HK1222961B - Method of manufacturing the achromatic doublet prism array - Google Patents
Method of manufacturing the achromatic doublet prism array Download PDFInfo
- Publication number
- HK1222961B HK1222961B HK16111042.7A HK16111042A HK1222961B HK 1222961 B HK1222961 B HK 1222961B HK 16111042 A HK16111042 A HK 16111042A HK 1222961 B HK1222961 B HK 1222961B
- Authority
- HK
- Hong Kong
- Prior art keywords
- prism
- array
- prism array
- achromatic
- mold
- Prior art date
Links
Description
技术领域Technical Field
本公开涉及使用消色差双棱镜阵列的广角摄影机及其制造方法。The present disclosure relates to a wide-angle camera using an achromatic dual-prism array and a method for manufacturing the same.
背景技术Background Art
有许多种捕获广角影像的方式;其中一种方式为基于N x N个透镜阵列系统,与采用单一透镜的更传统相机模块相比,其提供小型化且尺寸小的相机模块。其透镜阵列技术使用棱镜及其他光学组件以形成可视角度增加的光学系统。然而,棱镜的使用导致了色差,显着减低光学系统的调变转换函数(MTF)且因而降低生成的影像质量。There are many ways to capture wide-angle images; one approach is based on an N x N lens array system, which provides a compact and smaller camera module compared to more traditional camera modules that employ a single lens. This lens array technology uses prisms and other optical components to form an optical system that increases the viewing angle. However, the use of prisms introduces chromatic aberration, significantly reducing the modulation transfer function (MTF) of the optical system and, consequently, degrading the resulting image quality.
发明内容Summary of the Invention
光学系统及其制造方法揭露了一种基于棱镜且减少色差的光学系统。基于晶圆级的制造方式,一种新颖的消色差双棱镜阵列具有可改善光学分辨率的二个非对称棱镜,而不会过分复杂化其晶圆级制作程序。如本文中所使用,术语“二个非对称棱镜”表示该第一棱镜的形状相对于该第二棱镜是不对称的。也就是说,这两个棱镜反向地相互结合。在下文中将更详细讨论不对称的概念。An optical system and method for manufacturing the same disclose a prism-based optical system that reduces chromatic aberration. Based on wafer-level manufacturing, a novel achromatic dual-prism array features two asymmetric prisms that improve optical resolution without unduly complicating the wafer-level fabrication process. As used herein, the term "two asymmetric prisms" means that the shape of the first prism is asymmetric relative to the second prism. That is, the two prisms are inversely coupled to each other. The concept of asymmetry is discussed in more detail below.
在一实施例中,一种广角摄影机具有一传感器,该传感器具有设置在一基板的一第一侧上的复数个像素次阵列及一光学组件阵列,其中该等光学组件中的每一者能够从一视场在一不同的像素次阵列上形成影像。该广角摄影机在该基板的一第二侧上亦包含一消色差双棱镜阵列,其中该等消色差双棱镜中的每一者经排列对齐以使用一不同的光学组件提供一视角,使得传感器于具有小型化规格的同时可捕获一广角视场。In one embodiment, a wide-angle camera has a sensor having a plurality of pixel sub-arrays and an array of optical elements disposed on a first side of a substrate, wherein each of the optical elements is capable of forming an image from a field of view onto a different pixel sub-array. The wide-angle camera also includes an array of achromatic bi-prisms on a second side of the substrate, wherein each of the achromatic bi-prisms is aligned to provide a viewing angle using a different optical element, enabling the sensor to capture a wide-angle field of view while maintaining a compact form factor.
在另一实施例中,在所述具有一光学组件阵列及一可相配合以捕获广视场的对应单棱镜阵列、其中该光学组件阵列形成于一基板的一第一侧上而该单棱镜阵列形成于该基板的一第二侧上、且该等单棱镜中的每一者与一不同的光学组件对齐而导致色差的类型的小型化规格广角摄影机中,其改良包含实施该单棱镜阵列做为在该基板的第二侧上使用晶圆级制造方式所形成的一消色差双棱镜阵列,使得每一消色差双棱镜与一不同的光学组件对齐,且该消色差双棱镜阵列及该光学组件阵列相配合而以减少色差方式捕获该广视场。In another embodiment, in a miniaturized wide-angle camera of the type having an optical component array and a corresponding single prism array that can cooperate to capture a wide field of view, wherein the optical component array is formed on a first side of a substrate and the single prism array is formed on a second side of the substrate, and each of the single prisms is aligned with a different optical component to cause chromatic aberration, the improvement includes implementing the single prism array as an achromatic dual prism array formed using a wafer-level manufacturing method on the second side of the substrate, so that each achromatic dual prism is aligned with a different optical component, and the achromatic dual prism array and the optical component array cooperate to capture the wide field of view in a manner that reduces chromatic aberration.
在另一实施例中,一种制造具有N x N个部分的消色差双棱镜阵列的方法包含:在一基板上形成一第一棱镜阵列,各第一棱镜设于该等N x M部分中的一者内,且由一第一材料所组成;以及,在该第一棱镜阵列上形成一第二棱镜阵列,各第二棱镜设于该等N x M部分中的一者内,且由一与该第一材料不同的第二材料所组成。In another embodiment, a method of fabricating an achromatic dual-prism array having N x N segments includes forming a first prism array on a substrate, each first prism being disposed within one of the N x M segments and composed of a first material; and forming a second prism array on the first prism array, each second prism being disposed within one of the N x M segments and composed of a second material different from the first material.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1显示在一实施例中使用一消色差双棱镜阵列的一例示性广角摄影机。FIG. 1 shows an exemplary wide-angle camera using an achromatic dual-prism array in one embodiment.
