JP2000048358A - Manufacturing method of magnetic recording medium - Google Patents
Manufacturing method of magnetic recording mediumInfo
- Publication number
- JP2000048358A JP2000048358A JP11233448A JP23344899A JP2000048358A JP 2000048358 A JP2000048358 A JP 2000048358A JP 11233448 A JP11233448 A JP 11233448A JP 23344899 A JP23344899 A JP 23344899A JP 2000048358 A JP2000048358 A JP 2000048358A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- recording medium
- head
- less
- disk substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
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- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は磁気ドラム、磁気テ
ープ、磁気ディスク、磁気カード等の磁気記録媒体およ
び磁気記録装置に係り、特に高密度磁気記録に好適な薄
膜媒体およびこれを用いた磁気記録装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium such as a magnetic drum, a magnetic tape, a magnetic disk, and a magnetic card and a magnetic recording apparatus, and more particularly to a thin film medium suitable for high-density magnetic recording and magnetic recording using the same. Related to the device.
【0002】[0002]
【従来の技術】近年における電子計算機の小型化・高速
化に伴い、磁気ディスク装置その他の外部記憶装置の大
容量化・高速アクセス化に対する要求が高まっている。
特に、磁気ディスク記録装置は高密度化・高速化に適し
た情報記憶装置であり、その需要が一段と強まりつつあ
る。磁気ディスク装置に用いられる記録媒体としては、
酸化物磁性体の粉末を基板上に塗布した媒体と、金属磁
性体の薄膜を基板上にスパッタ蒸着した薄膜媒体が開発
されている。この薄膜媒体は、例えば特開昭58−78
06号や特開昭60−111323号に示されるよう
に、塗布型の媒体に比べて磁気記録層に含まれる磁性体
の密度が高いため、高密度の記録再生に適している。2. Description of the Related Art In recent years, as electronic computers have become smaller and faster, there has been an increasing demand for large-capacity and high-speed access to magnetic disk devices and other external storage devices.
In particular, a magnetic disk recording device is an information storage device suitable for high-density and high-speed operation, and the demand for it is increasing. Recording media used in magnetic disk devices include:
A medium in which a powder of an oxide magnetic material is applied on a substrate and a thin film medium in which a thin film of a metal magnetic material is sputter-deposited on a substrate have been developed. This thin film medium is disclosed in, for example, Japanese Patent Application Laid-Open No. 58-78.
As described in JP-A No. 06 and JP-A-60-111323, the density of the magnetic substance contained in the magnetic recording layer is higher than that of the coating type medium, and thus it is suitable for high-density recording and reproduction.
【0003】また、磁気ヘッドの再生部に磁気抵抗効果
型(以後、MRと略記する)素子を用いることにより、再
生感度を従来の誘導型の磁気ヘッドより向上したMRヘ
ッドが開発されている(例えば、特開昭62−4061
0号や特開昭63−117309号に示される)。この
ヘッドを用いると記録ビットの面積が小さくても充分な
信号S/Nが得られるので、媒体の記録密度を飛躍的に
向上することができる。Further, an MR head has been developed in which the reproducing sensitivity is improved from that of a conventional inductive magnetic head by using a magnetoresistive effect (hereinafter abbreviated as MR) element in a reproducing section of the magnetic head (refer to FIG. 1). For example, Japanese Patent Application Laid-Open No. 62-4061
0 and JP-A-63-117309). If this head is used, a sufficient signal S / N can be obtained even if the area of the recording bit is small, so that the recording density of the medium can be dramatically improved.
【0004】薄膜媒体の基板にはアルミ合金、ガラス、
セラミックス、あるいは有機樹脂が用いられる。また、
ディスク基板の表面には硬度、平滑度等の加工成形性あ
るいは磁気特性向上の目的で、例えば厚さ約10μmの
Ni−Pメッキ層や陽極酸化膜が形成される。このよう
な基板表面に、国特許第4735840号、特開昭61
−29418号、特開昭62−146434号、特開昭
63−121123号、雑誌IEEE Trans. Magn.、 vol.
MAG-22 (5)、 p.579、 1986年、あるいは雑誌IEEE Tra
ns. Magn.、 vol. MAG-23 (5)、 p.3405 1987年に記載
されるような、微細な溝が略磁気ヘッド走行方向、例え
ば、略円周方向に形成される場合がある。この溝はテク
スチャーと称され、砥粒を用いて表面を略円周方向に切
削して形成され、溝の中心線平均粗さ(Ra)は従来、約
2nmから10nmの範囲であった。このようなテクス
チャーを形成すると磁気ヘッドが媒体と接触した時の摩
擦力が減少し、コンタクト・スタート・ストップ(以後
CSSと略記する)動作時にヘッドが媒体表面に粘着す
る問題が回避される。また、溝の中心線平均粗さ、下地
膜の膜厚、あるいは媒体の成膜条件を適正化すると磁気
ヘッド走行方向に磁界を印加して測定した磁性膜の磁気
特性、例えば保磁力Hc、残留磁化量Br、保磁力角形
比S*、あるいは基板面内に磁界を印加して基板面内で
試料を回転して測定した磁気異方性エネルギーKが、テ
クスチャーを形成しない場合に比べて向上し、記録再生
時のS/Nや分解能が向上する場合がある。さらに、媒
体成膜時の加熱温度や搬送方法によって略円周方向の磁
気特性が媒体面内で不均一となり、これによって再生出
力が媒体面内で変動する、モジュレーションと呼ばれる
問題がある。しかし、溝の深さ、下地膜の組成、成膜条
件等を適正化すると略円周方向の磁気特性が媒体面内で
均一化され、その結果、モジュレーションが抑制される
効果が認められている。[0004] Aluminum alloy, glass,
Ceramics or organic resins are used. Also,
On the surface of the disk substrate, for example, a Ni-P plating layer or an anodic oxide film having a thickness of about 10 [mu] m is formed for the purpose of improving workability such as hardness and smoothness or improving magnetic properties. On such a substrate surface, Japanese Patent No. 4735840,
-29418, JP-A-62-146434, JP-A-63-121123, magazine IEEE Trans. Magn., Vol.
MAG-22 (5), p.579, 1986, or IEEE Tra
ns. Magn., vol. MAG-23 (5), p. 3405 A fine groove may be formed in a substantially magnetic head running direction, for example, a substantially circumferential direction, as described in 1987. This groove is called a texture, and is formed by cutting the surface in a substantially circumferential direction using abrasive grains, and the center line average roughness (Ra) of the groove has conventionally been in the range of about 2 nm to 10 nm. By forming such a texture, the frictional force when the magnetic head comes into contact with the medium is reduced, and the problem of the head sticking to the medium surface during a contact start / stop (hereinafter abbreviated as CSS) operation is avoided. When the center line average roughness of the groove, the thickness of the base film, or the film forming conditions of the medium are optimized, the magnetic properties of the magnetic film measured by applying a magnetic field in the running direction of the magnetic head, such as the coercive force Hc, Magnetization Br, coercivity squareness ratio S *, or magnetic anisotropy energy K measured by applying a magnetic field in the substrate and rotating the sample in the substrate surface are improved as compared with the case where no texture is formed. In some cases, the S / N and resolution during recording and reproduction are improved. Furthermore, there is a problem called modulation, in which the magnetic properties in the substantially circumferential direction become non-uniform in the medium surface due to the heating temperature and the transport method at the time of forming the medium, and the reproduction output fluctuates in the medium surface. However, when the depth of the groove, the composition of the base film, the film forming conditions, and the like are optimized, the magnetic properties in the substantially circumferential direction are uniformed in the medium surface, and as a result, the effect of suppressing the modulation has been recognized. .
【0005】[0005]
【発明が解決しようとする課題】薄膜媒体の記録密度を
向上するには、図1に示す磁気ヘッドと記録媒体との間
隙(以後、ヘッド浮上量と略記する)を可能な限り小さく
することが重要である。これは、記録時には媒体内に急
峻な磁界分布が形成されるとともに、再生時には媒体か
らの磁束を感度良く検出することができ、再生出力の損
失を抑えることができるからである。しかし、テクスチ
ャー加工を行った媒体ではヘッド浮上量を小さくする
と、テクスチャーのない平滑な基板に比べて磁気ヘッド
が媒体に接触する頻度が増す。詳細な検討により、この
原因はテクスチャー加工により媒体表面に不規則で微細
な突起が不可避的に形成され、浮上量を小さくすると突
起が磁気ヘッドと接触するためであることがわかった。
一方、ヘッドと媒体との接触頻度を低減する方法として
は基板表面の突起を研磨工程により除去すること特開平
1−162229号に述べられている。しかし、この場
合にはヘッド走行方向に磁界を印加して測定した磁性膜
の磁気特性や異方性エネルギーが、突起を研磨する前に
比べて低下し、記録再生時のS/Nが低下し、モジュレ
ーションが発生する問題があった。In order to improve the recording density of a thin film medium, it is necessary to minimize the gap between the magnetic head and the recording medium shown in FIG. is important. This is because a steep magnetic field distribution is formed in the medium at the time of recording, and a magnetic flux from the medium can be detected with high sensitivity at the time of reproduction, and loss of the reproduction output can be suppressed. However, when the flying height of the head is reduced in a texture-processed medium, the frequency of contact of the magnetic head with the medium increases as compared to a smooth substrate having no texture. Detailed studies have revealed that this is because irregularities and fine projections are inevitably formed on the medium surface by texture processing, and the projections come into contact with the magnetic head when the flying height is reduced.
On the other hand, as a method for reducing the frequency of contact between the head and the medium, Japanese Patent Laid-Open No. 1-162229 discloses that projections on the substrate surface are removed by a polishing step. However, in this case, the magnetic properties and anisotropic energy of the magnetic film measured by applying a magnetic field in the head running direction are lower than before the protrusion is polished, and the S / N at the time of recording / reproduction is reduced. There was a problem that modulation occurred.
【0006】さらに、溝の深さが大きい場合には、情報
が記録されたトラックをヘッドが追従する際に必要な、
予め媒体に記録されたサーボ信号の均一性やS/Nが、
テクスチャーのない平滑な基板に比べて悪いため、トラ
ック密度を高めることができない問題もあった。Further, when the depth of the groove is large, the head needs to follow a track on which information is recorded,
The uniformity and S / N of the servo signal recorded on the medium in advance
There was also a problem that the track density could not be increased because it was worse than a smooth substrate without texture.
