[go: up one dir, main page]

IL40285A0 - Method and apparatus for generating a glow discharge - Google Patents

Method and apparatus for generating a glow discharge

Info

Publication number
IL40285A0
IL40285A0 IL40285A IL4028572A IL40285A0 IL 40285 A0 IL40285 A0 IL 40285A0 IL 40285 A IL40285 A IL 40285A IL 4028572 A IL4028572 A IL 4028572A IL 40285 A0 IL40285 A0 IL 40285A0
Authority
IL
Israel
Prior art keywords
generating
glow discharge
glow
discharge
Prior art date
Application number
IL40285A
Other versions
IL40285A (en
Original Assignee
Telic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Telic Corp filed Critical Telic Corp
Publication of IL40285A0 publication Critical patent/IL40285A0/en
Publication of IL40285A publication Critical patent/IL40285A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
IL40285A 1971-09-07 1972-09-04 Method and apparatus for generating a glow discharge IL40285A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US178240A US3884793A (en) 1971-09-07 1971-09-07 Electrode type glow discharge apparatus
US25450472A 1972-05-18 1972-05-18

Publications (2)

Publication Number Publication Date
IL40285A0 true IL40285A0 (en) 1972-11-28
IL40285A IL40285A (en) 1976-01-30

Family

ID=26874127

Family Applications (1)

Application Number Title Priority Date Filing Date
IL40285A IL40285A (en) 1971-09-07 1972-09-04 Method and apparatus for generating a glow discharge

Country Status (8)

Country Link
US (1) US3884793A (en)
CA (1) CA1006116A (en)
CH (1) CH589940A5 (en)
DE (3) DE2264436A1 (en)
FR (2) FR2152633B1 (en)
GB (2) GB1420061A (en)
IL (1) IL40285A (en)
NL (1) NL7211911A (en)