图2显示图1摄影机的前视图,说明在一实施例中该消色差双棱镜阵列具有九个呈三乘三阵列的组件。FIG. 2 shows a front view of the camera of FIG. 1 , illustrating an embodiment in which the achromatic bi-prism array has nine elements arranged in a three-by-three array.
图3为通过图1及图2的摄影机的A–A剖线的侧面剖视图,说明在一实施例中的三个例示性子摄影机。3 is a side cross-sectional view through line AA of the camera of FIG. 1 and FIG. 2 , illustrating three exemplary sub-cameras in one embodiment.
图4显示在一实施例中图3的子摄影机的进一步例示性细节。FIG. 4 shows further illustrative details of the sub-camera of FIG. 3 in one embodiment.
图5显示在一实施例中图3及4的例示性子摄影机光学性能的 MTF全视场曲线图。FIG5 shows an MTF full field of view graph of the optical performance of the exemplary sub-cameras of FIG3 and FIG4 in one embodiment.
图6显示在一实施例中通过模拟于描述图5时所配置的图3及图 4子摄影机而生成的点状图。FIG. 6 shows a point diagram generated by simulating the sub-cameras of FIG. 3 and FIG. 4 configured as described in FIG. 5 in one embodiment.
图7显示一晶圆级透镜现有技术,其具有三个基板及五个表面供在一传感器阵列上形成影像。FIG. 7 shows a prior art wafer-level lens having three substrates and five surfaces for forming an image on a sensor array.
图8为说明图7的晶圆级透镜现有技术的光学性能的MTF全视场曲线图。FIG. 8 is a graph illustrating the full-field MTF curve of the conventional wafer-level lens of FIG. 7 .
图9为说明图7的晶圆级透镜光学性能的点状图。FIG. 9 is a point graph illustrating the optical performance of the wafer-level lens of FIG. 7 .
图10显示另一与图7的晶圆级透镜相似但含有一个单棱镜的晶圆级透镜现有技术。FIG. 10 shows another prior art wafer-level lens similar to the wafer-level lens of FIG. 7 but including a single prism.
图11为说明图10的晶圆级透镜现有技术光学性能的MTF全视场曲线图。FIG. 11 is a graph illustrating the MTF full field of view curve of the conventional optical performance of the wafer-level lens of FIG. 10 .
图12为说明图10的晶圆级透镜光学性能的点状图。FIG. 12 is a point graph illustrating the optical performance of the wafer-level lens of FIG. 10 .
图13为说明一用于制造具有消色差双棱镜阵列的广角摄影机的例示性方法的流程图。13 is a flow chart illustrating an exemplary method for fabricating a wide-angle camera with an achromatic dual-prism array.
图14描绘在一实施例中的例示性摄影机组件的外观示意图,其包含一叠置于透镜阵列组件、成像传感器阵列及成像基板上的消色差双棱镜阵列。FIG. 14 is a schematic diagram illustrating the appearance of an exemplary camera assembly in one embodiment, which includes an achromatic dual prism array stacked on a lens array assembly, an imaging sensor array, and an imaging substrate.
图15A-C为说明图13的方法步骤的剖面示意图。15A-C are schematic cross-sectional views illustrating steps of the method of FIG. 13 .
图16为说明一具有通过图13的方法所形成的2x 2消色差双棱镜阵列的例示性摄影机的剖面示意图。FIG. 16 is a schematic cross-sectional view illustrating an exemplary camera having a 2×2 achromatic bi-prism array formed by the method of FIG. 13 .
附图标记说明:Description of reference numerals:
100:摄影机;102:消色差双棱镜阵列;104:透镜阵列;106:传感器阵列;108:装置;110:广角度;111:视场;202(1)-(9):消色差双棱镜;302(2)、302(5)、302(8):光学组件;304(2)、 304(5)、304(8):像素次阵列;306、306(2)、306(5)、306(8):子摄影机;402:第一棱镜;403:结合表面;404:第二棱镜;406:第一基板;408:第一透镜;410:第二基板;412:第二透镜;414:第三透镜;416:第三基板;418:第四透镜;420:第五透镜;500: MTF全视场曲线图;600:点状图;700:晶圆级透镜;702(1)-(3):基板;704(1)-(5):表面;706:传感器阵列;1000:晶圆级透镜; 1002:单棱镜;1300:方法;1301、1302、1304、1306、1308、1310、 1312、1314、1316、1317、1318、1320:步骤;1400:摄影机组件; 1402:消色差双棱镜阵列;1408:成像基板;1500:第一模具;1502 (1)-(4)、1510:区域;1506:基板;1508:第二模具;1514:透镜阵列组件;1516:影像传感器;1600:摄影机;1602:消色差双棱镜阵列;1604:第一棱镜;1606:第二棱镜;1614:透镜阵列;1616:传感器阵列。100: Camera; 102: Achromatic biprism array; 104: Lens array; 106: Sensor array; 108: Device; 110: Wide angle; 111: Field of view; 202(1)-(9): Achromatic biprism; 302(2), 302(5), 302(8): Optical components; 304(2), 304(5), 304(8): Pixel sub-array; 306, 306(2), 306(5), 306(8): Sub-camera; 402: First prism; 403: Bonding surface; 404: Second prism; 406: First substrate; 408: First lens; 410: Second substrate; 412: Second lens; 414: Third lens; 416: Third substrate; 418: Fourth lens; 420: Fifth lens; 500: MTF full field of view curve; 600: point plot; 700: wafer-level lens; 702(1)-(3): substrate; 704(1)-(5): surface; 706: sensor array; 1000: wafer-level lens; 1002: single prism; 1300: method; 1301, 1302, 1304, 1306, 1308, 1310, 1312, 1314, 1316, 1317, 1318, 1320: steps; 1400: camera assembly; 1402: achromatic dual prism array; 1408: imaging substrate; 1500: first mold; 1502 (1)-(4), 1510: area; 1506: substrate; 1508: second mold; 1514: lens array assembly; 1516: image sensor; 1600: camera; 1602: achromatic bi-prism array; 1604: first prism; 1606: second prism; 1614: lens array; 1616: sensor array.
