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IE20080271A1 - A plasma system - Google Patents

A plasma system Download PDF

Info

Publication number
IE20080271A1
IE20080271A1 IE20080271A IE20080271A IE20080271A1 IE 20080271 A1 IE20080271 A1 IE 20080271A1 IE 20080271 A IE20080271 A IE 20080271A IE 20080271 A IE20080271 A IE 20080271A IE 20080271 A1 IE20080271 A1 IE 20080271A1
Authority
IE
Ireland
Prior art keywords
plasma system
electrodes
path
ions
stage
Prior art date
Application number
IE20080271A
Other languages
English (en)
Inventor
Edward Forde
Original Assignee
Univ Limerick
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Limerick filed Critical Univ Limerick
Priority to IE20080271A priority Critical patent/IE20080271A1/en
Publication of IE20080271A1 publication Critical patent/IE20080271A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/22—DC, AC or pulsed generators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
IE20080271A 2007-04-11 2008-04-10 A plasma system IE20080271A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IE20080271A IE20080271A1 (en) 2007-04-11 2008-04-10 A plasma system

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IE20070259 2007-04-11
IE20070897 2007-12-12
IE20080271A IE20080271A1 (en) 2007-04-11 2008-04-10 A plasma system

Publications (1)

Publication Number Publication Date
IE20080271A1 true IE20080271A1 (en) 2008-11-26

Family

ID=39705272

Family Applications (1)

Application Number Title Priority Date Filing Date
IE20080271A IE20080271A1 (en) 2007-04-11 2008-04-10 A plasma system

Country Status (3)

Country Link
EP (1) EP2135493A1 (fr)
IE (1) IE20080271A1 (fr)
WO (1) WO2008126068A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2960358A1 (fr) * 2014-06-25 2015-12-30 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Source plasma et procédé de traitement de surface
US10194672B2 (en) 2015-10-23 2019-02-05 NanoGuard Technologies, LLC Reactive gas, reactive gas generation system and product treatment using reactive gas
US10264663B1 (en) * 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
KR101837132B1 (ko) * 2017-11-23 2018-03-09 (주)준시스 가정용 플라즈마 살균장치
DE102018115300A1 (de) * 2018-06-26 2020-01-02 Relyon Plasma Gmbh Anordnung und Verfahren zur Dekontamination von Objekten
US10925144B2 (en) * 2019-06-14 2021-02-16 NanoGuard Technologies, LLC Electrode assembly, dielectric barrier discharge system and use thereof
US11896731B2 (en) 2020-04-03 2024-02-13 NanoGuard Technologies, LLC Methods of disarming viruses using reactive gas
CN113225888B (zh) * 2021-05-28 2023-08-04 南京苏曼等离子工程研究院有限公司 一种低温等离子体气流式发生器

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3942964A1 (de) * 1989-12-23 1991-06-27 Leybold Ag Einrichtung fuer die erzeugung eines plasmas
US6540966B1 (en) * 1998-06-29 2003-04-01 Hadronic Press Inc. Apparatus and method for recycling contaminated liquids
US20040262146A1 (en) * 2000-10-02 2004-12-30 Platt Robert C. Sterilization system plasma generation control
EP1334646A2 (fr) * 2000-10-27 2003-08-13 NKT Research A/S Procede et appareil d'excitation d'un plasma
FR2817444B1 (fr) * 2000-11-27 2003-04-25 Physiques Ecp Et Chimiques Generateurs et circuits electriques pour alimenter des decharges instables de haute tension
US7091481B2 (en) * 2001-08-08 2006-08-15 Sionex Corporation Method and apparatus for plasma generation
EP1521509B1 (fr) * 2003-09-30 2013-11-06 FUJIFILM Manufacturing Europe B.V. Procédé et agencement pour la production d'un plasma à pression atmosphérique
JP2005285520A (ja) * 2004-03-29 2005-10-13 Hiroshi Takigawa プラズマ発生用電極、プラズマ発生装置及びプラズマ処理装置

Also Published As

Publication number Publication date
WO2008126068A1 (fr) 2008-10-23
EP2135493A1 (fr) 2009-12-23

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MM9A Patent lapsed through non-payment of renewal fee