HK1202486B - Surface treatment method, surface treatment agent, and novel compound - Google Patents

Description

Surface treatment method, surface treatment agent, and novel compound

Technical Field

The present invention relates to a surface treatment technique.

Background

Humans use a variety of substances (materials) to make a variety of products. The materials of these products are classified into metal materials, ceramic materials, polymer materials, and composite materials obtained by compounding the materials. Each material has its own properties. These properties characterize the product. The metal or ceramic may also be formed as a separate product. However, an alloy or a multi-element ceramic can be produced by melting and mixing two or more elements. The polymer material is suitably composed (synthesized) using C, H, O, N, X (halogen), P, S, or other elements. The kind of which can even be said to be infinite.

The property of the material is the sum of the properties of the body and the properties of the surface. The properties of the body are essentially determined by the kind or composition of the material. The properties of the surface are not necessarily the same even if the types or compositions of the elements constituting the main body are the same. The properties of the surface vary in accordance with the external environment over time according to the law of gibbs free energy (Δ G ═ Δ H-T Δ S, Δ H: change in enthalpy, T: absolute temperature, Δ S: change in entropy). If oxygen, moisture, ultraviolet rays, or the like exists in the external environment, the surface is chemically changed and is changed into another substance (property) at any time.

Changes in the surface of materials in nature can pose a great obstacle to production for effective utilization of the surface function. Such obstacles vary depending on the kind of surface function. However, it is at least clear that yesterday's surface properties are different from today's surface properties. The material dependency is caused by the surface property which is an inherent property. It is now impossible to circumvent this fact. However, if the concept of unifying the changes at a certain time is constructed to realize the material independence, the production based on this can be realized. Also, our future living in the 21 st century is filled with light.

The following operations make it possible to unify the surfaces of the materials. For example, if a film (thin film) having the same chemical composition or surface property can be used to make the surface of a material uniform for any material, a surface treatment method using such a film (thin film) can be used. The present inventors refer to such agents as the same surface functionalizing agent. We will refer to the same surface functionalizing agent as simply the surface treating agent. The same surface functionalizing agent that homogenizes the surface of the material is brought into contact with a material (for example, a metal material, a ceramic material, a polymer material, an organic material, or another composite material) to strongly adhere to the surface or to chemically bond (react) to the surface. As a result, the characteristics of the surface become the same regardless of the material. That is, the difference in surface characteristics due to the material disappears. The agents that exert this effect are the same surface functionalizing agents.

The same surface functionalizing agent has a function of strongly adhering (or bonding) to the surface of the material to form a film (thin film). The same surface functionalizing agent strongly adhered (or bonded) to the surface of the material has a function of reacting with other functional groups. The same surface functionalizing agent has a function of effectively functioning on a large amount of materials. I.e., rich in diversity. We refer to agents with such characteristics as identical surface functionalizers in particular.

There are also surface-treating agents in the past which have a function of adhering to the surface of a material, for example. But lack reactivity. Or lack of diversity. For example, it can be applied to material a, but not to material B. Namely, it has a narrow range of use (lack of diversity).

Documents of the prior art

Patent document

Patent document 1: WO2012/043631A1

Non-patent document

Non-patent document 1: japanese society of follow-up , Sen Pongfu, vol.43(6), 242-248(2007)

Non-patent document 2: surface technique, Senpaofu, vol.59(5), 299-304(2008)

Non-patent document 3: TopCatal (2009) 52: 634-642

Disclosure of Invention

The surface treatment agents hitherto cannot cope with a wide range.

Non-patent document 3 is similar to the case after treatment with the surface treatment agent of the present invention. However, the present invention is not disclosed in non-patent document 3.

Accordingly, the present invention has been made to solve the problem of providing a surface treatment technique which is rich in adhesion function and reaction function and has diversity.

The problem is solved by: a surface treatment method for disposing a compound alpha on a substrate by applying a solution containing the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more.

The problem is solved by: a surface treatment method for disposing a compound alpha on a substrate by evaporation of the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more.

The problem is solved by: in the surface treatment method, before the compound α is provided on a substrate, the substrate is preferably subjected to one or more treatments selected from the group consisting of a cleaning treatment, a corona discharge treatment, a plasma discharge treatment, ultraviolet irradiation, an acid treatment, an alkali treatment, a water vapor treatment, and a chemical conversion treatment.

The problem is solved by: in the surface treatment method, preferably, after the compound α is provided on a substrate, a heat treatment is performed.

The problem is solved by: a surface treating agent used in the surface treating method,

the surface treating agent is a compound alpha, or contains the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more.

The amino group bound to the terminal is preferably a primary amino group.

The M-OH group and/or M-OH generating group is preferably an alkoxysilyl group, wherein M represents a metal element.

The compound α is preferably a compound represented by the following general formula [ I ]. More preferably a compound represented by the following general formula [ II ] or general formula [ III ].

A compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group R¹、R²、R³、R⁴X, Z, Q, V may be the same or different and are linking groups; there may be cases where no linking group X, Z, Q is present, except that Y is X, Z, QA framework; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a W is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups M other than H are selected from the group consisting of Si, Al and Ti, at least one of a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, and n is0, 1 or 2.

General formula [ II ]:

{(NR¹R²)_aX-Q}_bY{NH(CH₂)_mSi(R³)_n(OR⁴)_3-n}_e

general formula [ III ]:

{(NR¹R²)_aX-Q}_bY[N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂]_e

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Q is a linking group; there are also instances where no linking group X, Q is present, except that X, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a a is an integer of 1 or more, b is 1 or 2, e is 1 or 2, b + e is 3, m is an integer of 1 or more, and n is0, 1 or 2.

The compound α is preferably at least one selected from the group consisting of: n, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N ' -bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis {2- [ bis- (2-aminoethyl) amino ] ethyl } amine -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine

The problem is solved by: a novel compound represented by the general formula [ I ].

The problem is solved by: a novel compound represented by the general formula [ II ].

The problem is solved by: a novel compound represented by the general formula [ III ].

The present invention can obtain a material having a film with high adhesiveness, reactivity, and diversity as a surface.

Detailed Description

The first invention is a novel compound. More preferably a new compound as the same surface functionalising agent. The novel compounds are represented by the general formula [ I]And (4) showing. The general formula [ I]In, R¹、R²、R³、R⁴Is H or a functional group. These functional groups have, for example, at least one element selected from the group of C, O, N, S. The functional group is preferably a hydrocarbon group. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. The hydrocarbon group may be linear or branched. The hydrocarbon group preferably has 1 to 10 carbon atoms. Linking group X, Z, Q, V, for example, has at least one element selected from the group of C, O, N, S. Linking group X, V is preferably a hydrocarbyl group. Wherein the alkyl group has 1 to 18 carbon atoms. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. The hydrocarbon group may be linear or branched. The hydrocarbon group may further contain-S-, -O-, -NHCO-, -N<-NH-. Linking group Q, Z is preferably-NH-, -N<-O-, -S-, -NHCO-. The functional group W is preferably-NR⁵R⁶、-NHOH、-NH(CH₂)_pOH、-N((CH₂)_pOH)₂、-N(CH₂)_pNH-Y(Z(V-M(R³)_n(OR⁴)_3-n)(Q(X-NR¹R²))。R¹、R²、R³、R⁴Is H or a functional group. R¹、R²、R³、R⁴May be the same or different. These functional groups have, for example, at least one element selected from the group of C, O, N, S. The functional group is preferably a hydrocarbon group. Wherein the alkyl group has 1 to 10 carbon atoms. The hydrocarbon group is preferably an aliphatic hydrocarbon group. In particular an alkyl group. R⁵、R⁶Is a hydrocarbyl group. Wherein the alkyl group has 1 to 10 carbon atoms. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. X, Z, Q, V is a linking group. There may be cases where no linking group X, Z, Q is present, except for cases where X, Z, Q is completely absent. Linking group X, Z, Q, V, for example, has at least one element selected from the group of C, O, N, S. Linking group X, V is preferably a hydrocarbyl group. Wherein the alkyl group has 1 to 18 carbon atoms. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. The hydrocarbon group may be linear or branched. The hydrocarbon group may further contain-S-, -O-, -NHCO-, -N<-NH-. Linking group Q, Z is preferably-NH-, -N<-O-, -S-, -NHCO-. Y is a skeleton. The skeleton has a triazine ring (C)₃N₃). Preferably, the triazine ring is not directly bonded to-NH₂、-N₃(azido). M is at least one selected from the group consisting of Si, Al and Ti. p is an integer of 1 or more. Particularly an integer of 1 to 12. n is0, 1 or 2. a is preferably an integer of 8 or less.

The novel compounds are in particular of the formula [ II]Or the general formula [ III]And (4) showing. In the general formula [ II]、[III]In, R¹、R²、R³、R⁴Is H or a functional group. The functional group is preferably a hydrocarbon group. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. The hydrocarbon group may be linear or branched. The hydrocarbon group preferably has 1 to 10 carbon atoms. Linking group X, Q, for example, has at least one element selected from the group of C, O, N, S. The linking group X is preferably a hydrocarbon group. The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group. The hydrocarbon group may be linear or branchedSo as to be branched. The hydrocarbon group preferably has 1 to 18 carbon atoms. The hydrocarbon group may further contain-S-, -O-, -NHCO-, -N<-NH-. The linking group Q is preferably-NH-, -N%<-O-, -S-, -NHCO-. In the present invention, the triazine ring may be a triazine ring having C₃N₃The heterocyclic ring of (1). In the present invention, the triazine ring may further include melamine (C)₃N₃N₃H₃) The meaning of (1) is used. The triazine ring is preferably a1, 3, 5-triazine ring. a is preferably an integer of 8 or less. m is preferably an integer of 1 to 18. Preferably, the triazine ring is not directly bonded to-NH₂、-N₃(azido). In the general formula [ I]、[II]、[III]The functional group { (NR) { (¹R²)_aX-Q}_b、W、{Z(V-M(R³)_n(OR⁴)_3-n)}、{NH(CH₂)_mSi(R³)_n(OR⁴)_3-n}、N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂Preferably C bonded to the skeleton (Y) of the triazine ring. In particular, { NH (CH)₂)_mSi(R³)_n(OR⁴)_3-n}、N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂Is bound to the backbone Y by the binding of N to C of the backbone Y (C-N bond). { (NR)¹R²)_aX-Q}_b、{Z(V-M(R³)_n(OR⁴)_3-n) And X, Q, Z, V is bonded to the skeleton (Y) through bonding (C-N bond, C-C bond, C-O bond) of an element of the terminal functional group of the skeleton with C of the skeleton.

The novel compounds preferably have the amino group bound at the end as a primary amino group.

The novel compounds are, for example, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N ' -bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis {2- [ bis- (2-aminoethyl) amino ] ethyl } amine -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine. The specific examples described are merely examples. It is obvious that compounds other than them can be exemplified. However, because it is infinite, it is omitted.

The novel compound is, for example, a compound represented by the following general formula [ IV ] or [ V ].

General formula [ IV ]:

a general formula [ V ]:

in the general formulae [ IV ] and [ V ], A, B, C, D is, for example, the following group:

A＝-N(R^a)R^b-Si(R^c)_n(OR^d)_3-nor-N { R^b-Si(R^c)_n(OR^d)_3-n}₂

B＝-N(R^e)R^f(NH₂)_mor-N { R^f(NH₂)_m}₂

C-A, B or-N (R)^g)R^h

D＝Rⁱ

Wherein R is^a、R^e、R^gIs H or a hydrocarbyl group. R^b、R^c、R^d、R^f、R^h、RⁱIs a hydrocarbyl group. n is0, 1 or 2. m is 1 or 2. The hydrocarbon group may or may not contain-S-, -O-, -NHCO-, -N<-NH-. The hydrocarbon group may or may not contain a substituent.

The hydrocarbon group is preferably an aliphatic hydrocarbon group. The aliphatic hydrocarbon group is preferably an alkyl group.

The R is^aPreferably the number of carbons is 1 to 12. The R is^bPreferably the number of carbons is 1 to 12. The R is^cPreferably the number of carbons is 1 to 6. The R is^dPreferably the number of carbons is 1 to 6. The R is^ePreferably the number of carbons is 1 to 12. The R is^fPreferably the number of carbons is 1 to 12. The R is^gPreferably the number of carbons is 1 to 12. The R is^hPreferably the number of carbons is 1 to 12. The R isⁱPreferably the number of carbons is 1 to 12.

