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HK1233321B - 形成相对带电颗粒的准中性光束的装置 - Google Patents

形成相对带电颗粒的准中性光束的装置 Download PDF

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Publication number
HK1233321B
HK1233321B HK17106992.6A HK17106992A HK1233321B HK 1233321 B HK1233321 B HK 1233321B HK 17106992 A HK17106992 A HK 17106992A HK 1233321 B HK1233321 B HK 1233321B
Authority
HK
Hong Kong
Prior art keywords
ion
voltage source
plasma
radiofrequency
grids
Prior art date
Application number
HK17106992.6A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1233321A1 (zh
Inventor
Dmytro RAFALSKYI
Ane Aanesland
Original Assignee
Ecole Polytechnique
Centre National De La Recherche Scientifique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ecole Polytechnique, Centre National De La Recherche Scientifique filed Critical Ecole Polytechnique
Publication of HK1233321A1 publication Critical patent/HK1233321A1/zh
Publication of HK1233321B publication Critical patent/HK1233321B/zh

Links

HK17106992.6A 2014-04-17 2015-04-14 形成相对带电颗粒的准中性光束的装置 HK1233321B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR1453469 2014-04-17

Publications (2)

Publication Number Publication Date
HK1233321A1 HK1233321A1 (zh) 2018-01-26
HK1233321B true HK1233321B (zh) 2021-04-09

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