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IT1171401B - TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION - Google Patents

TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION

Info

Publication number
IT1171401B
IT1171401B IT48932/81A IT4893281A IT1171401B IT 1171401 B IT1171401 B IT 1171401B IT 48932/81 A IT48932/81 A IT 48932/81A IT 4893281 A IT4893281 A IT 4893281A IT 1171401 B IT1171401 B IT 1171401B
Authority
IT
Italy
Prior art keywords
thin film
value adjustment
film resistors
trimming value
adjustment thin
Prior art date
Application number
IT48932/81A
Other languages
Italian (it)
Other versions
IT8148932A1 (en
IT8148932A0 (en
Inventor
Carlo Misiano
Enrico Simonetti
Original Assignee
Selenia Ind Eletroniche Associ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Selenia Ind Eletroniche Associ filed Critical Selenia Ind Eletroniche Associ
Priority to IT48932/81A priority Critical patent/IT1171401B/en
Publication of IT8148932A0 publication Critical patent/IT8148932A0/en
Priority to EP82830171A priority patent/EP0070809A3/en
Publication of IT8148932A1 publication Critical patent/IT8148932A1/en
Application granted granted Critical
Publication of IT1171401B publication Critical patent/IT1171401B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
IT48932/81A 1981-07-20 1981-07-20 TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION IT1171401B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IT48932/81A IT1171401B (en) 1981-07-20 1981-07-20 TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION
EP82830171A EP0070809A3 (en) 1981-07-20 1982-06-15 Adjustment to desired value (trimming) on thin film resistors by ion sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT48932/81A IT1171401B (en) 1981-07-20 1981-07-20 TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION

Publications (3)

Publication Number Publication Date
IT8148932A0 IT8148932A0 (en) 1981-07-20
IT8148932A1 IT8148932A1 (en) 1983-01-20
IT1171401B true IT1171401B (en) 1987-06-10

Family

ID=11269073

Family Applications (1)

Application Number Title Priority Date Filing Date
IT48932/81A IT1171401B (en) 1981-07-20 1981-07-20 TRIMMING VALUE ADJUSTMENT THIN FILM RESISTORS BY IONIC EROSION

Country Status (2)

Country Link
EP (1) EP0070809A3 (en)
IT (1) IT1171401B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2213986A (en) * 1987-12-16 1989-08-23 Philips Electronic Associated Fabrication of resistors in microwave and other circuits
US6475400B2 (en) 2001-02-26 2002-11-05 Trw Inc. Method for controlling the sheet resistance of thin film resistors
DE10162540A1 (en) * 2001-12-19 2003-07-10 Infineon Technologies Ag Component and method for its production
US10680056B1 (en) 2018-12-26 2020-06-09 Texas Instruments Incorporated IC with ion milled thin-film resistors

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3860783A (en) * 1970-10-19 1975-01-14 Bell Telephone Labor Inc Ion etching through a pattern mask
DE2144656A1 (en) * 1971-09-07 1973-03-15 Hottinger Messtechnik Baldwin PROCEDURE AND ARRANGEMENT FOR CHANGING THE ELECTRICAL RESISTANCE
DE2449731A1 (en) * 1973-12-03 1975-06-05 Hewlett Packard Co ETCHING PROCEDURE
FR2354617A1 (en) * 1976-06-08 1978-01-06 Electro Resistance PROCESS FOR THE MANUFACTURE OF ELECTRICAL RESISTORS FROM METAL SHEETS OR FILMS AND RESISTANCES OBTAINED

Also Published As

Publication number Publication date
EP0070809A2 (en) 1983-01-26
EP0070809A3 (en) 1983-07-13
IT8148932A1 (en) 1983-01-20
IT8148932A0 (en) 1981-07-20

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