JP2000043042A - Polyphenylene ether resin prepreg - Google Patents
Polyphenylene ether resin prepregInfo
- Publication number
- JP2000043042A JP2000043042A JP21464898A JP21464898A JP2000043042A JP 2000043042 A JP2000043042 A JP 2000043042A JP 21464898 A JP21464898 A JP 21464898A JP 21464898 A JP21464898 A JP 21464898A JP 2000043042 A JP2000043042 A JP 2000043042A
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- polyphenylene ether
- parts
- laminate
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229920001955 polyphenylene ether Polymers 0.000 title claims abstract description 25
- 229920005989 resin Polymers 0.000 title description 25
- 239000011347 resin Substances 0.000 title description 25
- 239000000835 fiber Substances 0.000 claims abstract description 20
- 239000011342 resin composition Substances 0.000 claims abstract description 13
- 239000002131 composite material Substances 0.000 claims abstract description 5
- 239000000758 substrate Substances 0.000 claims description 11
- 239000011888 foil Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 abstract description 13
- 238000010521 absorption reaction Methods 0.000 abstract description 9
- 239000004745 nonwoven fabric Substances 0.000 abstract description 9
- 239000002759 woven fabric Substances 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 229920000728 polyester Polymers 0.000 abstract description 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 239000011889 copper foil Substances 0.000 description 9
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- -1 phenol compound Chemical class 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 229920003235 aromatic polyamide Polymers 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000003063 flame retardant Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- GVLZQVREHWQBJN-UHFFFAOYSA-N 3,5-dimethyl-7-oxabicyclo[2.2.1]hepta-1,3,5-triene Chemical compound CC1=C(O2)C(C)=CC2=C1 GVLZQVREHWQBJN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000004760 aramid Substances 0.000 description 3
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229920003048 styrene butadiene rubber Polymers 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 229920000265 Polyparaphenylene Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- BZQKBFHEWDPQHD-UHFFFAOYSA-N 1,2,3,4,5-pentabromo-6-[2-(2,3,4,5,6-pentabromophenyl)ethyl]benzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1CCC1=C(Br)C(Br)=C(Br)C(Br)=C1Br BZQKBFHEWDPQHD-UHFFFAOYSA-N 0.000 description 1
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 1
- PGJXFACHLLIKFG-UHFFFAOYSA-N 2-methyl-6-phenylphenol Chemical compound CC1=CC=CC(C=2C=CC=CC=2)=C1O PGJXFACHLLIKFG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DLEIYTXNYQRGES-UHFFFAOYSA-N 6,6-dimethylcyclohexa-2,4-dien-1-ol Chemical compound C1(C=CC=CC1(C)C)O DLEIYTXNYQRGES-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- FACXGONDLDSNOE-UHFFFAOYSA-N buta-1,3-diene;styrene Chemical compound C=CC=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 FACXGONDLDSNOE-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 210000001724 microfibril Anatomy 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003047 styrene-styrene-butadiene-styrene Polymers 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は主にプリント配線板
の製造に用いられるプリプレグおよび積層板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a prepreg and a laminate used mainly for manufacturing a printed wiring board.
【0002】[0002]
【従来の技術】近年、通信用、民生用、産業用等の電子
機器の分野において、実装方法の小型化、高密度化への
指向は著しいものがあり、それに伴って材料の面でもよ
り優れた耐熱性、寸法安定性、電気特性が要求されつつ
ある。例えばプリント配線基板としては、ガラス布を基
材とするプリプレグを用いて製造されるガラス布基材銅
張り積層板が従来汎用的に使用されてきた。しかし、近
年、軽量化、低誘電率化、レーザー加工性等の要望か
ら、有機繊維を基材とするプリプレグを用いたプリント
配線板が提案されている。そしてこの有機繊維の代表的
なものとして、アラミド(全芳香族ポリアミド)繊維が
あるが、アラミド繊維自身が吸湿性が大きいことおよび
誘電正接が大きいために、得られる積層板の吸湿性が大
きくかつ誘電正接が大きいという課題がある。2. Description of the Related Art In recent years, in the field of electronic equipment for communication, consumer use, industrial use, and the like, there has been a remarkable trend toward miniaturization and higher density of mounting methods, and accordingly, materials are more excellent. Heat resistance, dimensional stability, and electrical properties are being demanded. For example, as a printed wiring board, a glass cloth-base copper-clad laminate manufactured using a prepreg having a glass cloth as a base material has been conventionally and generally used. However, in recent years, printed wiring boards using prepregs based on organic fibers have been proposed due to demands for weight reduction, low dielectric constant, laser workability, and the like. A typical example of the organic fiber is aramid (wholly aromatic polyamide) fiber. However, since the aramid fiber itself has a large hygroscopic property and a large dielectric loss tangent, the obtained laminated board has a large hygroscopic property and There is a problem that the dielectric loss tangent is large.
