IT1193534B - SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA - Google Patents
SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREAInfo
- Publication number
- IT1193534B IT1193534B IT22046/80A IT2204680A IT1193534B IT 1193534 B IT1193534 B IT 1193534B IT 22046/80 A IT22046/80 A IT 22046/80A IT 2204680 A IT2204680 A IT 2204680A IT 1193534 B IT1193534 B IT 1193534B
- Authority
- IT
- Italy
- Prior art keywords
- semiconductor laser
- laser device
- single filament
- sending area
- light equipped
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2232—Buried stripe structure with inner confining structure between the active layer and the lower electrode
- H01S5/2234—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface
- H01S5/2235—Buried stripe structure with inner confining structure between the active layer and the lower electrode having a structured substrate surface with a protrusion
Landscapes
- Physics & Mathematics (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US8438779A | 1979-10-12 | 1979-10-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| IT8022046A0 IT8022046A0 (en) | 1980-05-14 |
| IT1193534B true IT1193534B (en) | 1988-07-08 |
Family
ID=22184652
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT22046/80A IT1193534B (en) | 1979-10-12 | 1980-05-14 | SEMICONDUCTOR LASER DEVICE, WITH A SINGLE FILAMENT OF LIGHT EQUIPPED WITH A LARGE SENDING AREA |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5661190A (en) |
| DE (1) | DE3021104A1 (en) |
| GB (1) | GB2062949B (en) |
| IT (1) | IT1193534B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2129211B (en) * | 1982-10-21 | 1987-01-14 | Rca Corp | Semiconductor laser and a method of making same |
| FR2535121B1 (en) * | 1982-10-25 | 1989-01-06 | Rca Corp | SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREOF |
| JPH0732278B2 (en) * | 1982-10-27 | 1995-04-10 | アールシーエー コーポレーシヨン | Semiconductor laser |
| US4523316A (en) * | 1982-10-29 | 1985-06-11 | Rca Corporation | Semiconductor laser with non-absorbing mirror facet |
| JPS62188220A (en) * | 1986-02-13 | 1987-08-17 | Sharp Corp | Method of liquid-phase epitaxy |
| CN114150367B (en) * | 2021-11-26 | 2023-07-04 | 华中科技大学 | Laser cladding repair method and repair system for high-temperature alloy single crystal defect |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4166253A (en) * | 1977-08-15 | 1979-08-28 | International Business Machines Corporation | Heterostructure diode injection laser having a constricted active region |
| IT1121922B (en) * | 1978-07-31 | 1986-04-23 | Rca Corp | SEMICONDUCTOR LASER, EMISSING A SINGLE BEAM OF LIGHT |
-
1980
- 1980-04-30 GB GB8014175A patent/GB2062949B/en not_active Expired
- 1980-05-14 IT IT22046/80A patent/IT1193534B/en active
- 1980-06-04 DE DE19803021104 patent/DE3021104A1/en not_active Withdrawn
- 1980-06-11 JP JP7957180A patent/JPS5661190A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE3021104A1 (en) | 1981-04-23 |
| GB2062949A (en) | 1981-05-28 |
| JPS5661190A (en) | 1981-05-26 |
| IT8022046A0 (en) | 1980-05-14 |
| GB2062949B (en) | 1983-08-10 |
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