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IL211092A0 - Polishing pad and method for manufacturing the same - Google Patents

Polishing pad and method for manufacturing the same

Info

Publication number
IL211092A0
IL211092A0 IL211092A IL21109211A IL211092A0 IL 211092 A0 IL211092 A0 IL 211092A0 IL 211092 A IL211092 A IL 211092A IL 21109211 A IL21109211 A IL 21109211A IL 211092 A0 IL211092 A0 IL 211092A0
Authority
IL
Israel
Prior art keywords
manufacturing
same
polishing pad
polishing
pad
Prior art date
Application number
IL211092A
Other versions
IL211092A (en
Original Assignee
Kuraray Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co filed Critical Kuraray Co
Publication of IL211092A0 publication Critical patent/IL211092A0/en
Publication of IL211092A publication Critical patent/IL211092A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • D—TEXTILES; PAPER
    • D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
    • D04H3/016—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the fineness
    • D—TEXTILES; PAPER
    • D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
    • D04H—MAKING TEXTILE FABRICS, e.g. FROM FIBRES OR FILAMENTARY MATERIAL; FABRICS MADE BY SUCH PROCESSES OR APPARATUS, e.g. FELTS, NON-WOVEN FABRICS; COTTON-WOOL; WADDING ; NON-WOVEN FABRICS FROM STAPLE FIBRES, FILAMENTS OR YARNS, BONDED WITH AT LEAST ONE WEB-LIKE MATERIAL DURING THEIR CONSOLIDATION
    • D04H3/00—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length
    • D04H3/08—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating
    • D04H3/10—Non-woven fabrics formed wholly or mainly of yarns or like filamentary material of substantial length characterised by the method of strengthening or consolidating with bonds between yarns or filaments made mechanically

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Textile Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
IL211092A 2008-08-08 2011-02-06 Polishing pad and method for manufacturing the same IL211092A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008205981 2008-08-08
PCT/JP2009/063802 WO2010016486A1 (en) 2008-08-08 2009-08-04 Polishing pad and method for manufacturing the polishing pad

Publications (2)

Publication Number Publication Date
IL211092A0 true IL211092A0 (en) 2011-04-28
IL211092A IL211092A (en) 2014-03-31

Family

ID=41663704

Family Applications (1)

Application Number Title Priority Date Filing Date
IL211092A IL211092A (en) 2008-08-08 2011-02-06 Polishing pad and method for manufacturing the same

Country Status (8)

Country Link
US (2) US20110171890A1 (en)
EP (1) EP2316614B1 (en)
JP (1) JP5411862B2 (en)
KR (1) KR101410116B1 (en)
CN (1) CN102119069B (en)
IL (1) IL211092A (en)
TW (1) TWI460052B (en)
WO (1) WO2010016486A1 (en)

Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040260034A1 (en) 2003-06-19 2004-12-23 Haile William Alston Water-dispersible fibers and fibrous articles
US7892993B2 (en) 2003-06-19 2011-02-22 Eastman Chemical Company Water-dispersible and multicomponent fibers from sulfopolyesters
US8513147B2 (en) 2003-06-19 2013-08-20 Eastman Chemical Company Nonwovens produced from multicomponent fibers
US8512519B2 (en) 2009-04-24 2013-08-20 Eastman Chemical Company Sulfopolyesters for paper strength and process
CN101624511B (en) * 2009-08-14 2012-08-29 上海震旦办公设备有限公司 Sharp grinding composition of paper shredder blade, grinding sheet and grinding bag manufactured thereby and relevant manufacturing technique
US8068011B1 (en) 2010-08-27 2011-11-29 Q Street, LLC System and method for interactive user-directed interfacing between handheld devices and RFID media
US20120302142A1 (en) * 2010-09-16 2012-11-29 San Fang Chemical Industry Co., Ltd. Polishing pad and method of producing the same
US9273417B2 (en) 2010-10-21 2016-03-01 Eastman Chemical Company Wet-Laid process to produce a bound nonwoven article
JP5729720B2 (en) * 2011-06-08 2015-06-03 株式会社クラレ Polishing cloth and polishing method using the polishing cloth
JP5945874B2 (en) * 2011-10-18 2016-07-05 富士紡ホールディングス株式会社 Polishing pad and manufacturing method thereof
US8840757B2 (en) 2012-01-31 2014-09-23 Eastman Chemical Company Processes to produce short cut microfibers
CN104136670B (en) * 2012-01-31 2016-06-01 可乐丽股份有限公司 The manufacture method of conjugated fibre, polyurethane elastomer cloth and silk and polyurethane elastomer cloth and silk
JP5844189B2 (en) * 2012-03-26 2016-01-13 富士紡ホールディングス株式会社 Polishing pad and polishing pad manufacturing method
EP2830829B1 (en) * 2012-03-30 2018-01-10 Saint-Gobain Abrasives, Inc. Abrasive products having fibrillated fibers
JP6033652B2 (en) 2012-11-23 2016-11-30 光洋機械工業株式会社 Static pressure pad thermal deformation prevention device and double-sided grinding device in double-sided grinding device
US9303357B2 (en) 2013-04-19 2016-04-05 Eastman Chemical Company Paper and nonwoven articles comprising synthetic microfiber binders
US9739009B2 (en) * 2013-09-13 2017-08-22 Toray Industries, Inc. Sheet-shaped object and process for producing same
US9598802B2 (en) 2013-12-17 2017-03-21 Eastman Chemical Company Ultrafiltration process for producing a sulfopolyester concentrate
US9605126B2 (en) 2013-12-17 2017-03-28 Eastman Chemical Company Ultrafiltration process for the recovery of concentrated sulfopolyester dispersion
US9873180B2 (en) * 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
CN113579992A (en) 2014-10-17 2021-11-02 应用材料公司 CMP pad construction with composite material properties using additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
JP2016087770A (en) 2014-11-11 2016-05-23 株式会社東芝 Polishing cloth and polishing method
EP3225357B1 (en) * 2014-11-28 2019-10-30 Kuraray Co., Ltd. Polishing-layer molded body, and polishing pad
CN105297161B (en) * 2015-09-22 2018-06-29 四川大学 It is a kind of using water soluble polyurethane elastomer as the sea-island fibre decrement method in a mild condition in sea
