HK40100641A - System and method for ultraviolet sterilization of fluids - Google Patents
System and method for ultraviolet sterilization of fluids Download PDFInfo
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Description
技术领域Technical Field
本公开涉及使用紫外线(UV)光辐照对水和其他流体进行灭菌处理的领域。更具体地,本公开涉及使用板式和框架式UV反应器对流体进行紫外线灭菌的系统和方法,该板式和框架式UV反应器使用受控的深度和表面积将流体暴露于紫外线辐射。This disclosure relates to the field of sterilizing water and other fluids using ultraviolet (UV) light irradiation. More specifically, this disclosure relates to systems and methods for UV sterilizing fluids using plate and frame UV reactors that expose the fluids to UV radiation with controlled depth and surface area.
背景技术Background Technology
紫外线(UV)辐射已被用于灭菌目的达一段时间。一种被称为UVC的特殊高频段UV辐射在灭菌方面特别有效。多项研究已表明,当诸如细菌、病毒、霉菌、酵母和原生动物的微生物体暴露于光谱波长范围为100nm至280nm的深UVC辐射时,所述深UVC辐射会被DNA、RNA和蛋白质吸收。更具体地,是构成蛋白质的氨基酸中的一些氨基酸实际吸收了UV光。这可破坏微生物体的细胞膜,从而导致所述微生物体死亡。DNA对UVC的吸收可导致胸腺嘧啶-胸腺嘧啶二聚化的产生和生物体的死亡。如果有足够多的链失活,则DNA/RNA复制过程会被中断,并且细胞无法复制。Ultraviolet (UV) radiation has been used for sterilization purposes for some time. A specific high-frequency band of UV radiation known as UVC is particularly effective for sterilization. Multiple studies have shown that when microorganisms such as bacteria, viruses, molds, yeasts, and protozoa are exposed to deep UVC radiation in the spectral wavelength range of 100 nm to 280 nm, this deep UVC radiation is absorbed by DNA, RNA, and proteins. More specifically, some amino acids that make up proteins actually absorb UV light. This can disrupt the cell membrane of the microorganism, leading to its death. DNA absorption of UVC can lead to thymine-thymine dimerization and the death of the organism. If enough strands are inactivated, DNA/RNA replication is interrupted, and the cell cannot replicate.
UV辐照技术由于其优势,已在食品行业中用于消毒/灭菌过程应用达一段时间。它通常是优选的处理方法,因为在辐照处理的情况下,化学物质不会被引入到经处理的液体物质中。此外,辐照过程不会产生不利的副产物。UV irradiation technology has been used in the food industry for disinfection/sterilization processes for some time due to its advantages. It is generally the preferred treatment method because chemicals are not introduced into the treated liquid substances during irradiation. Furthermore, the irradiation process does not produce any undesirable byproducts.
微生物灭菌的关键参数是UV剂量,所述UV剂量是微生物暴露于的UV辐射的量。剂量取决于UV辐射的强度和暴露的持续时间。许多生物学研究已经对消毒中最常见的目标微生物提出了广泛接受的典型UV剂量要求。例如,要实现枯草芽孢杆菌(B.Subtillus)(ATCC6633)的3个对数减少(99.9%),需要60mJ/cm2的剂量。A key parameter for microbial sterilization is the UV dose, which is the amount of UV radiation to which a microorganism is exposed. The dose depends on the intensity of the UV radiation and the duration of exposure. Numerous biological studies have established widely accepted typical UV dose requirements for the most common target microorganisms in disinfection. For example, a dose of 60 mJ/ cm² is required to achieve a 3-log reduction (99.9%) in Bacillus subtilis (ATCC 6633).
迄今为止,传统UV系统已由于不充分且不一致的UV暴露而效率低下。因此,需要提供充分且一致的UV定量投配(dosing)的UV灭菌系统和方法。To date, conventional UV systems have been inefficient due to insufficient and inconsistent UV exposure. Therefore, there is a need for UV sterilization systems and methods that provide adequate and consistent UV dosing.
发明内容Summary of the Invention
在一个方面中,本公开描述了一种用于对流体流进行灭菌的反应器。所述反应器包括:框架结构,所述框架结构具有纵向尺寸;和多个UV板式反应器,所述多个UV板式反应器能够以沿所述框架结构的所述纵向尺寸延伸的串(series)的形式可移除地插入到所述框架结构中,所述多个UV板式反应器中的每个UV板式反应器均包括至少一个选定直径的通道,所述流体流被输送进入并且通过所述通道;以及具有选定辐射通量的至少一个紫外线光源,所述至少一个紫外线光源联接到所述多个通道中的一个或多个通道。In one aspect, this disclosure describes a reactor for sterilizing a fluid flow. The reactor includes: a frame structure having a longitudinal dimension; and a plurality of UV plate reactors removably insertable into the frame structure in the form of a series extending along the longitudinal dimension of the frame structure, each of the plurality of UV plate reactors including at least one channel of a selected diameter into which the fluid flow is delivered and through; and at least one ultraviolet light source having a selected radiant flux, the at least one ultraviolet light source being coupled to one or more of the plurality of channels.
在另一方面中,本公开描述了一种用于对流体流进行灭菌的方法。所述方法包括将流体流输送通过反应器,所述反应器具有沿纵向尺寸布置的一串具有单个通道或多个通道的模块化UV板,每个UV板式反应器包括选定直径的单个通道或多个通道;以及随着所述流体流被输送通过所述UV板式反应器的所述多个通道,用选定辐射通量的紫外线辐射辐照所述流体流。所述多个通道的所述直径和所述紫外线光源的所述辐射通量被选择为向所述多个通道的受限制空间中的所述流体流提供精确剂量的紫外线辐射,以便实现所述流体流的灭菌。In another aspect, this disclosure describes a method for sterilizing a fluid flow. The method includes conveying the fluid flow through a reactor having a series of modular UV plates arranged longitudinally, each UV plate reactor including a single or multiple channels of a selected diameter; and irradiating the fluid flow with ultraviolet radiation of a selected radiant flux as the fluid flow is conveyed through the multiple channels of the UV plate reactor. The diameter of the multiple channels and the radiant flux of the ultraviolet light source are selected to provide a precise dose of ultraviolet radiation to the fluid flow within the confined space of the multiple channels in order to achieve sterilization of the fluid flow.
