JP2000042909A - Holding material for member to be polished and manufacture thereof - Google Patents
Holding material for member to be polished and manufacture thereofInfo
- Publication number
- JP2000042909A JP2000042909A JP20906698A JP20906698A JP2000042909A JP 2000042909 A JP2000042909 A JP 2000042909A JP 20906698 A JP20906698 A JP 20906698A JP 20906698 A JP20906698 A JP 20906698A JP 2000042909 A JP2000042909 A JP 2000042909A
- Authority
- JP
- Japan
- Prior art keywords
- holding material
- polyester
- foam layer
- wet foam
- supporter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 239000000203 mixture Substances 0.000 claims abstract description 19
- 239000006260 foam Substances 0.000 claims abstract description 14
- 229920002635 polyurethane Polymers 0.000 claims abstract description 13
- 239000004814 polyurethane Substances 0.000 claims abstract description 13
- 229920000728 polyester Polymers 0.000 claims description 15
- 229920005992 thermoplastic resin Polymers 0.000 claims description 9
- 229920005749 polyurethane resin Polymers 0.000 claims description 4
- 238000010030 laminating Methods 0.000 abstract description 3
- 239000000088 plastic resin Substances 0.000 abstract 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 19
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- -1 polypropylene Polymers 0.000 description 14
- 238000000034 method Methods 0.000 description 11
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 9
- 238000005498 polishing Methods 0.000 description 9
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 230000015271 coagulation Effects 0.000 description 6
- 238000005345 coagulation Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 229920005862 polyol Polymers 0.000 description 5
- 150000003077 polyols Chemical class 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920000909 polytetrahydrofuran Polymers 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 239000004970 Chain extender Substances 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 2
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 2
- IYWCBYFJFZCCGV-UHFFFAOYSA-N formamide;hydrate Chemical compound O.NC=O IYWCBYFJFZCCGV-UHFFFAOYSA-N 0.000 description 2
- 150000002334 glycols Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 229920003225 polyurethane elastomer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical compound O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- BVNSZWBIJTVRJP-UHFFFAOYSA-N chloroethene;ethyl carbamate Chemical compound ClC=C.CCOC(N)=O BVNSZWBIJTVRJP-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000921 polyethylene adipate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体ウエハー、
液晶ガラス等の被研磨部材の保持材に関するものであ
る。TECHNICAL FIELD The present invention relates to a semiconductor wafer,
The present invention relates to a holder for a member to be polished such as a liquid crystal glass.
【0002】[0002]
【従来の技術】一般的に、半導体ウエハーを回転加工装
置等の研磨機を用いて研磨加工する場合には、ウエハー
を研磨機の定盤に固定し、そして、この定盤と対向して
配設された定盤に研磨布を相対的に回転されると共に、
両者間に砥粒等を含む研磨液を供給する事によって、ウ
エハー表面を研磨する。2. Description of the Related Art In general, when a semiconductor wafer is polished by a polishing machine such as a rotary processing machine, the wafer is fixed to a surface plate of the polishing machine, and is arranged to face the surface plate. The polishing cloth is rotated relative to the set surface plate,
The wafer surface is polished by supplying a polishing liquid containing abrasive grains and the like between the two.
【0003】この際の、ウエハーの研磨用セラミックプ
レートへの保持方法としては、ウエハー片面にワックス
を塗布しセラミックプレートに固定するワックス方法
と、多孔質樹脂からなる保持材を用いてウエハーを水貼
りするワックスレス方法とがある。At this time, a method of holding the wafer on the ceramic plate for polishing includes a wax method in which wax is applied to one side of the wafer and the wafer is fixed to the ceramic plate, and a method in which the wafer is bonded with water using a holding material made of a porous resin. There is a waxless method to do.
【0004】ワックス方法は、後工程としてワックスの
除去作業が入る為、自動化の大きな障害となっている。
この点、ワックスレス方法が優れている。ワックスレス
方法は、ウエハーの研磨用セラミックプレートへの保持
だけでなく、液晶用ガラス等片面を仕上げ研磨する際も
非研磨体用保持材として、同様の保持材を用いて研磨す
る事が広く知られている。[0004] The wax method is a major obstacle to automation because a wax removal operation is required as a post-process.
