HK1259689B - Systems and methods for improved focus tracking using blocking structures - Google Patents
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Description
相关申请的交叉引用CROSS-REFERENCE TO RELATED APPLICATIONS
本申请要求2017年3月7日提交的美国临时申请号62/468,355的权益,该专利申请特此通过引用被全部并入本文。本申请还要求2017年5月5日提交的荷兰专利申请号N2018854的优先权,该专利申请特此通过引用被全部并入本文。This application claims the benefit of U.S. Provisional Application No. 62/468,355, filed March 7, 2017, which is hereby incorporated by reference in its entirety. This application also claims priority to Netherlands Patent Application No. N2018854, filed May 5, 2017, which is hereby incorporated by reference in its entirety.
背景background
在生物领域中的许多进步已经从改进的成像系统和技术(诸如,例如在光学显微镜和扫描仪中使用的成像系统和技术)中受益。使用这些成像系统在成像过程中获得准确的焦点对于成功的成像操作可能很重要。另外,减少与将系统聚焦在样品上相关联的时延提高了系统可以操作的速度。Many advances in the biological field have benefited from improved imaging systems and techniques, such as those used in optical microscopes and scanners. Obtaining accurate focus during imaging using these imaging systems can be important for successful imaging operations. Additionally, reducing the time delay associated with focusing the system on a sample increases the speed at which the system can operate.
许多早已存在的扫描系统使用多光束聚焦跟踪系统来确定对于给定样品的焦点距离。多光束系统使用物镜将两个光束聚焦到样品上。聚焦光束从样品的表面反射,且反射光束指向图像传感器。反射光束在图像传感器上形成光斑,且在光斑之间的距离可用于确定焦点距离。Many existing scanning systems use multi-beam focus tracking systems to determine the focal distance for a given sample. Multi-beam systems use an objective lens to focus two beams onto the sample. The focused beams reflect off the sample's surface, and the reflected beams are directed toward an image sensor. The reflected beams form light spots on the image sensor, and the distance between the light spots can be used to determine the focal distance.
早已存在的系统的设计者不断地努力提高聚焦准确度和系统可确定聚焦设置的速度。提高准确度可能很重要,因为它可以允许系统实现更好的结果。减少时延可能是一个重要的考虑因素,因为它可以允许系统更快地实现焦点确定,从而允许系统更快地完成扫描操作。Designers of existing systems continually strive to improve focus accuracy and the speed at which the system can determine a focus setting. Improving accuracy can be important because it allows the system to achieve better results. Reducing latency can be an important consideration because it allows the system to determine focus more quickly, thereby allowing the system to complete scanning operations more quickly.
概述Overview
本文公开的技术的各种示例提供了用于提高光学系统中的聚焦跟踪的准确度的系统和方法。另外的示例提供了用于减少与光学扫描仪中的聚焦跟踪相关联的时延的系统和方法。在一些示例中,提供用于改进或减少与光学扫描仪中的聚焦跟踪相关联的时延的系统和方法。Various examples of the technology disclosed herein provide systems and methods for improving the accuracy of focus tracking in optical systems. Additional examples provide systems and methods for reducing the latency associated with focus tracking in optical scanners. In some examples, systems and methods are provided for improving or reducing the latency associated with focus tracking in optical scanners.
在一些示例中,光学阻挡结构包括:界定孔径的框架;第一和第二细长结构构件,每个细长结构构件包括第一和第二端,使得第一和第二细长结构构件在它们的第一端处连接到孔径的相对侧,且进一步使得第一和第二细长结构构件从框架平行于彼此并在与彼此相同的方向上延伸;以及光学不透明阻挡构件,其定位成在第一和第二阻挡构件的各自的第二端之间延伸。In some examples, the optical blocking structure includes: a frame defining an aperture; first and second elongated structural members, each elongated structural member including a first and a second end, such that the first and second elongated structural members are connected to opposite sides of the aperture at their first ends, and further such that the first and second elongated structural members extend from the frame parallel to each other and in the same direction as each other; and an optically opaque blocking member positioned to extend between respective second ends of the first and second blocking members.
仅作为另一示例,阻挡构件的前表面可形成阻挡面,该阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二表面的反射光束。此外,仅作为另一示例,光学阻挡结构可被设计尺寸以布置成相邻于光束分离器,以及阻挡构件的后表面布置在相对于框架的平面成角度的平面中,进一步使得角度被选择,其中阻挡构件的后表面实质上平行于光束分离器的面。在一些实例中,阻挡构件的后表面的宽度可以在大约2mm和7mm之间。此外,仅作为示例,阻挡构件的后表面可以具有被选择来阻挡来自样品容器的第二表面的反射光束而不与从S2和S3表面反射的光束干涉的宽度。在另外的示例中,阻挡构件的后表面的宽度是被选择来阻挡来自样品容器的第二表面的反射光束而不与从表面S2、S3反射的光束干涉的宽度。As just another example, the front surface of the blocking member may form a blocking surface sized to block a light beam reflected from a first surface of a sample container in an imaging system without blocking a light beam reflected from a second surface of the sample container. Furthermore, as just another example, the optical blocking structure may be sized to be positioned adjacent to the beam splitter, with the rear surface of the blocking member positioned in a plane angled relative to the plane of the frame, further such that the angle is selected such that the rear surface of the blocking member is substantially parallel to a plane of the beam splitter. In some instances, the width of the rear surface of the blocking member may be between approximately 2 mm and 7 mm. Furthermore, as just another example, the rear surface of the blocking member may have a width selected to block a light beam reflected from the second surface of the sample container without interfering with light beams reflected from surfaces S2 and S3. In another example, the width of the rear surface of the blocking member is selected to block a light beam reflected from the second surface of the sample container without interfering with light beams reflected from surfaces S2 and S3.
此外,在另外的示例中,光学阻挡结构可被设计尺寸用于与扫描系统协作来使用,所述扫描系统使被包含在可包括四个反射表面的多层样品容器中的样品成像,并进一步使得阻挡构件的后表面形成阻挡面,阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二和第三表面的反射光束。仅作为另一示例,光学阻挡结构可被设计尺寸以具有三角形横截面。Furthermore, in another example, the optical blocking structure may be sized for use in conjunction with a scanning system that images a sample contained in a multi-layer sample container that may include four reflective surfaces, with the rear surface of the blocking member further forming a blocking surface sized to block reflected light beams from a first surface of the sample container in the imaging system without blocking reflected light beams from second and third surfaces of the sample container. As just another example, the optical blocking structure may be sized to have a triangular cross-section.
在其他示例中,光学阻挡结构可包括界定孔径的框架,使得孔径被设计尺寸以在宽度上从大约20mm到40mm和在高度上从大约15mm到30mm;第一结构构件可包括界定细长主体的第一端和第二端,该细长主体被设计尺寸以在长度上在大约20mm和30mm之间;第二结构构件可包括界定第二细长主体的第一端和第二端,该细长主体被设计尺寸以在长度上在大约20mm和30mm之间,使得第一和第二结构构件在它们的第一端处连接到孔径的相对侧,其中第一和第二结构构件从框架平行于彼此并在与彼此相同的方向上延伸;以及光学不透明阻挡构件,其定位成在第一和第二阻挡构件的各自的第二端之间延伸,光学不透明阻挡构件被设计尺寸以在宽度上在大约1mm和20mm之间。In other examples, the optical blocking structure may include a frame defining an aperture, such that the aperture is sized to be from approximately 20 mm to 40 mm in width and from approximately 15 mm to 30 mm in height; a first structural member may include a first end and a second end defining a slender body, the slender body being sized to be between approximately 20 mm and 30 mm in length; a second structural member may include a first end and a second end defining a second slender body, the slender body being sized to be between approximately 20 mm and 30 mm in length, such that the first and second structural members are connected to opposite sides of the aperture at their first ends, wherein the first and second structural members extend from the frame parallel to each other and in the same direction as each other; and an optically opaque blocking member positioned to extend between respective second ends of the first and second blocking members, the optically opaque blocking member being sized to be between approximately 1 mm and 20 mm in width.
仅作为示例,阻挡构件的前表面可形成阻挡面,该阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二表面的反射光束。此外,仅作为另一示例,光学阻挡结构可被设计尺寸以布置成相邻于光束分离器,以及阻挡构件的后表面布置在相对于框架的平面成角度的平面中,进一步地,其中角度被选择,使得阻挡构件的后表面实质上平行于光束分离器的面。By way of example only, a front surface of the blocking member may form a blocking surface that is dimensioned to block a reflected light beam from a first surface of a sample container in an imaging system without blocking a reflected light beam from a second surface of the sample container. Furthermore, by way of another example only, the optical blocking structure may be dimensioned to be disposed adjacent to a beam splitter, with the rear surface of the blocking member disposed in a plane that is angled relative to the plane of the frame, further wherein the angle is selected such that the rear surface of the blocking member is substantially parallel to a face of the beam splitter.
在一些示例中,阻挡构件的后表面的宽度可以是被选择来阻挡来自样品容器的第二表面的反射光束而不与从S2和S3表面反射的光束干涉的宽度。在一些实例中,仅作为示例,光学阻挡结构可被设计尺寸用于与扫描系统协作来使用,所述扫描系统使被包含在可包括四个反射表面的多层样品容器中的样品成像,并进一步使得阻挡构件的后表面可形成阻挡面,该阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二和第三表面的反射光束。此外,光学阻挡结构可被设计尺寸以具有三角形横截面。In some examples, the width of the rear surface of the blocking member can be selected to block the reflected light beam from the second surface of the sample container without interfering with the light beams reflected from the S2 and S3 surfaces. In some instances, by way of example only, the optical blocking structure can be sized for use in conjunction with a scanning system that images a sample contained in a multi-layer sample container that may include four reflective surfaces, and further such that the rear surface of the blocking member can form a blocking surface sized to block the reflected light beam from the first surface of the sample container in the imaging system without blocking the reflected light beams from the second and third surfaces of the sample container. Additionally, the optical blocking structure can be sized to have a triangular cross-section.
在一些示例中,也可公开一种成像系统,其中成像系统包括激光光源;差分分离窗口,其将从光源发射的光分成多个平行光束;样品容器,其可包括布置在基底上处于接触关系中的第一、第二和第三层,这些层包括在样品容器的第一层处的第一反射表面、在第一和第二层之间的第二反射表面、在第二和第三层之间的第三反射表面以及在第三层和基底之间的第四反射表面;物镜,其定位成将来自光源的光聚焦到第二和第三反射表面的至少一个上并接收从样品容器反射的光;图像传感器,其包括定位成接收从样品容器反射的光的多个像素位置;第一阻挡结构,其定位成阻止来自第一表面的反射到达图像传感器;以及第二阻挡结构,其定位成阻止来自第四表面的反射到达图像传感器。In some examples, an imaging system may also be disclosed, wherein the imaging system includes a laser light source; a differential separation window that separates light emitted from the light source into a plurality of parallel light beams; a sample container that may include first, second, and third layers arranged in a contacting relationship on a substrate, the layers including a first reflective surface at the first layer of the sample container, a second reflective surface between the first and second layers, a third reflective surface between the second and third layers, and a fourth reflective surface between the third layer and the substrate; an objective lens positioned to focus light from the light source onto at least one of the second and third reflective surfaces and receive light reflected from the sample container; an image sensor that includes a plurality of pixel positions positioned to receive light reflected from the sample container; a first blocking structure positioned to prevent reflections from the first surface from reaching the image sensor; and a second blocking structure positioned to prevent reflections from the fourth surface from reaching the image sensor.
作为示例,成像系统还可包括布置在成像系统的在物镜和图像传感器之间的光学返回路径中的分离器,进一步使得第二阻挡结构定位在返回光学路径中以在分离器的输出处阻挡来自第四表面的反射。As an example, the imaging system may further include a splitter arranged in an optical return path of the imaging system between the objective lens and the image sensor, further such that the second blocking structure is positioned in the return optical path to block reflections from the fourth surface at an output of the splitter.
在额外的示例中,第二阻挡结构还可包括:界定孔径的框架;第一和第二细长结构构件,每个细长结构构件包括第一和第二端,使得第一和第二细长结构构件在它们的第一端处连接到孔径的相对侧,且进一步使得第一和第二细长结构构件从框架平行于彼此并在与彼此相同的方向上延伸;以及光学不透明阻挡构件,其定位成在第一和第二阻挡构件的各自的第二端之间延伸。此外,在一些实例中,阻挡构件的前表面可形成阻挡面,该阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二表面的反射光束。在额外的实例中,仅作为另一示例,第二阻挡结构可被设计尺寸以布置成相邻于光束分离器,以及阻挡构件的后表面可布置在相对于框架的平面成角度的平面中,进一步使得角度被选择,其中阻挡构件的后表面实质上平行于光束分离器的面。In an additional example, the second blocking structure may further include: a frame defining the aperture; first and second elongated structural members, each elongated structural member including a first and a second end, such that the first and second elongated structural members are connected to opposite sides of the aperture at their first ends, and further such that the first and second elongated structural members extend from the frame parallel to and in the same direction as each other; and an optically opaque blocking member positioned to extend between the respective second ends of the first and second blocking members. Furthermore, in some examples, a front surface of the blocking member may form a blocking surface dimensioned to block a reflected beam from a first surface of a sample container in the imaging system without blocking a reflected beam from a second surface of the sample container. In an additional example, and by way of further example only, the second blocking structure may be dimensioned to be disposed adjacent to the beam splitter, and a rear surface of the blocking member may be disposed in a plane angled relative to the plane of the frame, further such that the angle is selected such that the rear surface of the blocking member is substantially parallel to a face of the beam splitter.
仅作为示例,第二阻挡结构的后表面的宽度可以在大约2mm和7mm之间。此外,仅作为另一示例,第二阻挡结构可被设计尺寸用于与扫描系统协作来使用,所述扫描系统使被包含在可包括四个反射表面的多层样品容器中的样品成像,并进一步使得阻挡构件的后表面形成阻挡面,该阻挡面被设计尺寸以阻挡来自在成像系统中的样品容器的第一表面的反射光束且不阻挡来自样品容器的第二和第三表面的反射光束。By way of example only, the width of the rear surface of the second blocking structure may be between approximately 2 mm and 7 mm. Furthermore, by way of another example only, the second blocking structure may be sized for use in conjunction with a scanning system that images a sample contained in a multi-layer sample container that may include four reflective surfaces, and further such that the rear surface of the blocking member forms a blocking surface sized to block reflected light beams from a first surface of the sample container in the imaging system without blocking reflected light beams from second and third surfaces of the sample container.
此外,第一阻挡结构可包括孔径,其被设计尺寸以阻挡来自样品容器的第一表面的反射光束并允许从样品容器的第二和第三表面反射的光束通过孔径。Additionally, the first blocking structure may include an aperture sized to block the reflected light beam from the first surface of the sample container and to allow the light beams reflected from the second and third surfaces of the sample container to pass through the aperture.
从结合附图采用的下面的详细描述中,所公开的示例的其它特征和方面将变得明显,附图作为示例示出根据本发明的示例的特征。该概述并非旨在限制本发明的范围,本发明的范围仅由其所附的权利要求限定。Other features and aspects of the disclosed examples will become apparent from the following detailed description taken in conjunction with the accompanying drawings, which illustrate, by way of example, features of examples according to the invention. This summary is not intended to limit the scope of the invention, which is defined solely by the claims appended hereto.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
参考以下附图详细描述根据一个或更多个示例实现的本文公开的技术。这些附图被提供以便于读者理解所公开的技术,并且没有被规定为穷尽的或将本公开限制到所公开的精确形式。实际上,在附图中的图仅为了说明的目的而被提供,并且仅描绘所公开的技术的示例实现。此外,应注意,为了说明的清楚和容易,附图中的元件不一定按比例绘制。The technology disclosed herein, implemented according to one or more examples, is described in detail with reference to the following figures. These figures are provided to facilitate the reader's understanding of the disclosed technology and are not intended to be exhaustive or to limit the disclosure to the precise forms disclosed. Indeed, the figures in the accompanying drawings are provided for illustrative purposes only and depict only example implementations of the disclosed technology. In addition, it should be noted that for clarity and ease of illustration, the elements in the drawings are not necessarily drawn to scale.
本文包括的一些附图从不同的视角示出所公开技术的各种示例。尽管附随的描述性文本可以将这样的视图称为“顶”、“底”或“侧”视图,但这样的参考仅仅是描述性的,并且不暗示或要求所公开的技术在特定的空间定向上被实现或使用,除非另外明确地说明。Some of the drawings included herein show various examples of the disclosed technology from different perspectives. Although the accompanying descriptive text may refer to such views as "top," "bottom," or "side" views, such references are merely descriptive and do not imply or require that the disclosed technology be implemented or used in a specific spatial orientation unless explicitly stated otherwise.
图1示出图像扫描系统的一个示例的简化框图,本文公开的系统和方法可以使用该图像扫描系统来实现。FIG1 shows a simplified block diagram of one example of an image scanning system with which the systems and methods disclosed herein may be implemented.
图2A和图2B示出用于聚焦跟踪的示例光学系统。特别地,图2A示出根据本文描述的系统和方法的一个示例实现的用于聚焦跟踪的示例光学设计。图2B是示出在图2A中显示的光学系统的一部分的可选视图的示意图。Figures 2A and 2B illustrate example optical systems for focus tracking. In particular, Figure 2A illustrates an example optical design for focus tracking according to one example implementation of the systems and methods described herein. Figure 2B is a schematic diagram illustrating an alternative view of a portion of the optical system shown in Figure 2A.
图3A示出包括多个层的被配置为容纳一个或更多个待成像的样品的样品容器的示例。FIG. 3A illustrates an example of a sample container including multiple layers configured to hold one or more samples to be imaged.
图3B是示出在一些环境中来自多层样品容器的多个表面的期望和不需要的反射的创建的示例的图。3B is a diagram illustrating an example of the creation of desired and unwanted reflections from multiple surfaces of a multi-layered sample container in some environments.
图3C是示出在图像传感器上的不需要的反射的影响的示例的图。FIG. 3C is a graph illustrating an example of the effects of unwanted reflections on an image sensor.
图3D是示出根据本文公开的技术的示例应用的、作为阻挡结构的放置的结果的在图像传感器处的噪声的减少的图。3D is a graph illustrating the reduction of noise at an image sensor as a result of placement of a blocking structure according to an example application of the techniques disclosed herein.