JP7066608B2 (en) * 2015-09-25 2022-05-13 シーエムシー マテリアルズ，インコーポレイティド Chemical mechanical polishing pads, methods for chemically polishing substrates, and methods for manufacturing chemical mechanical polishing pads.
US10618141B2 (en) 2015-10-30 2020-04-14 Applied Materials, Inc. Apparatus for forming a polishing article that has a desired zeta potential
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
TWI656199B (en) * 2016-06-29 2019-04-11 臺灣永光化學工業股份有限公司 Polyurethane-based uv absorber
BR112019003149B1 (en) * 2016-08-17 2022-08-16 A&At Uk Limited PREPOLYMER, AQUEOUS POLYURETHANE DISPERSIONS AND ARTICLES
CN106223058A (en) * 2016-08-29 2016-12-14 福建华阳超纤有限公司 A kind of light aging resisting and the manufacture method of wear-resisting waterborne suede super fiber leather
WO2018092630A1 (en) * 2016-11-16 2018-05-24 帝人フロンティア株式会社 Polishing pad and method for manufacturing same
JP2018108612A (en) * 2016-12-28 2018-07-12 花王株式会社 Polishing pad
IL303114A (en) * 2017-05-12 2023-07-01 Kuraray Co Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method
JP6951895B2 (en) * 2017-07-25 2021-10-20 ニッタ・デュポン株式会社 Abrasive cloth
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. Abrasive delivery polishing pads and manufacturing methods thereof
CN107604533B (en) * 2017-09-19 2019-10-18 四川大学 A kind of elastic superfine fiber synthetic leather and its environment-friendly preparation method
JP7081351B2 (en) * 2018-07-10 2022-06-07 日本電気硝子株式会社 Glass plate manufacturing method and glass plate cleaning equipment
CN112654655A (en) 2018-09-04 2021-04-13 应用材料公司 Advanced polishing pad formulations
JP7308223B2 (en) * 2018-10-25 2023-07-13 三井化学株式会社 Nonwoven fabric laminates, elastic nonwoven fabric laminates, textile products, absorbent articles and sanitary masks
EP3878897A4 (en) * 2018-11-09 2022-07-20 Kuraray Co., Ltd. POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND POLISHING LAYER MODIFICATION METHOD
IL282788B2 (en) * 2018-12-03 2024-08-01 Kuraray Co Polyurethane for polishing layers, polishing layer and polishing pad
CN109648451B (en) * 2018-12-29 2020-12-01 徐州鑫晶半导体科技有限公司 Final polishing method and final polishing apparatus for silicon wafers
KR102174958B1 (en) * 2019-03-27 2020-11-05 에스케이씨 주식회사 Polishing pad which minimizes occurence of defect and preparation method thereof
JP2020200543A (en) * 2019-06-07 2020-12-17 セイコーエプソン株式会社 Manufacturing method of fiber molded body and fiber binding treatment liquid
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
CN111098218A (en) * 2019-12-31 2020-05-05 杭州中欣晶圆半导体股份有限公司 Activation method for middle and fine polishing cloth of silicon wafer
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
CN113510613B (en) * 2021-03-12 2022-05-13 安徽禾臣新材料有限公司 White pad for display screen polishing and production method thereof
CN115229606B (en) * 2021-04-25 2024-08-09 苏州三鼎纺织科技有限公司 Auxiliary agent-containing composition and polishing pad for polishing optical glass prepared by using same
CN115946039A (en) * 2022-07-08 2023-04-11 宁波赢伟泰科新材料有限公司 A kind of chemical mechanical polishing pad and its preparation method and application
TWI877659B (en) * 2022-07-19 2025-03-21 日商東京鑽石工具製作所股份有限公司 Synthetic grinding stone, synthetic grinding stone assembly, and method for manufacturing synthetic grinding stone

