HK1124018B - Stereoscopic sheet structure - Google Patents

Description

Stereoscopic plate structure

Technical Field

This is an invention relating to a stereoscopic plate structure. Specifically, the three-dimensional interference corrugated pattern, for example, the three-dimensional interference corrugated pattern has a change in cell shape, a change in the size of the pattern cells, a change in the positions of the pattern cells, and/or a change in the interval between the pattern cells, according to a change in the observation angle.

Background

Patent document 1 proposes "a decorative plate characterized in that a pattern having the same pattern units and the same repetition pitch is formed on one surface of a transparent plate material, and a 2 nd pattern is formed on the other surface of the transparent plate material by a 2 nd pattern unit similar to the 1 st pattern unit" for the purpose of providing "a decorative plate material in which a three-dimensional pattern is expressed on a plate material by patterns formed on the front surface and the back surface of the transparent plate material" (refer to claim 1 and paragraph number 0005 of patent document 1). Patent document 2 proposes, for the purpose of providing a "decorative plate material having a three-dimensional pattern change", a "decorative plate material characterized in that a stereoscopic effect is imparted to a pattern by combining a lens body composed of a plurality of convex lenses and a pattern composed of pattern units, and a plurality of convex lenses are caused to have a protrusion change" (see claim 1 and paragraph number 0005 of patent document 2). Patent document 3 proposes "a decorative plate material characterized in that one arbitrary pattern is formed on the front surface 2 of the transparent plate material 1 by a plurality of continuous convex lens protrusions 21, and the continuous pattern on the front surface 2 is formed by offset printing on the back surface 3 of the plate material 1 with a continuous pattern 31 similar to the front surface 2" for the purpose of simplifying the structure of the decorative plate material having a superior pattern change depending on the observation direction and reducing the cost ". (see claim 1 and paragraph 0004 of patent document 3). Patent document 4 proposes a technical problem that "it is difficult to express a large variety of patterns composed of three-dimensionally enlarged dots because the shape and size of the embossing process of a plastic film must be changed to express a pattern composed of three-dimensionally enlarged dots of different sizes, and this method of changing a mold is expensive", and "it is difficult to express a large variety of patterns composed of three-dimensionally enlarged dots" that a plurality of independent convex light collectors a colored or non-colored and transparent are printed with a transparent printing ink on the surface of a colored or colorless transparent substrate B at a regular interval, a large number of colored pixels C are printed on the back surface of the transparent substrate B in the same shape as the convex light collectors a on the front surface or in the same shape as the convex light collectors a on the front surface, and the observation sizes of the colored pixels C are greatly changed depending on the angle of intersection, a point-drawing decorative body in which an intersection angle of a convex light collecting element a with respect to a surface is shifted, and a colored pixel C presents an enlarged stereoscopic image when viewed from the surface, and the enlarged image is also fluctuated with the movement of a viewpoint has been proposed (see claim 1 and paragraph No. 0006 of patent document 4).

Further, patent document 5 proposes "a virtual image appearing decoration body in which enlarged virtual images of the same shape and the same shape are shown above or below a planoconvex lens-shaped light collector layer", in which a planoconvex lens-shaped light collector layer and a transparent substrate layer formed by vertically and horizontally arranging a large number of planoconvex lens-shaped light collectors of the same shape and the same size and a pixel layer formed by vertically and horizontally arranging a large number of pixels of the same shape and the same size are arranged, at least one group of each planoconvex lens-shaped light collector and pixel is completely overlapped up and down, the other pixels at equal distances from the overlapping pixel are radially expanded outward (also inward) from the planoconvex lens head-shaped light collecting body corresponding to the other pixels with the overlapping pixel as the center at equal offset widths, and the offset width is larger toward the outside than the center pixel. A solution in which the planoconvex lens-like light collector layer and the pixel layer are arranged as described above, and a virtual image of the same enlarged pixel shape is displayed above (or below) "the light collector layer (see the abstract of patent document 5). Patent document 6 proposes "a virtual image display decorative body in which the depth position and the height position of the surface of the virtual image decorative body change with the change in the visual direction when the virtual image display decorative body is observed", and "a virtual image display decorative body in which a plurality of planoconvex lens head-shaped light collector layers and transparent substrate layers formed by the planoconvex lens head-shaped light collector bodies are arranged in a plurality of rows and a plurality of pixels are arranged in order with different vertical and horizontal intervals, and in an arrangement including overlapping pixels, in an arrangement of pixels which intersect each other at right angles, the arrangement of one pixel and the arrangement of other pixels which are equidistant from the one pixel are shifted in the inward direction with respect to the arrangement of the planoconvex lens head-shaped light collector bodies, and the arrangement of other pixels which are equidistant from the one pixel are shifted in the outward direction with respect to the arrangement of the planoconvex lens head-shaped light collector bodies as the magnitude of the shift increases, a method in which a virtual image appears centered on the overlapping pixels above or below the planoconvex lens-like light collector layer in accordance with the visual direction as the magnitude of the outward deviation increases (see the abstract of patent document 6). Patent document 7 discloses a technique for solving the above-mentioned problem by providing a decorative body in which enlarged virtual phases of pixels are displayed on or below a planoconvex lens head-shaped light collector layer, wherein the decorative body is composed of a planoconvex lens head-shaped light collector layer and a transparent substrate layer, the planoconvex lens head-shaped light collector layer being arranged in a plurality of vertical and horizontal rows, and a pixel layer in which the pixels are arranged in a plurality of vertical and horizontal rows, one row of pixels is selected as a basic pixel row, the size of the pixels is smaller than that of pixels on other pixel rows distant from the basic pixel row, at least one group of pixels which are most overlapped should be present above and below the planoconvex lens head-shaped light collector layer and the pixel layer, and the other pixels at equal distances from the overlapped pixels exhibit a radial shape with respect to the planoconvex lens head-shaped light collector pixel corresponding to each pixel with the overlapped pixel as a center, and the width of the outer pixels is larger than that of the, the enlarged virtual image appears above and below the planoconvex lens-like light collector layer "(see the abstract of patent document 7). Patent document 8 proposes "a virtual image decorative body in which each pixel is moved above or below a planoconvex lens head-shaped light collector layer in accordance with the movement of the visual position", and "a planoconvex lens head-shaped light collector layer composed of an array of planoconvex lens head-shaped light collectors, a transparent substrate layer, and a pixel layer in which pixels are arranged, wherein each pixel layer arranged in each pixel row (or each pixel column) of the pixel layer is formed by rotating according to a pattern accumulated at the same rotation angle, each planoconvex lens head-shaped light collector and each pixel are overlapped in a set, and the pixel column including overlapping pixels is shifted from the pixel column including overlapping pixels to the outside (or to the inside) with respect to a planoconvex lens head-shaped light collector corresponding to another set of pixel columns at an equal distance, and the shift width of the pixel column including overlapping pixels from the pixel column to the outside is gradually increased, the arrangement of the planoconvex lens-head-like light collector layer and the pixel layer in the above-described manner means that the virtual image varies among pixels above or below the planoconvex lens-head-like light collector layer with the movement of the visual position (see the abstract of patent document 8). Patent document 9 proposes "providing a decorative display body in which a three-dimensional enlarged decorative pattern can be seen without being restricted by the angle of observation in a state where the wobbling range is small and the display body is almost at rest", and "forming an image pattern by arranging a plurality of colored pixels 42 in a binary uniform manner such that the arrangement of the pixels 42 is directional on the back surface of a sheet-like transparent material 41. On the surface of the transparent material 41, a plurality of convex light collectors 44 are arranged in the same arrangement as the aforementioned pattern, thereby forming a light collector pattern. A proposal of forming the aforementioned pattern 43 and light collector pattern "by making the arrangement interval of each pixel 42 and the arrangement interval of each light collector 44 different (see the abstract of patent document 9). Patent document 10 proposes a solution to the problem of "providing a decorative display body in which a three-dimensional enlarged decorative pattern can be seen without being limited by the angle of observation in a state where the range of shaking is small and the decorative display body is substantially at rest", in which "a plurality of colored pixels 42 are two-dimensionally and uniformly arranged on the back surface of a sheet-like transparent material 41 so as to form a pattern in accordance with the directivity of each pixel 42. On the surface of the transparent material 41, a plurality of convex light collectors 44 are arranged in the same manner as the pattern described above to form a light collector pattern for each light collector 44. A proposal of forming a front pattern 43 and a light collector pattern "by making the arrangement interval of each pixel 42 and the arrangement interval of each light collector 44 different (see the abstract of patent document 10).

< patent document 1> specification of Japanese patent No. 3131771

< patent document 2> Japanese patent laid-open No. 2003-39583

< patent document 3> specification of Japanese patent No. 2761861

< patent document 4> specification of Japanese patent No. 3338860

< patent document 5> Japanese patent laid-open No. 2001-55000

< patent document 6> Japanese patent laid-open No. 2002-46400

< patent document 7> Japanese patent laid-open No. 2002-120500

< patent document 8> Japanese patent laid-open No. 2003-226099

< patent document 9> Japanese patent laid-open No. 2001-180198

< patent document 10> Japanese patent laid-open No. 2003-220173

Disclosure of Invention

However, in the case of this type of three-dimensional plate structure, the pattern displacement can be seen even by the mirror body if the angle is changed, but the amount of change is constant. Therefore, the pattern has a certain stereoscopic visual effect, but the three-dimensional visual effect is not obvious. Further, the lack of change in the shape of the three-dimensional pattern is also a cause of the poor three-dimensional visual effect. Even if the pattern is visually displaced as the visual angle changes, the amount of change in the pattern becomes small when viewed at a certain distance, and as a result, the stereoscopic effect of the pattern becomes inconspicuous.

Therefore, an object of the present invention is to provide a stereoscopic sheet material which can visually recognize a three-dimensional corrugated pattern which is visually changed in orientation according to a change in visual angle when the pattern is viewed through a mirror. Specifically, when the pattern is viewed through the lenticular lens assembly, the three-dimensional wave pattern and the change in the shape of the three-dimensional wave pattern can be seen by changing the viewing angle regardless of the viewing distance. The object of the present invention is to provide a stereoscopic plate structure of the above-described variation.

