[go: up one dir, main page]

IT1235578B - SEMICONDUCTOR LASER AND PRODUCTION PROCEDURE - Google Patents

SEMICONDUCTOR LASER AND PRODUCTION PROCEDURE

Info

Publication number
IT1235578B
IT1235578B IT8867279A IT6727988A IT1235578B IT 1235578 B IT1235578 B IT 1235578B IT 8867279 A IT8867279 A IT 8867279A IT 6727988 A IT6727988 A IT 6727988A IT 1235578 B IT1235578 B IT 1235578B
Authority
IT
Italy
Prior art keywords
semiconductor laser
production procedure
procedure
production
laser
Prior art date
Application number
IT8867279A
Other languages
Italian (it)
Other versions
IT8867279A0 (en
Inventor
Jean Pierre Hirtz
Claude Weisbuch
Jean Yves Raulin
Original Assignee
Thomson Csf
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson Csf filed Critical Thomson Csf
Publication of IT8867279A0 publication Critical patent/IT8867279A0/en
Application granted granted Critical
Publication of IT1235578B publication Critical patent/IT1235578B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3068—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure deep levels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34306—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000nm, e.g. InP based 1300 and 1500nm lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Lasers (AREA)
IT8867279A 1987-04-03 1988-03-29 SEMICONDUCTOR LASER AND PRODUCTION PROCEDURE IT1235578B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8704727A FR2674697A1 (en) 1987-04-03 1987-04-03 Semiconductor laser and method of production

Publications (2)

Publication Number Publication Date
IT8867279A0 IT8867279A0 (en) 1988-03-29
IT1235578B true IT1235578B (en) 1992-09-11

Family

ID=9349777

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8867279A IT1235578B (en) 1987-04-03 1988-03-29 SEMICONDUCTOR LASER AND PRODUCTION PROCEDURE

Country Status (4)

Country Link
FR (1) FR2674697A1 (en)
GB (1) GB8807724D0 (en)
IT (1) IT1235578B (en)
SE (1) SE8801290D0 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100377716B1 (en) 1998-02-25 2003-03-26 인터내셔널 비지네스 머신즈 코포레이션 Electric pumping of rare-earth-doped silicon for optical emission
US8284805B2 (en) * 2006-03-13 2012-10-09 The Uab Research Foundation Electrically pumped broadly tunable mid-infrared lasers based on quantum confined transition metal doped semiconductors

Also Published As

Publication number Publication date
FR2674697A1 (en) 1992-10-02
IT8867279A0 (en) 1988-03-29
GB8807724D0 (en) 1992-09-23
SE8801290D0 (en) 1988-03-31

Similar Documents

Publication Publication Date Title
NO891489D0 (en) PROCEDURE FOR MANUFACTURING HIV PROTEASE INHIBITORS
FR2639773B1 (en) TUNABLE SEMICONDUCTOR LASER
KR910001409A (en) Optical parts and manufacturing method
EP0314490A3 (en) Semiconductor laser
DE3689344D1 (en) Laser beam scanner and manufacturing process.
KR900011086A (en) Semiconductor diode laser and its manufacturing method
KR900009238A (en) Method of manufacturing ornaments
EP0300790A3 (en) Semiconductor laser
FR2585522B1 (en) SEMICONDUCTOR LASER
KR900009790A (en) Manufacturing method of mono-N-alkylated polyazamacrocycle
NO168397C (en) LASER DEVICES
FR2613548B1 (en) SEMICONDUCTOR LASER
DK554289A (en) -NEON LASER HELIUM
IT1240232B (en) SEMICONDUCTOR LASER DEVICE AND PROCEDURE FOR THE PRODUCTION OF THE SAME.
FR2628891B1 (en) SEMICONDUCTOR LASER
KR960009304B1 (en) Semiconductor laser devices
FR2649549B1 (en) QUANTUM WELL SEMICONDUCTOR LASER
FI913381A7 (en) Semiconductor laser amplifier
EP0291936A3 (en) Semiconductor laser
DK589187D0 (en) LASER
FR2615331B3 (en) LASER
IT1235578B (en) SEMICONDUCTOR LASER AND PRODUCTION PROCEDURE
KR890004394A (en) Method of manufacturing a semiconductor device
EP0306314A3 (en) Semiconductor laser devices
KR890011656A (en) Manufacturing method of nozzle member