In this regard, the waxless method is excellent. It is widely known that the waxless method is not only for holding a wafer on a ceramic plate for polishing, but also for polishing and polishing one side such as a glass for liquid crystal using a similar holding material as a holding material for a non-abrasive body. Have been.
【0005】これらの方法で用いられる保持体は、一般
にウレタン樹脂組成物を用いた湿式凝固で製造される。
この湿式凝固法は、ウレタン樹脂組成物を調整した後ウ
レタン樹脂組成物を支持体に塗布し、次いで水、ジメチ
ルフォルムアミド(DMF)混合溶液中にて湿式凝固処
理を行い、支持体上に発泡層を生成させ、その後乾燥し
場合によっては最表面をバフして保持材を得るものであ
る。[0005] The support used in these methods is generally produced by wet coagulation using a urethane resin composition.
In this wet coagulation method, after a urethane resin composition is prepared, the urethane resin composition is applied to a support, and then wet coagulation is performed in a mixed solution of water and dimethylformamide (DMF) to form a foam on the support. A layer is formed and then dried, and in some cases, the outermost surface is buffed to obtain a holding material.
【0006】[0006]
【発明が解決しようとする課題】このような保持体は、
一般的には寸法安定性、厚み均一性からポリエステルシ
ートを使用するが、ウレタンとの結合力が弱く、そのま
まではすぐに剥がれが生じる。SUMMARY OF THE INVENTION Such a holder is
Generally, a polyester sheet is used in view of dimensional stability and thickness uniformity, but the bonding force with urethane is weak, and peeling occurs immediately as it is.
【0007】特開平2−88229では、ウレタン重合
体に塩化ビニル重合体、塩化ビニル−酢酸ビニル共重合
体、及び塩化ビニル−酢酸ビニル−ビニルアルコールか
らなるビニル重合体を混合し、支持体上に直接設けられ
ている事を特徴にする保持材が提案されている。In JP-A-2-88229, a urethane polymer is mixed with a vinyl chloride polymer, a vinyl chloride-vinyl acetate copolymer, and a vinyl polymer composed of vinyl chloride-vinyl acetate-vinyl alcohol, and the mixture is formed on a support. A holding material characterized by being provided directly has been proposed.
【0008】しかしながら、ウレタン−塩化ビニル重合
体は相溶性に乏しく、分離しやすく、工業的に生産する
事が困難である。また、剥離強力も650g/25mm
以上が記載されているが、実用上では通算100時間以
上使用する場合もあり少なくとも2000g/25mm
以上の剥離強力が必要である。However, urethane-vinyl chloride polymers have poor compatibility, are easily separated, and are difficult to produce industrially. In addition, the peel strength is 650 g / 25 mm.
Although the above is described, at least 2000 g / 25 mm may be used for a total of 100 hours in practical use.
The above peel strength is required.
【0009】この事から保持材としてはポリエステルシ
ートと強固に接着したポリウレタン多孔質層が形成され
ている保持材が求められている。For this reason, as a holding material, a holding material having a polyurethane porous layer firmly bonded to a polyester sheet is required.
【0010】[0010]
【課題を解決するための手段】本発明者等は、上述の問
題点に鑑み鋭意研究し結果完成したものであって、本発
明の目的は剥離強力が強く、長時間使用可能な保持材を
提供する事にある。Means for Solving the Problems The present inventors have intensively studied in view of the above problems and completed the results. The object of the present invention is to provide a holding material which has a strong peeling strength and can be used for a long time. To provide.
【0011】上述の目的は、支持体に、支持体の組成と
湿式発泡層の組成を含む熱可塑性樹脂層、及び湿式発泡
層を順次積層する事により達成される。本発明に用いら
れる支持体としては、塩化ビニルシートやポリプロピレ
ンシート、ポリエステルシート等が挙げられるが、寸法
安定性、厚均一性からポリエステルシートが好適であ
る。The above object is achieved by sequentially laminating a thermoplastic resin layer containing the composition of the support and the composition of the wet foam layer, and the wet foam layer on the support. Examples of the support used in the present invention include a vinyl chloride sheet, a polypropylene sheet, and a polyester sheet, and a polyester sheet is preferable from the viewpoint of dimensional stability and thickness uniformity.