图4A示出根据本文描述的系统和方法的一个示例性实现的、包括聚焦跟踪光束被引导到其上的多个像素(为了图示的清楚而未示出)的图像传感器的一部分。4A illustrates a portion of an image sensor including a plurality of pixels (not shown for clarity of illustration) onto which a focus tracking beam is directed, according to one exemplary implementation of the systems and methods described herein.
图4B是示出使用被调整以沿着聚焦跟踪光束的光路定位光束腰的准直透镜,以不同聚焦设置从S2和S3表面反射到图像传感器上的左和右聚焦光束的强度的图。4B is a graph showing the intensities of left and right focused beams reflected from the S2 and S3 surfaces onto the image sensor at different focus settings using a collimating lens adjusted to position the beam waist along the optical path of the focused tracking beam.
图4C是示出使用被调节以沿聚焦跟踪光束的光路更优化地定位在光束腰处的准直透镜在不同聚焦设置下从S2和S3表面反射到图像传感器上的左和右聚焦光束的强度的图。4C is a graph showing the intensities of left and right focused beams reflected from the S2 and S3 surfaces onto the image sensor at different focus settings using a collimating lens adjusted to be more optimally positioned at the beam waist along the optical path of the focused tracking beam.
图5A是示出被实现为使聚焦跟踪光束会聚在样品平面上并被聚焦到图像传感器上的透镜的示例的图。FIG. 5A is a diagram illustrating an example of a lens implemented to cause a focus tracking beam to converge on a sample plane and be focused onto an image sensor.
图5B是示出被实现为使聚焦跟踪光束会聚到图像传感器上的屋脊棱镜的示例的图。FIG. 5B is a diagram illustrating an example of a roof prism implemented to converge a focus tracking beam onto an image sensor.
图6是示出包括定位成将聚焦跟踪光束的光束腰放置在选定位置处的透镜的示例配置的图。6 is a diagram illustrating an example configuration including lenses positioned to place the beam waist of a focused tracking beam at a selected location.
图7是示出聚焦跟踪系统的示例的图,本文所述的系统和方法可使用该聚焦跟踪系统来实现。7 is a diagram illustrating an example of a focus tracking system with which the systems and methods described herein may be implemented.
图8和图9是示出在一个示例中的反射聚焦跟踪光束的空间关系的图。8 and 9 are diagrams illustrating the spatial relationship of reflected focus tracking beams in one example.
图10是示出阻挡来自S4表面的左和右聚焦跟踪光束的反射的光束阻挡器的示例放置的图。10 is a diagram showing example placement of beam blocks that block reflections of the left and right focus tracking beams from the S4 surface.
图11和图12是示出在图7的示例配置中的光束分离器处的反射聚焦跟踪光束的空间关系的图,光束阻挡器如图10所示被放置。11 and 12 are diagrams showing the spatial relationship of reflected focus tracking beams at the beam splitter in the example configuration of FIG. 7 , with the beam blocker positioned as shown in FIG. 10 .
图13和图14示出在一个示例中从顶部潜望镜和光束分离器反射的光束。13 and 14 show light beams reflected from a top periscope and a beam splitter in one example.
图15A是示出自物镜返回并指向分离器的从表面S2和S4反射的聚焦跟踪光束的示例的自顶向下视图。15A is a top-down view showing an example of focus tracking beams reflected from surfaces S2 and S4 returning from the objective lens and directed toward the splitter.
图15B是图15A的特写视图,其示出如何可以通过阻挡构件在分离器的后表面处阻挡S4反射光束。FIG. 15B is a close-up view of FIG. 15A , illustrating how the S4 reflected beam can be blocked at the rear surface of the splitter by a blocking member.
图15C是示出位于分离器的后表面处的阻挡构件的示例的自顶向下视图的图。15C is a diagram illustrating a top-down view of an example of a blocking member located at the rear surface of a separator.
图15D是示出在分离器处的反射聚焦跟踪光束的光束路径中的4mm宽阻挡结构的表示的图。15D is a diagram showing a representation of a 4 mm wide blocking structure in the beam path of the reflected focus tracking beam at the splitter.
图16A和图16B是示出根据参考图8-10描述的示例实现的、可用于阻挡在滤波器/分离器处的S4反射的光束阻挡器的示例的图。16A and 16B are diagrams illustrating examples of beam blockers that may be used to block S4 reflections at a filter/splitter according to the example implementations described with reference to FIGs. 8-10.
图17A呈现在一个示例中安装在光束分离器处的光束阻挡器的剖视图。17A presents a cross-sectional view of a beam block installed at a beam splitter in one example.
图17B呈现安装在光束分离器处的光束阻挡器的后视图。FIG17B presents a rear view of a beam block mounted at the beam splitter.
图18A示出可用于阻挡从S1表面反射的光束的孔径的示例。FIG. 18A shows an example of an aperture that may be used to block a light beam reflected from the S1 surface.
图18B示出在垂直于光束轴的光束分离器前面的孔径的示例放置。FIG18B shows an example placement of an aperture in front of a beam splitter perpendicular to the beam axis.
图19示出来自顶部潜望镜处的用于聚焦在样品的顶部处的光束的光斑。FIG19 shows the light spot from the top periscope for the beam focused at the top of the sample.
图20示出来自顶部潜望镜处的用于聚焦在样品的底部处的光束的光斑。FIG20 shows the light spot from the top periscope for the beam focused at the bottom of the sample.
图21示出当聚焦于S2时用于在捕获范围的顶部处成像的S2、S3反射光束的在摄像机处的光斑。FIG. 21 shows the spots at the camera for the S2 , S3 reflected beams for imaging at the top of the capture range when focusing on S2 .
图22示出当聚焦于S2时用于在捕获范围的底部处成像的S2、S3反射光束的在摄像机处的光斑。FIG. 22 shows the light spots at the camera for the S2 , S3 reflected light beams for imaging at the bottom of the capture range when focusing on S2 .
图23示出当聚焦于S3时用于在捕获范围的顶部处成像的S2、S3反射光束的在摄像机处的光斑。FIG. 23 shows the spots at the camera of the S2 , S3 reflected beams for imaging at the top of the capture range when focusing on S3 .
图24示出当聚焦于S3时用于在捕获范围的底部处成像的S2、S3反射光束的在摄像机处的光斑。FIG. 24 shows the light spots at the camera of the S2 , S3 reflected light beams for imaging at the bottom of the capture range when focusing on S3 .
图25A示出在一个示例中在激光二极管在激光发射模式中操作的情况下的、图像传感器上的光束光斑中的光斑边缘变化。FIG. 25A shows, in one example, spot edge variation in a beam spot on an image sensor with a laser diode operating in a laser emission mode.
图25B示出在一个示例中在激光二极管在低功率模式中操作的情况下的、图像传感器上的光束光斑中的光斑剖面。FIG. 25B shows a spot profile in a beam spot on an image sensor with the laser diode operating in a low power mode in one example.
图26是示出在ASE模式中操作的激光二极管的示例的图。FIG. 26 is a diagram illustrating an example of a laser diode operating in an ASE mode.
图27是示出在激光发射模式中操作的激光二极管的示例的图。FIG. 27 is a diagram illustrating an example of a laser diode operating in a laser emission mode.
图28是示出在混合模式中操作的激光二极管的示例的图。FIG. 28 is a diagram illustrating an example of a laser diode operating in a hybrid mode.
图29示出当激光二极管被提供动力以在激光发射模式中操作时光斑尺寸的不稳定性。FIG. 29 illustrates the instability of the spot size when the laser diode is powered to operate in the lasing mode.
图30A示出在激光二极管在混合模式中操作的情况下的光斑移动的示例。FIG. 30A shows an example of spot movement in a case where a laser diode operates in a hybrid mode.
图30B示出在激光二极管在混合模式中操作的情况下的光斑移动的示例。FIG. 30B shows an example of spot movement in a case where the laser diode operates in hybrid mode.
图31是示出被测试以确定在5%处的光谱宽和设定功率之间的关系的各种激光源的光谱宽的示例的图。FIG. 31 is a graph showing examples of spectral widths of various laser sources that were tested to determine the relationship between the spectral width at 5% and the set power.
应该理解,所公开的技术可以在修改和变更的情况下被实施,并且所公开的技术仅由权利要求及其等同物限制。It should be understood that the disclosed technology can be practiced with modification and alteration and that the disclosed technology is limited only by the claims and their equivalents.
详细描述Detailed description
本文公开的技术的各种示例实现提供了用于增加或减少与在光学扫描仪中的聚焦跟踪相关联的时延的系统和方法。各种附加示例提供了用于提高在光学扫描仪中的聚焦跟踪系统的准确度的系统和方法。又一些另外的示例组合这两者的方面。例如,在一些示例中,提供系统和方法以阻止由来自样品容器的不需要的反射引起的杂散光到达图像传感器并阻碍聚焦跟踪光束的检测。在一些应用中,用于扫描系统的样品容器可以包括夹在两个或更多个其他层之间的样品层。在这样的应用中,由多层样品容器呈现的表面可以每个使反射光束回到物镜并进入扫描系统的返回路径中。在一些情况下可能比来自样品层的反射强得多的不需要的反射可降低在图像传感器处的信噪比,使其难以在所有其他光学噪声中检测实际聚焦跟踪光束。不需要的反射或散射光束也可能与在图像传感器处的聚焦跟踪光斑重叠并与聚焦跟踪光斑相干干涉,并使边缘出现,从而降低聚焦跟踪的准确性。本文公开的系统和方法的示例可以在沿着返回信号路径的一个或更多个点处放置孔径、阻挡条或其他阻挡构件,以提供光学不透明结构以阻止从其他表面反射的不需要的光束到达图像传感器。Various example implementations of the technology disclosed herein provide systems and methods for increasing or decreasing the latency associated with focus tracking in an optical scanner. Various additional examples provide systems and methods for improving the accuracy of a focus tracking system in an optical scanner. Still other examples combine aspects of both. For example, in some examples, systems and methods are provided to prevent stray light caused by unwanted reflections from a sample container from reaching an image sensor and obstructing detection of a focus tracking beam. In some applications, a sample container for a scanning system may include a sample layer sandwiched between two or more other layers. In such applications, the surfaces presented by the multi-layered sample container may each reflect a light beam back toward the objective lens and into the return path of the scanning system. Unwanted reflections, which in some cases may be much stronger than reflections from the sample layer, can reduce the signal-to-noise ratio at the image sensor, making it difficult to detect the actual focus tracking beam amidst all the other optical noise. Unwanted reflections or scattered light beams may also overlap with and coherently interfere with the focus tracking spot at the image sensor, causing edges to appear, thereby reducing focus tracking accuracy. Examples of the systems and methods disclosed herein may place apertures, blocking bars, or other blocking members at one or more points along the return signal path to provide an optically opaque structure to block unwanted light beams reflected from other surfaces from reaching the image sensor.
作为另一示例,另外的配置可以包括光学结构,诸如在光路中的透镜或其他弯曲或部分弯曲的光学元件,以使聚焦跟踪激光束成形。在各种示例中,这可以通过将光学元件插在物镜之前的光路中以将光束腰定位在系统内来实现。更具体地,在一些实现中,光学元件定位于在离光纤的输出端确定的距离处的光路中,以便将一个或更多个聚焦跟踪光束的光束腰放置在沿着光路的期望定位处。光束腰沿着光路的位置可以被选择使得来自从样品容器的多个感兴趣表面反射的聚焦跟踪光束的因而产生的光斑在图像传感器平面处是彼此相同尺寸或实质上相同的尺寸以提高聚焦跟踪准确度和时延。在另外的实现中,可以提供调整机构来调整光学元件的定位以用于沿着光路的光束腰的最佳放置。As another example, additional configurations may include optical structures, such as lenses or other curved or partially curved optical elements in the optical path, to shape the focus tracking laser beam. In various examples, this may be achieved by inserting an optical element in the optical path before the objective lens to position the beam waist within the system. More specifically, in some implementations, the optical element is positioned in the optical path at a determined distance from the output end of the optical fiber so as to place the beam waist of one or more focus tracking beams at a desired location along the optical path. The position of the beam waist along the optical path may be selected so that the resulting spots of focus tracking beams reflected from multiple surfaces of interest of the sample container are the same size or substantially the same size as each other at the image sensor plane to improve focus tracking accuracy and latency. In additional implementations, an adjustment mechanism may be provided to adjust the positioning of the optical element for optimal placement of the beam waist along the optical path.
作为又一个示例,其他实现包括用于聚焦跟踪光束的光源的配置和调整。更具体地,一些示例可以被配置为调整和设置激光二极管源操作的功率水平,以减少在图像传感器上的聚焦跟踪光束光斑的边缘通量并提供更稳定和一致的光斑放置。可以设置激光器的功率水平,使得激光二极管在准激光发射模式或混合模式中操作,组合ASE操作模式和激光发射操作模式的方面。功率水平可以被设置在如下范围内:其高端低于激光二极管在其处发射具有单个主谱峰和可忽略的副峰的、通常被认为是高度相干的光的功率,且其低端高于激光器在其处完全发射也称为放大式自发辐射(ASE)的暂时不相干的光的功率。As yet another example, other implementations include configuration and adjustment of a light source for a focus tracking beam. More specifically, some examples may be configured to adjust and set the power level at which a laser diode source operates to reduce the edge flux of the focus tracking beam spot on the image sensor and provide a more stable and consistent spot placement. The power level of the laser may be set so that the laser diode operates in a quasi-laser emission mode or a hybrid mode, combining aspects of an ASE mode of operation and a laser emission mode of operation. The power level may be set within a range where the high end is lower than the power at which the laser diode emits light having a single main spectral peak and negligible side peaks, which is generally considered to be highly coherent, and the low end is higher than the power at which the laser fully emits temporarily incoherent light also known as amplified spontaneous emission (ASE).
在描述本文公开的系统和方法的另外的示例之前,描述示例环境是有用的,系统和方法可以使用该示例环境来实现。一个这样的示例环境是诸如图中所示出的图像扫描系统的环境。示例成像扫描系统可以包括用于获取或产生区域的图像的设备。在图1中概述的示例显示了背光设计实现的示例成像配置。Before describing additional examples of the systems and methods disclosed herein, it is useful to describe an example environment in which the systems and methods can be implemented. One such example environment is an environment of an image scanning system such as that shown in the figures. An example imaging scanning system may include a device for acquiring or generating an image of an area. The example outlined in FIG1 shows an example imaging configuration for a backlight design implementation.
如在图1的示例中可以看到的,受试者样品定位于样品容器110上,该样品容器110位于在物镜142下方的样品台170上。光源160和相关联的光学器件将光(诸如激光)的光束引导到在样品容器110上的选定样品定位。样品发荧光并且因而得到的光被物镜142收集并被引导至光检器140以检测荧光。样品台170相对于物镜142移动,以将在样品容器110上的下一个样品定位放置在物镜142的焦点处。样品台110相对于物镜142的移动可以通过移动样品台本身、物镜、整个光学台或前述项的任何组合来实现。另外的示例还可以包括在静止样品之上移动整个成像系统。As can be seen in the example of FIG1 , a subject sample is positioned on a sample container 110, which is located on a sample stage 170 below an objective lens 142. A light source 160 and associated optics direct a beam of light (such as a laser) to a selected sample position on the sample container 110. The sample fluoresces and the resulting light is collected by the objective lens 142 and directed to a light detector 140 to detect the fluorescence. The sample stage 170 moves relative to the objective lens 142 to place the next sample position on the sample container 110 at the focal point of the objective lens 142. Movement of the sample stage 110 relative to the objective lens 142 can be achieved by moving the sample stage itself, the objective lens, the entire optical table, or any combination of the foregoing. Additional examples may also include moving the entire imaging system over a stationary sample.
流体输送模块或设备100将试剂(例如,荧光核苷酸、缓冲液、酶、裂解试剂等)的流引导至(并穿过)样品容器110和腰阀(waist valve)120。在特定的示例中,样品容器110可以被实现为包括在样品容器110上的多个样品定位处的核酸序列簇的流动池。待测序的样品可以连同其他可选组分一起附着到流动池的基底上。The fluid delivery module or device 100 directs the flow of reagents (e.g., fluorescent nucleotides, buffers, enzymes, lysis reagents, etc.) to (and through) a sample container 110 and a waist valve 120. In a particular example, the sample container 110 can be implemented as a flow cell comprising nucleic acid sequence clusters at multiple sample locations on the sample container 110. The sample to be sequenced can be attached to the base of the flow cell along with other optional components.
该系统还包括温度站致动器130和加热器/冷却器135,其可以可选地调节在样品容器110内的流体的条件的温度。可以包括摄像机系统140以监测和跟踪样品容器110的测序。摄像机系统140可以例如被实现为CCD摄像机,其可以与在滤波器切换组件145内的各种滤波器、物镜142和聚焦激光器/聚焦激光组件150相互作用。摄像机系统140不限于CCD摄像机,并且可以使用其他摄像机和图像传感器技术。The system also includes a temperature station actuator 130 and a heater/cooler 135, which can optionally adjust the temperature of the condition of the fluid within the sample container 110. A camera system 140 can be included to monitor and track the sequencing of the sample container 110. The camera system 140 can be implemented, for example, as a CCD camera, which can interact with various filters within the filter switching assembly 145, the objective lens 142, and the focus laser/focus laser assembly 150. The camera system 140 is not limited to a CCD camera, and other camera and image sensor technologies can be used.
可以包括光源160(例如,在可选地包括多个激光器的组件内的激发激光器)或其他光源,以经由通过光纤接口161(其可以可选地包括一个或更多个再成像透镜、光纤装备等)的照明来对在样品内的荧光测序反应进行照明。低瓦特灯165、聚焦激光器150和反向二色性镜185也呈现在所示示例中。在一些示例中,聚焦激光器150可以在成像期间关闭。在其他示例中,可选的聚焦配置可以包括第二聚焦摄像机(未示出),该第二聚焦摄像机可以是象限检测器、位置敏感检测器(PSD)或类似的检测器以与数据收集并行地测量从表面反射的散射光束的定位。A light source 160 (e.g., an excitation laser within an assembly that optionally includes multiple lasers) or other light source can be included to illuminate the fluorescent sequencing reaction within the sample via illumination through a fiber optic interface 161 (which can optionally include one or more re-imaging lenses, fiber optic equipment, etc.). A low-watt lamp 165, a focusing laser 150, and an inverted dichroic mirror 185 are also presented in the illustrated example. In some examples, the focusing laser 150 can be turned off during imaging. In other examples, an optional focusing configuration can include a second focusing camera (not shown), which can be a quadrant detector, a position sensitive detector (PSD), or similar detector to measure the location of the scattered light beam reflected from the surface in parallel with data collection.