在另一方面中,剂量和流的流动特性可被选择为优化流体流的灭菌。In another aspect, the dosage and flow characteristics of the flow can be selected to optimize the sterilization of the fluid flow.
从本发明的某些实施方案的以下描述以及附图和权利要求书可以理解这些和其他方面、特征和优点。These and other aspects, features, and advantages will be understood from the following description of certain embodiments of the invention, as well as from the accompanying drawings and claims.
附图说明Attached Figure Description
图1是根据本公开的实施方案的UV反应器系统的区段的透视图,其描绘了与单向流动通道串联布置的两个板式反应器。Figure 1 is a perspective view of a section of a UV reactor system according to an embodiment of the present disclosure, depicting two plate reactors arranged in series with a unidirectional flow channel.
图2是UV反应器系统的实施方案的进一步透视图,其示出了以具有单通道流的串的形式组装的总共十个板。流体随着它暴露于UV辐照度下而按顺序次序穿过每个板。Figure 2 is a further perspective view of an embodiment of the UV reactor system, showing a total of ten plates assembled in a series with single-channel flow. The fluid passes through each plate sequentially as it is exposed to UV irradiance.
图3是用于在单个通道或多个通道中流动的板式反应器的示例性布置的侧视图。Figure 3 is a side view of an exemplary arrangement for a plate reactor that flows in a single channel or multiple channels.
图4是示出产物流体流按顺序次序穿过各个板式反应器并且暴露于UV辐射的示意性侧视图。Figure 4 is a schematic side view showing the product fluid flow passing sequentially through the various plate reactors and being exposed to UV radiation.
图5是根据本公开的另一实施方案的UV反应器的示意性侧视图。Figure 5 is a schematic side view of a UV reactor according to another embodiment of the present disclosure.
图6是具有鱼骨设计的根据本公开的单独UV板式反应器的实施方案的平面图。Figure 6 is a plan view of an embodiment of a standalone UV plate reactor according to this disclosure, featuring a fishbone design.
图7是多个流体通道从多个侧面被辐照的根据本公开的示例性板式反应器的区段的横断面图。Figure 7 is a cross-sectional view of a section of an exemplary plate reactor according to the present disclosure, in which multiple fluid channels are irradiated from multiple sides.
图8是其中多个流体通道在一个侧面上被辐照的根据本公开的板式反应器的替代实施方案的区段的横断面图。Figure 8 is a cross-sectional view of a section of an alternative embodiment of the plate reactor according to the present disclosure, in which multiple fluid channels are irradiated on one side.
图9是其中单个流体通道在多个侧面上被辐照的板式反应器的进一步实施方案的区段的横断面图。Figure 9 is a cross-sectional view of a section of a further embodiment of a plate reactor in which a single fluid channel is irradiated on multiple sides.
图10是其中单个流体通道在单个侧面上被辐照的板式反应器的进一步实施方案的区段的横断面图。Figure 10 is a cross-sectional view of a section of a further embodiment of a plate reactor in which a single fluid channel is irradiated on a single side.
具体实施方式Detailed Implementation
本公开描述了一种用于使用紫外线(UV)辐射,优选地UVC辐射来对流体(诸如可能含有或可能不含有机化合物的水或液体食品)进行灭菌的系统和方法。整个UV辐射光谱涵盖100nm至400nm的波长范围,并且被分为三个区域,所述三个区域中最短的是在100nm至280nm范围内的UVC,该UVC发射出高效的灭菌功率(power)。260mm处的UVC杀菌波长对于杀灭空气、水中和表面上的有害微生物体最有效。This disclosure describes a system and method for sterilizing fluids, such as water or liquid food that may or may not contain organic compounds, using ultraviolet (UV) radiation, preferably UVC radiation. The entire UV radiation spectrum covers a wavelength range of 100 nm to 400 nm and is divided into three regions, the shortest of which is UVC in the range of 100 nm to 280 nm, which emits highly efficient sterilization power. The UVC sterilization wavelength at 260 nm is most effective for killing harmful microorganisms in the air, water, and on surfaces.
本文所公开的系统的实施方案包括反应器(“UV反应器”),所述反应器包括一串模块化板式反应器。在一些实施方案中,所述板式反应器包括不锈钢壳体、石英晶体套筒、UV辐射源和至少一个通道,待灭菌的流体被输送通过所述至少一个通道。所述钢壳体和石英套筒将紫外线辐射源与流体流分隔开。在UV反应器内,流体流被引导通过一串板式反应器的通道。流体在VFD(可变频率驱动)泵的控制下通过入口和出口循环进入和离开UV反应器。紫外线灭菌方法不需要在辐照前从流体中去除氧气。此外,该方法在灭菌期间也不需要对液体的温度范围进行限制。所公开的系统通过控制期望被灭菌的流体流的精确尺寸和被引导到该流体流上的UV光通量的量来进一步改进传统方法。The system disclosed herein includes an embodiment of a reactor (“UV reactor”) comprising a series of modular plate reactors. In some embodiments, the plate reactor includes a stainless steel shell, a quartz crystal sleeve, a UV radiation source, and at least one channel through which the fluid to be sterilized is conveyed. The steel shell and quartz sleeve separate the UV radiation source from the fluid flow. Within the UV reactor, the fluid flow is guided through the channels of the series of plate reactors. The fluid circulates into and out of the UV reactor via inlet and outlet under the control of a VFD (Variable Frequency Drive) pump. The UV sterilization method does not require the removal of oxygen from the fluid prior to irradiation. Furthermore, the method does not require limitation of the liquid temperature range during sterilization. The disclosed system further improves upon conventional methods by controlling the precise dimensions of the fluid flow to be sterilized and the amount of UV light flux directed onto that fluid flow.