【0012】支持体に積層層される熱可塑性樹脂として
は、支持体との接着、上層のポリウレタン湿式発泡層と
の接着いずれも強固に接着する必要がある。As the thermoplastic resin laminated on the support, both the adhesion to the support and the adhesion to the upper polyurethane wet foam layer must be firmly adhered.
【0013】ポリエステル系樹脂では、その構造の近似
性よりポリエステルシートとは強力に接着するものの、
上層のポリウレタン湿式層との接着性に問題がある。ま
た、ポリウレタン系樹脂では、逆に、上層のポリウレタ
ン湿式層とは強力に接着するものの、ポリエステルシー
ト間との接着力に問題がある。Although the polyester resin strongly adheres to the polyester sheet due to the similarity of its structure,
There is a problem in adhesion to the upper polyurethane wet layer. On the other hand, although the polyurethane resin strongly adheres to the upper polyurethane wet layer, it has a problem in the adhesive strength between the polyester sheets.
【0014】しかしながら、熱可塑性樹脂層にポリエス
テル−ポリウレタン共重合体を用いる事により、支持体
−熱可塑性樹脂層−湿式発泡層が互いに強固に接着し,
2000g/25mmを大きく上回る剥離強力が得られ
る。However, by using the polyester-polyurethane copolymer for the thermoplastic resin layer, the support, the thermoplastic resin layer, and the wet foam layer are firmly adhered to each other.
A peel strength significantly exceeding 2000 g / 25 mm is obtained.
【0015】[0015]
【発明の実施の形態】ポリエステル−ポリウレタン共重
合体の組成比は相互に存在すればよく、特に限定される
ものではないが、好ましくはモル比にて20:80〜8
0:20である。BEST MODE FOR CARRYING OUT THE INVENTION The composition ratio of the polyester-polyurethane copolymer is not particularly limited as long as they are mutually present, but is preferably 20:80 to 8 in molar ratio.
0:20.
【0016】本使用の支持体には、塩化ビニルシートや
ポリプロピレンシート、ポリエステルシート等が挙げら
れるが、吸水性が低く湿潤時の寸法安定性が良く、研磨
液に対する化学的耐性に優れ、厚み精度が高く、表面平
滑性に優れるポリエステルシートを使用するのが一般的
である。好適にはクリスパーG1212’(東洋紡株式
会社製)が挙げられる。The support used in the present invention includes a vinyl chloride sheet, a polypropylene sheet, a polyester sheet, etc., and has low water absorption, good dimensional stability when wet, excellent chemical resistance to polishing liquid, and thickness accuracy. In general, a polyester sheet having high surface smoothness and excellent surface smoothness is used. Preferable is Crispar G1212 '(manufactured by Toyobo Co., Ltd.).
【0017】本発明の熱可塑性樹脂層には、塩化ビニル
やポリプロピレン、ポリエステル等と、ポリウレタンと
の共重合体が、相互接着強力の面から重要である。例え
ば市販品としては’バイロナールUR−1400’(東
洋紡株式会社製)が挙げられる。In the thermoplastic resin layer of the present invention, a copolymer of polyurethane with vinyl chloride, polypropylene, polyester or the like is important from the viewpoint of mutual adhesion strength. For example, as a commercially available product, “Vylonal UR-1400” (manufactured by Toyobo Co., Ltd.) may be mentioned.