A first means for solving the above problems is a stereoscopic plate structure comprising a convex lens assembly and a repetitive pattern. The convex lens assembly is formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, and the convex lenses are formed by focusing on the other surface. A repetitive pattern, wherein a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from those of the convex lens, and when any 3 adjacent pattern units are selected, the arrangement interval D between the pattern unit of N number and the adjacent pattern unit of N +1 number_N～N+1And the interval D between the pattern unit No. N +1 and the pattern unit No. N +2 adjacent to it_N+1～N+2Ratio of (D)_N～N+1/D_N+1～N+2) And is regularly varied within the range of 0.95 to 1.05. The arrangement direction of the pattern units is regularly changed within the range of-1 degree to +1 degree, and a continuous deformation pattern part is formed, wherein the intersection angle formed by an extension line connecting the pattern unit N and the pattern unit N +1 adjacent to the pattern unit N +1 and a straight line connecting the pattern unit N +1 and the pattern unit N +2 adjacent to the pattern unit N +1 is formed.

A second means for solving the above problems is a stereoscopic plate structure comprising a convex lens assembly and a repetitive pattern. The convex lens assembly is formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, and the convex lenses are formed by focusing on the other surface.

And a repeating pattern in which a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from the convex lens, the pattern units being line segments, and a line segment collection unit including a plurality of line segments arranged at different arrangement intervals of the convex lens in the convex lens assembly is formed.

The characteristic of the stereo sheet carrier is that the repeated pattern part contains a plurality of line segment sets, and the extending direction of the line segments forming the line segment sets is not consistent with the extending direction of the line segments formed by other line segment sets.

A third means for solving the above problems is a stereoscopic plate structure comprising a convex lens assembly and a repetitive pattern. The convex lens assembly is formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, and the convex lenses are formed by focusing on the other surface.

A repetitive pattern in which a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from those of the convex lens, and in a pattern format including a plurality of pattern units arranged at different arrangement intervals from the convex lenses of the convex lens assembly, a plurality of sections each including the same number of pattern elements are formed by being equally divided in each arrangement direction of the pattern elements, and a section formed along at least 1 of the arrangement directions is arranged at an interval different from the arrangement interval in the 1 direction of the pattern elements in another section adjacent to the arrangement direction of the section, when a plurality of pattern units are arranged along the 1 direction, a continuous deformed pattern portion formed by deforming the pattern format is included.

A fourth means for solving the above problems is a stereoscopic plate structure comprising a convex lens assembly and a repetitive pattern. The convex lens assembly is formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, and the convex lenses are formed by focusing on the other surface.

The repetitive pattern includes the continuous deformation pattern portion as described above in the first and third means, and is formed by arranging a plurality of pattern units on the focal plane of the convex lens at different arrangement intervals and/or different directions from those of the convex lens.

A fifth means for solving the problems described above is a stereoscopic plate structure, wherein one surface of a first plate member has the convex lens assembly described in the first means, one surface of a second plate member has the repetitive pattern described in any one of the first to fourth means, and the first plate member and the second plate member can be freely combined or fixed to each other by aligning the focal plane of the first plate member and the second plate member having the repetitive pattern with each other.

The present invention can provide a stereoscopic vision effect plate structure in which a three-dimensional moire pattern that changes with a change in visual angle is seen.

That is, according to the present invention, there is provided the stereoscopic plate structure in which the three-dimensional moire pattern is seen by changing the observation angle regardless of the distance of the observation when the three-dimensional moire pattern is observed through the mirror assembly, by the stereoscopic plate structure according to the first and second means. Therefore, the effect of seeing the change of the three-dimensional ripple pattern can be fully exerted by changing the visual angle according to the invention. Therefore, the three-dimensional visual panel structure according to the present invention can produce a three-dimensional visual effect at a short distance, and is suitable for use in packages and the like, and in the case of producing a three-dimensional visual effect at a long distance, and is also suitable for use in commercial signs, posters, advertising towers, guide signs and the like.

Further, according to the present invention, there is provided the stereoscopic plate structure in which the three-dimensional wave pattern is seen in a changed shape by changing the angle of observation when the pattern is observed through the mirror assembly, by the stereoscopic plate structure according to the third means. Therefore, the present invention can sufficiently exhibit the effect of changing the visual angle to see the change of the three-dimensional wave pattern, and therefore the stereoscopic plate structure pertaining to the present invention is suitable for use in an attractive place such as a package, a commercial signboard, a poster, an advertising tower, a guide signboard, and the like.

Further, in this invention, since it is possible to easily form a part or all of the repetitive patterns included and to form a continuous deformed pattern portion and a line segment assembly portion, it is relatively easy to manufacture a stereoscopic effect structure having the above-described effects.

Drawings

Fig. 1 is a schematic cross-sectional view of a stereoscopic plate structure as an example of the present invention.

Fig. 2 is a schematic diagram showing an example of arrangement of convex lens combinations that can be used.

Fig. 3 is a schematic diagram showing an example of arrangement of convex lens combinations that can be used.

Fig. 4 is a schematic diagram showing an example of arrangement of the convex lens combinations that can be used.

Fig. 5 is a schematic diagram showing an example of arrangement of the convex lens combinations that can be used.

Fig. 6 is a schematic diagram showing an example of arrangement of the convex lens combinations that can be used.

Fig. 7 is a schematic diagram showing an example of arrangement of the convex lens combinations that can be used.

Fig. 8 is a schematic diagram showing an example of arrangement of the convex lens combinations that can be used.

Fig. 9 is a schematic diagram showing an example of a pattern format that can be used.

Fig. 10 is a schematic view of a continuous deformation pattern portion in the stereoscopic plate structure of the first pattern.

FIG. 11 is a view of FIG. 9 showing an auxiliary line Y along the pattern₀The arrangement and the arrangement direction of the pattern units 31 and the 2 pattern unitsAn explanatory view of a continuous deformation pattern portion formed by continuously changing the array angle θ formed by the connected straight lines.

Fig. 12 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the first embodiment.

FIG. 13 is a view of FIG. 9 showing an auxiliary line Y along the pattern₀And a continuous deformed pattern portion formed by continuously changing the arrangement of the pattern unit 31 and the arrangement interval d of 2 pattern unit pattern units 31 adjacent to and connected in the arrangement direction of the auxiliary line.

Fig. 14 is a schematic diagram showing an example of a pattern that can be used.

Fig. 15 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the first embodiment.

Fig. 16 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the first embodiment.

Fig. 17 is a schematic view showing an example of the pattern on the stereoscopic plate structure of the first embodiment.

Fig. 18 is a schematic cross-sectional view of a stereoscopic plate structure as an example of the present invention.

Fig. 19 is a schematic cross-sectional view of a stereoscopic plate structure as an example of the present invention.

Fig. 20 is a schematic cross-sectional view of a stereoscopic plate structure as an example of the present invention.

Fig. 21 is a schematic view of an example of a line segment set constituting the stereoscopic vision plate structure of the second pattern that can be used in the case of the honeycomb arrangement.

Fig. 22 is a schematic diagram showing an example of a line segment set constituting the stereoscopic vision plate structure of the second pattern that can be used in the case of the square arrangement.

Fig. 23 is a schematic view showing an example of a continuous deformation pattern portion in the stereoscopic plate structure of the second embodiment.

Fig. 24 is a schematic view showing an example of a continuous deformation pattern portion in the stereoscopic plate structure of the second mode.

Fig. 25 is a schematic cross-sectional view of a stereoscopic plate structure as an example of the present invention.

Fig. 26 is a schematic diagram showing an example of a pattern that can be used.

Fig. 27 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 28 is a schematic view of an example of the continuous deformed pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 29 is a schematic view of an example of the continuous deformed pattern portion in the stereoscopic plate structure of the third mode.

Fig. 30 is a schematic view of an example of a continuous deformed pattern portion in the stereoscopic sheet-like structure of the third embodiment.

Fig. 31 is a schematic view of an example of a continuous deformed pattern portion in the stereoscopic sheet-like structure of the third embodiment.

Fig. 32 is a schematic diagram showing an example of a pattern that can be used.

Fig. 33 is a schematic view of an example of the continuous deformed pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 34 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 35 is a schematic view of an example of a continuous deformation pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 36 is a schematic view of an example of the continuous deformed pattern portion in the stereoscopic plate structure of the third pattern.

Fig. 37 is a schematic view of an example of the continuous deformed pattern portion in the stereoscopic plate structure of the third mode.

Fig. 38 is a schematic view showing a three-dimensional moire pattern when the continuous deformed pattern portion 46 is viewed from above the convex lenses 21 constituting the convex lens assembly 20.

Fig. 39 is a schematic diagram showing a three-dimensional moire pattern when the continuous deformed pattern portion 46 is viewed by moving horizontally from above the convex lens 21 constituting the convex lens assembly 20.

1.2, 3, 4, 5: stereoscopic plate structures 10 and 11: sheet material

15: image 20: convex lens assembly

21: convex lens 22: lens body forming division

30. 30D, 50, 70: repeating patterns 31, 32: a pattern unit 35,

36. 37, 38, 39: pattern formats 40 to 49A: continuously deformed pattern part

60: line segment collection unit 65: line segment

Detailed Description

First, a first aspect of the present invention, that is, a stereoscopic plate structure in a stereoscopic plate structure will be described with reference to the drawings. As shown in fig. 1, the stereoscopic vision plate structure 1 of the first embodiment has a convex lens assembly 20 in which a plurality of convex lenses 21 are formed on one surface of a plate material 10. On the other side there is a repeating pattern 30.

As shown in fig. 1, the plate 10 is formed of a single plate and supports a convex lens assembly 20 to be described later. In the stereoscopic plate material structure, since the repetitive pattern 30 formed on the other surface of the plate material 10 forming the convex lens assembly 20 can be observed through the convex transparent crystal assembly 20, the plate material 10 needs to have transparency. The transparency here means that the repeating pattern part 30 can be observed. Including the concepts of clear, translucent, colored transparent and colored translucent. The material for the plate 10 must have characteristics such as synthetic resin, glass and transparent plastic film that support the convex lens assembly 20 and transparency.

The thickness of the plate 10 is practically the same as the focal distance of the convex lens 21. In other words, the main reason for determining the thickness of the plate material 10 is because the convex lens 21 in the convex lens assembly 20 and the focal point of the other surface of the plate material 10 must correspond to each other when the convex lens assembly 20 is formed on one surface of the plate material 10. In general, the thickness of the plate 10 is controlled to be 0.1 to 10.0mm, preferably 0.1 to 0.8mm, in order to correspond to the focal distance of the convex lens 21. The shape of the plate 10 is determined mainly by whether or not the supporting convex lens assembly 20 is provided, and is suitable for use in an image guide signboard or the like. For example, the plate-like shape may be a flat surface, a curved surface, an arbitrary uneven surface, or the like.