【0007】ヘッド浮上性やサーボ信号劣化の問題を解
決するには、溝の深さを小さくすることが有効である
が、雑誌IEEE Trans. Magn.、 vol. MAG-23 (5)、 p.34
05 1987年に述べられているように、溝の深さを小さく
するとヘッド走行方向に磁界を印加して測定した磁性膜
の磁気特性が低下する問題がある。ここで、磁気ヘッド
の走行方向に磁界を印加して測定した保磁力Hc(θ)
と、基板面内で磁気ヘッドの走行方向と略直角方向に磁
界を印加して測定した保磁力Hc(r)を用い、(Hc
(θ)−Hc(r)/Hc(θ)+Hc(r))により、磁気ヘ
ッド走行方向の保磁力Hcの配向比を定義する。To solve the problems of head flying characteristics and servo signal deterioration, it is effective to reduce the depth of the groove. However, the magazine IEEE Trans. Magn., Vol. MAG-23 (5), p. 34
05 As described in 1987, when the depth of the groove is reduced, there is a problem that the magnetic characteristics of the magnetic film measured by applying a magnetic field in the head traveling direction are deteriorated. Here, the coercive force Hc (θ) measured by applying a magnetic field in the running direction of the magnetic head
And the coercive force Hc (r) measured by applying a magnetic field in a direction substantially perpendicular to the running direction of the magnetic head in the plane of the substrate, and (Hc
(θ) −Hc (r) / Hc (θ) + Hc (r)) defines the orientation ratio of the coercive force Hc in the running direction of the magnetic head.
【0008】前述のHcの配向比は媒体の記録再生特性
と密接に関っている。詳細な実験の結果、線記録密度5
0kBPI(BPI=Bits Per Inchの
略)、トラック密度3kTPI(TPI=Tracks
Per Inchの略)の時に再生信号のS/Nとして
4以上を得るには、Hcの配向比は0.1以上、0.7以
下が好ましいことが見出された。また、基板面内に磁界
を印加して基板面内で試料を回転して測定された面内磁
気異方性エネルギーが3×104J/m3以上、5×10
5J/m3以下であると好ましいことが見出された。しか
し、従来の技術では溝の大きさを小さくして、Hcの配
向比を上記範囲に制御することは知られておらず、溝の
中心線平均粗さRaは3nmを上回る必要があった。The Hc orientation ratio is closely related to the recording / reproducing characteristics of the medium. As a result of detailed experiments, the linear recording density was 5
0 kBPI (BPI = abbreviation of Bits Per Inch), track density 3 kTPI (TPI = Tracks
In order to obtain a reproduction signal S / N of 4 or more at the time of Per Inch (abbreviation of Per Inch), it was found that the orientation ratio of Hc is preferably 0.1 or more and 0.7 or less. Further, the in-plane magnetic anisotropy energy measured by applying a magnetic field to the substrate and rotating the sample within the substrate is 3 × 10 4 J / m 3 or more and 5 × 10 4 J / m 3 or more.
It has been found that the content is preferably 5 J / m 3 or less. However, it is not known in the prior art to reduce the size of the groove to control the orientation ratio of Hc within the above range, and the center line average roughness Ra of the groove needs to exceed 3 nm.
【0009】以上の課題および状況を鑑み、本発明の第
一の目的は、ヘッドの安定走行が可能で、ヘッド走行方
向に高い磁気特性を有し、高密度記録時のS/Nが高い
媒体を提供することである。すなわち、ヘッドの浮上量
0.1μm以下において内周から外周までのヘッドシー
ク試験5万回後のビットエラー数が10ビット/面以
下、媒体のモジュレーションが10%以下、線記録密度
50kBPI、トラック密度3kTPIの時の再生信号
のS/Nの値が4以上の磁気記録媒体を提供することで
ある。さらに、第二の目的はこのような媒体を再現性良
く製造する方法を提供することであり、第三の目的は、
このような媒体を用いた大容量で信頼性の高い磁気記録
装置を提供することである。In view of the above problems and circumstances, it is a first object of the present invention to provide a medium capable of running a head stably, having high magnetic characteristics in the head running direction, and having a high S / N during high-density recording. It is to provide. That is, when the flying height of the head is 0.1 μm or less, the number of bit errors after 50,000 head seek tests from the inner circumference to the outer circumference is 10 bits / surface or less, the medium modulation is 10% or less, the linear recording density is 50 kBPI, and the track density is An object of the present invention is to provide a magnetic recording medium in which the value of S / N of a reproduced signal at 3 kTPI is 4 or more. Further, a second object is to provide a method for producing such a medium with good reproducibility, and a third object is to
An object of the present invention is to provide a large-capacity and highly reliable magnetic recording apparatus using such a medium.
【0010】[0010]
【課題を解決するための手段】本発明者らは媒体の微細
な表面形状と、ヘッド走行方向に磁界を印加して測定し
た磁気特性、面内磁気異方性エネルギー、記録再生特
性、ヘッド浮上性との関係を鋭意研究した結果、上記目
的は媒体表面のヘッドの走行方向に極めて微細な凹凸を
存在せしめることにより達成でき、ヘッド走行方向に磁
界を印加して測定した磁気特性、面内磁気異方性エネル
ギー、およびヘッドの安定浮上性に優れた媒体を提供で
きることを見出した。すなわち、磁気ヘッドの走行方向
と略直角方向に測定した媒体表面の中心線平均粗さRa
(r)の範囲は0.3nm以上、3nm以下であり、さら
に、前述のHcの配向比が0.1以上、0.7以下である
媒体を提供できることを見出した。また、磁気ヘッドの
走行方向と略直角方向に測定した表面中心線平均粗さR
a(r)の範囲が0.3nm以上、3nm以下であり、ヘ
ッド走行方向の磁化容易軸を有し、基板面内に磁界を印
加して基板面内で試料を回転して測定された磁気異方性
エネルギーが3×104J/m3以上、5×105J/m3
以下である媒体を提供できることを見出した。この時、
媒体表面の、ヘッド走行方向と略直角方向の距離1μm
あたりに存在する、深さ1nm以上の溝の平均本数が
0.5本以上、100本以下であることが好ましい。ま
た、媒体表面の最大高さRmax(r)とRa(r)との比
Rmax(r)/Ra(r)の値の範囲が10以上、30以
下であることが好ましい。また、略磁気ヘッド走行方向
に測定した中心線平均粗さRa(θ)と、それと略直角方
向に測定した中心線平均粗さRa(r)との比、Ra(r)
/Ra(θ)が1.1以上、3.0以下であることが好まし
い。Means for Solving the Problems The present inventors have studied the fine surface shape of a medium, the magnetic characteristics measured by applying a magnetic field in the head running direction, the in-plane magnetic anisotropic energy, the recording / reproducing characteristics, and the head floating. As a result of diligent research into the relationship between the magnetic properties and the in-plane magnetic properties, the above-mentioned object can be achieved by having extremely fine irregularities in the running direction of the head on the medium surface. It has been found that a medium excellent in anisotropic energy and stable flying characteristics of a head can be provided. That is, the center line average roughness Ra of the medium surface measured in a direction substantially perpendicular to the running direction of the magnetic head
It has been found that the range of (r) is 0.3 nm or more and 3 nm or less, and it is possible to provide a medium in which the orientation ratio of Hc is 0.1 or more and 0.7 or less. The surface center line average roughness R measured in a direction substantially perpendicular to the running direction of the magnetic head
The range of a (r) is not less than 0.3 nm and not more than 3 nm, has an axis of easy magnetization in the head running direction, and applies a magnetic field to the substrate surface to rotate the sample in the substrate surface. Anisotropic energy is 3 × 10 4 J / m 3 or more and 5 × 10 5 J / m 3
It has been found that the following media can be provided. At this time,
A distance of 1 μm on the medium surface in a direction substantially perpendicular to the head running direction
It is preferable that the average number of grooves having a depth of 1 nm or more present around 0.5 or more and 100 or less. Further, the range of the value of the ratio Rmax (r) / Ra (r) between the maximum height Rmax (r) and Ra (r) of the medium surface is preferably 10 or more and 30 or less. Also, the ratio of the center line average roughness Ra (θ) measured in the substantially magnetic head running direction to the center line average roughness Ra (r) measured in a direction substantially perpendicular thereto, Ra (r)
/ Ra (θ) is preferably 1.1 or more and 3.0 or less.
【0011】ここで、「中心線平均粗さ」、「最大高
さ」の使用は、日本工業規格(JIS−B0601)に規
定された定義に準拠する。また、中心線平均粗さ、およ
び最大高さは、例えば触針式あるいは光学式の表面粗さ
計、走査トンネル電子顕微鏡、原子間力顕微鏡、3次元
走査電子顕微鏡、あるいは透過電子顕微鏡により測定で
きる。触針式の表面粗さ計を用いる場合に再現性の良い
測定結果を得るためには図2に示すような触針の先端径
を0.5μm以下、好ましくは0.2μm以下とし、触針
の押しつけ荷重を4mg以下とし、触針走査速度を1μ
m/s以下とし、さらに、カットオフを0.5μm以
上、5μm以下とすることが好ましい。また、保護膜の
一部がエッチングや加熱等により加工されている場合
は、図2に示すように未加工部の表面を触針で走査する
ことにより溝の形状を測定でき、さらに保護膜全面が加
工されている場合には、保護膜のみをエッチングにより
除去して磁性膜表面の粗さを測定することが好ましい。Here, the use of "center line average roughness" and "maximum height" is based on the definition prescribed in Japanese Industrial Standards (JIS-B0601). The center line average roughness and the maximum height can be measured by, for example, a stylus or optical surface roughness meter, a scanning tunneling electron microscope, an atomic force microscope, a three-dimensional scanning electron microscope, or a transmission electron microscope. . In order to obtain a measurement result with good reproducibility when using a stylus type surface roughness meter, the tip diameter of the stylus as shown in FIG. 2 should be 0.5 μm or less, preferably 0.2 μm or less. Pressing load of 4mg or less and scanning speed of stylus 1μ
m / s or less, and the cutoff is preferably 0.5 μm or more and 5 μm or less. When a part of the protective film is processed by etching, heating, or the like, the shape of the groove can be measured by scanning the surface of the unprocessed portion with a stylus as shown in FIG. If the surface of the magnetic film is processed, it is preferable to measure only the roughness of the magnetic film surface by removing only the protective film by etching.
