HK1243361B - Plasma treatment device and method of treating items - Google Patents

Description

Plasma processing device and article processing method

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to U.S. Provisional Application Serial No. 62/095,629, filed December 22, 2014, and U.S. Provisional Application Serial No. 62/129,533, filed March 6, 2015, the entire contents of which are incorporated herein by reference, including any data, tables, or figures.

Background Art

Surface disinfection and odor elimination are common challenges in both personal and professional environments. Many odors are caused by the presence of microorganisms and the organic matter they produce. By eliminating these microorganisms and their byproducts, odors can often be controlled or eliminated. Numerous methods, materials, and techniques are available for this purpose. However, not all items can be treated the same, and some currently used techniques and materials for controlling microorganisms or removing organic matter may damage or have other undesirable effects on the treated items.

The electrical generation of plasma and reactive gases involves a process in which the potential difference between the terminals of two electrodes is greater than the dielectric strength of the gas between the two terminals, causing electrons to form an arc between the terminals. The interaction between the arc (corona discharge) and the dielectric gas excites the molecules comprising the dielectric gas to higher energy states, thereby producing highly reactive products.

In addition to generating a corona, other methods for generating similar reactive plasmas are known in the art. Highly reactive plasmas effectively destroy organic matter through oxidation. Due to this phenomenon, reactive plasmas or gases, such as ozone, have long been used to sterilize items and eliminate odors from a range of sources, from smoke to microorganisms. et al. reported in the journal article "Cold Atmospheric Air Plasma Sterilization against Spores and Other Microorganisms of Clinical Interest" that a physical cold atmosphere surface microdischarge (SMD) plasma operating in ambient air for 30 seconds was highly effective against different types of vegetative cells and resulted in a reduction of 4 ¹⁰ to 6 ¹⁰ CFU (colony forming units).

Standard plasma disinfection devices are generally ineffective and pose safety concerns due to the toxicity of some plasmas. According to the EPA, breathing ozone can trigger a variety of health problems, including chest pain, coughing, throat irritation, and congestion. It can also worsen bronchitis, emphysema, and asthma.

Because plasma is generally unstable, conventional plasma disinfection systems generate far more plasma than is necessary to react with the actual amount of contaminants present on the items being disinfected. This excess plasma leads to inefficiencies in both the front-end plasma generation process and the back-end plasma removal process. Many devices known in the art can move or purge excess plasma through the items being disinfected, or generate excess plasma and immerse the items in it. Purge and immersion disinfection systems are inefficient and can take a long time to complete the disinfection task.

Other devices use ozone dissolved in a liquid (such as water) that is flowed around the items to be sterilized. These approaches not only face the same efficiency challenges, but also create numerous problems when handling the liquid itself, such as unnecessary weight, spillage, corrosion, and leaks. In addition, many items, such as leather shoes and purses, will be damaged by exposure to liquid.

Some devices utilize vacuum to assist in the cleaning process; however, the vacuum chambers in these devices are typically rigid and do not conform or mold to the item being cleaned. In other words, the item is not physically compressed by the chamber's walls, making the device ineffective at removing unwanted air from small openings or pores within the item. The use of rigid walls within the vacuum chamber may also require a larger volume of plasma to refill the chamber upon reversal of negative pressure.

Other devices use flexible chambers to direct a plasma stream onto items such as mail or packages to reduce the bioburden on the items. Typically, this method applies a continuous stream of "oxygenated" gas to the mail. While such devices can limit the amount of other gases in the container, they are inefficient and often purge ozone or other plasma only over the surface of the item. The plasma or other gas is not mechanically introduced into the interior, small spaces, or pores of the item. Furthermore, with these devices, the gas passes through the plasma generator once. Therefore, the reactive "oxygenated" molecules entering the container must be generated during their first pass through the generator.

Summary of the Invention

According to the present invention, the problem of generating the minimum amount of highly active plasma required for sterilizing an object is solved by reducing the amount of space and ambient air around and within the object. In this way, the plasma generated by the device of the present invention is directed toward the object to be sterilized, rather than non-target areas.

One embodiment of the present invention utilizes a housing having a treatment chamber therein, wherein a negative pressure can be formed and maintained around the article to be sterilized. By removing excess ambient air from the treatment chamber to generate the negative pressure, the amount of plasma required to sterilize the article is reduced. The process of removing excess ambient air from the chamber can also promote the dispersion of plasma in the treatment chamber on various parts of the article and around the article. The housing can include a top 51 and a base 52, and the top 51 can be attached to the base 52. The base can also be used as a storage area for plasma treatment device components. For example, pumps, valves, pipes, outflow chambers and other components can be stored in the base. However, this is not required for the present invention, and the components can be kept in other parts of the plasma treatment device, or even away from the plasma treatment device.

Certain embodiments utilize a processing chamber having at least one compliant wall. The compliant wall can be a material that can be deformed, collapsed, molded, or otherwise shaped around or near an article to reduce the amount of space or volume within the processing chamber. The ability of the compliant wall to substantially conform or mold to the article being processed and to reduce the amount of non-target space around the article can further reduce the total amount of plasma required. The compliant wall can also deform more flexible articles, which can further facilitate the dispersion of the plasma throughout the spaces and pores around and within the article.

Other embodiments use a processing chamber in the form of a flexible or elastic bag in which the article can be placed and the bag sealed. With this embodiment, when negative pressure is reached inside the bag, the entire bag can adapt to the shape of the article.

Another embodiment can have at least one outflow chamber. The processing chamber can be collapsed by pumping excess air in the processing chamber to the surrounding environment to remove it from the processing chamber or sealing it in the outflow chamber, so that it can basically adapt to the shape of the article in the processing chamber. Therefore, the working volume is reduced, thereby reducing the volume of air that must be removed during the processing cycle. In such an embodiment, during the processing cycle, the air in the working volume is transferred back and forth between the processing chamber and the second outflow chamber (by the plasma generator). The reduction in volume makes it take less time to pump air, and the concentration of the plasma used to process the article increases.

Furthermore, in one embodiment, the present invention contemplates the use of at least one filtering mechanism to remove any excess plasma to protect the user from potentially harmful exposure.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to obtain a more accurate understanding of the above invention, a more specific description of the invention briefly described above can be provided by reference to the specific embodiments shown in the accompanying drawings. The drawings given in the present invention may not be drawn to scale, and any reference to dimensions in the drawings or the following description is specific to the disclosed embodiments. Any variation of these dimensions that will allow the present invention to function for its intended purpose is considered to be within the scope of the present invention. Therefore, it is to be understood that these drawings depict only typical embodiments of the present invention and are not to be considered as limiting the scope of protection. By using the drawings, the present invention will be described and explained with additional features and details, wherein:

Fig. 1 shows the external structure of an embodiment of the housing of the present invention. In this embodiment, the housing comprises a base and a top portion fitted on the base.

