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IT1193534B - SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA - Google Patents

SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA

Info

Publication number
IT1193534B
IT1193534B IT22046/80A IT2204680A IT1193534B IT 1193534 B IT1193534 B IT 1193534B IT 22046/80 A IT22046/80 A IT 22046/80A IT 2204680 A IT2204680 A IT 2204680A IT 1193534 B IT1193534 B IT 1193534B
Authority
IT
Italy
Prior art keywords
semiconductor laser
laser device
single filament
sending area
light equipped
Prior art date
Application number
IT22046/80A
Other languages
Italian (it)
Other versions
IT8022046A0 (en
Inventor
Dan Botez
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of IT8022046A0 publication Critical patent/IT8022046A0/en
Application granted granted Critical
Publication of IT1193534B publication Critical patent/IT1193534B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2232Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2232Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • H01S5/2234Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2232Buried stripe structure with inner confining structure between the active layer and the lower electrode
    • H01S5/2234Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
    • H01S5/2235Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface with a protrusion

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
IT22046/80A 1979-10-12 1980-05-14 SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA IT1193534B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8438779A 1979-10-12 1979-10-12

Publications (2)

Publication Number Publication Date
IT8022046A0 IT8022046A0 (en) 1980-05-14
IT1193534B true IT1193534B (en) 1988-07-08

Family

ID=22184652

Family Applications (1)

Application Number Title Priority Date Filing Date
IT22046/80A IT1193534B (en) 1979-10-12 1980-05-14 SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA

Country Status (4)

Country Link
JP (1) JPS5661190A (en)
DE (1) DE3021104A1 (en)
GB (1) GB2062949B (en)
IT (1) IT1193534B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2129211B (en) * 1982-10-21 1987-01-14 Rca Corp Semiconductor laser and a method of making same
FR2535121B1 (en) * 1982-10-25 1989-01-06 Rca Corp SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREOF
JPH0732278B2 (en) * 1982-10-27 1995-04-10 アールシーエー コーポレーシヨン Semiconductor laser
US4523316A (en) * 1982-10-29 1985-06-11 Rca Corporation Semiconductor laser with non-absorbing mirror facet
JPS62188220A (en) * 1986-02-13 1987-08-17 Sharp Corp Method of liquid-phase epitaxy
CN114150367B (en) * 2021-11-26 2023-07-04 华中科技大学 Laser cladding repair method and repair system for high-temperature alloy single crystal defect

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166253A (en) * 1977-08-15 1979-08-28 International Business Machines Corporation Heterostructure diode injection laser having a constricted active region
IT1121922B (en) * 1978-07-31 1986-04-23 Rca Corp SEMICONDUCTOR LASER, EMISSING A SINGLE BEAM OF LIGHT

Also Published As

Publication number Publication date
DE3021104A1 (en) 1981-04-23
GB2062949A (en) 1981-05-28
JPS5661190A (en) 1981-05-26
IT8022046A0 (en) 1980-05-14
GB2062949B (en) 1983-08-10

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