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IL87334A0 - Method and apparatus for the insitu generation of volatile compounds for chemical vapor deposition - Google Patents

Method and apparatus for the insitu generation of volatile compounds for chemical vapor deposition

Info

Publication number
IL87334A0
IL87334A0 IL87334A IL8733488A IL87334A0 IL 87334 A0 IL87334 A0 IL 87334A0 IL 87334 A IL87334 A IL 87334A IL 8733488 A IL8733488 A IL 8733488A IL 87334 A0 IL87334 A0 IL 87334A0
Authority
IL
Israel
Prior art keywords
vapor deposition
chemical vapor
volatile compounds
insitu
generation
Prior art date
Application number
IL87334A
Other languages
English (en)
Original Assignee
Santa Barbara Res Center
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Santa Barbara Res Center filed Critical Santa Barbara Res Center
Publication of IL87334A0 publication Critical patent/IL87334A0/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
IL87334A 1987-08-31 1988-08-04 Method and apparatus for the insitu generation of volatile compounds for chemical vapor deposition IL87334A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US9122787A 1987-08-31 1987-08-31

Publications (1)

Publication Number Publication Date
IL87334A0 true IL87334A0 (en) 1989-01-31

Family

ID=22226698

Family Applications (1)

Application Number Title Priority Date Filing Date
IL87334A IL87334A0 (en) 1987-08-31 1988-08-04 Method and apparatus for the insitu generation of volatile compounds for chemical vapor deposition

Country Status (2)

Country Link
IL (1) IL87334A0 (fr)
WO (1) WO1989001988A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6001172A (en) * 1997-08-05 1999-12-14 Advanced Technology Materials, Inc. Apparatus and method for the in-situ generation of dopants
KR100458779B1 (ko) * 2000-03-27 2004-12-03 미츠비시 쥬고교 가부시키가이샤 금속막의 제작방법 및 그 제작장치
GB0108782D0 (en) * 2001-04-07 2001-05-30 Trikon Holdings Ltd Methods and apparatus for forming precursors
US10497532B2 (en) * 2014-10-27 2019-12-03 Entegris, Inc. Ion implantation processes and apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2148945B (en) * 1983-10-19 1987-01-07 Marconi Co Ltd Metal telluride manufacture; synthesis of hydrogen telluride
EP0173715B1 (fr) * 1984-02-13 1992-04-22 SCHMITT, Jerome J. III Procede et appareil pour le depot par jet de gaz de minces films solides conducteurs et dielectriques et produits fabriques de la sorte
JPH084072B2 (ja) * 1986-01-14 1996-01-17 キヤノン株式会社 堆積膜形成法

Also Published As

Publication number Publication date
WO1989001988A1 (fr) 1989-03-09

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