Figure 2 shows a specific embodiment of the present invention, in which the top of the housing is removed to show the expansion and contraction process of the chamber within the device during the treatment process. Step 1 shows an item placed in the treatment chamber. For simplicity, the item is not shown in the remaining steps. In step 2, when the device is closed and the conformable wall edge is sealed against the rigid plate, a treatment chamber is formed. At least one hole in the rigid plate allows at least a portion of the ambient air to escape from the treatment chamber and be isolated in a primary outflow chamber. Step 2 shows the end of the primary vacuum cycle, in which the treatment chamber matches the surface of the item to be treated and the primary outflow chamber above the treatment chamber expands when filled with excess air from the treatment chamber. (Alternatively, if a primary outflow chamber is not used, the excess air from the treatment chamber can be discharged into the surrounding environment). Once the treatment chamber substantially matches the shape of the item, the secondary vacuum cycle begins. Step 3 shows the end of the secondary vacuum cycle, in which the item, such as a boot, is further compressed and the ambient air removed during this compression is directed into the secondary outflow chamber, which is shown above the primary outflow chamber. Step 4 shows the partial refilling of the process chamber as air from the secondary outflow chamber passes through the plasma generator and into the process chamber. A process cycle occurs as ambient air is transferred back and forth between the secondary outflow chamber and the process chamber (via the plasma generator). Step 5 shows that at the end of the planned number of process cycles, the process chamber (non-plasma air in the primary outflow chamber or from the ambient chamber) is finally refilled, and the primary outflow chamber collapses as air is transferred to the process chamber.

3A and 3B are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. These configurations include a processing chamber, a plasma generator, an air pump, and a valve for controlling airflow. In these configurations, air is moved into and out of the surrounding environment.

4A-4D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here include a processing chamber, a plasma generator, an air pump, a filter mechanism, and a valve for controlling air flow. In these configurations, air is moved into and out of the surrounding environment.

5A-5D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here include a processing chamber, a plasma generator, an air pump, a filtering mechanism, and a valve for controlling air flow. In these configurations, air is moved into and out of the surrounding environment.

FIG6A and FIG6B are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here include a processing chamber, a plasma generator, an air pump, a filtering mechanism, and a multi-way valve for controlling air flow. In these configurations, air is moved into and out of the surrounding environment.

FIG7A and FIG7B are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here include a processing chamber, a plasma generator, an air pump, a filter mechanism, and a valve for controlling air flow. In these configurations, air is moved into and out of the surrounding environment.

8A-8D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here include a processing chamber, a plasma generator, an air pump, a scent box, and a valve for controlling airflow. In these configurations, air is moved into and out of the surrounding environment.

9A-9H are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configuration shown in FIG9A-9D includes a processing chamber, a plasma generator, an air pump, at least one primary outflow chamber, and a valve for controlling airflow. The configuration shown in FIG9E-9H includes a processing chamber, a plasma generator, an air pump, a filtering mechanism, at least one primary outflow chamber, and a valve for controlling airflow.

10A-10D are schematic diagrams of different structures of a plasma processing apparatus according to the present invention, wherein the structure shown here includes a processing chamber, a plasma generator, an air pump, a filtering mechanism, at least one primary outflow chamber, and a valve for controlling air flow.

11A-11D are schematic diagrams of different configurations of a plasma processing apparatus according to the present invention. The configurations shown here may include a processing chamber, a plasma generator, an air pump, an odor cartridge, at least one primary outflow chamber, at least one secondary outflow chamber, and one or more valves or multi-way valves for controlling airflow.

FIG. 12 is a schematic diagram showing a pneumatic structure of an embodiment of a plasma processing apparatus according to the present invention.

FIG. 13 is a schematic diagram illustrating air flow when a processing chamber using an embodiment of a plasma processing apparatus according to the present invention is evacuated.

14 is a schematic diagram of air flow for one embodiment of a plasma processing apparatus according to the present invention as an article undergoes a processing cycle.

Figure 15 is a diagram of one embodiment of a plasma processing apparatus according to the present invention. As can be seen in the figure, the conformable sheet is collapsed around the article before it is processed.

16 is an exploded view of the housing base of one embodiment of a plasma processing apparatus according to the present invention, illustrating how working components can be fully contained within the apparatus base.

Figures 17-23 illustrate a method for treating an article using one embodiment of a plasma treatment apparatus according to the present invention. Each figure includes a schematic diagram showing the apparatus structure and/or air flow during various treatment steps. Each figure also includes a diagram of the apparatus showing the conditions in the treatment chamber during each step. Figure 22B illustrates an alternative scent delivery apparatus employing an atomization mechanism.

Figure 24 is an illustration of one embodiment of a gas directing member. In this embodiment, a port in the rigid plate connects to a hose or tube that can be directed to a specific area of an item for more directed or focused sterilization.

Figures 25A and 25B illustrate an alternative embodiment of a gas-directing member. This embodiment utilizes a cover layer having multiple smaller openings that can cover one or more ports in the rigid plate, allowing gas to diffuse upward through the cover layer toward the article. Figure 25B is a cross-section of the cover layer, illustrating how it is positioned over the ports in the rigid plate.

FIG. 26 illustrates one embodiment of a vacuum storage system that may be used with embodiments of the present invention.

FIG. 27 illustrates one embodiment of a plasma processing apparatus utilizing a conformal bag for a processing chamber.

28 illustrates the plasma treatment apparatus of FIG. 27 , wherein the items to be cleaned and/or sterilized are placed within a conformable bag and a gas guide member is positioned therein for more thorough treatment.

29 illustrates the plasma processing apparatus of FIG. 28 with an article sealed therein and the outflow chamber not yet filled with ambient air of the processing chamber.

DETAILED DESCRIPTION

The present invention relates to apparatus and methods for sterilizing objects. More specifically, the present invention provides embodiments of a plasma treatment chamber capable of sterilizing an object placed therein. In particular embodiments, the treatment chamber can at least partially conform to the shape of the object to reduce the volume of plasma required to sterilize the object.

The present invention is particularly useful for disinfecting, and in particular for controlling or eliminating odors from, household or personal items, particularly porous or irregularly shaped items, where standard aeration or disinfecting procedures may be less effective.

The term "plasma" is used in connection with the present invention for ease of reading only and refers to highly reactive ions, atoms, and molecules produced by an electric current or corona discharge, regardless of their physical state.

The terms "air" and "gas" are used interchangeably herein to describe the fluid mixture that moves throughout the device during operation.

The present invention is more particularly described in the following examples, which are intended to be illustrative only, as many modifications and variations therein will be apparent to those skilled in the art. As used in the specification and claims, singular forms such as "a," "an," and "the" include plural referents unless the context clearly dictates otherwise.

Reference will be made to the accompanying drawings, wherein like reference numerals are used to designate like or similar components. Referring to the accompanying drawings, which illustrate certain embodiments of the present invention, it can be seen that some embodiments of the plasma processing apparatus 10 of the present invention include a housing 50 containing a process chamber 100 having scalable dimensions, determined by the amount of negative pressure achieved within the process chamber, which deforms a bag or conformable wall 102 structure that may form the process chamber. There may also be at least one outflow chamber 3. Furthermore, there may be at least one primary outflow chamber 1 and/or at least one secondary outflow chamber 2. Other embodiments utilize a conformable bag within which items for processing may be placed. The conformable bag may, but need not, be within the housing 50.

In one embodiment, a plasma generator 200 is used to generate a plasma that can be pumped into a processing chamber to sterilize and/or clean items. Alternatively, an atomization mechanism can be used in conjunction with or in place of the plasma generator to sterilize and/or clean items. Each of these general components can have one or more subcomponents, which will be discussed in detail below.