【0012】また、基板上にCr、Mo、Wもしくはこ
れらを主たる成分とする合金からなる下地層を膜厚5n
m〜500nm形成し、下地層の(100)または(11
0)結晶格子面が基板と平行となるよう結晶を配向成長
させると、ヘッド走行方向の磁気異方性を向上できるの
で好ましい。磁性層としてはCo、Fe、Niもしくは
これらを主たる成分とする合金が望ましく、特にCo−
Ni、Co−Cr、Co−Fe、Co−Mo、Co−
W、Co−Pt、Co−Re等の合金を主たる成分とす
る場合に良好な磁気特性が認められる。また、磁性層の
(110)結晶格子面が基板と略平行となるよう結晶を配
向成長させると磁気異方性が向上するので好ましい。ま
た、優れた耐食性や磁気特性を求める場合には、下地層
としてCr、Mo、あるいはWを主たる成分とし、N
b、Ti、Ta、Pt、Pd、Si、Fe、V、あるい
はPのいずれかを添加した合金を用い、さらに、磁性膜
を構成する磁性体としてCo−Ni−Zr、Co−Cr
−Pt、Co−Cr−Ta、Co−Ni−Crを主たる
成分とする合金を用いることが望ましい。また、磁性膜
がCr、Mo、W、V、Ta、Nb、Zr、Ti、B、
Be、C、あるいはNi−Pの少なくとも一つを主たる
成分とする非磁性中間層により、2層以上に多層化され
ると媒体ノイズが減少するので好ましい。さらに、磁性
膜の保護層としてカーボンを膜厚10nm〜50nm形
成し、さらに吸着性のパーフルオロアルキルポリエーテ
ル等の潤滑層を膜厚3nm〜20nm設けることにより
信頼性が高く、高密度記録が可能な磁気記録媒体が得ら
れる。また、保護層としてWC、(W−Mo)C等の炭化
物、(Zr−Nb)−N、Si3N4等の窒化物、Si
O2、ZrO2等の酸化物、あるいはB、B4C、Mo
S2、Rh等を用いると耐摺動性、耐食性を向上できる
ので好ましい。特に、これらの保護膜は成膜後に微細マ
スクを用いてプラズマエッチングすることで表面に微細
な凹凸を形成したり、化合物、混合物のターゲットを用
いて保護膜表面に突起を生じせしめたり、あるいは熱処
理によって表面に凹凸を形成することで、ヘッドと媒体
との接触面積を低減でき、CSS動作時にヘッドが媒体
表面に粘着する問題が回避されるので好ましい。上記磁
気記録媒体を形成するに当っては、中心線平均面粗さR
aが2nm以下の非磁性基板を、平均粒径1μm以下、
好ましくは0.5μm以下の研磨砥粒を含む研磨材によ
り略磁気ヘッド走行方向に研磨して溝を形成した後、物
理的蒸着手段によって直接、あるいは下地膜を介して磁
性層および保護層を形成し、磁気ヘッドの走行方向と略
直角方向に測定した表面中心線平均粗さRa(r)の範囲
を0.3nm以上、3nm以下とすると、ヘッドの浮上
量0.1μm以下におけるビットエラー数が低減できる
ので好ましい。また、上記磁気記録媒体を形成する他の
方法として、非磁性基板上に形成され、中心線平均面粗
さRaが2nm以下の下地膜を、平均粒径1μm以下、
好ましくは0.5μm以下の研磨砥粒を含む研磨材によ
り略磁気ヘッド走行方向に研磨して図2に示すように溝
を形成した後、物理的蒸着手段によって磁性層および保
護層を形成し、磁気ヘッドの走行方向と略直角方向に測
定した表面中心線平均粗さRa(r)の範囲が0.3nm
以上、3nm以下とすることが可能である。この時、砥
粒による研磨加工時間を過度に短く、あるいは長くせず
に最適に制御することが重要である。また、溝が互いに
交差するように形成することも有効である。こうするこ
とによりヘッド走行方向と略直角方向の距離1μmあた
りに存在する、深さ1nm以上の溝の平均本数を0.5
本以上、100本以下とすることが可能である。また、
Rmax(r)/Ra(r)の値の範囲を10以上、30以
下とすることが可能である。また、Ra(r)/Ra(θ)
の値の範囲を1.1以上、3.0以下とすることが可能で
あり、これらの効果によりHcの配向度や面内磁気異方
性エネルギーが向上する。An underlayer made of Cr, Mo, W or an alloy containing these as main components is formed on a substrate to a thickness of 5 n.
(100) or (11)
0) It is preferable to grow the crystal so that the crystal lattice plane is parallel to the substrate, because the magnetic anisotropy in the head running direction can be improved. For the magnetic layer, Co, Fe, Ni or an alloy containing these as main components is desirable.
Ni, Co-Cr, Co-Fe, Co-Mo, Co-
Good magnetic properties are observed when alloys such as W, Co-Pt, and Co-Re are the main components. In addition, the magnetic layer
It is preferable that the crystal is oriented and grown so that the (110) crystal lattice plane is substantially parallel to the substrate, since magnetic anisotropy is improved. When excellent corrosion resistance and magnetic properties are required, Cr, Mo, or W is used as a main component for the underlayer, and N
b, Ti, Ta, Pt, Pd, an alloy to which any of Si, Fe, V or P is added, and Co-Ni-Zr, Co-Cr as a magnetic material constituting the magnetic film
It is desirable to use an alloy containing -Pt, Co-Cr-Ta, and Co-Ni-Cr as main components. The magnetic film is made of Cr, Mo, W, V, Ta, Nb, Zr, Ti, B,
It is preferable to use a non-magnetic intermediate layer containing at least one of Be, C, and Ni-P as a main component to reduce the medium noise to two or more layers. Furthermore, by forming carbon as a protective layer of a magnetic film with a film thickness of 10 nm to 50 nm, and further providing a lubricating layer of an adsorbent perfluoroalkyl polyether or the like with a film thickness of 3 nm to 20 nm, high reliability and high density recording are possible. A magnetic recording medium can be obtained. Further, WC as a protective layer, (W-Mo) carbides such as C, (Zr-Nb) -N, Si 3 N nitrides such 4, Si
Oxides such as O 2 and ZrO 2 , or B, B 4 C and Mo
It is preferable to use S 2 , Rh, or the like because sliding resistance and corrosion resistance can be improved. In particular, these protective films are subjected to plasma etching using a fine mask after film formation to form fine irregularities on the surface, to form projections on the protective film surface using a compound or mixture target, or to perform heat treatment. By forming unevenness on the surface, the contact area between the head and the medium can be reduced, and the problem of the head sticking to the medium surface during the CSS operation is preferably avoided. In forming the magnetic recording medium, the center line average surface roughness R
a is a non-magnetic substrate having a diameter of 2 nm or less;
Preferably, the grooves are formed by polishing in a substantially magnetic head running direction with an abrasive containing abrasive grains of 0.5 μm or less, and then a magnetic layer and a protective layer are formed directly by physical vapor deposition means or via an underlayer. If the range of the surface center line average roughness Ra (r) measured in a direction substantially perpendicular to the running direction of the magnetic head is not less than 0.3 nm and not more than 3 nm, the number of bit errors in the flying height of the head of 0.1 μm or less is reduced. It is preferable because it can be reduced. Further, as another method for forming the magnetic recording medium, a base film formed on a non-magnetic substrate and having a center line average surface roughness Ra of 2 nm or less may be coated with an average particle diameter of 1 μm or less.
Preferably, the grooves are formed as shown in FIG. 2 by polishing substantially in the running direction of the magnetic head with an abrasive containing abrasive grains of 0.5 μm or less, and then the magnetic layer and the protective layer are formed by physical vapor deposition means. The range of surface center line average roughness Ra (r) measured in a direction substantially perpendicular to the running direction of the magnetic head is 0.3 nm.
As described above, the thickness can be set to 3 nm or less. At this time, it is important to optimally control the polishing processing time by the abrasive grains without making the polishing processing time excessively short or long. It is also effective to form the grooves so as to cross each other. This makes it possible to reduce the average number of grooves having a depth of 1 nm or more per 1 μm in a direction substantially perpendicular to the head running direction to 0.5.
More than 100 and less than 100 can be used. Also,
The range of the value of Rmax (r) / Ra (r) can be set to 10 or more and 30 or less. Also, Ra (r) / Ra (θ)
Can be set to 1.1 or more and 3.0 or less, and these effects improve the degree of orientation of Hc and the in-plane magnetic anisotropy energy.
【0013】本磁気記録媒体は磁性膜表面の凹凸に起因
するサーボ信号の揺らぎが極めて小さく高品位であるの
でヘッドの位置決め精度が向上する。また、再生部にM
R素子を有し、トラック幅が5μm以下の磁気ヘッドを
組合せることにより、媒体の線記録密度が50kBPI
以上で、記録トラック密度が3kTPI以上の大容量で
高信頼性の磁気記録装置を提供することができる。The magnetic recording medium of the present invention has a very small fluctuation of the servo signal due to the unevenness of the surface of the magnetic film and is of high quality, so that the positioning accuracy of the head is improved. Also, M
By combining a magnetic head having an R element and a track width of 5 μm or less, the linear recording density of the medium is reduced to 50 kBPI.
As described above, it is possible to provide a large-capacity, high-reliability magnetic recording device having a recording track density of 3 kTPI or more.
【0014】本発明者らは平均粒径を0.1〜10μm
としたダイアモンド、アルミナ、セリア砥粒を含む液体
もしくはテープ状加工材を用いて、Ni−PメッキAl
合金、ガラス、Ti、Si、カーボン、ZrO2等の、
表面中心線平均粗さが約1nm以下の非磁性基板を研磨
圧力、時間、研磨法などを変えて研磨してヘッド走行方
向に微細な溝を設け、この上に直接もしくは下地膜を介
して磁性膜、保護潤滑膜等を形成して、浮上性、磁気特
性、記録再生特性を検討した。また、表面中心線平均粗
さRaが約1nmの非磁性基板にCr下地膜を形成し、
その表面を上記研磨条件で研磨してヘッド走行方向に微
細な溝を設け、この上に磁性膜、保護潤滑膜等を形成し
て、浮上性、磁気特性、記録再生特性等を検討した。そ
の結果、従来は円周方向の磁気異方性を高めるために
は、ヘッドの浮上性を犠牲にしても溝のRaを3nmを
上回る大きい値とする必要があったが、このような常識
とは全く異なり、磁性膜表面に現われる溝の粗さを小さ
くしてもヘッド走行方向に優れた磁気異方性を確保で
き、さらに、浮上性も極めて優れた媒体を提供できるこ
とを見出した。これは以下に述べる作用による。すなわ
ち、加工砥粒の平均粒径を1μm以下、好ましくは0.