【0003】[0003]
【発明が解決しようとする課題】本発明は以上の事情に
鑑みてなされたものであり、有機繊維を基材とし吸湿性
が小さく、誘電正接が小さい誘電特性に優れ、かつ耐熱
性に優れたプリプレグ、積層板を提供することを目的と
するものである。DISCLOSURE OF THE INVENTION The present invention has been made in view of the above circumstances, and uses an organic fiber as a base material, has a small hygroscopic property, a small dielectric loss tangent, has excellent dielectric properties, and has excellent heat resistance. It is an object to provide a prepreg and a laminate.
【0004】[0004]
【課題を解決するための手段】本発明者らは上述のよう
な課題を解決するため鋭意検討を重ねた結果、本発明を
完成するに到った。すなわち、本願は以下の発明を提供
する。 (1)ポリベンザゾール繊維から形成した基材と硬化性
ポリフェニレンエーテル系樹脂組成物とを複合してなる
プリプレグ。Means for Solving the Problems The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have completed the present invention. That is, the present application provides the following inventions. (1) A prepreg obtained by combining a substrate formed of polybenzazole fibers with a curable polyphenylene ether-based resin composition.
【0005】ここで、ポリベンザゾール繊維の形態を織
布及び/又は不織布とすることは好ましい実施態様であ
る。 (2)上記(1)記載のプリプレグを硬化して得られた
硬化複合材料。 (3)上記(1)記載のプリプレグと金属箔からなる積
層体。 (4)上記(2)の硬化複合材料と金属箔からなる硬化
積層体。Here, it is a preferred embodiment that the form of the polybenzazole fiber is a woven fabric and / or a nonwoven fabric. (2) A cured composite material obtained by curing the prepreg according to (1). (3) A laminate comprising the prepreg according to (1) and a metal foil. (4) A cured laminate comprising the cured composite material of (2) and a metal foil.
【0006】以下に本発明を詳しく述べる。本発明に用
いられる硬化性ポリフェニレンエーテル系樹脂組成物
は、ポリフェニレンエーテル系樹脂(変性物も含む)を
成分として含有する組成物である。上記のポリフェニレ
ンエーテル系樹脂の好ましい例としては、2,6ージメ
チルフェノールの単独重合で得られるポリ(2,6ージ
メチルー1,4ーフェニレンエーテル)、ポリ(2,6
ージメチルー1,4ーフェニレンエーテル)のスチレン
グラフト重合体、2,6ージメチルフェノールと2,
3,6ートリメチルフェノールの共重合体、2,6ージ
メチルフェノールと2ーメチルー6ーフェニルフェノー
ルの共重合体、2,6ージメチルフェノールと多官能フ
ェノール化合物の存在下で重合して得られた多官能性ポ
リフェニレンエーテル樹脂、例えば特開昭63ー301
222号公報、特開平1ー297428号公報に開示さ
れているような一般式(A)および(B)の単位を含む
共重合体等が挙げられる。Hereinafter, the present invention will be described in detail. The curable polyphenylene ether-based resin composition used in the present invention is a composition containing a polyphenylene ether-based resin (including a modified product) as a component. Preferred examples of the above polyphenylene ether-based resin include poly (2,6-dimethyl-1,4-phenylene ether) obtained by homopolymerization of 2,6-dimethylphenol, and poly (2,6
-Dimethyl-1,4-phenylene ether), 2,6-dimethylphenol and 2,2-dimethylphenol
It was obtained by polymerization in the presence of a copolymer of 3,6-trimethylphenol, a copolymer of 2,6-dimethylphenol and 2-methyl-6-phenylphenol, and a copolymer of 2,6-dimethylphenol and a polyfunctional phenol compound. Polyfunctional polyphenylene ether resin, for example, JP-A-63-301
And copolymers containing units of the general formulas (A) and (B) as disclosed in JP-A-222 and JP-A-1-297428.
【0007】以上述べたポリフェニレンエーテル系樹脂
の分子量については、30℃、0.5g/dlのクロロ
ホルム溶液で測定した粘度数ηsp/cが0.1〜1.
