HK1224820B - Pixel array and image sensing system - Google Patents
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Description
技术领域Technical Field
本发明涉及图像传感器。更具体来说,本发明的实例涉及三维图像传感器。The present invention relates to image sensors, and more particularly, to three-dimensional image sensors.
背景技术Background Art
对三维(3D)相机的兴趣正随着3D应用的流行不断在例如成像、电影、游戏、计算机、用户接口及类似物的应用中增长而增加。用于创建彩色3D图像的典型被动方式是使用多个相机来捕获立体或多个图像。使用立体图像,可对图像中的物体进行三角测量以创建彩色3D图像。此三角测量技术的一个缺点是难以使用小装置创建彩色3D图像,这是因为每一相机之间必须存在最小分离距离以便创建彩色3D图像。另外,此技术为复杂的,且因此需要显著的计算机处理能力以便实时地创建彩色3D图像。此外,使用多个相机可增加成像系统的大小及成本。Interest in three-dimensional (3D) cameras is increasing as 3D applications become increasingly popular, such as in applications such as imaging, movies, games, computers, user interfaces, and the like. A typical passive approach for creating color 3D images is to use multiple cameras to capture stereo or multiple images. Using stereo images, objects in the image can be triangulated to create a color 3D image. One disadvantage of this triangulation technique is that it is difficult to create a color 3D image using a small device because a minimum separation distance must exist between each camera in order to create a color 3D image. In addition, this technique is complex and therefore requires significant computer processing power in order to create a color 3D image in real time. Furthermore, using multiple cameras can increase the size and cost of the imaging system.
对于需要实时获取彩色3D图像的应用,有时利用基于光学飞行时间测量的有源深度成像系统。飞行时间系统通常采用:将光引导于物体处的光源,检测从物体反射的光的传感器,及基于光来往于物体行进所花费的往返时间而计算到所述物体的距离的处理单元。在典型飞行时间传感器中,通常由于从光电检测区到感测节点的高传送效率而使用光电二极管。For applications requiring real-time color 3D image acquisition, active depth imaging systems based on optical time-of-flight measurements are sometimes utilized. A time-of-flight system typically employs a light source to direct light toward an object, a sensor to detect the light reflected from the object, and a processing unit to calculate the distance to the object based on the round-trip time it takes for the light to travel to and from the object. In typical time-of-flight sensors, photodiodes are often used due to their high transmission efficiency from the photodetection region to the sensing node.
发明内容Summary of the Invention
本申请案的一个实施例涉及一种像素阵列,其包括:多个可见光像素,其布置于所述像素阵列中,其中所述多个可见光像素中的每一者包含布置于第一半导体裸片中以检测可见光的光敏元件,其中所述多个可见光像素中的每一者经耦合以将彩色图像数据提供到安置于第二半导体裸片中的可见光读出电路,所述第二半导体裸片以堆叠式芯片方案与所述第一半导体裸片堆叠且耦合到所述第一半导体裸片;及多个红外(IR)像素,其布置于所述像素阵列中,其中所述多个IR像素中的每一者包含布置于所述第一半导体裸片中以检测IR光的单光子雪崩光电二极管(SPAD),其中所述多个IR光像素中的每一者经耦合以将IR图像数据提供到安置于所述第二半导体裸片中的IR光读出电路。One embodiment of the present application relates to a pixel array, comprising: a plurality of visible light pixels arranged in the pixel array, wherein each of the plurality of visible light pixels includes a photosensitive element arranged in a first semiconductor die to detect visible light, wherein each of the plurality of visible light pixels is coupled to provide color image data to a visible light readout circuit disposed in a second semiconductor die, the second semiconductor die being stacked with the first semiconductor die in a stacked chip scheme and coupled to the first semiconductor die; and a plurality of infrared (IR) pixels arranged in the pixel array, wherein each of the plurality of IR pixels includes a single photon avalanche photodiode (SPAD) arranged in the first semiconductor die to detect IR light, wherein each of the plurality of IR light pixels is coupled to provide IR image data to an IR light readout circuit disposed in the second semiconductor die.
本申请案的另一实施例涉及一种图像感测系统,其包括:光源,其用于将红外(IR)光脉冲发射到物体;像素阵列,其用于从所述物体接收可见光及经反射IR光脉冲,其中所述像素阵列包含:多个可见光像素,其布置于所述像素阵列中,其中所述多个可见光像素中的每一者包含布置于第一半导体裸片中以检测来自所述物体的所述可见光的光敏元件,其中所述多个可见光像素中的每一者经耦合以将彩色图像数据提供到安置于第二半导体裸片中的可见光读出电路,所述第二半导体裸片以堆叠式芯片方案与所述第一半导体裸片堆叠且耦合到所述第一半导体裸片;及多个IR像素,其布置于所述像素阵列中,其中所述多个IR像素中的每一者包含布置于所述第一半导体裸片中以检测来自所述物体的所述经反射IR光脉冲来产生飞行时间信息的单光子雪崩光电二极管(SPAD),其中所述多个可见光像素中的每一者经耦合以将IR图像数据提供到安置于所述第二半导体裸片中的IR光读出电路;及控制电路,其经耦合以控制所述像素阵列的操作且借助同步信号控制并使所述光源同步以使所述光脉冲的发射与对从所述物体反射的光子的感测的时序同步。Another embodiment of the present application relates to an image sensing system comprising: a light source for emitting infrared (IR) light pulses toward an object; a pixel array for receiving visible light and reflected IR light pulses from the object, wherein the pixel array comprises: a plurality of visible light pixels arranged in the pixel array, wherein each of the plurality of visible light pixels comprises a photosensitive element arranged in a first semiconductor die to detect the visible light from the object, wherein each of the plurality of visible light pixels is coupled to provide color image data to a visible light readout circuit disposed in a second semiconductor die, the second semiconductor die being stacked with the first semiconductor die in a stacked chip scheme stacked and coupled to the first semiconductor die; and a plurality of IR pixels arranged in the pixel array, wherein each of the plurality of IR pixels includes a single photon avalanche photodiode (SPAD) arranged in the first semiconductor die to detect the reflected IR light pulses from the object to generate time-of-flight information, wherein each of the plurality of visible light pixels is coupled to provide IR image data to an IR light readout circuit disposed in the second semiconductor die; and a control circuit coupled to control the operation of the pixel array and to control and synchronize the light source with a synchronization signal to synchronize the emission of the light pulses with the timing of sensing of photons reflected from the object.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
参照以下图描述本发明的非限制性及非穷尽性实施例,其中除非另有规定,否则贯穿各个视图,相同参考编号是指相同部件。Non-limiting and non-exhaustive embodiments of the present invention are described with reference to the following figures, wherein like reference numerals refer to like parts throughout the various views unless otherwise specified.