The description herein does not discuss or specifically describe the various control devices known in the art that can be used to operate or direct the apparatus or components of the present invention. The electrical wiring of the present invention is also not discussed in detail. However, one of ordinary skill in the art will know how the various components described herein are connected to each other or to a power source, for example, and that various types of controllers or operating mechanisms can be constructed with the apparatus in such a manner that one skilled in the art can realize the benefits of the present invention. In the simplest iteration, the controller can be an actuator mechanism that moves or changes a component such as a valve on the plasma processing apparatus to effect a change in the process or to advance the process. The controller can be operably connected to any one of a plurality of sensors 800 that are capable of detecting a condition and, therefore, the operation of the controller. Variations in the type of controller and manner of attachment of the components of the present invention that provide the same functionality in a manner substantially as described herein and with substantially the same desired results are within the scope of the present invention.

In one embodiment, the plasma treatment apparatus 10 includes a plasma generator 200, a treatment chamber 100, and a device for transferring air between the plasma generator and the treatment chamber. The plasma generator may include, but is not limited to, corona, electrolytic, or ultraviolet plasma generation. Certain embodiments include a flow generator for use with the air pump 300 used in the plasma treatment apparatus 10 of the present invention. The various products formed by the plasma generator used in the treatment process of the present invention may be in a gaseous or plasma state. Alternative embodiments use an atomized disinfectant in addition to the plasma to treat the items in the treatment chamber, or use an atomized disinfectant instead of a plasma to treat the items in the treatment chamber. For the purposes of this application, treatment refers to a reaction with biological or non-biological organic matter, including killing microorganisms. Treatment may include reducing or eliminating odors associated with such organic matter.

In one embodiment, the processing chamber 100 has at least one conformable wall 102 that changes shape to at least partially surround or match the shape of the item to be processed. The conformable wall can be sealed to the rigid plate 102 using a gasket 103, an example of which is shown in Figure 16. Materials that can be used for the conformable wall include, but are not limited to, polyethylene, polypropylene, EPDM, fluorinated hydrocarbons (e.g., PTFE), PEEK, or any combination thereof, or any other material that is sufficiently impermeable to maintain a sufficient pressure differential and is sufficient to withstand exposure to various plasmas and chemical products that may be generated during the sterilization process of the present invention.

Because the treatment chamber 100 can be adjusted to conform to the shape of the article to be treated therein through the use of conformable walls 102, the volume of air that must be moved within the treatment chamber during a treatment cycle can be reduced, making the device faster and more efficient. The conformability of the treatment chamber also allows the plasma treatment apparatus 10 to squeeze or compress the article therein when a sufficient negative pressure is generated within the treatment chamber. This squeezing or compression can enhance the removal of contaminants from voids within the article and the penetration of plasma into voids within the article. If embodiments of the present invention utilize an atomized disinfectant, the negative pressure can also improve the distribution and penetration of the disinfectant into and around the material of the article. This enables the plasma generating apparatus 10 to achieve faster and deeper treatment of porous articles.

In one embodiment, the processing chamber 100 can be formed by closing the housing 50 of the plasma processing apparatus 10, such that the top 51 of the housing is shielded from and operably attached to the base 52. As shown in FIG2 , in step 1, the rigid plate 101 can be sealed to the conformable sheet 102 with the item to be processed therebetween. Using this embodiment, one or more operating mechanisms of the apparatus 10, such as pumps, valves, pipes, lines, and/or other components, can be stored or retained within the base 52. Alternatively, the various components can be retained in other portions of the housing, or even remotely from the housing.

In other embodiments, the treatment chamber is comprised of a conformable bag 125 having at least one conformable wall 102, such as shown in Figures 27, 28, and 29. The conformable bag can be operably connected to a pump 300 and any necessary components to create a negative pressure therein and inject the desired treatment material (e.g., plasma or sterilant). In one embodiment, the conformable bag is connected to a base in which the pump and other components are stored, an example of which is shown in Figures 27, 28, and 29. The creation of negative pressure within the conformable bag can cause the at least one conformable wall to collapse toward the article, causing it to at least partially conform to the shape of the article.

The conformable bag can utilize various sealing devices 130 and techniques known in the art. In one embodiment, the bag can utilize a reusable seal that allows the bag to be opened and closed for repeated use. For example, a slide seal or zipper seal, such as those commonly used for household storage bags, can be used, or a separate component can be attached to the bag to achieve an adequate seal. The bag can also be sealed by folding and clamping or any other means capable of forming an airtight seal.

In one embodiment, the bag can be permanently sealed so that the item placed therein is completely isolated from the surrounding environment. In this embodiment, the conformable bag 125 can be disposable so that after the item is cleaned and/or sterilized, the bag can be removed from the pump 300 and any other components of the plasma treatment device. A new or replacement bag can then be attached to the plasma treatment device to enable treatment of another item.

Alternatively, the bag can be reusable, with a seal 130 that allows the bag to be repeatedly opened and closed for receiving and isolating the items therein. With this embodiment, the compliant bag can be permanently attached to the pump and other components. Alternatively, the bag can be removed and replaced on the plasma processing device. To protect the compliant wall or compliant material of the compliant bag, embodiments can include a puncture-resistant liner disposed within the processing chamber between the compliant material and the items to be processed. Those skilled in the art will be able to determine any of a variety of materials and seals that can be used in the processing chamber and to seal embodiments of the present invention.

The transfer of ambient air between the process chamber and the plasma generator may include the use of a vacuum pump 300 and an airtight tube connecting the process chamber 100, the plasma generator 200, and the vacuum pump. Pumps suitable for use in the present invention include, but are not limited to, vibrating piston, piston, diaphragm, oscillating plunger, vibrating diaphragm, peristaltic, positive displacement, centrifugal, screw, blower, and rotary vane pumps.

One embodiment of a plasma processing apparatus includes a valve mechanism 500 for directing air flow between various components of the apparatus. Types of valves suitable for use with the present invention include flow reversing valves and selector valves. Useful flow reversing valves include, but are not limited to, 4/2, 4/3, 5/2, or 5/3 valves. Multiple solenoid valves may also be provided to allow reversal of the direction of air flow in the system. If a pumping mechanism that allows flow reversal is used, the air flow reversing valve may be eliminated. The selector valve may be any valve that allows a common inlet port to select multiple outlet ports. It should be understood that the air flowing between components may be through a pipe or manifold directly connected to one or more components.

While pumping can be performed to and from the ambient environment 15 (as shown in Figures 3A-8D), certain embodiments of the present invention include one or more outflow chambers 3 connected to the processing chamber 100 (relative to the airflow). These outflow chambers are advantageous for storing plasma and odors until they can be slowed down, as well as allowing for more efficient treatment of the treated items. In one embodiment, the outflow chambers 3 are formed of a rigid material so that they do not change shape or change shape minimally when air is drawn in. In alternative embodiments, the outflow chambers are formed of a flexible or conformable material that allows expansion and contraction when air is pumped into or out of the outflow chambers. Although reference is made herein to primary and secondary outflow chambers, as used herein, unless otherwise expressly stated, these references are only used to indicate the presence of an outflow chamber for a particular purpose, of which there may be at least one. Thus, reference to "first" does not necessarily mean there must be two or more. Additionally, reference to a secondary outflow chamber does not necessarily mean there must be a first one. These references are not intended to confer any temporal order, structural orientation, or one-sidedness (e.g., left or right, top or bottom) with respect to a particular feature.