A. B, C, D is as follows. However, it is not limited to these.

{A＝-NH-(CH₂)l-Si(O(CH₂)n(CH₃))₃

-N((CH₂)l-Si(O(CH₂)n(CH₃)₃

-NH-(CH₂)l-Si(CH₃)(O(CH₂)n(CH₃))₂Or

-NH-C₆H₄-O-(CH₂)l-Si(O(CH₂)n(CH₃))₃

B＝-NH-(CH₂)l(NH₂) or-N ((CH)₂)l(NH₂)₂

C＝A、B、-NH(CH₂)lCH₃、-N((CH₂)lCH₃)₂or-N (CH)₂CH＝CH₂)((CH₂)mCH₃)

D＝-(CH₂)_p-

Wherein l, m, n, p are integers of 1 or more }

{A＝-NH-(CH₂)l-Si(O(CH₂)n(CH₃))₃

-NH-(CH₂)l-Si(CH₃)(O(CH₂)n(CH₃))₂Or

-NH-C₆H₄-O-(CH₂)l-Si(O(CH₂)n(CH₃))₃

B＝-NH-(CH₂)l(NH₂) or-N ((CH)₂)l(NH₂)₂

C ═ A or B

D＝-(CH₂)_p-

Wherein l, n, p are integers of 1 or more }

{A＝-N(CH₂)l-Si(O(CH₂)n(CH₃))₃

-N((CH₂)l-Si(CH₃)(O(CH₂)n(CH₃))₂)₂Or

-N-(C₆H₄-O-(CH₂)l-Si(O(CH₂)n(CH₃)₂)((CH₂)pCH₃)

B＝-NH-(CH₂)l(NH₂) or-N ((CH)₂)l(NH₂)₂

C ═ A or B

D＝-(CH₂)_p-

Wherein l, n, p are integers of 1 or more }

The second invention is a surface treatment agent, more preferably a surface treatment agent capable of functioning as the same surface functionalizing agent, the surface treatment agent is, for example, an agent for adhesion with the compound α, the surface treatment agent is, for example, an agent for chemical reaction or physical adsorption with the compound α, the surface treatment agent is the compound α, or the compound α is contained, the compound α contains at least an M-OH group and/or an M-OH generating group, wherein M represents a metal element, an amino group, and a triazine ring, and the M-OH group and/or the ion unit isOr an M-OH generating group is preferably bonded directly or indirectly (through a linking group) to a carbon atom of the triazine ring, the amino group is preferably bonded directly or indirectly (through a linking group) to the carbon atom (C) of the triazine ring, at least one amino group of the amino group is indirectly bonded to the carbon atom (C) of the triazine ring, the indirectly bonded amino group is present at least at a terminal position, the amino group at the terminal position has one or more than one, for example, one or two, the M-OH group and/or the M-OH generating group has one or more than one, wherein M represents a metal element, M is preferably Si, Al, Ti., the triazine ring is one or more than one, for example, one or two, the amino group bonded at the terminal is preferably a primary amino group, the M-OH group and/or the M-OH generating group is particularly preferably an alkoxysilyl group, wherein M represents a metal element, a compound α having a primary amino group and an alkoxysilyl group in one molecule is brought into contact with a material selected from a metal material, a ceramic material, a high molecular material, etc., a chemical adsorption (strong binding) is caused by a reaction between these and a chemical adsorption of the compound α, even if the compound is strongly adsorbed (strong adsorption) at compound α), a strong adsorption material, a^-6However, in the conventional silane coupling agents, there is no possibility of adsorption (reaction) with any material such as a metal material, a ceramic material, a polymer material, and the like, for example, when the kind of the material is changed, the kind and the treatment conditions of the silane coupling agent are also changed, and particularly, in the case of a material having almost no-OH on the surface (for example, a polymer material), there is no possibility of strong adhesion or chemical bonding, that is, so-called diversity in a plurality of cases by one silane coupling agent does not exist, that is, there is no advantage of the present invention, in this respect, the compound α of the present invention is greatly different from the conventional silane coupling agent, and the compound α is preferably the above-mentioned [ I ] in a state where the compound α is not volatilized under an ultra-high vacuum condition for a long time, and the compound α is not volatilized, and the analysis by XPS is possible in this state]The compound shown in the specification. Wherein, is the general formula [ II]Or [ III]The compound shown in the specification. For exampleIs of the general formula [ IV]、[V]The compound shown in the specification. Preferably, the triazine ring is not directly bonded to-NH₂、-N₃(azido) preferably, the amino group bound to the terminal of the compound α is a primary amino group, and specifically, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximinopropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) aminopropylamino-1, 3, 5-triazine, 6-bis (2-triethoxysilyl) amino-4-propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-4-trisilyl) amino-1, 5-triazine, 6-bis (2, 6-triethoxypropylamino-4-tris (2, 6-ethyl) amino-1, 5-tris (2, 6-triethoxysilyl) amino-ethyl) amino-1, 6-tris (2, 6-triethoxypropylamino-ethyl) amino-1, 5-tri (2, 6-ethyl) amino-tris-ethyl) amino-1, 6-tris-amino-ethyl) amino-1, 5-tris (2, 6-ethyl) amino-1, 5-amino-tri-amino-1, 6-tris-tri-amino-ethyl) amino-1, 6-tri-1, 6-tris (2, 5-ethyl) amino-tris (2, 6-ethyl) amino-ethyl) amino-tris (2, 5-tris (2, 6-tris (4-tris (2, 6-tris (2, 5-tris (2, 6-tris (triisopropoxyl) amino-tris (2, 6-tris (2, 5-ethyl) amino-tris (2, 6-triethoxypropylamino-tris (4-ethyl) amino-tris (2, 5-tris (2, 6-ethyl) amino-tris (triisopropoxyl) amino-tris (2, 5Ethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N, n ' -bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis {2- [ bis- (2-aminoethyl) amino group.]Ethyl } -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine.

The third invention is a surface treatment method. Is a treatment method using the compound alpha. The surface treatment is intended to bond with the compound α, for example. The surface treatment is, for example, for the purpose of chemical reaction or physical adsorption by the compound α. The third invention is, for example, a method of applying a solution containing the compound α onto a substrate. Examples of the coating method include a dipping method, a spraying method, and a brush coating method. However, it is not limited to these methods. Instead of the coating method, an evaporation method may also be used. The third invention is a method of depositing (depositing) the evaporated compound α on the substrate by, for example, evaporating the compound α. The coating method is simpler than the evaporation method. And the cost is low. Before the compound α is provided on a substrate, the substrate is preferably subjected to one or more treatments selected from the group consisting of the following treatments. For example, cleaning treatment, corona discharge treatment, plasma discharge treatment, ultraviolet irradiation, acid treatment, alkali treatment, steam treatment, and chemical conversion treatment. After the compound α is provided on a substrate, heat treatment is performed as needed. In the chemical conversion treatment, for example, a hydroxide of a group I element, a salt of a group I element, a hydroxide of a group II element, a salt of a group II element, ammonia, an ammonium salt, hydrazine, a hydrazine derivative, an amine, phosphoric acid, a phosphate, a carbonate, a carboxylic acid, a carboxylate, silicic acid, a silicate, a fluoride, and the like are used. By the chemical conversion treatment, a coating film or the like is formed on the metal surface.

When a substrate made of various materials is treated with the compound α (for example, is provided on a substrate surface by applying the compound α), a material having the same surface function can be obtained. Of course, the physical properties of the substrate main body are different, but the surface physical properties are basically the same. As surface properties of the material, it is expected that: metal catalyst adsorption, chemical and biological compound reactivity, metallization, heat resistance, corrosion resistance, oxidation resistance, UV stability, hydrophobicity, hydrophilicity, weldability, adhesiveness, conductivity, colorability, dyeability, printability, transferability, and the like. Further, when the surface is treated with a functional group such as various functional compounds or functional group-containing compounds (silane coupling agents) and a function-imparting agent, it is considered that various functional properties such as catalytic properties, chemical and biological reactivity, metallizing properties, heat resistance, corrosion resistance, oxidation resistance, UV stability, hydrophobicity, water repellency, lipophilicity and hydrophilicity, weldability, adhesiveness, electrical insulation properties, electrical conductivity, stain resistance, antibacterial properties, smoothness and roughness, abrasion resistance, coloring properties, dyeing properties, printing properties, transferability, decorativeness, biocompatibility, luminescence, light-selective absorption properties, and the like, and a material surface having a functional group-containing surface can be obtained.

In the process assembly work in production, the influence of the surface characteristics becomes increasingly large. The number of factors such as the type and amount of members to be produced, the number of processing steps and processing time, and the number of assembling steps and assembling time increases, and the production is always difficult. One reason for this difficulty is believed to be that the surface characteristics of the components are different, not the same. In this regard, a large number of surface treatment techniques have been developed for a large number of materials. These surface treatment techniques are important. However, the era change has led to an activation of competition. The technical developments to date have not been able to cope with the changes. Countries with less competitive and developed technologies. In order to break such a situation, it is important to develop innovative technologies having concepts different from those of the previously developed technologies. If the same surface state can be achieved for a large number of materials by the same method using one treating agent, by breaking the material dependency of the prior surface treatment technique, the problem should be solved significantly. The surface treatment agent (the same surface functionalizing agent) for imparting such a material with no dependency needs to have three functions of "adhesion function", "reactivity function", "diversity function" and the like for a large amount of materials such as metal materials, ceramic materials, polymer materials and the like.

The same surface-functionalized coating film obtained by the same surface-functionalizing agent has a certain adhesion strength (exhibits cohesive failure) regardless of the type of the material. It is important that the interface peeling is not caused for a large amount of materials by the peeling test. That is, it is important that sufficient adhesion strength and cohesive failure be exhibited even if the material is changed. Further, the same surface functionalizing agent utilizes a reactive function when it is changed to various functional surfaces. Therefore, it is necessary to have a function of causing a chemical reaction in the entirety (or a part) of the cover film and changing the part to a different function. It is also important that the material to which such a function is imparted has a variety of functions in which the material surface exerts various functions. It is also important that the coating can be applied by a simple method. If this cannot be achieved by a special method, it is difficult to put it into practical use.

The physical properties of all materials are the sum of the properties of the bulk and the properties of the surface. These properties must be well known in production. For example, the surface properties of a material include a large number of factors such as wettability, adhesiveness, water repellency, hydrophilicity, adhesiveness, adsorptivity, smoothness, water retentivity, chargeability, reactivity, hardness, and the like. Understanding only these factors also requires a great deal of time and labor. In order to avoid such production complexity and to rapidly carry out production, it is important that the surfaces of the materials are in the same state. That is, it is more convenient to realize the same surface than to understand many factors as described above. And is practical. In this way, in order to accelerate the production, it is essential to uniformize (homogenize) the surface of the material. However, a method of uniformizing the surface state of a large amount of materials (metal, ceramic, and organic materials) to a degree of about 90% or more by using one compound has not been known so far.

Due to the above viewpoint, studies have been made. When the compound α is brought into contact with the substrate surface, the compound α reacts with (or strongly adsorbs) the substrate material, and the surface has, for example, a hydroxysilyl (or alkoxysilyl) group or an amino group, thereby greatly modifying the characteristics of the substrate. The surface functionalizing agent (the compound α) is chemically bonded to the substrate by a reaction or is closely adhered to the substrate by a strong adsorption force, and is found by detecting N, Si which is an element unique to the surface functionalizing agent (the compound α) in XPS analysis. When the surface functionalizing agent (the compound α) is brought into contact with another compound which reacts with (or adsorbs to) a hydroxysilane group and/or an amino group, the surface is changed to a surface having another function. In this way, it is possible to modify the surface to a desired functional surface or useful surface. The obtained surface functionalized material can realize that: hydrophilic-lipophilic materials which are reversibly converted by hydrophilization and hydrophobization, full-surface and partial metallization of functionalized organic materials, fluid-adhesive and non-fluid-adhesive bonding of functionalized organic materials with metallic materials, ceramic materials, organic materials and the like, electroless plating and electroplating of functionalized metallic materials, corrosion prevention and surface oxidation resistance of functionalized metallic materials, and the like.

It is generally considered that the substrate provided with said compound α is itself the final product. However, the substrate is often an intermediate material for the next step.

When the compound α is brought into contact with a functional group and/or a function-imparting agent for treatment, the former reacts with the latter. Materials containing different kinds of functional groups and different kinds of functional surfaces can be obtained. There are cases where the material becomes a product due to its own function, and cases where the same kind and different kinds of materials are used as a composite product by joining, attaching, and assembling. There are cases where plating is performed.

Hereinafter, the description will be made in more detail.

[ surface treating agent ]

The surface treatment agent of the present invention has "adhesive function", "reactive function" and "multifunctional function".

If specified more specifically, the compound is the compound α. Or a mixture comprising said compound alpha.

The compound α is more preferably represented by the general formula [ I ]. The compound α is particularly preferably represented by, for example, the general formula [ II ] or the general formula [ III ]. For example, the compound represented by the formula [ IV ] or the formula [ V ]. For example, the following are: n, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N ' -bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N ' -bis {2- [ bis- (2-aminoethyl) amino ] ethyl } amine -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine.

The compound is synthesized, for example, by [ reaction formula 1] or [ reaction formula 2 ].

It is important that the solvent used in the reaction does not react with the functional groups contained in the amino group, the alkoxysilyl group, and the alkoxysilyl group. The solvent satisfying such a condition differs depending on the combination of the amino group and the functional group containing the alkoxysilyl group. Therefore, it is difficult to generalize. However, for example, there may be enumerated: water, alcohols (e.g., methanol, ethanol, isopropanol, ethylene glycol, propylene glycol, cellosolve, carbitol, etc.), ketones (e.g., acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons (e.g., benzene, toluene, xylene, etc.), aliphatic hydrocarbons (e.g., hexane, octane, decane, dodecane, octadecane, etc.), esters (e.g., ethyl acetate, methyl propionate, methyl phthalate), ethers (e.g., tetrahydrofuran, ethyl butyl ether, anisole, etc.), and mixtures of such solvents.

In the reaction, the reaction temperature is governed by the reactivity of the triazine compound which becomes the skeleton and the functional group of the amino group (e.g., primary diamine or primary triamine) or the compound having an alkoxysilyl group, and thus cannot be defined in any way. However, it is generally from-20 ℃ to 200 ℃. Preferably-10 ℃ to 100 ℃. If the reaction temperature is lower than-20 ℃, the reaction rate is slow and the productivity is poor. When the reaction temperature is 200 ℃ or higher, facilities such as an autoclave are required in many cases. Moreover, the reaction rate becomes too high, and by-products are easily produced. Therefore, the preferred temperatures are as described above.