具体实施方式DETAILED DESCRIPTION
图1显示使用一消色差双棱镜阵列102的一例示性广角摄影机 100的侧面剖视图。图2显示该摄影机100的前视图,说明该消色差双棱镜阵列102具有九个呈三乘三阵列的消色差双棱镜202(1)-(9)。摄影机100显示在一选自包含有智能手机、个人摄影机、穿戴式摄影机等的群组的装置108内。摄影机100适用于任何需要具广角视场的小型影像捕获设备的应用之中。摄影机100亦包含一透镜阵列104及一传感器阵列106。透镜阵列104及消色差双棱镜阵列102促使摄影机100捕获一广角度110视场111。FIG1 shows a side cross-sectional view of an exemplary wide-angle camera 100 using an achromatic biprism array 102. FIG2 shows a front view of the camera 100 illustrating the achromatic biprism array 102 having nine achromatic biprisms 202 (1)-(9) arranged in a three-by-three array. The camera 100 is shown in a device 108 selected from the group consisting of a smartphone, a personal camera, a wearable camera, etc. The camera 100 is suitable for use in any application requiring a compact image capture device with a wide-angle field of view. The camera 100 also includes a lens array 104 and a sensor array 106. The lens array 104 and the achromatic biprism array 102 enable the camera 100 to capture a wide-angle 110 field of view 111.
图3为通过摄影机100的A–A剖线的侧面剖视图,分别说明三个例示性消色差双棱镜((202(2)、202(5)及202(8))、对应的光学组件(302(2)、302(5)及302(8))以及对应的像素次阵列(304 (2)、304(5)及304(8))。每一消色差双棱镜202、对应的光学组件302及对应的像素次阵列304形成一子摄影机306,其中摄影机100 具有九个这类子摄影机。在图3的实例中,子摄影机306包含消色差双棱镜202(2)、对应的光学组件302(2)及对应的像素次阵列304 (2)。FIG3 is a side cross-sectional view through line AA of camera 100 illustrating three exemplary achromatic biprisms (202(2), 202(5), and 202(8)), corresponding optical components (302(2), 302(5), and 302(8)), and corresponding pixel sub-arrays (304(2), 304(5), and 304(8)). Each achromatic biprism 202, corresponding optical component 302, and corresponding pixel sub-array 304 form a sub-camera 306, where camera 100 has nine such sub-cameras. In the example of FIG3, sub-camera 306 includes achromatic biprism 202(2), corresponding optical component 302(2), and corresponding pixel sub-array 304(2).
图4显示图3的子摄影机的进一步例示性细节。光学组件302(2) 为一个有五个表面的晶圆级透镜结构,其具备一带有一第一透镜408 的第一基板406、一带有一第二透镜412及一第三透镜414的第二基板410,以及一带有一第四透镜418及一第五透镜420的第三基板416。该等基板406、410及416(例如)为玻璃。尽管在此实施例中显示了该等透镜408、412、414、418及420,可在不偏离本发明范围的情况下使用其他种带有更多或更少透镜、或带有不同类型透镜的光学组件。FIG4 shows further exemplary details of the sub-camera of FIG3. Optical assembly 302(2) is a five-surface wafer-level lens structure having a first substrate 406 with a first lens 408, a second substrate 410 with a second lens 412 and a third lens 414, and a third substrate 416 with a fourth lens 418 and a fifth lens 420. Substrates 406, 410, and 416 are, for example, glass. Although lenses 408, 412, 414, 418, and 420 are shown in this embodiment, other optical assemblies with more or fewer lenses, or with different types of lenses, may be used without departing from the scope of the present invention.