0の範囲にあるものが良好に使用できる。また、本発明
でいうポリフェニレンエーテル系樹脂には、変性物も含
まれるが、このような変成物としては、具体的には、不
飽和基を含むポリフェニレンエーテル樹脂(特開昭64
−69628号、特開平1−113425号、特開平1
−113426号公報を参照)、ならびにポリフェニレ
ンエーテル樹脂と不飽和カルボン酸および/または酸無
水物との反応生成物等が挙げられる。With respect to the molecular weight of the polyphenylene ether resin described above, the viscosity number ηsp / c measured at 30 ° C. in a 0.5 g / dl chloroform solution is 0.1 to 1.
Those in the range of 0 can be used favorably. Further, the polyphenylene ether-based resin referred to in the present invention also includes modified products. Examples of such modified products include polyphenylene ether resins containing unsaturated groups (Japanese Patent Application Laid-Open No. Sho 64-64).
-69628, JP-A-1-113425, JP-A-1
And the reaction products of polyphenylene ether resins with unsaturated carboxylic acids and / or acid anhydrides.
【0008】次に、上記ポリフェニレン系樹脂以外に配
合される樹脂としては、本発明の目的であるプリント基
板用材料として基板物性を損なわないものであればどの
ようなものでもよい。このような樹脂としては、具体的
には、フェノール樹脂、エポキシ樹脂、ジアリルフタレ
ート、ジビニルベンゼン、多官能性アクリロイル化合
物、多官能性メタクリロイル化合物、多官能性マレイミ
ド、多官能性メタクリロイル化合物、多官能性マレイミ
ド、多官能性シアン酸エステル、多官能性イソシアネー
ト、不飽和ポリエステル、トリアリルイソシアヌレー
ト、トリアリルシアヌレート、ポリブタジエン、スチレ
ン−ブタジエン・スチレン−ブタジエン−スチレン等の
架橋性ポリマー、種々の熱可塑性樹脂、種々の熱硬化性
樹脂等が挙げられる。これらのものは一般にプリプレグ
を積層成形して作製された基板の物性を向上させる目的
で配合される。Next, as the resin to be blended in addition to the above-mentioned polyphenylene-based resin, any resin may be used as long as it does not impair the physical properties of the substrate as a material for a printed substrate, which is the object of the present invention. Specific examples of such a resin include a phenol resin, an epoxy resin, diallyl phthalate, divinylbenzene, a polyfunctional acryloyl compound, a polyfunctional methacryloyl compound, a polyfunctional maleimide, a polyfunctional methacryloyl compound, a polyfunctional methacryloyl compound. Crosslinkable polymers such as maleimide, polyfunctional cyanate ester, polyfunctional isocyanate, unsaturated polyester, triallyl isocyanurate, triallyl cyanurate, polybutadiene, styrene-butadiene / styrene-butadiene-styrene, and various thermoplastic resins And various thermosetting resins. These are generally blended for the purpose of improving the physical properties of a substrate produced by laminating and molding a prepreg.
【0009】本発明に用いられる樹脂組成物の好ましい
例としては、ポリフェニレンエーテルおよびトリアリル
イソシアヌレートおよび/またはトリアリルシアヌレー
ト、ポリフェニレンエーテルおよびエポキシ樹脂、ポリ
フェニレンエーテルおよびスチレンブタジエンブロック
コポリマーおよびトリアリルイソシアヌレートおよび/
またはトリアリルシアヌレート、不飽和基を含むポリフ
ェニレンエーテルおよびトリアリルイソシアヌレートお
よび/またはトリアリルシアヌレート、不飽和基を含む
ポリフェニレンエーテルおよびトリアリルイソシアヌレ
ートおよび/またはトリアリルシアヌレートおよびエポ
キシ樹脂、ポリフェニレンエーテル樹脂と不飽和カルボ
ン酸および/または酸無水物との反応生成物およびトリ
アリルイソシアヌレートおよび/またはトリアリルシア
ヌレート、ポリフェニレンエーテル樹脂と不飽和カルボ
ン酸および/または酸無水物との反応生成物およびエポ
キシ樹脂、ポリフェニレンエーテル樹脂と不飽和カルボ
ン酸および/または酸無水物との反応生成物およびトリ
アリルイソシアヌレートおよび/またはトリアリルシア
ヌレートおよびエポキシ樹脂等が挙げられる。これらの
系における各成分の配合量は、目的に応じて選択され
る。Preferred examples of the resin composition used in the present invention include polyphenylene ether and triallyl isocyanurate and / or triallyl cyanurate, polyphenylene ether and epoxy resin, polyphenylene ether and styrene butadiene block copolymer and triallyl isocyanurate. and/
Or triallyl cyanurate, polyphenylene ether containing unsaturated group and triallyl isocyanurate and / or triallyl cyanurate, polyphenylene ether containing unsaturated group and triallyl isocyanurate and / or triallyl cyanurate and epoxy resin, polyphenylene Reaction product of ether resin with unsaturated carboxylic acid and / or acid anhydride and reaction product of triallyl isocyanurate and / or triallyl cyanurate, reaction product of polyphenylene ether resin with unsaturated carboxylic acid and / or acid anhydride Reaction products of epoxy resins, polyphenylene ether resins with unsaturated carboxylic acids and / or acid anhydrides, and triallyl isocyanurate and / or triallyl cyanurate and epoxy resins. Carboxymethyl resins. The amount of each component in these systems is selected according to the purpose.