【0018】支持体上に、上記組成物を予め適切な塗工
粘度に調整する為、メチルエチルケトン等の溶剤に希釈
し、リバースコーター、ナイフコーター等にて支持体上
にコーティングする。その後、80℃〜120℃にて溶
剤を完全に除去する。熱可塑性樹脂層の膜厚は特に限定
はされねいが薄すぎると接着効果が十分発揮されず、厚
すぎると厚みむらによる保持材としての性能を損なう危
険もある。好適には30〜60μmである。In order to adjust the above-mentioned composition to an appropriate coating viscosity on a support in advance, the composition is diluted with a solvent such as methyl ethyl ketone and coated on the support with a reverse coater, knife coater or the like. Thereafter, the solvent is completely removed at 80 ° C to 120 ° C. The thickness of the thermoplastic resin layer is not particularly limited, but if it is too thin, the adhesive effect is not sufficiently exhibited, and if it is too thick, there is a risk of impairing the performance as a holding material due to uneven thickness. Preferably it is 30 to 60 μm.
【0019】本発明に使用されるウレタン組成物とは、
一般的に有機ジイソシアネート、ポリオール類及び鎖伸
長剤とから成る。The urethane composition used in the present invention includes:
It generally comprises an organic diisocyanate, a polyol and a chain extender.
【0020】有機ジイソシアネートとしては、例えばジ
フェニルメタンー4、4’ージイソシアネート、キシリ
レンジイソシアネート、ジクロヘキシルメタンー4、
4’ージイソシアネート、ヘイサメチレンジイソシアネ
ート等、或はこれらの混合物が挙げられる。Examples of the organic diisocyanate include diphenylmethane-4,4'-diisocyanate, xylylenediisocyanate, dichlorohexylmethane-4,
Examples thereof include 4 'diisocyanate and hesamethylene diisocyanate, and mixtures thereof.
【0021】またポリオールとしては、ポリエチレンア
ジペートグリコール、ポリプロピレンアジペートグリコ
ール、ポリエチレンプロピレンアジペートグリコール、
ポリブチレンアジペートグリコール、ポリエチレンブチ
レンアジペートグリコール、ポリペンタメチレンアジペ
ートグリコール等のポリエステルポリオール類、或はポ
リエチレンエーテルグリコール、ポリプロピレンエーテ
ルグリコール、ポリテトラメチレンエーテルグリコール
等のポリエーテルポリオール類、或はラクトン環を開環
重合したポリカプロラクトン類の両末端に水酸基を有す
る分子量500〜8000のグリコール、或はポリヘキ
サメチレンカーボネート、更にはポリヘキサメチレンカ
ーボネイトと上述のポリオール類を併合し共重合させた
ものが挙げられる。As the polyol, polyethylene adipate glycol, polypropylene adipate glycol, polyethylene propylene adipate glycol,
Polyester polyols such as polybutylene adipate glycol, polyethylene butylene adipate glycol, polypentamethylene adipate glycol, or polyether polyols such as polyethylene ether glycol, polypropylene ether glycol, polytetramethylene ether glycol, or lactone ring opening Examples of the polymerized polycaprolactones include glycols having a hydroxyl group at both terminals and a molecular weight of 500 to 8000, or polyhexamethylene carbonate, and those obtained by combining and copolymerizing polyhexamethylene carbonate and the above-mentioned polyols.
【0022】鎖伸長剤としては、活性水素基を含んだ低
分子化合物、例えばエチレングリコール、、プロピレン
グリコール、ブチレングリコール、ジエチレングリコー
ル等のグリコール類、、例えばエチレンジアミン、プロ
ピレンジアミン、ブチレンジアミン等のジアミン類、あ
るいはアミノアルコール等を挙げることができる。Examples of the chain extender include low molecular weight compounds containing an active hydrogen group, for example, glycols such as ethylene glycol, propylene glycol, butylene glycol, and diethylene glycol; for example, diamines such as ethylene diamine, propylene diamine, and butylene diamine; Alternatively, amino alcohol and the like can be mentioned.
【0023】上述の組成からなるウレタン組成物を溶解
する溶剤としては、例えばジメチルホルムアミド、ジメ
チルスルホキシド、エトラヒドロフラン、ジメチルアセ
トアミド、エチルアセテート、ジオキサン等の水混和性
有機溶剤を挙げることができるが、特にこれらに限定さ
れるものではない。Examples of the solvent for dissolving the urethane composition having the above composition include water-miscible organic solvents such as dimethylformamide, dimethylsulfoxide, etrahydrofuran, dimethylacetamide, ethyl acetate and dioxane. It is not particularly limited to these.