The ratio (molar ratio) of the amino compound (primary diamine or primary triamine) to one of the carbon elements in the triazine compound constituting the skeleton is preferably 1 or more in terms of the ratio of the latter to the former. Typically, the ratio is 2 to 10. If the ratio is less than 1, the target product may be hardly obtained or the raw material may remain. When the ratio exceeds 10 and becomes large, the production amount of impurities decreases, but it takes time to remove unreacted amines. And the production efficiency is poor. Next, it is important that the ratio (molar ratio) of the alkoxysilyl group-containing compound is 1 or more in terms of the ratio of the alkoxysilyl group-containing compound to the alkoxysilyl group-containing compound. Typically, the ratio is 1.05 to 1.50. If the ratio is less than 1, unreacted raw materials remain and the yield is lowered. If the ratio exceeds 1.50 and becomes large, the yield of impurities increases. And the production efficiency is poor.

The treatment is also effective when the compound α is a mixture of 2 or more. Thus, the reaction product can be used without isolation as a single compound. The compound obtained here is mainly a monomer represented by the compound α, but is a condensate of a dimer, oligomer, and alkoxysilane group obtained by reacting a triazine having a terminal amino group and a triazine having an unreacted carbon atom, which are by-produced during the synthesis process, and/or the above-mentioned mixture.

The obtained compound α (compound represented by the general formula [ I ]) was provided on a substrate by a coating method. For example, if the compound α (the compound represented by the general formula [ I ]) is not a liquid, it is added to a solvent. The compound a is disposed on a substrate by immersing the substrate in the solution. The compound α may also be disposed on a substrate by spraying the solution. Spin coating may also be used. A bristle coating method may also be used. In addition, various coating methods can also be employed. In addition to the coating method, a method of evaporating the compound α and depositing the compound α on a substrate may be used. However, the coating process can be carried out very simply anyway. The compound α is also strongly adhered to the substrate by a method called coating. Alternatively, a chemical reaction is caused to bind. That is, the compound α is in contact with only the substrate, and the both are strongly adhered to each other. Thus, the same surface function is exerted.

The average film thickness of the compound α was about 1nm to 20nm, the film thickness of the compound α was thinner when the compound α was chemically bonded to a substrate, the film thickness of the compound α was relatively thick when the bonding force was strong, although not due to chemical reaction, and was not too thick when the compound was referred to as thick, the average film thickness was about 1nm to 5nm when the compound α was bonded to the substrate surface due to chemical reaction, and the film thickness was larger than the thickness (1nm to 5nm) when the compound α was bonded to a substrate due to strong adsorption, so-called bonding force was strong, and was referred to as bonding force even when the film thickness was 10 nm^-6When placed under an ultra-high vacuum of Pa for a long time, compound α does not volatilize, and in this state, XPS analysis can be performed, and the adhesion strength is at a level at which the silicone rubber phase is broken when the silicone rubber is bonded.

The solvent used in the coating may be the same solvent as that used in the reaction. That is, the following can be listed: water, alcohols, ketones, aromatic hydrocarbons, aliphatic hydrocarbons, esters, ethers, and mixtures of said solvents. The concentration of compound alpha is about 0.001 wt% to 10 wt%. When the concentration of the compound α is too dilute to be less than 0.001 wt%, the effect is lacking. When the concentration of the compound α exceeds 10 wt% and is excessively concentrated, the subsequent treatment is time-consuming and labor-consuming. The temperature during coating treatment is about-20 ℃ to 200 ℃. The treatment time is about 0.1 second to 12 hours. The concentration of the compound α is correlated with the treatment temperature and the treatment time, and the best results are obtained by repeated experiments.

After the compound α is provided on the substrate by a coating or evaporation (vapor deposition) method, the treated substrate is maintained at-20 ℃ (preferably 15 ℃ or higher) to 200 ℃ in a vacuum atmosphere, under normal pressure, or under pressure. The holding time is 0.1 second to 12 hours. In this case, the compound α is considered to be fixed to the substrate.

The membrane of compound α has an acid amide group (-CONH-), an amino group (NH) when the membrane is associated with a chemical reaction₂-, -NH-), alkoxysilyl groups (-SiOR), and/or hydroxysilyl groups (-SiOH). When the film is formed by strong adhesion, the film has an amino group (NH)₂-, -NH-), alkoxysilyl groups (-SiOR), and/or hydroxysilyl groups (-SiOH). In water or an aqueous solution, the alkoxysilyl group is hydrolyzed to become a hydroxysilyl group. The alkoxysilyl group is hydrolyzed during contact with moisture and becomes a hydroxysilyl group. At the amino group (NH)₂A hydrogen bond (H.. N.. H) and/or a salt bond (H.. N.. H) is formed between the electron-localized nitrogen of the-NH-or triazine ring and the hydroxysilyl group>NH₂ ^-...⁺OSi<) The substrate surface is believed to be substantially homogenous, i.e., the film of compound α is believed to exhibit the same surface functionalization.

The film of the compound α strongly bonds to a large number of materials (for example, resin materials such as olefin resin, nylon resin, and polyvinyl alcohol, ceramic materials such as glass and alumina, and metal materials such as Cu and Al). The binding force cannot be described in the range of the primary binding or the secondary binding. When the atomic state of the nitrogen atom is estimated from the XPS analysis, it is confirmed that electrons flow into the nitrogen atom. It is considered that the electron excess state of the nitrogen atom becomes a london dispersing force, and strong adhesion is also exhibited to the olefin resin. The same surface-functionalized film is considered to be characterized as a result of stabilization by the interaction between the transverse direction and the downward direction of the film. In general materials, films are formed by the same degree of intermolecular force in the upper, lower, left, and right directions. In the same surface-functionalized film, the binding force in the lateral direction is stronger than that in the downward direction.

The film of the compound α bound to the substrate by reaction or adsorption has an amino group, an alkoxysilyl group, and/or a hydroxysilyl group on the surface. Therefore, the film of the compound α has a reactive functional group on the surface thereof. The reactive functional group is utilized to impart more reactivity or functionality.

[ function-imparting agent and reactivity-imparting agent ]

An amino group, an alkoxysilyl group, and/or a hydroxysilyl group is present on the surface of the film of the compound α. These functional groups are reactive. Therefore, it can react with various substances (reagents). For example, a reaction is caused with the same kind of functional reagent, a different kind of functional reagent, or a nanoparticle dispersing reagent. The surface treatment with such a substance (reagent) converts the substance into a material having various functions.

The homofunctional reagent contains 2 or more identical functional groups. Examples thereof include: bis (hydroxyphenyl) methane, bis (2, 4-hydroxymethyl) phenol, bis (2, 4-hydroxymethyl) -3, 5-xylenol, bis (2, 4-hydroxymethyl) -m-cresol, melamine, trimethylolmelamine, hexamethylolmelamine, trimethoxy methyl melamine, hexamethoxy methyl melamine, guanamine, tetramethylurea, cyanuric acid, phthalic acid, terephthalic acid, succinic acid, adipic acid, sebacic acid, trimellitic acid, pyromellitic acid, rosin succinic acid, phthalic anhydride, trimellitic anhydride, rosin maleic anhydride, pyromellitic anhydride, dihydroxy dimethyl silicon, trihydroxymethyl silicon, octane dithiol, pentaerythritol tetrathiolate, 1, 4-dimercapto, 1,3, 5-trimercapto benzene, and the like, 1, 5-dimercaptonaphthalene, 2,4, 6-trithiol-1, 3, 5-triazine, 2, 4-dithiol-6-dibutylamino-1, 3, 5-triazine, 2, 4-dithiol-6-anilino-1, 3, 5-triazine, 2, 4-dithiol-6- (N-phenyl) aminoanilino-1, 3, 5-triazine, 2, 4-dithiol-6- (N-phenyl) aminoisopropylphenylamino-1, 3, 5-triazine, 2, 4-dithiol-6- (N-phenyl) aminophenoxy-1, 3, 5-triazine, 2, 4-dithiol-6- (N-allyl-2-perfluorooctyl) ethylaminophenoxy-1, 3, 5-triazine, perfluorooctanoyl chloride, perfluorodecanoic acid, perfluorododu 40273, arachidic acid, 3- (1H, 1H, 7H-dodecylfluoroheptyloxy) -1, 2-epoxypropane, 1,3, 5-phenylaminobenzene, 1, 3-naphthylaminobenzene, 1, 5-diaminonaphthalene, bis 3- (N, N-dimethylaminophenyl) amine, tris (4-aminophenyl) amine, bis (4-aminophenyl) amine, N-phenyl-2, 4-phenylaminoamine, bis (1, 4-phenylaminoyl) benzene, hexamethylene diisocyanate, tolylene diisocyanate, triisocyanatophenylmethane, dicyclohexyldimethylmethane, p' -diisocyanate, hexamethylene dimethylcarbamate, tolylene dimethylcarbamate, diethylcarbamate, benzoic acid, dimethylmethane, and, 2, 2' -bis (4-glycidylphenyl) propane, diglycidyloctane, tetraglycidylaminodiphenylmethane, diglycidylether, divinylbenzene dioxide, 2, 6-diglycidylphenylglycidylether, and the like.

The following compounds can be mentioned as examples of different functional agents. Examples thereof include: 6-alkoxysilylpropylamino-1, 3, 5-triazine-2, 4-dithiol monosodium salt, 6-bis (3-alkoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dithiol monosodium salt, 6-N-cyclohexyl-N- (3- (triethoxysilyl) propylamino) -1,3, 5-triazine-2, 4-dithiol monosodium salt, vinylmethoxysiloxane homopolymer, bis (triethoxysilylpropyl) tetrasulfide, 3-mercaptopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2, 4-bis (2-aminoethylamino) -6- (3-triethoxysilylpropylamino) -1,3, 5-triazine, 2, 4-dihydrazino-6- (3-triethoxysilylpropylamino) -1,3, 5-triazine, 6-alkoxysilylpropylamino-1, 3, 5-triazine-2, 4-dithiol, 6-alkoxysilylpropylamino, 6-bis (3-alkoxysilylpropyl) amine, 6-N-cyclohexyl-N- (3- (triethoxysilyl) propylamine), vinylmethoxysiloxane homopolymer, bis (triethoxysilylpropyl) tetrasulfide, 3-mercaptopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, (3-acryloyloxypropyl) trimethoxysilane, methacryloyloxypropyltrimethoxysilane, Triethoxysilylundecalaldehyde, 4-aminobutyltriethoxysilane, metaaminophenyltriethoxysilane, 11-aminoundecyltrimethoxysilane, N- (3-triethoxysilylpropyl) pyrrole, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropylmethyldiethoxysilane, aminopropylsilanetriol, N- (2-aminoethyl) -3-aminopropylsilanetriol, N-methylaminopropyltrimethoxysilane, N-butylaminopropyltrimethoxysilane, N-trimethoxysilylpropyltrimethylammonium chloride, bis (trimethoxysilylpropyl) amine, 3- (triethoxysilyl) propylsuccinic anhydride, 6-azidosulfonylhexyltriethoxysilane, N-butylaminopropyltrimethoxysilane, N-trimethoxysilylpropyltrimethylammonium chloride, bis (trimethoxysilylpropyl) amine, 3- (triethoxysilyl) propylsuccinic anhydride, N-butylaminopropyltriethoxysilane, N-butylaminopropyltrimethoxysilane, N-butylamino, 2- (4-chlorosulfonyl) ethyltriethoxysilane, 2- (3, 4-epoxycyclohexyl) trimethoxysilane, (3-glycidoxypropyl) trimethoxysilane, 10- (carbomethoxy) decylmethylmethoxysilane, 3-chloropropyltrimethoxysilane, 7-bromoheptyltrimethoxysilane, 3-isocyanatopropyltriethoxysilane, (3-triethoxysilyl) -t-butylcarbamate, 2- (diphenylphosphino) ethyltriethoxysilane, diethylphospateylethyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 5- (bicycloheptynyl) triethoxysilane, (3-cyclopentadienyl propyl) triethoxysilane, 2, 4-dithiol-6- (triethoxysilylpropyl) amino-1, 3, 5-triazine, 2, 4-dithiol-6-triethoxysilylpropylthio-1, 3, 5-triazine, 2-thiol-4, 6-bis (N, N '-triethoxysilylpropyl) amino-1, 3, 5-triazine, 2-thiol-4, 6-bis (triethoxysilylpropylthio) -1,3, 5-triazine, 2, 4-diazido-6- (triethoxysilylpropyl) amino-1, 3, 5-triazine, 2-azido-4, 6-bis (N, N' -triethoxysilylpropyl) amino-1, 3, 5-triazine, hexadecafluordocosan-11-alkenyl-1-trimethoxysilane, mixtures thereof, and mixtures thereof, [ tris (tridecafluoro-1, 1, 2, 2-tetrahydrooctyl) dimethylsiloxane ] chlorosilane, tridecafluoro-1, 1, 2, 2-tetrahydrooctyl trimethoxysilane and the like.