【0010】また、硬化反応を促進するために、本発明
に用いられるポリフェニレンエーテル系樹脂に通常のラ
ジカル開始剤あるいはエポキシ樹脂の通常の硬化剤を含
有させても良い。さらにその用途に応じて所望の性能を
付与する目的で本来の性質を損なわない範囲の量の充填
剤や添加剤を配合して用いることができる、充填剤とし
てはカーボンブラック、シリカ、アルミナ、チタン酸バ
リウム、タルク、雲母、ガラスビーズ、ガラス中空球等
をあげることができる。添加剤としては、酸化防止剤、
熱安定剤、帯電防止剤、紫外線吸収剤、可塑剤、顔料、
染料(蛍光剤含む)、着色剤等を挙げることができる。
また難燃性の一層の向上を図る目的で臭素系、塩素系、
リン系、シリコン系の難燃剤や三酸化アンチモン、五酸
化アンチモン等の難燃助剤を併用することもできる。In order to accelerate the curing reaction, the polyphenylene ether resin used in the present invention may contain a usual radical initiator or a usual curing agent for an epoxy resin. Further, fillers and additives can be blended and used in an amount that does not impair the original properties for the purpose of imparting desired performance according to the application. Examples of the filler include carbon black, silica, alumina, and titanium. Examples include barium acid, talc, mica, glass beads, glass hollow spheres, and the like. As additives, antioxidants,
Heat stabilizer, antistatic agent, ultraviolet absorber, plasticizer, pigment,
Dyes (including fluorescent agents), coloring agents, and the like can be given.
For the purpose of further improving flame retardancy, bromine, chlorine,
A phosphorus-based or silicon-based flame retardant or a flame retardant auxiliary such as antimony trioxide or antimony pentoxide can be used in combination.
【0011】本発明に用いられる基材はポリベンザゾー
ル繊維から形成される。ここでいうポリベンザゾール繊
維とは、ポリベンザゾールより成る繊維をいい、ポリベ
ンザゾール(PBZ)とは、ポリベンゾオキサゾール(P
BO)ホモポリマー、ポリベンゾチアゾール(PBT)ホ
モポリマーおよびそれらPBO、PBTのランダム、シ
ーケンシあるいはブロック共重合ポリマーをいう。The substrate used in the present invention is formed from polybenzazole fibers. The polybenzazole fiber referred to here is a fiber made of polybenzazole, and the polybenzazole (PBZ) is a polybenzoxazole (P
BO) homopolymer, polybenzothiazole (PBT) homopolymer, and random, sequence or block copolymers of PBO and PBT.
【0012】本発明で用いられるポリベンザゾール繊維
の形態の例としては、ロービングクロス、クロス、チョ
ップドマット、サーフェシングマットなどのポリベンザ
ゾール繊維の織布および/または不織布が挙げられる。
これらの形態の中では、寸法安定性の観点からは織布、
そして加工性の観点からは不織布が好ましい。本発明に
おいては、これらの両者の特長を兼備させるために織布
と不織布とを積層しても良い。また、本発明の基材に、
ガラス、アラミド、芳香族ポリエステル、天然セルロス
系繊維のクロスまたはミクロフィブリルを混抄して用い
ても良い。本発明に用いられるポリベンザゾール繊維の
不織布の製造法の例としては、チョップド繊維を用いる
乾式法、抄紙法などが挙げられる。Examples of the form of the polybenzazole fiber used in the present invention include woven and / or nonwoven fabric of polybenzazole fiber such as roving cloth, cloth, chopped mat, and surfacing mat.