【0024】ウレタン組成物の固形分濃度は、好ましく
は10〜40重量%、更に好ましくは15〜30重量%
である。固形分濃度が低すぎると湿式凝固後のウレタン
層表面に大きなうねりが発生し平滑性が悪化する。又固
形分が高すぎる場合空気を巻き込みやすく湿式凝固後の
ウレタン表面に大きな陥没が発生する場合がある。The solid content concentration of the urethane composition is preferably from 10 to 40% by weight, more preferably from 15 to 30% by weight.
It is. If the solid content concentration is too low, large undulations will occur on the surface of the urethane layer after wet coagulation, and the smoothness will deteriorate. On the other hand, if the solid content is too high, air is easily entrained, and large depressions may occur on the urethane surface after wet solidification.
【0025】上述の組成に調整されたウレタン組成物
を、すでにコーティングされた熱可塑性樹脂層上にリバ
ースコーター、ナイフコーター等の適宜な塗工手段を用
いてコーティングする。コート量は、特に限定しないが
150g〜1200g/m2 が好適である。The urethane composition adjusted to the above composition is coated on the already coated thermoplastic resin layer by using a suitable coating means such as a reverse coater or a knife coater. The coating amount is not particularly limited, but is preferably 150 g to 1200 g / m 2 .
【0026】ついで水、DMF(ジメチルアミド)混合
溶液中にて湿式凝固せしめた後、脱溶剤のための水洗、
乾燥をすることにより、コート層に発泡層が得られる。Then, after wet coagulation in a mixed solution of water and DMF (dimethylamide), washing with water is performed to remove the solvent.
By drying, a foam layer is obtained on the coat layer.
【0027】得られた保持材の表面そのままでも、十分
保持材として使用可能であり、液晶ガラスの場合は、こ
の保持材にガラスを水の表面張力により固定し研磨す
る。The surface of the obtained holding material can be used as it is as a holding material, and in the case of liquid crystal glass, the glass is fixed to the holding material by the surface tension of water and polished.
【0028】また、保持材の表面を、例えばサンドペー
パー好ましくは#120〜#320番手のサンドペーパ
ーを用いて、クリアランス0.3〜0.6mm、ライン
スピード1〜10m/分、ペーパー回転数500〜30
00rpmの条件にてバフィングを行う。Further, the surface of the holding material is coated with, for example, sandpaper, preferably # 120 to # 320 sandpaper, with a clearance of 0.3 to 0.6 mm, a line speed of 1 to 10 m / min, and a paper rotation speed of 500. ~ 30
Buffing is performed under the condition of 00 rpm.
【0029】シリコンウエハーの場合は、この様に表面
処理された保持材を使用し、ウエハーサイズに開口した
主としてガラス入りエポシキ樹脂にて形成されているテ
ンプレートを配置し、その中に非研磨物であるシリコン
ウエハーを水吸着して研磨する。In the case of a silicon wafer, using a holding material that has been surface-treated as described above, a template mainly made of glass-containing epoxy resin that is opened to the size of the wafer is arranged, and a non-polished material is placed in the template. A certain silicon wafer is polished by absorbing water.
【0030】[0030]
【実施例】以下、実施例、比較例により本発明品を詳述
する。尚、実施例、及び比較例中の「部」及び「%」
は、特に断わりの無い限り重量当りの比率である「重量
部」及び、単位重量当りの重量%比率である「重量%」
を意味する。 剥離強力の測定方法 保持材を25mm×100mmの長方形状に切出し、こ
れを試験片とした。2枚の試験片に、ウレタン系接着剤
を10mmのつかみしろを残して塗布し、互いに接着す
る。次に、テンシロンU−1798(オリエンテック株
式会社製)に、接着した試験片を固定し、相対的に10
0mm/分の速度で引っ張り、その強さを測定する。保
持材の剥離強力の評価は、実測値(g/25mm)を求
めるとともに、保持材の過酷な使用環境を考慮し、20
00g/25mm以上を○、それ以下を×として行っ
た。 実施例1〜3 ポリエステル:ポリウレタンのモル比を80:20、5
0:50、20:80に調整し、実施例1、2、3のそ
れぞれのポリエステル−ポリウレタン共重合体を得た。EXAMPLES Hereinafter, the product of the present invention will be described in detail with reference to Examples and Comparative Examples. In the Examples and Comparative Examples, “parts” and “%” are used.