5μm以下とするとともに、砥粒加工時間、砥粒加工圧
力により磁性膜表面のRa(r)を制御すると、図3に示
すように0.3nm≦Ra≦3nmの範囲で保磁力のヘ
ッド走行方向の配向比が0.1以上、0.7以下に向上す
る。一方、Raが3nmを超えるとヘッド走行方向の磁
気異方性やヘッド浮上性が低下する。このように小さい
粗さの、微細な溝を形成した媒体でも高い保磁力配向比
が得られる理由は、研磨時の砥粒の切削能力が加工の初
期において最も優れており、また、溝の密度が高くなる
ためである。中心線平均粗さが1nmの平滑な基板をテ
クスチャー加工すると、図4に示すように加工時間が増
すに従いヘッド走行方向と略直角方向のRa(r)が顕著
に増大するが、ヘッド走行方向の面粗さRa(θ)の変化
はRa(r)に比べて緩慢である。このようにRa(r)が
急激に変化する初期の加工時間領域において最も有効に
砥粒が研磨に作用しており、この時に高密度で、結晶粒
程度の大きさの良好な溝が形成される。こうすることに
よりヘッド走行方向と略直角方向の距離1μmあたりに
存在する、深さ1nm以上の溝の平均本数を0.5本以
上、100本以下とすることが可能である。また、Rm
ax(r)/Ra(r)の値の範囲を10以上、30以下と
することが可能である。また、Ra(r)/Ra(θ)の値
の範囲を1.1以上、3.0以下とすることが可能であ
り、これらの効果によりHcの配向度や面内磁気異方性
エネルギーが向上する。従来のように、大きい砥粒径を
用いて加工時間を長くすると媒体表面に異常な突起やバ
リなどが出てヘッド浮上性が低下する上、Hcの配向度
や面内磁気異方性エネルギーが低下する。The present inventors set the average particle size to 0.1 to 10 μm.
Ni-P plating Al using liquid or tape-like processing material containing diamond, alumina, ceria abrasive grains
Alloys, glass, Ti, Si, carbon, ZrO 2 etc.
A non-magnetic substrate having a surface center line average roughness of about 1 nm or less is polished by changing the polishing pressure, time, polishing method, etc., and a fine groove is provided in the head running direction. A film, a protective lubricating film, and the like were formed, and the levitation, magnetic characteristics, and recording / reproducing characteristics were examined. Further, a Cr underlayer is formed on a nonmagnetic substrate having a surface center line average roughness Ra of about 1 nm,
The surface was polished under the above polishing conditions to form fine grooves in the head running direction, and a magnetic film, a protective lubricating film, and the like were formed thereon, and flying characteristics, magnetic characteristics, recording / reproducing characteristics, etc. were examined. As a result, conventionally, in order to increase the magnetic anisotropy in the circumferential direction, it was necessary to increase the Ra of the groove to a large value exceeding 3 nm even at the expense of the flying property of the head. The present inventors have found that even when the roughness of the groove appearing on the surface of the magnetic film is reduced, it is possible to provide a medium having excellent magnetic anisotropy in the head running direction and further excellent flying property. This is due to the operation described below. That is, the average particle size of the processing abrasive grains is 1 μm or less, preferably 0.1 μm.
When the Ra (r) of the magnetic film surface is controlled by the abrasive grain processing time and the abrasive grain processing pressure while controlling the grain size to 5 μm or less, the head traveling direction of the coercive force in the range of 0.3 nm ≦ Ra ≦ 3 nm as shown in FIG. Is improved to 0.1 or more and 0.7 or less. On the other hand, when Ra exceeds 3 nm, the magnetic anisotropy in the head traveling direction and the head flying property decrease. The reason why a high coercive force orientation ratio can be obtained even with a medium having such a small roughness and a fine groove is that the cutting ability of abrasive grains during polishing is most excellent in the initial stage of processing, and the groove density is high. This is because When texture processing is performed on a smooth substrate having a center line average roughness of 1 nm, Ra (r) in a direction substantially perpendicular to the head traveling direction increases remarkably as the processing time increases, as shown in FIG. The change of the surface roughness Ra (θ) is slower than that of Ra (r). As described above, the abrasive grains most effectively act on the polishing in the initial processing time region in which Ra (r) changes abruptly. At this time, a good groove having a high density and a size of about a crystal grain is formed. You. By doing so, the average number of grooves having a depth of 1 nm or more and existing at a distance of 1 μm in a direction substantially perpendicular to the head traveling direction can be set to 0.5 or more and 100 or less. Also, Rm
The value range of ax (r) / Ra (r) can be set to 10 or more and 30 or less. Further, the range of the value of Ra (r) / Ra (θ) can be set to 1.1 or more and 3.0 or less, and by these effects, the degree of orientation of Hc and the in-plane magnetic anisotropy energy are reduced. improves. As in the past, if the processing time is extended by using a large abrasive grain size, abnormal protrusions or burrs appear on the medium surface, leading to a decrease in head buoyancy, and the degree of orientation of Hc and in-plane magnetic anisotropy energy are reduced. descend.
【0015】さらに、磁性層の(110)結晶格子面が基
板と略平行となるよう結晶を配向成長せしめるとヘッド
走行方向の配向比、面内磁気異方性エネルギーが向上す
る上、下地膜を設ける場合に(100)または(110)結
晶格子面が基板と略平行となるよう配向成長せしめると
上記磁性膜の配向成長が促進されるので好ましい。さら
に、上記媒体の磁性膜をCr、Mo、W、V、Ta、N
b、Zr、Ti、B、Be、C、Ni−Pの少なくとも
一つを主たる成分とする非磁性中間層により多層化する
と、一層の膜厚が小さくなり各層からの媒体ノイズの和
が単層の磁性膜のノイズより大幅に小さくなり、特にM
R再生素子を有する磁気ヘッドを用いた場合に装置のS
/Nが著しく向上するので好ましい。本発明による媒体
では磁化遷移領域における磁化のゆらぎの大きさが極め
て小さいため媒体ノイズが小さく、トラック幅が5μm
以下の高記録用磁気ヘッドで記録再生した場合に50k
BPI以上の高い記録密度においてS/Nが4以上、さ
らに、オーバーライト(O/W)特性が26dB以上の大
容量磁気記録装置が得られる。特に、磁性膜表面の凹凸
が従来より小さいために、3kTPI以上の高記録密度
時でもサーボ信号の品位が高く、良好なヘッド位置決め
ができるので好ましい。Further, when the crystal is oriented and grown so that the (110) crystal lattice plane of the magnetic layer is substantially parallel to the substrate, the orientation ratio in the head running direction and the in-plane magnetic anisotropy energy are improved, and the underlying film is formed. In the case where the magnetic film is provided, it is preferable to perform the orientation growth so that the (100) or (110) crystal lattice plane is substantially parallel to the substrate because the orientation growth of the magnetic film is promoted. Further, the magnetic film of the medium is made of Cr, Mo, W, V, Ta, N
When a multilayer is formed by a non-magnetic intermediate layer containing at least one of b, Zr, Ti, B, Be, C, and Ni-P as a main component, the thickness of one layer becomes small, and the sum of medium noise from each layer becomes a single layer. Significantly smaller than the noise of the magnetic film of
When a magnetic head having an R reproducing element is used, the S
/ N is preferred because the ratio of N / N is significantly improved. In the medium according to the present invention, the fluctuation of the magnetization in the magnetization transition region is extremely small, so that the medium noise is small and the track width is 5 μm.
50k when recording / reproducing with the following high recording magnetic head
At a high recording density of BPI or higher, a large-capacity magnetic recording apparatus having an S / N of 4 or higher and an overwrite (O / W) characteristic of 26 dB or higher can be obtained. In particular, the unevenness of the surface of the magnetic film is smaller than before, so that the quality of the servo signal is high even at a high recording density of 3 kTPI or more, and good head positioning can be performed.
【0016】[0016]
【発明の実施の形態】以下、実施例により本発明をさら
に詳細に説明する。図5は、本発明に係る薄膜媒体の断
面構造を模式的に示したものである。同図において、符
号51はAl−Mg合金、化学強化ガラス、有機樹脂、
Ti、Si、カーボンあるいはセラミックス等からなる
基板、52および52’は基板51の両面に形成したN
i−P、Ni−W−P等からなる非磁性メッキ層であ
る。Al−Mg合金を基板として用いた場合には通常、
このようなメッキ層を備えたものを基板として使用す
る。53および53’はCr、Mo、W、またはこれら
のいずれかを主な成分とする合金からなる金属下地膜、
54および54’は当該下地膜の上に形成したCo−N
i、Co−Cr、Co−Re、Co−Pt、Co−P、
Co−Fe、Co−Ni−Zr、Co−Cr−Pt−
B、Co−Cr−Al、Co−Cr−Ta、Co−Cr
−Pt、Co−Ni−Cr、Co−Cr−Nb、Co−
Ni−P、Co−Ni−Pt、Co−Cr−Si等から
なる金属磁性層、55および55’は当該磁性膜の上に
形成したカーボン、ボロン、B4C、SiC、SiO2、
Si3N4、WC、(W−Mo)C、(W−Zr)C等からな
る非磁性保護膜をそれぞれ示す。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in more detail by way of examples. FIG. 5 schematically shows a cross-sectional structure of the thin film medium according to the present invention. In the figure, reference numeral 51 denotes an Al-Mg alloy, chemically strengthened glass, organic resin,
Substrates made of Ti, Si, carbon, ceramics, or the like;
This is a nonmagnetic plating layer made of iP, Ni-WP, or the like. When an Al-Mg alloy is used as a substrate,
A substrate provided with such a plating layer is used as a substrate. 53 and 53 ′ are Cr, Mo, W, or a metal base film made of an alloy containing any of these as a main component;
54 and 54 'are Co-N layers formed on the underlying film.
i, Co-Cr, Co-Re, Co-Pt, Co-P,
Co-Fe, Co-Ni-Zr, Co-Cr-Pt-
B, Co-Cr-Al, Co-Cr-Ta, Co-Cr
-Pt, Co-Ni-Cr, Co-Cr-Nb, Co-
Ni-P, Co-Ni- Pt, metallic magnetic layer made of Co-Cr-Si or the like, carbon 55 and 55 'are formed on the said magnetic film, boron, B 4 C, SiC, SiO 2,
Non-magnetic protective films made of Si 3 N 4 , WC, (W-Mo) C, (W-Zr) C and the like are shown, respectively.