Among these forms, woven fabric,
And a nonwoven fabric is preferable from a viewpoint of workability. In the present invention, a woven fabric and a nonwoven fabric may be laminated in order to combine these two features. In addition, the substrate of the present invention,
Glasses, aramids, aromatic polyesters, cloths or microfibrils of natural cellulosic fibers may be mixed and used. Examples of the method for producing a nonwoven fabric of polybenzazole fibers used in the present invention include a dry method using chopped fibers and a papermaking method.
【0013】本発明のプリプレグ中における基材の割合
は、10-80重量%、より好ましくは20-70重量%である。
基材の割合が10%重量未満では硬化後の寸法安定性や
強度が不十分であり、この割合が80重量%を越える
と、プリプレグにおける樹脂量が極端に少なくなるため
にプリプレグ同士の接着性や金属箔に代表される他の材
料との接着性が劣り好ましくない。[0013] The proportion of the substrate in the prepreg of the present invention is 10-80% by weight, more preferably 20-70% by weight.
When the proportion of the base material is less than 10% by weight, the dimensional stability and strength after curing are insufficient, and when the proportion exceeds 80% by weight, the amount of resin in the prepreg becomes extremely small, so that the adhesiveness between the prepregs is reduced. And the adhesion to other materials typified by metal foil is inferior.
【0014】本発明の樹脂組成物と基材との複合方法に
ついては特に限定されることはなく、樹脂組成物を溶融
して基材中に含浸させる溶融法、樹脂組成物を溶媒に溶
解後基材に含浸させ次いで溶媒を乾燥してプリプレグを
得る湿式法等が採用できる。成形および硬化は温度:8
0−300℃、時間:1分ー10時間、圧力:0.1−
500kg/cm2の範囲、より好ましくは、温度:15
0−250℃、時間:1分ー5時間、圧力:1−100
kg/cm2の範囲で行われる。The method of combining the resin composition of the present invention with a substrate is not particularly limited. A melting method in which the resin composition is melted and impregnated into the substrate, and a method in which the resin composition is dissolved in a solvent A wet method of obtaining a prepreg by impregnating the base material and then drying the solvent can be employed. Molding and curing temperature: 8
0-300 ° C, time: 1 minute-10 hours, pressure: 0.1-
500 kg / cm 2 range, more preferably, temperature: 15
0-250 ° C, time: 1 minute-5 hours, pressure: 1-100
It is performed in the range of kg / cm2.
【0015】本発明の積層体に用いられる金属箔として
は、たとえば銅箔、アルミニウム箔等が挙げられる。そ
の厚みは特に限定されないが、3−200ミクロンが好
ましく、より好ましくは5−105ミクロンである。本
発明のプリプレグは両面に銅箔を積層して硬化すること
により銅張積層板を得ることができる。またプリプレグ
をプリント配線板の上下に積層し次いでレーザー照射に
よりビアホールを形成し、次いでメッキしてビアホール
の接続とパターン形成する、いわゆるビルドアップ工法
用プリプレグとして用いることができる。この時はあら
かじめ金属箔の片面にプリプレグを積層した、いわゆる
樹脂付き銅箔の形で使用しても良い。またプリント配線
板の外層にプリプレグを積層するときに最外層に銅箔を
同時に積層する事もできる。このときに、最外層の銅箔
はレーザーによるビア形成の時に利用できる。さらに本
発明のプリプレグにレーザーまたは機械的パンチングに
より穴加工し、次いでこの穴に導電性ペーストを充填し
た後に、その両面に銅箔を積層し硬化することによりコ
ア材とすることができる。このコア材をパターニングし
プリント配線板を作成し、次いで同じく作成された充填
剤含有プリプレグを引き続き積層する多層配線板にも用
いることができる。The metal foil used for the laminate of the present invention includes, for example, copper foil, aluminum foil and the like. The thickness is not particularly limited, but is preferably 3-200 microns, more preferably 5-105 microns. The prepreg of the present invention can obtain a copper-clad laminate by laminating and curing a copper foil on both sides. Also, the prepreg can be used as a so-called prepreg for a build-up method in which a prepreg is laminated on the upper and lower sides of a printed wiring board, a via hole is formed by laser irradiation, and then plated to form a connection and pattern of the via hole. In this case, a prepreg may be previously laminated on one side of a metal foil, that is, a so-called resin-coated copper foil may be used. Further, when prepreg is laminated on the outer layer of the printed wiring board, copper foil can be laminated on the outermost layer at the same time. At this time, the outermost copper foil can be used when forming a via with a laser. Further, the prepreg of the present invention is formed with a hole by laser or mechanical punching, and then filled with a conductive paste, and then a copper foil is laminated on both surfaces thereof and cured to form a core material. This core material is patterned to form a printed wiring board, and then the filler-containing prepreg prepared in the same manner can be used for a multilayer wiring board to be subsequently laminated.