“% By weight” is a percentage by weight and “% by weight” is a percentage by weight per unit weight unless otherwise specified.
Means Measuring method of peel strength The holding material was cut into a rectangular shape of 25 mm x 100 mm, and this was used as a test piece. A urethane-based adhesive is applied to two test pieces with a 10 mm gripping margin left, and adheres to each other. Next, the adhered test piece was fixed to Tensilon U-1798 (manufactured by Orientec Co., Ltd.), and the relative strength was 10
Pull at a speed of 0 mm / min and measure its strength. The evaluation of the peeling strength of the holding material was performed by calculating the actual measurement value (g / 25 mm) and considering the severe use environment of the holding material.
At least 00 g / 25 mm was evaluated as ○, and less than 00 g / 25 mm was evaluated as ×. Examples 1 to 3 The molar ratio of polyester: polyurethane was 80: 20,5.
The ratios were adjusted to 0:50 and 20:80 to obtain the respective polyester-polyurethane copolymers of Examples 1, 2, and 3.
【0031】そのポリエステル−ポリウレタン共重合体
をメチルエチルケトンで希釈して固形分25%に調整
し、ポリエステルシート(東洋紡株式会社製、’クリス
パーG1212( 厚み0.188mm))上に、ナイフ
コーターでクリアランス0.15mmにて塗布した。そ
の後、80℃、15分間乾燥し、約35μmの熱可塑性
層を形成しコートしたシートを得た。The polyester-polyurethane copolymer was diluted with methyl ethyl ketone to adjust the solid content to 25%, and the clearance was adjusted to 0% with a knife coater on a polyester sheet (manufactured by Toyobo Co., Ltd., 'Crisper G1212 (0.188 mm thick)). .15 mm. Thereafter, the sheet was dried at 80 ° C. for 15 minutes to obtain a sheet coated with a thermoplastic layer having a thickness of about 35 μm.
【0032】一方、ポリテトラメチレンエーテルグリコ
ール(PTMG)をポリオール成分として用い、ジフェ
ニル−4、4’−ジイスシアネート、ジアミンをジメチ
ルホルムアミド中で溶液重合させて、濃度30%のポリ
ウレタンエラストマー溶液を得た。このポリウレタンエ
ラストマー溶液100部に、カーボンブラック粉3部、
ステアリルアルコール3部、ジメチルホルムアミド10
0部を加え、塗布液を得た。On the other hand, using polytetramethylene ether glycol (PTMG) as a polyol component, diphenyl-4,4'-diisocyanate and diamine are solution-polymerized in dimethylformamide to obtain a polyurethane elastomer solution having a concentration of 30%. Was. 100 parts of this polyurethane elastomer solution, 3 parts of carbon black powder,
Stearyl alcohol 3 parts, dimethylformamide 10
0 parts were added to obtain a coating solution.
【0033】得た塗布液を、上記シート上にリバースコ
ーターで600g/m2 塗布した後、35℃の凝固浴
(水:ジメチルアミド=90:10重量比)中にて凝固
させ、温水で十分に脱溶媒した後、150℃にて熱風乾
燥を行い、厚み0.6mmの保持材を得た。 比較例1 ポリエステルシート上に、同一組成のポリエステル樹脂
(ポリウレタン樹脂不含)を使用する以外は、実施例1
〜3と同一の方法で保持材を製造した。 比較例2 ポリエステルシート上に、同一組成のポリウレタン樹脂
(ポリエステル樹脂不含)を使用する以外は、実施例1
〜3と同一の方法で保持材を製造した。After applying the obtained coating solution to the above sheet at 600 g / m 2 with a reverse coater, the coating solution is coagulated in a coagulation bath (water: dimethylamide = 90: 10 weight ratio) at 35 ° C. Then, hot air drying was performed at 150 ° C. to obtain a holding material having a thickness of 0.6 mm. Comparative Example 1 Example 1 was repeated except that a polyester resin (without polyurethane resin) having the same composition was used on a polyester sheet.