【0017】〈実施例1〉外径95mm、内径25m
m、厚さ0.8mmのAl−4Mg(原子記号の前に付し
た数字は当該素材の含有量を示す。含有量の単位は重量
%)からなるディスク基板の両面にNi−12Pからな
るメッキ層を膜厚が13μmとなるよう形成した。この
非磁性基板の表面を、ラッピングマシンを用いて表面中
心線平均粗さRaが2nmとなるまで平滑に研磨し、洗
浄、さらに乾燥した。その後、テープポリッシングマシ
ン(例えば、特開昭62−262227号に記載)を用
い、砥粒の存在下で研磨テープをコンタクトロールを通
して、ディスク基板51を回転させながらディスク面の
両側に押しつけることにより、ディスク基板表面に略円
周方向のテクスチャーを形成した。この時、砥粒の平均
粒径、加工時間およびコンタクトロールで研磨テープを
加圧する圧力を制御することにより、媒体表面のRa
(r)を変化させた。さらに、基板に付着した研磨剤等の
汚れを洗浄・除去して乾燥した。このように形成された
ディスク基板をマグネトロンスパッタリング装置内で2
50℃まで真空中で昇温し、2mTorrのアルゴン圧
の条件のもとで膜厚50nmのCr下地膜を形成した。
この下地膜の上に86Co−10Cr−4Ta(原子%)
からなる膜厚30nmの金属磁性膜を積層した。その
後、磁性膜上に膜厚30nmのカーボン保護膜を形成
し、最後に当該保護膜上に吸着性のパーフルオロアルキ
ルポリエーテル等の潤滑層を形成した。こうして形成さ
れた磁気記録媒体をX線回折により分析した結果、Cr
下地膜では(100)あるいは(110)結晶面が基板と略
並行となるように結晶が配向成長していた。また、磁性
層では(110)面が基板と略並行となるよう配向成長し
ていた。<Example 1> Outer diameter 95 mm, inner diameter 25 m
m, 0.8 mm thick Al-4Mg (the number in front of the atomic symbol indicates the content of the material; the unit of the content is% by weight). The layer was formed to have a thickness of 13 μm. The surface of this non-magnetic substrate was polished smoothly using a lapping machine until the surface center line average roughness Ra became 2 nm, washed, and further dried. Thereafter, by using a tape polishing machine (for example, described in JP-A-62-262227), a polishing tape is passed through a contact roll in the presence of abrasive grains, and pressed against both sides of the disk surface while rotating the disk substrate 51. A substantially circumferential texture was formed on the disk substrate surface. At this time, by controlling the average particle diameter of the abrasive grains, the processing time, and the pressure for pressing the polishing tape with the contact roll, the Ra of the medium surface is controlled.
(r) was changed. Further, dirt such as an abrasive adhered to the substrate was washed and removed, and dried. The disk substrate thus formed is placed in a magnetron sputtering apparatus for 2 hours.
The temperature was raised to 50 ° C. in a vacuum to form a 50 nm-thick Cr underlayer under the conditions of an argon pressure of 2 mTorr.
86Co-10Cr-4Ta (atomic%)
A 30 nm-thick metal magnetic film made of Thereafter, a carbon protective film having a thickness of 30 nm was formed on the magnetic film, and finally a lubricating layer made of adsorbable perfluoroalkyl polyether was formed on the protective film. The magnetic recording medium thus formed was analyzed by X-ray diffraction.
In the underlayer, crystals were oriented and grown so that the (100) or (110) crystal plane was substantially parallel to the substrate. In the magnetic layer, the (110) plane was oriented and grown so as to be substantially parallel to the substrate.
【0018】こうして形成した媒体表面の磁気ヘッド走
行方向に測定した中心線平均粗さRa(θ)、およびそれ
と直角方向に測定した中心線平均粗さRa(r)を、針先
径0.2μmの触針式表面粗さ計を用いて求めた。この
時、触針の押しつけ荷重を4mg、触針走査速度を1μ
m/s、カットオフを4.5μmとした。さらに、ヘッ
ド媒体相対速度12m/s、浮上スペーシング0.08
μmにおいて、実効ギャップ長0.4μm、トラック幅
5μm、MR素子を用いた記録再生分離型の薄膜磁気ヘ
ッドを用いて、内周から外周までのヘッドシーク試験5
万回後のビットエラー数、モジュレーション(Md)、お
よび線記録密度50kBPI、トラック密度3kTPI
の時の再生信号のS/Nの値を求めた。ここでモジュレ
ーションMdはディスク面内における最大出力Hおよび
最低出力Lとにより、Md=(H−L)/(H+L)により
定義した。また、最大印加磁界14kOeの振動式磁化
測定機(VSM)あるいは非破壊磁気測定機により、磁気
ヘッドの走行方向に磁界を印加した時の保磁力Hc(θ)
と、基板面内で磁気ヘッドの走行方向と略直角な方向に
磁界を印加した時の保磁力Hc(r)を求めた。また、最
大印加磁界14kOeのトルクメーターにより、基板面
内に磁界を印加して基板面内で試料を回転することによ
り面内磁気異方性エネルギーKを求めた。The center line average roughness Ra (θ) measured in the running direction of the magnetic head on the surface of the medium thus formed and the center line average roughness Ra (r) measured in a direction perpendicular to the center line are 0.2 μm in diameter. Using a stylus type surface roughness meter. At this time, the pressing load of the stylus was 4 mg, and the stylus scanning speed was 1 μm.
m / s, and the cutoff was 4.5 μm. Further, the relative velocity of the head medium is 12 m / s, and the flying spacing is 0.08.
In μm, a head seek test from the inner circumference to the outer circumference was performed using an effective gap length of 0.4 μm, a track width of 5 μm, and a read / write separated thin film magnetic head using an MR element.
Number of bit errors after 10,000 times, modulation (Md), linear recording density 50 kBPI, track density 3 kTPI
The value of S / N of the reproduced signal at the time of was obtained. Here, the modulation Md is defined as Md = (HL) / (H + L) by the maximum output H and the minimum output L in the disk surface. The coercive force Hc (θ) when a magnetic field is applied in the running direction of the magnetic head by a vibrating magnetometer (VSM) or a non-destructive magnetometer with a maximum applied magnetic field of 14 kOe.
And a coercive force Hc (r) when a magnetic field was applied in a direction substantially perpendicular to the running direction of the magnetic head in the plane of the substrate. The in-plane magnetic anisotropy energy K was determined by applying a magnetic field within the substrate surface and rotating the sample within the substrate surface using a torque meter with a maximum applied magnetic field of 14 kOe.
【0019】図3に示すように媒体表面の中心線平均粗
さRa(r)が3nmを上回る従来例に比べて、平均粒径
1μm以下の砥粒を用いてテクスチャーを形成し、表面
粗さを0.3nm≦Ra(r)≦3nmとした媒体は前述の
保磁力配向比が0.1以上、0.7以下と顕著に高くなっ
た。また、図6に示すように中心線平均粗さRa(r)が
3nmを上回る従来例に比べて、平均粒径1μm以下の
砥粒を用いてテクスチャーを形成し、表面粗さを0.3
nm≦Ra(r)≦3nmとした媒体は面内の磁気異方性
エネルギーKが3×104J/m3以上、5×105J/
m3以下と高くなった。このような微細な溝を形成した
媒体のヘッド走行方向と略直角方向の距離1μmあたり
に存在する、深さ1nm以上の溝の平均本数は0.5本
以上、100本以下、Rmax(r)/Ra(r)の値の範
囲は10以上、30以下、さらに、Ra(r)/Ra(θ)
の値の範囲は1.1以上、3.0以下であった。また、ヘ
ッド浮上量0.08μmにおいて内周から外周までのヘ
ッドシーク試験5万回後のビットエラー数は10ビット
/面以下、媒体のモジュレーションMdは10%以下、
線記録密度50kBPI、トラック密度3kTPIの時
のS/Nの値は4以上であった。一方、Ra(r)が3n
m以上の従来の磁気記録媒体ではヘッド浮上性が劣り、
ヘッドの浮上量0.08μmにおいてヘッドシーク試験
5万回後のビットエラー数は15ビット/面以上であっ
た。As shown in FIG. 3, a texture is formed using abrasive grains having an average particle diameter of 1 μm or less, as compared with a conventional example in which the center line average roughness Ra (r) of the medium surface exceeds 3 nm. The medium with 0.3 nm ≦ Ra (r) ≦ 3 nm had a remarkably high coercive force orientation ratio of 0.1 or more and 0.7 or less. Further, as shown in FIG. 6, a texture is formed using abrasive grains having an average particle diameter of 1 μm or less, and the surface roughness is reduced to 0.3 as compared with a conventional example having a center line average roughness Ra (r) of more than 3 nm.
The medium in which nm ≦ Ra (r) ≦ 3 nm has an in-plane magnetic anisotropy energy K of 3 × 10 4 J / m 3 or more and 5 × 10 5 J /.
m 3 was below the high. The average number of grooves having a depth of 1 nm or more and present at a distance of 1 μm in a direction substantially perpendicular to the head running direction of the medium having such fine grooves is 0.5 or more, 100 or less, and Rmax (r) The range of the value of / Ra (r) is 10 or more and 30 or less, and further, Ra (r) / Ra (θ)
Range was 1.1 or more and 3.0 or less. Further, at a head flying height of 0.08 μm, the number of bit errors after 50,000 times of the head seek test from the inner circumference to the outer circumference is 10 bits / surface or less, the modulation Md of the medium is 10% or less,
When the linear recording density was 50 kBPI and the track density was 3 kTPI, the S / N value was 4 or more. On the other hand, Ra (r) is 3n
m or more of the conventional magnetic recording medium, the head levitation is inferior,
At a head flying height of 0.08 μm, the number of bit errors after 50,000 head seek tests was 15 bits / surface or more.