图1是展示用于产生物体或场景的三维彩色图像的成像系统的实例的示意性框图。1 is a schematic block diagram showing an example of an imaging system for producing a three-dimensional color image of an object or scene.
图2是展示根据本发明的教示包含具有对应读出电路、控制电路及功能逻辑的彩色飞行时间像素阵列的3D彩色图像传感器的实例的一部分的框图。2 is a block diagram showing a portion of an example of a 3D color image sensor including a color time-of-flight pixel array with corresponding readout circuitry, control circuitry, and function logic in accordance with the teachings of the present invention.
图3是展示根据本发明的教示安置于实例性彩色飞行时间像素阵列上方的实例性RGB-IR滤光器阵列的图解说明。3 is a diagrammatic illustration showing an example RGB-IR filter array disposed over an example color time-of-flight pixel array in accordance with the teachings of the present invention.
图4A是图解说明根据本发明的教示的堆叠式可见光像素的一个实例的示意图。4A is a schematic diagram illustrating one example of a stacked visible light pixel in accordance with the teachings of the present invention.
图4B是图解说明根据本发明的教示包含淬灭元件的堆叠式芯片SPAD像素的一个实例的示意图。4B is a schematic diagram illustrating one example of a stacked-chip SPAD pixel including a quenching element in accordance with the teachings of the present invention.
图5是根据本发明的教示包含具有堆叠式裸片的3D彩色图像传感器的集成电路系统的横截面图。5 is a cross-sectional diagram of an integrated circuit system including a 3D color image sensor with stacked die in accordance with the teachings of the present invention.
贯穿图式的数个视图,对应参考字符指示对应组件。所属领域的技术人员将了解,图中的元件是为简单及清晰起见而图解说明的,且未必按比例绘制。举例来说,为帮助改进对本发明的各种实施例的理解,各图中的元件中的一些元件的尺寸可能相对于其它元件被放大。同样,通常不描绘在商业上可行的实施例中有用或必需的常见而众所周知的元件以便促进对本发明的这些各个实施例的较不受阻碍的观看。Throughout the several views of the drawings, corresponding reference characters indicate corresponding components. Those skilled in the art will appreciate that the elements in the figures are illustrated for simplicity and clarity and are not necessarily drawn to scale. For example, to help improve understanding of the various embodiments of the present invention, the dimensions of some of the elements in the various figures may be exaggerated relative to other elements. Likewise, common and well-known elements that are useful or necessary in commercially feasible embodiments are generally not depicted to facilitate a less obstructed view of these various embodiments of the present invention.
具体实施方式DETAILED DESCRIPTION
揭示一种用于使用飞行时间及深度信息获得彩色3D图像的设备及系统。在以下说明中,陈述众多特定细节以提供对实施例的透彻理解。然而,相关领域的技术人员将认识到,可在不具有所述特定细节中的一者或多者的情况下或者借助其它组件、材料等来实践本文中所描述的技术。在其它实例中,未详细展示或描述众所周知的结构、材料或操作以避免使特定方面模糊。Disclosed are an apparatus and system for obtaining color 3D images using time-of-flight and depth information. In the following description, numerous specific details are set forth to provide a thorough understanding of the embodiments. However, one skilled in the relevant art will recognize that the techniques described herein can be practiced without one or more of these specific details, or with other components, materials, etc. In other instances, well-known structures, materials, or operations are not shown or described in detail to avoid obscuring certain aspects.
贯穿本说明书对“一个实施例”或“实施例”的提及意指结合所述实施例所描述的特定特征、结构或特性包含于本发明的至少一个实施例中。因此,贯穿本说明书在各个地方中出现的短语“在一个实施例中”或“在实施例中”未必全部是指相同实施例。此外,特定特征、结构或特性可以任一适合方式组合于一个或多个实施例中。Reference throughout this specification to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the present invention. Thus, the appearances of the phrases "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment. Furthermore, the particular features, structures, or characteristics may be combined in any suitable manner in one or more embodiments.
贯穿本说明书,使用数个技术术语。这些术语将呈现其在其所属领域中的普通含义,除非本文中另外具体定义或其使用的上下文将另外清晰地暗示。举例来说,术语“或”在包含性意义上使用(例如,如同“及/或”),除非上下文另外清晰地指示。Throughout this specification, several technical terms are used. These terms are to be taken on their ordinary meaning in the art to which they pertain, unless otherwise specifically defined herein or the context of their use clearly implies otherwise. For example, the term "or" is used in an inclusive sense (e.g., as in "and/or") unless the context clearly dictates otherwise.
图1图解说明可产生物体或场景12的彩色3D图像的实例性成像系统10的示意性框图。举例来说,成像系统10可用作彩色相机用于3D手势辨识系统的部分,3D手势辨识系统举例来说可用于视频游戏系统中。如图1中所展示,成像系统10包含光学成像仪或相机18,光学成像仪或相机18接收并处理来自场景或物体12的可见光。在所述实例中,相机18产生场景或物体12的红色(R)、绿色(G)及蓝色(B)彩色图像数据。如此,相机18也可被称为“RGB相机”。RBG像素阵列22接收可见光,且读出电路24读出可见图像数据。FIG1 illustrates a schematic block diagram of an example imaging system 10 that can generate a color 3D image of an object or scene 12. For example, imaging system 10 can be used as a color camera for a 3D gesture recognition system, such as may be used in a video gaming system. As shown in FIG1 , imaging system 10 includes an optical imager or camera 18 that receives and processes visible light from a scene or object 12. In the example, camera 18 generates red (R), green (G), and blue (B) color image data of scene or object 12. As such, camera 18 may also be referred to as an "RGB camera." An RBG pixel array 22 receives the visible light, and readout circuitry 24 reads out the visible image data.
