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IT1112625B - PERFECTED EQUIPMENT FOR ION IMPLANTATION - Google Patents

PERFECTED EQUIPMENT FOR ION IMPLANTATION

Info

Publication number
IT1112625B
IT1112625B IT22795/78A IT2279578A IT1112625B IT 1112625 B IT1112625 B IT 1112625B IT 22795/78 A IT22795/78 A IT 22795/78A IT 2279578 A IT2279578 A IT 2279578A IT 1112625 B IT1112625 B IT 1112625B
Authority
IT
Italy
Prior art keywords
ion implantation
perfected
equipment
perfected equipment
implantation
Prior art date
Application number
IT22795/78A
Other languages
Italian (it)
Other versions
IT7822795A0 (en
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/794,275 external-priority patent/US4118630A/en
Priority claimed from US05/794,276 external-priority patent/US4135097A/en
Application filed by Ibm filed Critical Ibm
Publication of IT7822795A0 publication Critical patent/IT7822795A0/en
Application granted granted Critical
Publication of IT1112625B publication Critical patent/IT1112625B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/026Means for avoiding or neutralising unwanted electrical charges on tube components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/24405Faraday cages
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245Detection characterised by the variable being measured
    • H01J2237/24507Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
IT22795/78A 1977-05-05 1978-04-28 PERFECTED EQUIPMENT FOR ION IMPLANTATION IT1112625B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/794,275 US4118630A (en) 1977-05-05 1977-05-05 Ion implantation apparatus with a cooled structure controlling the surface potential of a target surface
US05/794,276 US4135097A (en) 1977-05-05 1977-05-05 Ion implantation apparatus for controlling the surface potential of a target surface

Publications (2)

Publication Number Publication Date
IT7822795A0 IT7822795A0 (en) 1978-04-28
IT1112625B true IT1112625B (en) 1986-01-20

Family

ID=27121491

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22795/78A IT1112625B (en) 1977-05-05 1978-04-28 PERFECTED EQUIPMENT FOR ION IMPLANTATION

Country Status (5)

Country Link
DE (1) DE2819114C3 (en)
FR (1) FR2389998B1 (en)
GB (1) GB1584224A (en)
IT (1) IT1112625B (en)
NL (1) NL7804691A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2490873A1 (en) * 1980-09-24 1982-03-26 Varian Associates METHOD AND DEVICE FOR PRODUCING IMPROVED NEUTRALIZATION OF POSITIVE ION BEAM
FR2793951B1 (en) * 1999-05-21 2001-08-17 Centre Nat Etd Spatiales PROCESS AND INSTALLATION FOR PROCESSING A SUBSTRATE SUCH AS AN INTEGRATED CIRCUIT WITH A FOCUSED BEAM OF ELECTRICALLY NEUTRAL PARTICLES

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2890342A (en) * 1954-09-29 1959-06-09 Gen Electric System for charge neutralization
US3313969A (en) * 1966-03-25 1967-04-11 Boeing Co Charged particle deflecting apparatus having hemispherical electrodes
US3507709A (en) * 1967-09-15 1970-04-21 Hughes Aircraft Co Method of irradiating dielectriccoated semiconductor bodies with low energy electrons
US3997846A (en) * 1975-06-30 1976-12-14 International Business Machines Corporation Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus
US4011449A (en) * 1975-11-05 1977-03-08 Ibm Corporation Apparatus for measuring the beam current of charged particle beam
US4013891A (en) * 1975-12-15 1977-03-22 Ibm Corporation Method for varying the diameter of a beam of charged particles

Also Published As

Publication number Publication date
DE2819114C3 (en) 1982-03-04
GB1584224A (en) 1981-02-11
FR2389998B1 (en) 1981-11-20
NL7804691A (en) 1978-11-07
DE2819114A1 (en) 1978-11-16
FR2389998A1 (en) 1978-12-01
IT7822795A0 (en) 1978-04-28
DE2819114B2 (en) 1981-07-16

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