【0016】[0016]
【発明の実施の形態】以下、本発明を一層明確にするた
めに実施例を挙げて説明する。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described by way of examples to further clarify the present invention.
【0017】[0017]
【参考例1】30℃、0.5g/dlのクロロホルム溶
液で測定した粘度数ηsp/cが0/44のポリ(2,
6ージメチルー1,4ーフェニレンエーテル):100
重量部と、無水マレイン酸:1.5重量部、および2,
5ージメチルー2,5ージ(tーブチルパーオキシ)ヘ
キサン(日本油脂(株)製 パーヘキサ25B):1.
0重量部を室温でドライブレンドした後、シリンダー温
度300℃、スクリュー回転数230rpmの条件で2
軸押し出し機により押出した。この反応生成物をポリマ
ーAとする。なお、以下の参考例、実施例で記載された
各ポリマーの粘度数ηsp/Cは、この参考例1と同一
の方法で測定されたものである。REFERENCE EXAMPLE 1 Poly (2,4) having a viscosity number ηsp / c of 0/44 as measured with a chloroform solution of 0.5 g / dl at 30 ° C.
6-dimethyl-1,4-phenylene ether): 100
Parts by weight, maleic anhydride: 1.5 parts by weight, and 2,
5-dimethyl-2,5-di (t-butylperoxy) hexane (Perhexa 25B manufactured by NOF Corporation): 1.
0 parts by weight were dry-blended at room temperature, and then heated at a cylinder temperature of 300 ° C. and a screw rotation speed of 230 rpm.
It was extruded by a screw extruder. This reaction product is referred to as polymer A. The viscosity number ηsp / C of each polymer described in the following Reference Examples and Examples was measured by the same method as in Reference Example 1.
【0018】[0018]
【参考例2】<不飽和基を含むポリフェニレンエーテル
樹脂>ηsp/C=0.56のポリ(2,6−ジメチル
−1,4−フェニレンエーテル)を用いて、特開昭64
−69629号に開示された公知の方法に従って、ηs
p/c=0.62のアリル基置換ポリフェニレンエーテ
ル(平均置換率14%)を合成した。このアリル置換ポ
リフェニレンエーテルをポリマーBとする。REFERENCE EXAMPLE 2 <Polyphenylene ether resin containing unsaturated group> A poly (2,6-dimethyl-1,4-phenylene ether) having .eta.sp / C = 0.56 was used and disclosed in
Ηs according to the known method disclosed in US Pat.
An allyl group-substituted polyphenylene ether having ap / c of 0.62 (average substitution ratio: 14%) was synthesized. This allyl-substituted polyphenylene ether is referred to as polymer B.
【0019】[0019]
【実施例1】ポリマーA50重量部(以下すべて重量
部)、トリアリルイソシアヌレート(TAIC):46部、難
燃剤SAYTEX8010(アルベマーレ社製):30部、過酸化
物PH25B(日本油脂(株)製):6部からなる樹脂組成
物35部をトルエン100部に溶解してワニスを作成し
た。次いでこのワニスにPBO繊維不織布を含浸し、引
き続き溶媒を乾燥してプリプレグを作成した。このプリ
プレグ中の樹脂量は50%であった。このプリプレグの
両面に35ミクロンの銅箔を張り200℃、1時間硬化
し両面銅張り積層板を作成した。両面銅張り積層板は誘
電率3.0(1MHz)、誘電正接0.003(1MH
z)、ガラス転移温度210℃(DMAによる測定)、
吸湿率0.4%、xy方向線膨張率はそれぞれ10pp
mで誘電特性、低吸湿性に優れたいた。また、上記で得
られたプリプレグを銅箔にコーテイングし溶媒を乾燥し
て樹脂付き銅箔を得た。この材料はビルドアップ用材料
として好適に用いることができる。Example 1 50 parts by weight of polymer A (hereinafter all parts by weight), 46 parts of triallyl isocyanurate (TAIC), 30 parts of flame retardant SAYTEX8010 (manufactured by Albemare), 30 parts of peroxide PH25B (manufactured by NOF Corporation) ): A varnish was prepared by dissolving 35 parts of a resin composition consisting of 6 parts in 100 parts of toluene. Next, the varnish was impregnated with a PBO fiber nonwoven fabric, and the solvent was subsequently dried to prepare a prepreg. The resin content in this prepreg was 50%. A copper foil of 35 microns was applied to both sides of the prepreg and cured at 200 ° C. for 1 hour to prepare a double-sided copper-clad laminate. The double-sided copper-clad laminate has a dielectric constant of 3.0 (1 MHz) and a dielectric tangent of 0.003 (1 MH)
z), glass transition temperature 210 ° C. (measured by DMA),
Moisture absorption 0.4%, xy linear expansion coefficient 10pp each
m was excellent in dielectric properties and low hygroscopicity. The prepreg obtained above was coated on a copper foil and the solvent was dried to obtain a resin-coated copper foil. This material can be suitably used as a build-up material.