所述紫外线灭菌方法使用特定UV发光二极管(LED)来辐照液体,但也可以采用非LED灯的调适(adaptation)。板式反应器中的每个板式反应器上都安装了几个LED的阵列。被引导到流体上的UV辐射(优选地UVC辐射)的量取决于LED阵列的UV光通量的量,也取决于流体被引导通过多少板式反应器(称为“停留时间”)。本发明人已发现,将流体流引导通过大致一致的小直径(其可以例如为约4mm)的通道提供了用于灭菌目的的足够的(优选最佳的)定量投配。The ultraviolet sterilization method uses specific UV light-emitting diodes (LEDs) to irradiate the liquid, but adaptation with non-LED lamps is also possible. Each plate reactor in the plate reactor is equipped with an array of several LEDs. The amount of UV radiation (preferably UVC radiation) directed onto the fluid depends on the amount of UV luminous flux of the LED array and also on how many plate reactors the fluid is directed through (referred to as "residence time"). The inventors have discovered that directing the fluid flow through generally uniform, small-diameter channels (which may be, for example, about 4 mm) provides sufficient (preferably optimal) dosing for sterilization purposes.
在一个实施方案中,所公开的UV反应器被调适成以连续模式运行,即不以间歇模式运行。在这个实施方案中,灭菌方法是连续流动系统,所述连续流动系统提供更高效率的有效的灭菌过程。一些灭菌反应器通过辐照流体达一定时长的暴露时间并且然后停止辐照暴露来以分批模式实现所需剂量。相反,本文所公开的UV反应器的实施方案在连续系统中提供了剂量的控制,该连续系统不需要被断开来实现所需的定量投配。停机时间的避免使得能够实现更高的灭菌生产量。需注意的是,所使用的所有流体接触材料均已获得FDA(食品和药物管理局)的批准。In one embodiment, the disclosed UV reactor is adapted to operate in a continuous mode, i.e., not in an intermittent mode. In this embodiment, the sterilization method is a continuous flow system, which provides a more efficient and effective sterilization process. Some sterilization reactors achieve the desired dosage in a batch mode by irradiating the fluid for a certain exposure time and then stopping the irradiation exposure. In contrast, the UV reactor embodiment disclosed herein provides dosage control in a continuous system that does not require disconnection to achieve the required quantitative dosing. The avoidance of downtime enables higher sterilization throughput. It should be noted that all fluid contact materials used are FDA (Food and Drug Administration) approved.
所述板式反应器可包括具有多个流体通道或压缩在框架中的单个通道的波纹状金属板。UV辐射源被定位于板式反应器内的一个或多个通道的一个侧面上,而待灭菌的液体在板式反应器内的所述通道的相对侧面上流动。冷却系统可以联接至UV辐射源。冷却系统可以使用液体或空气来消散从UV辐射源产生的热量。图1是根据本公开的实施方案的UV反应器100的区段的透视剖视图,其描绘了壳体的入口端部110和串联布置的两个板式反应器120、125。所示板的数量仅仅是说明性的,并且UV反应器通常包括多于两个板,但也可包括更少的板。板式反应器120、125以沿着限定流体流动通过UV反应器的方向的纵向轴线的串的形式布置。在一些实施方案中,板式反应器之间的间距可以在4mm至10mm之间,但更大或更小的间距也是可能的。板式反应器120、125可以是波纹状的并且包括多个通道,或者替代地,板式反应器可以包括单个通道,待灭菌流体在基本上横向于UV反应器的纵向轴线的方向上流动通过所述单个通道。The plate reactor may comprise a corrugated metal plate having multiple fluid channels or a single channel compressed within a frame. A UV radiation source is positioned on one side of one or more channels within the plate reactor, while the liquid to be sterilized flows on opposite sides of the channels within the plate reactor. A cooling system may be coupled to the UV radiation source. The cooling system may use liquid or air to dissipate heat generated from the UV radiation source. Figure 1 is a perspective sectional view of a section of a UV reactor 100 according to an embodiment of the present disclosure, depicting the inlet end 110 of the shell and two plate reactors 120, 125 arranged in series. The number of plates shown is merely illustrative, and UV reactors typically include more than two plates, but may also include fewer. The plate reactors 120, 125 are arranged in series along a longitudinal axis defining the direction of fluid flow through the UV reactor. In some embodiments, the spacing between the plate reactors may be between 4 mm and 10 mm, but larger or smaller spacings are also possible. Plate reactors 120 and 125 may be corrugated and include multiple channels, or alternatively, the plate reactor may include a single channel through which the fluid to be sterilized flows substantially transversely to the longitudinal axis of the UV reactor.