虽然被示为背光设备,但是其他示例可以包括来自激光器或其他光源的光,其通过物镜142被引导到在样品容器110上的样品上。样品容器110可以最终安装在样品台170上,以提供样品容器110相对于物镜142的移动和对准。样品台可以具有一个或更多个致动器,以允许它在三个维度中的任何一个维度中移动。例如,从笛卡尔坐标系方面来说,可以提供致动器以允许台相对于物镜在X、Y和Z方向上移动。这可以允许在样品容器110上的一个或更多个样品定位被放置成与物镜142光学对准。Although shown as a backlight device, other examples may include light from a laser or other light source that is directed through the objective lens 142 onto the sample on the sample container 110. The sample container 110 may ultimately be mounted on a sample stage 170 to provide movement and alignment of the sample container 110 relative to the objective lens 142. The sample stage may have one or more actuators to allow it to move in any one of three dimensions. For example, in terms of a Cartesian coordinate system, actuators may be provided to allow the stage to move in the X, Y, and Z directions relative to the objective lens. This may allow one or more sample locations on the sample container 110 to be placed in optical alignment with the objective lens 142.
在该示例中,聚焦(z轴)部件175被示为被包括以控制光学部件在聚焦方向(被称为z轴或z方向)上相对于样品容器110的定位。聚焦部件175可包括物理地耦合到光学台或样品台或两者的一个或更多个致动器,以使样品台170上的样品容器110相对于光学部件(例如物镜142)移动,以对于成像操作提供适当的聚焦。例如,致动器可以诸如例如通过机械、磁性、流体或者直接或间接地到台的其他附着或与台的其他接触来物理地耦合到相应的台。一个或更多个致动器可以被配置为在保持样品台在同一平面内(例如,保持垂直于光轴的等高或水平姿态)的同时在z方向上移动台。一个或更多个致动器也可以被配置为使台倾斜。例如,这可以被完成,使得样品容器110可以动态地变水平以处理在它的表面中的任何倾斜。In this example, a focusing (z-axis) component 175 is shown as being included to control the positioning of the optical components relative to the sample container 110 in a focusing direction (referred to as the z-axis or z-direction). The focusing component 175 may include one or more actuators physically coupled to the optical table or the sample table, or both, to move the sample container 110 on the sample table 170 relative to the optical components (e.g., the objective lens 142) to provide appropriate focus for the imaging operation. For example, the actuator may be physically coupled to the respective stage, such as by mechanical, magnetic, fluidic, or other attachment or other contact with the stage, either directly or indirectly. The one or more actuators may be configured to move the stage in the z-direction while maintaining the sample stage in the same plane (e.g., maintaining a level or horizontal attitude perpendicular to the optical axis). The one or more actuators may also be configured to tilt the stage. For example, this may be done so that the sample container 110 can be dynamically leveled to account for any tilt in its surface.
系统的聚焦通常指将物镜的焦平面与在所选样品定位处待成像的样品对准。然而,聚焦还可以指对系统的调整以获得用于样品的表示的期望特性,例如诸如对于测试样品的图像的期望水平的锐度或对比度。由于物镜的焦平面的可用景深非常小(有时在约1μm或更小的数量级上),因此聚焦部件175紧密跟随正在成像的表面。因为样品容器当固定在仪器中时是不完全平坦的,所以聚焦部件175可以被设置为在沿着扫描方向(被称为y轴)移动的同时遵循该剖面。Focusing the system typically refers to aligning the focal plane of the objective with the sample to be imaged at the selected sample location. However, focusing can also refer to adjusting the system to obtain desired characteristics for the representation of the sample, such as, for example, a desired level of sharpness or contrast for the image of the test sample. Because the available depth of field of the focal plane of the objective is very small (sometimes on the order of about 1 μm or less), the focusing component 175 closely follows the surface being imaged. Because the sample container is not perfectly flat when fixed in the instrument, the focusing component 175 can be arranged to follow this profile while moving along the scan direction (referred to as the y-axis).
从在被成像的样品定位处的测试样品发出的光可以被引导至一个或更多个检测器140。检测器可以包括例如CCD摄像机。可以包括并定位孔径以允许只有从聚焦区域发出的光传到检测器。可以包括孔径以通过滤掉从聚焦区域以外的区域发出的光的分量来提高图像质量。发射滤波器可以被包括在滤波器切换组件145中,该滤波器切换组件145可以被选择来记录所确定的发射波长并且去除任何杂散激光。Light emitted from the test sample at the sample location being imaged can be directed to one or more detectors 140. The detector can include, for example, a CCD camera. An aperture can be included and positioned to allow only light emitted from the focused area to pass to the detector. The aperture can be included to improve image quality by filtering out components of light emitted from areas outside the focused area. An emission filter can be included in a filter switching assembly 145 that can be selected to record the determined emission wavelength and remove any stray laser light.
在各种应用中,样品容器110可以包括一个或更多个基底,在其上提供样品。例如,在分析大量不同的核酸序列的系统的情况下,样品容器110可以包括待测序的核酸被结合、附着或关联到其上的一个或更多个基底。在各种实现中,基底可以包括核酸可被附着到的任何惰性基底或基质,例如诸如玻璃表面、塑料表面、乳胶、葡萄聚糖、聚苯乙烯表面、聚丙烯表面、聚丙烯酰胺凝胶、金表面和硅晶片。在一些应用中,基底在遍及样品容器110的矩阵或阵列中形成的多个定位处的通道或其他区域内。In various applications, the sample container 110 may include one or more substrates on which the sample is provided. For example, in the case of a system for analyzing a large number of different nucleic acid sequences, the sample container 110 may include one or more substrates to which the nucleic acid to be sequenced is bound, attached, or associated. In various implementations, the substrate may include any inert substrate or matrix to which the nucleic acid can be attached, such as, for example, a glass surface, a plastic surface, latex, dextran, a polystyrene surface, a polypropylene surface, a polyacrylamide gel, a gold surface, and a silicon wafer. In some applications, the substrate is within a channel or other region of a plurality of locations formed in a matrix or array throughout the sample container 110.
尽管未示出,但控制器可以被提供来控制扫描系统的操作。控制器可以被实现为控制系统操作的方面,例如诸如聚焦、台移动和成像操作。在各种实现中,可以使用硬件、机器可读指令或算法或前述项的组合来实现控制器。例如,在一些实现中,控制器可以包括具有相关联的存储器的一个或更多个CPU或处理器。作为另一个示例,控制器可以包括硬件或其他电路来控制操作。例如,该电路可以包括下列项中的一个或更多个:现场可编程门阵列(FPGA)、专用集成电路(ASIC)、可编程逻辑器件(PLD)、复杂可编程逻辑器件(CPLD)、可编程逻辑阵列(PLA)、可编程阵列逻辑(PAL)或其他类似的处理设备或电路。作为又一个示例,控制器可以包括该电路与一个或更多个处理器的组合。Although not shown, a controller may be provided to control the operation of the scanning system. The controller may be implemented to control aspects of the system operation, such as focusing, stage movement, and imaging operations. In various implementations, the controller may be implemented using hardware, machine-readable instructions, or algorithms, or a combination of the foregoing. For example, in some implementations, the controller may include one or more CPUs or processors with associated memory. As another example, the controller may include hardware or other circuitry to control operations. For example, the circuitry may include one or more of the following: a field programmable gate array (FPGA), an application specific integrated circuit (ASIC), a programmable logic device (PLD), a complex programmable logic device (CPLD), a programmable logic array (PLA), a programmable array logic (PAL), or other similar processing devices or circuitry. As yet another example, the controller may include a combination of the circuitry and one or more processors.
通常,对于聚焦操作,由聚焦激光器生成的聚焦光束从样品定位反射以测量所需焦点,并且样品台相对于光学台移动以将光学台聚焦到当前样品定位上。通常将样品台相对于光学台的移动以进行聚焦描述为沿着z轴或在z方向上的移动。术语“z轴”和“z方向”被规定为与它们通常在显微镜和成像系统的技术领域中的使用一致地被使用,其中z轴指焦轴。因此,z轴平移导致增加或减少焦轴的长度。例如,可以通过相对于光学台移动样品台(例如,通过移动样品台或光学元件或两者)来执行z轴平移。因此,可以通过驱动物镜、光学台或样品台或前述项的组合来执行z轴平移,其中的任何一个部件都可以通过启动一个或更多个伺服系统或电动机或与物镜或样品台或两者进行功能通信的其他致动器来被驱动。在各种实现中,致动器可以被配置成使样品台相对于光学台倾斜,以例如有效地使样品容器在垂直于光学成像轴的平面上变平。在执行这种动态倾斜以有效地使样品容器上的样品定位变平的情况下,这可以允许样品容器在x方向和y方向上移动,用于根据需要在z轴上有很少或没有移动的情况下进行扫描。Typically, for focusing operations, a focused beam generated by a focusing laser is reflected from a sample location to measure the desired focus, and the sample stage is moved relative to the optical bench to focus the optical bench on the current sample location. Movement of the sample stage relative to the optical bench for focusing is typically described as movement along the z-axis or in the z-direction. The terms "z-axis" and "z-direction" are used consistently with their common usage in the art of microscopy and imaging systems, where the z-axis refers to the focal axis. Thus, a z-axis translation results in an increase or decrease in the length of the focal axis. For example, a z-axis translation can be performed by moving the sample stage relative to the optical bench (e.g., by moving the sample stage or an optical element, or both). Thus, a z-axis translation can be performed by driving the objective lens, the optical bench, or the sample stage, or a combination of the foregoing, any of which can be driven by activating one or more servos, motors, or other actuators in functional communication with the objective lens, the sample stage, or both. In various implementations, the actuator can be configured to tilt the sample stage relative to the optical bench, for example, to effectively flatten the sample container in a plane perpendicular to the optical imaging axis. Where such dynamic tilting is performed to effectively flatten the sample position on the sample container, this can allow the sample container to be moved in the x- and y-directions for scanning as desired with little or no movement in the z-axis.
图2A和图2B示出用于聚焦跟踪的示例光学系统。特别地,图2A示出用于聚焦跟踪的一个示例光学设计。图2B是在图2A中显示的光学系统的一部分的可选视图的示意图。为了避免混乱和便于读者的理解,在图2A中所示的示例被示为具有单个光束,其在这种情况下是中心光束。该系统可以使用多于一个光束(诸如例如用3个光束)来操作。例如,三光束系统可以提供前瞻和后视聚焦跟踪。Figures 2A and 2B illustrate example optical systems for focus tracking. In particular, Figure 2A illustrates an example optical design for focus tracking. Figure 2B is a schematic diagram of an alternative view of a portion of the optical system shown in Figure 2A. To avoid clutter and facilitate the reader's understanding, the example shown in Figure 2A is shown with a single beam, which in this case is the center beam. The system can operate using more than one beam, such as, for example, with three beams. For example, a three-beam system can provide both forward-looking and backward-looking focus tracking.
现在参考图2A,激光器270生成用于聚焦光束并且光学地耦合到系统中的光。来自激光器270的光可以例如经由光纤耦合到光束分离器棱镜272,诸如横向位移光束分离器。如果需要,可以包括滤波器,例如用于源选择。棱镜272将发射光束分成大致相等强度的两个实质上平行的光斑。这可以被包括以在聚焦模型中提供差分测量。Referring now to FIG2A , a laser 270 generates light for focusing the beam and is optically coupled into the system. Light from the laser 270 can be coupled, for example, via an optical fiber, to a beam splitter prism 272, such as a transversely displaced beam splitter. A filter can be included, for example, for source selection, if desired. The prism 272 splits the emitted beam into two substantially parallel spots of approximately equal intensity. This can be included to provide differential measurement in the focusing model.
衍射光栅274生成输入光束的多个副本。在其他配置中,可以使用光束分离器立方体或多个激光源来生成多个光束。在三光束系统的情况下,衍射光栅274可以为两个输入光束中的每一个生成三个输出光束。在图2B处示出的是对于一个输入光束的示例。因为衍射光栅可以生成发散的光束(如也在图2B所示的),所以平顶或道威棱镜(dove prism)276重定向多个光束。在一些实现中,棱镜被配置为使得光束会聚在物镜142的光瞳处,所以在样品容器处的光束垂直于样品容器。在图2B中为三输出光束配置示出此的示例。来自样品容器的所接收的信号通过光束分离器277返回并且从反射镜279反射。因为每个光束对发散,所以接收棱镜280和282将光斑结合到图像传感器284的焦平面上。在一些示例中,这些可以被实现为道威和屋脊棱镜以折射并瞄准离开显微镜物体的射线以在图像传感器阵列上配合。可以使用屋脊棱镜来折射返回光束,以将在光斑对内的光斑结合到图像传感器的焦平面上,以及道威棱镜使前/后光斑对折射以将所有光斑对结合到焦平面上。使用三光束前瞻,三个光束穿过屋脊棱镜的两个棱镜半部分中的每一个。但是,在另一个轴上,光束发散,这就是为什么道威棱镜被包括以纠正这些问题。The diffraction grating 274 generates multiple copies of the input beam. In other configurations, a beam splitter cube or multiple laser sources can be used to generate multiple beams. In the case of a three-beam system, the diffraction grating 274 can generate three output beams for each of the two input beams. An example for one input beam is shown in FIG2B . Because the diffraction grating can generate diverging beams (as also shown in FIG2B ), a flat-top or dove prism 276 redirects the multiple beams. In some implementations, the prism is configured so that the beams converge at the pupil of the objective lens 142 so that the beams at the sample container are perpendicular to the sample container. An example of this is shown in FIG2B for a three-output beam configuration. The received signal from the sample container returns through the beam splitter 277 and is reflected from the mirror 279. Because each beam pair diverges, the receiving prisms 280 and 282 combine the light spots onto the focal plane of the image sensor 284. In some examples, these can be implemented as dove and roof prisms to refract and collimate rays exiting the microscope object to fit onto the image sensor array. A roof prism can be used to refract the return beam to combine the spots within a spot pair onto the focal plane of the image sensor, while a dove prism refracts the front/back spot pairs to combine all spot pairs onto the focal plane. With a three-beam look-ahead, three beams pass through each of the two prism halves of the roof prism. However, on the other axis, the beams diverge, which is why a dove prism is included to correct for these issues.
在上面参考图2A和图2B描述的各种示例中,使用棱镜来实现各种光学部件。这些中的一些或全部可以使用透镜来实现,然而棱镜可能是合乎需要的,因为与它们的透镜对应物相比,这些部件通常对未对准较不敏感。棱镜也可能比透镜系统更合乎需要,因为棱镜通常更紧凑并且包括更少的元件。In the various examples described above with reference to FIG2A and FIG2B , prisms are used to implement various optical components. Some or all of these can be implemented using lenses, however, prisms may be desirable because these components are generally less sensitive to misalignment than their lens counterparts. Prisms may also be more desirable than lens systems because they are generally more compact and include fewer elements.
在图1、图2A和图2B的示例中的物镜142提供了在样品容器上的大致圆形的视场。在一个实现中,视场的中心是正在成像的当前样品定位。在该视场内的扫描方向是x或y轴。为了讨论的目的,扫描的方向将被假定为在y方向上。光源(诸如LED或激光光源)生成聚焦光束。在所示示例中,使用三个光束来提供三点差分离轴预测性焦点估计,一个光束用于当前样品定位,而两个附加光束用于前瞻和后视聚焦跟踪。这两个附加光束用于确定在光学台与在样品容器上的样品定位之间沿z轴的焦点距离。The objective lens 142 in the examples of Figures 1, 2A and 2B provides a generally circular field of view on the sample container. In one implementation, the center of the field of view is the current sample position being imaged. The scanning direction within the field of view is the x or y axis. For the purposes of discussion, the direction of scanning will be assumed to be in the y direction. A light source (such as an LED or laser light source) generates a focused beam. In the example shown, three beams are used to provide a three-point differential separation axis predictive focus estimate, one beam for the current sample position and two additional beams for forward and backward focus tracking. The two additional beams are used to determine the focus distance along the z axis between the optical table and the sample position on the sample container.
在图1、图2A和图2B中描述的系统示出示例系统,本文描述的系统和方法可以使用该示例系统来实现。尽管本文可能在此示例系统的上下文中不时地描述系统和方法,但这只是一个示例,这些系统和方法可以使用这个示例来实现。本文描述的系统和方法可以用这个和其他扫描仪、显微镜和其他成像系统来实现。The system depicted in Figures 1, 2A, and 2B illustrates an example system that the systems and methods described herein may be implemented using. While systems and methods may occasionally be described herein in the context of this example system, this is merely an example of how these systems and methods may be implemented using this example. The systems and methods described herein may be implemented using this and other scanners, microscopes, and other imaging systems.
早已存在的扫描系统使用用于聚焦操作的准直光。在这种系统中,在光束的整个长度上保持相当一致的直径的准直光被引导到物镜。这个的示例在图2A中示出(以上描述的),其中准直光束被传送到物镜。物镜将准直光聚焦到样品上。从样品反射的光通过物镜返回,并被重新准直。然后将反射的准直光束引导至系统的图像传感器(例如在图2A的示例中的图像传感器284)。为了聚焦的目的,确定在图像传感器上的反射光束的定位。例如,使用双光束系统,测量在图像传感器上的光斑定位之间的距离以确定聚焦。Scanning systems that already exist use collimated light for focusing operations. In this system, collimated light of a diameter that is kept quite consistent over the entire length of the beam is directed to the objective lens. An example of this is shown in FIG. 2A (described above), in which a collimated light beam is transmitted to the objective lens. The objective lens focuses the collimated light onto the sample. The light reflected from the sample is returned by the objective lens and re-collimated. The reflected collimated light beam is then directed to the image sensor of the system (e.g., the image sensor 284 in the example of FIG. 2A ). For the purpose of focusing, the positioning of the reflected light beam on the image sensor is determined. For example, using a dual-beam system, the distance between the light spot positioning on the image sensor is measured to determine focusing.