每一消色差双棱镜202形成有二个非对称棱镜。消色差双棱镜202 (2)具有一第一棱镜402及一第二棱镜404,第一棱镜402具有低阿贝数(V1)和高折射率(n1),而第二棱镜404具有高阿贝数(V2) 和低折射率(n2)。例如,在图4中,第一棱镜402具有13.6度的一角度、1.6的折射率(n1)及30的阿贝数(V1),而第一棱镜具有-17.2 度的一角度、1.5的折射率(n2)及57的阿贝数(V2)。应明确,这些数值可在不背离本申请范围的情况下改变。消色差双棱镜202(2) 用于改变光学组件302(2)及子摄影机306的视角。每一消色差双棱镜202的配置选择为改变相对应的子摄影机306的视角,以使得摄影机100捕获广角度110视场111。如将在下文中进行进一步详细讨论的那样,消色差双棱镜202(2)直接形成在第一基板406的一表面(相对透镜408)上,由此减少制造时间和费用。进一步地,消色差双棱镜202的使用显著地改善了摄影机100的光学分辨率,以便摄影机100 在质量上能够与未形成有棱镜的摄影机相比较。Each achromatic biprism 202 is formed with two asymmetric prisms. The achromatic biprism 202 (2) has a first prism 402 and a second prism 404, the first prism 402 having a low Abbe number (V1) and a high refractive index (n1), and the second prism 404 having a high Abbe number (V2) and a low refractive index (n2). For example, in FIG4 , the first prism 402 has an angle of 13.6 degrees, a refractive index (n1) of 1.6, and an Abbe number (V1) of 30, while the first prism has an angle of -17.2 degrees, a refractive index (n2) of 1.5, and an Abbe number (V2) of 57. It should be understood that these values can be changed without departing from the scope of the present application. The achromatic biprism 202 (2) is used to change the viewing angle of the optical component 302 (2) and the sub-camera 306. The configuration of each achromatic biprism 202 is selected to change the viewing angle of the corresponding sub-camera 306 so that the camera 100 captures a wide angle 110 field of view 111. As will be discussed in further detail below, the achromatic biprism 202(2) is formed directly on a surface of the first substrate 406 (opposite the lens 408), thereby reducing manufacturing time and cost. Furthermore, the use of the achromatic biprism 202 significantly improves the optical resolution of the camera 100, so that the camera 100 is comparable in quality to cameras without prisms.
为实现具有广角性能的小型摄影机,本发明使用了一具有二个非对称棱镜的消色差双棱镜,且该等非对称棱镜由两种具有不同阿贝数的不同光学材料所制成。该第一棱镜的阿贝数比该第二棱镜的阿贝数低。这些棱镜使用晶圆级制造方法(例如使用下文所进一步详细讨论的方法1300)而结合形成在一第一基板上。每一消色差双棱镜的几何形状是基于其在该阵列内的位置。To achieve a compact camera with wide-angle performance, the present invention utilizes an achromatic biprism having two asymmetric prisms made from two different optical materials with different Abbe numbers. The first prism has a lower Abbe number than the second prism. The prisms are bonded together on a first substrate using wafer-level fabrication methods (e.g., method 1300 discussed in further detail below). The geometry of each achromatic biprism is based on its position within the array.
假定第一棱镜的阿贝数为V1,而第二棱镜的阿贝数为V2,第一棱镜的折射率为n1,而第二棱镜的折射率为n2。若下列二个限制条件被满足,可在每一子摄影机306(即,消色差双棱镜202(2)与光学组件302(2))中实现高光学性能。Assuming that the Abbe number of the first prism is V1 and the Abbe number of the second prism is V2, the refractive index of the first prism is n1, and the refractive index of the second prism is n2, high optical performance can be achieved in each sub-camera 306 (i.e., the achromatic biprism 202(2) and the optical element 302(2)) if the following two constraints are met.
限制条件1:V2>V1,V2>50且V1<35(d线,波长为587 nm)。Constraint 1: V2>V1, V2>50 and V1<35 (d-line, wavelength is 587 nm).
限制条件2:n2<n1,n2<1.52且n1>1.58(d线,波长为587 nm)。Constraint 2: n2<n1, n2<1.52 and n1>1.58 (d-line, wavelength is 587 nm).
第一棱镜402与第二棱镜404之间的结合表面403角度是取决于第一棱镜402与第二棱镜404的不同材料折射率的匹配性。例如,第一棱镜402与第二棱镜404各别的角度可不同于图4中的13.6及-17.2 度,但第一棱镜402的角度与第二棱镜404的角度相比优选为负的。The angle of the bonding surface 403 between the first prism 402 and the second prism 404 is determined by the refractive index matching of the different materials of the first prism 402 and the second prism 404. For example, the angles of the first prism 402 and the second prism 404 may differ from 13.6 and -17.2 degrees, respectively, as shown in FIG4 , but the angle of the first prism 402 is preferably negative compared to the angle of the second prism 404.
图5显示一MTF全视场曲线图500,其说明图3及图4中的例示性子摄影机306(即,消色差双棱镜202(2)与光学组件302(2)) 的光学性能。第一棱镜402的阿贝数(V1)为30,且第一棱镜402的材料的折射率(n1)为1.6(d线,于587nm下)。第二棱镜404的阿贝数(V2)为57,且由折射率(n2)为1.51(d线,于587nm下) 的材料所制成。图6显示一通过模拟于描述图5时所配置的图3及图 4子摄影机306(即,消色差双棱镜202(2)与光学组件302(2))而生成的点状图600。FIG5 shows an MTF full field curve graph 500 illustrating the optical performance of the exemplary sub-camera 306 (i.e., the achromatic bi-prism 202(2) and the optical component 302(2)) of FIG3 and FIG4. The Abbe number (V1) of the first prism 402 is 30, and the refractive index (n1) of the material of the first prism 402 is 1.6 (d-line, at 587 nm). The Abbe number (V2) of the second prism 404 is 57 and is made of a material with a refractive index (n2) of 1.51 (d-line, at 587 nm). FIG6 shows a point graph 600 generated by simulating the sub-camera 306 (i.e., the achromatic bi-prism 202(2) and the optical component 302(2)) of FIG3 and FIG4 configured as described in FIG5.
