[go: up one dir, main page]

IT1262924B - Ageing-resistant photosensitive layer composition - Google Patents

Ageing-resistant photosensitive layer composition

Info

Publication number
IT1262924B
IT1262924B ITMI920029A ITMI920029A IT1262924B IT 1262924 B IT1262924 B IT 1262924B IT MI920029 A ITMI920029 A IT MI920029A IT MI920029 A ITMI920029 A IT MI920029A IT 1262924 B IT1262924 B IT 1262924B
Authority
IT
Italy
Prior art keywords
phenol
photosensitive layer
layer composition
ageing
derivative
Prior art date
Application number
ITMI920029A
Other languages
Italian (it)
Inventor
Mario Piro
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Priority to ITMI920029A priority Critical patent/IT1262924B/en
Publication of ITMI920029A0 publication Critical patent/ITMI920029A0/en
Priority to EP92121970A priority patent/EP0550893A1/en
Priority to JP5001670A priority patent/JPH05273751A/en
Publication of ITMI920029A1 publication Critical patent/ITMI920029A1/en
Application granted granted Critical
Publication of IT1262924B publication Critical patent/IT1262924B/en

Links

Landscapes

  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

This invention relates to a positive photosensitive layer composition which following a process of inversion is capable of also acting as a negative, comprising a diazo resin based on orthoquinone diazide 4-and/or 5-sulphonate and a polymer compound based on resin derived from phenol and/or a phenol derivative condensate with formaldehyde or a phenol vinyl and/or a vinyl phenol derivative polymerised by radical means in which the said composition also comprises an antioxidant comprising a phenol or polyphenol derivative having a molecular weight of more than 108.
ITMI920029A 1992-01-10 1992-01-10 Ageing-resistant photosensitive layer composition IT1262924B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
ITMI920029A IT1262924B (en) 1992-01-10 1992-01-10 Ageing-resistant photosensitive layer composition
EP92121970A EP0550893A1 (en) 1992-01-10 1992-12-24 Light sensitive layer for positive-negative copying material
JP5001670A JPH05273751A (en) 1992-01-10 1993-01-08 Positive-negative photosensitive layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITMI920029A IT1262924B (en) 1992-01-10 1992-01-10 Ageing-resistant photosensitive layer composition

Publications (3)

Publication Number Publication Date
ITMI920029A0 ITMI920029A0 (en) 1992-01-10
ITMI920029A1 ITMI920029A1 (en) 1993-07-10
IT1262924B true IT1262924B (en) 1996-07-22

Family

ID=11361509

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI920029A IT1262924B (en) 1992-01-10 1992-01-10 Ageing-resistant photosensitive layer composition

Country Status (1)

Country Link
IT (1) IT1262924B (en)

Also Published As

Publication number Publication date
ITMI920029A1 (en) 1993-07-10
ITMI920029A0 (en) 1992-01-10

Similar Documents

Publication Publication Date Title
TW353086B (en) Method for multistep coating of a surface
KR900002123A (en) Radiation-sensitive positive resist composition
SG75110A1 (en) Polymer composition and resist material
FI99125B (en) Polylaktidikoostumus
AU4482493A (en) Multi-stage polymers having alkali-soluble and alkali- insoluble stages
BR9304775A (en) Process for the preparation of aqueous polymer emulsion by the polymerization of free radical aqueous emulsion of at least one monomer in the presence of a stabilizing composition, and aqueous and polymer emulsion.
KR920006427A (en) Polybutene-1 Resin Composition
CA2116111A1 (en) A process for Preparing a Binder Resin Useful in Electrophotographic Toner
IT1262924B (en) Ageing-resistant photosensitive layer composition
EP0532240A3 (en) Composition and method for inhibition of styrene polymerization
ES536358A0 (en) PROCEDURE FOR PREPARING AN IMPACT RESISTANT THERMOPLASTIC MOLDING COMPOUND
EP1078945A3 (en) Polymer for use in a photoresist composition
MY114498A (en) Fractionated novolak resin and photoresist composition therefrom
ATE17128T1 (en) CURING POLYESTER COMPOSITIONS.
DE3382518D1 (en) METHOD FOR PRODUCING ACRYLIC RESIN MOLD WITH LOW WATER ABSORPTION.
KR930004806A (en) Positive resist composition
ATE112793T1 (en) CONSENSATION POLYMERS MODIFIED WITH KETONE OR ATHERKETONE GROUP-CONTAINING COMPOUNDS.
IT1239315B (en) Composition of a positive photosensitive layer also with the function of a negative
ATE139436T1 (en) HAIRSPRAY COMPOSITIONS CONTAINING FLUORINE SURFACE-ACTIVE SUBSTANCES
FI904568A0 (en) GUMMISAMMANSAETTNINGAR FOER SLIRSKYDDANORDNINGAR OCH SLIRSKYDDANORDNINGAR FOER DAECK.
IL100248A0 (en) Process for the preparation of 4-hydroxystyrene polymers from 4-acetoxystyrene polymers
KR850005854A (en) Plating resin
JPS56166259A (en) Resin composition
MY110875A (en) Abrasive.
BR9916378A (en) Mixtures of polymers with release agents

Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970424