在图1所描绘的实施方案中,在壳体110的入口端部上有三个入口端口112、114、116。待灭菌的流体流流动通过每个端口。待灭菌的流体在本文中也被称为“产物”流。每个流体流从入口端部110单向向下流动(在相对于纵向轴线的横向方向上)通过第一板式反应器120,在这里流体暴露于位于第一板式反应器120的暴露区域122中的UV辐射并且被灭菌。从板式反应器120的底部涌出的流体在流体压力下纵向流动一段距离,并且然后向上流动通过第二板式反应器125,在这里流体再次暴露于位于第二板式反应器125的暴露区域128中的UV辐射并且被进一步灭菌。因此,通过入口端口112、114、116进入反应器的流体在具有UV光源的一串板式反应器中沿着该流体通过UV反应器的纵向路径经历相当大的辐射暴露。In the embodiment depicted in Figure 1, there are three inlet ports 112, 114, and 116 at the inlet end of the housing 110. The fluid to be sterilized flows through each port. The fluid to be sterilized is also referred to herein as the “product” flow. Each fluid flow flows unidirectionally downwards (in the transverse direction relative to the longitudinal axis) from the inlet end 110 through the first plate reactor 120, where the fluid is exposed to UV radiation in the exposure area 122 of the first plate reactor 120 and is sterilized. The fluid gushing from the bottom of the plate reactor 120 flows longitudinally for a distance under fluid pressure and then flows upwards through the second plate reactor 125, where the fluid is again exposed to UV radiation in the exposure area 128 of the second plate reactor 125 and is further sterilized. Thus, the fluid entering the reactor through the inlet ports 112, 114, and 116 undergoes considerable radiation exposure along the longitudinal path of the fluid through the UV reactors in a series of plate reactors with UV light sources.
图2是描绘图1中示出其区段的UV反应器的整个实施方案的透视剖视图。图2所示的UV反应器100包括沿壳体(未在剖开图(cutout view)中示出)内的纵向轴线串联布置的十个板式反应器120、125、130、135、140、145、150、155、160、165。进入UV反应器100的流体按顺序次序穿过各个板式反应器120-165,并且暴露于位于每个板式反应器中的UV辐照度。在所描绘的实施方案中,每个板式反应器120-170包括单个通道,流体被输送通过该单个通道并且暴露于UV辐射。由板式反应器120-165提供的总辐照度被校准和设置为实现流体完全灭菌所需的剂量。已经流动通过板式反应器120-170的完全灭菌的流体通过UV反应器的壳体的出口端部170上的出口端口离开。为了实现通过反应器的流体的期望生产量,使用在每分钟10加仑与1000加仑之间的流率,这取决于反应器的大小和期望的应用。Figure 2 is a perspective sectional view depicting the entire embodiment of the UV reactor shown in the section of Figure 1. The UV reactor 100 shown in Figure 2 comprises ten plate reactors 120, 125, 130, 135, 140, 145, 150, 155, 160, and 165 arranged in series along a longitudinal axis within the shell (not shown in the cutout view). Fluid entering the UV reactor 100 passes sequentially through each plate reactor 120-165 and is exposed to the UV irradiance located within each plate reactor. In the depicted embodiment, each plate reactor 120-170 includes a single channel through which fluid is conveyed and exposed to UV radiation. The total irradiance provided by the plate reactors 120-165 is calibrated and set to the dose required to achieve complete sterilization of the fluid. The fully sterilized fluid that has flowed through the plate reactors 120-170 exits through an outlet port on the outlet end 170 of the UV reactor shell. To achieve the desired production rate of fluid through the reactor, a flow rate between 10 gallons and 1000 gallons per minute is used, depending on the size of the reactor and the desired application.
端板中的每个端板均包括联接到外部基础设施的用于接收和输出用于灭菌的产物流体的入口和出口。UV光源会产生热量,并且所述热量将影响光源的寿命。因此,UV光源在操作期间需要冷却。为了冷却LED并且提供足够的热传递,也使冷却剂流体以与产物流的流体方向不同并且在一些情况下相反的逆流方式循环通过UV反应器。图2还示意性地描绘了冷却剂的这种循环。在所描述的实施方案中,冷冷却剂210在图的顶部处进入UV反应器并且最初水平地前进,并且然后经由所述板的相应冷流体入口孔口在顶部至底部方向上竖直前进。在其他实施方案中,流动可以同样地是底部至顶部。随着冷流体210前进通过UV反应器的背面,所述冷流体冷却UV LED。来自UV LED的热量已被传递到的冷却剂在反应器后面的底部处离开。除了用于产物流的相应入口和出口之外,每个板式反应器120-165还包括用于冷却剂流的相应入口和出口。Each end plate includes an inlet and an outlet connected to external infrastructure for receiving and discharging product fluids used for sterilization. The UV light source generates heat, which affects the lifespan of the light source. Therefore, the UV light source requires cooling during operation. To cool the LEDs and provide sufficient heat transfer, the coolant fluid is also circulated through the UV reactor in a countercurrent manner, opposite to and in some cases to the flow direction of the product stream. Figure 2 also schematically depicts this circulation of the coolant. In the described embodiment, the cold coolant 210 enters the UV reactor at the top of the figure and initially proceeds horizontally, then vertically in a top-to-bottom direction via the corresponding cold fluid inlet orifice of the plate. In other embodiments, the flow may similarly be bottom-to-top. As the cold fluid 210 proceeds through the back of the UV reactor, it cools the UV LEDs. The coolant, to which heat from the UV LEDs has been transferred, exits at the bottom of the back of the reactor. In addition to the corresponding inlets and outlets for the product stream, each plate reactor 120-165 also includes corresponding inlets and outlets for the coolant stream.
用于在单个通道或多个通道中流动的板式反应器的示例性布置的侧视图示出在图3中。如在图2所示的实施方案中,十个板式反应器(为了便于说明,标记了所述板式反应器中的两个板式反应器130、155)以沿纵向方向延伸的串的形式组装在框架105上。待灭菌的流体进入入口112,流动通过板式反应器,并且经灭菌的流体从出口175离开。板式反应器是模块化的,并且可以容易且安全地插入到反应器框架中或从反应器框架中拆卸。板式反应器的大小(和表面积)也可以取决于应用而广泛地变化。示例性尺寸例如在高度/宽度上在5ft至11ft的范围内。如图3所示,板在框架的端板之间以沿纵向方向延展(run)的串的形式竖直地组装。A side view of an exemplary arrangement of plate reactors for flow in a single or multiple channels is shown in Figure 3. As in the embodiment shown in Figure 2, ten plate reactors (two of which, 130 and 155, are labeled for illustration) are assembled in a string extending longitudinally on a frame 105. Fluid to be sterilized enters at inlet 112, flows through the plate reactor, and the sterilized fluid exits at outlet 175. The plate reactors are modular and can be easily and safely inserted into or removed from the reactor frame. The size (and surface area) of the plate reactors can also vary widely depending on the application. Exemplary dimensions, for example, range from 5 ft to 11 ft in height/width. As shown in Figure 3, the plates are vertically assembled in a string extending longitudinally between the end plates of the frame.