虽然准直光是已知的光源和扫描系统,但是发明人已经发现准直光可以不利地影响在各种应用中的聚焦跟踪操作。一种不利影响与从使用对于聚焦跟踪光束的准直光产生的光斑尺寸有关。因为准直光在整个光路中保持相对一致的直径,所以聚焦跟踪光束在图像传感器上使相对大的光斑尺寸成像。较大的光斑尺寸包括在图像传感器上的较大数量的像素,这增加了需要测量的图像传感器的像素的行数。这增加了对于聚焦跟踪操作所需的时间量。While collimated light is a known light source and scanning system, the inventors have discovered that collimated light can adversely affect focus tracking operations in various applications. One adverse effect is related to the spot size resulting from using collimated light for the focus tracking beam. Because collimated light maintains a relatively consistent diameter throughout the optical path, the focus tracking beam images a relatively large spot size on the image sensor. This larger spot size includes a larger number of pixels on the image sensor, which increases the number of rows of image sensor pixels that need to be measured. This increases the amount of time required for the focus tracking operation.
另一个不利影响可能出现在系统中,其中物镜可用于在多个不同的表面处聚焦,但不以等于在这些不同表面之间的距离的量移动。在这种情况下,在图像传感器上可出现从不同表面反射的聚焦跟踪光束的不同光斑尺寸,影响聚焦跟踪操作。图3A是示出这样的现象的示例的图。更特别地,图3A示出其中包含待成像的一个或更多个样品的样品容器包括多个层的示例。现在参考图3A,样品容器330包括3个层334、338和336。在这个3层示例中,在层之间有四个表面。这些在表面S1、S2、S3和S4处示出。在该示例中还示出物镜332,其将聚焦跟踪光束333、335(在2光束系统中有2个)聚焦到样品容器330上用于聚焦操作。Another adverse effect can occur in systems where the objective lens can be used to focus at multiple different surfaces but does not move by an amount equal to the distance between these different surfaces. In this case, different spot sizes of the focus tracking beam reflected from different surfaces may appear on the image sensor, affecting the focus tracking operation. Figure 3A is a diagram illustrating an example of such a phenomenon. More specifically, Figure 3A shows an example in which a sample container containing one or more samples to be imaged includes multiple layers. Now referring to Figure 3A, sample container 330 includes three layers 334, 338, and 336. In this three-layer example, there are four surfaces between the layers. These are shown at surfaces S1, S2, S3, and S4. Also shown in this example is objective lens 332, which focuses focus tracking beams 333, 335 (two in a two-beam system) onto sample container 330 for the focusing operation.
对于聚焦跟踪操作,在一些实例中将成像光束聚焦到表面S2以及在其他实例中将成像光束聚焦表面S3可能很重要。假设在表面S2和S3之间的间隔固定在距离X。在一些应用中,根据物镜332的操作,当改变在表面S2和S3之间的焦点时,物镜可移动大于或小于距离X的距离。因此,从表面S2和S3反射的聚焦跟踪光束333、335可以在不同的直径处被重新准直,使S2光束呈现与S3光束不同的光斑尺寸。For focus tracking operations, it may be important to focus the imaging beam onto surface S2 in some instances and onto surface S3 in other instances. Assume that the separation between surfaces S2 and S3 is fixed at distance X. In some applications, depending on the operation of objective lens 332, the objective lens may be moved by a distance greater than or less than distance X when changing the focus between surfaces S2 and S3. Consequently, the focus tracking beams 333, 335 reflected from surfaces S2 and S3 may be re-collimated at different diameters, causing the S2 beam to exhibit a different spot size than the S3 beam.
在图4A中示出此的示例。更特别地,图4A示出图像传感器362的一部分,该图像传感器362包括聚焦跟踪光束被引导到其上的多个像素(为了清楚起见未示出)。在情形360中的图的左手侧上,这示出具有来自在双光束系统中的两个聚焦跟踪光束中的每一个的光束光斑34、36的图像传感器部分362。光斑34来自从两个成像表面中的一个成像表面(在本例中假设为S2)反射的左和右光束,并且光斑36来自由两个成像表面中的另一个表面(在这个示例中假设为S3)反射的左和右光束。如在该示例所示的,基于物镜的移动,都被准直并且在进入物镜之前都具有实质上相同的光束直径的两个聚焦跟踪光束现在具有不同的直径并因此在图像传感器上产生不同的光斑尺寸。光斑中的较大的两个各自包括较多数量的像素,且因此增加了需要测量的图像传感器的像素的行数。这增加了对于聚焦跟踪操作所需的时间量。由于这些原因,期望实现诸如在图4A的右手侧所示的情形361的情形,其中来自分别从表面S2和S3反射的左和右光束的光斑34、36实质上是相同的光斑尺寸并且相对较小。An example of this is shown in FIG4A . More specifically, FIG4A shows a portion of an image sensor 362, which includes a plurality of pixels (not shown for clarity) onto which focus tracking beams are directed. On the left-hand side of the diagram in scenario 360 , this shows image sensor portion 362 with beam spots 34, 36 from each of the two focus tracking beams in a dual-beam system. Spot 34 results from left and right beams reflected from one of the two imaging surfaces (assumed to be S2 in this example), and spot 36 results from left and right beams reflected from the other of the two imaging surfaces (assumed to be S3 in this example). As shown in this example, due to the movement of the objective lens, the two focus tracking beams, both collimated and having substantially the same beam diameter before entering the objective lens, now have different diameters and therefore produce different spot sizes on the image sensor. The larger of the two spots each includes a greater number of pixels, thereby increasing the number of rows of pixels on the image sensor that need to be measured. This increases the amount of time required for the focus tracking operation. For these reasons, it is desirable to achieve a situation such as situation 361 shown on the right hand side of FIG. 4A , where the spots 34 , 36 from the left and right beams reflected from surfaces S2 and S3 , respectively, are substantially the same spot size and relatively small.
早先存在的系统可以使用聚焦透镜来使聚焦跟踪光束会聚在图像传感器上,并减小或最小化它们在传感器上的光斑尺寸。然而,由于透镜在光学系统中引入曲面,因此在透镜的对准中的微小变化(包括可通过在系统中的热变化引起的变化)可能导致在传感器上的聚焦跟踪光束的放置的不准确。透镜的移动或变化可能导致横向平移,其不同地影响多个聚焦跟踪光束。因此,如上面参考图2A和图2B所述的,在一些示例中,聚焦透镜用屋脊棱镜代替。Prior art systems may use focusing lenses to converge the focus tracking beams onto the image sensor and reduce or minimize their spot size on the sensor. However, because the lenses introduce a curved surface into the optical system, slight variations in the alignment of the lenses (including variations that may be caused by thermal variations in the system) may result in inaccuracies in the placement of the focus tracking beams on the sensor. Movement or variation of the lenses may result in lateral shifts that affect the multiple focus tracking beams differently. Therefore, as described above with reference to FIG2A and FIG2B , in some examples, the focusing lenses are replaced with roof prisms.
图5A是示出被实现为使聚焦跟踪光束会聚到图像传感器上的聚焦透镜的示例的图。现在参考图5A,来自光源(例如图2A的激光二极管270)的光通过光纤(激光器和光纤未示出)传送到准直透镜400。准直光诸如通过光束分离器棱镜382(例如图2A的光束分离器棱镜272)分成两个光束。为了避免在图示中的不必要的混乱,在透镜370和图像传感器398处示出两个反射聚焦跟踪光束394、395;然而,在图5A的其余部分中仅示出两个聚焦跟踪光束中的一个。FIG5A is a diagram illustrating an example of a focusing lens implemented to converge a focus tracking beam onto an image sensor. Referring now to FIG5A , light from a light source (e.g., laser diode 270 of FIG2A ) is transmitted to a collimating lens 400 via an optical fiber (the laser and optical fiber are not shown). The collimated light is split into two beams, such as by a beam splitter prism 382 (e.g., beam splitter prism 272 of FIG2A ). To avoid unnecessary clutter in the illustration, two reflected focus tracking beams 394, 395 are shown at lens 370 and image sensor 398; however, only one of the two focus tracking beams is shown in the remainder of FIG5A .
来自光束分离器棱镜382的聚焦跟踪光束穿过光束分离器384并且被反射镜386反射通过物镜390。物镜将光束聚焦到样品容器392(例如图3A的样品容器330)中的样品上。在该示例中,聚焦跟踪光束从样品容器392的S2表面反射。反射光束(仍然仅示出一个光束394)通过物镜390返回,从反射镜386和光束分离器384反射,并且被引导到透镜370。由于返回光束394、395在这个点处发散,所以透镜370被实现以使返回光束394、395会聚到图像传感器398上。而且,由于聚焦跟踪光束394、395是准直光,所以透镜370提供将光束聚焦成在图像传感器398上的较小光斑尺寸的附加功能。然而,因为透镜370的横向放置中的改变影响了在图像传感器398上的光束的定位,所以这些改变引入了聚焦跟踪误差。The focus tracking beam from beam splitter prism 382 passes through beam splitter 384 and is reflected by mirror 386 through objective lens 390. The objective lens focuses the beam onto a sample in sample container 392 (e.g., sample container 330 of FIG. 3A ). In this example, the focus tracking beam reflects from the S2 surface of sample container 392. The reflected beams (again, only one beam 394 is shown) return through objective lens 390, reflect from mirror 386 and beam splitter 384, and are directed to lens 370. Because the return beams 394, 395 diverge at this point, lens 370 is implemented to converge the return beams 394, 395 onto image sensor 398. Moreover, because the focus tracking beams 394, 395 are collimated, lens 370 provides the additional function of focusing the beams into a smaller spot size on image sensor 398. However, because changes in the lateral placement of lens 370 affect the positioning of the light beam on image sensor 398, these changes introduce focus tracking errors.
图5B是示出其中透镜370用屋脊棱镜396代替以避免由透镜370的横向放置中的变化引起的问题的示例的图。用屋脊棱镜396代替透镜减少或消除了系统对透镜的横向位置的敏感性。由于热和其他变化引起的棱镜的变化不影响在图像传感器398上的聚焦跟踪光束394、395的间距。因此棱镜的角度偏差完全由玻璃的角度决定,所以屋脊棱镜396的横向位移不影响光束。FIG5B is a diagram illustrating an example in which lens 370 is replaced with a roof prism 396 to avoid problems caused by variations in the lateral placement of lens 370. Replacing the lens with a roof prism 396 reduces or eliminates the system's sensitivity to the lateral position of the lens. Variations in the prism due to thermal and other variations do not affect the spacing of the focus tracking beams 394, 395 on image sensor 398. Since the angular deviation of the prism is entirely determined by the angle of the glass, lateral displacement of roof prism 396 does not affect the beams.
代替透镜370来包括屋脊棱镜396可以提高聚焦跟踪系统的准确度。由于在光斑之间的间隔用于测量从物镜到样品容器的距离,因此当光束的间隔仅取决于到样品容器的距离时,更高水平的准确度被达到。影响光束间隔的其他变量(诸如,由透镜370的放置中的横向不精确度引入的变量)消极地影响聚焦跟踪系统的准确度。因此,包括屋脊棱镜(其甚至在存在某个横向位移的情况下也呈现与聚焦跟踪光束的相同角度)可以极大地有益于系统的准确度。Including a roof prism 396 in place of lens 370 can improve the accuracy of the focus tracking system. Because the spacing between the light spots is used to measure the distance from the objective lens to the sample container, a higher level of accuracy is achieved when the separation of the beams depends solely on the distance to the sample container. Other variables that affect the separation of the beams (such as those introduced by lateral inaccuracies in the placement of lens 370) negatively impact the accuracy of the focus tracking system. Therefore, including a roof prism (which presents the same angle to the focus tracking beam even in the presence of some lateral displacement) can greatly benefit the accuracy of the system.
移除透镜有一个缺点。因为透镜被消除,所以聚焦跟踪光束(在这个示例中是光束394、395)没有聚焦在传感器上。因此,在各种示例中,不是如早先存在的扫描系统进行的那样使用准直光,聚焦跟踪光束被聚焦以将腰放置在沿光路的给定点处。这在图像传感器上呈现较小的光斑尺寸。例如,在一个应用中,准直透镜400比它以其他方式被放置的从光纤输出端移动得更远,以准直来自光纤的光。沿准直透镜400被放置于的光路的点规定光束腰沿光路放置的位置。准直透镜400可被定位成提供腰,使得尽管用屋脊棱镜396代替透镜370,反射聚焦跟踪光束394、395能够以减小的光斑尺寸聚焦到图像传感器398上。There is a disadvantage to removing the lens. Because the lens is eliminated, the focus tracking beam (in this example, beams 394, 395) is not focused on the sensor. Therefore, in various examples, rather than using collimated light as is done in preexisting scanning systems, the focus tracking beam is focused to place the waist at a given point along the optical path. This presents a smaller spot size on the image sensor. For example, in one application, the collimating lens 400 is moved further from the output end of the optical fiber than it would otherwise be placed to collimate the light from the optical fiber. The point along the optical path at which the collimating lens 400 is placed dictates where the beam waist is placed along the optical path. The collimating lens 400 can be positioned to provide a waist so that the reflected focus tracking beams 394, 395 can be focused onto the image sensor 398 with a reduced spot size despite the use of the roof prism 396 in place of the lens 370.
移动准直透镜400以将光束腰放置在光路中的另一益处在于,这可以有助于减小或消除上面参考图4A讨论的光斑尺寸中的不平衡。透镜400可以被提供并定位在光路中,使得通过物镜以及通过光路的其余部分从样品返回的光以与在情形361中所示的实质上相同的光斑尺寸撞射在传感器上。更特别地,在一些实例中,将透镜定位在距光纤输出端一定距离处,以将光束腰放置在距准直仪的预定距离处,以平衡从样品容器的上表面和下表面传播到图像传感器的光束的直径。Another benefit of moving the collimating lens 400 to position the beam waist in the optical path is that it can help reduce or eliminate the imbalance in spot size discussed above with reference to FIG4A. The lens 400 can be provided and positioned in the optical path so that light returning from the sample through the objective lens and through the rest of the optical path impinges on the sensor with substantially the same spot size as shown in scenario 361. More specifically, in some examples, the lens is positioned at a distance from the output end of the optical fiber to place the beam waist at a predetermined distance from the collimator to balance the diameter of the light beam propagating from the upper and lower surfaces of the sample container to the image sensor.
在一个应用中,光束腰位于距准直仪690mm-700mm的距离处,以平衡和减小撞击在图像传感器上的光束的直径。在一些示例中,光斑尺寸可以减小到大约400μm。在其他示例中,光斑尺寸可以在300μm至500μm的范围内。在又一些其他示例中,可以使用其他光斑尺寸。In one application, the beam waist is located at a distance of 690mm-700mm from the collimator to balance and reduce the diameter of the beam impinging on the image sensor. In some examples, the spot size can be reduced to approximately 400μm. In other examples, the spot size can be in the range of 300μm to 500μm. In still other examples, other spot sizes can be used.
另外,准直透镜400将光束腰放置在光路中的移动可以有助于平衡撞击在图像传感器上的光的强度。图4B是示出使用被调节以在非最佳定位处提供光束腰的准直透镜在不同聚焦设置下从S2和S3表面反射到图像传感器上的左和右聚焦光束的强度的图。在该图中,光斑亮度在垂直轴上,并且聚焦台的位置在水平轴上。在一个示例实现中,在图的左手侧上的垂直蓝线示出对于S2反射的最佳聚焦位置。类似地,在该示例实现中,在图的右手侧上的垂直蓝线示出对于S3反射的最佳聚焦位置。如该图所示,在S2聚焦位置处,对于S2光束的平均光斑亮度约为170,而在优化S3聚焦位置处,对于S3光束的平均光斑亮度约为85。因此,对于S2和S3光束的光斑强度不平衡。In addition, the movement of the collimating lens 400 to position the beam waist in the optical path can help balance the intensity of the light impinging on the image sensor. Figure 4B is a graph showing the intensity of the left and right focused beams reflected from the S2 and S3 surfaces onto the image sensor at different focus settings using a collimating lens adjusted to provide a beam waist at a non-optimal position. In this graph, the spot brightness is on the vertical axis and the position of the focusing stage is on the horizontal axis. In one example implementation, the vertical blue line on the left-hand side of the graph shows the optimal focus position for the S2 reflection. Similarly, in this example implementation, the vertical blue line on the right-hand side of the graph shows the optimal focus position for the S3 reflection. As shown in the graph, at the S2 focus position, the average spot brightness for the S2 beam is approximately 170, while at the optimized S3 focus position, the average spot brightness for the S3 beam is approximately 85. Therefore, the spot intensities for the S2 and S3 beams are unbalanced.
图4C是示出使用被调节以沿聚焦跟踪光束的光路更优化地定位在光束腰处的准直透镜在不同聚焦设置下从S2和S3表面反射到图像传感器上的左和右聚焦光束的强度的图。在这里,当光束腰沿光路定位时,S2和S3反射光束的强度更加平衡。特别地,该图示出在S2最佳聚焦位置处左和右S2光束具有大约125的平均光斑亮度。这也说明在S3最佳聚焦位置处,左和右S3光束具有大约130的平均光斑亮度。作为图4B和4C的比较,示出沿光路的光束腰的放置可影响S2和S3聚焦跟踪光束的强度的平衡。FIG4C is a graph showing the intensity of the left and right focused beams reflected from the S2 and S3 surfaces onto the image sensor at different focus settings using a collimating lens adjusted to be more optimally positioned at the beam waist along the optical path of the focus tracking beam. Here, when the beam waist is positioned along the optical path, the intensities of the S2 and S3 reflected beams are more balanced. In particular, the graph shows that at the S2 optimal focus position, the left and right S2 beams have an average spot brightness of approximately 125. This also shows that at the S3 optimal focus position, the left and right S3 beams have an average spot brightness of approximately 130. As a comparison of FIG4B and FIG4C, it is shown that the placement of the beam waist along the optical path can affect the balance of the intensities of the S2 and S3 focus tracking beams.