The surface of the plate material 10 forming the convex lens assembly 20 is preferably smooth. The optimum photometric standard which can specify the surface of the plate material 10 forming the convex lens assembly 20 is determined by the arithmetic average roughness (Ra value) and the maximum height (Ry value) as defined in JIS B0601. The plate 10 forming the convex lens assembly 20 has a surface standard Ra value of 0.001 to 5(μm), preferably a Ra value of 0.002 to 0.6(μm), a standard Ry value of 0.001 to 28(μm), and preferably a Ry value of 0.002 to 3(μm). Further, the Ra value may be set to 0.001 to 0.6 and 0.002 to 5, or the Ry value may be set to 0.002 to 28 and 0.001 to 3, depending on the case. The smoothness of the surface of the plate material 10 forming the convex lens assembly 20, if controlled within the above range, enables the formation of the convex lens assembly 20 having uniform convex lenses 21. In particular, when the printing method described below is used, the lenticular lens assembly 20 can be formed more efficiently. If the above surface smoothness is not good, the function of the convex lens assembly 20 is eventually affected.

The convex lens 21 forms a convex lens assembly 20 on the surface of the plate 10. The arrangement of the lenticular lenses 21 is determined depending on whether the pattern elements of the interference moire effect in the repetitive pattern can produce a special visual effect of unevenness. The lens body formation sections formed by one convex lens 21 have different characteristics depending on the distance between the lens body formation sections. Examples of such lens body shapes include polygonal shapes such as triangle, quadrangle, pentagon, hexagon, etc., circular oval, etc. In the inside of the lens body formation, one convex lens 21 is formed first, and then the arrangement of the convex lenses 21 is determined. The size of the pattern formation pattern region (the interval between the pattern formation sections adjacent thereto and connected thereto) depends on whether or not it corresponds to the arrangement interval L to be described next.

The arrangement shown in FIGS. 2 to 8 is the arrangement of the convex lens assembly 20. The arrangement of the convex lens assembly 20 shown in fig. 2 is a honeycomb-type arrangement formed by the individual convex lenses 21 in the hexagonal lens body forming section 22 which is most precisely arranged. The arrangement of the convex lens assembly 20 shown in fig. 3 is a square arrangement formed by the single convex lens 21 in the rectangular regular lens forming section 22 arranged vertically and horizontally. The convex lens assembly 20 shown in fig. 4 is a square array system formed by the single convex lenses 21 in the rectangular lens body forming section 22 which is rotated by 45 degrees and arranged vertically and horizontally. The arrangement of the convex lens assembly 20 shown in fig. 5 is a radiation shape arrangement manner formed by the single convex lens 21 in the lens body formation section (not shown in fig. 5) arranged in the spot radiation shape. The arrangement of the convex lens assembly 20 shown in fig. 6 is an arrangement in which concentrically arranged lens sections (not shown in fig. 6) are formed in a single concentric shape. The arrangement of the convex lens assembly 20 shown in fig. 7 is an arrangement formed by a single spiral-shaped convex lens 21 in a zone (not shown in fig. 7) where a spiral-shaped lens body formed from a point is arranged. The arrangement of the convex lens assembly 20 shown in fig. 8 is a radial curved arrangement formed by the convex lenses 21 in the lens body sections (not shown in fig. 8) arranged in a shape diverging from the center of the circle toward the circumferential direction. In the stereoscopic vision plate structure 1 as an example of the stereoscopic vision plate structure of the first embodiment, the arrangement of the lens body forming sections 22 is a honeycomb type arrangement shown in fig. 2.

In the lens body forming section 22, the convex lenses 21 are arranged in a desired pattern in the central region. The shape of the convex lens 21 is a shape that can form a focal point with the light incident on the convex lens 21. The size of the convex lens 21 is preferably equal to the size of the lens body forming partition shape, and is preferably the same as the lens body forming partition shape. The height of the convex lens 21 is, for example, about 5 to 100 μm as long as the light incident on the convex lens 21 and the plate 10 can form a focal point on the reverse side.

The convex lenses 21 are arranged in the arrangement direction of the lens body forming sections 22 at the arrangement interval L between adjacent convex lenses 21. The distance of the arrangement interval L of the convex lenses 21 formed at this time is not limited, and may be equidistant or unequal. In the stereoscopic plate structure 1 (fig. 1) as an example of the stereoscopic plate structure, a plurality of convex lenses 21 are arranged at equal arrangement intervals L. The arrangement interval L between the convex lenses 21 is preferably kept between 0.1 and 1.2mm, more preferably between 0.12 and 0.42 mm. The arrangement interval L of the convex lenses 21 is a distance from a certain convex lens 21 to an arbitrary position of the adjacent convex lens 21 in a direction toward the lens body forming section 22. For reference, in fig. 2 to 8, the arrangement interval L between the centers of the convex lenses 21 is shown in each legend.

The material of the convex lens assembly 20 may be any material as long as it can form the lens performance. For example, an acrylated resin of an acrylic methyl resin, a methacrylated resin of a methacrylic methyl resin, or a vinyl resin, and other resin materials containing these resin components.

As described above, the stereoscopic plate body 1 of the first embodiment has the repetitive pattern 30 on one surface of the plate material 10, which is free from the convex lens assembly 20, that is, the surface combined with the focal point formed on the other surface. The repetitive pattern 30 includes a plurality of pattern units 31 arranged in a different manner from the plurality of convex lenses 21, that is, adjacent pattern units 31 are arranged at different intervals and in different directions from the plurality of convex lenses 21, thereby forming a continuous deformed pattern portion. Examples of the repetitive pattern 30 on the stereoscopic plate structure 1 will be described with reference to fig. 9 to 17. Fig. 9 and 14 are explanatory views of the three-dimensional wave pattern according to the present invention. In the embodiment shown in fig. 10, 12, 15, 16, 17, when the arrangement interval D of the pattern unit is selected to be adjacent to any other three pattern units in the repeating pattern part 30, the interval D between the unit pattern N No. N and the pattern unit N +1 No. N +1 adjacent to and connected to it is selected_N～N+1And the interval D between the pattern unit No. N +1 and the adjacent pattern unit No. N +2_N+1～N+2Ratio of (D)_N～N+1/D_N+1～N+2) In the range of 0.95 to 1.05, that is, in the same range as the following formula (1), regular changes are made, and the arrangement direction of the pattern units described above is such that the intersection angle θ (hereinafter referred to as θ) formed by the extension line of the connecting line of the pattern unit N No. N and the pattern unit N +1 No. N +1 adjacent thereto and the extension line of the connecting line of the pattern unit N +2 No. N +1 adjacent thereto is in the range of-1 degree to +1 degree, and the repeating pattern 30 includes the two or more continuous deformed pattern portions which are regularly changed on the premise that the following formula (2) is satisfied.

Formula (1) 0.95. ltoreq. D_N～N+1/D_N+1～N+2≤1.05

Formula (2) -1 ≤ theta ≤ 1 ≤

Again, the above ratio (D)_N～N+1/D_N+1～N+2) If it is less than 0.95, the three-dimensional moire pattern becomes too small when viewed from the lenticular lens assembly, resulting in no depressed effect of the pattern. If the above ratio exceeds 1.05, the pattern becomes too small when the three-dimensional moire pattern is observed through the convex lens assembly, resulting in no effect of the pattern being convex upward. If the crossing angle is less than-1 degree or more than +1 degree, the change of the three-dimensional moire pattern is not noticeable.

The repeating pattern including continuous deformed pattern portion 40 shown in fig. 10 is an example of repeating pattern 30. This continuous deformed pattern portion 40 is formed by arranging the pattern units 31 formed in a star shape in a similar manner to the lenticular lens assembly 20 to form the pattern 35 (see fig. 9), and then continuously changing the arrangement interval D of 2 pattern units 31 adjacent to the arrangement direction of the pattern unit 35 and the arrangement angle θ formed by the straight lines connecting the arrangement direction and the 2 pattern units 31 as shown in fig. 10 with respect to the pattern 35.

The pattern format 35 before the modification and the pattern unit arrangement direction shown in fig. 9 are the same on the convex lens assembly 20, but the arrangement interval L (referred to as pitch) of the convex lenses and the arrangement interval D of the pattern units are different, that is, a so-called similar arrangement format. Specifically, the plurality of star pattern units 31 are arranged at an arrangement interval D different from the arrangement interval L of the plurality of convex lenses on the convex lens assembly 20, but is not limited to such an arrangement. That is, the pattern format 35 may be similar to the arrangement of the convex lens assembly 20. For example, the arrangement interval D of the pattern 35 may be smaller or larger than the arrangement interval L of the convex lens assembly 20, and the arrangement direction may be the same as or different from the arrangement of the convex lens assembly 20. For example, when the convex lens assembly 20 is formed according to the arrangement shown in fig. 2 to 8, the patterns are formed according to the arrangement intervals shown in fig. 2 to 8, which are different from the arrangement intervals L shown in fig. 2 to 8.

Here, when the pattern unit constituting the pattern is formed by a discontinuous pattern, the pattern is referred to as a discontinuous individual pattern. When a pattern is formed by a continuous pattern such as a line segment, the pattern is referred to as a partially continuous pattern when the pattern is divided into lattice-shaped patterns at predetermined intervals. The shape of the pattern which is discontinuous as the pattern forming unit is not particularly limited, and for example, polygonal shapes such as triangle, quadrangle, pentagon, hexagon, and the like, and other arbitrary shapes such as circle, ellipse, heart, star, tear drop, character, and the like.

The convex lens assemblies 20 (the lens body formation sections 22 described above) in the three-dimensional plate structure 1 are arranged in a honeycomb arrangement as shown in fig. 2. The pattern format 35 is an arrangement of a plurality of star-shaped pattern elements 31 in a honeycomb-shaped arrangement, as shown in fig. 9. Further, an auxiliary line X shown in FIG. 9_-5～X₅And Y_-5～Y₅Only the auxiliary lines for changing the pattern will be described. Rather than the entities that make up pattern format 35.

Fig. 11 is an explanatory diagram of regularity of a pattern arrangement with respect to a first pattern, for example, an arrangement of pattern units 31 in a pattern 40 like that shown in fig. 10. As illustrated in FIG. 11, if attention is paid to 3 consecutive arbitrary pattern elements, e.g., 31a to 31c, in the pattern 40, it is found that the intersection angle θ formed by the straight lines connecting the pattern element 31a and the pattern element 31c₁Within a range of-1 degree to +1 degree, an intersection angle θ formed by a straight line connecting the pattern unit 31c and the unit pattern 31b and a straight line connecting the pattern unit 31c and the unit pattern 31d₂And also in the range of-1 to +1 degrees. In this case, the above formula (2) is applied to the arrangement of the plurality of patterns. The design of the pattern determines the value of the angle of theta varying within the aforementioned range of-1 degree to +1 degree.