为进行比较,已测试若干例示性光学配置现有技术并与图3及图 4中的消色差双棱镜202(2)与光学组件302(2)的MTF全视场曲线图500与点状图600进行比较。For comparison, several exemplary prior art optical configurations were tested and compared to the MTF full field curve graphs 500 and point graphs 600 of the achromatic biprism 202(2) and optical assembly 302(2) in Figures 3 and 4.
图7显示一晶圆级透镜700现有技术,其具有三个基板702(1) -(3)及五个表面704(1)-(5)供在一传感器阵列706上形成影像。晶圆级透镜700与图3的光学组件302(2)相似。值得注意的是,晶圆级透镜700并不包含任何棱镜且因而不具有广视场性能。FIG7 shows a prior art wafer-level lens 700 having three substrates 702(1)-(3) and five surfaces 704(1)-(5) for forming an image on a sensor array 706. Wafer-level lens 700 is similar to optical element 302(2) of FIG3. It is worth noting that wafer-level lens 700 does not include any prisms and therefore does not have wide field of view capabilities.
图8为说明图7的晶圆级透镜700现有技术的光学性能的MTF 全视场曲线图800。图9为说明图7的晶圆级透镜700的光学性能的点状图900。MTF曲线图800及点状图900说明了晶圆级透镜700的典型性能。Figure 8 is a graph 800 of MTF over full field of view illustrating prior art optical performance of wafer-level lens 700 of Figure 7. Figure 9 is a plot 900 illustrating optical performance of wafer-level lens 700 of Figure 7. MTF graph 800 and plot 900 illustrate typical performance of wafer-level lens 700.
图10显示另一与图7的晶圆级透镜700相似的晶圆级透镜1000 现有技术,但其具有一额外的单棱镜1002,该单棱镜1002与基板702 (1)上相对于表面704(1)的一表面配置一起。单棱镜1002的阿贝数(VD)为62.6,且其是由一折射率(n)为1.5168(d线,在587nm 下)的材料所制成。值得注意的是,单棱镜1002对晶圆级透镜1000 提供了广角性能。FIG10 shows another prior art wafer-level lens 1000 similar to the wafer-level lens 700 of FIG7 , but having an additional single prism 1002 disposed on a surface of the substrate 702(1) opposite to the surface 704(1). The single prism 1002 has an Abbe number (V D ) of 62.6 and is made of a material having a refractive index (n) of 1.5168 (d-line at 587 nm). Notably, the single prism 1002 provides wide-angle performance to the wafer-level lens 1000.
图11为说明图10的晶圆级透镜1000现有技术的光学性能的MTF 全视场曲线图1100。图12为说明图10的晶圆级透镜1000的光学性能的点状图1200。MTF全视场曲线图800及点状图900说明了晶圆级透镜700的典型性能。如曲线图1100及点状图1200中所示,单棱镜 1002的加入导致了严重的色差,显着降低晶圆级透镜1000的光学分辨率性能,如图11及12与图8及9相比时所示。因此,使用如晶圆级透镜1000中所示的单棱镜会造成质量差的影像。FIG11 is a graph 1100 of MTF over field of view illustrating the prior art optical performance of the wafer-level lens 1000 of FIG10 . FIG12 is a plot 1200 illustrating the optical performance of the wafer-level lens 1000 of FIG10 . The MTF over field of view graph 800 and the plot 900 illustrate the typical performance of the wafer-level lens 700. As shown in graph 1100 and the plot 1200, the addition of the single prism 1002 results in severe chromatic aberration, significantly degrading the optical resolution performance of the wafer-level lens 1000, as shown when FIG11 and FIG12 are compared with FIG8 and FIG9 . Therefore, using a single prism as shown in the wafer-level lens 1000 results in poor image quality.
然而,当图5的MTF全视场曲线图500及图6的点状图600与现有技术的MTF全视场曲线图800(图8)及点状图900(图9)比较时,其显示出在图3的子摄影机306中使用消色差双棱镜202将在光学性能上导致超越图10的晶圆级透镜1000现有技术的显着改善情形。However, when the MTF full field curve graph 500 of FIG. 5 and the spot diagram 600 of FIG. 6 are compared with the MTF full field curve graph 800 ( FIG. 8 ) and the spot diagram 900 ( FIG. 9 ) of the prior art, it is shown that the use of the achromatic biprism 202 in the sub-camera 306 of FIG. 3 results in a significant improvement in optical performance over the prior art wafer-level lens 1000 of FIG. 10 .
图13为说明一用于制造具有消色差双棱镜阵列的广角摄影机的例示性方法1300的流程图。图14描绘在一实施例中图1的摄影机100 的外观示意图,包含叠置于透镜阵列104及成像传感器阵列106上的消色差双棱镜阵列102,且用作说明性地显示其形成于一成像基板 1408上。图15A-C为说明图13的方法1300步骤的剖面示意图,用以在一晶圆上形成复数个摄影机100。特别地,图15A显示模具1500、 1508的例示性使用,用以在一基板1506上形成第一及第二棱镜,而图15B显示与一透镜阵列组件1514及一影像传感器1516结合在一起的基板1506被切割成块以形成每一个单独的摄影机组件1400。图13 至图15B最好与以下描述一起观看。FIG13 is a flow chart illustrating an exemplary method 1300 for fabricating a wide-angle camera having an achromatic dual-prism array. FIG14 depicts a schematic diagram of the camera 100 of FIG1 , including the achromatic dual-prism array 102 superimposed on the lens array 104 and the imaging sensor array 106, and illustratively shown formed on an imaging substrate 1408, in one embodiment. FIG15A-C are cross-sectional diagrams illustrating the steps of the method 1300 of FIG13 for forming a plurality of cameras 100 on a wafer. In particular, FIG15A illustrates an exemplary use of molds 1500 and 1508 for forming first and second prisms on a substrate 1506, while FIG15B shows the substrate 1506, combined with a lens array assembly 1514 and an imaging sensor 1516, being diced to form individual camera assemblies 1400. FIG13-15B are best viewed in conjunction with the following description.