【0020】[0020]
【比較例1】PBO繊維不織布に変えてアラミド不織布
を用いた以外は実施例1と同一の方法でプリプレグを作
成し、次いで銅張り積層板を作成した。この銅張り積層
板は、ガラス転移温度210℃、誘電率3.5、誘電正
接0.01、吸湿率1.0%であった。Comparative Example 1 A prepreg was prepared in the same manner as in Example 1 except that an aramid nonwoven fabric was used instead of the PBO fiber nonwoven fabric, and then a copper-clad laminate was prepared. This copper clad laminate had a glass transition temperature of 210 ° C., a dielectric constant of 3.5, a dielectric loss tangent of 0.01, and a moisture absorption of 1.0%.
【0021】[0021]
【実施例2】ポリマーAに変えてポリマーBを用いた以
外は実施例1と同一の方法で銅張り積層板を作成した。
得られた銅張り積層板は、誘電率3.0、誘電正接0.
002、ガラス転移温度220℃、吸湿率0.35%、
線膨張率10ppmであった。Example 2 A copper-clad laminate was prepared in the same manner as in Example 1 except that Polymer B was used instead of Polymer A.
The obtained copper-clad laminate has a dielectric constant of 3.0 and a dielectric tangent of 0.4.
002, glass transition temperature 220 ° C., moisture absorption 0.35%,
The coefficient of linear expansion was 10 ppm.
【0022】[0022]
【実施例3】ポリフェニレンエーテル樹脂:30部、TA
IC:5部、エポキシ樹脂:60部および硬化剤:5部か
らなる樹脂組成物35部を用いて実施例1と同一の方法
でプリプレグを作成し、180℃で90分間硬化させ
た。得られた銅張り積層板はガラス転移温度170℃、
誘電率3.2、誘電正接0.008、吸湿率0.45
%、線膨張率10ppmであった。Example 3 Polyphenylene ether resin: 30 parts, TA
A prepreg was prepared in the same manner as in Example 1 using 35 parts of a resin composition consisting of 5 parts of IC, 60 parts of epoxy resin and 5 parts of curing agent, and cured at 180 ° C. for 90 minutes. The obtained copper-clad laminate has a glass transition temperature of 170 ° C.
Dielectric constant 3.2, dielectric loss tangent 0.008, moisture absorption 0.45
% And the linear expansion coefficient were 10 ppm.
【0023】[0023]
【実施例4】ポリフェニレンエーテル樹脂:30部、ス
チレン・ブタジエンブロックコポリマー:30部、TAI
C:35部、過酸化物パーヘキサ25B:5部からなる
樹脂組成物35部を用いて実施例1と同一の方法で作成
し、200℃で1時間硬化させ銅張り積層板を得た。得
られた銅張り積層板はガラス転移温度180℃、誘電率
3.0、誘電正接0.003、吸水率0.4%、線膨張
率12ppmであった。Example 4 Polyphenylene ether resin: 30 parts, styrene / butadiene block copolymer: 30 parts, TAI
Using a resin composition consisting of 35 parts of C: 35 parts and 5 parts of perhexaperoxide 25B, 35 parts of a resin composition was prepared in the same manner as in Example 1, and cured at 200 ° C. for 1 hour to obtain a copper-clad laminate. The obtained copper-clad laminate had a glass transition temperature of 180 ° C., a dielectric constant of 3.0, a dielectric loss tangent of 0.003, a water absorption of 0.4%, and a linear expansion coefficient of 12 ppm.