在所述实例中,成像系统10还包含红外(IR)源14,红外(IR)源14用IR光照射场景或物体12。在一个实例中,IR源14可包含用于提供IR光的IR激光器或类似物。IR成像仪或相机16接收并处理从场景或物体12返回的IR光以产生场景或物体12的IR图像数据。如此,IR像素阵列26接收IR光,且IR读出电路28读出IR图像数据。In the example, imaging system 10 also includes an infrared (IR) source 14 that illuminates scene or object 12 with IR light. In one example, IR source 14 may include an IR laser or the like for providing IR light. IR imager or camera 16 receives and processes the IR light returned from scene or object 12 to generate IR image data of scene or object 12. In this manner, IR pixel array 26 receives the IR light, and IR readout circuitry 28 reads out the IR image data.
在所述实例中,来自RGB相机18及IR相机16的图像数据的帧经发射到图像处理电路20,图像处理电路20处理所接收数据以产生场景或物体12的3D彩色图像。图像处理电路20使用来自RGB相机18的数据来产生彩色图像,且使用来自IR相机16的数据来提供深度信息以便产生彩色3D图像。因此,图1的成像系统10包含用于产生彩色3D图像的单独RGB相机18及IR相机16。然而,应注意,通过利用例如RGB相机18及IR相机16的多个相机,存在多组控制信号线及多个数据集,其导致成像系统10具有大且复杂的外观尺寸以及相对高成本。In the example, frames of image data from the RGB camera 18 and the IR camera 16 are transmitted to the image processing circuit 20, which processes the received data to generate a 3D color image of the scene or object 12. The image processing circuit 20 uses the data from the RGB camera 18 to generate the color image and uses the data from the IR camera 16 to provide depth information for generating the color 3D image. Thus, the imaging system 10 of FIG1 includes a separate RGB camera 18 and an IR camera 16 for generating a color 3D image. However, it should be noted that by utilizing multiple cameras, such as the RGB camera 18 and the IR camera 16, there are multiple sets of control signal lines and multiple data sets, which results in the imaging system 10 having a large and complex physical size and a relatively high cost.
在一个实例中,可通过使用其中将RGB相机及IR相机组合于一单个图像像素阵列中的成像系统获得3D彩色图像。举例来说,在一个实例中,成像系统包含图像像素阵列,所述图像像素阵列具有多个可见光像素及多个硅光子雪崩二极管(SPAD)像素。在所述实例中,所述多个可见光像素中的每一者包含用于接收光的一部分的(举例来说)例如光电二极管的光敏元件,及用于产生表示光的所述所接收部分的强度的信号的像素支持电路。所述多个SPAD像素中的每一者包含用于检测到物体的距离的雪崩二极管,及耦合到雪崩光电二极管的SPAD像素支持电路。光敏元件及SPAD像素的阵列安置于传感器裸片上,且可见光像素及SPAD像素的像素支持电路安置于专用集成电路(ASIC)裸片上。传感器裸片及ASIC裸片堆叠在一起。In one example, a 3D color image can be obtained by using an imaging system in which an RGB camera and an IR camera are combined into a single image pixel array. For example, in one example, the imaging system includes an image pixel array having a plurality of visible light pixels and a plurality of silicon photonic avalanche diode (SPAD) pixels. In the example, each of the plurality of visible light pixels includes a photosensitive element such as a photodiode, for example, for receiving a portion of light, and pixel support circuitry for generating a signal representing the intensity of the received portion of light. Each of the plurality of SPAD pixels includes an avalanche diode for detecting the distance to an object, and SPAD pixel support circuitry coupled to the avalanche photodiode. The array of photosensitive elements and SPAD pixels is disposed on a sensor die, and the pixel support circuitry for the visible light pixels and SPAD pixels is disposed on an application-specific integrated circuit (ASIC) die. The sensor die and ASIC die are stacked together.
在所述实例中,滤光器安置于所述多个可见光像素中的每一者及所述多个SPAD像素中的每一者上面。每一滤光器使预定波长带或光的颜色通过。每一滤光器与可见光像素的相关联光敏元件或SPAD像素的雪崩二极管对准。滤光器中的至少一者适于使可见色彩带中的波长带通过,且滤光器中的至少另外一者适于使红外带中的波长带通过。In the example, a filter is disposed over each of the plurality of visible light pixels and each of the plurality of SPAD pixels. Each filter passes a predetermined wavelength band or color of light. Each filter is aligned with an associated photosensitive element of a visible light pixel or an avalanche diode of a SPAD pixel. At least one of the filters is adapted to pass a wavelength band in the visible color band, and at least one other of the filters is adapted to pass a wavelength band in the infrared band.
为图解说明,图2是展示根据本发明的教示包含具有对应读出电路、控制电路及功能逻辑的飞行时间像素阵列的堆叠式3D彩色图像传感器200的实例的一部分的框图。特定来说,如所描绘实例中所图解说明,堆叠式3D彩色图像传感器200包含彩色飞行时间(TOF)像素阵列210、读出电路220、控制电路230、功能逻辑240及IR源250。在所述实例中,IR源250发射脉冲IR光252,脉冲IR光可用于基于IR光的脉冲的飞行时间来感测到物体260的往返距离。特定来说,根据本发明的教示可通过测量所发射IR光脉冲252从IR源250行进到物体260且返回到彩色TOF像素阵列210所花费的时间的量来确定往返距离。通过确定到物体260的往返距离,可确定3D信息。可举例来说在多种应用中(例如包含于举例来说视频游戏系统或类似物中的3D手势辨识系统中的相机的部分)使用图2的堆叠式3D彩色图像传感器200。在一个实例中,IR源250可包含发射照射物体260的IR光252的IR激光器。To illustrate, FIG2 is a block diagram showing a portion of an example of a stacked 3D color image sensor 200 including a time-of-flight pixel array with corresponding readout circuitry, control circuitry, and function logic in accordance with the teachings of the present invention. Specifically, as illustrated in the depicted example, stacked 3D color image sensor 200 includes a color time-of-flight (TOF) pixel array 210, readout circuitry 220, control circuitry 230, function logic 240, and an IR source 250. In the example, IR source 250 emits pulsed IR light 252 that can be used to sense the round-trip distance to an object 260 based on the time-of-flight of the pulses of IR light. Specifically, the round-trip distance can be determined in accordance with the teachings of the present invention by measuring the amount of time it takes for the emitted IR light pulses 252 to travel from IR source 250 to object 260 and back to color TOF pixel array 210. By determining the round-trip distance to object 260, 3D information can be determined. 2 can be used, for example, in a variety of applications, such as part of a camera in a 3D gesture recognition system included in, for example, a video game system or the like. In one example, IR source 250 can include an IR laser that emits IR light 252 that illuminates object 260.
