IL320409A - Method and apparatus for inspection focus measurement - Google Patents
Method and apparatus for inspection focus measurementInfo
- Publication number
- IL320409A IL320409A IL320409A IL32040925A IL320409A IL 320409 A IL320409 A IL 320409A IL 320409 A IL320409 A IL 320409A IL 32040925 A IL32040925 A IL 32040925A IL 320409 A IL320409 A IL 320409A
- Authority
- IL
- Israel
- Prior art keywords
- focus measurement
- inspection focus
- inspection
- measurement
- focus
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706851—Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263423214P | 2022-11-07 | 2022-11-07 | |
| PCT/EP2023/079327 WO2024099740A1 (en) | 2022-11-07 | 2023-10-20 | Method and apparatus for inspection focus measurement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IL320409A true IL320409A (en) | 2025-06-01 |
Family
ID=88517418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IL320409A IL320409A (en) | 2022-11-07 | 2023-10-20 | Method and apparatus for inspection focus measurement |
Country Status (3)
| Country | Link |
|---|---|
| CN (1) | CN120077332A (en) |
| IL (1) | IL320409A (en) |
| WO (1) | WO2024099740A1 (en) |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG108975A1 (en) | 2003-07-11 | 2005-02-28 | Asml Netherlands Bv | Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern |
| US7791727B2 (en) | 2004-08-16 | 2010-09-07 | Asml Netherlands B.V. | Method and apparatus for angular-resolved spectroscopic lithography characterization |
| US7723657B2 (en) * | 2007-11-16 | 2010-05-25 | Mitutoyo Corporation | Focus detection apparatus having extended detection range |
| NL2010717A (en) | 2012-05-21 | 2013-11-25 | Asml Netherlands Bv | Determining a structural parameter and correcting an asymmetry property. |
| WO2017102428A1 (en) * | 2015-12-18 | 2017-06-22 | Asml Netherlands B.V. | Focus monitoring arrangement and inspection apparatus including such an arrangement |
| US10146041B1 (en) * | 2018-05-01 | 2018-12-04 | Nanotronics Imaging, Inc. | Systems, devices and methods for automatic microscope focus |
| CN110657953B (en) * | 2018-06-29 | 2022-02-18 | 上海微电子装备（集团）股份有限公司 | Focal length measuring system and method, focusing system and method and photoetching device |
| DE102019004337B4 (en) * | 2019-06-21 | 2024-03-21 | Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung | Optical system and beam analysis method |
-
2023
- 2023-10-20 WO PCT/EP2023/079327 patent/WO2024099740A1/en not_active Ceased
- 2023-10-20 IL IL320409A patent/IL320409A/en unknown
- 2023-10-20 CN CN202380077366.6A patent/CN120077332A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024099740A1 (en) | 2024-05-16 |
| CN120077332A (en) | 2025-05-30 |
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