Nanoparticle dispersion agentThe dispersion medium is a biologically relevant nanoparticle dispersion reagent for proteins or enzymes having a particle diameter of 1 to 100nm, a polymer nanoparticle (monodisperse or polydisperse polymer nanoparticles) dispersion reagent, a metal nanoparticle dispersion reagent, a metal oxide nanoparticle dispersion reagent, a metal inorganic salt nanoparticle dispersion reagent, a metal nanoparticle dispersion reagent, or the like. The nanoparticle dispersion reagent is produced by a gas phase method (chemical reaction method, thermal Chemical Vapor Deposition (CVD), plasma CVD, molecular beam epitaxy, evaporative concentration, sputtering, Electron Beam (EB) heating, evaporation in gas, laser lift-off, resistance heating), a liquid phase method (chemical liquid phase method, chemical reaction precipitation method, microwave heating, reverse micelle method, normal micelle method, hydrothermal synthesis method, sol-gel method, physical liquid phase method, spray drying method), a solid phase method (firing method, heating furnace method), or the like. Examples of the metal nanoparticles include: fe. Nanoparticles of Co, Ni, Au, Ag, Cu, Sn, Pb, Ge, In, Pt, Zn, etc. Examples of the metal oxide nanoparticles include: fe₃O₄、CeO₂、BaTiO₃、PbSrTiO₃、CaPt_0.05Ti_0.95O₃、Al₂O₃、MgO、Mn₃O₄、NiO、SiO₂、TiO₂、ZrO₂、YO₃-ZnO₂Nanoparticles of clay, etc. Examples of the metal inorganic salt nanoparticles include: AgCl, AgBr, tin compounds (e.g., stannous formate, stannous acetate, stannous propionate, stannous butyrate, stannous valerate, stannous caproate, stannous caprylate, stannous caprate, stannous laurate, stannous benzoate, stannous maleate, stannous fumarate, stannous methoxylate, stannous ethoxylate, stannous propoxide, stannous butoxyde, stannous pentoxyde, stannous hexyloxide, stannous phenoxyate, stannous benzyloxyand the like), and the like. Biologically relevant nanoparticles can be listed: nanoparticles of proteins, bacteria, viruses, DNA, antibodies, enzymes, hormones, and the like. Examples of the polymer nanoparticles include: polyethylene, polymethyl methacrylate, polyethyl methacrylate, polybutyl methacrylate, polyethyl acrylate,Nanoparticles of polyhexamethylene acrylate, polyacrylamide, polydimethylacrylamide, polyisopropylacrylamide, polyvinyl acetate, and the like. Other examples include: nanoparticles of fullerene, carbon nanotube, carbon black, ZnS, PbSe, etc.

When the agent (function-imparting agent and/or reactivity-imparting agent) comes into contact with the compound α bound to the substrate surface, the material has various functions. The contact is performed by an appropriate method selected from a coating method, an evaporation method, a sputtering method, and the like. The solvent used for coating may be the same solvent as the solvent exemplified for coating of the compound α. The concentration, treatment time, treatment temperature, and subsequent treatment can be applied to the technical idea listed in the application of the compound α. The film thickness of the agent (function-imparting agent and/or reactivity-imparting agent) can be appropriately set. The compound α and the agent (function-imparting agent and/or reactivity-imparting agent) are bonded by a bonding force such as a chemical bond, an ionic bond, a hydrogen bond, van der waals force, london dispersion force, or the like.

[ base plate ]

In the present invention, various substrates can be used as the target substrate. For example, the substrate is a metal material. The substrate is a ceramic material. The substrate is made of organic polymer material. The substrate is made of inorganic high polymer material. Or the substrate is a composite material obtained by compounding the materials. The substrate form is not particularly limited. For example, the present invention can be applied to various types of substrates such as plates, rods, columns, balls, hemispheres, frames, fibers, filaments, powders, nonwoven fabrics, cloths, nets, foams, films, sheets, and laminates.

The metal material may be exemplified by: various metals, alloys, shape memory alloys, superelastic alloys, functional metals, amorphous metals, or fiber-reinforced metal blocks, etc. Examples of the metal material constituent elements include: be. Mg, Ca, Sr, Ba, Ra, Sc, Y, Ti, Zr, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, Al, Ge, Sn, Pb, Sb, Bi, Nd. Examples of alloys include: iron alloys (steel, carbon steel, pig iron), copper alloys (phosphor bronze, brass, cupronickel, beryllium copper, titanium copper), aluminum alloys (alloy components other than Al are appropriately selected from the group of Cu, Mn, Zn, Ni, and the like), magnesium alloys (alloy components other than Mg are appropriately selected from the group of Zn, Ca, and the like), zinc alloys, tin alloys, nickel alloys, gold alloys, silver alloys, platinum alloys, palladium alloys, lead alloys, titanium alloys (α -type alloys, β -type alloys, α + β -type alloys), cadmium alloys, zirconium alloys, cobalt alloys, chromium alloys, molybdenum alloys, tungsten alloys, manganese alloys, ferrite-based stainless steel, martensite-series stainless steel, arsanilite-based stainless steel, precipitation-strengthened stainless steel, nickel-titanium alloys, iron-manganese-titanium alloys, superelastic alloys (nickel-titanium alloys), and the like. Of course, the present invention is not limited to the above alloys.

The metal material is preferably subjected to surface cleaning before being treated with the compound α. For example, wet cleaning (aqueous system: pure water, tap water, functional water, non-aqueous system: hydrocarbon system, non-flammable solvent system) is performed. Or dry cleaning (uv, ozone, uv + ozone, plasma, corona discharge, argon aerosol, liquefied carbon dioxide).

The ceramic materials may be exemplified by: ceramics (kaolin, clay of Rana Nigromaculata, pottery stone, feldspar, silica, quartz, alumina, etc.), glass, cement, gypsum, enamel, etc. From the composition point of view, there may be enumerated: oxide-based, zirconia-based, hydroxide-based, carbide-based, carbonate-based, nitride-based, halide-based, phosphate-based ceramic materials, and the like. Specific examples thereof include: barium titanate, Bi₂Sr₂Ca₂Cu₃O₁₀High-temperature superconducting ceramics, boron nitride, ferrite, lead zirconate titanate, silicon carbide, silicon nitride, saponite, zinc oxide, aluminum nitride, stevensite, cordierite, sialon, machinable ceramics, zircon, barium titanate, lead zirconate titanate, mullite, carbon black, white carbon, silica-based diatomaceous earth, calcined diatomaceous earth, quartz/silica, white silica, kaolin clay, calcined clay, talc, white mica, sericite, wollastonite, serpentine, pyrophyllite, calcium carbonate, heavy calcium carbonate, and the likeSpar, titanium oxide, basic magnesium carbonate, dolomite, alumina, and the like. Of course, the present invention is not limited to the above ceramic materials.

The ceramic material is also preferably subjected to surface cleaning prior to treatment with compound alpha. For example, wet cleaning. Or dry cleaning.