The arrangement of the pattern elements 31 shown in fig. 10 is necessarily arranged in the pattern format 35 shown in fig. 9, and the intersection angle θ between the straight line formed by the adjacent 2 pattern elements and the straight line formed by any one of the 2 unit patterns and the adjacent other pattern element is within the range of the formula (1), and is formed by continuously and stepwise changing along the plurality of auxiliary lines X and Y in the same manner as the auxiliary lines X and Y in the curved arrangement manner of changing from the straight line to the S-shape in intentionally producing the visual effect.

In this case, if the arrangement angle θ of the pattern units is changed, as is clear from fig. 10 and 11, the angle is changed along the auxiliary line Y as is clear from fig. 11₀The arrangement interval D of the 2 pattern elements 31 adjacent in the direction also varies slightly within the range of the above formula (1). That is, the sub-auxiliary lines X are respectively_-5And X₅At the beginning, towards the auxiliary line X₀Direction along the auxiliary line Y₀The arrangement interval D of the 2 pattern units 31 adjacent and connected in the arrangement direction is continuously and stepwise or steplessly changed.

Along the auxiliary line X of the pattern format 35 shown in FIG. 9₀And Y and the arrangement of the pattern units 31₀Satisfies the ranges of the formulas (1) and (2) and is derived from the auxiliary line X forming a straight line_-5Initially, passing through the S-shaped auxiliary line X₀From the auxiliary line X forming a straight line₊₅And an auxiliary line Y_-5Starting to pass through the S-shaped auxiliary line Y₀Each along a straight auxiliary line Y₊₅Then, on the premise that the arrangement of the same pattern units is included in the region surrounded by the auxiliary line X and the auxiliary line Y, the pattern is deformed so as to form a continuously deformed pattern 40 as shown in fig. 10. The continuous deformation pattern part 40 is an auxiliary line X of the pattern format 35₀And an auxiliary line Y₀The intersections are centered and then arranged in such a way that the pattern format 35 is twisted or twisted.

As the continuous deformation pattern portion 40, when the arrangement angle θ in the formula (2) is changed, the magnitude and direction of the arrangement angle θ (the absolute value of θ) may be arbitrarily set within the range of the formula (2) described above, by taking the example shown in fig. 10 and 11 as an example.

In the continuous deformation pattern section 40 shown in FIG. 10, the auxiliary line X is formed from the auxiliary line X forming a straight line as described above_-5Initially, passing through the S-shaped auxiliary line X₀Becomes again an auxiliary line X forming a straight line₊₅While forming a straight auxiliary line Y_-5Starting to pass through the S-shaped auxiliary line Y₀And the auxiliary line Y is changed again to form a straight line₊₅However, the form of the auxiliary line change is not limited to such a manner. The continuously deformed pattern portion 40 may be formed by a plurality of pattern units arranged along the auxiliary lines while changing one of the auxiliary lines X and the auxiliary lines Y in order and the other auxiliary lines are kept in the original shape of a straight line or a non-straight line.

The repetitive pattern (not shown) including the continuous deformation pattern portion 41 shown in fig. 12 is an example of the repetitive pattern 30 described above. The continuous deformation pattern portion 41 is formed by continuously changing an arrangement angle θ formed by an arrangement interval D between the pattern 35 in which the pattern cells 31 are arranged in accordance with the arrangement pattern of the lenticular lens assembly 20, the 2 pattern cells 31 adjacent to the arrangement direction, and a straight line connecting the arrangement direction and the 2 pattern cells 31.

The pattern format 35 is the same as the pattern format 35 explained as an example of the repetitive pattern 30 described above, and has an arrangement interval different from the arrangement interval L of the convex lens assembly 20, thereby forming an arrangement format in which the plurality of star pattern units 31 are arranged.

FIG. 13 is a drawing showing an auxiliary line Y along the pattern format 35 shown in FIG. 9₀The pattern units 31 arranged along the auxiliary line Y₀Of 2 pattern units 31 adjacent to each other in the arrangement directionThe column interval D is continuously deformed and then an explanatory drawing of the continuously deformed pattern portion is formed. In FIG. 13, the lines are only located on the auxiliary line X_-5～X₅The upper star patterns 31a to 31k are indicated by circles, and the auxiliary lines after the deformation are indicated by the small characters "x" and "y".

Along y in FIG. 12₀The pattern element 31 of (1) is arranged in the pattern format 35 shown in fig. 9, and is deformed by changing the arrangement interval D of 2 pattern elements 31 adjacent to the arrangement direction thereof in a continuous step or a non-step manner within the range of the formula (1) as shown in fig. 13. Thus, when the arrangement of the pattern elements 31 is compared with the arrangement interval of the pattern format 35, it is found that the arrangement interval of the pattern elements 31 has a size of 2, and the auxiliary line x is used₀Centering on the auxiliary line x_-5Starting with the auxiliary line x₀The arrangement of the pattern units 31 and the auxiliary lines x₅Starting with the auxiliary line x₀The arrangement of the pattern units 31 up to this point forms line symmetry. Thus, along the auxiliary line y₀The arrangement interval d of the pattern units 31a and 31b₁Arrangement interval d from the unit patterns 31k and 31j₁Are arranged at intervals d which are the same₂～d₅Also, each has the same arrangement interval d₂～d₅. In FIG. 13, only the auxiliary line x is shown_-5～x₅All along Y, and pattern units 31a to 31k₀The pattern units 31 of (2) are arranged as described above with the auxiliary lines x₀Forming symmetry for the center.

On the other hand, along x as shown in FIG. 12₀And the aforementioned unit pattern arrangement along y₀The pattern elements 31a to 31k are arranged in the same manner as the pattern elements in the same manner as in the case of the above-described variation₀A way of deforming to form line symmetry at the center. Specifically, along the aforementioned x₀The pattern unit 31 of (1) is arranged in a pattern format 35 shown in FIG. 9, the arrangement interval D of 2 pattern units 31 adjacent to the arrangement direction is changed in a continuous stage or stepless manner within the range of the formula (1) as shown by the pattern 13,and then deformed. Thus, the above-mentioned direction x is defined₀When the arrangement of the pattern units 31 is compared with the arrangement interval of the pattern format 35, it is found that the arrangement interval of the pattern units 31 has 2 kinds. And with an auxiliary line y₀To be centered on, to follow the auxiliary line y_-5Starting to the auxiliary line y₀The arrangement of the pattern units 31 and the auxiliary lines y₅Starting to the auxiliary line y₀The pattern units 31 are arranged in line symmetry all along the auxiliary line X₀The arrangement of the pattern units 31 is deformed.

Thus, all along X shown in FIG. 12₀And the pattern unit 31 of (2) is arranged along Y₀The pattern units 31 are arranged as described above with the aid of auxiliary lines y₀Line symmetry is formed for the center line and deformed. The continuous deformation pattern portion shown in fig. 12 has the same number of pattern cells in each cell divided based on the y-axis and the x-axis, regardless of the cell. Further, when the arrangement rule of the pattern units of the continuous deformation pattern portion shown in FIG. 12 is described in another way, it is present in y₀Axis and x₀The density of pattern cells in the 4 cell segments around the intersection formed by the axes is the maximum, and the density of pattern cells in the cell segments arranged in order outside the aforementioned 4 cells follows an arrangement rule with a decrease in the direction along the outside. Specifically, when the pattern elements 31 are deformed, as is clear from fig. 12 and 13, the deformation is accompanied, more specifically, for example, by the pattern elements 31 arranged along the auxiliary line y4 on fig. 12 being continuously close to the auxiliary line y₀In the same direction, the connection being along the auxiliary line y₀The arrangement angle theta of the pattern unit 31 and the straight line of 2 pattern units 31 adjacent to the arrangement direction also slightly changes, that is, along the auxiliary line y₀The arrangement of the pattern elements 31 is changed continuously and stepwise or steplessly according to an arrangement angle θ formed by a straight line connecting the arrangement direction of the pattern elements and 2 unit patterns adjacent to the arrangement direction. The arrangement angle does not changeThe pattern unit 31 arrangement along the auxiliary line y also includes the pattern unit 31 arrangement along the auxiliary line x. In this case, as shown in FIG. 12, the continuous deformation pattern part 41 is an auxiliary line X of the pattern format 35₀And an auxiliary line Y₀With the intersection point of (a) as the center, a contracted arrangement is formed like the pattern format 35.

Fig. 12 and 13 have been exemplified with respect to the continuous deformation pattern 41. When the arrangement interval D is continuously, stepwise or steplessly deformed, the size of the arrangement interval can be arbitrarily set as long as it is within the range of the above formula (1).

In addition, instead of the continuous deformation pattern portion 41 shown in FIG. 12, for example, the continuous deformation pattern portion is formed along the auxiliary line y₀And an auxiliary line x₀The continuous deformed pattern portion can be formed by deforming one of the arrays of the pattern units 31. Further, for example, the auxiliary line x_-5Starting with the auxiliary line x₀The arrangement of the pattern units 31 and the auxiliary lines x₅Starting with the auxiliary line x₀Any one of the arrangements of the pattern units 31 up to now may be deformed alone even from the auxiliary line x_-5Starting with the auxiliary line x₀The arrangement of the pattern units 31 and the auxiliary lines x₅Starting with the auxiliary line x₀The arrangement interval D of the up to pattern unit 31 arrangements is set to a different value, and 2 arrangements may be modified.

The repetitive deformation pattern including the continuous deformation pattern portion 44 shown in fig. 15 is an example of the repetitive deformation pattern. The continuously deformed pattern portion 44 is formed by continuously changing the arrangement interval D of the 2 pattern units 31 adjacent to each other in the arrangement direction and the arrangement angle θ formed by the arrangement direction and the straight line of the 2 pattern units 31, as shown in fig. 15, in accordance with the pattern format 37 (see fig. 14) in which the pattern units 31 forming the star shape are arranged in the similar arrangement manner to the lens body assembly 20.

As shown in FIG. 14, the pattern format 37 is that of the convex lens assembly 20Similar arrangements are arranged. Specifically, the arrangement pattern is formed by arranging a plurality of star pattern units at different arrangement intervals from the convex lens assembly 20. The pattern format 37 is an arrangement pattern similar to the convex lens assembly 20 shown in fig. 4, which is formed in a square arrangement pattern forming the convex lenses 21 in the regular rectangular lens body formation sections 22 which are rotated and then arranged in the vertical and horizontal directions. Thereby forming an arrangement of a plurality of star pattern units 31. Additional auxiliary lines X on FIG. 14_-5～X₅And Y_-5～Y₅The auxiliary lines constituting the change state of pattern format 37 are described separately, not the entities constituting pattern format 37.