在图2中的所图解说明的实例中,彩色TOF像素阵列210为安置于半导体传感器裸片的半导体材料中的可见光像素211及SPAD像素212的二维(2D)阵列。可用彩色TOF像素阵列210中的多个SPAD像素212来检测来自物体260的经反射IR光254以提供IR图像数据。彩色TOF像素阵列210中的所述多个可见光像素211检测来自物体260的可见光以提供彩色图像数据。在一个实例中,所述多个可见光像素211中的每一者包含用于接收光的一部分的例如光电二极管的光敏元件,以及用于产生表示光的所述所接收部分的强度的信号的像素支持电路。所述多个SPAD像素212中的每一者包含雪崩二极管及SPAD像素支持电路。In the illustrated example in FIG2 , color TOF pixel array 210 is a two-dimensional (2D) array of visible light pixels 211 and SPAD pixels 212 disposed in semiconductor material of a semiconductor sensor die. Multiple SPAD pixels 212 in color TOF pixel array 210 can be used to detect reflected IR light 254 from an object 260 to provide IR image data. The multiple visible light pixels 211 in color TOF pixel array 210 detect visible light from the object 260 to provide color image data. In one example, each of the multiple visible light pixels 211 includes a photosensitive element, such as a photodiode, for receiving a portion of the light, and pixel support circuitry for generating a signal representing the intensity of the received portion of the light. Each of the multiple SPAD pixels 212 includes an avalanche diode and SPAD pixel support circuitry.
如所描绘实例中所展示,所述多个SPAD像素212中的每一者在彩色TOF像素阵列210的半导体材料中的所有横向侧上被可见光像素211围绕。如此,根据本发明的教示,所述多个SPAD像素212贯穿彩色TOF像素阵列210而分布于半导体传感器裸片的半导体材料中的所述多个可见光像素211当中。在一个实例中,SPAD像素212与可见光像素211之间的大小的比率为4比1。在另一实例中,SPAD像素212与可见光像素之间的大小的比率可为另一值,例如9比1。在另一实例中,SPAD像素的大小为可见光像素的大小的N倍大,其中N为整数。由于堆叠式3D彩色图像传感器200包含以堆叠式芯片方案与ASIC裸片堆叠的传感器裸片,因此光敏元件可占据可见光像素211的实质上整个区域且雪崩二极管可占据SPAD像素212的实质上整个区域。As shown in the depicted example, each of the plurality of SPAD pixels 212 is surrounded on all lateral sides by visible light pixels 211 in the semiconductor material of the color TOF pixel array 210. Thus, in accordance with the teachings of the present invention, the plurality of SPAD pixels 212 are distributed throughout the color TOF pixel array 210 among the plurality of visible light pixels 211 in the semiconductor material of the semiconductor sensor die. In one example, the ratio of the sizes of the SPAD pixels 212 to the visible light pixels 211 is 4 to 1. In another example, the ratio of the sizes of the SPAD pixels 212 to the visible light pixels can be another value, such as 9 to 1. In another example, the size of the SPAD pixels is N times larger than the size of the visible light pixels, where N is an integer. Because the stacked 3D color image sensor 200 includes a sensor die stacked with an ASIC die in a stacked chip approach, the photosensitive elements can occupy substantially the entire area of the visible light pixels 211, and the avalanche diodes can occupy substantially the entire area of the SPAD pixels 212.
在所描绘实例中,控制电路230经耦合以控制彩色TOF像素阵列210的操作,以及借助同步信号235控制并使IR源250同步来发射到物体260的IR光252的脉冲以使IR光脉冲252的发射与借助SPAD像素212对从物体260反射的光子的感测的时序同步。特定来说,经反射IR光254从物体260反射回到彩色TOF像素阵列210。用可见光像素211检测可见光且用所述多个SPAD像素212检测经反射IR光254。In the depicted example, control circuitry 230 is coupled to control the operation of color TOF pixel array 210, as well as to control and synchronize pulses of IR light 252 emitted by IR source 250 to object 260 with synchronization signal 235 to synchronize the emission of IR light pulses 252 with the timing of sensing of photons reflected from object 260 with SPAD pixels 212. In particular, reflected IR light 254 is reflected from object 260 back to color TOF pixel array 210. Visible light is detected with visible light pixels 211 and reflected IR light 254 is detected with the plurality of SPAD pixels 212.