图4是示出通过UV反应器的流体流动的示意性侧视图。如图所示,流体在图的顶部处进入UV反应器并且最初经由第一板110的相应入口孔口112以从右到左的方向纵向前进通过反应器。随着流体前进通过UV反应器,所述流体被交替地向下和向上引导到通道例如410、420、430中。例如,在离开第一板式反应器120之后,流体被重定向成竖直地流动到第二板125的顶部,所述流体在所述顶部处离开。从第二板式反应器,流体向下传送。这种运动由挡板例如445、450促进,所述挡板邻接反应器的壳体并且阻止流体进一步纵向流动并且竖直地重定向流。挡板可以如图所示是可为板式反应器的延伸部的组成部分,或可以是对流进行重定向的独立部件。离开最后一个板165的流体被引导到流体出口175和UV反应器的外部。Figure 4 is a schematic side view illustrating the fluid flow through the UV reactor. As shown, the fluid enters the UV reactor at the top of the figure and initially travels longitudinally through the reactor from right to left via the corresponding inlet orifice 112 of the first plate 110. As the fluid travels through the UV reactor, it is alternately directed downwards and upwards into channels such as 410, 420, and 430. For example, after exiting the first plate reactor 120, the fluid is redirected to flow vertically to the top of the second plate 125, where it exits. From the second plate reactor, the fluid flows downwards. This movement is facilitated by baffles such as 445 and 450, which abut the reactor shell and prevent further longitudinal flow of the fluid, thus vertically redirecting the flow. The baffles may be, as shown, part of an extension of the plate reactor, or may be separate components for redirecting the flow. The fluid exiting the last plate 165 is directed to the fluid outlet 175 and the exterior of the UV reactor.
图5是具有替代设计的根据本公开的UV反应器的示意性侧视图。在这种UV反应器500中,待灭菌的流体进入底部入口512,并沿着壳体505的底部水平地行进到反应器的端部。当反应器的底部充满流体时,液体进入介于板式反应器(例如,520、530)之间的通道和位于介于板式反应器与壳体505之间的反应器的纵向端部处的两个通道510、550(在所描绘的实施方案中有总共十一个通道)。在所述通道中的每个通道中,流体在竖直路径中被单向向上传送。在离开竖直通道之后,液体沿着UV反应器的顶部水平行进到出口560。Figure 5 is a schematic side view of a UV reactor according to this disclosure with an alternative design. In this UV reactor 500, the fluid to be sterilized enters the bottom inlet 512 and travels horizontally along the bottom of the shell 505 to the end of the reactor. When the bottom of the reactor is filled with fluid, the liquid enters a channel between plate reactors (e.g., 520, 530) and two channels 510, 550 located at the longitudinal ends of the reactor between the plate reactors and the shell 505 (a total of eleven channels in the depicted embodiment). In each of these channels, the fluid is unidirectionally conveyed upwards in a vertical path. After exiting the vertical channel, the liquid travels horizontally along the top of the UV reactor to the outlet 560.
在所有上述实施方案中,板式反应器的通道的数量和尺寸被设计为提供期望的辐射暴露和停留时间。例如,在一些实施方式中,期望通道直径为约3-5毫米并且在每个板内的停留时间在30秒与1.5分钟之间的范围内。当然需注意的是,这些是示例性参数,该参数可以为了提供足够的剂量以实现流体灭菌的目的而进行调整。In all the above embodiments, the number and size of the channels in the plate reactor are designed to provide the desired radiation exposure and residence time. For example, in some embodiments, it is desired that the channel diameter is about 3-5 mm and the residence time in each plate is in the range of 30 seconds to 1.5 minutes. It should be noted, of course, that these are exemplary parameters and can be adjusted to provide sufficient dosage for the purpose of fluid sterilization.
如前所述,辐射源优选地是LED,所述LED发射在EM光谱的紫外线范围内,更优选在UVC范围内的辐射,所述UVC范围如前所述是电磁光谱的在100纳米与280纳米之间的波长范围。在某些实施方案中,板式反应器是波纹状的并且包括深度可以在4mm至11.5mm范围内的凹槽或狭槽或单个通道。所述板的狭槽可含有许多UV LED或带有许多UV LED的单个通道。例如,每个狭槽可包括约100个LED,但是根据所需的应用,可以采用更多或更少数量的LED。As previously stated, the radiation source is preferably an LED that emits radiation in the ultraviolet range of the EM spectrum, more preferably in the UVC range, which, as previously stated, is the wavelength range of the electromagnetic spectrum between 100 nm and 280 nm. In some embodiments, the plate reactor is corrugated and includes grooves, slots, or single channels with depths ranging from 4 mm to 11.5 mm. The slots of the plate may contain a number of UV LEDs or a single channel with a number of UV LEDs. For example, each slot may include approximately 100 LEDs, but more or fewer LEDs may be used depending on the desired application.
反应器中相对于LED所位于的通道的LED与LED的间距是用于实现所需辐照度的重要参数。LED距离与高度的比率(DHR)被定义为两个相邻LED之间的距离与通道的高度的比率。DHR由通道面积确定以便提供所需辐照度来对流体进行灭菌。在石英护套的表面处折射的光在流体的靶平面上提供辐照度图案,从而允许产生均匀的辐射分布。The spacing between LEDs in the reactor relative to the channel in which the LEDs are located is a crucial parameter for achieving the desired irradiance. The distance-to-height ratio (DHR) is defined as the ratio of the distance between two adjacent LEDs to the height of the channel. The DHR is determined by the channel area to provide the required irradiance for sterilizing the fluid. Light refracted at the surface of the quartz sheath provides an irradiance pattern on the target plane of the fluid, thus allowing for a uniform radiation distribution.