The continuous deformation pattern part 44 is, as in the continuous deformation pattern part 40 shown in fig. 15, a pattern format 37 is used as a basis for arranging an auxiliary line X along the pattern format 37₀And Y₀And an arrangement angle θ formed by straight lines connecting the arrangement direction and 2 pattern units 31 adjacent to the arrangement direction is continuously changed. Thus with the auxiliary line x₀And an auxiliary line y₀Centering on the intersection of (A) and (B), and drawing an auxiliary line x_-5Starting with the auxiliary line x₀The arrangement of the pattern units, and the auxiliary line x₅Starting with the auxiliary line x₀The arrangement of the pattern units up to this point is changed from a linear state to an S-shaped curved shape, and then changed to a linear state again. Additionally from auxiliary line y_-5Starting to the auxiliary line y₀Arrangement of pattern units and auxiliary lines y₅Starting to the auxiliary line y₀The arrangement of the pattern units up to now is also changed from a linear state to an S-shaped curved shape, and then changed again to a linear state, and all the auxiliary lines X along the pattern format 37 are changed in the above-described manner₀And Y₀The arrangement of the pattern units 31 is changed. The deformed auxiliary lines in fig. 15 are indicated by small letters "x" and "y".

The repeating pattern portion including the continuous deformation pattern portion 45 shown in fig. 16 is also an example of the repeating pattern portion. This continuous variationThe pattern 45 is formed by deforming the pattern format 37 shown in fig. 14, in which the arrangement angle θ is continuously changed within the range of expression (2) by the arrangement interval D of 2 pattern elements 31 adjacent to the arrangement direction and by the arrangement angle θ of 3 pattern elements selected in succession, as in the case of the continuously deformed pattern portion 41. In the continuous variation 45 of the repeating pattern 30 shown in fig. 16, the arrangement interval is found to have 2 kinds of sizes when compared with the arrangement interval of the pattern format 37. And with auxiliary lines x₀Centering on the auxiliary line x_-5Starting with the auxiliary line x₀The arrangement of the pattern units 31 and the auxiliary lines x₅Starting with the auxiliary line x₀The arrangement of the pattern units 31 up to now forms line symmetry. And for using the auxiliary line y₀Centered on the auxiliary line y_-5Starting to the auxiliary line y₀The arrangement of the pattern units 31, and the auxiliary line y₅Starting to the auxiliary line y₀The pattern units 31 are arranged in line symmetry, all along the auxiliary lines X of the pattern format 37₀And Y₀The arrangement of the pattern units 31 is deformed. The deformed auxiliary lines in fig. 16 are indicated by small letters "x" and "y".

The repetitive pattern 30D including the continuous deformation pattern portion 42 and the continuous deformation pattern portion 43 shown in fig. 17 is another example of the above repetitive pattern. Fig. 17 shows a portion of a repeating pattern 30D. The repetitive pattern 30D is formed by deforming the pattern unit in the x direction and the Y direction of the auxiliary lines in accordance with the 2 types of the deformation patterns 42 and 43. In fig. 17, line segments constituting the continuous deformation pattern portions 42 and 43 are indicated by solid lines.

The continuous deformation pattern portion 42 is formed by deforming a pattern (not shown) formed by the pattern unit 31, like the continuous deformation pattern portions 41 and 45. On this continuous deformation pattern part 42, an auxiliary line y₀And an auxiliary line x_-3The formed intersection is the center, and the arrangement interval D of the pattern elements 31 changes from large to small while being away from the intersection. The continuous deformation pattern part 43According to the auxiliary line y₀And an auxiliary line x₃The pattern format 36 is converted to a mode in which the arrangement interval D of the pattern elements 31 is changed from large to small with the formed intersection as the center, i.e., a mode of deformation opposite to the continuously deformed pattern portion 42, while being away from the intersection.

The pattern in the pattern unit set shown in fig. 17 is formed of a pattern in which line segments are arranged in a basic shape or in a vertical and horizontal direction. Therefore, the arrangement of the convex lenses on the convex lens assembly is a square arrangement in which the regular tetragonal lens bodies shown in fig. 3 are arranged in a vertical and horizontal direction.

The repeating pattern including the continuous deformed pattern portions 40 to 45 is formed on the back surface of the plate material 10 on which the convex lens assembly 20 is formed, that is, on the focal plane of the convex transparent crystal.

The principle of how the three-dimensional interference wave pattern undergoes visible displacement movement according to the repeating patterns 30 and 30D including the continuous deformation pattern portions 40 to 45 will be described by taking the continuous deformation pattern portion 40 as an example by changing the visual angle regardless of the distance of vision in the stereoscopic plate-like structure 1.

When the repetitive pattern 30 including the continuous deformation pattern portion 40 is observed through the convex lens assembly 20, the continuous deformation pattern portion 40 is a three-dimensional moire pattern, and the visual displacement movement can be performed by changing the visual angle.

In the stereoscopic plate structure 1, the three-dimensional visual effect of the continuously deformed pattern portion 40 is determined by the difference between the arrangement interval L between the convex lenses 21 on the convex lens group 20 and the arrangement interval D between the pattern cells 31 on the continuously deformed pattern portion 40, and the angular difference between the arrangement direction between the convex lenses 21 on the convex lens group 20 and the arrangement of the pattern cells 31 on the continuously deformed pattern portion 40. That is, if the arrangement interval L is larger than the arrangement interval D, the repetitive pattern 30 will have a concave visual effect, and conversely, if the arrangement interval D is larger than the arrangement interval L, the repetitive pattern 30 will have a convex visual effect. Thus, if the difference (absolute value) between the arrangement interval L and the arrangement interval D is relatively small, the amount of sinking or floating appears to be relatively large. Also, if the angular difference (absolute value) between the arrangement direction of the convex lenses 21 on the convex lens combination 20 and the arrangement of the pattern units 31 on the continuously-deformed pattern portion 40 is relatively small, the amount of concavity or convexity appears to be relatively large.

Since the arrangement interval D and the arrangement angle θ of the plurality of pattern units 31 constituting the continuous deformation pattern portion 40 are continuously changed by continuously changing the arrangement interval D and the arrangement angle θ of the pattern units 31 in a stepwise manner or without changing the arrangement interval D and the arrangement angle θ in a stepwise manner, the amount of concavity or convexity of the continuous deformation pattern portion 40 is continuously visually changed when the continuous deformation pattern portion 40 is observed through the convex lens assembly 20. Therefore, the three-dimensional concave or convex appearance of the continuous deformed pattern portion 40 observed through the convex lens assembly 20 becomes relatively prominent, and the three-dimensional visual effect of the continuous deformed pattern portion 40 becomes large.

On the other hand, when the viewing angle at which the continuous deformed pattern portion 40 is viewed through the convex lens assembly 20 is changed, the pattern unit 31 constituting the continuous deformed pattern portion 40 is visually moved by a movement amount which is largely dependent on the three-dimensional visual effect. That is, if the difference (absolute value) between the arrangement interval L and the arrangement interval D is relatively small, or if the difference (absolute value) between the arrangement direction of the convex lenses 21 on the convex lens combination 20 and the arrangement of the pattern units 31 on the continuous deformed pattern portion 40 is relatively small, the amount of concavity or convexity thereof appears to be large and the amount of movement becomes large by changing the observation angle of the continuous deformed pattern portion 40. Therefore, the observation angle is changed so as to correspond to the difference (absolute value) between the arrangement interval L and the arrangement interval D, and the pattern unit 31 constituting the continuous deformed pattern portion 40 visually changes by a movement amount like a movement. Moreover, if the angle difference (absolute value) between the arrangement direction of the convex lenses 21 on the convex lens assembly 20 and the arrangement of the pattern units 31 on the continuously-deformed pattern portion 40 is changed, the pattern units 31 constituting the continuously-deformed pattern portion 40 produce a visual effect of moving in a different direction from the line of sight by changing the observation angle. At this time, there is a large dependence on the angular difference (absolute value) between the moving direction of the pattern unit 31 and the arrangement direction of the convex lenses 21 on the convex lens assembly 20 and the arrangement of the pattern unit 31 on the continuously-deformed pattern portion 40, and if this difference becomes large, the moving direction of the pattern unit 31 greatly deviates from the moving direction of the line of sight.

In this way, in the continuously deformed pattern portion 40, if the observation angle is changed in a portion where the arrangement interval D is continuously changed, the displacement amount of the pattern unit 31 generates continuously different visual effects, and if the observation angle is changed in a portion where the arrangement angle θ is continuously changed, the displacement direction of the pattern unit 31 generates continuously different visual effects. Therefore, when the continuous deformed pattern portion 40 is observed through the convex lens assembly 20, it is emphasized that the variation of the continuous deformed pattern portion 40 has a clearer visual effect.

In the continuous deformed pattern portion 40 in which the difference (absolute value) between the arrangement interval L and the arrangement interval D and the difference (absolute value) between the arrangement direction of the convex lenses 21 in the convex lens assembly 20 and the arrangement direction of the pattern units 31 in the continuous deformed pattern portion 40 are continuously or steplessly changed as described above, the displacement amount of the pattern units 31 constituting the continuous deformed pattern portion 40 and the displacement direction of the pattern units 31 are continuously changed, and thus, the variation emphasizing the continuous deformed pattern portion 40 occurs, and a clearer visual effect is obtained, and the variation of the continuous deformed pattern portion 40 can be clearly and easily observed not only at a short distance but also at a long distance.

Therefore, as with the three-dimensional plate structure 1 of the first embodiment according to the present invention, the continuous deformation pattern 40 observed through the convex lens assembly 20 has not only a clear concave and convex visual effect, but also a visual effect of displacement movement by changing the observation angle even at a long distance when the continuous deformation pattern 40 is observed through the convex lens assembly 20.

Therefore, the stereoscopic plate structure 1 can be used for a packaging material or the like as an effect that can be produced by a short distance observation, and can be used for a commercial signboard, a poster, an advertising tower, a guide signboard, and the like as an effect that can be produced by a long distance observation.

Specifically, when the continuously variable pattern portion 40 and the continuously variable pattern portion 44 are observed at different angles by the convex lens assembly 20, the pattern unit 31 is formed to face the auxiliary line x₀And an auxiliary line y₀While converging in the direction of the intersection point, form a three-dimensional wave pattern that is convex, creating a visual shifting effect into or out of the intersection point.

Similarly, when the continuously variable pattern part 41 and the continuously variable pattern part 45 are observed by changing the angle of the convex lens assembly 20, the pattern unit 31 is formed to face the auxiliary line x₀And an auxiliary line y₀Are gathered while forming a concave three-dimensional wave pattern that produces a visual shifting effect into and out of the intersection.