彩色图像数据及IR图像数据的帧通过位线225从彩色TOF像素阵列210传送到包含于读出电路220中的可见光读出电路及IR光读出电路。读出电路220可包含放大器以放大通过位线225接收的信号。位线225可用于耦合安置于同一列上的可见光像素211。彩色飞行时间像素阵列210中的所述多个SPAD像素212中的每一者可耦合到其自身相应读出电路,所述相应读出电路不同于可见光像素211的读出电路。由读出电路220中的可见光读出电路及IR光读出电路读出的信息接着可经传送到包含于功能逻辑240中的数字电路以存储并处理从彩色TOF像素阵列210读出的信息。在一个实例中,功能逻辑240可确定距彩色TOF像素阵列210的所述多个SPAD像素212中的每一者的飞行时间及距离信息。在一个实例中,功能逻辑240可操纵彩色图像数据及/或IR图像数据(例如,剪裁、旋转、针对背景噪声调整或类似物)。在一个实例中,功能逻辑240可将彩色图像数据与IR图像数据中的飞行时间信息组合以提供彩色3D图像。Frames of color image data and IR image data are transmitted from the color TOF pixel array 210 via bit lines 225 to visible light readout circuitry and IR light readout circuitry included in the readout circuitry 220. The readout circuitry 220 may include an amplifier to amplify the signal received via the bit lines 225. The bit lines 225 may be used to couple visible light pixels 211 disposed on the same column. Each of the plurality of SPAD pixels 212 in the color TOF pixel array 210 may be coupled to its own respective readout circuitry, which is different from the readout circuitry of the visible light pixels 211. The information read out by the visible light readout circuitry and IR light readout circuitry in the readout circuitry 220 may then be transmitted to digital circuitry included in the function logic 240 to store and process the information read out from the color TOF pixel array 210. In one example, the function logic 240 may determine time of flight and distance information from each of the plurality of SPAD pixels 212 in the color TOF pixel array 210. In one example, function logic 240 may manipulate the color image data and/or the IR image data (e.g., crop, rotate, adjust for background noise, or the like). In one example, function logic 240 may combine the color image data with time-of-flight information in the IR image data to provide a color 3D image.
如所提及,应注意,图2中所图解说明的3D彩色图像传感器200可以堆叠式芯片方案实施。举例来说,可见光像素211的光敏元件与SPAD像素212的雪崩二极管的阵列可安置于传感器裸片上。可见光像素211的像素支持电路及SPAD像素212的像素支持电路以及读出电路220、控制电路230及功能逻辑240可安置于单独ASIC裸片上。在所述实例中,根据本发明的教示,传感器裸片及ASIC裸片在制作期间以堆叠式芯片方案堆叠及耦合在一起以实施3D彩色图像感测系统。As mentioned, it should be noted that the 3D color image sensor 200 illustrated in FIG2 can be implemented using a stacked chip approach. For example, the photosensitive elements of visible light pixels 211 and the array of avalanche diodes of SPAD pixels 212 can be disposed on a sensor die. The pixel support circuitry for visible light pixels 211 and the pixel support circuitry for SPAD pixels 212, as well as readout circuitry 220, control circuitry 230, and function logic 240 can be disposed on separate ASIC dies. In this example, the sensor die and the ASIC die are stacked and coupled together in a stacked chip approach during fabrication to implement a 3D color image sensing system in accordance with the teachings of the present invention.
图3是展示根据本发明的教示安置于实例性彩色TOF像素阵列上方的实例性RGB-IR滤光器阵列的图解说明。在所描绘实例中,根据本发明的教示,RGB-IR滤光器阵列300安置于图2的彩色TOF像素阵列210的一个实例上方。返回参考图3,滤光器310中的每一滤光器310、311、312及313与可见光像素211的对应下伏光敏元件对准,而滤光器315与SPAD像素212的对应下伏雪崩二极管对准。在一个实例中,可见光像素211的光敏元件可与滤光器310的每一滤光器310、311、312、313为实质上相同大小,且SPAD像素212的雪崩二极管可与滤光器315为实质上相同大小。在一个实例中,滤光器310、311、312及313为经布置成重复图案(举例来说例如拜耳(repeating)图案或类似物)的彩色滤光器,其中最小重复彩色滤光器单元314如所展示包含四个彩色滤光器310、311、312及313的分组。在一个实例中,重复彩色滤光器单元314的大小与滤光器315为实质上相同大小。在一个实例中,滤光器310、311、312及313可分别为R、G、G及B彩色滤光器,从而使滤光器阵列300成为RGB-IR滤光器阵列。在一个实例中,滤光器阵列300可为CYM-IR滤光器阵列或CYGM-IR滤光器阵列或类似物。FIG3 is a diagram showing an example RGB-IR filter array disposed above an example color TOF pixel array in accordance with the teachings of the present invention. In the depicted example, RGB-IR filter array 300 is disposed above one example of color TOF pixel array 210 of FIG2 in accordance with the teachings of the present invention. Referring back to FIG3 , each filter 310, 311, 312, and 313 of filters 310 is aligned with a corresponding underlying photosensitive element of visible light pixel 211, while filter 315 is aligned with a corresponding underlying avalanche diode of SPAD pixel 212. In one example, the photosensitive element of visible light pixel 211 can be substantially the same size as each filter 310, 311, 312, 313 of filters 310, and the avalanche diode of SPAD pixel 212 can be substantially the same size as filter 315. In one example, filters 310, 311, 312, and 313 are color filters arranged in a repeating pattern, such as a Bayer pattern or the like, with the smallest repeating color filter unit 314, as shown, comprising a grouping of four color filters 310, 311, 312, and 313. In one example, the size of repeating color filter unit 314 is substantially the same as the size of filter 315. In one example, filters 310, 311, 312, and 313 can be R, G, G, and B color filters, respectively, making filter array 300 an RGB-IR filter array. In one example, filter array 300 can be a CYM-IR filter array, a CYGM-IR filter array, or the like.
图4A是图解说明根据本发明的教示的四晶体管(4T)像素单元堆叠式芯片可见光像素的一个实例的示意图。图4A中所图解说明的像素电路为用于实施图2的彩色飞行时间像素阵列210的每一可见光像素211的可见光像素电路架构的一个可能实例。返回参考图4A,每一可见光像素400包含光敏元件410(例如,光电二极管)及像素支持电路411,如所展示。光敏元件410可安置于堆叠式裸片系统的传感器裸片上,而像素支持电路411可安置于ASIC裸片上。在一个实例中,像素支持电路411包含耦合到光敏元件410的转移晶体管415、复位晶体管420、源极跟随器(SF)晶体管425及行选择晶体管430,如所展示。FIG4A is a schematic diagram illustrating one example of a four-transistor (4T) pixel cell stacked chip visible light pixel in accordance with the teachings of the present invention. The pixel circuit illustrated in FIG4A is one possible example of a visible light pixel circuit architecture for implementing each visible light pixel 211 of the color time-of-flight pixel array 210 of FIG2 . Referring back to FIG4A , each visible light pixel 400 includes a photosensitive element 410 (e.g., a photodiode) and pixel support circuitry 411, as shown. The photosensitive element 410 can be disposed on the sensor die of the stacked die system, while the pixel support circuitry 411 can be disposed on the ASIC die. In one example, the pixel support circuitry 411 includes a transfer transistor 415 coupled to the photosensitive element 410, a reset transistor 420, a source follower (SF) transistor 425, and a row select transistor 430, as shown.
