IL82623A0 - Light-sensitive mixture and light-sensitive recording material prepared from it - Google Patents

Light-sensitive mixture and light-sensitive recording material prepared from it

Info

Publication number: IL82623A0
Authority: IL; Israel
Prior art keywords: light; sensitive; recording material; material prepared; mixture
Prior art date: 1986-05-24

Application number

IL82623A

Other languages

English (en)

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-05-24

Filing date

1987-05-21

Publication date

1987-11-30

1987-05-21 Application filed by Hoechst Ag filed Critical Hoechst Ag

1987-11-30 Publication of IL82623A0 publication Critical patent/IL82623A0/xx

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

IL82623A 1986-05-24 1987-05-21 Light-sensitive mixture and light-sensitive recording material prepared from it IL82623A0 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19863617499 DE3617499A1 (de)	1986-05-24	1986-05-24	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number	Publication Date
IL82623A0 true IL82623A0 (en)	1987-11-30

Family

ID=6301558

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL82623A IL82623A0 (en)	1986-05-24	1987-05-21	Light-sensitive mixture and light-sensitive recording material prepared from it

Country Status (11)

Country	Link
US (1)	US4828959A (xx)
EP (1)	EP0247461B1 (xx)
JP (1)	JPS62289835A (xx)
KR (1)	KR870011501A (xx)
AU (1)	AU7342387A (xx)
BR (1)	BR8702644A (xx)
CA (1)	CA1328047C (xx)
DE (2)	DE3617499A1 (xx)
FI (1)	FI872238L (xx)
IL (1)	IL82623A0 (xx)
ZA (1)	ZA873694B (xx)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5948591A (en) *	1997-05-27	1999-09-07	Agfa-Gevaert, N.V.	Heat sensitive imaging element and a method for producing lithographic plates therewith
DE10204114A1 (de) *	2002-02-01	2003-08-14	Basf Coatings Ag	Thermisch und mit aktinischer Strahlung härtbares Stoffgemisch, Verfahren zu seiner Herstellung und seine Verwendung

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3544320A (en) *	1966-07-21	1970-12-01	Yoshikazu Yamada	Stabilization of light sensitive film with a peroxide,perchlorate or perborate
US3867147A (en) *	1969-05-20	1975-02-18	Hoechst Co American	Light-sensitive diazo compounds and reproduction material employing the same
US3660097A (en) *	1969-11-28	1972-05-02	Polychrome Corp	Diazo-polyurethane light-sensitive compositions
US4289838A (en) *	1972-12-14	1981-09-15	Polychrome Corporation	Diazo-unsaturated monomer light sensitive compositions
AR205345A1 (es) *	1973-06-20	1976-04-30	Minnesota Mining & Mfg	Composicion organofilica fotosensible y placa litografica preparada con la misma
US4259430A (en) *	1974-05-01	1981-03-31	International Business Machines Corporation	Photoresist O-quinone diazide containing composition and resist mask formation process
DE3036077A1 (de) *	1980-09-25	1982-05-06	Hoechst Ag, 6000 Frankfurt	Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3130987A1 (de) *	1981-08-05	1983-02-24	Hoechst Ag, 6000 Frankfurt	Verfahren zur herstellung von flachdruckformen aus einem lichtempfindlichen material auf basis von diazoniumsalz-polykondensationsprodukten
DE3246037A1 (de) *	1982-12-09	1984-06-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
CA1216455A (en) *	1983-01-17	1987-01-13	Frederick W. Sanders	Imaging system
US4564580A (en) *	1983-06-30	1986-01-14	Kogyo Gijutsuin	Photosensitive resin composition
DE3404366A1 (de) *	1984-02-08	1985-08-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3425328A1 (de) *	1984-07-10	1986-01-16	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3504658A1 (de) *	1985-02-12	1986-08-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial

1986
- 1986-05-24 DE DE19863617499 patent/DE3617499A1/de not_active Withdrawn
1987
- 1987-05-15 EP EP87107064A patent/EP0247461B1/de not_active Expired - Lifetime
- 1987-05-15 DE DE87107064T patent/DE3789469D1/de not_active Expired - Fee Related
- 1987-05-21 FI FI872238A patent/FI872238L/fi not_active Application Discontinuation
- 1987-05-21 IL IL82623A patent/IL82623A0/xx unknown
- 1987-05-22 BR BR8702644A patent/BR8702644A/pt unknown
- 1987-05-22 US US07/053,011 patent/US4828959A/en not_active Expired - Fee Related
- 1987-05-22 JP JP62124101A patent/JPS62289835A/ja active Pending
- 1987-05-22 KR KR870005085A patent/KR870011501A/ko not_active Withdrawn
- 1987-05-22 CA CA000537711A patent/CA1328047C/en not_active Expired - Fee Related
- 1987-05-22 ZA ZA873694A patent/ZA873694B/xx unknown
- 1987-05-25 AU AU73423/87A patent/AU7342387A/en not_active Abandoned

Also Published As

Publication number	Publication date
ZA873694B (en)	1987-11-18
KR870011501A (ko)	1987-12-23
CA1328047C (en)	1994-03-29
EP0247461A2 (de)	1987-12-02
FI872238A0 (fi)	1987-05-21
FI872238A7 (fi)	1987-11-25
DE3617499A1 (de)	1987-11-26
JPS62289835A (ja)	1987-12-16
FI872238L (fi)	1987-11-25
BR8702644A (pt)	1988-02-23
EP0247461B1 (de)	1994-03-30
AU7342387A (en)	1987-11-26
DE3789469D1 (de)	1994-05-05
EP0247461A3 (en)	1988-07-20
US4828959A (en)	1989-05-09

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