー
ト(商品名;アロニックスM−315、東亜合成化学工
業(株)製)40g
・ビス(アクリロイルオキシエチル)ヒドロキシエチル
イソシアヌレート(商品名;アロニックスM−215、
東亜合成化学工業(株)製)40g
・1,9−ノナンジオールジアクリレート(商品名;ビ
スコート#260、大阪有機化学工業(株)製)20g
(B−2):下記モノマー混合物(計100g中)
・イソホロンジイソシアネート1モルと2−ヒドロキシ
プロピルアクリレート2.1モルを反応させたウレタン
アクリレート(合成品)50g
・ジペンタエリスリトールペンタアクリレート(商品
名:DPHA、日本化薬(株)製)30g
・4−ヒドロキシブチルアクリレート、20g(B) Component (B-1): the following monomer mixture (in a total of 100 g): 40 g of tris (acryloyloxyethyl) isocyanurate (trade name: Aronix M-315, manufactured by Toa Gosei Chemical Industry Co., Ltd.) Bis (acryloyloxyethyl) hydroxyethyl isocyanurate (trade name; ARONIX M-215,
40 g of Toa Gosei Chemical Industry Co., Ltd. 20 g of 1,9-nonanediol diacrylate (trade name: Biscoat # 260, manufactured by Osaka Organic Chemical Industry Co., Ltd.) (B-2): The following monomer mixture (100 g in total) 50 g of urethane acrylate (synthetic product) obtained by reacting 1 mol of isophorone diisocyanate with 2.1 mol of 2-hydroxypropyl acrylate 30 g of dipentaerythritol pentaacrylate (trade name: DPHA, manufactured by Nippon Kayaku Co., Ltd.) -Hydroxybutyl acrylate, 20 g
【0078】(C)成分
(C−1):下記光開始剤混合物(計100g中)
・ベンゾフェノン、50g
・1−ヒドロキシシクロヘキシルフェニルケトン(商品
名:イルガキュア184、チバスペシャリティーケミカ
ルズ(株)製)50g
(C−2):下記光開始剤混合物(計100g中)
・2,4,6−トリメチルベンゾイルジフェニルホスフ
ィンオキサイド(商品名;Lucirin−TPO、B
ASF(株)製)40g
・メチルフェニルグリオキシレート(商品名;バイキュ
アー55、ストウファー(株)製)60g(C) Component (C-1): The following photoinitiator mixture (in a total of 100 g): benzophenone, 50 g; 1-hydroxycyclohexylphenyl ketone (trade name: Irgacure 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 50 g (C-2): The following photoinitiator mixture (in a total of 100 g): 2,4,6-trimethylbenzoyldiphenylphosphine oxide (trade name: Lucirin-TPO, B
ASF (manufactured by ASF) 40 g ・ Methylphenylglyoxylate (trade name; Vicure 55, manufactured by Stouffer) 60 g
【0079】(D)成分:下記有機溶剤混合物(計10
0g中)
(D−1):1−メトキシ−2−プロパノール100g
(D−2):イソ−ブチルアルコール50g、酢酸エチ
ル30g、 メチル−イソブチルケトン(MIBK)2
0gComponent (D): The following organic solvent mixture (total 10)
(D-1): 1-methoxy-2-propanol 100 g (D-2): iso-butyl alcohol 50 g, ethyl acetate 30 g, methyl-isobutyl ketone (MIBK) 2
0g
【0080】[0080]
【表1】 [Table 1]
【0081】[0081]
【表2】 [Table 2]
【0082】[0082]
【発明の効果】本発明の耐摩耗性薄膜を有する薄型物品
は、耐摩耗性と耐久性に優れるばかりでなく、光ディス
クを始めとする薄肉樹脂成形品の形状精度にも優れるも
のであり、耐摩耗性、耐久性、寸法精度等の要求の強い
光学関連部材、特に、光ディスク、ディスプレイ関連部
品、液晶関連部品、太陽電池関連部品などの用途に特に
有用である。The thin article having a wear-resistant thin film according to the present invention is excellent not only in wear resistance and durability but also in shape accuracy of a thin resin molded article such as an optical disk. It is particularly useful for optical-related members requiring strong abrasion, durability, dimensional accuracy, etc., particularly for optical discs, display-related parts, liquid-crystal-related parts, solar-cell-related parts, and the like.