In one embodiment, two outflow chambers 3 are included, a primary outflow chamber 1 and a secondary outflow chamber 2. Each outflow chamber (with respect to the airflow) can be connected to the process chamber 100, for example as shown in Figures 2 and 9A-11D. In this embodiment, ambient air from the process chamber 100 can be pumped into the primary outflow chamber 1 until certain process conditions are met. Such process conditions can be, for example, a predetermined time limit for pumping air, or when a sensor 800, such as a pressure sensor 850, indicates that a predetermined pressure has been reached in the process chamber 100. After the first process condition is met, the air remaining in the process chamber can be pumped into the secondary outflow chamber 2.

In one embodiment, the controller can switch the apparatus from one stage to another (e.g., from a primary to a secondary vacuum cycle) based on achieving a specific "absolute" pressure (e.g., measured against atmosphere) within the process chamber (e.g., as measured by one or more sensors 800). In this embodiment, pressure is measured within the process chamber during the primary vacuum cycle. To determine when the process chamber walls substantially conform to the article, the primary vacuum cycle continues until the pressure within the process chamber reaches a predetermined pressure. This predetermined pressure level depends in part on the rigidity of the process chamber's compliant walls. For example, thicker or more rigid compliant wall materials may result in lower pressures required to conform the material to the article. By applying a vacuum to the chamber and measuring the pressure as the compliant walls collapse and conform to the article within the chamber, one of ordinary skill in the art can determine the appropriate pressure for conforming a chamber made of a particular material. To determine the end of the primary vacuum cycle (the point at which the process chamber's compliant material substantially conforms to the article within the chamber without substantially squeezing or otherwise deforming the article), the pressure sensor can determine that the pressure within the process chamber is slightly more negative than the pressure required to deform the compliant wall material. In one embodiment, the negative pressure level sufficient to indicate that the compliant wall 102 substantially conforms to the article 75 may be between about 0.00 PSIV and about -14.7 PSIV. In a more specific embodiment, the negative pressure level sufficient to indicate that the compliant wall substantially conforms to the article may be between about -0.001 PSIV and about -5 PSIV.

In a particular embodiment, once the sensor 800 has determined, for example through pressure measurement, that the processing chamber is substantially conforming to the article 75, a secondary vacuum cycle is initiated. The secondary vacuum cycle can compress the article by increasing the vacuum within the processing chamber 100, thereby forcing the conforming walls against the article. In this embodiment, the secondary vacuum cycle will continue until at least one of the following three occurs: 1) the pressure within the chamber reaches a predetermined value; 2) the pressure reaches the maximum vacuum achievable by the vacuum pump; or 3) ΔP/Δt (discussed below) stabilizes or begins to stabilize.

In one embodiment, a sensor 800 operably connected to the controller determines the end of a primary or secondary vacuum cycle based on the rate of change of pressure (ΔP/Δt) measured within the process chamber. This method is less affected by variations in the conforming material within the process chamber and more influenced by the physical deformation characteristics of the article being processed. For example, when processing a rigid article 75 (e.g., a lacrosse helmet), its ΔP/Δt at the end of a primary vacuum cycle will be much greater than when processing a softer or more flexible article of similar size (e.g., a throw pillow). In one embodiment, the plasma processing apparatus 10 has different setup options based on the type of article being processed, which will consider different ΔP/Δt value parameters for triggering the processing sequence. For example, a setup for a soft article may use a smaller ΔP/Δt value than a setup for a hard article. During the primary vacuum cycle, as excess air is removed from the process chamber, the pressure within the process chamber may decrease at a relatively constant rate until the chamber conforms to the article. Once the conforming wall 102 is prevented from easily collapsing (e.g., because it contacts the article), the ΔP/Δt value may increase rapidly. Thus, measuring the pressure and calculating ΔP/Δt allows the controller to predict when the chamber walls substantially conform to the article, at which point the apparatus can initiate a secondary vacuum cycle.

In another embodiment, the ΔP/Δt value can be used to determine the end of the secondary vacuum cycle. Once one or more pumps begin to reach their maximum vacuum capacity, the ΔP/Δt value will begin to stabilize, and the controller can then switch the device to the next stage. Again, by measuring ΔP/Δt while observing when the compliant walls of the processing chamber substantially conform to, but do not actually deform, the article, an appropriate ΔP/Δt value for indicating the end of the primary vacuum cycle can be determined empirically. The ΔP/Δt value used to indicate the end of the secondary vacuum cycle can be determined by the stability of the ΔP/Δt value, as the pumps approach their maximum vacuum or deformation of the article ceases.

Certain embodiments of the plasma processing apparatus 10 measure the rate of change of pump load (the change in current (I) over time (t): ΔI/Δt). Essentially, the same events that trigger higher ΔI/Δt values (e.g., object contact and reaching maximum vacuum) as those that trigger ΔP/Δt values can be used similarly.

Once a predetermined pressure level is reached in the process chamber, any of a variety of controllers can be used to operate the valve mechanism 500, which stops removing ambient air from the primary outflow chamber 1 and begins removing the remaining air from the process chamber, causing it to enter the secondary outflow chamber 2 instead of the primary outflow chamber 1. Furthermore, the pump 300 operably connected to the valve mechanism 500 will reduce the process chamber vacuum to a greater negative pressure, thereby causing the compliant wall 102 of the process chamber 100 to collapse further and squeeze or compress the article as much as possible. Figures 11A-11D, 12, and 13 illustrate a non-limiting embodiment of a plasma processing apparatus 10 having a primary outflow chamber 1 and a secondary outflow chamber 2. In Figure 13, the primary outflow chamber is formed by the housing 50, with the secondary outflow chamber 2 therein.

One embodiment of the apparatus includes a vacuum storage system 900 to reduce processing time. The vacuum storage system may include a vacuum reservoir 920 capable of withstanding sufficient negative pressure, a high-flow valve 940 capable of withstanding the negative pressure and operably connected to the vacuum reservoir, and a vacuum pump also operably connected to the vacuum reservoir. In one embodiment, the vacuum storage system is operably connected to the processing chamber so that when the high-flow valve is opened, ambient air can enter the vacuum reservoir from the processing chamber.

In another embodiment, when the device is powered on and the high flow valve is closed, the vacuum pump can pull negative pressure on the vacuum reservoir to create a negative pressure chamber.

The object to be processed can be initially placed and sealed within the processing chamber, so that when the pressure differential between the two chambers reaches equilibrium, the high-flow valve can be opened, allowing air to quickly flow from the processing chamber to the vacuum reservoir. Once pressure equilibrium is achieved between the processing chamber and the vacuum reservoir, the high-flow valve can be closed, and the vacuum pump activated to reapply pressure to the vacuum reservoir. If more air must be removed to reach the pressure parameters noted above, indicating the end of the primary vacuum cycle, the primary vacuum cycle will continue until such parameters are met.

This technique, utilizing a negative pressure vacuum reservoir system, allows for very rapid removal of air from a given chamber without the need for a high-flow pump. Instead, a pump can be used to slowly build up a negative vacuum "reservoir" during idle phases in the process, and a high-flow valve can be used to maintain the negative pressure until needed.