在操作期间,在曝光周期期间光敏元件410响应于入射光而光生电荷。转移晶体管415经耦合以接收转移信号TX,转移信号TX致使转移晶体管415将在光电二极管410中积累的电荷转移到浮动扩散(FD)节点417。复位晶体管420耦合于电力轨VDD与浮动扩散节点417之间以响应于复位信号RST复位可见光像素400(例如,将浮动扩散节点417及光电二极管410放电或充电到预设电压)。During operation, photosensitive element 410 generates charge in response to incident light during an exposure period. Transfer transistor 415 is coupled to receive a transfer signal TX that causes transfer transistor 415 to transfer the charge accumulated in photodiode 410 to a floating diffusion (FD) node 417. Reset transistor 420 is coupled between power rail VDD and floating diffusion node 417 to reset visible light pixel 400 (e.g., discharge or charge floating diffusion node 417 and photodiode 410 to a predetermined voltage) in response to a reset signal RST.
浮动扩散节点417经耦合以控制源极跟随器晶体管425的栅极端子。源极跟随器晶体管425耦合于电力轨VDD与行选择晶体管430之间以响应于浮动扩散FD节点417上的电荷放大信号。行选择晶体管430响应于行选择信号RS将来自源极跟随器晶体管425的像素电路的输出耦合到读出列或位线435。Floating diffusion node 417 is coupled to control the gate terminal of a source follower transistor 425. Source follower transistor 425 is coupled between a power rail VDD and a row select transistor 430 to respond to the charge amplified signal on floating diffusion FD node 417. Row select transistor 430 couples the output of the pixel circuit from source follower transistor 425 to a readout column or bit line 435 in response to a row select signal RS.
光敏元件410及浮动扩散节点417通过暂时地断言复位信号RST及转移信号TX而复位。积累窗(例如,曝光周期)在转移信号TX被撤销断言时开始,此准许入射光在光敏元件410中光生电荷。随着所光生电子在光敏元件410中积累,其电压降低(电子为负电荷载体)。光电二极管410上的电压或电荷表示在曝光周期期间入射于光敏元件410上的光的强度。在曝光周期结束时,复位信号RST被撤销断言,此关断复位晶体管420且将浮动扩散FD节点417与VDD隔离。接着,转移信号TX被断言以将光敏元件410耦合到浮动扩散节点417。电荷通过转移晶体管415从光敏元件410转移到浮动扩散FD节点417,此致使浮动扩散FD节点417的电压下降与在曝光周期期间于光敏元件410上积累的所光生电子成比例的量。Photosensitive element 410 and floating diffusion node 417 are reset by temporarily asserting reset signal RST and transfer signal TX. An accumulation window (e.g., an exposure period) begins when transfer signal TX is deasserted, allowing incident light to photogenerate charge in photosensitive element 410. As the photogenerated electrons accumulate in photosensitive element 410, its voltage decreases (electrons are negative charge carriers). The voltage, or charge, on photodiode 410 represents the intensity of light incident on photosensitive element 410 during the exposure period. At the end of the exposure period, reset signal RST is deasserted, turning off reset transistor 420 and isolating floating diffusion node FD 417 from VDD. Transfer signal TX is then asserted to couple photosensitive element 410 to floating diffusion node 417. Charge is transferred from photosensitive element 410 to floating diffusion node FD 417 via transfer transistor 415, causing the voltage of floating diffusion node FD 417 to drop by an amount proportional to the photogenerated electrons accumulated on photosensitive element 410 during the exposure period.
图4B是图解说明根据本发明的教示包含淬灭元件的堆叠式芯片SPAD像素的一个实例的示意图。图4B中所图解说明的像素电路为用于实施图2的彩色飞行时间像素阵列210的每一SPAD像素212的SPAD像素电路架构的一个可能实例。返回参考图4B,每一SPAD像素450包含如所展示而耦合的雪崩二极管460、淬灭元件470及数字计数器480。雪崩二极管460耦合到淬灭元件470,且雪崩二极管460及淬灭元件470两者均可安置于堆叠式裸片系统的传感器裸片上,而包含于读出电路中的数字计数器480安置于ASIC裸片上。在其它实例中,淬灭元件470可根据本发明的教示包含于传感器裸片或ASIC裸片中。还应了解,淬灭元件470可根据本发明的教示使用无源或有源淬灭元件来实施。FIG4B is a schematic diagram illustrating one example of a stacked-die SPAD pixel including a quenching element in accordance with the teachings of the present invention. The pixel circuit illustrated in FIG4B is one possible example of a SPAD pixel circuit architecture for implementing each SPAD pixel 212 of the color time-of-flight pixel array 210 of FIG2 . Referring back to FIG4B , each SPAD pixel 450 includes an avalanche diode 460, a quenching element 470, and a digital counter 480 coupled as shown. The avalanche diode 460 is coupled to the quenching element 470, and both the avalanche diode 460 and the quenching element 470 can be disposed on the sensor die of the stacked-die system, while the digital counter 480 included in the readout circuit is disposed on the ASIC die. In other examples, the quenching element 470 can be included in the sensor die or the ASIC die in accordance with the teachings of the present invention. It should also be understood that the quenching element 470 can be implemented using either a passive or active quenching element in accordance with the teachings of the present invention.