フロントページの続き Fターム(参考) 4F006 AA12 AA15 AA22 AA35 AA36 AA38 AA39 AB64 AB65 AB66 AB67 AB68 BA02 CA01 DA04 EA03 4J011 AC04 CA01 CA08 CC10 PA13 PB16 PB40 QA03 QA12 QA13 QA14 QA15 QA18 QA22 QA23 QA24 QB03 SA02 SA16 SA19 SA20 SA22 SA25 SA26 SA32 SA34 SA42 SA53 SA61 SA76 SA79 SA83 SA84 VA01 VA10 4J038 DL031 DL101 FA012 FA241 GA15 HA446 KA04 KA06 NA11 PA17 PB08 PB11 PC08Continuation of front page F term (reference) 4F006 AA12 AA15 AA22 AA35 AA36 AA38 AA39 AB64 AB65 AB66 AB67 AB68 BA02 CA01 DA04 EA03 4J011 AC04 CA01 CA08 CC10 PA13 PB16 PB40 QA03 QA12 QA13 QA14 QA15 QA18 QA22 QA23 QA24 QB03 SA02 SA16 SA19 SA20 SA22 SA25 SA26 SA32 SA34 SA42 SA53 SA61 SA76 SA79 SA83 SA84 VA01 VA10 4J038 DL031 DL101 FA012 FA241 GA15 HA446 KA04 KA06 NA11 PA17 PB08 PB11 PC08
Claims (4)
子(固形分)40〜90重量部と、(a−2)下記の一
般式(I) 【化1】 (式中、Xはメタクリロイルオキシ基、アクリロイルオ
キシ基、又はビニルオキシ基をR1は炭素数0〜8の直
鎖型又は分岐型アルキル基を、 R2、R3は炭素数1〜
8の直鎖型又は分岐型アルキル基を、aは1〜3の正の
整数を、bは0〜2の正の整数を示し、a+bは1〜3
の正数である。)で示される単量体(固形分)10〜6
0重量部(ただし、(a−1)成分と(a−2)成分と
の合計量を100重量部とする)を加水分解し、縮合反
応して得られる光硬化性シリコーンの固形分10〜70
重量%と、(B)1分子中に少なくとも1個の(メタ)
アクリロイルオキシ基を有する単量体の少なくとも1種
30〜90重量%の合計量100重量部に対して、
(C)光重合開始剤0.01〜10重量部、(D)有機
溶剤の少なくとも1種30〜2000重量部からなる光
感応性被覆材組成物を基材上に塗布した後、含有する有
機溶剤(D)を揮発させ、光エネルギー照射により重合
硬化させた、膜厚3μm未満の硬化被膜を有することを
特徴とする、耐摩耗性薄膜を有する薄型物品。(A) (a-1) 40 to 90 parts by weight of colloidal silica fine particles (solid content), and (a-2) the following general formula (I): (Wherein X is a methacryloyloxy group, acryloyloxy group, or vinyloxy group, R 1 is a linear or branched alkyl group having 0 to 8 carbon atoms, and R 2 and R 3 are 1 to 3 carbon atoms.
8, a is a positive integer of 1 to 3, b is a positive integer of 0 to 2, a + b is 1 to 3,
Is a positive number. ) Monomer (solid content) 10-6
0 parts by weight (provided that the total amount of the components (a-1) and (a-2) is 100 parts by weight), and the solid content of the photocurable silicone obtained by the condensation reaction is 10 to 10 parts by weight. 70
% By weight, and (B) at least one (meth)
With respect to 100 parts by weight of a total amount of 30 to 90% by weight of at least one kind of a monomer having an acryloyloxy group,
(C) A photosensitive coating material composition comprising 0.01 to 10 parts by weight of a photopolymerization initiator and (D) 30 to 2,000 parts by weight of at least one kind of an organic solvent is applied on a substrate, and then the organic solvent is contained. A thin article having an abrasion-resistant thin film, characterized by having a cured film having a thickness of less than 3 μm, which is obtained by volatilizing a solvent (D) and polymerizing and curing by irradiation with light energy.