图6是根据本公开的单独UV板式反应器的实施方案的平面图。所描绘的实施方案包括以鱼骨设计布置的通道。板式反应器600包括弹性体垫圈密封系统,以及根据本公开的实施方案的并入在该板上的UV LED光源,例如605、610、615。板式反应器600包括通往外部基础设施以让产物进入和离开的入口和出口/开口(在本文中称为孔口)。例如,图6所示的板式反应器示出了产物流体进入的顶部孔口620。进入顶部孔口620的流体通过通道向下流动到底部孔口625,流体在所述底部孔口处离开。流体被引导通过通道,例如通过鱼骨设计形成的630。孔口620、625优选与定位于反应器中的其他板式反应器的孔口对齐。板式反应器的外边缘可包括形成周边密封的弹性垫圈640。垫圈密封阻止了板式反应器之间的流体流流到旨在供流体流用的通道的外部。每个板式反应器可以配备有也用于将流体保持在通道内的附加密封件,例如650。密封件的材料和设计是基于待处理的液体选择的,并且可以以许多方式实施,所述方式包括例如从弹性体垫圈到激光焊缝。Figure 6 is a plan view of an embodiment of a standalone UV plate reactor according to the present disclosure. The depicted embodiment includes channels arranged in a herringbone design. The plate reactor 600 includes an elastomeric gasket sealing system and UV LED light sources, such as 605, 610, and 615, incorporated on the plate according to an embodiment of the present disclosure. The plate reactor 600 includes inlets and outlets/openings (referred to herein as orifices) leading to external infrastructure for product entry and exit. For example, the plate reactor shown in Figure 6 illustrates a top orifice 620 for product fluid entry. Fluid entering the top orifice 620 flows down through channels to a bottom orifice 625, where it exits. Fluid is guided through channels, such as 630 formed by a herringbone design. Orifices 620 and 625 are preferably aligned with orifices of other plate reactors located within the reactor. The outer edge of the plate reactor may include an elastomeric gasket 640 forming a peripheral seal. The gasket seal prevents fluid flow between the plate reactors from flowing outside the channels intended for fluid flow. Each plate reactor may be equipped with additional seals, such as 650, to also retain fluid within the channels. The material and design of the seals are selected based on the liquid being treated and can be implemented in a variety of ways, including, for example, from elastomeric gaskets to laser welds.
如上所述,本公开的UV反应器和紫外线灭菌方法采用允许根据需要改变UV反应器组件的每个部分的模块化方法。可以添加或移除板式反应器单元以用于新的任务,并且用户可以容易地修改板式反应器和其他部件以适应扩展的容量需求。在被拆卸后,板式反应器可以按照食物加工、乳制品和制药行业所要求的严格标准进行清洁和检查。板式反应器优选地使用卫生材料诸如不锈钢形成。类似地,也在与食物接触的区域中使用合适的卫生材料形成密封材料。UV光源与通过板式反应器的流体路径之间的间隙也可以被调适用于更宽的分离,以处理相对粘稠的流体或具有微粒的流体。As described above, the UV reactor and ultraviolet sterilization method of this disclosure employ a modular approach that allows for modification of each part of the UV reactor assembly as needed. Plate reactor units can be added or removed for new tasks, and users can easily modify the plate reactor and other components to accommodate expanded capacity requirements. After disassembly, the plate reactor can be cleaned and inspected to the stringent standards required by the food processing, dairy, and pharmaceutical industries. The plate reactor is preferably formed using hygienic materials such as stainless steel. Similarly, suitable hygienic materials are also used to form the sealing material in areas in contact with food. The gap between the UV light source and the fluid path through the plate reactor can also be adjusted to accommodate wider separation to handle relatively viscous fluids or fluids containing particles.
图7是多个流体通道从多个侧面被辐照的示例性板式反应器700的区段的横断面图。所述板式反应器的所述区段由以使得在所述板之间形成两个孔眼704、708的方式焊接或以其他方式接合的板区段形成。第一流体通道710流动通过第一孔眼704。流体通道710被限制在石英套筒715内。石英套筒715对UV辐射是基本上透明的。第一UV辐射源722和第二UV辐射源724定位于孔眼710内的石英套筒715的相对侧面上。从UV光源722、724两者发射的UV辐射穿过石英套筒,并且因此通道710内的流体暴露于从两个光源722、724发射的辐射。类似地,第二流体通道730流动通过第二孔眼708。流体通道730被限制在第二石英套筒735内。第三UV光源742和第四UV光源744定位于石英套筒735和来自两个光源742、744的UV辐射的相对侧面上。第二通道730内的流体由此暴露于从光源742、744发射的辐射。UV辐射源722、724、742、744被石英套筒和板(例如,不锈钢)两者保护而免于与流体接触。Figure 7 is a cross-sectional view of a section of an exemplary plate reactor 700 in which multiple fluid channels are irradiated from multiple sides. The section of the plate reactor is formed by welding or otherwise joining plate sections such that two orifices 704, 708 are formed between the plates. A first fluid channel 710 flows through the first orifice 704. The fluid channel 710 is confined within a quartz sleeve 715. The quartz sleeve 715 is substantially transparent to UV radiation. A first UV radiation source 722 and a second UV radiation source 724 are positioned on opposite sides of the quartz sleeve 715 within the orifice 710. UV radiation emitted from both UV light sources 722, 724 passes through the quartz sleeve, and thus the fluid within the channel 710 is exposed to radiation emitted from the two light sources 722, 724. Similarly, a second fluid channel 730 flows through the second orifice 708. The fluid channel 730 is confined within a second quartz sleeve 735. The third UV light source 742 and the fourth UV light source 744 are positioned on opposite sides of the quartz sleeve 735 and the UV radiation from the two light sources 742 and 744. The fluid within the second channel 730 is thus exposed to the radiation emitted from the light sources 742 and 744. The UV radiation sources 722, 724, 742, and 744 are protected from contact with the fluid by both the quartz sleeve and a plate (e.g., stainless steel).