In one embodiment, the vacuum container is a rigid container that is placed in the same compartment as the other components of the device. In one embodiment, the vacuum container is a rigid cylindrical chamber. In another embodiment, the vacuum container is a rigid container that is contoured to fill the gaps around the other components in the storage chamber and further help hold them in place.

In another embodiment, ambient air delivered to and from the secondary outflow chamber 2 passes through the plasma generator 200 as it is pumped between the secondary outflow chamber and the processing chamber. This arrangement has several benefits, including: 1) safety - limiting the volume of gas that can be converted to plasma helps prevent the device from generating potentially dangerous amounts of plasma; 2) efficiency - pumping a smaller volume of air between the processing chamber and the secondary outflow chamber reduces cycle time and can result in a higher concentration of plasma for treating the article (especially when a small volume is moved multiple times through the generator between chambers). The present invention further contemplates the use of a filtering mechanism to allow the ambient environment 15 to replace the primary outflow chamber 1, the secondary processing chamber 100, or both.

Once the plasma has been pumped into the treatment chamber, it can surround and penetrate fibers, openings, pores, spaces, and contact surfaces on the article 75. The reactivity of the plasma ions can effectively and quickly begin to react with any biological or other organic material in the treatment chamber and/or on the article. To promote contact, there can be a pause period 250 during the treatment cycle to allow the plasma formed during the treatment cycle to remain in the treatment chamber for a predetermined time. Figure 2 shows one embodiment of how the pause period can be incorporated into the treatment cycle. The length of the pause period depends on several factors, including, for example, the type of plasma used, the size or structure of the article, the amount of organic or biological material on the article, and other factors.

In one embodiment, the primary outflow chamber 1 is a rigid enclosure that seals against the outer surface of the conformable sheet 102 that forms the processing chamber 100. In this embodiment, the primary outflow chamber can be formed by the top 51 of the housing being assembled on the base 52 and can accommodate the secondary outflow chamber 2 and the processing chamber 100 (when the device is closed), one example of which is shown in Figure 15. In another embodiment, the primary outflow chamber 1 has at least one conformable side, or is a conformable bag. Similarly, in some embodiments, the secondary outflow chamber can be rigid or have at least one conformable side.

Certain embodiments of the present invention include more than one means for moving air. For example, certain embodiments may include a first pump 300 that quickly moves excess air from the processing chamber to the primary outflow chamber or the surrounding environment 15, and a second pump 300 that has sufficient power to create or increase negative pressure within the processing chamber to move air from the processing chamber to the secondary outflow chamber and compress the article.

Multiple vacuum pumps may also be used in series or parallel, including at least one embodiment in which two or more pumps can be switched between parallel and series configurations. The parallel configuration allows the device to move a larger volume of air in a given amount of time, while the series configuration can increase the negative pressure drawn within the process chamber. Figures 4A-4D provide non-limiting examples of these pump configurations.

In order to monitor the pressure differential between various airways or chambers, which can, for example, indicate when to cause a controller to reconfigure a valve from directing air to the primary outflow chamber 1 to directing air to the secondary outflow chamber 2, certain embodiments of the present invention further include one or more sensors 800. In one embodiment, the sensor 800 is a pressure sensor 850 capable of detecting and/or responding to pressure within the processing chamber 100 and triggering any of a variety of known control mechanisms to initiate specific events. In another embodiment, a pressure sensor 850 that responds to pressure elsewhere in the system can be used to trigger these same or other events. Figures 13, 14, and 17-23 illustrate embodiments utilizing a pressure sensor 850. Pressure sensors and other types of sensors for various purposes and devices are well known in the art. One of ordinary skill in the art will be able to determine an appropriate sensor, whether a pressure sensor or other sensor for use within any chamber described herein, or a sensor that can be connected to a gas line connected to the chamber whose pressure is being measured. In certain embodiments, another gas flow meter can also be used instead of the pressure sensor 850.

Another embodiment of the present invention may include a filter mechanism 400 to remove unpleasant odors from the article 75 itself and to react with excess plasma. Figures 13 and 14 show a non-limiting embodiment comprising a filter 400. In one embodiment, the filter mechanism will be arranged (relative to the airflow) between the processing chamber 100 and the primary outflow chamber 1, the secondary outflow chamber 2 or the surrounding environment 15 (depending on the embodiment). Because some plasmas are considered harmful to the human body, the filter mechanism can provide another safety measure for embodiments of the present invention. The filter mechanism 400 may include a catalyst (such as manganese dioxide) that catalyzes electrically generated plasma to form a more stable product, or the filter mechanism 400 may be a consumable filter comprising a reactant material (such as carbon or an oxidizable metal, such as iron) that will react with the electrically generated plasma to form a more stable product. The filter mechanism 400 may also have a combination of a catalyst and a consumable filter. An embodiment of the filter mechanism 400 using a consumable filter may be a replaceable cartridge.

One embodiment illustrated in Figures 17-23 utilizes at least one odor filtering mechanism 401 to remove odors from the air in the process chamber 100 during the primary vacuum cycle, and at least one other plasma filtering mechanism 402 to remove excess plasma from the ambient air after the process cycle is complete. For additional safety, some embodiments include a detection mechanism for determining the level of plasma removed from the process chamber before unlocking the process chamber after the process cycle.

Another embodiment includes a scent cartridge 700 operably connected (with respect to the airflow) to the treatment chamber, one example of which is shown in Figures 16 and 17-23. In this embodiment, after a planned number of treatment cycles are completed, air can be actively (e.g., pumped or forced through) or passively (e.g., by releasing a valve that maintains negative pressure in the treatment chamber, allowing the intake of ambient air) through the scent cartridge 700 into the treatment chamber 100 to impart a scent to the treated items. In such an embodiment, the scent cartridge 700 can be arranged in series or parallel with the plasma generator (with respect to the air path). In another embodiment, the scent cartridge 700 can be arranged in series or parallel with the air pump 300 (with respect to the air path). The scent cartridge 700 can also be arranged in series with a valve and operably attached to the treatment chamber 100. In such an embodiment, the valve can be located on the side of the scent cartridge 700 in the treatment chamber 100 or on the side of the scent cartridge 700 opposite the treatment chamber 100. In certain embodiments, the present invention also utilizes a scent cartridge with a filtering mechanism. In one specific embodiment, the scent cartridge is combined with the filtering mechanism.

Other devices and techniques can be combined with embodiments of the present invention to aid in the effective reduction of viable microorganisms on articles. One embodiment includes a UV light source 150 positioned to emit UV light onto articles in a treatment chamber. UV lamp systems have been used to kill microorganisms in hospital rooms and other environments. Embodiments of the present invention can utilize UV light sources to provide increased antimicrobial effectiveness. Figures 2 and 16 illustrate non-limiting examples of how UV light sources can be combined with embodiments of the present invention.