The organic polymer material typically has a C-C bond or a C-H bond. Examples of the organic polymer material include: thermosetting resins, thermoplastic resins, fiber-reinforced plastics, photocurable resins, vulcanized rubbers, uncrosslinked rubbers, and the like. The polymer skeleton includes a two-dimensional linear skeleton and a three-dimensional network skeleton. Examples of the two-dimensional linear structure polymer include: cellulose such as hydroxyethyl cellulose, cellulose ester (derivative) such as cellulose diacetate, starch, vinyl acetate resin, low-density polyethylene, high-density polyethylene, polypropylene, ethylene-propylene copolymer, petroleum resin, polystyrene, syndiotactic polystyrene, styrene copolymer, chroman-indene resin, terpene resin, styrene-divinylbenzene copolymer, acrylonitrile-butadiene-styrene copolymer (ABS) resin, polymethyl acrylate, polyethyl acrylate, polyacrylonitrile, polymethyl acrylate, polymethyl methacrylate, polyethyl methacrylate, polycyanoacrylate, polyvinyl acetate, ethylene-vinyl acetate copolymer (EVA) resin, polyvinyl alcohol, polyethylene formaldehyde, polyvinyl acetal, vinyl acetate copolymer, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl alcohol-vinyl acetate copolymer, polyvinyl alcohol, polyvinyl acetal, polyvinyl chloride-vinyl acetate copolymer, polyvinyl alcohol, Vinyl chloride-ethylene copolymer, polyvinylidene fluoride, vinylidene fluoride-ethylene copolymer, vinylidene fluoride-propylene copolymer, 1, 4-trans polybutadiene, 1, 2-trans polybutadiene, polyoxymethylene, polyethylene glycol, polypropylene glycol, phenol-formalin resin, cresol-formalin resin, resorcinol resin, melamine resin, xylene resin, toluene resin, glyphosate resin, modified glyphosate resin, polyethylene terephthalate (PET), polybutylene terephthalate (PBT), unsaturated polyester resin, polyester acrylate, allyl ester resin, Polycarbonate (PC), 6-nylon, 6' 10-nylon, polyimide (P)I) Poly (p-phenylene pyromellitimide), poly (p-phenylene biphenyl-3, 4, 3 ', 4' -tetracarboximide), poly (p-phenylene oxydiphthalimide), poly (p-phenylene benzophenone-3, 4, 3 ', 4' -tetracarboximide), poly (p-phenylene diphenylsulfone-3, 4, 3 ', 4' -tetracarboximide), poly (p-phenylene cyclobutane-1, 2, 3, 5-tetracarboximide), polyimides, polyamide, polybenzimidazole, polyamideimide, silicone resin, addition hardening type silicone rubber, polymerization hardening type silicone rubber (polysiloxane containing vinyl in side chain, polysiloxane containing vinyl in both terminals), condensation hardening type silicone rubber, addition hardening type silicone resin, furan resin, polyurethane resin, Epoxy resin (EP), polyphenylene ether, polydimethylphenylene ether, polymer alloy of polyphenylene ether (or polydimethylphenylene ether) and triallyl isocyanurate and peroxide, parylene, polyphenylene sulfide (PPS), polycycloolefin (COP), Polysulfone (PSF), polyether sulfone (PES), polyether ether ketone (PEEK), liquid crystal resin (LCP), polyurethane (U), natural rubber, 1, 4-cis-butadiene rubber, isoprene rubber, polychloroprene, styrene-butadiene copolymer rubber (SBR), hydrogenated styrene-butadiene copolymer rubber, acrylonitrile-butadiene copolymer rubber (NBR), hydrogenated acrylonitrile-butadiene copolymer rubber, polybutene rubber, polyisobutylene rubber, poly (allyl cyanurate), poly (trimethylene terephthalate), poly (tetramethylene terephthalate), poly (, Ethylene-propylene rubber (EPR), ethylene-propylene-diene rubber (EPDM), ethylene oxide-epichlorohydrin copolymer rubber, chlorinated polyethylene rubber, chlorosulfonated polyethylene rubber, alkylated chlorosulfonated polyethylene rubber, chloroprene rubber, acryloyl chloride rubber, acryloyl bromide rubber, fluorine rubber (FKM), epichlorohydrin and its copolymer rubber, vinylchloride propylene rubber, chlorobutyl rubber, bromobutyl rubber, tetrafluoroethylene, hexafluoropropylene and vinylidene fluoride, tetrafluoroethylene, and the like homopolymer rubbers and the above-mentioned binary and ternary copolymer rubbers, ethylene-tetrafluoroethylene copolymer rubber, propylene-tetrafluoroethylene copolymer rubber, ethylene acrylic rubber, peroxide type silicone rubber, addition type silicone rubber, condensation type silicone rubber, epoxy rubber, urethane type silicone rubberExamples of the polymer having a three-dimensional network structure include glycidyl acrylate monomers such as vinyl acrylate, acrylate ester, methacrylate ester, epoxy ester, isocyanate group, or oxetanyl acrylate monomers, glycidyl acrylate monomers such as glycidyl acrylate, glycidyl1, 4-butanediol diacrylate, 1, 6-hexanediol diacrylate, 1, 9-nonanediol diacrylate, neopentyl glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, polyethylene glycol diacrylate, tripropylene glycol diacrylate, hydroxypivalic acid neopentyl glycol diacrylate, acetal glycol diacrylate, an adduct diacrylate of hydroxypivalic acid neopentyl glycol and caprolactone, trimethylolpropane triacrylate, trimethylolpropane polyethoxylated triacrylate, trimethylolpropane polypropoxylated triacrylate, pentaerythritol triacrylate, dipentaerythritol hexaacrylate, an adduct of dipentaerythritol and caprolactone, hexaacrylate, acryloxyethyl phosphate, fluoroalkyl acrylate, sulfopropyl acrylate, poly (ethylene glycol) acrylate, poly (propylene glycol) acrylate, Ethylene glycol diacrylate, propylene glycol diacrylate, polyethylene glycol diacrylate, 1, 4-butanediol diacrylate, 1, 6-hexanediol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, epoxy (meth) acrylate obtained by addition reaction with acrylic acid, polyurethane acrylate obtained by reaction of 2-hydroxyethyl acrylate with glycol and diisocyanate, polyester acrylate obtained by reaction of acrylic acid with polybasic acid and polyhydric alcohol, polyester acrylate, urethane acrylate, epoxy acrylate, polyether acrylate, polyhydric alcohol acrylate, and the like. The polymer having a three-dimensional network structure may be a methacrylate. The polymer having a three-dimensional network structure is, for example: methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, butyl methacrylate, isobutyl methacrylate, sec-butyl methacrylate, tert-butyl methacrylate, hexyl methacrylate, octyl methacrylate, isooctyl methacrylate, 2-ethylhexyl methacrylate, decyl methacrylate, lauryl methacrylate, stearyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2-dimethylaminoethyl methacrylate, 2-diethylaminoethyl methacrylate, 2-tert-butylaminoethyl methacrylate, glycidyl methacrylate, allyl methacrylate, methyl methacrylateCyclohexyl methacrylate, phenyl methacrylate, nonylphenyl methacrylate, benzyl methacrylate, dicyclopentenyl methacrylate, bornyl methacrylate, 1, 4-butanediol dimethacrylate, 1, 3-butanediol dimethacrylate, ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, polyethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, 1, 6-hexanediol dimethacrylate, dipropylene glycol dimethacrylate, trimethylolpropane trimethacrylate, glycerol methacrylate, ethylene glycol dimethacrylate, propylene glycol dimethacrylate, polyethylene glycol dimethacrylate, 1, 4-butanediol dimethacrylate, propylene glycol dimethacrylate, and mixtures thereof, 1, 6-hexanediol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetramethacrylate, epoxy methacrylate obtained by addition reaction with methacrylic acid, poly (urethane) obtained by reacting 2-hydroxyethyl methacrylate with diol and diisocyanate, polyester methacrylate obtained by reacting methacrylic acid with polybasic acid and polyhydric alcohol, polyether methacrylate, polyol methacrylate, and the like. In addition, polymers having a three-dimensional network structure can be exemplified by: methacryloyloxyethyl phosphate, bis-methacryloyloxyethyl phosphate, aroxostan (AronOxetane), bis [ 1-ethyl (3-oxetanyl)]Methyl ether, 3-ethyl-3- (hexyloxymethyl) oxetane, xylylene dioxetane, phenyloxetane, oxetanylsilsesquioxane, 3-ethyl-3- (heptyloxymethyl) oxetane, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3- (octyloxymethyl) oxetane, 3-ethyl-3- (dodecyloxymethyl) oxetane, bisphenol A type epoxy monomer, bisphenol F type epoxy monomer, novolak type epoxy monomer, toluene diisocyanate, and the like. Of course, the polymer having a three-dimensional network structure is not limited to these. Various polymers having a three-dimensional network structure can be used as the polymerization initiator, the crosslinking agent, the crosslinking accelerator, and the crosslinking assistant. For example peroxides, cationic polymersSpecific examples of the crosslinking agent include azobisbutyronitrile, benzophenone, milone, benzoisopropyl ether, chlorothioxanthone, isopropylthioxanthone, benzyldimethyl ketal, acetophenone diethyl ketal, α -hydroxycyclohexylphenyl ketone, 2-hydroxy-2-methyl-phenylpropane, acetophenone derivatives, 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-propyl) ketone, α -hydroxy- α' -dimethyl acetophenone, methoxyacetophenone, 2-dimethoxy-2-phenylacetophenone, benzoine ether compounds, such as benzoin ethyl ether, benzoin propyl ether, such ketal derivative compounds, such as benzyldimethyl ketal, halogenated ketone, acyl phosphine oxide, bis- (2-dimethoxy-2-phenylacetyl) thiolane phosphate, bis- (2-dimethoxy-2-benzothiazolyl) -thiolane ammonium salt, sodium-dithiolane-ammonium chloride, sodium-dithiolane-N-dithiolane-ammonium chloride, sodium-dithiolane-N-dithiolane-ammonium chloride, potassium-dithiolane-N-dithiolane-ammonium chloride, sodium-dithiolane-N-dithiolane-octylammonium chloride, potassium chloride, sodium-dithiolane-N-dithiolane-octylsulfonate, sodium-dithiolane-N-octylthiolane-dithiolane-octylammonium chloride, potassium-2-dithiolane-2-octylthiolane-2-dithiolane-2-dithiolane-octylammonium salt, thiuramide, thiuram-thiolane-2-thiolane, thiuram-thiolane-dithiolane-thiolane, thiuram-thiolane-2-thiolane, thiuram-thiolane, thiuram-thiolane-ammonium chloride, thiuram-ammonium chloride, thiuraTerminal diaminopolypropylene glycol, benzenedithiol, hexane dithiol, 1, 10-decane dithiol, 1, 12-dodecane dithiol, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, polypropylene glycol diacrylate, polypropylene glycol dimethacrylate, diallyl ether, triallyl isocyanurate, triallyl cyanurate. The polymer having a three-dimensional network structure (thermosetting resin, crosslinked rubber) is obtained, for example, by: a composition comprising 100 parts by weight of a two-dimensional linear polymer (or a low-molecular monomer) and 0.1 to 20 parts by weight (preferably 0.5 to 10 parts by weight) of a crosslinking agent, a crosslinking accelerator or a crosslinking aid, respectively, is subjected to a roll-to-sheet process, a calender roll process, a press process, an extrusion process and an injection molding process at a temperature of 20 to 350 ℃ for 0.1 to 200 minutes. The two-dimensional linear structure polymer (thermoplastic resin, uncrosslinked rubber) can also be obtained by a known method. The photo-setting resin is obtained by: the composition constituting the photocurable resin is cured at a concentration of 10mJ/m using an Ultraviolet (UV) device (e.g., a high-pressure mercury UV lamp, a low-pressure mercury UV lamp, a fluorescent UV lamp (short ARC (ARC) xenon lamp, a chemical lamp), a metal halide lamp) in the atmosphere, in nitrogen, in argon, or under reduced pressure²～20kJ/m²The ratio of (A) to (B) is in the range of 200nm to 400 nm. The composition constituting the photocurable resin contains, for example, a photopolymerization catalyst. The amount of the photopolymerization catalyst is 0.01 to 5 parts by weight relative to 100 parts by weight of the compound having an epoxy group, for example. When the blending ratio of the photopolymerization catalyst is less than 0.01 part by weight, the ring-opening reaction of the epoxy group does not proceed sufficiently even when light is irradiated. Even if the amount is more than 5 parts by weight, the reaction is not improved. The vulcanized rubber is obtained by: a composition containing a desired component such as a linear polymer having a glass transition temperature of-20 ℃ or lower, a crosslinking agent, and a crosslinking accelerator is maintained at a temperature of 0 to 300 ℃ (preferably 60 to 180 ℃) for 0.1 to 120 minutes (preferably 5 to 60 minutes). If the temperature is low, the reaction time is too long, and the productivity is deteriorated. On the other hand, if the temperature is high, the energy cost is too high. Thus, as aboveThe organic polymer material has a filler and a functional additive as required, the functional additive is a reinforcing agent, the reinforcing agent includes, for example, carbon black, calcium carbonate, talc, mica, clay, kaolin, cellulose, diatomaceous earth, flat clay, kaolin, glass, barium titanate, strontium titanate, mica, silica, the reinforcing agent includes, for example, rayon reinforcing agent, nylon, polyester, vinylon, steel, aramid (Kevlar), carbon fiber, glass fiber, the like, the reinforcing agent includes, for example, fiber form, the reinforcing agent includes, for example, copper, nickel, silver, tin, carbon, vinylon, steel, aramid (Kevlar), the reinforcing agent includes, for example, a styrene reinforcing agent, a styrene-acrylic acid, a styrene-ethylene-2-bis (p-octylphenol-2-octylphenol), a styrene-2-bis (benzylphenol-4-2-octylphenol), a phenol-2-dihydrooctylphenol-2-dihydrobenzene-2-Nickel dimethyldithiocarbamate, 1, 3-bis (dimethylaminopropyl) thiourea, dilauryl 3, 3-thiodipropionate, tris (nonylated phenyl) phosphite, 2- (4-hydroxy-3, 5-tert-butyl) anilino-1, 3, 5-triazine-4, 6-dithiol, 2- (4-phenylamino) anilino-1, 3, 5-triazine-4, 6-dithiol, 2- (N-anilinophenyl) -N '-isopropylamino-1, 3, 5-triazine-4, 6-dithiol, 4-bis (N-anilinophenyl-N' -isopropylamino) -1,3, 5-triazine-6-thiol, sodium dithiol, sodium 1, 3-bis (dimethylaminopropyl) thiourea, 3-, 2, 4-bis (N-anilinophenyl-N' -isopropylamino) -1,3, 5-triazine-6-thiol, 1,3, 5-triazine-2, 4, 6-trithiol, bis (2, 4-dithiol-1, 3, 5-triazinyl-6-amino) benzene, 2-triethoxysilylpropylamino-1, 3, 5-triazine-4, 6-dithiol, and the like. In particular, a sulfur-based or phosphorus-based compound such as triazine thiol having an antioxidant group can be used. The amount added is an amount corresponding to the purpose.

The composite material is a proper combination of the metal material, the ceramic material and the polymer material. For example, a composite material is formed by disposing a ceramic material on the surface of a metal material. The composite material is formed by arranging a high polymer material on the surface of a metal material. The composite material is formed by arranging a metal material on the surface of a ceramic material. The composite material is formed by arranging a high polymer material on the surface of a ceramic material. In addition, various combinations are possible. In the case of the combination, the material a and the material B are joined together. Of course, the present invention is not limited thereto. When the composite material is constituted by the joining, each material may be previously subjected to a cleaning treatment. Alternatively, for example, treatment with a silane coupling agent or the like is performed.

A wide variety of composite products are obtained by: one of the substrates treated with the surface treatment agent is an adherend, and the other substrate treated with the surface treatment agent (or untreated) is an adherend, and both are bonded. A plated product was obtained by: the material is immersed (or blown) in an electroless plating solution, followed by plating. The circuit substrate may also be fabricated by: a resist is coated on the plated metallized product, thereby etching the plating film. When a groove or a channel is formed on the surface of a substrate and the same material is bonded after hydrophobization (or hydrophilization), a hydrophobized (or hydrophilized) microchannel can be easily produced. When adhesiveness is provided to the electrically conductive composite, the magnetic composite, or the thermally conductive composite, fluid bonding (processing bonding or cross-linking bonding) or non-fluid bonding (assembly bonding) may be performed on the metal material, the ceramic material, the polymer material, or the composite polymer material. The present invention is effective in a large number of industrial fields such as electronic devices, materials, automobiles, robots, buildings, construction, and environment, energy. In recent years, the multifunction, high performance, and miniaturization of digital devices, portable/mobile devices, high-frequency module devices, and network devices have been rapidly advanced. One of the ways to achieve this is: system In Package (SiP) products and chip on chip (CoC) products, in which a large number of chips such as a microcomputer, a system on chip (SoC), and a memory are housed in one package, are expanding. SiP technology is required to achieve higher performance or higher functionality of devices. In order to achieve high performance and high functionality, development of a technique for bonding minute parts is essential. The present invention is also effective in such fields.

The present invention will be described below with reference to specific examples. However, the present invention is not limited to the following examples. Various modifications and applications are certainly included in the present invention as long as the advantages of the present invention are not substantially impaired.

[ example 1]

6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (TEDC) and N, N' -bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine (TEDDA) were synthesized according to the following reaction formula (1-1) and reaction formula (1-2).

A500 mL three-necked flask was charged with a stirrer and cyanuric chloride (CC: 18.325 g; 99.37 mmol: Seki manufactured by chemical industry of China). A thermometer and a dropping funnel were installed. The flask was placed under argon. Tetrahydrofuran (THF) (200mL) was added thereto. Cooling to-20 ℃. Then, a solution of 3-triethoxysilylpropylamine (28 mL; 120 mmol: チツソ, manufactured by Kagaku Kogyo, Ltd.)/THF (20 mL: Seki, manufactured by , manufactured by imperial chemical industries, Ltd.) was slowly added dropwise over 30 minutes. After the dropwise addition, a solution of triethylamine (17 mL; 122 mmol: made by K.K. pure Chinese medicine) and THF (20 mL: Seki made by K.K.) was slowly added dropwise over 30 minutes. After dropwise addition, the mixture was stirred at-20 ℃ for 1 hour. After the reaction, triethylamine hydrochloride as a by-product was separated by filtration. Then, the mixture was concentrated by a rotary evaporator and dried under reduced pressure. Thus, a crude purified product was obtained. The crude purified product was subjected to purification by silica gel column chromatography (developing solvent: chloroform). The purified product (6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride) (31.820 g; 84.96mmol) was a pale yellow oil. Nuclear Magnetic Resonance (NMR) data and the like are described below.

¹HNMR(400MHz，CDCl₃)d0.67(t，J＝8.0Hz，2H，CH₂CH ₂Si)，1.24(t，J＝6.9Hz，9H，SiOCH₂CH ₃)，1.73(quint，J＝8.0Hz，2H，CH₂CH ₂CH₂)，3.49(q，J＝8.0Hz，2H，NHCH ₂CH₂)，3.83(q，J＝6.9Hz，2H，SiOCH ₂CH₃)，6.60(brs，1H，NH)

Elemental analysis value: measurement value (%); c: 38.81, N: 15.01, H: 6.02, calculated (%, in C)₁₂N₄H₂₂O₃SiCl₂A meter); c: 39.02, N: 15.17, H: 6.00

Next, a stirrer and ethylenediamine (11 mL; 165 mmol; manufactured by Fujijing chemical industry , Bao, Ltd.; purification by molecular sieves) were placed in a 300mL three-necked flask. The flask was placed under argon. A mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (7.821 g; 21.18mmol) and THF (60mL) was added dropwise. After the dropwise addition, the reaction solution was slowly heated to 90 ℃. Then, the reaction was carried out for 17 hours. Then, it was cooled to room temperature. Suction filtration through celite was performed. The filtrate was concentrated using a rotary evaporator. Then, drying under reduced pressure was performed. Purification by silica gel column chromatography was performed. Thus, N' -bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine (TEDDA, 6.063 g; yield 69%) was obtained as a pale yellow oil. The resulting compounds were identified by elemental analysis, NMR spectroscopy, mass spectrometry (MassSpectrometry, MS) measurements. The elemental analysis value N% was carried out using an analysis apparatus of the パ - キンエルマモデル 2400CHN type, NMR spectrometry was carried out using the Japanese ブル force-AC 400P, and MS was carried out using the Japanese electron JEOLJMS-700.