【0024】[0024]
【実施例5】ポリマーA:50部、TAIC:40部、水素
化スチレン・ブタジエンコポリマー:10部、難燃剤SA
YTEX8010:25部、シリカ:45部からなる樹脂組成物
35部を用いて実施例1と同一の方法でプリプレグを作
成し、次いで200℃、90分間硬化させて両面銅張り
積層板を作成した。得られた銅張り積層板はガラス転移
温度240℃、誘電率2.9、誘電正接0.0025、
吸湿率0.35%、線膨張率9ppmであった。Example 5 Polymer A: 50 parts, TAIC: 40 parts, hydrogenated styrene / butadiene copolymer: 10 parts, flame retardant SA
A prepreg was prepared in the same manner as in Example 1 using 35 parts of a resin composition consisting of 25 parts of YTEX8010 and 45 parts of silica, and then cured at 200 ° C. for 90 minutes to prepare a double-sided copper-clad laminate. The obtained copper-clad laminate had a glass transition temperature of 240 ° C., a dielectric constant of 2.9, a dielectric loss tangent of 0.0025,
The moisture absorption was 0.35% and the coefficient of linear expansion was 9 ppm.
【0025】[0025]
【発明の効果】本発明のプリプレグから得られた積層板
は、低誘電率、低吸水率、高耐熱性、低線膨張率におい
て従来得られなかった良好な特性を有する。特に低線膨
張率、高耐熱、低吸水率を兼備しているので優れたプリ
ント配線板材料、特に半導体実装分野の材料とした好適
である。またガラスクロスを含まないために各種レーザ
ー加工が容易であるので高密度実装基板の製造が可能と
なる。The laminate obtained from the prepreg of the present invention has good characteristics which have not been obtained conventionally in terms of low dielectric constant, low water absorption, high heat resistance and low coefficient of linear expansion. In particular, it has both low coefficient of linear expansion, high heat resistance, and low water absorption, and is therefore suitable as an excellent printed wiring board material, particularly a material in the field of semiconductor mounting. In addition, since it does not include a glass cloth, various types of laser processing are easy, so that a high-density mounting substrate can be manufactured.
Claims (4)
と硬化性ポリフェニレンエーテル系樹脂組成物とを複合
してなるプリプレグ。1. A prepreg comprising a substrate formed of polybenzazole fiber and a curable polyphenylene ether-based resin composition.
られた硬化複合材料。2. A cured composite material obtained by curing the prepreg according to claim 1.
なる積層体。3. A laminate comprising the prepreg according to claim 1 and a metal foil.
る硬化積層体。4. A cured laminate comprising the cured composite material of claim 2 and a metal foil.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21464898A JP2000043042A (en) | 1998-07-29 | 1998-07-29 | Polyphenylene ether resin prepreg |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21464898A JP2000043042A (en) | 1998-07-29 | 1998-07-29 | Polyphenylene ether resin prepreg |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000043042A true JP2000043042A (en) | 2000-02-15 |
Family
ID=16659251
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21464898A Withdrawn JP2000043042A (en) | 1998-07-29 | 1998-07-29 | Polyphenylene ether resin prepreg |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000043042A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001274523A (en) * | 2000-03-23 | 2001-10-05 | Risho Kogyo Co Ltd | Prepreg for printed wiring board |
| JP2004510869A (en) * | 2000-10-04 | 2004-04-08 | ゼネラル・エレクトリック・カンパニイ | Flame retardant polycarbonate composition, production method and article |
| US7638564B2 (en) | 2005-10-04 | 2009-12-29 | Hitachi Chemical Co., Ltd. | Low dielectric loss tangent-resin varnish, prepreg, laminated sheet, and printed wiring board using the varnish |
-
1998
- 1998-07-29 JP JP21464898A patent/JP2000043042A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001274523A (en) * | 2000-03-23 | 2001-10-05 | Risho Kogyo Co Ltd | Prepreg for printed wiring board |
| JP2004510869A (en) * | 2000-10-04 | 2004-04-08 | ゼネラル・エレクトリック・カンパニイ | Flame retardant polycarbonate composition, production method and article |
| US7638564B2 (en) | 2005-10-04 | 2009-12-29 | Hitachi Chemical Co., Ltd. | Low dielectric loss tangent-resin varnish, prepreg, laminated sheet, and printed wiring board using the varnish |
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