【0020】同様の微細な溝を形成した基板を用い、下
地膜としてCr、Mo、W、Nb、Taもしくはこれを
主たる成分とする合金からなる下地膜を膜厚5nm以
上、500nm以下で形成した場合も同様の表面粗さ、
磁気異方性、および記録再生特性が得られた。また、図
2に示すように磁性膜をCr、Mo、W、V、Ta、N
b、Zr、Ti、B、Be、C、Ni−Pの少なくとも
一つの元素を主たる成分とする非磁性中間層により2層
以上に多層化した場合には、媒体からのノイズは単層の
磁性膜を用いた場合に比べて30%低減し、S/Nの値
として5以上が得られた。Using a substrate on which similar fine grooves were formed, a base film made of Cr, Mo, W, Nb, Ta or an alloy containing these as main components was formed with a film thickness of 5 nm or more and 500 nm or less. Similar surface roughness,
Magnetic anisotropy and recording / reproducing characteristics were obtained. Further, as shown in FIG. 2, the magnetic film is made of Cr, Mo, W, V, Ta, N
When a non-magnetic intermediate layer containing at least one of b, Zr, Ti, B, Be, C, and Ni-P as a main component is formed into two or more layers, noise from the medium is a single-layer magnetic layer. It was reduced by 30% as compared with the case where the film was used, and an S / N value of 5 or more was obtained.
【0021】〈実施例2〉実施例1と同様の装置を用
い、テクスチャーを形成する際に用いる砥粒の平均粒径
を0.5μmとして、加工時間、加工方向およびコンタ
クトロールで研磨テープを加圧する圧力を制御すること
により、媒体表面のRa(r)を0.5μm以上、1.0μ
m以下とし、媒体表面のヘッド走行方向と直角方向距離
1μm当りに存在する深さ1nm以上の溝の平均本数N
を変化させた。溝の平均本数Nと、前述の保磁力配向
比、および面内磁気異方性エネルギーKとの関係を図7
に示す。Nが0.5以上、100以下では配向比は0.1
5以上、0.7以下となり、面内磁気異方性エネルギー
は4×104J/m3以上、5×105J/m3以下となった。この
ような微細な溝を形成した媒体のRmax(r)/Ra
(r)の値の範囲は10以上、30以下、Ra(r)/Ra
(θ)の値の範囲は1.1以上、3.0以下であった。ま
た、ヘッド浮上量0.08μmにおいて内周から外周ま
でのヘッドシーク試験5万回後のビットエラー数は10
ビット/面以下、媒体のモジュレーションは10%以下
であり、線記録密度50kBPI、トラック密度3kT
PIの時のS/Nの値は4以上であった。<Embodiment 2> Using the same apparatus as in Embodiment 1, the average grain size of the abrasive grains used for forming the texture was set to 0.5 μm, and a polishing tape was applied with a processing time, a processing direction, and a contact roll. By controlling the pressure to be applied, Ra (r) on the medium surface is set to 0.5 μm or more and 1.0 μm or more.
m or less, and the average number N of grooves having a depth of 1 nm or more per 1 μm in the direction perpendicular to the head running direction on the medium surface.
Was changed. The relationship between the average number N of grooves, the coercive force orientation ratio, and the in-plane magnetic anisotropy energy K is shown in FIG.
Shown in When N is 0.5 or more and 100 or less, the orientation ratio is 0.1.
It was 5 or more and 0.7 or less, and the in-plane magnetic anisotropy energy was 4 × 10 4 J / m 3 or more and 5 × 10 5 J / m 3 or less. Rmax (r) / Ra of the medium having such fine grooves formed thereon
The range of the value of (r) is 10 or more and 30 or less, and Ra (r) / Ra
The range of the value of (θ) was 1.1 or more and 3.0 or less. Further, when the head flying height is 0.08 μm, the number of bit errors after 50,000 times of the head seek test from the inner circumference to the outer circumference is 10
Bit / surface or less, medium modulation is 10% or less, linear recording density 50 kBPI, track density 3 kT
The value of S / N at the time of PI was 4 or more.
【0022】〈実施例3〉外径65mm、内径20m
m、厚さ0.4mm、表面粗さ1nmのガラスディスク
基板の両面に、実施例1と同様のスパッタリング装置、
および条件により、図2に示すように膜厚1μmのCr
下地膜を形成した。さらに真空チャンバ内でCr下地膜
表面を砥粒平均径1μm以下の研磨剤を含む研磨テープ
により研磨し、略円周方向のテクスチャーを形成した。
Cr下地膜表面のRaは0.8nm、溝の平均本数Nは
0.7であった。この上に膜厚50nmの90Cr−1
0Ti(原子%)下地膜を形成し、さらに、膜厚15nm
の84Co−12Cr−4Pt(原子%)磁性膜、膜厚
2.5nmのCr中間膜、さらに膜厚15nmの84C
o−12Cr−4Ta(原子%)磁性膜を形成した。その
後、膜厚30nmのカーボン保護膜を形成した。さら
に、カーボン保護膜表面に、開口部の平均距離が50μ
m以上、100μm以下のエッチングマスクを設け、マ
スクに覆われない領域のカーボン保護膜を酸素プラズマ
エッチングにより深さ15nmエッチングした。その結
果、図2に示すように、カーボン保護膜表面に平均径5
0μm以上、100μm以下の島状の凹凸が形成され
た。最後に当該保護膜上に吸着性のパーフルオロアルキ
ルポリエーテル等の潤滑層を形成した。本媒体の保護膜
の島状部上の中心線平均粗さRa(r)は1.0nmであ
り、面内の磁気異方性エネルギーKは3.5×104J/m3
であった。また、ヘッド走行方向と略直角方向の距離1
μmあたりに存在する、深さ1nm以上の溝の平均本数
は0.7本、Rmax(r)/Ra(r)の値は12、さら
に、Ra(r)/Ra(θ)の値は1.6であった。また、
ヘッドの浮上量0.1μmにおいて内周から外周までの
ヘッドシーク試験5万回後のビットエラー数は10ビッ
ト/面以下、媒体のモジュレーションMdは10%以
下、線記録密度90kBPI、トラック密度4kTPI
の時のS/Nの値は4.5であった。また、媒体が停止
したときにヘッドが媒体と接触しないロードアンロード
方式では、本媒体は実施例1に述べた媒体と同等の耐摺
動信頼性を示したが、CSS方式でヘッドを浮上させた
場合には実施例1の媒体よりヘッドの粘着を低減するこ
とができ、信頼性が向上した。<Embodiment 3> Outer diameter 65 mm, inner diameter 20 m
m, a thickness of 0.4 mm, a surface roughness of 1 nm on both surfaces of a glass disk substrate, the same sputtering apparatus as in Example 1,
Depending on the conditions and conditions, as shown in FIG.
An underlayer was formed. Further, the surface of the Cr underlayer was polished with a polishing tape containing an abrasive having an average grain diameter of 1 μm or less in a vacuum chamber to form a texture in a substantially circumferential direction.
The Ra on the surface of the Cr underlayer was 0.8 nm, and the average number N of grooves was 0.7. On this, 90Cr-1 having a thickness of 50 nm is formed.
0Ti (atomic%) base film is formed, and the film thickness is further reduced to 15 nm.
84Co-12Cr-4Pt (atomic%) magnetic film, a 2.5 nm thick Cr intermediate film, and a 15 nm thick 84C
An o-12Cr-4Ta (atomic%) magnetic film was formed. Thereafter, a carbon protective film having a thickness of 30 nm was formed. Further, the average distance of the opening is 50 μm on the surface of the carbon protective film.
An etching mask of not less than m and not more than 100 μm was provided, and the carbon protective film in a region not covered by the mask was etched by oxygen plasma etching to a depth of 15 nm. As a result, as shown in FIG.
Island-like irregularities of 0 μm or more and 100 μm or less were formed. Finally, a lubricating layer such as an adsorbent perfluoroalkyl polyether was formed on the protective film. The center line average roughness Ra (r) on the island portion of the protective film of this medium is 1.0 nm, and the in-plane magnetic anisotropy energy K is 3.5 × 10 4 J / m 3.
Met. In addition, a distance 1 in a direction substantially perpendicular to the head traveling direction 1
The average number of grooves having a depth of 1 nm or more existing per μm is 0.7, the value of Rmax (r) / Ra (r) is 12, and the value of Ra (r) / Ra (θ) is 1 .6. Also,
At a flying height of the head of 0.1 μm, the number of bit errors after 50,000 times of the head seek test from the inner circumference to the outer circumference is 10 bits / surface or less, the modulation Md of the medium is 10% or less, the linear recording density is 90 kBPI, and the track density is 4 kTPI.
The value of S / N at the time of was 4.5. In the load / unload system in which the head does not come in contact with the medium when the medium stops, the medium exhibited the same sliding resistance as the medium described in Embodiment 1, but the head was lifted up by the CSS system. In this case, the adhesion of the head could be reduced as compared with the medium of Example 1, and the reliability was improved.