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166018A (en) * 1974-01-31 1979-08-28 Airco, Inc. Sputtering process and apparatus
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
JPS51117933A (en) * 1975-04-10 1976-10-16 Tokuda Seisakusho Spattering apparatus
FR2324755A1 (en) * 1975-09-19 1977-04-15 Anvar HIGH SPEED OF DEPOSIT CATHODIC SPRAY DEVICE
US4046660A (en) * 1975-12-29 1977-09-06 Bell Telephone Laboratories, Incorporated Sputter coating with charged particle flux control
NL7607473A (en) * 1976-07-07 1978-01-10 Philips Nv SPRAYING DEVICE AND METHOD FOR SPRAYING WITH SUCH A DEVICE
US4179351A (en) * 1976-09-09 1979-12-18 Hewlett-Packard Company Cylindrical magnetron sputtering source
DE2655942A1 (en) * 1976-12-10 1978-06-15 Tokuda Seisakusho Kawasaki Kk Metals deposited by cathodic sputtering - in appts. using magnetic field to increase sputtering rate
US4126530A (en) * 1977-08-04 1978-11-21 Telic Corporation Method and apparatus for sputter cleaning and bias sputtering
JPS54137642A (en) * 1978-04-12 1979-10-25 Battelle Memorial Institute Electrode for reversible fuel cell* and method of and apparatus for producing same
GB2028377B (en) * 1978-08-21 1982-12-08 Vac Tec Syst Magnetically-enhanced sputtering device
EP0045822B1 (en) * 1980-08-08 1985-05-29 Battelle Development Corporation Cylindrical magnetron sputtering cathode
EP0046154B1 (en) * 1980-08-08 1984-11-28 Battelle Development Corporation Apparatus for coating substrates by high-rate cathodic sputtering, as well as sputtering cathode for such apparatus
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
DE3107914A1 (en) * 1981-03-02 1982-09-16 Leybold-Heraeus GmbH, 5000 Köln METHOD AND DEVICE FOR COATING MOLDED PARTS BY CATODENSIONING
CH649578A5 (en) * 1981-03-27 1985-05-31 Ulvac Corp HIGH-SPEED CATHODE SPRAYING DEVICE.
US4525264A (en) * 1981-12-07 1985-06-25 Ford Motor Company Cylindrical post magnetron sputtering system
US4525262A (en) * 1982-01-26 1985-06-25 Materials Research Corporation Magnetron reactive bias sputtering method and apparatus
US4422896A (en) * 1982-01-26 1983-12-27 Materials Research Corporation Magnetically enhanced plasma process and apparatus
US4376025A (en) * 1982-06-14 1983-03-08 Battelle Development Corporation Cylindrical cathode for magnetically-enhanced sputtering
US4581118A (en) * 1983-01-26 1986-04-08 Materials Research Corporation Shaped field magnetron electrode
JPS60221563A (en) * 1984-04-17 1985-11-06 Ulvac Corp Bias sputtering device
US4865712A (en) * 1984-05-17 1989-09-12 Varian Associates, Inc. Apparatus for manufacturing planarized aluminum films
DE3427587A1 (en) * 1984-07-26 1986-02-06 Leybold-Heraeus GmbH, 5000 Köln SPRAYING DEVICE FOR CATODE SPRAYING SYSTEMS
DE3442208C3 (en) * 1984-11-19 1998-06-10 Leybold Ag Method and device for producing hard carbon layers
US4600563A (en) * 1985-02-05 1986-07-15 Psi Star Incorporated Plasma reactor with voltage transformer
US4711767A (en) * 1985-02-05 1987-12-08 Psi Star Plasma reactor with voltage transformer
DE3527626A1 (en) * 1985-08-01 1987-02-05 Leybold Heraeus Gmbh & Co Kg SPRAYING CATODE ACCORDING TO THE MAGNETRON PRINCIPLE
US4668338A (en) * 1985-12-30 1987-05-26 Applied Materials, Inc. Magnetron-enhanced plasma etching process
DE3636524A1 (en) * 1986-10-27 1988-04-28 Vtu Angel Kancev Apparatus for applying coatings in a vacuum by magnetron atomisation
DE3727901A1 (en) * 1987-08-21 1989-03-02 Leybold Ag SPRAYING CATHODE ACCORDING TO THE MAGNETRON PRINCIPLE
BE1001027A3 (en) * 1987-10-21 1989-06-13 Bekaert Sa Nv METHOD AND DEVICE FOR CLEANING an elongated metal substrate such as a wire, A BAND, A CORD, ETC., AND ACCORDING TO THAT METHOD AND CLEANED SUBSTRATES WITH SUCH substrates ENHANCED OBJECTS OF POLYMER MATERIAL.
JP2673807B2 (en) * 1987-10-30 1997-11-05 パイオニア株式会社 Method for manufacturing magneto-optical recording medium
US4842703A (en) * 1988-02-23 1989-06-27 Eaton Corporation Magnetron cathode and method for sputter coating
US4810347A (en) * 1988-03-21 1989-03-07 Eaton Corporation Penning type cathode for sputter coating
DE3844064A1 (en) * 1988-12-28 1990-07-05 Leybold Ag MAGNETRON PRINCIPLE CATALOG SPRAYING DEVICE WITH A HOLLOW CATODE AND A CYLINDRICAL TARGET
US4927515A (en) * 1989-01-09 1990-05-22 The Board Of Trustees Of The Leland Stanford Junior University Circular magnetron sputtering device
DE3908252C2 (en) * 1989-03-14 1996-06-20 Leybold Ag Atomizing cathode based on the magnetron principle
US4957605A (en) * 1989-04-17 1990-09-18 Materials Research Corporation Method and apparatus for sputter coating stepped wafers