Some articles may have thereon the area, space or structure that may need to apply the air containing treatment material (such as plasma or disinfectant) additionally or more directly, to reach the desired effect of killing microorganisms and removing odor.Another feature of an embodiment of the present invention may be to guide the ability of treatment air in a manner that maximizes the treatment of some articles.One embodiment of the present invention has a plurality of ports 750 leading to a treatment chamber, wherein one example is shown in Figure 24 and Figure 25B.Figure 27, Figure 28 and Figure 29 show conformable bags.These ports can not only be arranged with a specific pattern to regulate the flow rate of treatment air in and out of the treatment chamber, but also allow the specific arrangement of gas guiding component 755 (such as hose, funnel or diffuser) to be attached to port to strengthen the processing of some articles.For example, in order to process the inside of a boxing glove, it may be desirable to make treatment gas directly enter the glove interior and flow out from the inside of the glove.

One embodiment includes a gas directing member in the form of a flexible tube attached to at least one port, an example of which is shown in FIG. 24 , where the end of the tube can be inserted into the interior of an article (e.g., a glove) to introduce and remove gas from the interior of the article during a treatment cycle. Alternatively, it may be desirable to diffuse gas more generally into and out of the treatment chamber, for example, when treating a towel. In another embodiment, a plurality of ports 75 in the wall of the treatment chamber (e.g., in a rigid plate 101) can be used. In another embodiment, a diffusion attachment can be attached to one or more ports, such as shown in FIG. 25A and FIG. 25B .

The plasma treatment apparatus 10 of the present invention is not limited to treating items 75 of a particular size. The size of any item that can be treated is limited only by the size and/or volume of the treatment chamber 100. In one embodiment, the plasma treatment apparatus can be hand-portable and suitable for home use. For example, the plasma treatment apparatus of the present invention can be used to treat household items or clothing and can have a treatment chamber sized to fit into the portable housing 50. In another embodiment, the portable treatment apparatus can be permanently fixed, or at least not hand-portable, and have a treatment chamber sufficient to accommodate larger item sizes or have industrial or commercial uses. In one embodiment, the treatment chamber has a volume of about 50 ml to about 500 liters. In a more specific embodiment, the treatment chamber has a volume of about 200 ml to 50 liters.

The apparatus of the present invention can be used to process articles by employing a repeatable process comprising a vacuum phase and a refill phase. One embodiment of the process is shown in Figures 17-23. During the vacuum phase of the process, such as shown in Figure 18, negative pressure is drawn onto a processing chamber 100 having conformable walls 102, thereby causing the conformable walls to collapse onto the article and further squeezing or compressing the article being processed so as to remove as much ambient air as possible from the processing chamber. During the refill phase of the process, such as shown in Figure 19, the negative pressure is reversed or released within the processing chamber until a neutral or positive pressure point is achieved. A vacuum phase is followed by a refill phase, constituting a processing cycle. In a specific embodiment, the vacuum phase and refill phase are repeated multiple times to perform multiple processing cycles.

In another embodiment, a final cycle is performed after multiple treatment cycles. During the final cycle, air is admitted to the treatment chamber until the pressure in the treatment chamber is restored or substantially returned to a neutral pressure, at which point the articles can be removed from the treatment chamber, as shown in FIG23. In one specific embodiment, during the final cycle, the air passes through a scent cartridge before entering the treatment chamber, thereby imparting a scent to the treated articles, as shown in FIG22 and FIG23.

This method utilizes plasma to treat articles within a treatment chamber. In this embodiment, air entering the treatment chamber during the refill phase passes through a plasma generator 200 before entering treatment chamber 100. Because plasma is highly reactive, it attacks organic matter within the articles. This organic matter on the articles is destroyed or may have an odor-neutralizing, deodorizing, or antimicrobial effect.

In alternative embodiments, an aerosolized disinfectant can be used to treat the article, either in addition to or in place of the plasma. Examples of similar aerosolized disinfectants include, but are not limited to, hydrogen peroxide and alcohols. One embodiment of the apparatus includes an aerosolizing mechanism 960 for applying the aerosolized disinfectant to the article 75 as ambient air is moved back into the treatment chamber 100. FIG22B illustrates a non-limiting example of this embodiment. In this embodiment, the disinfectant can be applied during each treatment cycle or during the final refill cycle. In certain embodiments, the aerosolizing mechanism includes a fluid reservoir 965 for containing the disinfectant and a nozzle 970 for aerosolizing the fluid disinfectant into the ambient air passage. Examples of aerosolizing nozzles that can be used with embodiments of the present invention include, but are not limited to, venturi or orifice-type nozzles, or any other nozzle known in the art that can produce sufficiently small droplets from a reservoir so that they can be transported to the treatment chamber by the ambient air flow. In another embodiment, the aerosolizing mechanism is preferably connected to the ambient air passage leading to the treatment chamber and can be activated as ambient air enters the treatment chamber, causing aerosolized disinfectant to be delivered to the treatment chamber during the refill phase. In an alternative embodiment, an atomizing mechanism is used to disperse a scented fluid as an alternative to or in addition to the disinfecting fluid.

The vacuum stage of this process can include primary and secondary vacuum cycles. In an embodiment including a secondary vacuum cycle, the primary vacuum cycle first removes ambient air from the processing chamber 100 so that the compliant walls 102 of the processing chamber begin to fit the article and create a reduced working volume of air in the processing chamber. Removing ambient air during the primary vacuum cycle is not necessary but can create a negative pressure in the processing chamber. This step in the process can be followed by a secondary vacuum cycle, which can pull at least a minimum negative pressure on the processing chamber and move all or most of the remaining reduced working volume of ambient air. The secondary vacuum cycle can move the remaining ambient air directly or through a plasma generator into the outflow chamber. Then, in the refill phase, the air from the outflow chamber is returned to the processing chamber through the plasma generator. Subsequent processing cycles move the reduced air volume back and forth (through the plasma generator) between the outflow chamber and the processing chamber. Reducing the working volume reduces the amount of time required to pump air back and forth and improves processing efficiency (as described above).

As described above, certain embodiments of the plasma treatment apparatus utilize a sealable 130 conformal bag 125 having at least one conformal wall 102 as the treatment chamber 100. The conformal bag can utilize any of the methods and components described herein for embodiments utilizing conformal walls 102 sealed against a rigid plate 101. In embodiments utilizing a conformal bag as the treatment chamber, sealed inlet and outlet ports can be created to allow air to flow in and out during circulation. The ports can also include attachments for gas directing components. In such embodiments, the treatment chamber can be sealed within the housing 50, or in alternative embodiments, the treatment chamber is not enclosed within the housing. For example, when the apparatus is used to treat very large items (e.g., mattresses), it is advantageous to leave the treatment chamber unenclosed. In such embodiments, the item to be treated would be placed in a conformal bag, the opening of which would be sealed closed.

The method of treating an article using the plasma treatment apparatus 10 of the present invention may begin when the article is placed in the treatment chamber 100 and the treatment chamber 100 is closed. A primary vacuum cycle may then be initiated. In one embodiment, during the primary vacuum cycle, air is removed from the treatment chamber 100 and enters the ambient environment 15, either directly or through the filtration mechanism 400. The primary vacuum cycle may continue until the controller is activated when one or more process conditions are met (e.g., when a limit time is reached or when the pressure sensor 850 indicates that a predetermined pressure has been reached in the treatment chamber 100). The controller may then activate the plasma generator 200 and initiate a refill cycle, in which air is transferred from the ambient environment 15 (actively—using the air pump 300 to drive air, or passively—by simply opening a valve to allow relative pressures to equalize) through the activated plasma generation electrode 200, which is generating plasma. The active or passive transfer of air into the treatment chamber 100 may continue until the sensor 850 determines that one or more of the process conditions described above have been met and activates the controller 850. In one embodiment, the controller initiates a treatment pause of a predetermined amount of time, during which the plasma is used to sterilize the article in the treatment chamber. After a processing pause, the controller may be activated to restart the primary vacuum cycle and again pump air from the processing chamber 100 through the filtration mechanism and into the ambient environment 15 until the sensors determine that one or more process conditions are met.