Specifically, the continuous deformed pattern portion 42 shown in fig. 17 forms the pattern unit 32 toward the auxiliary line x when viewed at a changed angle by the convex lens assembly 20_-3And an auxiliary line y₀The state where the three-dimensional wave patterns gathered in the direction of the cross point and formed as depressions are visible in the movement of the cross point, and more specifically, the continuously deformed pattern portion 43 is formed to be viewed from the pattern unit 32 toward the auxiliary line x when the angle is changed by the convex lens assembly 20₃And an auxiliary line y₀While creating the effect of a visible movement of the upwardly convex radial three-dimensional wave pattern into and out of the intersection. That is, the entire repeating pattern 30D has a pattern visual effect with a wavy uneven feeling.

The method of manufacturing the stereoscopic plate structure 1 will be described. First, the sheet material 10 is formed by a manufacturing method using a general molding technique using a material having the properties of the above-described material. In this case, a surface treatment method or a method of processing a base layer surface may be employed to form a rough surface on the surface of the plate material 10 on which the convex lens assembly 20 is formed. The base layer surface is formed from a material such as a synthetic resin by a coating method such as a dipping process, a brush coating process, a spray process, a roll bonding process, etc., and printing and other methods.

Next, the convex lens assembly 20 is formed on the surface of the plate material 10 using the material having the aforementioned properties. As a method of producing the convex lens assembly 20, the convex lens assembly 20 may be manufactured by a molding and printing method using a mold.

When the plate material 10 and the convex lens assembly 20 are formed of materials having the same property, the plate material 10 and the convex lens assembly 20 may be formed by, for example, molding technique.

In order to form the repetitive pattern 30 including the continuously deformed pattern portion 40, first, in order to form the repetitive pattern 30 in an arrangement form having an arrangement interval different from the arrangement interval of the image-convex lens assembly 20, a plurality of pattern units 31 are arranged by using, for example, a personal computer, image compilation software (Adobe Illustrator manufactured by Adobe system and Adobe photoshop manufactured by Adobe system), and the like, for example, a pattern format 35 shown in fig. 9 is formed. Then, the arrangement angle θ of the partial area or the entire area (corresponding to the pattern format 35) of the repetitive pattern 30 is changed by the image compilation software, that is, the arrangement interval D, in accordance with the arrangement shown in fig. 10. The repetitive pattern 30 including the continuous deformation pattern portion 40 formed in this manner is formed on the other surface of the plate material 10 on which the convex lens assembly 20 is not formed, that is, on the focal plane of the convex lens, and then the stereoscopic plate structure 1 can be obtained. Like the repetitive pattern including the continuous deformed pattern portion 41 shown in fig. 12, the repetitive pattern including the continuous deformed pattern portion 44 shown in fig. 15, the continuous deformed pattern portion 45 shown in fig. 16, the continuous deformed pattern portion 42 shown in fig. 17, and the repetitive pattern 30D may be formed by the same method.

With this invention, the continuous deformed pattern portion formed by deforming a part or all of the pattern can be relatively easily formed by the above-described method, and therefore the stereoscopic plate structure 1 can be easily formed.

Further, as long as any 3 pattern elements 31 are continuously formed in the arrangement direction of the continuously deformed pattern portions within the ranges of the expressions (1) and (2), the arrangement interval D and the arrangement angle θ of the pattern elements 31 are changed slowly or drastically, the pattern format of the continuously deformed pattern portions is not limited to several formats of the continuously deformed pattern portions 40 to 45.

The repetitive patterns 30, 30A to 30C in the stereoscopic plate structure 1 may include 1 continuous deformed pattern portion, or 2 or more continuous deformed pattern portions as shown in fig. 17. In this case, the 2 or more continuous deformation pattern portions may be the same continuous deformation pattern portion or may be different continuous deformation pattern portions. For example, the continuous variable pattern portion 41 may be formed by including a plurality of continuous variable pattern portions 40 alone, or 2 types may be included. If the repeating pattern includes a plurality of continuous deformed pattern portions, the continuous deformed pattern portions may be arranged arbitrarily.

Although the formation regions of the repetitive patterns 30, 30D and the continuous deformed pattern portions 40 to 45 in the stereoscopic plate structure are assumed to be square, the outline shapes of the regions in which the repetitive patterns and the continuous deformed pattern portions are formed are not limited, and examples thereof include polygonal shapes such as triangle, quadrangle, pentagon, and hexagon, circular shapes, oval shapes, heart shapes, star shapes, tear shapes, arrow shapes, streamline shapes, character shapes, and composite shapes including the above shapes.

The stereoscopic vision plate structure according to the present invention is a convex lens assembly including a plurality of convex lenses formed on one surface of a transparent plate material formed of one or more layers. The plate material does not necessarily have a repeating pattern of continuously deformed pattern portions on the focal plane of the convex lenses. For example, as described in claim 6 of the patent application, the convex lens assembly described in claim 1 is provided on one surface of the 1 st plate member, and the repetitive pattern described in any one of claims 1 to 5 is provided on the 2 nd plate member. The stereoscopic plate structure according to the present invention is also a stereoscopic plate structure in which the first plate material and the second plate material can be freely combined or integrated by laminating the focal plane of the convex lens on the 1 st plate material and the repetitive pattern contained in the 2 nd plate material to each other.

Specifically, as shown in fig. 18, the stereoscopic plate structure 2 has a convex lens assembly 20 on one surface of a 1 st plate member, has a repetitive pattern 30 on one surface of a 2 nd plate member, and is formed by integrating the other surface of the 1 st plate member 10, i.e., the focal plane of the convex lens, and the repetitive pattern 30 included in the 2 nd plate member, facing each other, and laminating the 1 st plate member 10 and the 2 nd plate member 11. The plate material 11 of the stereoscopic plate structure 2 may not have transparency, and may be made of paper, synthetic resin, or a coated film.

This superimposed body may be formed by attaching the other surface of the plate 10 and the 2 nd plate to each other, for example, without bonding or joining them, or may be formed by fixing the plate 10 and the plate 11 to each other by 2 fixing plates, or by fixing the plate 10 and the plate 11 to each other. In the stereoscopic plate structure 2 shown in fig. 18, the plate material 11 including the repetitive pattern 30 can be formed by forming the repetitive pattern 30 in the above-described manner and then forming the surface of the plate material 11.

Fig. 18 shows a composite body formed by stacking two plate materials 10 and 11, or a composite body may be formed by stacking three or more plate materials. For example, the 3 rd plate may be interposed between the plates 10 and 11, or the 3 rd plates may be stacked in the order of the plates 10 and 11. In a different case, the 3 rd plate material may serve as a support layer for the plate materials 10 and 11, and may also function as a focal distance layer for adjusting the focal distance.

Further, the stereoscopic plate structures 1 and 2 already have the repetitive patterns, but other patterns and images may be added to these repetitive patterns, and for example, as shown in fig. 19, an image 15 may be formed on the surface of the plate material 10 on which the convex lens assembly 20 is not formed, and the image 15 may be used as a background, and then the repetitive pattern 30 may be added to the image 15 to form the plate structure 3.

The stereoscopic plate structure 4 pertaining to the second aspect of the present invention will be described with reference to drawings. The stereoscopic vision sheet structure 4 shown in fig. 20 has a convex lens assembly 20 formed of a plurality of convex lenses 21 on one surface of a plate material 10, and a repetitive pattern 50 on the other surface of the plate material 10, as in the stereoscopic vision plate structure 1 of the first embodiment shown in fig. 1. The plate material 10 and the convex lens assembly 20 of the stereoscopic vision plate structure 4 of the second form are the same as the plate material 10 and the convex lens assembly 20 of the stereoscopic vision plate structure 1 of the first form. In the stereoscopic vision plate structure 4 of the second type, for example, the convex lens assemblies 20 are arranged in a honeycomb shape in which rectangular transparent crystal-forming sections shown in fig. 3 are arranged in a vertical and horizontal direction.

As shown in fig. 20, the repetitive pattern 50 on the stereoscopic vision plate structure 4 includes a line segment aggregate unit 60 adjacent to a plurality of line segments 65 arranged D at different arrangement intervals L from the arrangement of the convex lenses 21 on the convex lens assembly 20.

The outline shape of the region of the line segment aggregate portion 60 may be determined according to a desired pattern, for example, polygonal shapes such as triangle, quadrangle, pentagon, hexagon, etc., circle, ellipse, heart, star, tear, arrow, streamline, and character. Also included are composite shapes including the above shapes, and the like.

The line segments 65 constituting the line segment collecting section 60 are arranged in parallel at intervals different from the arrangement intervals L of the convex lenses 21 in the convex lens assembly 20, and thus, a line segment of a repetitive pattern can be formed. Such as straight lines, curved lines, and other line segments. The line segment 65 may be, for example, an extending direction of the line segment 65 passing through the convex lens 21 adjacent to the convex lens 21 constituting the convex lens assembly 20 and an extending line segment in the same direction. More specifically, for example, in the case where the convex lens assembly 20 is formed by being arranged as shown in fig. 2, the line segments 65a to 65c shown in fig. 21 extend in the same direction as the extending line segments. In the case of the convex lens assembly 20 formed by arranging in fig. 3, the extending direction of the line segments 65d to 65m shown in fig. 22, the extending line segment in the same direction, and the like are illustrated.

The line segment collecting unit 60 is formed by combining a plurality of such line segments and is arranged in parallel at an interval different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20. Here, the interval different from the convex lens 21 is, for example, a case where the interval of a plurality of adjacent line segments constituting the line segment collection unit 60 is shorter than the arrangement interval L by a certain distance, a case where the interval is longer than the arrangement interval L by a certain distance, a case where the interval is continuously lengthened or shortened slowly or rapidly, and a case where the interval is continuously lengthened or lengthened slowly or rapidly. The predetermined interval can be expressed by 1/n to n times the arrangement interval L of the convex lenses 21.

In the stereoscopic plate structure 4, the repeating pattern 50 has a star-shaped outline having a hexagonal basic shape as shown in fig. 23, for example, and is configured by arranging 4 line segment assemblies 60a, 60b, and 60c in a triangle obtained by dividing the star into 12. The three line segment assemblies 60a, 60b, and 60c are arranged in the order of the line segment assemblies 60a, 60b, and 60c in the clockwise direction, with the extending direction of the line segments constituting the line segment assemblies 60a to 60c being different from the extending direction of the line segments constituting the 2 line segment assemblies connected adjacent to each other. The line segments 65 constituting the line segment aggregate units 60a, 60b, and 60c extend in the same direction as the extending direction of the line segments 65j, 65d, and 65f shown in fig. 22, and the distances between the adjacent line segments 65 constituting the line segment aggregate units 60a, 60b, and 60c are set at intervals different from the arrangement interval L of the convex lenses 21 constituting the convex lens assembly 20. Each of the 3 line segment collecting sections 60a, 60b, and 60c is formed by arranging a plurality of line segments 65 in parallel at a distance different from the arrangement interval L.