US5178743A (en) * 1989-06-15 1993-01-12 Microelectronics And Computer Technology Corporation Cylindrical magnetron sputtering system
DE4018914C1 (en) * 1990-06-13 1991-06-06 Leybold Ag, 6450 Hanau, De
US5073245A (en) * 1990-07-10 1991-12-17 Hedgcoth Virgle L Slotted cylindrical hollow cathode/magnetron sputtering device
US5437778A (en) * 1990-07-10 1995-08-01 Telic Technologies Corporation Slotted cylindrical hollow cathode/magnetron sputtering device
DE4100291C1 (en) * 1991-01-08 1991-10-02 Leybold Ag, 6450 Hanau, De
EP0581902A4 (en) * 1991-04-19 1994-03-23 Surface Solutions Inc METHOD AND DEVICE FOR LINEAR MAGNETIC SPRAYING.
GB2256085A (en) * 1991-05-13 1992-11-25 Integrated Plasma Ltd Plasma deposition and etching of substrates.
US5228963A (en) * 1991-07-01 1993-07-20 Himont Incorporated Hollow-cathode magnetron and method of making thin films
DE4135939A1 (en) * 1991-10-31 1993-05-06 Leybold Ag, 6450 Hanau, De SPRAYING CATHODE
DE4138793C2 (en) * 1991-11-26 2001-03-01 Leybold Ag Method and device for coating a substrate, in particular with electrically non-conductive layers
US5415757A (en) * 1991-11-26 1995-05-16 Leybold Aktiengesellschaft Apparatus for coating a substrate with electrically nonconductive coatings
US5685961A (en) * 1992-03-27 1997-11-11 P & D Medical Coatings, Inc. Method for fabrication of metallized medical devices
DE4333825C1 (en) * 1993-09-28 1995-02-23 Mat Gmbh Apparatus for coating elongated flexible products
US6217716B1 (en) 1998-05-06 2001-04-17 Novellus Systems, Inc. Apparatus and method for improving target erosion in hollow cathode magnetron sputter source
US6066242A (en) * 1998-06-10 2000-05-23 David A. Glocker Conical sputtering target
US6432286B1 (en) 1998-06-10 2002-08-13 David A. Glocker Conical sputtering target
US6235170B1 (en) 1998-06-10 2001-05-22 David A. Glocker Conical sputtering target
US6352430B1 (en) 1998-10-23 2002-03-05 Goodrich Corporation Method and apparatus for cooling a CVI/CVD furnace
US6440220B1 (en) * 1998-10-23 2002-08-27 Goodrich Corporation Method and apparatus for inhibiting infiltration of a reactive gas into porous refractory insulation
US6162298A (en) * 1998-10-28 2000-12-19 The B. F. Goodrich Company Sealed reactant gas inlet for a CVI/CVD furnace
US6193853B1 (en) 1999-02-25 2001-02-27 Cametoid Limited Magnetron sputtering method and apparatus
US6257881B1 (en) 1999-06-04 2001-07-10 The B.F. Goodrich Company Combination CVI/CVD and heat treat susceptor lid
US6639196B1 (en) 1999-06-04 2003-10-28 Goodrich Corporation Method and apparatus for cooling a CVI/CVD furnace
EP1065294B1 (en) 1999-06-04 2003-10-15 Goodrich Corporation Method and apparatus for pressure measurement in a CVI/CVD furnace
TW584905B (en) 2000-02-25 2004-04-21 Tokyo Electron Ltd Method and apparatus for depositing films
US6497803B2 (en) 2000-05-31 2002-12-24 Isoflux, Inc. Unbalanced plasma generating apparatus having cylindrical symmetry
US6551477B2 (en) 2000-09-25 2003-04-22 Isoflux, Inc. Interlocking cylindrical magnetron cathodes and targets
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
US6759807B2 (en) * 2002-04-04 2004-07-06 Veeco Instruments, Inc. Multi-grid ion beam source for generating a highly collimated ion beam
AT414215B (en) * 2003-02-12 2006-10-15 Peter Ziger ANNEX TO PLASMA PROCESSING
US20050288773A1 (en) * 2004-01-22 2005-12-29 Glocker David A Radiopaque coating for biomedical devices
EP1761212A4 (en) * 2004-06-28 2009-09-09 Isoflux Inc Porous coatings for biomedical implants
BE1017817A7 (en) * 2006-10-17 2009-08-04 Ardenne Anlagentech Gmbh POWER TERMINAL BLOCK FOR A TUBULAR MAGNETRON.
DE102007049735B4 (en) * 2006-10-17 2012-03-29 Von Ardenne Anlagentechnik Gmbh Supply end block for a tubular magnetron
JP5467735B2 (en) * 2007-07-02 2014-04-09 東ソー株式会社 Cylindrical sputtering target
DE102008052217B3 (en) * 2008-10-17 2011-03-10 Johann Wolfgang Goethe-Universität Electrostatic ion compressor
US20140061039A1 (en) * 2012-09-05 2014-03-06 Applied Materials, Inc. Target cooling for physical vapor deposition (pvd) processing systems
KR102188988B1 (en) * 2013-11-22 2020-12-09 도레이 카부시키가이샤 Plasma electrode, plasma processing electrode, cvd electrode, plasma cvd device, and method for manufacturing substrate with thin film
CA3063389C (en) 2019-12-02 2021-03-30 2S Water Incorporated Solution electrode glow discharge apparatus
CA3068769A1 (en) 2020-01-20 2021-07-20 2S Water Incorporated Liquid electrode tip
KR102802960B1 (en) * 2020-09-16 2025-05-07 가부시키가이샤 알박 Drive block for rotary cathode unit