In another embodiment, the controller can initiate additional treatment cycles (depending on the planned protocol), in which the controller activates the plasma generator 200 and switches the air flow so that it flows from the ambient environment 15 through the plasma generator 200 and into the processing chamber 100. After the final treatment cycle, the controller can initiate a final vacuum cycle in which air from the processing chamber 100 is pumped back into the ambient environment 15, either directly or through the filtration mechanism 400. After completing the planned number of treatment cycles and the final vacuum cycle, the controller can initiate a final flow cycle in which air from the ambient environment 15 is introduced (actively or passively) into the processing chamber 100 until sensors determine that certain process conditions have been met (e.g., a time limit, or when the pressure sensor 850 indicates that a predetermined pressure has been reached within the processing chamber 100). In some embodiments, the final flow cycle delivers air from the ambient environment 15 directly to the processing chamber 100, or, in other embodiments, scents the item via the scent cartridge 700. Once the sensors determine that the entire treatment protocol has been completed, the item can be removed from the processing chamber 100.

In one embodiment, during the primary vacuum cycle, air is removed from the processing chamber 100 and passed directly through the filtration mechanism 400, or through an activated plasma generator 200, into the primary outflow chamber 1. In such an embodiment, the primary vacuum cycle continues until a sensor 800 operably connected to the controller determines that certain process conditions have been met (e.g., a time limit, or when the pressure sensor 850 indicates that a predetermined pressure has been reached within the processing chamber 100), indicating the end of the primary vacuum cycle.

In embodiments where the plasma generator is not activated at the start of the primary vacuum cycle, once the primary vacuum cycle is complete, the controller may activate the plasma generator 200, and air may then be passed from the primary outlet chamber 1 through the (actively or passively) activated plasma generating electrode to generate the plasma, and then into the processing chamber 100 until a sensor determines and activates the controller when certain process conditions are met (e.g., a time limit, or when the pressure sensor 850 indicates that a predetermined pressure has been reached in the processing chamber 100).

If the plasma generator 200 is activated at the beginning of the primary vacuum cycle, the generator 200 may remain activated after the primary vacuum cycle ends, and air flows from the primary outflow chamber 1 through the generator 200 and then into the processing chamber 100. The controller may then initiate a processing pause of a predetermined amount of time, thereby allowing time for the plasma to sterilize the items. After the processing pause, the controller restarts the primary vacuum cycle and again pumps air from the processing chamber 100 through the filtration mechanism into the primary outflow chamber 1.

In an alternative embodiment, air is pumped from the process chamber 100 directly to the primary outflow chamber 1 without passing through a filtering mechanism until the sensor 800 determines that certain process conditions are met (e.g., a time limit, or when the pressure sensor 850 indicates that a predetermined pressure has been reached in the process chamber 100) and activates the controller.

In one embodiment, the controller initiates additional treatment cycles (the number of which depends on the planned protocol), in which the controller activates plasma generator 200 and switches the air flow so that it flows from primary outlet chamber 1 through plasma generator 200, and plasma enters process chamber 100. After the final treatment cycle, the controller initiates a final vacuum cycle in which air from process chamber 100 is pumped back into primary outlet chamber 1. After completing these planned number of treatment cycles and the final vacuum cycle, the controller initiates a final flow cycle in which air from primary outlet chamber 1 is transferred (actively or passively) into process chamber 100 until a sensor that determines that the desired process conditions are met activates the controller. In one embodiment, the final flow cycle delivers air from primary outlet chamber 1 directly into process chamber 100, or, in another embodiment, applies a scent to article 75 via scent cartridge 700. Once the entire treatment protocol is complete, the article can be removed from process chamber 100.

In one embodiment, when the controller initiates a primary vacuum cycle, air is removed from the process chamber 100 and enters the primary outlet chamber 1 directly or through the filtration mechanism 400. In at least one embodiment, the primary vacuum cycle continues until a sensor determines that a process condition has been met, as described above, activates the controller. The controller can initiate a secondary vacuum cycle, in which air from the process chamber 100 is pumped into the secondary outlet chamber 2, which can also be compliant to allow it to expand or contract. When the process condition is met, for example, when the pressure sensor 850 indicates that a predetermined pressure has been reached in the process chamber 100, for example, a pressure lower than the pressure within the process chamber 100, triggering the termination of the primary vacuum cycle, the controller can activate the plasma generator 200 and switch the air flow so that it flows from the secondary outlet chamber 2 through the plasma generator 200 and plasma enters the process chamber 100. An example of this method is shown in Figure 2.

In another embodiment, while the plasma is sterilizing the article, the controller can initiate a processing pause for a predetermined amount of time. The controller then restarts the secondary vacuum cycle, whereupon air from the processing chamber 100 is again passed through the filtration mechanism, either through the plasma generator, or directly pumped into the secondary outflow chamber 2, until it determines that certain process conditions are met. Next, the controller can initiate additional processing cycles (the number of which depends on the planned protocol), in which the controller activates the plasma generator 200 and switches the air flow so that it flows from the secondary outflow chamber 2 through the plasma generator 200, and plasma enters the processing chamber 100. Among the advantages achieved by this approach is that the volume of air transferred back and forth between the secondary outflow chamber and the processing chamber is smaller, which enables the device to process articles more efficiently. This approach can also reduce the time to complete each processing cycle. Furthermore, in embodiments where air passes through the plasma generator on its way from the processing chamber to the secondary outflow chamber and back, the amount of air converted to plasma is increased, thereby increasing the concentration of plasma used to treat the article.

In at least one embodiment, when the controller initiates a primary vacuum cycle, air from the processing chamber 100 is pumped to the ambient environment 15 (directly or through the filtration mechanism 400). In at least one embodiment, the primary vacuum cycle continues until the controller determines that certain process conditions have been met. Next, the controller initiates a secondary vacuum cycle, in which a valve is switched to allow air to be pumped from the processing chamber 100 into the secondary outlet chamber 2. In one embodiment, the secondary outlet chamber 2 is compliant to allow it to expand or contract. When the sensors determine that certain process conditions have been met, the controller may activate the plasma generator 200 and switch the air flow so that it flows from the secondary outlet chamber 2 through the plasma generator 200, and then the plasma enters the processing chamber 100. The controller then initiates a process pause for a predetermined amount of time while the plasma sterilizes the items. After the process pause, the controller restarts the secondary vacuum cycle, and air is again pumped from the processing chamber 100 to the secondary outlet chamber 2 through the filtration mechanism or directly, until the sensors determine that certain process conditions have been met. The controller may initiate additional processing cycles (depending on the planned protocol) in which the controller activates the plasma generator 200 and switches the air flow from the secondary outflow chamber 2 through the plasma generator 200 and then into the plasma in the processing chamber 100 .