【0023】〈実施例4〉実施例1と同様に、ディスク
基板上に平均径1μm以下の砥粒を用いて微細なテクス
チャーを形成した。この時、ディスク基板上にテクスチ
ャーを形成する際の加工時間、およびコンタクトロール
で研磨テープを加圧する圧力を制御することにより、ヘ
ッド走行方向に測定した中心線平均粗さRa(θ)と、そ
れに直角方向に測定した中心線平均粗さRa(r)との
比、Ra(r)/Ra(θ)を変化させた。さらに、基板上に
磁性膜および保護膜を成膜した。その後、実施例3と同
様の方法により、保護膜上に平均径5μm以上、10μ
m以下、高さ10nmの島状の凹凸を形成した。媒体の
磁気異方性、ヘッド浮上性、記録再生特性を測定した
後、保護膜を酸素プラズマエッチングにより除去し、磁
性膜表面のRa(r)/Ra(θ)を測定した。この時、Ra
(r)は0.5nm以上、3nm以下であった。Ra(r)/
Ra(θ)と面内異方性エネルギーKの関係を図8に示
す。Ra(r)/Ra(θ)が1.1以上、3.0以下の範囲で
面内の磁気異方性エネルギーKが3×104J/m3以
上、5×105J/m3以下と高くなった。また、媒体の
ヘッド走行方向と略直角方向の距離1μmあたりに存在
する、深さ1nm以上の溝の平均本数は0.5本以上、
100本以下、また、Rmax(r)/Ra(r)の値の範
囲は10以上、30以下であった。また、ヘッドの浮上
量0.06μmにおいて内周から外周までのヘッドシー
ク試験5万回後のビットエラー数は10ビット/面以
下、媒体のモジュレーションは10%以下、線記録密度
50kBPI、トラック密度3kTPIの時のS/Nの
値は4以上であった。Example 4 Similar to Example 1, a fine texture was formed on a disk substrate using abrasive grains having an average diameter of 1 μm or less. At this time, by controlling the processing time for forming the texture on the disk substrate and the pressure for pressing the polishing tape with the contact roll, the center line average roughness Ra (θ) measured in the head running direction and the The ratio to the center line average roughness Ra (r) measured in the perpendicular direction, Ra (r) / Ra (θ), was changed. Further, a magnetic film and a protective film were formed on the substrate. Then, in the same manner as in Example 3, an average diameter of 5 μm or more and 10 μm was formed on the protective film.
m or less, island-shaped irregularities having a height of 10 nm were formed. After measuring the magnetic anisotropy, head flying property, and recording / reproducing characteristics of the medium, the protective film was removed by oxygen plasma etching, and Ra (r) / Ra (θ) on the surface of the magnetic film was measured. At this time, Ra
(r) was not less than 0.5 nm and not more than 3 nm. Ra (r) /
FIG. 8 shows the relationship between Ra (θ) and the in-plane anisotropy energy K. When Ra (r) / Ra (θ) is 1.1 or more and 3.0 or less, the in-plane magnetic anisotropy energy K is 3 × 10 4 J / m 3 or more and 5 × 10 5 J / m 3. It was higher than below. Further, the average number of grooves having a depth of 1 nm or more and existing at a distance of 1 μm in a direction substantially perpendicular to the head traveling direction of the medium is 0.5 or more,
100 or less, and the range of values of Rmax (r) / Ra (r) was 10 or more and 30 or less. Also, at a head flying height of 0.06 μm, the number of bit errors after 50,000 times of the head seek test from the inner circumference to the outer circumference is 10 bits / surface or less, the medium modulation is 10% or less, the linear recording density is 50 kBPI, and the track density is 3 kTPI. The value of S / N at the time of was 4 or more.
【0024】〈実施例5〉実施例1と同様に、ディスク
基板上にテクスチャーを形成する際に用いる砥粒の平均
粒径、加工時間、およびコンタクトロールで研磨テープ
を加圧する圧力を変化させることにより媒体表面のRa
(r)、Rmax(r)/Ra(r)を変化させた時のビットエラ
ー数、モジュレーションおよびS/Nの値を表1に示
す。<Example 5> As in Example 1, the average particle size of the abrasive grains used for forming the texture on the disk substrate, the processing time, and the pressure for pressing the polishing tape with the contact roll were changed. Of the medium surface
Table 1 shows the number of bit errors, modulation and S / N when (r) and Rmax (r) / Ra (r) were changed.
【0025】[0025]
【表1】 [Table 1]
【0026】表1より、媒体表面のRa(r)を0.3nm
以上、3nm以下とするとともにRmax(r)/Ra(r)を
10以上、30以下とすることにより、本実施例の媒体
は比較例に比べてビットエラー数、モジュレーションM
dが小さく、面内異方性エネルギーおよびS/Nが高く
なり、ビットエラー数は10ビット/面以下、モジュレ
ーションは10%以下、S/Nは4以上となった。この
時、Ra(r)/Ra(θ)の比は1.1以上、3.0以下、媒
体のヘッド走行方向と略直角方向の距離1μmあたりに
存在する、深さ1nm以上の溝の平均本数は0.5本以
上、100本以下であった。According to Table 1, Ra (r) on the medium surface is 0.3 nm.
By setting Rmax (r) / Ra (r) to be 10 or more and 30 or less as well as 3 nm or less, the medium of the present embodiment has a smaller number of bit errors and modulation M than the comparative example.
d was small, the in-plane anisotropy energy and S / N were high, the number of bit errors was 10 bits / plane or less, the modulation was 10% or less, and the S / N was 4 or more. At this time, the ratio of Ra (r) / Ra (θ) is not less than 1.1 and not more than 3.0, and the average of grooves having a depth of 1 nm or more, which are present per 1 μm in a direction substantially perpendicular to the head running direction of the medium. The number was not less than 0.5 and not more than 100.
【0027】〈実施例6〉実施例3に示した磁気記録媒
体4枚を使用し、Co−Ta−Zr合金を記録用磁極材
とし、再生部に磁気抵抗効果型素子を有する複合型薄膜
磁気ヘッドを7個組み合わせた磁気記録装置を試作し
た。本装置は、図9に示すように磁気記録媒体91、磁
気記録媒体駆動部92、磁気ヘッド93、磁気ヘッド駆
動部96、記録再生信号処理系95などの部品から構成
される。この磁気記録装置を使用し、スペーシング0.
08μmにおいてエラーが発生するまでの平均時間を求
めたところ、比較例の記録媒体を用いた磁気記録装置と
比較して10倍以上の寿命があり、信頼性が極めて高い
ことを実証できた。また、本実施例で試作した磁気記録
装置はヘッド浮上量が低いため、信号の記録再生におけ
る位相マージンが広く、また、サーボ信号の品位が高い
ためヘッド位置決め精度が向上したため、面記録密度を
比較例の媒体を用いた場合の2倍に高めることができ、
小形で大容量の磁気記録装置を提供できた。本装置を用
いてトラック幅が5μm以下のMRヘッドで再生した場
合に90kBPI、4kTPIの高記録密度においてS
/Nが4以上、さらに、オーバーライト(O/W)特性が
26dB以上の大容量磁気記録装置が得られた。<Embodiment 6> Using the four magnetic recording media shown in Embodiment 3, a Co-Ta-Zr alloy as a recording magnetic pole material, and a composite thin film magnetic element having a magnetoresistive element in a reproducing section. A magnetic recording device having seven heads was fabricated. This apparatus includes components such as a magnetic recording medium 91, a magnetic recording medium driving unit 92, a magnetic head 93, a magnetic head driving unit 96, and a recording / reproducing signal processing system 95 as shown in FIG. Using this magnetic recording device, spacing
When the average time until an error occurred at 08 μm was determined, it was proved that the lifetime was at least 10 times longer than that of the magnetic recording apparatus using the recording medium of the comparative example, and the reliability was extremely high. In addition, the magnetic recording device prototyped in this example has a low head flying height, has a wide phase margin in recording and reproducing signals, and has a high quality servo signal to improve head positioning accuracy. Twice as high as with the example media,
A small, large-capacity magnetic recording device could be provided. When reproduced with an MR head having a track width of 5 μm or less using this apparatus, the S at high recording density of 90 kBPI and 4 kTPI
/ N was 4 or more, and a large capacity magnetic recording apparatus having an overwrite (O / W) characteristic of 26 dB or more was obtained.
【0028】本実施例では、記録用にCo−Ta−Zr
合金を磁極材とする薄膜磁気ヘッドを用いた場合につい
て説明したが、Ni−Fe、Co−Fe合金等を記録用
磁極材とする録再分離型薄膜磁気ヘッド、Co−Ta−
Zr、Fe−Al−Si合金等をギャップ部に設けたメ
タル・イン・ギャップ型(MIG)録再分離複合磁気ヘッ
ド、誘導型薄膜ヘッドまたはMIGヘッドを用いた場合
にも同様の効果が得られることを確認した。In this embodiment, Co-Ta-Zr is used for recording.
The case where a thin-film magnetic head using an alloy as a magnetic pole material has been described, but a recording / reproducing separation type thin-film magnetic head using a Ni-Fe, Co-Fe alloy or the like as a recording magnetic pole material, a Co-Ta-
Similar effects can be obtained when a metal-in-gap (MIG) recording / reproducing separation composite magnetic head, inductive type thin film head or MIG head having Zr, Fe-Al-Si alloy or the like provided in the gap portion is used. It was confirmed.
【0029】[0029]
【発明の効果】本発明によれば、高密度記録が可能な磁
気記録媒体、およびこれを用いた小形で大容量の磁気記
録装置を提供できる。According to the present invention, it is possible to provide a magnetic recording medium capable of high-density recording and a small and large-capacity magnetic recording apparatus using the same.
【図1】本発明の一実施例の薄膜型磁気記録媒体の縦断
面構造、および媒体とMRヘッドの関係を示す図であ
る。FIG. 1 is a diagram showing a longitudinal sectional structure of a thin-film magnetic recording medium according to one embodiment of the present invention, and a relationship between the medium and an MR head.
【図2】本発明の一実施例の薄膜型磁気記録媒体の縦断
面構造を示す図である。FIG. 2 is a diagram showing a longitudinal sectional structure of a thin-film magnetic recording medium according to one embodiment of the present invention.
【図3】本発明の一実施例の媒体表面の中心線平均粗さ
と保磁力の配向度の関係を示す図である。FIG. 3 is a diagram showing the relationship between the center line average roughness of the medium surface and the degree of orientation of the coercive force according to one embodiment of the present invention.
【図4】本発明の一実施例の媒体表面のヘッド走行方
向、およびそれと直角方向に測定した中心線平均粗さと
テクスチャー加工時間の関係を示す図である。FIG. 4 is a diagram illustrating a relationship between a head running direction on a medium surface and a center line average roughness measured in a direction perpendicular to the head running direction and a texture processing time according to an embodiment of the present invention.
【図5】本発明の一実施例の媒体の縦断面構造を示す図
である。FIG. 5 is a diagram showing a longitudinal sectional structure of a medium according to an embodiment of the present invention.
【図6】本発明の一実施例の媒体表面の中心線平均粗さ
と面内磁気異方性エネルギーの関係を示す図である。FIG. 6 is a graph showing the relationship between the center line average roughness of the medium surface and the in-plane magnetic anisotropy energy of one embodiment of the present invention.