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3773546A (en) * 1971-11-26 1973-11-20 Owens Corning Fiberglass Corp Coated glass fibers and glass fiber reinforced elastomers
JPH03234475A (en) 1990-02-08 1991-10-18 Kanebo Ltd Abrasive cloth
US6129620A (en) * 1993-04-23 2000-10-10 Jason Incorporated Honing tool and method of making
JPH08294872A (en) * 1995-04-27 1996-11-12 Fuji Photo Film Co Ltd Polishing body
JPH10128674A (en) 1996-10-28 1998-05-19 Rooder Nitta Kk Polishing pad
JPH10225864A (en) 1997-02-17 1998-08-25 Sony Corp Polishing pad, method of manufacturing the same, and method of polishing wafer using the polishing pad
JP3631879B2 (en) * 1997-04-25 2005-03-23 Ｔｄｋ株式会社 Polishing tape
JPH1199479A (en) 1997-09-30 1999-04-13 Teijin Ltd Polishing pad
JPH11322878A (en) 1998-05-13 1999-11-26 Dainippon Ink & Chem Inc Method for producing foam-containing polyurethane molded article, urethane resin composition for foam-containing molded article, and polishing pad using the same
JP3516874B2 (en) 1998-12-15 2004-04-05 東洋ゴム工業株式会社 Method for producing polyurethane foam and polishing sheet
JP2000248034A (en) 1999-03-02 2000-09-12 Mitsubishi Chemicals Corp Polyurethane resin composition for abrasives and foams thereof
JP3558273B2 (en) 1999-09-22 2004-08-25 東洋ゴム工業株式会社 Method for producing polyurethane foam and polishing sheet
JP2002009026A (en) 2000-06-21 2002-01-11 Toray Ind Inc Polishing pad, polishing apparatus and polishing method using the same
TW491757B (en) * 2000-06-19 2002-06-21 Kuraray Co Abrasive sheet for texturing and method of producing same
JP2002079472A (en) * 2000-06-19 2002-03-19 Kuraray Co Ltd Abrasive sheet for texture processing and method for producing the same
JP3901939B2 (en) 2000-12-05 2007-04-04 帝人コードレ株式会社 Polishing base fabric and polishing method
KR100467113B1 (en) * 2001-01-31 2005-01-24 가부시키가이샤 구라레 Aqueous resin composition, and method of manufacturing a separable fastener using this composition
US20030100250A1 (en) 2001-10-29 2003-05-29 West Thomas E. Pads for CMP and polishing substrates
JP3992483B2 (en) 2001-12-06 2007-10-17 帝人コードレ株式会社 Manufacturing method of polishing base fabric
JP3921085B2 (en) 2001-12-28 2007-05-30 大日精化工業株式会社 Manufacturing method of substrate for polishing
JP2004130395A (en) * 2002-10-08 2004-04-30 Toray Ind Inc Abrasive cloth for glass texture working, and method of manufacturing magnetic recording medium using the same
US20060189269A1 (en) * 2005-02-18 2006-08-24 Roy Pradip K Customized polishing pads for CMP and methods of fabrication and use thereof
WO2005000529A1 (en) * 2003-06-03 2005-01-06 Neopad Technologies Corporation Synthesis of a functionally graded pad for chemical mechanical planarization
US7704125B2 (en) * 2003-03-24 2010-04-27 Nexplanar Corporation Customized polishing pads for CMP and methods of fabrication and use thereof
JP2004311731A (en) 2003-04-08 2004-11-04 Hitachi Chem Co Ltd Polishing pad and method for polishing object to be polished using the same
US7871946B2 (en) * 2003-10-09 2011-01-18 Kuraray Co., Ltd. Nonwoven fabric composed of ultra-fine continuous fibers, and production process and application thereof
US20050159063A1 (en) * 2004-01-16 2005-07-21 Bernard Hill Disposable cleaning substrate
JP2005212055A (en) 2004-01-30 2005-08-11 Kanebo Ltd Polishing cloth for nonwoven fabric base, and its fablication method
JP4455161B2 (en) 2004-05-25 2010-04-21 旭化成せんい株式会社 Nonwoven fabric for polishing pad and polishing pad
JP2006028659A (en) * 2004-07-13 2006-02-02 Kuraray Co Ltd Suede artificial leather and method for producing the same
TWI385050B (en) * 2005-02-18 2013-02-11 Nexplanar Corp Customized polishing pads for cmp and methods of fabrication and use thereof
TW200641193A (en) * 2005-05-27 2006-12-01 San Fang Chemical Industry Co A polishing panel of micro fibers and its manufacturing method
JP4645361B2 (en) 2005-08-24 2011-03-09 東レ株式会社 Polishing cloth
WO2008093850A1 (en) * 2007-02-01 2008-08-07 Kuraray Co., Ltd. Polishing pad and process for production of polishing pad

Also Published As

Publication number Publication date
WO2010016486A1 (en) 2010-02-11
EP2316614A1 (en) 2011-05-04
HK1154828A1 (en) 2012-05-04
US20110171890A1 (en) 2011-07-14
JP5411862B2 (en) 2014-02-12
KR20110042213A (en) 2011-04-25
JPWO2010016486A1 (en) 2012-01-26
EP2316614B1 (en) 2019-07-17
KR101410116B1 (en) 2014-06-25
CN102119069A (en) 2011-07-06
US20190218697A1 (en) 2019-07-18
CN102119069B (en) 2015-04-15
TW201016393A (en) 2010-05-01
TWI460052B (en) 2014-11-11
EP2316614A4 (en) 2014-08-20
IL211092A (en) 2014-03-31

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