为讨论图13-15B目的,已参照上文绘制呈三乘三阵列的摄影机组件1400。然而,应理解到方法1300可应用于任何的N x M个相机组件阵列,其中N及M为正整数。13-15B, the camera assembly 1400 has been drawn in a three-by-three array with reference to the above. However, it should be understood that the method 1300 is applicable to any array of N x M camera assemblies, where N and M are positive integers.
在步骤1302中,方法1300产生一对应第一棱镜阵列的第一模具。在步骤1302的一实例中,第一模具1500系经产生以用于形成第一棱镜阵列402。第一模具1500配置有复数个对应于若干第一棱镜402预期构造的区域1502。在图15A中,其显示了第一模具1500可形成二个消色差双棱镜阵列1402,且每一消色差双棱镜阵列对应于图14的剖线B-B。此外,于每一区域1502与该消色差双棱镜的一给定部分相关联时,每一区域1502可基于该部分中的第一棱镜预期构造而有不同的构造。在图15所说明的实例中,第一模具1500的剖面与图1及14的消色差双棱镜阵列102的消色差双棱镜202(2)、202(5)及202 (8)的第一棱镜402相关联,其中区域1502系经成形且改变其大小以形成其中的每一个第一棱镜402。In step 1302, method 1300 generates a first mold corresponding to a first prism array. In one example of step 1302, a first mold 1500 is generated for forming the first prism array 402. The first mold 1500 is configured with a plurality of regions 1502 corresponding to the desired configurations of a plurality of first prisms 402. FIG15A shows that the first mold 1500 can form two achromatic dual prism arrays 1402, each corresponding to section line B-B in FIG14. Furthermore, while each region 1502 is associated with a given portion of the achromatic dual prism, each region 1502 can have a different configuration based on the desired configuration of the first prisms in that portion. In the example illustrated in FIG. 15 , a cross-section of a first mold 1500 is associated with first prisms 402 of achromatic biprisms 202 ( 2 ), 202 ( 5 ), and 202 ( 8 ) of the achromatic biprism array 102 of FIGs. 1 and 14 , wherein region 1502 is shaped and resized to form each of the first prisms 402 therein.
在步骤1304中,方法1300使用该第一模具于一第一基板上形成一由第一材料所制成的第一棱镜阵列。在步骤1304的一实例中,第一材料设置于若干区域1502(1)-(4)内,以分别在基板406上形成第一棱镜404(1)-(4)。第一材料可为紫外光(UV)固化材料。基板 406可以是玻璃、塑料、硅胶或其他光学透明性材料。In step 1304, method 1300 forms a first prism array made of a first material on a first substrate using the first mold. In one embodiment of step 1304, the first material is disposed in a plurality of regions 1502(1)-(4) to form first prisms 404(1)-(4) on substrate 406, respectively. The first material can be an ultraviolet (UV) curable material. Substrate 406 can be glass, plastic, silicone, or other optically transparent material.
在可选择的步骤1306中,第一材料经固化以完成第一棱镜1504 的成形。In optional step 1306 , the first material is cured to complete the formation of the first prism 1504 .
在步骤1308中,方法1300移除该第一模具。在步骤1308的一实例中,第一模具1500被移除以在基板406上留下第一棱镜402。At step 1308 , method 1300 removes the first mold. In one example of step 1308 , first mold 1500 is removed to leave first prisms 402 on substrate 406 .
在可选择的步骤1310中,方法1300产生一对应第二棱镜阵列的第二模具。在步骤1310的一实例中,第二模具1508系经产生以用于形成第二棱镜404阵列。第二模具1508包含至少一个对应于若干第二棱镜404预期构造的区域1510。第二模具1508与第一模具1500对应并(例如)在一晶圆上形成复数个摄影机100。每一部分的区域1510 与该消色差双棱镜阵列102的一给定部分相关联,其中每一部分的区域1510可基于消色差双棱镜阵列102的对应第二棱镜404形状及大小而有不同的形状及大小。在图15A所说明的实例中,第二模具1510的剖面与图1、2及3的摄影机100的子摄影机306(2)、306(5)及 306(8)相关联,包含用于形成其中的第二棱镜404的一个区域1510。 (例如)若剖线B-B穿过其部分202(1)-202(3),第二模具1510 的表面将有所不同以匹配于此等子摄影机306的第二棱镜404的预期构造。At optional step 1310, method 1300 generates a second mold corresponding to the second prism array. In one example of step 1310, a second mold 1508 is generated for forming the second prism array 404. Second mold 1508 includes at least one region 1510 corresponding to the desired configuration of a plurality of second prisms 404. Second mold 1508 corresponds to first mold 1500 and forms a plurality of cameras 100, for example, on a wafer. Each portion of region 1510 is associated with a given portion of the achromatic dual-prism array 102, wherein each portion of region 1510 may have a different shape and size based on the shape and size of the corresponding second prisms 404 of the achromatic dual-prism array 102. In the example illustrated in FIG15A, a cross-section of a second mold 1510 associated with sub-cameras 306(2), 306(5), and 306(8) of camera 100 of FIG1, 2, and 3 includes an area 1510 for forming second prisms 404 therein. For example, if section line B-B were to pass through portions 202(1)-202(3), the surface of the second mold 1510 would be different to match the intended configuration of the second prisms 404 of these sub-cameras 306.