【図7】本発明の一実施例の媒体表面の溝の平均本数密
度と保磁力の配向比、面内異方性エネルギーの関係を示
す図である。FIG. 7 is a diagram showing the relationship between the average number density of grooves on the medium surface, the orientation ratio of coercive force, and the in-plane anisotropic energy according to one embodiment of the present invention.
【図8】本発明の一実施例の磁性膜表面のヘッド走行方
向およびそれと直角方向に測定した中心線平均粗さの比
と面内磁気異方性エネルギーの関係を示す図である。FIG. 8 is a diagram showing the relationship between the ratio of the center line average roughness measured in the head running direction and the direction perpendicular to the head running direction on the surface of the magnetic film and the in-plane magnetic anisotropic energy according to one embodiment of the present invention.
【図9】本発明の一実施例の磁気記録装置の縦断面構造
図である。FIG. 9 is a longitudinal sectional structural view of a magnetic recording apparatus according to an embodiment of the present invention.
11…MR再生素子を有する磁気ヘッド、12…保護
膜、13…金属磁性膜、14…金属下地膜、15…非磁
性メッキ膜、16…テクスチャー溝、17…磁気ディス
ク基板、20…触針、21…保護膜、22…金属磁性
膜、23…非磁性中間膜、24…上層金属下地膜、25
…下層金属下地膜、26…テクスチャー溝、27…ガラ
スディスク基板、28…保護膜島状部、29…保護膜エ
ッチング部、51…磁気ディスク基板、52,52’…
非磁性メッキ層、53,53’…金属下地膜、54,5
4’…金属磁性膜、55,55’…非磁性保護膜、91
…磁気記録媒体、92…磁気記録媒体駆動部、93…磁
気ヘッド、94…磁気ヘッド駆動部、95…記録再生信
号処理系。Reference numeral 11: a magnetic head having an MR reproducing element, 12: a protective film, 13: a metal magnetic film, 14: a metal base film, 15: a non-magnetic plating film, 16: a texture groove, 17: a magnetic disk substrate, 20: a stylus, Reference numeral 21: protective film, 22: metal magnetic film, 23: non-magnetic intermediate film, 24: upper metal base film, 25
... lower metal base film, 26 ... texture groove, 27 ... glass disk substrate, 28 ... protective film island part, 29 ... protective film etching part, 51 ... magnetic disk substrate, 52, 52 '...
Non-magnetic plating layer, 53, 53 '... metal base film, 54, 5
4 ′: metal magnetic film, 55, 55 ′: non-magnetic protective film, 91
... magnetic recording medium, 92 ... magnetic recording medium drive unit, 93 ... magnetic head, 94 ... magnetic head drive unit, 95 ... recording / reproducing signal processing system.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 城石 芳博 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 竹下 正敏 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 屋久 四男 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 山本 朋生 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 尾嵜 明 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 棚橋 究 東京都国分寺市東恋ケ窪1丁目280番地 株式会社日立製作所中央研究所内 (72)発明者 文岡 順 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 (72)発明者 加藤 義喜 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 (72)発明者 大浦 正樹 神奈川県小田原市国府津2880番地 株式会 社日立製作所ストレージシステム事業部内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yoshihiro Shiroishi 1-280 Higashi Koikekubo, Kokubunji-shi, Tokyo Inside the Central Research Laboratory, Hitachi, Ltd. (72) Inventor Masatoshi Takeshita 1-280 Higashi Koikebo, Kokubunji-shi, Tokyo Hitachi, Ltd. Within the Central Research Laboratory (72) Inventor Yukio Yoo 1-280 Higashi Koikekubo, Kokubunji City, Tokyo Inside the Central Research Laboratory, Hitachi, Ltd. (72) Inventor Tomio Yamamoto 1-280 Higashi Koikebo, Kokubunji City, Tokyo Inside the Central Research Laboratory, Hitachi, Ltd. (72) Inventor Akira Ozaki 1-280 Higashi Koikekubo, Kokubunji-shi, Tokyo Inside the Hitachi, Ltd.Central Research Laboratories (72) Inventor Kazuki Tanahashi 1-280 Higashi Koikekubo, Kokubunji-shi, Tokyo Hitachi, Ltd. Person Jun Fumioka Kozuhara, Odawara City, Kanagawa Prefecture 2880 Address Hitachi Storage Systems Division, Hitachi, Ltd. (72) Inventor Yoshiki Kato 2880 Kozu, Odawara-shi, Kanagawa Prefecture Inside Storage Systems Division, Hitachi, Ltd. (72) Inventor Masaki Ohura 2880, Kofutsu, Odawara-shi, Kanagawa Prefecture Stock Association Hitachi, Ltd. Storage Systems Division
Claims (7)
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、非磁性ディスク基板と
上記磁性膜との間にCr、Mo、W、Nb、Taもしく
はこれを主たる成分とする合金からなる下地膜が膜厚5
nm以上、500nm以下形成されていることを特徴と
する磁気記録媒体の製造方法。1. A magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed directly on the non-magnetic disk substrate or via an under film, wherein Cr, The base film made of Mo, W, Nb, Ta or an alloy containing these as main components has a thickness of 5
A method for manufacturing a magnetic recording medium, wherein the magnetic recording medium is formed to have a thickness of 500 nm to 500 nm.
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、前記記録媒体の周方向
と直角な方向に測定した表面中心線平均粗さRa(r)が
0.3nm以上、3nm以下の範囲にあることを特徴と
する磁気記録媒体の製造方法。2. A surface of a magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed directly on the non-magnetic disk substrate or via a base film, measured in a direction perpendicular to a circumferential direction of the recording medium. A method for manufacturing a magnetic recording medium, wherein a center line average roughness Ra (r) is in a range of 0.3 nm or more and 3 nm or less.
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、前記非磁性ディスク基
板と前記磁性膜との間の下地膜表面に、前記ディスク基
板の周方向に沿って深さ1nm以上の溝が、前記周方向
と直角な方向の距離1μmあたりに、平均0.5本以
上、100本以下存在することを特徴とする磁気記録媒
体の製造方法。3. A magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed directly or via an underlayer on the non-magnetic disk substrate, wherein a lower portion between the non-magnetic disk substrate and the magnetic film is provided. On the surface of the ground film, grooves having a depth of 1 nm or more along the circumferential direction of the disk substrate are present at an average of 0.5 or more and 100 or less per 1 μm in a direction perpendicular to the circumferential direction. Of manufacturing a magnetic recording medium.
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、磁気記録媒体の周方向
と直角な方向に測定した表面中心線平均粗さRa(r)と
前記周方向に測定した表面中心線平均粗さRa(θ)との
比、Ra(r)/Ra(θ)が1.1以上、3.0以下であるこ
とを特徴とする磁気記録媒体の製造方法。4. A surface measured in a direction perpendicular to a circumferential direction of a magnetic recording medium in a magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed on the non-magnetic disk substrate directly or via an underlayer. When the ratio of the center line average roughness Ra (r) to the surface center line average roughness Ra (θ) measured in the circumferential direction, Ra (r) / Ra (θ) is 1.1 or more and 3.0 or less. A method for manufacturing a magnetic recording medium, comprising:
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、前記磁気記録媒体の周
方向に磁界を印加して測定した保磁力Hc(θ)と、前記
周方向と略直角方向に磁界を印加して測定した保磁力H
c(r)、を用いて定義される保磁力配向比{Hc(θ)−
Hc(r)}/{Hc(θ)+Hc(r)}が0.1以上、0.
7以下であることを特徴とする磁気記録媒体の製造方
法。5. A magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed on the non-magnetic disk substrate directly or via an underlayer by applying a magnetic field in a circumferential direction of the magnetic recording medium. Coercive force Hc (θ) and the coercive force H measured by applying a magnetic field in a direction substantially perpendicular to the circumferential direction.
c (r), the coercive force orientation ratio ΔHc (θ) −
Hc (r)} / {Hc (θ) + Hc (r)} is 0.1 or more, 0.1
7. A method for manufacturing a magnetic recording medium, wherein the number is 7 or less.
基板上に直接もしくは下地膜を介して形成された磁性膜
を有する磁気記録媒体において、基板面内に磁界を印加
して基板面内で試料を回転して測定された磁気異方性エ
ネルギーが3×104J/m3以上、5×105J/m3以
下であることを特徴とする磁気記録媒体の製造方法。6. In a magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed directly on the non-magnetic disk substrate or via an underlayer, a magnetic field is applied to the surface of the substrate and a sample is formed in the surface of the substrate. The method for producing a magnetic recording medium, wherein the magnetic anisotropy energy measured by rotating is not less than 3 × 10 4 J / m 3 and not more than 5 × 10 5 J / m 3 .
基板表面上に直接もしくは下地膜を介して形成された磁
性膜を有する磁気記録媒体において、前記磁気記録媒体
の周方向と直角な方向に測定した表面中心線平均粗さR
a(r)の範囲が0.3nm以上、3nm以下であること
を特徴とする請求項2から6のいずれか1に記載の磁気
記録媒体の製造方法。7. In a magnetic recording medium having a non-magnetic disk substrate and a magnetic film formed directly on the surface of the non-magnetic disk substrate or via an underlayer, measurement is performed in a direction perpendicular to the circumferential direction of the magnetic recording medium. Surface center line average roughness R
7. The method for manufacturing a magnetic recording medium according to claim 2, wherein the range of a (r) is 0.3 nm or more and 3 nm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11233448A JP2000048358A (en) | 1999-08-20 | 1999-08-20 | Manufacturing method of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11233448A JP2000048358A (en) | 1999-08-20 | 1999-08-20 | Manufacturing method of magnetic recording medium |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02937193A Division JP3564707B2 (en) | 1992-11-20 | 1993-02-18 | Magnetic recording media |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000048358A true JP2000048358A (en) | 2000-02-18 |
Family
ID=16955211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11233448A Pending JP2000048358A (en) | 1999-08-20 | 1999-08-20 | Manufacturing method of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000048358A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7249405B2 (en) | 2002-05-22 | 2007-07-31 | Hitachi Global Storage Technologies Japan, Ltd. | Method for manufacturing a magnetic medium |
-
1999
- 1999-08-20 JP JP11233448A patent/JP2000048358A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7249405B2 (en) | 2002-05-22 | 2007-07-31 | Hitachi Global Storage Technologies Japan, Ltd. | Method for manufacturing a magnetic medium |
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