图6是示出包括定位成将聚焦跟踪光束的光束腰放置在选定位置处的透镜的示例配置的图。在该示例中,来自诸如激光光源(例如光源270)的光源(未示出)的光由光纤电缆432携带,该光纤电缆432经由套圈434连接到透镜壳体组件。套圈434安装在固定地附接到插入件436的安装块435中。给定焦距的透镜440被放置在距光纤432的输出端确定的距离处,并且可以通过透镜壳体组件保持在该距离处。在该示例中,来自光纤的光行进穿过安装在主体部分438中的插入件436中的孔径。选择透镜440的焦距及它离光纤432的输出端的距离以将光束腰放置在沿着光路的期望位置处。如上面提到的,在光纤的输出端与透镜440之间的距离被选择为将光束腰放置在期望位置处,如下面更充分描述的。FIG6 is a diagram illustrating an example configuration including a lens positioned to position the beam waist of a focused tracking beam at a selected location. In this example, light from a light source (not shown), such as a laser light source (e.g., light source 270), is carried by a fiber optic cable 432, which is connected to a lens housing assembly via a ferrule 434. Ferrule 434 is mounted in a mounting block 435, which is fixedly attached to an insert 436. A lens 440 of a given focal length is positioned at a determined distance from the output end of optical fiber 432 and can be maintained at that distance by the lens housing assembly. In this example, light from the optical fiber travels through an aperture in insert 436, which is mounted in a body portion 438. The focal length of lens 440 and its distance from the output end of optical fiber 432 are selected to position the beam waist at a desired location along the optical path. As mentioned above, the distance between the output end of the optical fiber and lens 440 is selected to position the beam waist at a desired location, as described more fully below.
在这个示例中,在透镜440和光纤输出端之间的间隔是14.23mm,其为在透镜表面和光纤之间的工作距离。15.7mm是透镜的有效焦距(其比透镜的后焦距更高,因为它是相对于透镜主平面)。因为在准直器中的透镜的后焦距为13.98mm,其为在光轴上的从透镜顶点到透镜的焦点的距离,所以后焦距短于14.23mm。In this example, the spacing between lens 440 and the fiber output end is 14.23 mm, which is the working distance between the lens surface and the fiber. 15.7 mm is the effective focal length of the lens (which is higher than the back focal length of the lens because it is relative to the lens principal plane). Because the back focal length of the lens in the collimator is 13.98 mm, which is the distance from the lens vertex to the lens focus on the optical axis, the back focal length is shorter than 14.23 mm.
在所示的示例中,插入件436可滑动地安装在由主体部分438限定的腔内,使得在光纤输出端和透镜440之间的距离可由可滑动地安装在主体部分438的腔内的插入件436调整。可以包括定位螺钉442或其它锁定机构以将插入件436锁定在主体部分438内地方。使用可滑动的插入件436允许系统被调整以调节或优化在图像传感器上的光斑尺寸。这可以允许最终的系统配置调整或现场调节。图6所示的示例中,透镜440是平凸透镜。然而,在阅读了本描述之后,本领域中的普通技术人员将理解,可以使用其他透镜结构,包括例如双凸透镜。In the example shown, insert 436 is slidably mounted within a cavity defined by body portion 438, such that the distance between the optical fiber output end and lens 440 can be adjusted by insert 436 slidably mounted within the cavity of body portion 438. A set screw 442 or other locking mechanism can be included to lock insert 436 in place within body portion 438. The use of a slidable insert 436 allows the system to be adjusted to adjust or optimize the spot size on the image sensor. This can allow for final system configuration adjustments or field adjustments. In the example shown in FIG6 , lens 440 is a plano-convex lens. However, after reading this description, one of ordinary skill in the art will understand that other lens configurations can be used, including, for example, biconvex lenses.
在一些应用中,透镜被配置为使得光束腰位于物镜内。更特别地,在一些应用中,透镜被配置为使得在光束撞击在样品上之前光束腰被定位在物镜内,而在其他应用中,透镜被配置为使得在光束从样品反射之后光束腰被定位在物镜内。在其他应用中,透镜被配置成使得光束腰出现在物镜之前、在反射光束离开物镜之后或在物镜与样品之间。透镜的放置可以通过迭代过程、诸如通过建模软件的使用来确定以实现在图像传感器上的期望光斑尺寸和平衡。In some applications, the lens is configured so that the beam waist is located within the objective. More specifically, in some applications, the lens is configured so that the beam waist is positioned within the objective before the beam impinges on the sample, while in other applications, the lens is configured so that the beam waist is positioned within the objective after the beam reflects from the sample. In other applications, the lens is configured so that the beam waist appears before the objective, after the reflected beam leaves the objective, or between the objective and the sample. The placement of the lens can be determined through an iterative process, such as through the use of modeling software, to achieve the desired spot size and balance on the image sensor.
除了平衡光斑尺寸之外,通常利用更小的光斑尺寸来提高聚焦可以被确定的速度。从图像传感器读取信息所需的时间影响聚焦跟踪系统的时延。更特别地,对于具有给定像素密度的传感器,较大的光斑尺寸覆盖更多的像素,并且需要更多的时间来从在光斑直径内的每个像素读取数据。因此,如上面讨论的,用于平衡光束直径的透镜也可以用于减小撞击在图像传感器上的光斑的尺寸,从而减少为了聚焦操作而确定光斑定位(或用于多光束聚焦的定位)所需的时间量。In addition to balancing the spot size, a smaller spot size is often used to increase the speed at which focus can be determined. The time required to read information from the image sensor affects the latency of the focus tracking system. More specifically, for a sensor with a given pixel density, a larger spot size covers more pixels and requires more time to read data from each pixel within the spot diameter. Therefore, as discussed above, the lens used to balance the beam diameter can also be used to reduce the size of the spot that impinges on the image sensor, thereby reducing the amount of time required to determine the spot position (or position for multi-beam focusing) for the focusing operation.
如上面参考图3A所讨论的,在一些应用中,可以使用多层样品容器来携带将由扫描系统成像的样品。如在那个示例中所讨论的,待成像的样品可以被包含在层338中的溶液中。为了使成像发生,至少层334必须对用于成像的光束是光学透明的。层336也可以是光学透明的。因此,表面S1、S2、S3和S4通常是反射性的。同样,因为成像光束在层338处到达样品很重要,所以在表面上使用抗反射涂层是不合乎需要的。因此,在聚焦跟踪和成像操作期间来自表面S1和S4的不需要的反射可以在系统中产生不需要的光学噪声,并且可以使来自S2和S3的反射光束变得模糊,该反射光束是在图像传感器处收集的光束。As discussed above with reference to FIG3A , in some applications, a multi-layer sample container can be used to carry a sample to be imaged by a scanning system. As discussed in that example, the sample to be imaged can be contained in a solution in layer 338. In order for imaging to occur, at least layer 334 must be optically transparent to the light beam used for imaging. Layer 336 can also be optically transparent. Therefore, surfaces S1, S2, S3, and S4 are typically reflective. Likewise, because it is important that the imaging beam reaches the sample at layer 338, it is undesirable to use an anti-reflective coating on the surface. Therefore, unwanted reflections from surfaces S1 and S4 during focus tracking and imaging operations can generate unwanted optical noise in the system and can blur the reflected beams from S2 and S3, which are the beams collected at the image sensor.
图3B是示出在一些环境中产生离开多层样品容器的多个表面的不需要的反射的示例的图。如在本例中看到的,三层样品容器包括表面S1、S2、S3和S4。为了清楚起见,示出单个聚焦跟踪光束465。但是,在其他应用中,可以使用多个聚焦跟踪光束。例如,下面的示例描述了其中描述了两个聚焦跟踪光束的系统。也如在该示例中看到的,光束从表面S1、S2、S3和S4中的每一个反射。由于样品在表面S2和S3之间,因此这些表面是系统被设计成聚焦于其上的表面。因此,离开表面S1的反射光束467和离开表面S4的反射光束469不返回任何有用的信息并且是不需要的反射。聚焦跟踪的感兴趣反射是离开表面S2和S3的反射。相应地,如果来自离开表面S1和S4的反射的光到达检测器,则这可能引入可能干扰聚焦跟踪光束反射的检测的噪声。FIG3B is a diagram illustrating an example of unwanted reflections generated off multiple surfaces of a multi-layer sample container in some environments. As seen in this example, the three-layer sample container includes surfaces S1, S2, S3, and S4. For clarity, a single focus tracking beam 465 is shown. However, in other applications, multiple focus tracking beams may be used. For example, the following example describes a system in which two focus tracking beams are described. As also seen in this example, the beams reflect off each of surfaces S1, S2, S3, and S4. Since the sample is between surfaces S2 and S3, these are the surfaces on which the system is designed to focus. Therefore, reflected beam 467 off surface S1 and reflected beam 469 off surface S4 do not return any useful information and are unwanted reflections. The reflections of interest for focus tracking are those off surfaces S2 and S3. Accordingly, if light from reflections off surfaces S1 and S4 reaches a detector, this may introduce noise that could interfere with the detection of the focus tracking beam reflections.
图3C是示出在图像传感器上的不需要的反射的影响的示例的图。如在该示例中看到的,除了由聚焦跟踪光束呈现的光斑482之外,还有在图像传感器上出现的相当大数量的噪声,作为不需要的反射的结果。在其他示例中,不需要的反射也可以作为在图像传感器上的附加光斑出现。图3D是示出根据下面讨论的示例的作为阻挡结构的放置的结果的在图像传感器处的噪声的减少的图。FIG3C is a graph illustrating an example of the effects of unwanted reflections on an image sensor. As can be seen in this example, in addition to the spot 482 presented by the focus tracking beam, there is also a significant amount of noise appearing on the image sensor as a result of the unwanted reflections. In other examples, unwanted reflections may also appear as additional spots on the image sensor. FIG3D is a graph illustrating the reduction in noise at the image sensor as a result of the placement of a blocking structure, according to an example discussed below.
这个问题在其中离开表面S1和S4的反射具有比离开样品的反射更大强度的情况下加剧。因为重要的是样品容器是光学透明的,所以在样品容器上不提供抗反射涂层。同样,离开玻璃表面的反射往往比离开生物样品的反射更强。另外,在其中样品容器在表面S2和S3上包含纳米井或其他类似图案的应用中,这可以进一步减少离开这些表面的反射。因此,来自表面S1和S4的不需要的反射倾向于具有比离开表面S2和S3的反射更大的强度。例如,在一些应用中,离开表面S1的反射可以多达离开表面S2和S3的反射的强度的100倍(或更大)。为了补救这个问题并且除去来自聚焦跟踪操作的这些不需要的反射的影响,可以实现各种示例以在沿着在样品和图像传感器之间的光路的所确定的定位处包括阻挡结构,以阻止这个不需要的光到达图像传感器。This problem is exacerbated in cases where the reflections leaving surfaces S1 and S4 have a greater intensity than the reflections leaving the sample. Because it is important that the sample container be optically transparent, no anti-reflective coating is provided on the sample container. Similarly, reflections leaving glass surfaces tend to be stronger than reflections leaving biological samples. In addition, in applications where the sample container includes nanowells or other similar patterns on surfaces S2 and S3, this can further reduce reflections leaving these surfaces. Therefore, unwanted reflections from surfaces S1 and S4 tend to have a greater intensity than reflections leaving surfaces S2 and S3. For example, in some applications, reflections leaving surface S1 can be as much as 100 times (or more) the intensity of reflections leaving surfaces S2 and S3. To remedy this problem and remove the effects of these unwanted reflections from focus tracking operations, various examples can be implemented to include blocking structures at determined locations along the optical path between the sample and the image sensor to prevent this unwanted light from reaching the image sensor.
图7是示出扫描系统的另一示例的图,本文所述的系统和方法可使用该扫描系统来实现。现在参考图7,该示例包括光源(未示出),诸如激光光源。例如,在一个应用中,光源可以被配置为使用光纤耦合器以及透镜结构耦合到系统的激光二极管,诸如图6所示的示例。作为另一个示例,光源可以被配置为具有准直器的激光二极管,以提供用于聚焦跟踪操作的准直光。FIG7 is a diagram illustrating another example of a scanning system with which the systems and methods described herein can be implemented. Referring now to FIG7 , this example includes a light source (not shown), such as a laser light source. For example, in one application, the light source can be configured as a laser diode coupled to the system using a fiber coupler and a lens structure, such as the example shown in FIG6 . As another example, the light source can be configured as a laser diode with a collimator to provide collimated light for focus tracking operations.
在这个示例中,来自激光器的光被引入到横向位移棱镜522中以将光分成两个平行光束。其他配置可以用单个聚焦跟踪光束或用多于两个聚焦跟踪光束来实现。在操作中,聚焦跟踪光束通过光束分离器524被发送并且从上部潜望镜526和下部潜望镜528反射。聚焦跟踪光束通过潜望镜窗口530和光束分离器532(其也可以被实现为二向色滤波器)被传送。然后光束从反射镜536反射并且通过物镜538聚焦到样品容器540上。来自样品容器的反射通过物镜返回,并沿着相同的路径行进,直到它们从光束分离器524反射为止。因为光束可以从彼此稍微发散,所以屋脊棱镜546可以被包括以将光束重新引导到平行定向或者甚至到略微会聚的配置,使得它们都可以被引导到相对较小面积的图像传感器。在该示例中,摄像机转向镜548将聚焦跟踪光束引导至图像传感器550。虽然本文描述的示例阻挡结构是从该示例配置方面来描述的,但是本领域中的普通技术人员在阅读本描述之后将认识到可以如何在不同地配置的系统中使用阻挡结构的不同几何形状或放置以阻挡来自多表面样品容器的不需要的反射。In this example, light from a laser is directed into a lateral displacement prism 522 to split the light into two parallel beams. Other configurations can be implemented with a single focus tracking beam or with more than two focus tracking beams. In operation, the focus tracking beam is sent through a beam splitter 524 and reflected from an upper periscope 526 and a lower periscope 528. The focus tracking beam is transmitted through a periscope window 530 and a beam splitter 532 (which can also be implemented as a dichroic filter). The beam is then reflected from a reflector 536 and focused onto a sample container 540 by an objective lens 538. Reflections from the sample container return through the objective lens and follow the same path until they are reflected from beam splitter 524. Because the beams can diverge slightly from each other, a roof prism 546 can be included to redirect the beams into a parallel orientation or even a slightly converging configuration so that they can all be directed onto a relatively small area image sensor. In this example, a camera steering mirror 548 directs the focus tracking beam to an image sensor 550. Although the example blocking structures described herein are described in terms of this example configuration, a person of ordinary skill in the art, after reading this description, will recognize how different geometries or placements of blocking structures can be used in differently configured systems to block unwanted reflections from multi-surface sample containers.
图7的示例系统被建模以确定从系统中的S1-S4表面反射的光束的路径,以识别沿着返回路径的点,在这些点处来自S1和S4表面的不需要的反射可以被阻止到达图像传感器。作为这种建模的结果,在沿着路径的各个点处的光束的空间关系在图8、图9、图11、图12、图19、图20、图21、图22、图23和图24中示出。如这些图所示的,从表面S1-S4反射的光束的空间关系在系统的整个返回路径中变化。光束定位沿其返回路径的长度相对于彼此改变,并且定位也根据样品容器相对于物镜的放置而改变。增加复杂性在于存在在前向方向和返回方向上延伸的聚焦光束,并且还存在也在两个方向上延伸的成像光束。因此,在避免对期望的聚焦跟踪和成像光束的干涉的同时,在光路内在适当的地方配置阻挡结构并不是不重要的任务,该阻挡结构有效地阻止不需要的反射在图像传感器上传递噪声。The example system of Figure 7 was modeled to determine the paths of light beams reflected from surfaces S1-S4 in the system, identifying points along the return path where unwanted reflections from surfaces S1 and S4 could be blocked from reaching the image sensor. As a result of this modeling, the spatial relationships of the light beams at various points along the path are illustrated in Figures 8, 9, 11, 12, 19, 20, 21, 22, 23, and 24. As shown in these figures, the spatial relationships of the light beams reflected from surfaces S1-S4 vary throughout the return path of the system. The positioning of the beams varies relative to each other along the length of their return path, and also depends on the placement of the sample container relative to the objective lens. Adding to the complexity is the presence of a focusing beam extending in both the forward and return directions, as well as an imaging beam extending in both directions. Therefore, configuring blocking structures at appropriate locations within the optical path that effectively prevent unwanted reflections from transmitting noise to the image sensor while avoiding interference with the desired focus tracking and imaging beams is a nontrivial task.
图8和图9是示出在使用多层样品容器(诸如图3B所示的多层样品容器)的图7的示例配置中在光束分离器532处的反射聚焦跟踪光束的空间关系的图。图8和图9显示在21mmx 21mm面积内的光束。图8示出当系统被配置为聚焦在表面S2处的样品井的顶部时在光束分离器532处的光束的空间关系,而图9示出在系统被配置为聚焦在表面S3处的样品井的底部上的情况下在光束分离器532处的光束的空间关系。这些图示出在光束分离器532处在系统聚焦在S2和S3处的情况下反射光束以三个空间组撞击在表面上:离开表面S1、S2和S3的左聚焦跟踪光束的反射在第一组中;离开表面S1、S2和S3的右聚焦跟踪光束的反射在与第一组物理地分离的第二组中;并且从表面S4反射的左和右聚焦跟踪光束在这两组之间的区域中。利用在光束当中的这种空间关系,使用孔径配置来有效地阻止表面S1的左和右反射同时允许离开表面S2和S3的期望反射不受抑制地通过将很难。然而,因为存在离开表面S4的反射相对于其他反射的良好的空间分离,所以来自S4表面的反射可能在沿着返回路径的这个点处被阻挡。FIG8 and FIG9 are diagrams illustrating the spatial relationship of the reflected focus tracking beams at beam splitter 532 in the example configuration of FIG7 using a multi-layer sample container, such as the multi-layer sample container shown in FIG3B. FIG8 and FIG9 show the beams within a 21 mm x 21 mm area. FIG8 illustrates the spatial relationship of the beams at beam splitter 532 when the system is configured to focus on the top of the sample well at surface S2, while FIG9 illustrates the spatial relationship of the beams at beam splitter 532 when the system is configured to focus on the bottom of the sample well at surface S3. These diagrams show that at beam splitter 532, when the system is focused on S2 and S3, the reflected beams impinge on the surfaces in three spatial groups: reflections of the left focus tracking beam from surfaces S1, S2, and S3 are in a first group; reflections of the right focus tracking beam from surfaces S1, S2, and S3 are in a second group physically separate from the first group; and the left and right focus tracking beams reflected from surface S4 are in the region between these two groups. With this spatial relationship among the beams, it is difficult to use an aperture configuration to effectively block the left and right reflections of surface S1 while allowing the desired reflections off surfaces S2 and S3 to pass uninhibited. However, because there is good spatial separation of the reflection off surface S4 relative to the other reflections, the reflection from the S4 surface can be blocked at this point along the return path.