The stereoscopic vision plate structure 4 is formed with a repetitive pattern 50 on the opposite side of the convex lens assembly 20 of the plate material 10, that is, on the focal plane of the convex lenses, as in the stereoscopic vision plate structure 1.

The principle of moving and displacing the three-dimensional wave pattern including the repeated pattern 50 of the line segment aggregate unit 60 is observed in the stereoscopic plate structure 4 by changing the observation angle regardless of the distance of the visual range, and will be described below.

When the 3 line segment assemblies 60a, 60b, and 60c included in the repetitive pattern 50 are observed by changing the angle of the convex lens assembly 20, the line segments constituting the line segment assemblies 60a, 60b, and 60c move in parallel, and therefore, the movement displacement of the line segment assemblies 60a, 60b, and 60c can be seen. Specifically, when the repetitive pattern shown in fig. 23 is observed by moving the line of sight in the horizontal direction by the convex lens assembly 20, the line segment set portion 60a that keeps the extending direction of the line segments constituting the line segment set and the moving direction of the line of sight in agreement is actually moved in the displacement, but since the displacement direction and the moving direction of the line of sight are in agreement, the line segment set portion 60a is not visually moved, but both the line segments 60b and 60c that do not in agreement have the extending direction of the line segments constituting the line segment set and the moving direction of the line of sight are moved in the displacement. In this way, since some of the repetitive pattern 50 (the line segment collection unit 60a) is not visually changed but other parts (the line segment collection units 60b and 60c) are visually changed, the moving three-dimensional repetitive pattern 50 appears when the repetitive pattern 50 is viewed by moving the line of sight in the horizontal direction through the convex lens assembly 20.

Since the plurality of line segment assemblies 60a, 60b, and 60c are arranged on the repetitive pattern 50 so that the extending direction of the line segments constituting the line segment assembly and the extending direction of the line segments constituting the 2 adjacent line segment assemblies are different from each other, the three-dimensional movement effect of the repetitive pattern 50 can be more clearly displayed according to the variation in the line segment assemblies when the angle is changed. Therefore, according to the stereoscopic vision plate structure 4 of the type 2 pertaining to the present invention, when the repetitive pattern 50 is observed through the convex lens assembly 20, the three-dimensional moire pattern can be clearly seen by changing the observation angle even if the distance is relatively long, and the three-dimensional moire pattern can be more clearly shown as in the case where the above-described three-dimensional moire pattern includes a plurality of line segment sets.

Therefore, the stereoscopic sheet structure 4 is suitable for use in, for example, a packaging box or the like when viewed in a short distance. And is suitable for commercial signboard, poster, advertising tower, guide signboard, etc. under the condition of remote observation.

Specifically, when the convex lens assembly 20 moves the line of sight along the horizontal line and is observed on the repeating pattern 50, the line segment collecting portion 60a is stationary, and the line segment collecting portions 60b and 60c flow toward the outside or the inside of the repeating pattern 50. When the line of sight is moved in a direction not coinciding with the extending direction of all the line segments constituting the line segment assemblies 60a to 60c, all the line segment assemblies 60a to 60c flow toward the outside or the inside of the repetitive pattern 50.

Basically, the stereoscopic plate structure 4 can be basically manufactured by the stereoscopic plate structures 1 to 3 of the first embodiment. The repetitive pattern 50 including the line segment assembling portion 60 can be used to create a desired image by using the image compiling software on a computer, for example, as in the repetitive pattern 30.

In the stereoscopic vision plate structure 4 of the second style, the repetitive pattern 50 is not limited to a star-shaped pattern including only the three patterns 60a to 60 c. For example, at least one set of line segments in the repeating pattern 50 may be sufficient. Further, as shown in fig. 24, the intervals between adjacent line segments of the plurality of line segments constituting the line segment set may be continuously shortened or not, or continuously lengthened or continuously shortened to be lengthened. In such a case, the three-dimensional moire pattern may exhibit a continuous or step-free variation. Also, other patterns or images may be added between the line segments that make up the line segment set.

In the stereoscopic plate structure 4, similarly to the stereoscopic plate structure 1 of the first embodiment, the plate material 10 and the plate material 11 may be superimposed on each other or 3 or more plate materials may be superimposed on each other to form a superimposed body, like the stereoscopic plate structure 2 shown in fig. 18. Similarly, as in the stereoscopic plate structure 3 shown in fig. 19, other patterns or images 15 may be formed on the stereoscopic plate structure 4 in addition to the repetitive pattern 50.

A stereoscopic plate structure 5 according to a third aspect of the present invention will be described with reference to the drawings. In the stereoscopic vision plate structure 5 shown in fig. 25, the convex lens assembly 20 is formed by the plurality of convex lenses 21 on one surface of the plate material 10, and the repetitive pattern 70 is provided on the other surface of the plate material, as in the stereoscopic vision plate structure 1 shown in fig. 1. The plate material 10 and the convex lens assembly 20 of the stereoscopic vision plate structure 5 of the third embodiment are the same as the plate material 10 and the convex lens assembly 20 of the stereoscopic vision plate structure 1 of the first embodiment. In the stereoscopic vision plate structure 5 of the third embodiment, for example, the convex lens assemblies 20 are arranged in a square shape in which regular quadrangle-shaped partitions shown in fig. 3 are arranged in a vertical and horizontal direction.

As shown in fig. 25, the repetitive pattern 70 on the stereoscopic plate structure 5 is formed by dividing the pattern unit 31 into equal distances in the arrangement direction of the pattern units 31 in a pattern format including a plurality of pattern units 31 arranged at arrangement intervals D different from the arrangement intervals L of the convex lenses 21 on the convex lens assembly 20. Further, the pattern elements 31 constituting the same number of the pattern elements 31 are arranged in at least one direction of the arrangement direction, and the pattern elements 31 constituting at least one other section adjacent to the pattern elements in the direction of the section are arranged at the arrangement interval D different from each other in the arrangement interval, and include the continuously deformed pattern portion formed by deformation as in the case of including a plurality of pattern elements 31 arranged along the one direction. In other words, the repetitive pattern 70 is formed by arranging the plurality of pattern units 31 at the arrangement interval D different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20 (a), and (B) includes the continuous deformed pattern portion formed by arranging the pattern units 31 in such a manner that the arrangement interval in at least one direction along the arrangement direction is different from the arrangement interval in the one direction in the pattern units 31 in at least one section adjacent to the one direction along the one section in the pattern units 31 in the one section, in which the sections including the same number of pattern units 31 are continuously divided and formed along the arrangement direction of the pattern units 31. Examples of the repetitive pattern 70 in the stereoscopic vision plate structure 5 will be described with reference to fig. 26 to 31. In addition, the repeating pattern shown in fig. 26 is not a repeating pattern of this invention, and only a reference for explaining a repeating pattern of this invention is made.

The repetitive pattern including the continuous deformation pattern portion 46 shown in fig. 27 is an example of the repetitive pattern 70 in the third-style stereoscopic plate structure 5. The continuous deformed pattern portion 46 is formed by dividing a plurality of pattern units 31, which are formed by arranging the circular pattern units 31 at the arrangement intervals D different from the arrangement intervals L of the convex lenses 21 in the convex lens assembly 20, into a grid shape having an equal distance in the longitudinal and transverse arrangement directions of the pattern units 31, as shown in fig. 27. The sections including the same number of pattern units 31, the sections formed in the longitudinal and transverse directions of the pattern units 31, the arrangement interval D including the interval different from the interval arranged in the longitudinal and transverse directions in the pattern units 31 in at least one other section adjacent to the longitudinal and transverse directions of the section, and the section formed by the deformation of the pattern format 38 shown in fig. 26 are formed similarly to the case of the pattern units 31 including the plurality of pattern units arranged in the longitudinal and transverse directions. That is, as illustrated in fig. 26, the continuous deformed pattern portion 46 is formed by arranging the unit patterns in an arrangement format similar to that of the convex lens assembly 20.

Specifically, the pattern format 38 is not limited to the one shown in fig. 26 in which a plurality of circular pattern units are arranged in an arrangement format different from the arrangement interval of the lenticular lens assembly 20. That is, the pattern format 38 is similar to the convex lens assembly 20, for example, the arrangement interval of the pattern format 38 may be smaller or larger than the arrangement interval L of the convex lens assembly 20, and the arrangement direction thereof may or may not coincide with the arrangement direction of the convex lens assembly 20. For example, when the convex lens assembly 20 is formed in the arrangement shown in fig. 2 to 8, the pattern is formed in the arrangement shown in fig. 2 to 8 having the arrangement interval D different from the arrangement interval L in the arrangement shown in fig. 2 to 8. The pattern elements constituting the pattern format 38 are the same as those of the stereoscopic plate structure 1 of the first style. Since the convex lens assembly 20 (lens body forming section 22) in the stereoscopic vision plate structure 5 of the third pattern is formed in the square array of fig. 3, the pattern format 38 is formed by a plurality of circular pattern units 31 in the square array as shown in fig. 26. In addition, an auxiliary line X shown in FIG. 26₀～X₇And Y₀～Y₇The lines are not the entities constituting the pattern format 38, but are merely auxiliary lines for explaining the state when the pattern format 38 is changed.

As shown in fig. 26, the pattern format 38 is formed by dividing the pattern elements 31 at equal intervals in the longitudinal and lateral arrangement directions, and forms a plurality of lattice-shaped sections including a plurality of the same number of pattern elements. The lattice-shaped sections formed by the pattern format 38 are based on the auxiliary lines X that are equidistant from the pattern format 38₀～X₇And Y₀～Y₇Each divided into 7 zones in longitudinal and transverse directionsThe scribes contain 49 pattern elements 31.

The continuous deformation pattern portion 46 is formed by deforming the pattern format 38 in which, for example, 49 sections are formed, in the above-described manner. In other words, the continuous deformation pattern portion 46 is formed by arranging a plurality of pattern units 31 at an arrangement interval D that is different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20 (a), (B) arranging the pattern units 31 in a case where, in a section containing the same number of pattern units 31 and divided continuously in a grid-like manner in the longitudinal and transverse arrangement directions of the pattern units 31, one arrangement interval along the longitudinal and transverse arrangement directions of the pattern units 31 in 1 section is different from the arrangement interval along the arrangement direction of the pattern units 31 in a section adjacent to the arrangement direction of that section.