¹HNMR(400MHz，DMSO-d₆)d0.52(brt，J＝8.0Hz，2H，CH₂CH ₂Si)，1.12(t，J＝7.0Hz，9H，SiOCH₂CH ₃)，1.36(brs，4H，CH₂NH ₂)，1.50(brs，2H，CH₂CH ₂CH₂)，2.60(brt，J＝5.6Hz，4H，NCH₂CH ₂N)，3.15(brs，6H，CH ₂CH₂CH₂andNCH ₂CH₂N)，3.72(q，J＝7.0Hz，6H，SiOCH ₂CH₃)，6.39(brs，3H，NHCH₂×3)

¹³CNMR(101MHz，DMSO-d₆)d7.4，18.2，22.9，41.6，42.7，43.6，57.6，165.6，165.8MS(70eV)m/z416(M⁺)

Elemental analysis results: measurement value (%); c: 46.06, N: 26.61, H: 8.48, calculated (%, in C)₁₆N₈H₃₈O₃A Si meter); c: 46.13, N: 26.90, H: 8.71

[ example 2]

The reaction proceeds according to the following reaction formula.

A200 mL three-necked flask was charged with a stirrer and hydrazine monohydrate (4.0 mL; 82 mmol: manufactured by Tokyo chemical industries, Ltd., imperial (China) ). The flask was placed under argon. The flask was cooled to 0 ℃. In this state, a mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (3.734 g; 10.11mmol) and ethanol (50mL) was added dropwise. After the dropwise addition, the reaction solution was slowly heated to 50 ℃. Then, the reaction was carried out at 50 ℃ for 2 hours. After the reaction, the precipitated white solid was separated by filtration with suction filtration. Purification by column chromatography was performed. Thus, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine (DTEDH: 3.403 g; 9.44 mmol; yield 93%) was obtained as a colorless powder. When the compound is brought into contact with air, carbon dioxide in the air is absorbed and precipitated, and the compound is determined as a target compound from the results of NMR analysis. NMR data and the like are as follows.

¹HNMR(400MHz，DMSO-d₆)d0.53(brt，J＝8.0Hz，2H，CH₂CH ₂Si)，1.12(t，J＝6.9Hz，9H，SiOCH₂CH ₃)，1.50(quint.，J＝8.0Hz，2H，CH₂CH ₂CH₂)，3.18(brs，2H，NCH ₂CH₂)，3.31(brs，4H，NHNH ₂)，3.72(q，J＝6.9Hz，6H，SiOCH ₂CH₃)，6.73(brs，1H，NHCH₂CH₂)，7.58(brs，2H，NHNH₂)；¹³CNMR(101MHz，DMSO-d₆)d7.3，18.2，22.8，42.6，57.6，165.3，167.4.

Elemental analysis results: measurement value (%); c: 40.12, N: 30.81, H: 7.68, calculated (%, in C)₁₂N₈H₂₈O₃A Si meter); c: 39.98, N: 31.09, H: 7.83

[ example 3]

DTEDC was synthesized from Cyanuric Chloride (CC) and bis (N, N' -triethoxysilylpropyl) amine. Then, the reaction of DTEDC with ethylenediamine was performed in the presence of ethanol and Triethylamine (TEA). The reaction solution was filtered. Then, the solvent and unreacted ethylenediamine are distilled off under a reduced pressure of 1mmHg to 10 mmHg. The product was dissolved in methanol solution and decolorized by adding activated carbon. After concentration, purification was performed by a silica gel column chromatography. By concentrating it, a pale yellow syrup was obtained. The syrup was judged to be 2- (N, N' -di-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine (DTEDEA) from the elemental analysis data, NMR spectrum, and the like.

[ example 4]

DTEC were synthesized from Cyanuric Chloride (CC) and bis (triethoxysilylpropyl) amine. Then, the reaction of DTEC with ethylenediamine was performed in the presence of ethanol and Triethylamine (TEA). The reaction solution was filtered. Then, the solvent and unreacted ethylenediamine were distilled off under reduced pressure of 10 mmHg. The product was dissolved in methanol solution. Decolorization with activated carbon was performed. After concentration, purification was performed by a silica gel column chromatography. By concentrating it, a pale yellow syrup was obtained. The syrup was judged to be 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine (DTEEA) based on the elemental analysis data, NMR spectrum, and the like.

[ example 5]

Example 5 is an example of surface treatment using the compound (TEDDA) of example 1.

A substrate of 10 mm. times.20 mm. times.0.1 mm was prepared. The substrate is a Ti plate, a Mo plate, a Ni plate, a Cu plate, an Al plate, an Ag plate, a Pt plate, an Sn plate, an SUS316 plate and a brass plate. Namely, 10 kinds of substrates were prepared. Each substrate was ultrasonically degreased in ethanol at 40 ℃ for 15 minutes. Then, rinsing with ethanol was performed. Thereby, the surface is cleaned. After cleaning, the mixture was dried in a vacuum dryer.

The treated substrate was immersed in an aqueous solution (0.1 wt%) containing TEDDA. After 10 minutes, the substrate was pulled up. Then, the washing was sufficiently performed with distilled water. Then, the mixture was placed in a desiccator at 20 ℃ under vacuum (0.1mmHg or less) for 24 hours.

After the treatment, XPS analysis of the TEDDA treated substrate was performed. The XPS analyzer was an X-ray photoelectron spectroscopy analyzer (manufactured by アルバツクフアイ: PHI-QuntersxMScanning X-ray microprobe; irradiation angle: 45 degrees).

In the comparative example, aminopropyltriethoxysilane (AIS 0610.0 manufactured by APS: アヅマツクス) was used in place of the TEDDA, and the operation was carried out in the same manner.

The XPS analysis results are shown in the following Table-1.

TABLE-1

The judgment is as follows from Table-1. The TEDDA processed substrate has a reduced overall surface metal concentration and oxygen concentration and a greatly increased nitrogen concentration and silicon concentration as compared to the APS processed substrate. This case indicates that TEDDA strongly adsorbs (binds) to the substrate surface, whereas APS hardly adsorbs (binds) to the substrate surface. In the analysis, X-raysSince the irradiation angle of the line was 45 degrees, the elements were measured at a depth of approximately 7nm from the outermost surface. In the surface analysis of the TEDDA-treated substrate, since metal atoms were sufficiently observed, the thickness of the TEDDA film was judged to be 7nm or less. In XPS analysis, the difference is 10^-6Pa or less, and therefore, it is understood that TEDDA is adsorbed (bonded) to the substrate with a bonding force (bonding force comparable to a chemical bond) higher than a normal intermolecular force.

[ example 6]

Example 6 is an example of surface treatment using the compound (TEDDA) of example 1.

A substrate of 10 mm. times.10 mm. times.0.1 mm was prepared. The base plate is an aluminum oxide plate, a silicon carbide plate, an aluminum nitride plate, a zinc oxide plate, a carbon plate, a glass plate, a zirconium oxide plate, a ceramic plate, a cement plate and a gypsum plate. Namely, 10 kinds of substrates were prepared. Subsequently, the same treatment as in example 5 was performed.

In the comparative example, Aminopropyltriethoxysilane (APS) was used in place of the TEDDA, and the operation was performed in the same manner.

The XPS analysis results are shown in the following Table-2.

TABLE-2

The judgment is as follows from Table-2. The TEDDA treated substrate showed a reduction in the surface metal concentration and oxygen concentration and a large increase in the nitrogen concentration and silicon concentration as a whole, as compared with the APS treated substrate (comparative example). Since the AlN plate contains Al and N and the SiC plate contains Si and C, the tendency is not significant, but the same tendency can be seen. Namely, it was judged that TEDDA was strongly adsorbed (bonded) to the surface of the ceramic material. In the analysis, since the irradiation angle of the X-ray is 45 degrees, the elements up to a depth of approximately 7nm from the outermost surface are measured. In a TEDDA treatment baseIn the surface analysis of the plate, since metal atoms were sufficiently observed, the thickness of the TEDDA film was judged to be 7nm or less. In XPS analysis, the difference is 10^-6Pa or less, and therefore, it is understood that TEDDA is adsorbed (bonded) to the substrate with a bonding force (bonding force comparable to a chemical bond) higher than a normal intermolecular force.

[ example 7]

Example 7 is an example of surface treatment using the compound (TEDDA) of example 1.

A substrate of 10 mm. times.20 mm. times.0.2 mm was prepared. The substrate is a polyethylene plate (PE: LD-PE: 07-127-01: ハギテツク, manufactured by Nissan corporation), a polypropylene plate (manufactured by PP. コクゴ: 07-175-04), a tetrafluoroethylene plate (PTFE: 903UL: manufactured by Nissan industries, Ltd.), a polyoxymethylene plate (POM: DURACONM 25-44: ポリプラスチツク), a nylon plate (PA 6: P07-142-04, manufactured by コクゴ), a polyethylene 2, 6-naphthalate plate (PEN: Teonex (R), manufactured by Didi ヅュポン Co., Ltd.), a polyethylene terephthalate plate (PET: TORAYCON, manufactured by Ching レコン), a polyether ether ketone plate (PEEK: PEEK 450G: octadeca プロシ - ド), a PPS plate (PPS: C-130 SG: shinning PolyBenkon, manufactured by Mitsugaku corporation), a polycarbonate plate (PC: 07-145-04: コクゴ - コクゴ, manufactured by PC: 5929), a polypropylene plate (manufactured by PP. コクゴ), a Polytetrafluoroethylene plate (Polytetrafluoroethylene, manufactured by Polytetrafluoroethylene, Polytetrafluoroethylene, Polyimide plate (PI: polyimide, manufactured by DONG レデュポン Co., Ltd.), urethane plate (UR: 07-007-01: コクゴ). Subsequently, the same treatment as in example 5 was performed.

In the comparative example, aminoethylaminopropyltriethoxysilane (SIT 8398.0 manufactured by AEPS, アヅマツクス) was used in place of the TEDDA, and the operation was performed in the same manner.

The XPS analysis results are shown in the following Table-3.

TABLE-3

The judgment is as follows from Table-3. The TEDDA treated substrate had a reduced surface carbon concentration and oxygen concentration and a greatly increased nitrogen concentration and silicon concentration as compared with the AEPS treated substrate (comparative example). The nitrogen concentration was greatly increased by TEDDA treatment, except for PA6 containing nitrogen. Since a resin containing silicon is not used, in the case of the present invention, all of silicon is contained. Although the amount of adsorption of PTFE is small, it is apparently bonded with a considerable adhesive force. This indicates that TEDDA is strongly adsorbed on the surface of the resin material. In the analysis, since the irradiation angle of the X-ray is 45 degrees, the elements up to a depth of approximately 7nm from the outermost surface are measured. Therefore, the thickness of the TEDDA film was judged to be 7nm or less. In XPS analysis, the difference is 10^-6Pa or less, and therefore, it is understood that TEDDA is adsorbed (bonded) to the substrate with a bonding force (bonding force comparable to a chemical bond) higher than a normal intermolecular force.

[ example 8]

Example 8 is an example of surface treatment using the compound (TEDDA) of example 1.

Ethylene propylene diene rubber (EPDM, JSR-EP), silicone rubber sheet (Q: SH-851U manufactured by Fujia レ & ダウコ, ニンゲ K.K.), styrene butadiene rubber (SBR: Nipol1500 manufactured by Nippon ゼオン K.K.), nitrile butadiene rubber (NBR: DN300 manufactured by Nippon ゼオン K.K.), and fluororubber (FKM: G-901: ダイキン manufactured by K.K.) were prepared. These materials were mixed with Fast Extrusion Furnace (FEF) furnace black (manufactured by tokyo materials ltd., imperial), dicumyl peroxide (DCP), and ZnO, and kneaded with two rolls. Next, an uncrosslinked rubber sheet having a thickness of 2mm was obtained. The uncrosslinked rubber sheets were placed in a mold in a superposed manner, and a pressing pressure of 2MPa was applied at 160 ℃ for 30 minutes by a vacuum heat press (BakyumuboyVM 01-1010VM, manufactured by ミカドテクノス Co., Ltd.). Thereby, crosslinking is performed. Thus, each rubber substrate was obtained. Subsequently, the same treatment as in example 5 was performed.

In the comparative example, aminoethylaminopropyltriethoxysilane (SIT 8398.0 manufactured by AEPS, アヅマツクス) was used in place of the TEDDA, and the operation was performed in the same manner.

The XPS analysis results are shown in Table-4 below.

TABLE-4

The judgment is as follows from Table-4. In the crosslinked rubber material, Q (crosslinked silicone rubber) contains silicon as a constituent of the material, and NBR contains nitrogen as a constituent of the material. But other rubbers do not contain silicon or nitrogen. Therefore, in the surface analysis of the TEDDA treated substrate and the untreated substrate, it was judged that the reason why N, Si was present or increased was that TEDDA was present on the surface of the crosslinked rubber due to the reaction (or strong adsorption). Surprisingly, TEDDA binds (adsorbs) to the surface of the rubber perturbed by the molecular chains.

[ example 9]

Example 9 is an example of surface treatment using the compound (TEDDA) of example 1.

The substrate is a composite material. That is, the fillers described in Table-5 were mixed with a polymer material such as Q, PE, SBR, PA6, PPS or the like. The mixing of the filler with Q and SBR was carried out using two rolls, and the mixing of the filler with PE and PA6 was carried out using a kneader. Then, press molding was performed at a temperature of 120 to 180 ℃ for 5 minutes using a mold to obtain a substrate of 10mm × 20mm × 0.1 mm. Subsequently, the same treatment as in example 5 was performed.

In the comparative example, aminoethylaminopropyltriethoxysilane (SIT 8398.0 manufactured by AEPS, アヅマツクス) was used in place of the TEDDA, and the operation was performed in the same manner.

The XPS analysis results are shown in Table-5 below.