图10是示出根据一个示例实现的阻挡来自S4表面的左和右聚焦跟踪光束的反射的光束阻挡器的示例放置的图。这个示例显示来自表面S4的反射424在光束分离器532处彼此会聚,如在图8和图9中看到的。这个示例还示出阻挡结构可如何被包括以阻挡来自表面S4的这些反射而不干扰来自S2和S3表面的期望反射。这可以在所示出的示例中使用在光束分离器532的聚焦跟踪模块侧上的4mm宽遮蔽来实现。FIG10 is a diagram illustrating an example placement of a beam blocker to block reflections of the left and right focus tracking beams from the S4 surface, according to one example implementation. This example shows that reflections 424 from surface S4 converge at beam splitter 532, as seen in FIG8 and FIG9. This example also illustrates how a blocking structure can be included to block these reflections from surface S4 without interfering with the desired reflections from the S2 and S3 surfaces. This can be achieved in the example shown using a 4 mm wide mask on the focus tracking module side of beam splitter 532.
图11和图12是示出在使用多层样品容器(诸如在图3B中所示的多层样品容器)的图7的示例配置中在光束分离器532处的反射聚焦跟踪光束的空间关系的图。图11和图12显示在25mm×25mm面积内的光束。图11显示了当系统被配置为聚焦在表面S2处的样品井的顶部上时在顶部潜望镜526处的光束的空间关系,而图12显示了在系统配置成聚焦在表面S3处的样品井的底部上的情况下在顶部潜望镜526处的光束的空间关系。因为在这个示例中离开S4表面的聚焦跟踪光束的反射在到达返回路径中的这个点之前在光束分离器532处被阻挡,所以没有来自表面S4的光斑。更重要的是,这表明来自表面S1的反射光束具有与离开S2和S3表面的期望反射的良好的空间分离。Figures 11 and 12 are diagrams illustrating the spatial relationship of the reflected focus tracking beams at beam splitter 532 in the example configuration of Figure 7 using a multi-layer sample container, such as that shown in Figure 3B . Figures 11 and 12 show the beams within a 25 mm x 25 mm area. Figure 11 shows the spatial relationship of the beams at top periscope 526 when the system is configured to focus on the top of the sample well at surface S2, while Figure 12 shows the spatial relationship of the beams at top periscope 526 when the system is configured to focus on the bottom of the sample well at surface S3. Because the reflection of the focus tracking beam exiting surface S4 in this example is blocked at beam splitter 532 before reaching this point in the return path, there is no spot of light from surface S4. More importantly, this demonstrates that the reflected beam from surface S1 has good spatial separation from the desired reflections from surfaces S2 and S3.
使用光束的这个空间放置,孔径可以用于阻挡S1反射,同时允许来自S2和S3表面的反射光束穿过并最终到达图像传感器。图13和图14示出从顶部潜望镜526和光束分离器524反射的光束。如这个所示,如果光束没有在顶部潜望镜526处被阻挡,则它们将从光束分离器524反射并撞击在屋脊棱镜546的边缘上。如该建模所示的,可以通过在上部潜望镜526处放置20mm×20mm孔径来阻挡来自表面S1的反射光束。可选地,可以将上部潜望镜526的尺寸减小到20mm×20mm的尺寸,使得来自S1表面的反射光束不返回到图像传感器。在其他应用中或对于孔径的其他放置定位,所实现的孔径的尺寸可以基于S1光束的位置而变化。在另一个示例实现中,孔径为20.8mm宽。选择这个宽度以适应在大约-20μm到+30μm(在一个应用中大约是对于S2的最佳焦点)处的S2图像和在约-25μm到+25μm(在一个应用中大约是对于S3的最佳焦点)处的S3图像。Using this spatial placement of the beams, an aperture can be used to block the S1 reflection while allowing the reflected beams from the S2 and S3 surfaces to pass through and ultimately reach the image sensor. Figures 13 and 14 illustrate the beams reflected from the top periscope 526 and beam splitter 524. As shown, if the beams were not blocked at the top periscope 526, they would reflect from the beam splitter 524 and impinge on the edge of the roof prism 546. As shown in this modeling, the reflected beams from surface S1 can be blocked by placing a 20 mm x 20 mm aperture at the upper periscope 526. Alternatively, the size of the upper periscope 526 can be reduced to 20 mm x 20 mm so that the reflected beams from the S1 surface do not return to the image sensor. In other applications or for other placements of the aperture, the size of the aperture implemented can vary based on the location of the S1 beam. In another example implementation, the aperture is 20.8 mm wide. This width is chosen to accommodate S2 images at approximately -20 μm to +30 μm (approximately the best focus for S2 in one application) and S3 images at approximately -25 μm to +25 μm (approximately the best focus for S3 in one application).
图15A提供示出通过物镜538从样品反射并指向光束分离器532的聚焦跟踪光束的自顶向下视图。尽管在图15A中未示出反射镜536,但这示出反射聚焦跟踪光束朝着光束分离器532被反射。这个示例还示出S4反射光束被位于光束分离器532的背面处的光束阻挡器阻挡。尽管在图15A中未示出光束阻挡器,但一个例证性示例在图16A和图16B中被提供。FIG15A provides a top-down view showing a focus tracking beam reflected from a sample by an objective lens 538 and directed toward a beam splitter 532. Although mirror 536 is not shown in FIG15A , this shows the reflected focus tracking beam being reflected toward the beam splitter 532. This example also shows that the S4 reflected beam is blocked by a beam blocker located at the back of the beam splitter 532. Although a beam blocker is not shown in FIG15A , an illustrative example is provided in FIG16A and FIG16B .
图15B提供了图15A的特写视图,示出在光束分离器532的背面处从表面S4反射的聚焦跟踪光束的示例。如该示例所示的,从表面S4反射的聚焦跟踪光束被阻挡构件562阻挡。如该示例也示出的,阻挡构件562的正面被定向为与光束分离器532的背面实质上平行。在一个示例实现中,阻挡构件562布置在系统中以与光束分离器532的背面分开50μm。在其他示例中,可以提供其他分离间距。例如,在一些实现中,间距可以在25μm-100μm的范围内。尽管该示例将阻挡构件562示为具有矩形横截面,但阻挡构件562可以使用其他形状或几何形状来实现,其示例在下面参考图16A和图16B被示出。FIG15B provides a close-up view of FIG15A , illustrating an example of a focus tracking beam reflected from surface S4 at the back side of beam splitter 532. As shown in this example, the focus tracking beam reflected from surface S4 is blocked by blocking member 562. As also shown in this example, the front side of blocking member 562 is oriented substantially parallel to the back side of beam splitter 532. In one example implementation, blocking member 562 is arranged in the system to be separated from the back side of beam splitter 532 by 50 μm. In other examples, other separation spacings may be provided. For example, in some implementations, the spacing may be in the range of 25 μm-100 μm. Although this example illustrates blocking member 562 as having a rectangular cross-section, blocking member 562 may be implemented using other shapes or geometries, examples of which are shown below with reference to FIG16A and FIG16B .
图15C是示出定位在成像系统的一部分内的阻挡构件和分离器的示例的自顶向下视图。在该示例中,阻挡构件562定位在光束分离器532的背面处以阻挡从S4表面反射的光束。从物镜538出射的反射光束朝着光束分离器532被反射镜536反射。阻挡构件562被定位成阻挡从S4表面反射的光束并且具有足够小的宽度,以便不干扰从S2和S3表面反射的光束。FIG15C is a top-down view showing an example of a blocking member and a splitter positioned within a portion of an imaging system. In this example, a blocking member 562 is positioned behind the beam splitter 532 to block the light beam reflected from the S4 surface. The reflected light beam emitted from the objective lens 538 is reflected by the mirror 536 toward the beam splitter 532. The blocking member 562 is positioned to block the light beam reflected from the S4 surface and has a width that is small enough so as not to interfere with the light beams reflected from the S2 and S3 surfaces.
在所示的示例中,阻挡构件562是4mm宽且长度为2mm,并从物镜538的光轴稍微偏离。然而,它与安装在壳体565中的下部潜望镜528的中心对齐。更具体地,在一个示例实现中,阻挡构件562与物镜光轴的左侧偏移1.1毫米以确保它相对于从S4表面反射的光束居中。In the example shown, the blocking member 562 is 4 mm wide and 2 mm long and is slightly offset from the optical axis of the objective lens 538. However, it is aligned with the center of the lower periscope 528 mounted in the housing 565. More specifically, in one example implementation, the blocking member 562 is offset 1.1 mm to the left of the objective lens optical axis to ensure that it is centered with respect to the light beam reflected from the S4 surface.
图15D是示出在分离器处反射聚焦跟踪光束的光束路径中的4mm宽的阻挡结构的表示的图。如这个示例所示的,4mm宽的阻挡结构(由矩形631表示)具有足够的宽度以阻挡从表面S4反射的聚焦跟踪光束,其在图的中心中示出。如该示例也示出的,阻挡构件的宽度被选择为足够宽以阻挡不需要的反射光束,但仍为S2和S3成像提供最大可能的捕获范围。因为在聚焦中的微小变化可以有在光束分离器处的光束的位置中的相应的变化,所以可以将阻挡构件的宽度选择为稍宽于在完美聚焦条件下阻挡光束所必需的宽度。换句话说,阻挡构件可以足够宽以适应在聚焦系统中的不精确度的所确定的程度。FIG15D is a diagram showing a representation of a 4 mm wide blocking structure in the beam path of a focus tracking beam reflected at a beam splitter. As shown in this example, the 4 mm wide blocking structure (represented by rectangle 631) has sufficient width to block the focus tracking beam reflected from surface S4, which is shown in the center of the diagram. As also shown in this example, the width of the blocking member is selected to be wide enough to block unwanted reflected beams, but still provide the maximum possible capture range for imaging S2 and S3. Because small changes in focus can have corresponding changes in the position of the beams at the beam splitter, the width of the blocking member can be selected to be slightly wider than necessary to block the beams under perfect focus conditions. In other words, the blocking member can be wide enough to accommodate a determined degree of inaccuracy in the focusing system.
图16A和图16B是示出根据参考图8-10描述的示例实现的可用于阻挡在光束分离器532处的S4反射的光束阻挡器的示例的图。图17A至图18B是示出在图16A和图16B中所示的光束阻挡器的示例性放置的图。图16A的左手侧示出光束阻挡器620的后视图(从光束的角度看);以及右手侧示出光束阻挡器620的透视图。光束阻挡器620包括限定反射束可以穿过的孔径624的框架部分622。包括阻挡面630的光束阻挡构件626由延伸臂628支撑在适当的位置上以阻挡来自S4的不需要的反射光束。在所示的示例中,延伸臂628是附着、固定、接合或以其他方式连接到框架部分622的相对侧的细长结构构件,并且光束阻挡构件626越过延伸臂628的远端延伸。Figures 16A and 16B illustrate examples of a beam blocker that can be used to block S4 reflections at beam splitter 532, according to the example implementation described with reference to Figures 8-10. Figures 17A through 18B illustrate exemplary placement of the beam blocker shown in Figures 16A and 16B. The left-hand side of Figure 16A shows a rear view of beam blocker 620 (as viewed from the perspective of the beam); the right-hand side shows a perspective view of beam blocker 620. Beam blocker 620 includes a frame portion 622 defining an aperture 624 through which a reflected beam can pass. A beam blocking member 626, including a blocking surface 630, is supported in position by an extension arm 628 to block unwanted reflected beams from S4. In the example shown, extension arm 628 is an elongated structural member attached, fixed, joined, or otherwise connected to opposite sides of frame portion 622, with beam blocking member 626 extending beyond the distal end of extension arm 628.
框架部分622和延伸臂628提供安装结构,通过该安装结构,光束阻挡构件626可以安装在光束分离器532处的适当位置上而不干扰来自表面S2和S3的反射。光束阻挡器620可以被铸造、模制、用机器加工或以其他方式制造为整体结构。在其他示例中,构成光束阻挡器620的元件可以是被附着、接合、紧固或以其他方式连接在一起以形成作为结果的组件的单独部件。光束阻挡器620可以使用光吸收不透明表面来实现,以避免在系统内的其他不需要的反射。例如,光束阻挡器620可以使用黑色阳极氧化铝或其他光吸收或光吸收涂覆材料制成。光束阻挡器620可以针对特定的应用被设计尺寸。在一个示例应用中,光束阻挡器620被设计尺寸以提供:30mm的孔径宽度和21mm的高度;25mm长的延伸臂628;以及2.8mm宽和21mm长的阻挡表面。The frame portion 622 and the extension arm 628 provide a mounting structure by which the beam block member 626 can be mounted in position at the beam splitter 532 without interfering with reflections from surfaces S2 and S3. The beam block 620 can be cast, molded, machined, or otherwise manufactured as a unitary structure. In other examples, the elements comprising the beam block 620 can be separate components that are attached, bonded, fastened, or otherwise connected together to form a resulting assembly. The beam block 620 can be implemented using a light-absorbing opaque surface to prevent other unwanted reflections within the system. For example, the beam block 620 can be made of black anodized aluminum or other light-absorbing or light-absorbing coating material. The beam block 620 can be sized for a specific application. In one example application, the beam block 620 is sized to provide: an aperture width of 30 mm and a height of 21 mm; an extension arm 628 of 25 mm length; and a blocking surface of 2.8 mm wide and 21 mm long.
现在参考图16B,视图682示出光束阻挡器620的自顶向下视图,并且视图683示出在光束阻挡器620的A处的横截面侧视图。延伸臂628的前边缘逐渐变细以符合光束分离器532的角度,如在图17A和图17B(下面描述)中进一步所示的。光束阻挡构件具有三角形横截面并且被定向为将平坦阻挡面630呈现给入射光束。虽然可以使用光吸收材料来制造光束阻挡器620,但是向不需要的光束呈现三角形横截面可以具有从返回路径反射任何未被吸收的光的效果。Referring now to FIG16B , view 682 shows a top-down view of beam blocker 620, and view 683 shows a cross-sectional side view at point A of beam blocker 620. The leading edge of extension arm 628 tapers to conform to the angle of beam splitter 532, as further illustrated in FIG17A and FIG17B (described below). The beam blocking member has a triangular cross-section and is oriented to present a flat blocking surface 630 to the incident beam. While light-absorbing materials can be used to fabricate beam blocker 620, presenting a triangular cross-section to the unwanted beam can have the effect of reflecting any unabsorbed light from the return path.
图17A示出安装在光束分离器532处的光束阻挡器620的剖视图。现在参考图17A,在操作中,来自表面S1、S2、S3和S4的聚焦跟踪光束的反射从物镜向上行进,从反射镜536反射并且指向光束分离器532。阻挡构件626的阻挡面630(见图16A和图16B)阻止S4反射继续穿过光束分离器532。在该示例中示出,延伸臂628被设计尺寸以便将阻挡构件626放置在光束分离器532的表面处或附近。该图还示出延伸臂628的锥形前锥角,以允许阻挡构件626的阻挡面630被放置为与光束分离器532相邻并且在与光束分离器532实质上相同的角度处。在一些示例中,阻挡构件626被定位成使得阻挡面630与光束分离器532处于接触关系中。在其他示例中,阻挡构件626被定位成使得阻挡面630与光束分离器532的面分开小的数量,诸如例如50μm至500μm。FIG17A shows a cross-sectional view of beam blocker 620 mounted at beam splitter 532. Referring now to FIG17A, in operation, reflections of the focus tracking beam from surfaces S1, S2, S3, and S4 travel upward from the objective lens, reflect from mirror 536, and are directed toward beam splitter 532. Blocking surface 630 of blocking member 626 (see FIG16A and FIG16B) prevents the S4 reflection from continuing through beam splitter 532. In the example shown, extension arm 628 is sized to position blocking member 626 at or near a surface of beam splitter 532. The figure also shows the tapered front angle of extension arm 628 to allow blocking surface 630 of blocking member 626 to be positioned adjacent to and at substantially the same angle as beam splitter 532. In some examples, blocking member 626 is positioned so that blocking surface 630 is in contact with beam splitter 532. In other examples, the blocking member 626 is positioned so that the blocking surface 630 is separated from the surface of the beam splitter 532 by a small amount, such as, for example, 50 μm to 500 μm.
在可选的示例中,阻挡元件可以布置在光束分离器532的背侧上,而没有图16A至图17B所示的结构。例如,在一些实例中,可以将不透明材料带附接到光束分离器532的背面。在其他实例中,不透明或光学吸收性涂层能够以窄条纹施加到光束分离器532的后部。In alternative examples, a blocking element may be disposed on the back side of the beam splitter 532 without the structures shown in Figures 16A to 17B. For example, in some examples, a strip of opaque material may be attached to the back side of the beam splitter 532. In other examples, an opaque or optically absorptive coating may be applied to the rear portion of the beam splitter 532 in narrow stripes.
对于扫描操作,成像光束(其例如可以是红色和绿色成像光束)从右手侧进入系统,如箭头690所示的。这些光束从光束分离器532的正面朝着反射镜536反射。反射镜536将成像光束向下反射到物镜中。因此,也选择阻挡构件626的位置,以便不干扰朝着样品反射的成像光束(通过光束分离器532的正面)。For scanning operation, imaging beams (which can be, for example, red and green imaging beams) enter the system from the right-hand side, as indicated by arrows 690. These beams are reflected from the front face of the beam splitter 532 toward the mirror 536. The mirror 536 reflects the imaging beams downward into the objective lens. Therefore, the position of the blocking member 626 is also selected so as not to interfere with the imaging beams reflected toward the sample (through the front face of the beam splitter 532).
该示例还示出阻挡构件626呈现三角形横截面,其中阻挡构件626的后边缘逐渐变细以在锐角处交会。可以使用对于阻挡构件626的其他横截面几何形状,假定阻挡面630适当地被设计尺寸以阻挡或实质上阻挡来自表面S4的反射。然而,减小朝着阻挡构件626的后部的横截面的几何形状(诸如所示的几何形状)可以使阻挡构件626可能以其他方式提供对期望光束的不需要的干涉的机会最小化。This example also shows that the blocking member 626 presents a triangular cross-section, wherein the rear edge of the blocking member 626 tapers to meet at an acute angle. Other cross-sectional geometries for the blocking member 626 may be used, assuming that the blocking surface 630 is appropriately sized to block or substantially block reflections from the surface S4. However, a geometry that decreases in cross-section toward the rear of the blocking member 626, such as the geometry shown, may minimize the chance that the blocking member 626 may otherwise provide unwanted interference with the desired light beam.