在步骤1312中,方法1300使用该第二模具在该等第一棱镜上形成一由不同于第一材料的第二材料所组成的第二棱镜阵列。在步骤 1312的一实例中,第二材料是设置在区域1510内以分别在第一棱镜上形成第二棱镜404(1)-(6)。在图15A所显示运用于三乘三阵列的实例中,对应子摄影机306(5)的阵列中心仅包含第二材料且不含有第一棱镜。因此,于此部分中第二材料是形成于基板406上。第二材料可为紫外光(UV)固化材料。In step 1312, method 1300 uses the second mold to form a second prism array composed of a second material different from the first material on the first prisms. In one embodiment of step 1312, the second material is disposed in region 1510 to form second prisms 404 (1)-(6) on the first prisms. In the embodiment shown in FIG15A for a three-by-three array, the center of the array corresponding to sub-camera 306 (5) contains only the second material and no first prisms. Therefore, the second material is formed on substrate 406 in this portion. The second material can be an ultraviolet (UV) curable material.
在可选择的步骤1314中,第二材料系经固化以完成第二棱镜404 的成形。In optional step 1314 , the second material is cured to complete the formation of the second prism 404 .
在步骤1316中,方法1300移除该第二模具。在步骤1316的一实例中,第二模具1508被移除而在第一棱镜402及基板406上留下若干第二棱镜404。At step 1316 , method 1300 removes the second mold. In one example of step 1316 , second mold 1508 is removed, leaving second prisms 404 on first prisms 402 and substrate 406 .
在可选择的步骤1318中,方法1300将步骤1302-1316中所形成的第一及第二棱镜阵列叠置于一透镜阵列组件上。在步骤1318的一实例中,设有第一棱镜402及第二棱镜404于其上的基板406叠置于透镜阵列组件104及影像传感器阵列106上。在图15B的实例中,其于进行叠置之前已在基板406的一第二侧上形成一额外的透镜(例如,图4的透镜408)。In optional step 1318, method 1300 laminates the first and second prism arrays formed in steps 1302-1316 onto a lens array assembly. In one example of step 1318, substrate 406 having first prism 402 and second prism 404 thereon is laminated onto lens array assembly 104 and image sensor array 106. In the example of FIG15B, an additional lens (e.g., lens 408 of FIG4) is formed on a second side of substrate 406 prior to lamination.
在可选择的步骤1320中,方法1300将层叠的阵列切割成块以形成单独的摄影机。在步骤1320的一实例中,消色差棱镜阵列102、基板406、透镜阵列104及影像传感器阵列106系经切割成块(例如,沿着切割线1518)以形成单独的摄影机100,如图15C中所示。In optional step 1320, method 1300 dices the stacked array into blocks to form individual cameras. In one example of step 1320, achromatic prism array 102, substrate 406, lens array 104, and image sensor array 106 are diced into blocks (e.g., along cut lines 1518) to form individual cameras 100, as shown in FIG15C.
步骤1301及1317为可选择的。若步骤1301被包含于内,那么步骤1317则不会被包含于其内。若步骤1317被包含于内,那么步骤1301 则不会被包含于其内。在每一个可选择的步骤1301及1317中,一可选择的透镜阵列被制造于该基板的一第二侧上。在步骤1301及1317 中的一实例中,透镜408被制造于基板406的一第二侧上。亦即,若包含在内时,透镜408可于制造消色差双棱镜阵列102之前或之后在基板406的一第二侧上制造。Steps 1301 and 1317 are optional. If step 1301 is included, then step 1317 is not included. If step 1317 is included, then step 1301 is not included. In each of the optional steps 1301 and 1317, an optional lens array is fabricated on a second side of the substrate. In one example of steps 1301 and 1317, lens 408 is fabricated on a second side of substrate 406. That is, if included, lens 408 can be fabricated on a second side of substrate 406 before or after fabrication of achromatic biprism array 102.