TABLE-5

The judgment is as follows from Table-5. In the composite material, Q (cross-linked silicone rubber) contains Si as a constituent, NBR contains N as a constituent, but other materials do not contain Si and N. Thus, in the surface analysis of the TEDDA treated composite and the untreated composite, it was determined that the presence and increase of N, Si was present on the composite surface due to the TEDDA reaction (or strong adsorption).

[ example 10]

Substrates of example 5d (TEDDA-treated Cu plate), example 5e (TEDDA-treated Al plate), example 5i (TEDDA-treated SUS316 plate), and example 6f (TEDDA-treated SiO plate) were prepared₂Plate), PI plate subjected to the same treatment as in example 7 (PI: polyimide manufactured by imperial レデュポン corporation), and a UR board (UR: 07-007-01: コクゴ, respectively).

A Cu plate used in example 5d, a PP plate used in example 7b, and a Q plate used in example 8b were prepared. TEDDA treatment was not performed. The substrates were ultrasonically degreased (in ethanol at 40 ℃ for 15 minutes). Then, washing with ethanol was performed. Next, corona discharge treatment (corona master control device manufactured by letters Gekko Co., Ltd., output voltage 9kV (surface voltage), oscillation frequency 20kHz, and temperature 20 ℃) was performed.

The TEDDA-treated substrate and the TEDDA-untreated substrate are arranged to face each other with a TEDDA film interposed therebetween. Then, pressing at 1MPa was performed. The pressing temperature was 120 ℃. The pressing time was 10 minutes.

A PI board (PI: polyimide, カプトン, manufactured by DONG レデュポン) and the substrate of example 5i (TEDDA-processed SUS316 board) were prepared by the same processes as those of example 7.

An SUS316 plate (substrate in example 5 i) was treated with TEDDA, and an acrylic urethane-based paint (U: Urecoat, composite materials Ltd.) was further applied. Next, a hardening treatment (50 ℃ C.; 24 hours) was performed. Then, in the same manner as in example 5i, surface treatment with an aqueous TEDDA solution was performed on the acrylic urethane-based coating film.

These TEDDA-treated substrates were immersed in a catalyst treatment solution (NP-8, 150mL/L, HCl, 150mL/L, manufactured by Tokamura Co., Ltd.) (temperature: 25 ℃ C., time: 1 minute). Thus, the Pd-Sn catalyst was supported on the surface. The substrate carrying the Pd-Sn catalyst was immersed in an electroless copper plating bath (100 mL/L-Through-cupperPSY-1A; 100 mL/L-Through-cupperPSY-1B; 55 mL/L; 20mL/L of an 18.5% formalin aqueous solution; temperature: 33 ℃ C., time: 20 minutes) manufactured by Tokamura K. Then, electroplating is performed. The electrolytic bath used in the electroplating was a Through-cupperETN bath (CuSO) manufactured by wamura ltd₄·5H₂O；80g/L，H₂SO₄；200g/L，Cl^-(ii) a 50ppm), Through-cuppierETN-1A bath (1ml/L), and Through-cuppierETN-1B bath (10 ml/L). The current is 2.5A/dm². The time period required was 60 minutes. The temperature was 25 ℃. The thickness of the copper plating film thus obtained was 30 μm.

In the comparative example, AEPS (manufactured by アヅマツクス) was used in place of the TEDDA, and the operation was performed in the same manner.

The following measurements were carried out on the samples obtained in this example, and the results are shown in Table-6. The measurement of the bonding strength (adhesion strength) is an autostereoscopic mapper P-100 manufactured using a peeling test apparatus (shimadzu manufacturing). The peeling speed in the measurement was 5 mm/min.

TABLE-6

The samples of the present invention were judged to have very high adhesive strength (adhesion strength) according to Table-6.

[ example 11]

A500 mL three-necked flask was charged with a stirrer and N, N-dimethylethylenediamine (20.0 g; 0.230 mmol). The flask was placed under argon. THF (200mL) was added to the flask. A mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (8.3 g; 22.5mmol) and THF (100mL) was added dropwise. After the dropwise addition, the reaction solution was slowly heated to 90 ℃. Then, the reaction was carried out for 8 hours. Then, it was cooled to room temperature. Suction filtration through celite was performed. The filtrate was concentrated using a rotary evaporator. Then, drying under reduced pressure was performed. Thus, N' -bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine was obtained as a pale yellow oil (9.1 g; yield 86%). The obtained compound was identified by elemental analysis, NMR spectrum, MS measurement. The elemental analysis value N% was measured by using an analytical device of Perkin Elmer model 2400CHN, the NMR spectrum measurement was performed by using Bruker AC400P, and the MS was performed by using JMS-700, electron of Japan.

¹HNMR(400MHz，CDCl₃)d0.65(t，2H，CH₂CH ₂Si)，1.22(t，9H，SiOCH₂CH ₃)，1.66(quint，2H，CH₂CH ₂CH₂)，2.29(s，12H，CH₂NCH ₃)，2.57(t，4H，NHCH₂CH ₂)，3.34-3.40(m，6H，NHCH ₂CH₂)，3.82(q，6H，SiOCH ₂CH₃).

¹³CNMR(101MHz，CDCl₃)d7.7，18.2，23.1，37.7，37.9，43.2，45.1，58.2，165.5，165.9.

MS(CI+)m/z472(M+1)

Elemental analysis results: measurement value (%); c: 50.78, N: 23.61, H: 9, 45, calculated (%, in C)₂₀H_{4 4}N₈O₃A Si meter); c: 50.82, N: 23.70, H: 9.38

[ example 12]

A300 mL three-necked flask was charged with a stirrer and 1, 6-hexanediamine (46.5 g; 0.40 mol). The flask was placed under argon. THF (80g) was added to the flask. A mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (14.8 g; 0.04mol) and THF (20g) was added dropwise. After the dropwise addition, the reaction solution was slowly heated. Then, the reaction was carried out under reflux for 5 hours. Then, it was cooled to room temperature. Suction filtration through celite was performed. The filtrate was concentrated using a rotary evaporator. Then, drying under reduced pressure was performed. Thus, N' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine (TEDHDA, 19.9 g; yield 94%) was obtained as a pale yellow oil. The obtained compound was identified by elemental analysis, NMR spectrum, MS measurement. The elemental analysis value N% was measured by using an analytical device of Perkin Elmer model 2400CHN, the NMR spectrum measurement was performed by using Bruker AC400P, and the MS was performed by using JMS-700, electron of Japan.

¹HNMR(400MHz，CDCl₃)d0.66(t，2H，CH₂CH ₂Si)，1.22(t，9H，SiOCH₂CH ₃)，1.34-1.54(m，16H，CH₂-(CH ₂)₄-CH₂)，1.66(t，2H，CH ₂CH₂Si)，2.67(t，4H，CH₂CH ₂NH₂)，3.32(brs，6H，NHCH ₂CH₂)，3.81(q，6H，SiOCH ₂CH₃).

¹³CNMR(101MHz，CDCl₃)d7.7，18.2，23，1，26.6，29.8，33.8，40.5，42.1，43.2，57.86，58.2，166.1.

MS(FAB+)nm/z529(M⁺+1)

Elemental analysis results: measurement value (%); c: 54.62, N: 21.01, H: 10.01, calculated (%, in C)₂₄H₅₂N₈O₃A Si meter); c: 54.51, N: 21.19, H: 9.91

[ example 13]

A300 mL three-necked flask was charged with a stirrer and tris (2-aminoethyl) amine (29.3 g; 0.20 mmol). The flask was placed under argon. THF (40g) was added to the flask. A mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (7.8 g; 0.02mol) and THF (10g) was added dropwise. After the dropwise addition, the reaction solution was slowly heated to 90 ℃. Then, the reaction was carried out for 8 hours. Then, it was cooled to room temperature. Suction filtration through celite was performed. The filtrate was concentrated using a rotary evaporator. Then, drying under reduced pressure was performed. Thus, N' -bis {2- [ bis- (2-aminoethyl) amino ] ethyl } -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine (TEBTTA, 11.2 g; yield 95%) was obtained as a pale yellow oil. The obtained compound was identified by elemental analysis, NMR spectrum, MS measurement. The elemental analysis value N% was measured by using an analytical device of Perkin Elmer model 2400CHN, the NMR spectrum measurement was performed by using Bruker AC400P, and the MS was performed by using JMS-700, electron of Japan.

¹HNMR(400MHz，DMSO-d₆)d0.53(brs，2H，CH₂CH ₂Si)，1.06(t，8H，CH₂CH₂NH ₂)，1.13(t，9H，SiOCH₂CH ₃)，1.51(brs，2H，CH ₂NCH ₂CH ₂NH₂)，2.36-2.54(m，20H，CH ₂NCH ₂CH ₂NH₂)，3.23(m，6H，NHCH ₂CH₂)，3.72(q，6H，SiOCH ₂CH₃)，6.12-6.48(m，3H，NH)

¹³CNMR(101MHz，DMSO-d₆)d7.8，18.6，23.3，54.3，56.4，58.1，58.4，79.6，166.1.

MS(FAB+)m/z588(M+1)

Elemental analysis results: measurement value (%); c: 48.88, N: 28.55, H: 9, 47, calculated (%, in C)₂₄H_{5 6}N₁₂O₃A Si meter); c: 48.95, N: 28.54, H: 9.59

[ example 14]

A500 mL three-necked flask was charged with a stirrer and 1, 12-dodecanediamine (40.1 g; 0.20 mol). The flask was placed under argon. THF (200g) was added to the flask. A mixed solution of 6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-dichloride (7.8 g; 0.02mol) and THF (10g) was added dropwise. After the dropwise addition, the reaction solution was slowly heated. Then, the reaction was performed under reflux for 10 hours. Then, it was cooled to room temperature. Suction filtration through celite was performed. The filtrate was concentrated using a rotary evaporator. Then, drying under reduced pressure was performed. Thus, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine (TEDDDA, 13.1 g; yield 94%) was obtained as a colorless oil. The obtained compound was identified by elemental analysis, NMR spectrum, MS measurement. The elemental analysis value N% was measured by using an analytical device of Perkin Elmer model 2400CHN, the NMR spectrum measurement was performed by using Bruker AC400P, and the MS was performed by using JMS-700, electron of Japan.

¹HNMR(400MHz，CDCl₃)d0.65(t，2H，CH₂CH ₂Si)，1.20(t，9H，SiOCH₂CH ₃)，1.26-1.51(m，2H，CH₂CH ₂CH₂)，1.66(brs，2H，CH ₂CH₂Si)，2.67(t，4H，CH₂CH ₂NH₂)，3.31(brs，6H，NHCH ₂CH2)，3.82(q，6H，SiOCH ₂CH₃).

¹³CNMR(101MHz，CDCl₃)d7.6，8.7，18.2，23.126.8，29.5，30.2，33.740.5，42.1，43.16，57.358.3165.9

MS(FAB+)m/z697(M++1)

Elemental analysis results: measurement value (%); c: 54.62, N: 21.01, H: 10.01, calculated (%, in C)₂₄H₅₂N₈O₃A Si meter); c: 54.51, N: 21.19, H: 9.91

In addition, other compounds listed in the summary of the invention were synthesized in the same manner.

[ example 15]

The Cu plate used in example 5d was prepared. TEDDA (example 1), ddedh (example 2), ddeea (example 3), deeea (example 4), TEDDMA (example 11), TEDHDA (example 12), TEBTTA (example 13), tedddda (example 14) were used. The same surface treatment as in example 5 was performed.

The PP sheet used in example 7b was prepared. No treatment with compound α was performed. The substrate was ultrasonically degreased (in ethanol at 40 ℃ for 15 min). Then, washing with ethanol was performed. Next, corona discharge treatment (corona master control device manufactured by letters Gekko Co., Ltd., output voltage; 9kV (surface voltage), oscillation frequency: 20kHz, temperature: 20 ℃) was performed.

The treated Cu substrate and the untreated PP substrate of each compound were disposed to face each other with each compound film interposed therebetween. Then, pressing at 1MPa was performed. The pressing temperature was 120 ℃. The pressing time was 10 minutes.

A PI plate (PI: polyimide, カプトン, manufactured by DONG レデュポン Co.) was prepared. TEDDA (example 1), TEDHDA (example 12), TEBTTA (example 13), TEDDDA (example 14) were used. The same surface treatment as in example 5 was performed.

These treated substrates were immersed in a catalyst treatment solution (NP-8, 150mL/L, HCl, 150mL/L, manufactured by Tokamura Co., Ltd.) (temperature: 25 ℃ C., time: 1 minute). Thus, the Pd-Sn catalyst was supported on the surface. The substrate carrying the Pd-Sn catalyst was immersed in an electroless copper plating bath (100 mL/L, Through-cupperPSY-1B; 55mL/L, 18.5% formalin solution; 20mL/L) (temperature: 33 ℃ C., time: 20 minutes). Then, electroplating is performed. The electrolytic bath used in the electroplating was a Through-cupperETN bath (CuSO) manufactured by wamura ltd₄·5H₂O；80g/L，H₂SO₄；200g/L，Cl^-(ii) a 50ppm), Through-cuppierETN-1A bath (1ml/L), and Through-cuppierETN-1B bath (10 ml/L). The current is 2.5A/dm². The time period required was 60 minutes. The temperature was 25 ℃. The thickness of the copper plating film thus obtained was 30 μm.

The following measurements were carried out on the samples obtained in this example, and the results are shown in Table-7. The measurement of the bonding strength (adhesion strength) is an autostereoscopic mapper P-100 manufactured using a peeling test apparatus (shimadzu manufacturing). The peeling speed in the measurement was 5 mm/min.