A holding material was produced in the same manner as in Nos. 1 to 3. Comparative Example 2 Example 1 was repeated except that a polyurethane resin (containing no polyester resin) having the same composition was used on a polyester sheet.
A holding material was produced in the same manner as in Nos. 1 to 3.
【0034】製造した各保持材は、それぞれテンシロン
U−1798装置で剥離強力を測定した。その結果を表
1に示した。実施例で明らかな様に、ポリエステルシー
トにポリエステル−ポリウレタン共重合体を用いた保持
材は、剥離強力は飛躍的に増加し、強靭な保持材である
ことが分かる。The peel strength of each of the produced holding materials was measured using a Tensilon U-1798 apparatus. The results are shown in Table 1. As is clear from the examples, the holding material using the polyester-polyurethane copolymer for the polyester sheet has a remarkably increased peel strength, and is a tough holding material.
【0035】[0035]
【表1】 [Table 1]
【0036】[0036]
【発明の効果】得られた保持材は、剥離強力が2000
g/2.5mm以上を有し、長時間の加工にも十分使用
可能な保持材であった。The obtained holding material has a peel strength of 2000.
The holding material had a g / 2.5 mm or more and was sufficiently usable for long-time processing.
Claims (5)
組成を含む熱可塑性樹脂層、及び湿式発泡層が順次積層
されている事を特徴とする被研磨部材の保持材。1. A holding material for a member to be polished, wherein a thermoplastic resin layer containing a composition of a support and a composition of a wet foam layer, and a wet foam layer are sequentially laminated on the support.
載の保持材。2. The holding material according to claim 1, wherein the support is made of polyester.
タン共重合体である事を特徴とする請求項1或は、請求
項2記載の保持材。3. The holding material according to claim 1, wherein the thermoplastic resin layer is a polyester-polyurethane copolymer.
す請求項1〜3記載の保持材。4. The holding material according to claim 1, wherein the wet foam layer mainly comprises a polyurethane resin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20906698A JP3909155B2 (en) | 1998-07-24 | 1998-07-24 | Holding material for member to be polished and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20906698A JP3909155B2 (en) | 1998-07-24 | 1998-07-24 | Holding material for member to be polished and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000042909A true JP2000042909A (en) | 2000-02-15 |
| JP3909155B2 JP3909155B2 (en) | 2007-04-25 |
Family
ID=16566695
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20906698A Expired - Fee Related JP3909155B2 (en) | 1998-07-24 | 1998-07-24 | Holding material for member to be polished and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3909155B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005332873A (en) * | 2004-05-18 | 2005-12-02 | Nitto Denko Corp | Protective sheet for semiconductor wafer processing, and backside grinding method for semiconductor wafer |
| JP2009066717A (en) * | 2007-09-14 | 2009-04-02 | Nitta Haas Inc | Gap filler for polishing pad and method for filling the same |
| JP2011073093A (en) * | 2009-09-30 | 2011-04-14 | Fujibo Holdings Inc | Sheet-like polishing member |
| JP2013052471A (en) * | 2011-09-02 | 2013-03-21 | Teijin Cordley Ltd | Suction pad material for polishing and method for manufacturing the same |
-
1998
- 1998-07-24 JP JP20906698A patent/JP3909155B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005332873A (en) * | 2004-05-18 | 2005-12-02 | Nitto Denko Corp | Protective sheet for semiconductor wafer processing, and backside grinding method for semiconductor wafer |
| JP2009066717A (en) * | 2007-09-14 | 2009-04-02 | Nitta Haas Inc | Gap filler for polishing pad and method for filling the same |
| JP2011073093A (en) * | 2009-09-30 | 2011-04-14 | Fujibo Holdings Inc | Sheet-like polishing member |
| JP2013052471A (en) * | 2011-09-02 | 2013-03-21 | Teijin Cordley Ltd | Suction pad material for polishing and method for manufacturing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3909155B2 (en) | 2007-04-25 |
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