图17B呈现安装在光束分离器532处的光束阻挡器620的后视图。这示出使用螺栓732安装在适当位置上的框架部分622。这示出由孔径624提供的窗口,该窗口允许从表面S2和S3(以及稍后在路径中被阻挡的S1)反射的光通过,而阻挡构件626在它离开光束分离器532之前阻挡来自表面S4的光。17B presents a rear view of the beam blocker 620 mounted at the beam splitter 532. This shows the frame portion 622 mounted in place using bolts 732. This shows the window provided by aperture 624, which allows light reflected from surfaces S2 and S3 (and S1 later in the path to be blocked) to pass through, while the blocking member 626 blocks light from surface S4 before it exits the beam splitter 532.
图18A示出可用于阻挡从S1表面反射的光束的孔径的示例。在一个示例中,这可以放置在潜望镜孔径处的聚焦跟踪模块的内壁上。如上面提到的,在一个示例实现中,孔径为20.8mm×20.8mm,但在其他示例中可以提供其他孔径尺寸。与阻挡构件一样,可以选择孔径的尺寸以阻挡不需要的反射,同时相对于“最佳聚焦”考虑因素提供对S2和S3反射光束可能的最大捕获范围。图18B示出在垂直于光束轴的光束分离器524前面的孔径740的示例放置。FIG18A shows an example of an aperture that can be used to block beams reflected from the S1 surface. In one example, this can be placed on the inner wall of the focus tracking module at the periscope aperture. As mentioned above, in one example implementation, the aperture is 20.8 mm x 20.8 mm, but other aperture sizes can be provided in other examples. As with the blocking member, the size of the aperture can be selected to block unwanted reflections while providing the maximum possible capture range of the S2 and S3 reflected beams relative to "best focus" considerations. FIG18B shows an example placement of the aperture 740 in front of the beam splitter 524 perpendicular to the beam axis.
图19和图20显示了阻挡S4反射的附加光束阻挡器620和阻挡S1反射的20.8mm×20.8mm孔径的结果。图19显示了来自在用于在样品的顶部(表面S2)处聚焦的顶部潜望镜526处的光束的光斑,以及图20显示了来自在用于在样品的底部(表面S3)处聚焦的顶部潜望镜526处的光束的光斑。Figures 19 and 20 show the results of the additional beam blocker 620 that blocks the S4 reflection and the 20.8 mm x 20.8 mm aperture that blocks the S1 reflection. Figure 19 shows the spot of the beam from the top periscope 526 for focusing at the top of the sample (surface S2), and Figure 20 shows the spot of the beam from the top periscope 526 for focusing at the bottom of the sample (surface S3).
虽然上述内容使用在表面S2和S3处聚焦的物镜来被说明,但完美聚焦并不总是被实现,且因此示例可以被实现以解释在上部和下部样品之上和之下的捕获范围。例如,上述建模也被执行,假设有适应在距上部和下部样品表面+/-25μm内聚焦的“最佳聚焦”。这种“最佳聚焦”建模确认上述结构足以阻挡在最佳聚焦操作下来自S1和S4表面的不需要的反射。While the above is illustrated using an objective lens focused at surfaces S2 and S3, perfect focus is not always achieved, and therefore examples can be implemented to account for the capture range above and below the upper and lower samples. For example, the above modeling was also performed assuming a "best focus" adapted to focus within +/- 25 μm from the upper and lower sample surfaces. This "best focus" modeling confirmed that the above configuration was sufficient to block unwanted reflections from the S1 and S4 surfaces under best focus operation.
图21-24是示出在示例“最佳聚焦”捕获范围的顶部和底部处的图像传感器处的光斑放置的图。在这个实例中,以+/-25μm的捕获范围执行建模。这些图示出11.26mm x11.26mm的图像传感器面积。图21示出用于在捕获范围的顶部处成像以用于使用离S2的物镜位置1.064mm聚焦在S2上的S2、S3反射光束的在摄像机处的光斑。图22示出用于在捕获范围的底部处成像以用于使用离S2的物镜位置1.014mm聚焦在S2上的S2、S3反射光束的在摄像机处的光斑。图21和图22示出离理想聚焦位置的+/-25μm的变化。图23示出当在S3上聚焦时用于在捕获范围的顶部处成像的S2、S3反射光束的在摄像机处的光斑。图24示出当在S3上聚焦时用于在捕获范围的底部处成像的S2、S3反射光束的在摄像机处的光斑。Figures 21-24 are diagrams showing the placement of light spots at the image sensor at the top and bottom of an example "best focus" capture range. In this example, modeling was performed with a capture range of +/- 25 μm. These figures show an image sensor area of 11.26 mm x 11.26 mm. Figure 21 shows the light spots at the camera for the S2 and S3 reflected light beams used for imaging at the top of the capture range for focusing on S2 using an objective lens position of 1.064 mm from S2. Figure 22 shows the light spots at the camera for the S2 and S3 reflected light beams used for imaging at the bottom of the capture range for focusing on S2 using an objective lens position of 1.014 mm from S2. Figures 21 and 22 show variations of +/- 25 μm from the ideal focus position. Figure 23 shows the light spots at the camera for the S2 and S3 reflected light beams used for imaging at the top of the capture range when focusing on S3. FIG. 24 shows the light spots at the camera for the S2 , S3 reflected light beams for imaging at the bottom of the capture range when focusing on S3 .
如上所述,在利用多光束系统的聚焦跟踪操作中,测量在图像传感器上的聚焦跟踪光束的光斑之间的光斑间隔或距离,以确定聚焦。因此,光斑间隔的稳定性可能是在实现准确的测量的重要因素。光斑间隔稳定性可能被诸如作为时间的函数的聚焦阶段(有时被称为Z阶段)的光斑质量/形状的移动以及用于解析光斑间隔的质心算法的分辨率的因素影响。对光斑间隔稳定性的一个挑战在于光斑固有地包括边缘。由于激光器的模式跳变,边缘图案可改变,这随着时间的推移而引起光斑剖面的变化,其影响聚焦跟踪模块的光斑间隔稳定性。在图25A中示出这个的示例,图25A示出光斑边缘变化。这个示例显示了在12mW的功率下、以250μs的曝光时间、使用在适当位置上的OD 1.0ND滤光器操作的激光器的光斑边缘变化。As described above, in focus tracking operations utilizing a multi-beam system, the spot separation, or distance, between the spots of the focus tracking beam on the image sensor is measured to determine focus. Therefore, the stability of the spot separation can be an important factor in achieving accurate measurements. Spot separation stability can be affected by factors such as the movement of the spot quality/shape during the focus stage (sometimes referred to as the Z stage) as a function of time, and the resolution of the centroid algorithm used to resolve the spot separation. One challenge to spot separation stability is that the spot inherently includes edges. Due to mode hopping of the laser, the edge pattern can change, which causes changes in the spot profile over time, which affects the spot separation stability of the focus tracking module. An example of this is shown in FIG25A , which illustrates spot edge variation. This example shows the spot edge variation of a laser operating at a power of 12 mW, with an exposure time of 250 μs, and using an OD 1.0 ND filter in place.
在通常被称为放大式自发辐射(ASE)的模式中操作激光器往往提供更干净的光斑剖面。在图25B中示出这个的示例。这个示例是针对以500μW、250us曝光(无ND滤光器)操作的相同激光二极管。在这种模式下,源发射时间非相干光,更像LED而不是激光器一样运转,并具有5至10nm FWHM(半高全宽强度)的宽光学带宽。然而,在ASE模式下操作有几个缺点,这就是为什么一般早先存在的成像系统不在这种模式中操作。首先,ASE模式不是用于激光二极管的激光发射模式,因此输出功率非常低。它通常被定义为低于其中没有激光发射出现的激光发射阈值的模式。因此,它的输出是时间非相干的,并且包括跨越宽光谱的频率分量。Operating a laser in a mode commonly referred to as amplified spontaneous emission (ASE) tends to provide a cleaner spot profile. An example of this is shown in Figure 25B. This example is for the same laser diode operated at 500μW, 250us exposure (no ND filter). In this mode, the source emits temporally incoherent light, behaves more like an LED than a laser, and has a wide optical bandwidth of 5 to 10nm FWHM (full width at half maximum intensity). However, there are several disadvantages to operating in ASE mode, which is why generally existing imaging systems do not operate in this mode. First, ASE mode is not a lasing mode for a laser diode, so the output power is very low. It is generally defined as a mode below the lasing threshold in which no lasing occurs. Therefore, its output is temporally incoherent and includes frequency components across a wide spectrum.
图26是示出在ASE模式下操作的激光二极管的示例的图。在这个示例中,激光二极管在0.17mW处操作,并且展示具有跨越宽范围的波长的频率分量的相对平坦的光谱(当与在激光发射模式下操作的二极管相比时)。没有单一的操作模式,且输出是不相干的。在光源中的不相干可导致不希望有的效应,诸如相消干涉和色差。另外,在ASE模式下操作可能根本是不切实际的,因为没有被发射来产生足够强度的光束的足够的功率。然而,存在其中激光器可以在ASE模式中操作的其他应用。在这种模式下,激光二极管倾向于更像LED运作,且因此它可能对某些应用是有用的。FIG26 is a diagram showing an example of a laser diode operated in ASE mode. In this example, the laser diode is operated at 0.17 mW and exhibits a relatively flat spectrum (when compared to a diode operated in laser emission mode) with frequency components spanning a wide range of wavelengths. There is no single mode of operation, and the output is incoherent. Incoherence in the light source can lead to undesirable effects such as destructive interference and chromatic aberration. Additionally, operation in ASE mode may simply be impractical because there is not enough power being emitted to produce a beam of sufficient intensity. However, there are other applications in which a laser can be operated in ASE mode. In this mode, the laser diode tends to behave more like an LED, and therefore it may be useful for certain applications.
图27是示出在激光发射模式中操作的同一激光二极管的示例的图。FIG. 27 is a diagram showing an example of the same laser diode operating in a laser emission mode.
图27的上半部分的图示出在0.96mW处操作的同一激光二极管,并且图27的下半部分的图示出在1.22mW处操作的同一激光二极管。在这两种情况下,输出都与在工作频率处的单个主峰和几乎忽略的副峰有效地高度相干。这与没有主峰的ASE模式明显相反。The graph in the upper half of Figure 27 shows the same laser diode operating at 0.96 mW, and the graph in the lower half of Figure 27 shows the same laser diode operating at 1.22 mW. In both cases, the output is effectively highly coherent, with a single main peak at the operating frequency and almost negligible secondary peaks. This is in stark contrast to the ASE mode, which has no main peak.
图28是示出在混合模式中操作的激光二极管的示例的图。图28显示了在该示例中的激光器在0.43mW处操作。在这个功率水平处,几个主峰开始形成,但仍有强的副峰。如该图所示,激光二极管不在强激光发射模式中,然而它也不在完全的ASE模式中。功率水平可能仍然被定义为高于激光发射阈值,但输出不完全相干。Figure 28 is a graph illustrating an example of a laser diode operating in hybrid mode. Figure 28 shows the laser in this example operating at 0.43 mW. At this power level, several primary peaks begin to form, but there are still strong secondary peaks. As shown in this figure, the laser diode is not in strong lasing mode, but it is also not in full ASE mode. The power level may still be defined as above the lasing threshold, but the output is not fully coherent.
由于ASE模式可在没有足够的功率下产生输出,因此在ASE模式下的操作在操作上不切实际。如上面参考图25A提到的,然而,在激光发射模式中操作扫描系统产生时间变化的边缘,其提供在光斑测量中的不稳定性。Since ASE mode may not produce output at sufficient power, operation in ASE mode is operationally impractical. As mentioned above with reference to FIG25A, however, operating the scanning system in laser emission mode produces temporally varying edges that provide instabilities in the spot measurement.
在图29处示出这个的示例,图29显示了根据本文描述的系统和方法的一个示例的、当激光二极管被供电以在激光发射模式中操作时在光斑的形态中的不稳定性。如在该图中所示,在图像传感器上的左光束光斑的标准偏差为1.619像素,而在图像传感器上的右光束光斑的标准偏差为0.518像素。但是,如对于左和右光斑的曲线图所示的,对于每个光束的光斑的运动可从一个帧到下一帧是显著的,并且实际上可能移动几个像素。对于左光斑的两个相邻帧的光束剖面显示在图的右手侧上的剖面图像中。这些剖面图像说明光束光斑放置的偏差如何随着时间的推移而产生。An example of this is shown in FIG29, which illustrates instabilities in the morphology of the light spot when the laser diode is powered to operate in laser emission mode according to an example of the systems and methods described herein. As shown in the figure, the standard deviation of the left beam spot on the image sensor is 1.619 pixels, while the standard deviation of the right beam spot on the image sensor is 0.518 pixels. However, as shown in the graphs for the left and right spots, the movement of the spot for each beam can be significant from one frame to the next and may actually move by several pixels. The beam profiles for two adjacent frames for the left spot are shown in the cross-sectional images on the right-hand side of the figure. These cross-sectional images illustrate how deviations in the placement of the beam spots can occur over time.
由于焦点通过测量在图像传感器上的左和右光斑之间的距离来确定,因此在光斑放置中的变化可导致聚焦跟踪的不准确性。如在图29的顶部两个曲线图中所示的左和右光束的运动的影响在图的底部曲线图中示出。该曲线图显示了在相同数量的帧上在左和右光斑之间的距离变化(在此被称为Delta X)。这显示1.178像素的标准偏差,其导致具有95%置信区间(对于高斯群体,~2*StDev)的+/-139nm的光斑间隔稳定性。这如图所示被计算为(1.178*1.96)/16.36=+/-139nm。16.36因子表示以像素/μm为单位的聚焦跟踪增益。它表示对于物镜到样品距离的每1μm移动获得多少个光斑间隔的像素。它用于光斑间隔中的增量(像素)到在z方向上的空间中的增量(nm)的转换。Since focus is determined by measuring the distance between the left and right light spots on the image sensor, variations in light spot placement can lead to inaccuracies in focus tracking. The effect of the motion of the left and right light beams, as shown in the top two graphs of FIG29 , is shown in the bottom graph of the figure. The graph shows the variation in the distance between the left and right light spots (referred to herein as Delta X) over the same number of frames. This shows a standard deviation of 1.178 pixels, which results in a light spot spacing stability of +/- 139 nm with a 95% confidence interval (~2*StDev for a Gaussian population). This is calculated as (1.178*1.96)/16.36=+/- 139 nm as shown in the figure. The 16.36 factor represents the focus tracking gain in pixels/μm. It indicates how many pixels of light spot spacing are obtained for every 1 μm of movement of the objective lens to the sample distance. It is used to convert increments in the light spot spacing (pixels) to increments in space in the z direction (nm).
本发明人已经发现,干涉边缘图案由于样品容器的多级结构而出现,如图3A所示。本发明人还发现,这是在多层玻璃样品容器内的多个光束和/或散射光的叠加的结果。没有其他变化的样品容器的位置(例如在X和Y方向上)的变化可以导致边缘的移动。The present inventors have discovered that interference fringe patterns appear due to the multi-level structure of the sample container, as shown in FIG3A . The present inventors have also discovered that this is the result of the superposition of multiple light beams and/or scattered light within the multi-level glass sample container. A change in the position of the sample container (e.g., in the X and Y directions) without other changes can cause the fringe to shift.
图30A和图30B示出在激光二极管在混合模式中操作的情况下的光斑移动的附加示例。特别地,图30A和图30B示出具有不是模式跳变的稳定激光器的更优化的情形。如图30A所示,左光斑的标准偏差下降到0.069像素,而右光斑下降到0.064像素。如在图上的上部两个曲线图所示,从一个帧到另一帧的光斑移动通常小于一个像素。由于运动可以是加性的,因此在左和右光斑之间的Delta X差异可能有0.122像素的标准偏差。这将光斑间隔稳定性降低至+/-15.2nm((0.122*1.96)/16.36nm=+/-15.2nm)。在这里,16.36是以像素/μm为单位的FTM增益。这是当物镜在Z轴上移动1μm时获得的像素中的Delta X的量。这可用于将Delta X中的像素转换为Z空间中的μm,反之亦然。此外,1.96是对于标准偏差的倍增因子,以表示分布(假设它是高斯分布)的误差的95%置信区间。Figures 30A and 30B show additional examples of spot movement when the laser diode is operating in hybrid mode. Specifically, Figures 30A and 30B illustrate a more optimized scenario with a stable laser that is not mode-hopping. As shown in Figure 30A, the standard deviation of the left spot drops to 0.069 pixels, while the right spot drops to 0.064 pixels. As shown in the upper two graphs in the figure, the spot movement from one frame to the next is typically less than one pixel. Because the motion can be additive, the Delta X difference between the left and right spots can have a standard deviation of 0.122 pixels. This reduces the spot spacing stability to +/- 15.2 nm ((0.122 * 1.96) / 16.36 nm = +/- 15.2 nm). Here, 16.36 is the FTM gain in pixels/μm. This is the amount of Delta X in a pixel achieved when the objective lens moves 1 μm in the Z axis. This can be used to convert pixels in Delta X to μm in Z space and vice versa. Additionally, 1.96 is a multiplication factor for the standard deviation to express a 95% confidence interval for the error of the distribution (assuming it is Gaussian).
在图30B的示例中,左光斑的标准偏差下降到0.069像素,并且右光斑也下降到0.069像素。如在图上的上面两个曲线图所示,从一个帧到另一帧的光斑移动通常小于一个像素。由于运动可以是加性的,因此在左和右光斑之间的Delta X差异可能有0.127像素的标准偏差。这将光斑间隔稳定性降低至+/-14.6nm((0.127*1.96)/16.36nm=+/-14.6nm)。In the example of FIG30B , the standard deviation of the left spot has dropped to 0.069 pixels, and the right spot has also dropped to 0.069 pixels. As shown in the upper two graphs on the graph, the spot movement from one frame to another is typically less than one pixel. Since motion can be additive, the Delta X difference between the left and right spots may have a standard deviation of 0.127 pixels. This reduces the spot spacing stability to +/- 14.6 nm ((0.127 * 1.96) / 16.36 nm = +/- 14.6 nm).