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3282815A (en) * 1963-07-01 1966-11-01 Ibm Magnetic control of film deposition
US3282816A (en) * 1963-09-16 1966-11-01 Ibm Process of cathode sputtering from a cylindrical cathode
US3369991A (en) * 1965-01-28 1968-02-20 Ibm Apparatus for cathode sputtering including a shielded rf electrode
US3507774A (en) * 1967-06-02 1970-04-21 Nat Res Corp Low energy sputtering apparatus for operation below one micron pressure

Also Published As

Publication number Publication date
IL40285A (en) 1976-01-30
DE2264437A1 (en) 1973-10-31
CH589940A5 (en) 1977-07-29
FR2152633A1 (en) 1973-04-27
GB1420061A (en) 1976-01-07
NL7211911A (en) 1973-03-09
FR2168124B1 (en) 1976-12-03
FR2152633B1 (en) 1978-06-02
DE2264436A1 (en) 1973-12-20
GB1420062A (en) 1976-01-07
FR2168124A1 (en) 1973-08-24
CA1006116A (en) 1977-03-01
DE2243708A1 (en) 1973-04-26
US3884793A (en) 1975-05-20

Similar Documents

Publication Publication Date Title
IL40285A0 (en) Method and apparatus for generating a glow discharge
AU8134575A (en) Glow discharge method and apparatus
IL37615A0 (en) Method and apparatus for producing a controlled discharge in a gaseous medium
ZA74320B (en) Evacuation method and apparatus
HK81079A (en) Apparatus and method for generation of drops
AU3945672A (en) Method and apparatus for pumping
IL37646A0 (en) Method and apparatus for the manufacture of a cigarette fi
ZA726565B (en) A process and an apparatus for forming certain impulse sequences
IL43821A0 (en) Process and apparatus for exhaust-dyeing
AU475272B2 (en) Glow discharge method and apparatus
ZA715453B (en) Method and apparatus for cooking
CA982237A (en) Method and apparatus for projecting materials into an arc discharge
CA929099A (en) Apparatus and process for slag reduction in a vapor generator
AU5786673A (en) Gas supplying apparatus
AU4692972A (en) Method and apparatus for changing the frequency of an a.c. supply
ZA73560B (en) Gas supply process and apparatus
ZA726646B (en) Tobacco reclaiming method and apparatus
IL39629A (en) Method and apparatus for generating electrical oscillations
GB1414132A (en) Method and apparatus for soldering
MTP706B (en) Process and apparatus for texturing a lano abained thereby
CA1009180A (en) Glow discharge method and apparatus
CA984335A (en) Glow discharge method and apparatus
ZA745693B (en) A method of pressure treatments of materials and an apparatus for performing the method
ZM1172A1 (en) Method and apparatus
ZA724141B (en) Method and apparatus for mining