数字计数器480可使用安置于ASIC裸片上的使用堆叠式裸片系统的标准CMOS过程制作的CMOS电路来实施,且经电耦合以接收由雪崩二极管460响应于所接收光子产生的输出脉冲465。数字计数器480可经启用以计数由雪崩二极管460在时间窗期间产生的输出脉冲465的数目且输出表示所述计数的数字信号485。尽管图4B中所描绘的实例图解说明包含雪崩光电二极管460及数字计数器480的像素电路之间的直接连接,但应了解,根据本发明教示可利用包含雪崩光电二极管460及数字计数器480的像素电路之间的任何连接(包含以AC耦合方式)。在一个实例中,每一数字计数器480包含用于放大所接收输出脉冲465的放大器。替代地或除数字计数器480以外,根据本发明的教示,可在每一像素/列/阵列中放置用于计时入射光子的到达的计时电路以确定所述光子的飞行时间及到物体的往返距离。Digital counter 480 can be implemented using CMOS circuitry fabricated using a standard CMOS process of a stacked die system disposed on an ASIC die and electrically coupled to receive output pulses 465 generated by avalanche diode 460 in response to received photons. Digital counter 480 can be enabled to count the number of output pulses 465 generated by avalanche diode 460 during a time window and output a digital signal 485 representing the count. Although the example depicted in FIG4B illustrates a direct connection between the pixel circuitry including avalanche photodiode 460 and digital counter 480, it should be understood that any connection (including AC coupling) between the pixel circuitry including avalanche photodiode 460 and digital counter 480 can be utilized in accordance with the teachings of the present invention. In one example, each digital counter 480 includes an amplifier for amplifying the received output pulses 465. Alternatively, or in addition to digital counter 480, timing circuitry for timing the arrival of incident photons can be placed in each pixel/column/array to determine the photon's time of flight and the round-trip distance to an object in accordance with the teachings of the present invention.
在操作中,每一雪崩二极管460经由高于每一雪崩二极管460的击穿电压的偏置电压VBIAS而反向偏置。响应于单个光生载流子(其响应于入射光子而产生),触发雪崩倍增过程,所述雪崩倍增过程在每一雪崩二极管460的输出处产生雪崩电流。此雪崩电流响应于跨越淬灭元件470形成的电压降而自淬灭,此导致跨越雪崩二极管460的偏置电压下降。在雪崩电流的淬灭之后,跨越雪崩二极管460的电压恢复到高于偏置电压且接着雪崩二极管460准备好再次被触发。每一雪崩二极管460的所得输出脉冲465由其相应数字计数器480接收,数字计数器480响应于输出脉冲465而使其计数递增。In operation, each avalanche diode 460 is reverse biased by a bias voltage V BIAS that is higher than the breakdown voltage of each avalanche diode 460. In response to a single photogenerated carrier (generated in response to an incident photon), an avalanche multiplication process is triggered, which produces an avalanche current at the output of each avalanche diode 460. This avalanche current self-quenches in response to the voltage drop developed across the quenching element 470, which causes the bias voltage across the avalanche diode 460 to drop. After quenching of the avalanche current, the voltage across the avalanche diode 460 recovers to above the bias voltage and the avalanche diode 460 is then ready to be triggered again. The resulting output pulse 465 of each avalanche diode 460 is received by its corresponding digital counter 480, which increments its count in response to the output pulse 465.
在与使用标准CMOS过程制作的CMOS数字计数器相同的芯片上并入SPAD的常规SPAD像素设计由于CMOS电路本身占据的面积而遭受成像平面上的减小填充因子的影响。因此,根据本发明的教示,实施堆叠式芯片结构的一个优点提供成像平面上的经改进填充因子。Conventional SPAD pixel designs that incorporate a SPAD on the same chip as a CMOS digital counter fabricated using a standard CMOS process suffer from a reduced fill factor at the imaging plane due to the area occupied by the CMOS circuitry itself. Therefore, one advantage of implementing a stacked chip structure in accordance with the teachings of the present invention provides for an improved fill factor at the imaging plane.
应注意,图4B的电路图是出于解释的目的而随本文一起提供且未详细展示一些其它电路元件(例如,例如电阻器及电容器的无源组件及例如晶体管的有源组件)以便不使本发明的教示模糊。举例来说,图4B的所图解说明像素电路可产生输出脉冲465,输出脉冲465在被数字计数器480的输入感测之前需要放大。在另一实例中,淬灭元件470与雪崩二极管460之间的节点处的连接将处于高电压,此可需要AC耦合。It should be noted that the circuit diagram of FIG4B is provided herein for purposes of explanation and some other circuit elements (e.g., passive components such as resistors and capacitors and active components such as transistors) are not shown in detail so as not to obscure the teachings of the present invention. For example, the illustrated pixel circuit of FIG4B may generate an output pulse 465 that requires amplification before being sensed by the input of the digital counter 480. In another example, the connection at the node between the quenching element 470 and the avalanche diode 460 will be at a high voltage, which may require AC coupling.
图5是根据本发明的教示包含具有堆叠式装置裸片的3D彩色像素阵列的集成电路系统500的一个实例的横截面图。集成电路系统500为具有图3的RGB-IR滤光器阵列300的图2的彩色飞行时间像素阵列210的一个可能实施方案。举例来说,图5的集成电路系统500可为沿着图3的虚线A-A'的横截面图。图5中所展示的集成电路系统500的所图解说明实例包含第一装置裸片506、第二装置裸片508及接合界面507,第一装置裸片506在接合界面507处接合到第二装置裸片508。第一装置裸片506包含第一半导体层510及第一互连层512,而第二装置裸片508包含第二半导体层514及第二互连层516。所图解说明实例展示经布置成行及列(举例来说,例如也如图2及3中所图解说明)的多个可见光像素502A、502B、502C及502D以及多个SPAD像素503A及503B。FIG5 is a cross-sectional view of one example of an integrated circuit system 500 including a 3D color pixel array having stacked device dies in accordance with the teachings of the present invention. Integrated circuit system 500 is one possible implementation of the color time-of-flight pixel array 210 of FIG2 with the RGB-IR filter array 300 of FIG3. For example, the integrated circuit system 500 of FIG5 can be a cross-sectional view taken along dashed line AA' of FIG3. The illustrated example of integrated circuit system 500 shown in FIG5 includes a first device die 506, a second device die 508, and a bonding interface 507 at which the first device die 506 is bonded to the second device die 508. The first device die 506 includes a first semiconductor layer 510 and a first interconnect layer 512, while the second device die 508 includes a second semiconductor layer 514 and a second interconnect layer 516. The illustrated example shows a plurality of visible light pixels 502A, 502B, 502C, and 502D and a plurality of SPAD pixels 503A and 503B arranged in rows and columns (for example, such as also illustrated in Figures 2 and 3).