如上面提到的,在早先存在的ASE模式中运行激光器是不切实际的。如也刚刚描述的,使用在高于激光发射阈值的功率水平下运行的激光二极管,准确度受到损害,并且如果出现模式跳变(例如,诸如经由功率变化)则尤其如此。然而,本发明人已经发现,在ASE模式和完全激光发射模式之间的混合模式中操作激光器为在图像传感器处的测量提供足够的光束强度且为提高的测量精度提供增加的光斑放置稳定性。这种模式在一些实例中可以通过稍微在激光二极管的激光发射阈值之上操作来实现。例如,这可能稍微超过激光发射曲线的拐点而出现,但仍然足够低,以至于相当一部分功率在ASE状态中。这产生了输出,其中大量的光仍然具有更宽的光谱宽度,导致显著降低的相干性。As mentioned above, operating a laser in the previously existing ASE mode is impractical. As also just described, using a laser diode operated at power levels above the lasing threshold, accuracy suffers, and this is particularly true if mode hopping occurs (e.g., such as via power variations). However, the inventors have discovered that operating the laser in a hybrid mode between ASE mode and full lasing mode provides sufficient beam intensity for measurements at the image sensor and increased spot placement stability for improved measurement accuracy. Such a mode can be achieved in some instances by operating slightly above the lasing threshold of the laser diode. For example, this may occur slightly beyond the inflection point of the lasing curve, but still low enough that a significant portion of the power is in the ASE state. This produces an output in which a significant amount of the light still has a wider spectral width, resulting in significantly reduced coherence.
与可能用于尝试实现相同效果的其他光源相比,在这种混合模式中操作激光器可能是有利的。激光二极管往往是理想的光源,因为由于在该领域中的不同公司对这种类型的设备的高产量制造,激光二极管展示高可靠性和低成本。在这种较低功率模式下操作激光二极管甚至可以提高激光二极管可实现的典型高MTBF额定值。因此,能够实现具有非常高的寿命和MTBF额定值(激光二极管特性和非常低的操作功率的组合)、低制造成本和足够短的相干长度以消除由样品容器的多层结构引起的干涉边缘的设备的结果。Operating the laser in this hybrid mode can be advantageous compared to other light sources that might be used to attempt to achieve the same effect. Laser diodes are often ideal light sources because they exhibit high reliability and low cost due to the high-volume manufacturing of this type of device by various companies in the field. Operating the laser diode in this lower power mode can even improve the typically high MTBF ratings achievable with laser diodes. Thus, it is possible to achieve a device with very high lifetime and MTBF ratings (a combination of laser diode characteristics and very low operating power), low manufacturing cost, and a coherence length short enough to eliminate interference fringes caused by the multi-layer structure of the sample container.
表1是说明在各种可选的解决方案被实现的情况下的光斑间隔稳定性的图。第一组测量假定12mW的激光功率以在激光发射模式中操作,ND滤光器的存在以使光衰减,以及250μs曝光。在这里,质量中心或光斑间隔稳定性对于本底噪声1为396.02nm,以及对于本底噪声2为146.0nm。如表格所示的,如果添加2D或1D高斯滤波,则稳定性提高。可以添加高斯滤波器来减轻边缘的影响,并提供更均匀的光斑剖面。也如这个表所示的,将激光二极管的功率降低至0.5mW减少质心误差,这意味着更大的稳定性。特别地,在本示例中,质心误差对本底噪声1减小到14.6nm而对本底噪声2减小到15.2nm。Table 1 is a graph illustrating the spot spacing stability when various optional solutions are implemented. The first set of measurements assumes a laser power of 12 mW operating in laser emission mode, the presence of an ND filter to attenuate the light, and a 250 μs exposure. Here, the center of mass or spot spacing stability is 396.02 nm for noise floor 1 and 146.0 nm for noise floor 2. As shown in the table, stability improves if 2D or 1D Gaussian filtering is added. Gaussian filters can be added to mitigate the effects of edges and provide a more uniform spot profile. As also shown in this table, reducing the power of the laser diode to 0.5 mW reduces the center of mass error, which means greater stability. In particular, in this example, the center of mass error is reduced to 14.6 nm for noise floor 1 and 15.2 nm for noise floor 2.
表1Table 1
在这个示例中,在0.5mW而不是12mW处操作激光二极管意味着激光器并不真正在激光发射模式中。然而,这个功率水平足够高,以至于激光二极管也不在ASE模式下操作。相反,在这个功率范围内,激光器可以被称为在混合模式或准激光发射模式中操作。这对激光器操作来说很不寻常。在通常情况下,预期在清楚地可识别的激光发射模式中运行激光器,并且早先存在的系统在激光发射阈值之上舒适地操作激光二极管和功率水平。在这种混合模式下操作激光器是违反直觉的和非典型的激光器操作。In this example, operating the laser diode at 0.5 mW instead of 12 mW means that the laser is not truly in lasing mode. However, this power level is high enough that the laser diode is not operating in ASE mode either. Instead, in this power range, the laser can be said to be operating in a hybrid mode or quasi-lasing mode. This is quite unusual for laser operation. Under normal circumstances, it is expected to operate a laser in a clearly identifiable lasing mode, and pre-existing systems are comfortable operating laser diodes and power levels above the lasing threshold. Operating the laser in this hybrid mode is counterintuitive and atypical for laser operation.
图31是示出5%全光谱宽(在5%处的FW)与各种激光光源的激光功率的关系的示例的图。如在该图中看到的,当设定功率下降时,在5%处的FW增加。因此,各种示例被配置有被设置成在该混合模式中操作激光器的激光功率,以在合理的时间量内为在图像传感器处的检测提供足够的光斑强度,但仍然足以限制激光功率以便不产生在光斑放置中引入不需要的不稳定性的边缘图案。由于较低的强度对于在图像传感器处的充分的读出需要较长的曝光时间,因此降低激光功率可不利地影响聚焦跟踪系统的时延。因此,在确定是否提供足够的强度时,考虑完成聚焦跟踪测量所需的时间量以及是否充分实现系统的时延目标可能是有用的。施加到激光器以实现前述内容的功率的量取决于指定的激光二极管、图像传感器的灵敏度和速度(对于时延考虑因素)、系统的时延要求以及系统的准确度要求。FIG31 is a graph showing an example of the relationship between the 5% full spectral width (FW at 5%) and the laser power for various laser light sources. As can be seen in the graph, the FW at 5% increases as the set power decreases. Thus, various examples are configured with laser powers set to operate the laser in this hybrid mode to provide sufficient spot intensity for detection at the image sensor within a reasonable amount of time, but still sufficiently limit the laser power so as not to produce edge patterns that introduce unwanted instabilities in spot placement. Because lower intensities require longer exposure times for adequate readout at the image sensor, reducing the laser power can adversely affect the latency of the focus tracking system. Therefore, when determining whether sufficient intensity is provided, it may be useful to consider the amount of time required to complete the focus tracking measurement and whether the system's latency goals are adequately achieved. The amount of power applied to the laser to achieve the foregoing depends on the specified laser diode, the sensitivity and speed of the image sensor (for latency considerations), the latency requirements of the system, and the accuracy requirements of the system.
其它示例可以用被设置来操作激光器的激光功率来实现,使得在给定频率处在激光二极管输出中的主峰具有比在激光二极管输出中的任何副峰大15%-100%的归一化强度。在又一些其它示例中,激光二极管光源被操作的功率水平被选择为使得在给定频率处在激光二极管输出中的主峰具有比在激光二极管输出中的副峰的归一化强度大15%-25%的归一化强度。在又一些其他示例中,选择激光二极管光源被操作的功率水平,使得在给定频率处在激光二极管输出中的主峰具有比在激光二极管输出中的副峰的归一化强度大15%-100%的归一化强度。在另外的示例中,选择激光二极管光源操作的功率水平,使得在给定频率处在激光二极管输出中的主峰具有比在激光二极管输出中的副峰的归一化强度大15%-200%的归一化强度。Other examples can be implemented with the laser power configured to operate the laser so that, at a given frequency, the main peak in the laser diode output has a normalized intensity that is 15%-100% greater than any secondary peaks in the laser diode output. In still other examples, the power level at which the laser diode light source is operated is selected so that, at a given frequency, the main peak in the laser diode output has a normalized intensity that is 15%-25% greater than the normalized intensity of the secondary peaks in the laser diode output. In still other examples, the power level at which the laser diode light source is operated is selected so that, at a given frequency, the main peak in the laser diode output has a normalized intensity that is 15%-100% greater than the normalized intensity of the secondary peaks in the laser diode output. In yet other examples, the power level at which the laser diode light source is operated is selected so that, at a given frequency, the main peak in the laser diode output has a normalized intensity that is 15%-200% greater than the normalized intensity of the secondary peaks in the laser diode output.
可以用于设置光源被操作的功率的另一个度量可以是系统在满足预定聚焦跟踪时延要求的同时可以容忍的最大曝光时间。一般而言,当激光器被操作的功率减小时,光斑边缘通量的量也减少,提高聚焦跟踪准确度。然而,在图像传感器处提供低于某个功率量的不足的强度以实现光斑的检测,或者以使在足够短的曝光时间中的检测能够满足时延要求。因此,可以将功率设置降低到其中所需的相应曝光时间在对聚焦跟踪操作中的系统时延允许的最大曝光时间处或附近的点。在上面提供的示例中,对于在0.5mW处操作的光源的曝光时间为250μs。Another metric that can be used to set the power at which the light source is operated can be the maximum exposure time that the system can tolerate while meeting a predetermined focus tracking latency requirement. Generally speaking, as the power at which the laser is operated is reduced, the amount of flux at the edge of the light spot is also reduced, improving focus tracking accuracy. However, insufficient intensity is provided at the image sensor below a certain power level to enable detection of the light spot, or to enable detection with a sufficiently short exposure time to meet the latency requirement. Therefore, the power setting can be reduced to a point where the corresponding exposure time required is at or near the maximum exposure time allowed for the system latency in the focus tracking operation. In the example provided above, the exposure time for a light source operating at 0.5 mW is 250 μs.
虽然在上面描述了所公开的技术的各种示例,但是应该理解,它们仅作为示例而非限制的方式被呈现。同样,各个图可以描绘对于所公开的技术的示例架构或其他配置,其被完成来帮助理解可以被包括在所公开的技术中的特征和功能。所公开的技术不限于所示的示例架构或配置,而是期望特征可以使用各种可选的架构和配置来实现。实际上,对于本领域中的技术人员将明显,可以如何实现可选的功能、逻辑或物理分块和配置以实现在本文公开的技术的期望特征。而且,除了在本文描绘的那些之外的许多不同的组成模块名称可以被应用于各种分块。另外,关于流程图、操作描述和方法权利要求,步骤在本文被呈现的顺序不应强制所公开的技术被实现为以相同顺序执行所列举的功能,除非上下文另有规定。Although various examples of the disclosed technology have been described above, it should be understood that they are presented as examples only and not in a limiting manner. Similarly, the various figures may depict example architectures or other configurations for the disclosed technology, which are completed to help understand the features and functions that may be included in the disclosed technology. The disclosed technology is not limited to the example architectures or configurations shown, but it is expected that features can be implemented using various optional architectures and configurations. In fact, it will be obvious to those skilled in the art how optional functional, logical or physical block and configuration can be implemented to achieve the desired features of the technology disclosed herein. Moreover, many different component module names other than those depicted herein can be applied to various blocks. In addition, with respect to flow charts, operational descriptions, and method claims, the order in which the steps are presented herein should not force the disclosed technology to be implemented as performing the listed functions in the same order, unless the context dictates otherwise.
尽管上面从各种示例配置和实现方面描述了所公开的技术,但是应当理解,在一个或更多个单独的示例中描述的各种特征、方面和功能在它们的应用性中不限于它们被描述所使用的特定示例,而是可以单独地或在各种组合中应用于所公开的技术的一个或更多个其他示例,而不管这样的示例是否被描述以及这样的特征是否被呈现为所描述的示例的一部分。因此,本文所公开的技术的广度和范围不应受任何上述示例的限制。Although the disclosed technology is described above in terms of various example configurations and implementations, it should be understood that the various features, aspects, and functions described in one or more individual examples are not limited in their applicability to the specific examples for which they are described, but can be applied alone or in various combinations to one or more other examples of the disclosed technology, regardless of whether such examples are described and whether such features are present as part of the described examples. Accordingly, the breadth and scope of the technology disclosed herein should not be limited by any of the above examples.
除非另有明确说明,否则在本文档中使用的术语和短语及其变形应被解释为开放式的,而非限制性的。作为前述内容的示例:术语“包括”应理解为意指“包括但不限于”等;术语“示例”用于提供在讨论中的项目的示例实例,而不是其详尽的或限制性的列表;术语“一个(a)”或“一个(an)”应被理解为意指“至少一个”、“一个或更多个”等;以及诸如“早先存在的”、“传统的”、“正常的”、“标准的”、“已知的”以及类似含义的术语的形容词不应被解释为将所描述的项目限制到给定时间段或到给定时间为止时可用的项目,而是应该被理解为包括早先存在的、传统的、正常的或标准的技术,这些技术可能是现在或在将来的任何时间可用的或已知的。在本文中术语“包括”被规定为是开放式的,不仅包括所列举的元件,而且还包括任何另外的元件。同样,在本文档提到对本领域中的普通技术人员明显或已知的技术的情况下,这样的技术包括现在或在将来的任何时间对技术人员明显或已知的那些技术。Unless otherwise expressly stated, the terms and phrases used in this document and their variations should be interpreted as open-ended and not restrictive. As an example of the foregoing: the term "including" should be understood to mean "including but not limited to," etc.; the term "example" is used to provide an example instance of the item in question, rather than an exhaustive or limiting list thereof; the term "a" or "an" should be understood to mean "at least one," "one or more," etc.; and adjectives such as "pre-existing," "traditional," "normal," "standard," "known," and terms of similar meaning should not be interpreted as limiting the items described to items available at a given time period or up to a given time, but should be understood to include pre-existing, traditional, normal, or standard technologies that may be available or known now or at any time in the future. The term "including" is defined herein as open-ended, including not only the listed elements, but also any additional elements. Similarly, where this document refers to technologies that would be obvious or known to one of ordinary skill in the art, such technologies include those that would be obvious or known to the skilled person now or at any time in the future.
术语“耦合”是指直接或间接接合、连接、紧固、接触或链接,并且可以指各种形式的耦合,例如物理、光学、电气、流体、机械、化学、磁性、电磁、光学、通信或其他耦合或前述项的组合。在一种形式的耦合被指定的情况下,这并不暗示其他形式的耦合被排除。例如,物理地耦合到另一部件的一个部件可以指在两个部件之间的(直接或间接)物理附接或接触,但不排除在部件之间的其他形式的耦合,诸如例如也通信地耦合这两个部件的通信链路(例如RF或光学链路)。同样,各种术语本身并没有被规定为是相互排他的。例如,流体耦合、磁性耦合或机械耦合等可以是物理耦合的形式。The term "coupled" means to join, connect, fasten, contact or link directly or indirectly, and may refer to various forms of coupling, such as physical, optical, electrical, fluid, mechanical, chemical, magnetic, electromagnetic, optical, communicative or other coupling or combinations of the foregoing. Where one form of coupling is specified, this does not imply that other forms of coupling are excluded. For example, a component that is physically coupled to another component may refer to a (direct or indirect) physical attachment or contact between the two components, but does not exclude other forms of coupling between the components, such as, for example, a communication link (e.g., an RF or optical link) that also communicatively couples the two components. Likewise, the various terms themselves are not intended to be mutually exclusive. For example, fluid coupling, magnetic coupling, or mechanical coupling, etc. may be forms of physical coupling.
在一些实例中,扩展词和短语(诸如,“一个或更多个”、“至少”,“但不限于”或其他类似短语)的存在不应被理解为意指较窄的情况在这样的扩展短语可能缺乏的实例中是预期的或需要的。术语“部件”的使用并不暗示被描述或要求保护作为部件的一部分的元件或功能都被配置在共同的封装中。实际上,部件的各种元件中的任一个或所有(包括结构元件)可以被组合在单个封装中或单独地被维护,并且可以进一步分布在多个组或封装中。In some instances, the presence of expanded words and phrases (such as, "one or more," "at least," "but not limited to," or other similar phrases) should not be understood to mean that narrower cases are expected or required in instances where such expanded phrases may be absent. The use of the term "component" does not imply that the elements or functions described or claimed as part of the component are all configured in a common package. In fact, any or all of the various elements of the component (including structural elements) may be combined in a single package or maintained separately, and may further be distributed among multiple groups or packages.
应认识到,前述概念(假定这样的概念不是相互不一致的)的所有组合被设想为本文所公开的发明主题的部分。特别是,出现在本公开的末尾处的所要求保护的主题的所有组合被设想为本文所公开的发明主题的部分。It should be appreciated that all combinations of the foregoing concepts (provided such concepts are not mutually inconsistent) are contemplated as part of the inventive subject matter disclosed herein. In particular, all combinations of the claimed subject matter appearing at the end of this disclosure are contemplated as part of the inventive subject matter disclosed herein.
在整个本公开(包括权利要求)中使用的术语“实质上”和“大约”用于描述并解释诸如由于在处理中的变化而引起的小波动。例如,它们可以指小于或等于±5%,诸如小于或等于±2%,诸如小于或等于±1%,诸如小于或等于±0.5%,诸如小于或等于±0.2%,诸如小于或等于±0.1%,诸如小于或等于±0.05%。The terms "substantially" and "approximately" as used throughout this disclosure (including the claims) are used to describe and account for small fluctuations, such as those due to variations in processing. For example, they may refer to less than or equal to ±5%, such as less than or equal to ±2%, such as less than or equal to ±1%, such as less than or equal to ±0.5%, such as less than or equal to ±0.2%, such as less than or equal to ±0.1%, such as less than or equal to ±0.05%.
另外,本文阐述的各种示例是从示例图和其他图示方面来描述的。如在阅读本文档后对本领域中的普通技术人员变得明显的,所示出的示例及其各种可选方案可以在没有对所示示例的限制的情况下实现。例如,框图及其附随的描述不应被解释为强制特定的架构或配置。In addition, the various examples described herein are described in terms of example diagrams and other illustrations. As will become apparent to one of ordinary skill in the art after reading this document, the illustrated examples and their various alternatives can be implemented without limitation to the illustrated examples. For example, the block diagrams and accompanying descriptions should not be construed as mandating a specific architecture or configuration.
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| NLN2018854 | 2017-05-05 |
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