图8是其中多个流体通道在一个侧面上被辐照的板式反应器800的替代实施方案的区段的横断面图。类似于图2所示的实施方案,板式反应器的所述区段由以使得在所述板之间形成两个孔眼804、808的方式焊接或以其他方式接合的板区段形成。然而,这个实施方案中的孔眼804、808是不对称的,不同于图7中所示的孔眼。第一流体通道810流动通过第一孔眼804。流体通道810被限制在板812与石英套筒815之间。UV辐射源820定位于石英套筒815的与通道810相对的侧面上,辐照在通道810内流动的流体。类似地,第二流体通道830流动通过第二孔眼808。流体通道830被限制在第二石英套筒835内的板832之间。第二UV辐射源840定位于石英套筒835的与通道830相对的侧面上。第二UV辐射源840辐照在通道830内流动的流体。Figure 8 is a cross-sectional view of a section of an alternative embodiment of a plate reactor 800 in which multiple fluid channels are irradiated on one side. Similar to the embodiment shown in Figure 2, the section of the plate reactor is formed by plate sections welded or otherwise joined such that two orifices 804, 808 are formed between the plates. However, the orifices 804, 808 in this embodiment are asymmetrical, unlike the orifices shown in Figure 7. A first fluid channel 810 flows through the first orifice 804. The fluid channel 810 is confined between a plate 812 and a quartz sleeve 815. A UV radiation source 820 is positioned on the side of the quartz sleeve 815 opposite to the channel 810, irradiating the fluid flowing within the channel 810. Similarly, a second fluid channel 830 flows through the second orifice 808. The fluid channel 830 is confined between plates 832 within a second quartz sleeve 835. The second UV radiation source 840 is positioned on the side of the quartz sleeve 835 opposite to the channel 830. The second UV radiation source 840 irradiates the fluid flowing within the channel 830.
图9是其中单个流体通道在多个侧面上被辐照的板式反应器900的进一步实施方案的区段的横断面图。板式反应器900包括平行于彼此地定位的第一板904和第二板908。第一组UV LED(例如,912、914)被定位在第一板904上板之间的区域中,并且第二组LED(例如,922、924)被定位成与第二板908上的第一多个LED相对。被定位于第一组UV LED与第二组UVLED之间的是围绕流体通道940的石英套筒930。随着流体流动通过通道940,所述流体被第一组UV LED和第二组UV LED两者辐照。板式反应器900包括位于第一端部的第一凸缘942和垫圈944,以及位于第二端部的第二凸缘946和垫圈948。该凸缘和垫圈提供了用于控制流体流动的周边密封和使得能够在UV反应器内容易地安装和移除板式反应器的固定件。与其他实施方案中一样,在这个实施方案中,UV辐射源通过板(例如,不锈钢)和石英套管与液体流分隔开。Figure 9 is a cross-sectional view of a section of a further embodiment of a plate reactor 900 in which a single fluid channel is irradiated on multiple sides. The plate reactor 900 includes a first plate 904 and a second plate 908 positioned parallel to each other. A first set of UV LEDs (e.g., 912, 914) is positioned in the region between the upper plates of the first plate 904, and a second set of LEDs (e.g., 922, 924) is positioned opposite a first set of LEDs on the second plate 908. A quartz sleeve 930 is positioned between the first and second sets of UV LEDs surrounding a fluid channel 940. As fluid flows through the channel 940, the fluid is irradiated by both the first and second sets of UV LEDs. The plate reactor 900 includes a first flange 942 and a gasket 944 at a first end, and a second flange 946 and a gasket 948 at a second end. The flanges and gaskets provide a peripheral seal for controlling fluid flow and fasteners that allow easy installation and removal of the plate reactor within the UV reactor. As in other implementations, in this implementation, the UV radiation source is separated from the liquid flow by a plate (e.g., stainless steel) and a quartz sleeve.
图10是其中单个流体通道在单个侧面上被辐照的板式反应器1000的实施方案的区段的横断面图。板式反应器1000包括辐照板1004和底板1008,一组UV LED(例如,1012、1014)定位在所述辐照板上。套筒1020与底板1008之间的空间限定了流体通道1030。随着流体流动通过通道1030,所述流体被所述一组UV LED(例如,1012、1014)辐照。板式反应器1000包括位于第一端部的第一凸缘942和垫圈944,以及位于第二端部的第二凸缘946和垫圈948。该凸缘和垫圈提供了用于控制流体流动的周边密封和使得能够在UV反应器内容易地安装和移除板式反应器的固定件。与其他实施方案中一样,在这个实施方案中,UV辐射源通过板(例如,不锈钢)和石英套管与液体流分隔开。Figure 10 is a cross-sectional view of a section of an embodiment of a plate reactor 1000 in which a single fluid channel is irradiated on a single side. The plate reactor 1000 includes an irradiation plate 1004 and a base plate 1008, on which a set of UV LEDs (e.g., 1012, 1014) are positioned. A space between a sleeve 1020 and the base plate 1008 defines a fluid channel 1030. As fluid flows through the channel 1030, the fluid is irradiated by the set of UV LEDs (e.g., 1012, 1014). The plate reactor 1000 includes a first flange 942 and a gasket 944 at a first end, and a second flange 946 and a gasket 948 at a second end. The flanges and gaskets provide a peripheral seal for controlling fluid flow and fasteners that allow easy installation and removal of the plate reactor within the UV reactor. As in other embodiments, in this embodiment, the UV radiation source is separated from the liquid flow by a plate (e.g., stainless steel) and a quartz sleeve.