TABLE-7

The samples of the present invention were judged to have very high adhesive strength (adhesion strength) according to Table-7.

The operation was carried out in the same manner as in example 1 except that ethylenediamine (11mL) was changed to ethylenediamine (7 mL). As a result, a mixture of a monomer of TEDDA and a dimer of TEDDA (see the general formula described in [0027 ]) was obtained. That is, a mixture of the monomer and the dimer was obtained (the mixing ratio was changed depending on the amount of ethylenediamine). The isolation of the dimer from the mixture is not straightforward. Surface treatment with the mixture was performed in the same manner as in example 5. The results of the surface treatment were the same as those of example 5.

The surface treatment agent of the present invention can be applied to a large number of substrates, and thus has various determinations.

Since the compound α provided on the substrate surface is highly reactive, it can be applied to various fields by utilizing the above-mentioned reaction characteristics. For example, when the compound X capable of reacting (adsorbing) with the compound α is to be provided on the substrate, the operation is also simple.

It is understood that the present invention may be applied to various fields (e.g., ornaments, circuit substrates, other composite products).

Claims (25)

1. A surface treatment method for disposing a compound alpha on a substrate by applying a solution containing the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more,

the compound alpha is a compound represented by the following general formula [ I ],

a compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Z, Q, V is a linking group; there are also instances where no linking group X, Z, Q is present, except that X, Z, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a W is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups other than }; m is at least one selected from the group consisting of Si, Al and Ti; a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, n is0, 1 or 2,

the compound alpha represented by the general formula [ I ] is a compound represented by the following general formula [ II ] or general formula [ III ],

general formula [ II ]:

{(NR¹R²)_aX-Q}_bY{NH(CH₂)_mSi(R³)_n(OR⁴)_3-n}_e

general formula [ III ]:

{(NR¹R²)_aX-Q}_bY[N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂]_e

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Q is a linking group; there are also instances where no linking group X, Q is present, except that X, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a a is an integer of 1 or more, b is 1 or 2, e is 1 or 2, b + e is 3, m is an integer of 1 or more, and n is0, 1 or 2.

2. The surface treatment method according to claim 1, wherein the amino group bonded to the terminal of the compound α is a primary amino group.

3. The surface treatment method according to claim 1, wherein the compound α is a compound represented by the following general formula [ IV ] or general formula [ V ],

general formula [ IV ]:

a general formula [ V ]:

wherein A, B, C, D is the following group:

A＝-N(R^a)R^b-Si(R^c)_n(OR^d)_3-nor-N { R^b-Si(R^c)_n(OR^d)_3-n}₂

B＝-N(R^e)R^f(NH₂)_mor-N { R^f(NH₂)_m}₂

C-A, B or-N (R)^g)R^h

D＝Rⁱ

R^a、R^e、R^gIs H or a hydrocarbyl group; r^b、R^c、R^d、R^f、R^h、RⁱIs a hydrocarbyl group; n is0, 1 or 2; m is 1 or 2.

4. A surface treatment method according to claim 3, characterized in that the compound α is at least one selected from the group consisting of: n, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) silane Yl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N '-bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N '-bis {2- [ bis- (2-aminoethyl) amino ] ethyl } -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine.

5. The surface treatment method according to any one of claims 1 to 3, wherein the M-OH group and/or the M-OH generating group is an alkoxysilyl group, wherein M represents a metal element.

6. The surface treatment method according to any one of claims 1 to 4, wherein one or more treatments selected from the group consisting of cleaning treatment, corona discharge treatment, plasma discharge treatment, ultraviolet irradiation, acid treatment, alkali treatment, steam treatment, and chemical conversion treatment are performed on the substrate before the compound α is provided on the substrate.

7. The surface treatment method according to any one of claims 1 to 4, wherein a heat treatment is performed after the compound α is provided on a substrate.

8. A surface treatment method according to any one of claims 1 to 4, characterized in that the surface treatment is for the purpose of adhesion by the compound α.

9. A surface treatment method according to any one of claims 1 to 4, wherein the surface treatment is for the purpose of chemical reaction or physical adsorption by the compound α.

10. A surface treatment method for disposing a compound alpha on a substrate by evaporation of the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more,

the compound alpha is a compound represented by the following general formula [ I ],

a compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Z, Q, V is a linking group; there are also instances where no linking group X, Z, Q is present, except that X, Z, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a W is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups other than }; m is at least one selected from the group consisting of Si, Al and Ti; a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, n is0, 1 or 2,

the compound alpha represented by the general formula [ I ] is a compound represented by the following general formula [ II ] or general formula [ III ],

general formula [ II ]:

{(NR¹R²)_aX-Q}_bY{NH(CH₂)_mSi(R³)_n(OR⁴)_3-n}_e

general formula [ III ]:

{(NR¹R²)_aX-Q}_bY[N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂]_e

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Q is a linking group; there are also instances where no linking group X, Q is present, except that X, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a a is an integer of 1 or more, b is 1 or 2, e is 1 or 2, b + e is 3, m is an integer of 1 or more, and n is0, 1 or 2.

11. The surface treatment method according to claim 10, wherein the amino group bonded to the terminal of the compound α is a primary amino group.

12. The surface treatment method according to claim 10, wherein the compound α is a compound represented by the following general formula [ IV ] or general formula [ V ],

general formula [ IV ]:

a general formula [ V ]:

wherein A, B, C, D is the following group:

A＝-N(R^a)R^b-Si(R^c)_n(OR^d)_3-nor-N { R^b-Si(R^c)_n(OR^d)_3-n}₂

B＝-N(R^e)R^f(NH₂)_mor-N { R^f(NH₂)_m}₂

C-A, B or-N (R)^g)R^h

D＝Rⁱ

R^a、R^e、R^gIs H or a hydrocarbyl group; r^b、R^c、R^d、R^f、R^h、RⁱIs a hydrocarbyl group; n is0, 1 or 2; m is 1 or 2.

13. The surface treatment method according to claim 12, wherein the compound α is at least one selected from the group consisting of: n, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) silane Yl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N '-bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N '-bis {2- [ bis- (2-aminoethyl) amino ] ethyl } -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine.

14. The surface treatment method according to any one of claims 10 to 13, wherein one or more treatments selected from the group consisting of cleaning treatment, corona discharge treatment, plasma discharge treatment, ultraviolet irradiation, acid treatment, alkali treatment, steam treatment, and chemical conversion treatment are performed on the substrate before the compound α is provided on the substrate.

15. The surface treatment method according to any one of claims 10 to 13, wherein a heat treatment is performed after the compound α is provided on a substrate.

16. The surface treatment method according to any one of claims 10 to 13, wherein the surface treatment is for the purpose of adhesion by the compound α.

17. The surface treatment method according to any one of claims 10 to 13, wherein the surface treatment is performed for the purpose of chemical reaction or physical adsorption by the compound α.

18. A surface treating agent for use in the surface treating method according to any one of claims 1 to 17,

the surface treating agent is a compound alpha, or contains the compound alpha,

the compound α contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more,

the compound alpha is a compound represented by the following general formula [ I ],

a compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Z, Q, V is a linking group; there are also instances where no linking group X, Z, Q is present, except that X, Z, Q is absent at all; y is a skeleton; the skeleton having a triazineRing (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a W is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups other than }; m is at least one selected from the group consisting of Si, Al and Ti; a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, n is0, 1 or 2,

the compound alpha represented by the general formula [ I ] is a compound represented by the following general formula [ II ] or general formula [ III ],

general formula [ II ]:

{(NR¹R²)_aX-Q}_bY{NH(CH₂)_mSi(R³)_n(OR⁴)_3-n}_e

general formula [ III ]:

{(NR¹R²)_aX-Q}_bY[N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂]_e

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Q is a linking group; there are also instances where no linking group X, Q is present, except that X, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a a is an integer of 1 or more, b is 1 or 2, e is 1 or 2, b + e is 3, m is an integer of 1 or more, and n is0, 1 or 2.

19. The surface treating agent according to claim 18, wherein the amino group bonded to the terminal of the compound α is a primary amino group.

20. The surface treating agent according to claim 18, wherein the compound α is a compound represented by the following general formula [ IV ] or general formula [ V ],

general formula [ IV ]:

a general formula [ V ]:

wherein A, B, C, D is the following group:

A＝-N(R^a)R^b-Si(R^c)_n(OR^d)_3-nor-N { R^b-Si(R^c)_n(OR^d)_3-n}₂

B＝-N(R^e)R^f(NH₂)_mor-N { R^f(NH₂)_m}₂

C-A, B or-N (R)^g)R^h

D＝Rⁱ

R^a、R^e、R^gIs H or a hydrocarbyl group; r^b、R^c、R^d、R^f、R^h、RⁱIs a hydrocarbyl group; n is0, 1 or 2; m is 1 or 2.

21. The surface treating agent according to claim 20, wherein the compound α is at least one selected from the group consisting of: n, N '-bis (2-aminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, 6- (3-triethoxysilylpropyl) amino-2, 4-dihydrazino-1, 3, 5-triazine, 2- (N, N' -bis-3-triethoxysilylpropyl) amino-4, 6-bis (2-aminoethyl) amino-1, 3, 5-triazine, 2- (2-aminoethyl) amino-4, 6-bis (3-triethoxysilylpropyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triacetoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (tribenzoyloxysilyl) propylamino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilylhexyl) amino-1, 3, 5-triazine, 6- (2-aminoethyl) amino-2, 4-bis (triethoxysilyldodecyl) amino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (methylethylketoximosilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triacetoxysilyl) silane Yl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropenoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triisopropoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (tribenzoxysilyl) propylamino-1, 3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylhexylamino) -1,3, 5-triazine, 2, 4-bis (2-aminoethyl) amino-6-bis (triethoxysilylpropyl) amino-1, 3, 5-triazine, N '-bis (2-dimethylaminoethyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (2-aminohexyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N '-bis {2- [ bis- (2-aminoethyl) amino ] ethyl } -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine, N' -bis (12-aminododecyl) -6- (3-triethoxysilylpropyl) amino-1, 3, 5-triazine-2, 4-diamine.

22. A novel compound is provided, which is a novel compound,

the compound contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more,

the compound is represented by the following general formula [ I ],

a compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Z, Q, V is a linking group; there are also instances where no linking group X, Z, Q is present, except that X, Z, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a At least one of said indirectly bound amino groups is present in a terminal position; w is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups other than }; m is at least one selected from the group consisting of Si, Al and Ti; a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, n is0, 1 or 2,

characterized in that the compound represented by the general formula [ I ] is a compound represented by the following general formula [ III ],

general formula [ III ]:

{(NR¹R²)_aX-Q}_bY[N{(CH₂)_mSi(R³)_n(OR⁴)_3-n}₂]_e

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Q is a linking group; there are also instances where no linking group X, Q is present, except that X, Q is absent at all; y is a skeleton; the framework toolHaving a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a At least one of said indirectly bound amino groups is present in a terminal position; a is an integer of 1 or more, b is 1 or 2, e is 1 or 2, b + e is 3, m is an integer of 1 or more, and n is0, 1 or 2.

23. A novel compound is provided, which is a novel compound,

the compound contains at least:

M-OH group and/or M-OH generating group, wherein M represents a metal element;

an amino group; and

the number of the triazine rings is as follows,

the M-OH group and/or M-OH generating group has one or more than one, wherein M represents a metal element,

the triazine ring has more than one triazine ring,

at least one amino group of the amino groups is indirectly bonded to C of the triazine ring,

the indirectly bound amino group is present at least in a terminal position,

the amino group at the terminal position has one or more,

the compound is represented by the following general formula [ I ],

a compound represented by the general formula [ I ]:

{(NR¹R²)_aX-Q}_bY(W)_c{Z(V-M(R³)_n(OR⁴)_3-n)}_d

in the formula, R¹、R²、R³、R⁴Is H or a functional group; r¹、R²、R³、R⁴May be the same or different; x, Z, Q, V is a linking group; there are also instances where no linking group X, Z, Q is present, except that X, Z, Q is absent at all; y is a skeleton; the skeleton has a triazine ring (C)₃N₃) (ii) a The triazine ring is not directly bonded to-NH₂、-N₃(ii) a At least one of said indirectly bound amino groups is present in a terminal position; w is { Z (V-M (R))³)_n(OR⁴)_3-n) Functional groups other than }; m is selected from the group consisting of Si, Al, TiOne is less; a is an integer of 1 or more, b is 1 or 2, c is0 or 1, d is 1 or 2, b + c + d is 3, n is0, 1 or 2,

characterized in that the compound represented by the general formula [ I ] is a compound represented by the following general formula [ IV ] or general formula [ V ],

general formula [ IV ]:

a general formula [ V ]:

wherein A, B, C, D is the following group:

A＝-N(R^a)R^b-Si(R^c)_n(OR^d)_3-nor-N { R^b-Si(R^c)_n(OR^d)_3-n}₂

B＝-N(R^e)R^f(NH₂)_mor-N { R^f(NH₂)_m}₂

C-A, B or-N (R)^g)R^h

D＝Rⁱ

R^a、R^e、R^gIs H or a hydrocarbyl group; r^b、R^c、R^d、R^f、R^h、RⁱIs a hydrocarbyl group; n is0, 1 or 2; m is 1 or 2.

24. A bonded product obtained by integrally bonding a substrate obtained by the surface treatment method according to any one of claims 1 to 17 and an adhesive body.

25. A metal film product comprising a substrate having a surface treated by the surface treatment method according to any one of claims 1 to 17 and a metal film formed on the surface of the substrate.