After the last processing pause, the controller can initiate a final flow cycle in which air from the processing chamber 100 is pumped through a filtration mechanism into the ambient environment 15 until the controller determines that certain process conditions are met. A valve is switched to pump air from the ambient environment 15 into the processing chamber 100, either directly or through a scent cartridge 700, until the controller determines that certain process conditions are met. Once the controller determines that the entire processing protocol has been completed, the items can be removed from the processing chamber 100.

The embodiments and implementations described herein are for illustrative purposes only, and various modifications or changes thereto may be suggested to those skilled in the art and are intended to be included within the spirit and scope of the present invention.

References in this specification to "one embodiment," "an embodiment," "an exemplary embodiment," "another embodiment," "an alternative embodiment," etc. are for convenience of description. This means that any specific feature, structure, or characteristic described in connection with the embodiment is included in at least one embodiment of the invention. The appearance of such phrases in different places in the specification do not necessarily refer to the same embodiment. In addition, any element or limitation of any invention or embodiment thereof disclosed herein may be combined with any and/or all other elements or limitations disclosed herein (alone or in any combination) or any other invention or embodiment thereof, and all such combinations are within the scope of the invention and are not limitations thereon.

Claims (23)

1. A disinfection device, comprising: A processing chamber for receiving items to be processed, the processing chamber including at least one conformal wall for forming a volume for accommodating the items; A pump is operatively connected to the processing chamber such that at least a portion of the ambient air in the processing chamber can be pumped out, causing the conformal wall to collapse and at least partially conform to the article, thereby reducing the volume of the processing chamber, while the working volume of air remains in the processing chamber; An outlet chamber, operatively connected to the pump, the pump repeatedly removing at least a portion of the working volume of air from the processing chamber at least once to isolate it in the outlet chamber and returning the working volume of air to the processing chamber; and A plasma generator is provided so that each time air from the working volume of the outflow chamber returns to the processing chamber, the air of the working volume passes through the plasma generator, thereby converting at least a portion of the air delivered to the processing chamber into plasma. 2. The apparatus of claim 1 further includes a controller for controlling the operation of the pump. 3. The apparatus according to claim 2 further includes a sensor for controlling the operation of the controller. 4. The apparatus of claim 3 further includes a separate outflow chamber operatively connected to the pump, wherein at least a portion of the ambient air in the treatment chamber can be pumped into the outflow chamber. 5. The apparatus according to claim 4, wherein the sensor controls the position of the pump moving ambient air and the working volume of air. 6. The apparatus of claim 1 further includes an odor delivery device positioned such that ambient air moving into the processing chamber passes through the odor delivery device. 7. The apparatus of claim 1 further includes a filter positioned such that at least one of the ambient air and the working volume of air passes through the filter at least once. 8. The apparatus according to claim 7, wherein the filter removes or passivates plasma from the air in the working volume when the filter is removed from the processing chamber by the pump. 9. The apparatus according to claim 2 further includes a UV lamp light source that guides the disinfecting UV light into the treatment chamber. 10. The apparatus of claim 1, further comprising a vacuum storage system, which includes: A vacuum container that can maintain a negative pressure level; Pumps, which are used to generate negative pressure levels; and, A valve, located between the vacuum container and the processing chamber, is provided such that when the valve is opened, at least a portion of the ambient air in the processing chamber enters the vacuum container due to the negative pressure level, thereby reducing the amount of ambient air in the processing chamber, and the valve closes when the ambient air is balanced between the vacuum container and the processing chamber to maintain the reduction of ambient air in the processing chamber. 11. The apparatus of claim 1, further comprising an atomizing mechanism between the pump and the processing chamber, the atomizing mechanism comprising: Disinfectant storage container; and, A nozzle is positioned between the disinfectant reservoir and the treatment chamber, such that when the pump moves a working volume of air from the outflow chamber into the treatment chamber, the nozzle atomizes the disinfectant, thereby carrying it into the treatment chamber at least once by the working volume of air. 12. The apparatus of claim 1, further comprising one or more ports in the processing chamber through which air moving into the working volume of the processing chamber can pass. 13. The apparatus of claim 12, further comprising a gas guiding component operatively connected to at least one of the one or more ports and leading to the processing chamber. 14. A method for disinfecting articles, the method comprising: Place the items in the processing chamber of the disinfection device according to claim 1. The first stage of the disinfection process involves the pump removing at least a portion of the ambient air from the treatment chamber, causing the conformal wall to collapse and reducing the volume of the treatment chamber, so that the air in the working volume remains in the treatment chamber. The second stage of the disinfection process is initiated by repeatedly pumping a working volume of air into the outflow chamber and then from the outflow chamber into the processing chamber at least once, such that each time the working volume of air passes through the plasma generator, at least a portion of the working volume of air is converted into plasma, which then contacts the items for a predetermined time upon entering the processing chamber; and The final stage of the disinfection process is initiated by pumping out the working volume of air from the treatment chamber and then moving air from outside the treatment chamber into the treatment chamber, thereby restoring the volume of the treatment chamber. 15. The method of claim 14, further comprising an additional outflow chamber, wherein a portion of the ambient air removed in the first stage is released into the surrounding environment and at least one of the additional outflow chamber. 16. The method of claim 15, wherein the final stage further comprises the pump transferring a portion of the ambient air in the additional outflow chamber to the treatment chamber. 17. The method of claim 14, wherein the air moved by the pump through the working volume of the plasma generator originates from the processing chamber. 18. The method of claim 17, wherein the pump, in the process of repeatedly transferring a working volume of air from the outflow chamber to the processing chamber and from the processing chamber, causes the plasma concentration to increase each time the working volume of air passes through the plasma generator. 19. The method of claim 18, wherein the second stage further comprises at least one pause period after the air in the working volume is transferred to the processing chamber. 20. The method of claim 19, wherein the sterilization apparatus further comprises a filter, and the method further comprises, in a final stage, the pump moving a working volume of air in the treatment chamber through the filter to remove or passivate the plasma therein. 21. The method of claim 20, wherein the disinfection apparatus further comprises an odor delivery device, and the method further comprises the pump transferring air outside the treatment room into the treatment room such that it passes through the odor delivery device during the final stage of the treatment process, and wherein the air entering the treatment room during the final stage originates from the surrounding environment or at least other outflow chambers. 22. A disinfection device, comprising: A processing chamber for receiving items to be processed, the chamber including at least one conformal wall for forming a volume for accommodating the items; A pump, operably connected to a processing chamber, allows at least a portion of the ambient air in the processing chamber to be removed by the pump, causing the conformal wall to collapse toward and at least partially conform to the article, thereby reducing the volume of the processing chamber and retaining a working volume of air in the processing chamber; The pump repeatedly moves at least a portion of the working volume of air from the processing chamber into the outlet chamber and returns the at least a portion of the working volume of air back to the processing chamber at least once; and An atomizing mechanism is positioned such that when air in at least a portion of the working volume outside the processing chamber is pumped into the processing chamber, the atomizing mechanism binds material to the air in at least a portion of the working volume at least once. 23. The disinfection device according to claim 22, wherein the material incorporated by the atomizing mechanism into the air of the at least a portion of the working volume is a disinfectant.