在图1至15的实例中,由于子摄影机306(5)不需要修改其对应的视场,故第一棱镜402未包含于其内。换言之,假定摄影机100 是由一对称的N x N子摄影机306阵列所形成,当N为奇数时,该消色差双棱镜阵列102的中央消色差双棱镜可不包含第一棱镜402但可包含对应于其他第二棱镜的材料。当N为偶数时,该中央子摄影机可选择地包含一第一棱镜。例如,在一4x 4阵列中,摄影机100中心的四个子摄影机可只包含第二材料。或者,在一4x 4阵列中,中心的四个部分可包含第一及第二棱镜二者。图16为说明一具有通过图13的方法1300所形成的2x 2消色差双棱镜阵列1602的例示性摄影机1600 的剖面示意图。摄影机1600具有一消色差双棱镜阵列1602、一透镜阵列1614及一传感器阵列1616。在图16的实例中,摄影机1600形成为一个2x 2子摄影机阵列,且因而不具有中心子摄影机,其中每一子摄影机包含第一及第二棱镜1604、1606二者。In the examples of Figures 1 to 15, the first prism 402 is not included in the sub-camera 306 (5) because the sub-camera 306 (5) does not need to modify its corresponding field of view. In other words, assuming that the camera 100 is formed by a symmetrical N x N array of sub-cameras 306, when N is an odd number, the central achromatic bi-prism of the achromatic bi-prism array 102 may not include the first prism 402 but may include materials corresponding to the other second prisms. When N is an even number, the central sub-camera may optionally include a first prism. For example, in a 4 x 4 array, the four central sub-cameras of the camera 100 may include only the second material. Alternatively, in a 4 x 4 array, the four central sub-cameras may include both the first and second prisms. Figure 16 is a cross-sectional schematic diagram illustrating an exemplary camera 1600 having a 2 x 2 achromatic bi-prism array 1602 formed by the method 1300 of Figure 13. Camera 1600 has an achromatic dual prism array 1602, a lens array 1614, and a sensor array 1616. In the example of FIG16 , camera 1600 is formed as a 2 x 2 sub-camera array, and thus has no central sub-camera, where each sub-camera includes both first and second prisms 1604, 1606.
如图15A-C中所示,可从一封装每一个第一棱镜402的单一毗连材料层制作形成第二棱镜404的第二材料。有利的是,这节省了对齐第二棱镜404与第一棱镜402的时间。有利的是,第二模具1508可经配置而使得只有第一棱镜402的上表面被各别第二棱镜404的第二材料以类似于图3及4的方法进行覆盖。有利的是,这节省了使用在形成第二棱镜阵列的材料用量费用。15A-C , the second material forming the second prisms 404 can be fabricated from a single contiguous layer of material that encapsulates each of the first prisms 402. Advantageously, this saves time in aligning the second prisms 404 with the first prisms 402. Advantageously, the second mold 1508 can be configured so that only the top surfaces of the first prisms 402 are covered with the second material of the respective second prisms 404 in a manner similar to that of FIGURES 3 and 4. Advantageously, this saves money on the amount of material used to form the second prism array.
可在不偏离本发明范畴的情形下对上述方法及系统做出改变。因此应当指出的是,上述说明或显示于附图中的内容应解释为说明性的意义而非限制性的意义。下列申请专利范围意欲涵盖本文所述的所有一般性特征及特定特征,且由于语言的关系,本方法及系统的范畴的陈述皆应落入其间。Changes may be made to the above methods and systems without departing from the scope of the present invention. It should be noted that the above description or the contents shown in the accompanying drawings are to be interpreted in an illustrative sense and not in a restrictive sense. The following claims are intended to cover all generic and specific features described herein, and for language constraints, the statements of the scope of the present methods and systems should fall within these claims.
Claims (11)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/616,936 US9438779B2 (en) | 2015-02-09 | 2015-02-09 | Wide-angle camera using achromatic doublet prism array and method of manufacturing the same |
| US14/616,936 | 2015-02-09 | ||
| US14/616,925 | 2015-02-09 | ||
| US14/616,925 US9902120B2 (en) | 2015-02-09 | 2015-02-09 | Wide-angle camera using achromatic doublet prism array and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| HK1222961A1 HK1222961A1 (en) | 2017-07-14 |
| HK1222961B true HK1222961B (en) | 2020-05-15 |
Family
ID=
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9438779B2 (en) | Wide-angle camera using achromatic doublet prism array and method of manufacturing the same | |
| US12389700B2 (en) | Aperture-metasurface and hybrid refractive-metasurface imaging systems | |
| CN107966782B (en) | Photographing optical lens system, image capturing device and electronic device | |
| US20210116684A1 (en) | Optical imaging system | |
| CN101512768B (en) | Camera system and associated methods | |
| KR101425792B1 (en) | Photographic lens optical system | |
| CN102625034B (en) | Image pickup units | |
| US9195033B2 (en) | Imaging optical system and imaging equipment | |
| US20170023769A1 (en) | Optical device and mobile device including a plurality of optical devices having different fields of view | |
| JP2006323365A (en) | Wafer-scale lens, and optical system equipped with the same | |
| JP2009251367A (en) | Imaging lens, method for manufacturing imaging lens and imaging apparatus | |
| KR20130103144A (en) | Zoom lens and photographing apparatus | |
| KR20170093504A (en) | Optical System for Imaging Device | |
| KR101869965B1 (en) | Lens optical system and Imaging Device | |
| TW202532910A (en) | Optical imaging system | |
| KR101710320B1 (en) | Photographic Lens Optical System | |
| JP2008058600A (en) | Zoom lens and imaging apparatus having the same | |
| US9902120B2 (en) | Wide-angle camera using achromatic doublet prism array and method of manufacturing the same | |
| US7920329B2 (en) | Embedded lens for achromatic wafer-level optical module and methods of forming the same | |
| KR20140124286A (en) | Wide angle lens system and photographing apparatus having the same | |
| KR20190081932A (en) | Apparatus and method for evaluating performance of lens module and relay lens system applicable thereto | |
| JPWO2010143458A1 (en) | Imaging lens and imaging apparatus | |
| WO2009125654A1 (en) | Lens block manufacturing method, lens block, imaging lens, imaging device and portable terminal | |
| HK1222961B (en) | Method of manufacturing the achromatic doublet prism array | |
| KR101621204B1 (en) | Photographic Lens Optical System |