在一个实例中,可见光像素502A、502B、502C及502D可分别各自包含接近第一半导体层510的前侧511安置的光敏区或光电二极管504A、504B、504C及504D。在一个实例中,SPAD像素503A及503B可分别各自包含接近第一半导体层510的前侧511形成的倍增区505A及505B。在所描绘实例中,根据本发明的教示,光电二极管504A、504B、504C及504D以及倍增区505A及505B经配置以通过第一半导体层510的背侧513而被照射。In one example, visible light pixels 502A, 502B, 502C, and 502D can each include a photosensitive region or photodiode 504A, 504B, 504C, and 504D, respectively, disposed proximate to a front side 511 of a first semiconductor layer 510. In one example, SPAD pixels 503A and 503B can each include a multiplication region 505A and 505B, respectively, formed proximate to a front side 511 of a first semiconductor layer 510. In the depicted example, photodiodes 504A, 504B, 504C, and 504D and multiplication regions 505A and 505B are configured to be illuminated through a back side 513 of the first semiconductor layer 510 in accordance with the teachings of the present invention.
在一个实例中,第二装置裸片508为CMOS逻辑裸片,所述CMOS逻辑裸片使用标准CMOS过程而制作且包含第二半导体层514,第二半导体层514包含可见光读出电路517A、517B、517C及517D以及IR光读出电路519A及519B。在一个实例中,IR光读出电路519A及519B包含类似于举例来说图4的数字计数器480的数字计数器。在一个实例中,混合接合通孔528包含于接合界面507处,如所展示。举例来说,在一个实例中,可包含混合接合通孔528以将包含于第一装置裸片506中的SPAD像素503A及503B的电压转移到包含于第二装置裸片508中的IR光读出电路519A及519B。可见光读出电路517A、517B、517C及517D中的每一者可包含取样与保持电路及模/数转换(ADC)电路。如所描绘实例中所展示,可见光读出电路517A、517B、517C及517D以及IR光读出电路519A及519B接近第二半导体层514的前侧520形成。在所图解说明实例中,可见光读出电路517A、517B、517C及517D安置于其相应可见光像素(例如,分别为502A、502B、502C及502D)内的半导体层514的区中。类似地,IR光读出电路519A及519B安置于其相应SPAD像素(例如,分别为503A及503B)内的半导体层514的区中。在其它实例中,彩色飞行时间像素阵列内的邻近可见光像素的可见光读出电路可经分组以形成公共裸片面积。此公共裸片面积可由相邻SPAD像素的IR光读出电路中的数字计数器使用。In one example, the second device die 508 is a CMOS logic die fabricated using a standard CMOS process and includes a second semiconductor layer 514 that includes visible light readout circuitry 517A, 517B, 517C, and 517D, and IR light readout circuitry 519A and 519B. In one example, the IR light readout circuitry 519A and 519B includes a digital counter similar to, for example, digital counter 480 of FIG. 4 . In one example, a hybrid bonding via 528 is included at the bonding interface 507, as shown. For example, in one example, the hybrid bonding via 528 can be included to transfer the voltage of the SPAD pixels 503A and 503B included in the first device die 506 to the IR light readout circuitry 519A and 519B included in the second device die 508. Each of visible light readout circuits 517A, 517B, 517C, and 517D can include sample-and-hold circuitry and analog-to-digital conversion (ADC) circuitry. As shown in the depicted example, visible light readout circuits 517A, 517B, 517C, and 517D, as well as IR light readout circuits 519A and 519B, are formed proximate to the front side 520 of the second semiconductor layer 514. In the illustrated example, visible light readout circuits 517A, 517B, 517C, and 517D are disposed in regions of semiconductor layer 514 within their respective visible light pixels (e.g., 502A, 502B, 502C, and 502D, respectively). Similarly, IR light readout circuits 519A and 519B are disposed in regions of semiconductor layer 514 within their respective SPAD pixels (e.g., 503A and 503B, respectively). In other examples, the visible light readout circuits of adjacent visible light pixels within a color time-of-flight pixel array can be grouped to form a common die area. This common die area can be used by digital counters in the IR light readout circuits of adjacent SPAD pixels.
包含发明摘要中所描述内容的对本发明的所图解说明实施例的以上说明并不打算为穷尽性或将本发明限制于所揭示的精确形式。虽然出于说明性目的而在本文中描述本发明的特定实施例及实例,但相关领域的技术人员将认识到,可在本发明的范围内做出各种修改。The above description of the illustrated embodiments of the present invention, including what is described in the Abstract, is not intended to be exhaustive or to limit the invention to the precise forms disclosed. While specific embodiments and examples of the invention are described herein for illustrative purposes, those skilled in the relevant art will recognize that various modifications can be made within the scope of the invention.
可根据以上详细说明对本发明做出这些修改。所附权利要求书中所使用的术语不应理解为将本发明限制于说明书中所揭示的特定实施例。而是,本发明的范围将完全由所附权利要求书来确定,所述权利要求书将根据权利要求解释的所创建原则加以理解。These modifications can be made to the invention in light of the above detailed description. The terms used in the appended claims should not be construed to limit the invention to the specific embodiments disclosed in the specification. Rather, the scope of the invention is to be determined entirely by the appended claims, which are to be construed in accordance with established doctrines of claim interpretation.
Claims (14)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/624,198 | 2015-02-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| HK1224820A1 HK1224820A1 (en) | 2017-08-25 |
| HK1224820B true HK1224820B (en) | 2020-06-05 |
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