所公开的UVC反应器系统相对于相关技术具有若干优点。所公开的反应器系统提供了增强的UV辐照传递区域板和紧凑的设计,从而导致更高效率的灭菌过程。与传统的UV灭菌系统相比,具有很少的阴影形成(shadowing)至没有阴影形成。UV光以直线行进,因此任何阴影或障碍物都将降低它的效率。本公开的设计消除了阴影形成并且将整个液体暴露于辐照。The disclosed UVC reactor system offers several advantages over related technologies. The disclosed reactor system provides an enhanced UV irradiation transfer zone plate and a compact design, resulting in a more efficient sterilization process. Compared to conventional UV sterilization systems, it exhibits very little to no shadowing. UV light travels in a straight line, so any shadow or obstruction will reduce its efficiency. The design of this disclosure eliminates shadowing and exposes the entire liquid to irradiation.
仅通过向框架结构添加更多模块化板,即可高效率地且有效地提高灭菌“致命性”。传统系统将需要完全重新设计等离子放电灯和构建新系统。此外,该反应器可以容易且廉价地被调适成对具有不同灭菌规格的不同类型的产品进行灭菌。此外,反应器设计提供了更有效的UV光源冷却,这有助于延长光源的光寿命。Simply by adding more modular panels to the frame structure, the sterilization "lethality" can be significantly improved efficiently and effectively. Traditional systems would require a complete redesign of the plasma discharge lamp and the construction of a new system. Furthermore, the reactor can be easily and inexpensively adapted to sterilize different types of products with varying sterilization specifications. Additionally, the reactor design provides more efficient cooling of the UV light source, which helps extend the light source's photolife.
此外,本文所公开的紫外线灭菌反应器和方法不需要在辐照之前从流体中去除氧气,也不需要硝态氮的存在来有效地对液体进行灭菌。此外,该方法在灭菌期间不需要对液体的温度范围进行限制。Furthermore, the ultraviolet sterilization reactor and method disclosed herein do not require the removal of oxygen from the fluid prior to irradiation, nor does the presence of nitrate nitrogen necessitate effective sterilization of the liquid. Additionally, this method does not require limitation on the temperature range of the liquid during sterilization.
应当理解的是,本文所公开的任何结构和功能细节不应被解释为限制所述系统和方法,而是作为代表性实施方案和/或布置提供以用于教导本领域技术人员各种实施所述方法的方式。还应理解的是,附图中的相似零件在若干附图中表示相似元件,并且并非所有实施方案或布置都需要参照附图描述和例示的所有部件和/或步骤。It should be understood that any structural and functional details disclosed herein should not be construed as limiting the systems and methods described, but are provided as representative embodiments and/or arrangements to teach those skilled in the art various ways of implementing the methods. It should also be understood that similar parts in the figures represent similar elements in several figures, and not all embodiments or arrangements require reference to all parts and/or steps described and illustrated in the figures.
本文中所使用的术语仅仅是为了描述具体实施方案的目的,并且并不旨在限制本发明。如本文使用,除非上下文另有明确指示,否则单数形式“一个(种)”和“该(所述)”旨在也包括复数形式。还应当理解的是术语“包括”和/或“包含”,当在本专利说明书中使用时,明确指出所陈述的特征、整体、步骤、操作、元件和/或部件的存在,但是并不排除一个多个其他特征、整体、步骤、操作、元件、部件和/或它们的组的存在或添加。The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the invention. As used herein, unless the context clearly indicates otherwise, the singular forms “a” and “the” are intended to include the plural forms as well. It should also be understood that the terms “comprising” and/or “including”, when used in this patent specification, expressly indicate the presence of stated features, integrals, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integrals, steps, operations, elements, components, and/or groups thereof.
取向术语在本文中仅用于约定和参考的目的,并且不应被解读为限制。然而,公认的是这些术语可以参考观察者使用。因此,不暗示或推断任何限制。Orientation terms are used herein for convention and reference purposes only and should not be construed as limiting. However, it is generally accepted that these terms may be used by the observer. Therefore, no limitation is implied or inferred.
还应理解的是,本文所用的措辞和术语是出于描述目的,并且不应认为是限制性的。本文中“包括”、“包含”或“具有”、“含有”、“涉及”以及它们的变型的使用意指涵盖其后列出的项目和其等同物以及附加项目。It should also be understood that the wording and terminology used herein are for descriptive purposes and should not be considered restrictive. The use of “including,” “comprising,” or “having,” “containing,” “involving,” and variations thereof in this document means to cover the items listed thereafter and their equivalents and additional items.
虽然已经参照示例性实施方案描述了本发明,但是本领域的技术人员将理解,在不脱离本发明的范围的情况下,可以做出各种改变,并且可用等同物取代其要素。此外,本领域的技术人员将会理解,在不脱离本发明的基本范围的情况下可以对本发明的教导进行许多修改,以适应特定的仪器、情况或材料。因此,本发明并不旨在局限于作为被考虑用于实施本发明的最佳模式而公开的特定实施方案,而是本发明将包括如本领域普通技术人员所理解的落入本公开的范围内的所有实施方案。Although the invention has been described with reference to exemplary embodiments, those skilled in the art will understand that various changes can be made without departing from the scope of the invention, and equivalents can be substituted for its elements. Furthermore, those skilled in the art will understand that many modifications can be made to the teachings of the invention to suit particular apparatus, situations, or materials without departing from the basic scope of the invention. Therefore, the invention is not intended to be limited to the specific embodiments disclosed as the best mode considered for carrying out the invention, but rather the invention will include all embodiments falling within the scope of this disclosure as understood by those skilled in the art.
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