子(固形分)40〜90重量部と、(a−3)下記の一
般式(II) 【化2】 (式中、Xはメタクリロイルオキシ基、アクリロイルオ
キシ基、又はビニルオキシ基をR1は炭素数0〜8の直
鎖型又は分岐型アルキル基を、R2は炭素数1〜8の直
鎖型又は分岐型アルキル基を、aは1〜3の正の整数
を、bは0〜2の正の整数を示し、a+bは1〜3の正
数である。)で示される単量体の加水分解物(固形分)
10〜60重量部(ただし、(a−1)成分と(a−
3)成分との合計量を100重量部とする)を、縮合反
応して得られる光硬化性シリコーンの固形分10〜70
重量%と、(B)1分子中に少なくとも1個の(メタ)
アクリロイルオキシ基を有する単量体の少なくとも1種
30〜90重量%の合計量100重量部に対して、
(C)光重合開始剤0.01〜10重量部、(D)有機
溶剤の少なくとも1種30〜2000重量部からなる光
感応性被覆材組成物を基材上に塗布した後、含有する有
機溶剤(D)を揮発させ、光エネルギー照射により重合
硬化させた、膜厚3μm未満の硬化被膜を有することを
特徴とする、耐摩耗性薄膜を有する薄型物品。(A) (a-1) 40 to 90 parts by weight of colloidal silica fine particles (solid content) and (a-3) the following general formula (II): (In the formula, X is a methacryloyloxy group, an acryloyloxy group, or a vinyloxy group, R 1 is a linear or branched alkyl group having 0 to 8 carbon atoms, and R 2 is a linear or branched alkyl group having 1 to 8 carbon atoms. A is a positive integer of 1 to 3; b is a positive integer of 0 to 2; a + b is a positive number of 1 to 3; Object (solid content)
10 to 60 parts by weight (provided that the component (a-1) and the component (a-
3) The total amount of the photocurable silicone and the component is 100 parts by weight).
% By weight, and (B) at least one (meth)
With respect to 100 parts by weight of a total amount of 30 to 90% by weight of at least one kind of a monomer having an acryloyloxy group,
(C) A photosensitive coating material composition comprising 0.01 to 10 parts by weight of a photopolymerization initiator and (D) 30 to 2,000 parts by weight of at least one kind of an organic solvent is applied on a substrate, and then the organic solvent is contained. A thin article having an abrasion-resistant thin film, characterized by having a cured film having a thickness of less than 3 μm, which is obtained by volatilizing a solvent (D) and polymerizing and curing by irradiation with light energy.
ィスクである、請求項1及び請求項2記載の耐摩耗性薄
膜を有する薄型物品。3. The thin article having a wear-resistant thin film according to claim 1, wherein the thin article having a wear-resistant thin film is an optical disk.
求項1及び請求項2記載の耐摩耗性薄膜を有する薄型物
品。4. A thin article having a wear-resistant thin film according to claim 1, wherein the thickness of the substrate is less than 1.5 mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23751698A JP3436492B2 (en) | 1998-08-24 | 1998-08-24 | Thin article having a wear-resistant thin film and optical disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23751698A JP3436492B2 (en) | 1998-08-24 | 1998-08-24 | Thin article having a wear-resistant thin film and optical disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000063549A true JP2000063549A (en) | 2000-02-29 |
| JP3436492B2 JP3436492B2 (en) | 2003-08-11 |
Family
ID=17016491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23751698A Expired - Fee Related JP3436492B2 (en) | 1998-08-24 | 1998-08-24 | Thin article having a wear-resistant thin film and optical disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3436492B2 (en) |
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