Specifically, the continuous deformation pattern portion 46 has continuity with the extending direction of the auxiliary line y (hereinafter referred to as the auxiliary line y direction, the lateral arrangement direction of the continuous deformation pattern portion 46 in fig. 27) as shown in fig. 27, for example, in order to form a continuous shape along the auxiliary section D₁₁～D₇₁Arrangement interval d in the y direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₇₁Unlike the arrangement interval D of the pattern units 31 adjacent to and connected to the auxiliary line y, more specifically, to form the section D₁₁～D₇₁Arrangement interval d of pattern units 31 contained in each₁₁～d₇₁Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the stages or non-stages to form a section D₄₁In the case of central symmetry, the pattern format 38 is deformed in the direction of the auxiliary line y to form an array of a plurality of pattern units 31. That is, in the section D₁₁～D₇₁Arrangement interval d of upper pattern unit₁₁～d₇₁Having a meaning of "d₁₁＝d₇₁＜d₂₁＝d₆₁＜d₃₁＝d₅₁＜d₄₁"in the same section adjacent to the auxiliary line y direction, the arrangement intervals in the above-mentioned directions are different. In addition, the figuresAuxiliary line X shown on 27₀～X₇And Y₀～Y₇Are respectively associated with the auxiliary lines X on the pattern format 38₀～X₇And Y₀～Y₇Correspondingly, the auxiliary lines describing the deformed state of the sections are not the entities constituting the continuous deformed pattern portion 46.

The continuous deformation pattern 46 is continuous with the extending direction of the auxiliary line X (hereinafter referred to as the auxiliary line X direction, the longitudinal arrangement direction of the continuous deformation pattern 46 in fig. 27), for example, so as to be formed along the section D₁₁～D₁₇Arrangement interval d in the x direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₁₇And a region D having continuity with the auxiliary line y direction₁₁～D₇₁The arrangement interval D different from the pattern unit 31 in the other section adjacent to and connected to the auxiliary line x direction is formed at the same ratio, more specifically, the section D having continuity with the auxiliary line y direction is used₁₁～D₇₁At the same ratio, to form a section D₁₁～D₁₇At an arrangement interval d of₁₁～d₁₇Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the stages or non-stages to form a section D₁₄In the case of central symmetry, the pattern format 38 is deformed in the direction of the auxiliary line x to form an array of a plurality of pattern units 31. That is, in the section D₁₁～D₁₇Arrangement interval d of upper pattern unit₁₁～d₁₇Having a meaning of "d₁₁＝d₁₇＜d₁₂＝d₁₆＜d₁₃＝d₁₅＜d₁₄"the arrangement intervals are different in the same section adjacent to and connected to the auxiliary line x direction. In addition, the interval D between the sections formed by continuously deforming the pattern portion 46 is D₁₁＝d₇₁＝d₁₇、d₂₁＝d₆₁＝d₁₂＝d₁₆、d₃₁＝d₅₁＝d₁₃＝d₁₅、d₄₁＝d₁₄The relationship (2) of (c).

In addition, although the section D is already provided₁₁～D₇₁And a section D₁₁～D₁₇For example, the continuous deformation pattern portion 46 has been described, but as shown in fig. 27, all of the connection regions along the auxiliary line y direction and the connection regions along the auxiliary line x direction have the sum region D₁₁～D₇₁And a section D₁₁～D₁₇In the same modification, the pattern units 31 are arranged in the same manner.

As will be described later, since the continuously deformed pattern portion 46 is similarly deformed in the direction of the auxiliary line x and the direction of the auxiliary line y, and the pattern units 31 are similarly arranged, the pattern format 38 has a square outline, the density of the pattern units 31 on the outside is high, the density of the pattern units 31 becomes low as the pattern units are located inside, and the section D located at 4 corners₁₁、D₁₇、D₇₁And D₇₇The density of the pattern elements 31 in (2) is the maximum, the density of the pattern elements 31 of the central section D44 is the minimum, and the sections arranged along the diagonal lines of the continuous deformed pattern portion 46 have similar shapes.

As an example of the continuous deformation pattern portion 46, as shown in fig. 26 and 27, when the arrangement interval d is continuously or discontinuously changed in a stepwise or non-stepwise manner, the size of the arrangement interval d can be arbitrarily set.

As shown in fig. 26, the continuously deformed pattern portion 46 is formed by deforming the pattern 38 in such a manner that 49 sections, which are 7 or more divided by equally dividing the pattern cells 31 in each longitudinal and transverse arrangement direction, are formed in the pattern 38, that a section formed along the longitudinal and transverse arrangement direction of the pattern cell 31 and an arrangement interval different from the longitudinal and transverse arrangement interval of the pattern cell 31 in another section adjacent to the section are formed in the longitudinal and transverse arrangement direction as if a plurality of pattern cells 31 were arranged in the longitudinal and transverse arrangement direction. However, the sections forming the pattern format 38 are not limited to 49 sections, and may be set in any number.

In the continuously deformed pattern portion 46 shown in fig. 27, when the arrangement intervals D of the sections D are different at the same ratio in the auxiliary line x direction and the auxiliary line y direction, the pattern format 38 is deformed in the auxiliary line x direction and the auxiliary line y direction, and then the plurality of pattern units 31 are arranged. However, when the arrangement intervals D of the sections D are different at different ratios in the auxiliary line x direction and the auxiliary line y direction, the pattern format 38 may be deformed in the auxiliary line x direction and the auxiliary line y direction, and then a plurality of pattern units 31 may be arranged.

In the continuous deformation pattern portion 46 shown in fig. 27, the arrangement intervals D of the sections D are continuously or discontinuously formed, and the sections D are formed so that the sections D become successively smaller after the successive increase of the stages or non-stages₄₁And D₁₄In the case of center symmetry, the pattern format 38 is deformed in the auxiliary line x direction and the auxiliary line y direction to form an array of a plurality of pattern units 31. However, the three-dimensional plate structure 5 of the third pattern is not limited to the above-described modification and arrangement method. For example, the pattern format 38 may be modified in the auxiliary line x direction and the auxiliary line y direction so that the arrangement interval d of the sections adjacent to the auxiliary line x direction and the auxiliary line y direction may be continuous or discontinuous, may be sequentially increased in stages or may be continuously or discontinuously decreased, and may be sequentially increased in stages or may be decreased in stages or may be continuously or steplessly, or may be arranged in a plurality of pattern units 31.

The repeating pattern 70 may be all the continuous deformation pattern portions 46, or may be one or a plurality of continuous deformation pattern portions 46 in a part thereof.

A repetitive pattern (not shown) including the continuous deformation pattern portion 47 shown in fig. 28 is an example of the repetitive pattern 70. As shown in fig. 28, the continuous deformed pattern portion 47 is formed by dividing the circular pattern unit 31 into a plurality of pattern units 31 at equal intervals in a lattice shape in the longitudinal and transverse directions of the pattern units 31 in a pattern format including a plurality of pattern units 31 arranged at arrangement intervals D different from the arrangement intervals L of the convex lenses 21 in the convex lens assembly 20. A plurality of sections including the same number of pattern elements 31 are formed, and a section formed along the longitudinal direction of the pattern elements 31 is arranged at intervals different from the longitudinal and lateral arrangement intervals of the pattern elements 31 in other sections adjacent to and connected to the section, and a continuous deformed pattern section 47 is formed after only the longitudinal direction of the pattern 38 is deformed so that the plurality of pattern elements 31 arranged in the longitudinal direction can be formed. That is, as shown in fig. 28, the continuous deformed pattern portion 47 is formed by deformation only in the vertical arrangement direction of fig. 38, unlike the continuous deformed pattern portion 46 formed by deformation in each of the vertical and horizontal arrangement directions of the pattern units 31.

The continuous deformed pattern portion 47 is formed by deforming the pattern 38 formed by the 49 divisions in this way. In other words, the continuous deformed pattern portion 47 is formed by arranging the plurality of pattern units 31 in such a manner that (a) the plurality of pattern units 31 are arranged at the arrangement interval D different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20, and (B) the pattern units 31 are arranged in a manner that (a) the pattern units 31 are continuously divided into a plurality of sections containing the same number of sections in the vertical and horizontal arrangement direction of the pattern units 31 in a lattice shape, and that (B) the arrangement interval in the vertical arrangement direction of the pattern units 31 in the section adjacent to the vertical arrangement direction of the section is different from the arrangement interval in the vertical arrangement direction of the pattern units 31 in 1 section.

Specifically, the continuous deformation pattern portion 47 is continuous with the extending direction of the auxiliary line x as shown in fig. 28, for example, so as to form a continuous deformation pattern portion along the section D₁₁～D₁₇Arrangement interval d in the x direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₁₇Unlike the arrangement interval D of the pattern units 31 adjacent to and connected to the auxiliary line x direction, more specifically, to form the section D₁₁～D₁₇Is arranged at an interval d₁₁～d₁₇Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the number of stages or non-stages, and forming the regionsScribe D₁₄In the case of central symmetry, the flower pattern 38 is deformed in the direction of the auxiliary line x to form an array of a plurality of pattern elements 31. That is, in the section D₁₁～D₁₇Arrangement interval d of upper pattern unit₁₁～d₁₇Having a meaning of "d₁₁＝d₁₇＜d₁₂＝d₁₆＜d₁₃＝d₁₅＜d₁₄"the arrangement intervals are different in the same section adjacent to the auxiliary line x direction. In addition, an auxiliary line x shown on fig. 28₀～x₁₀And y₀～y₁₀The continuous deformation pattern portion 47 is not a solid body as in the auxiliary line in fig. 27.

The continuous deformation pattern portion 47 has been described by taking the sections D11 to D17 as an example. However, as shown in fig. 28, all the continuous sections along the auxiliary line x are deformed in this manner. The arrangement interval D in the auxiliary line y direction of the pattern units 31 in the continuous sections along the auxiliary line y direction is fixed in all the sections, and may be smaller or larger than this arrangement interval, as in the case of the pattern format 38.

The continuous deformed pattern portion 47 is deformed only in the direction of the auxiliary line x and then the pattern units 31 are arranged, as described below, so that a rectangular outline shape different from the outline shape of fig. 38 is formed. The density of the outer pattern elements 31 in the x direction of the auxiliary line is relatively large, and the density of the pattern elements 31 gradually decreases toward the inner direction. As shown in fig. 28, in order to form a contour shape slightly similar to the contour shape of the pattern format 38, the continuously deformed pattern portion 47 forms a section D in the x direction of the connection auxiliary line₇₁～D₇₇Section D connected in the y-direction of the auxiliary line₈₁～D₈₇Division D₉₁～D₉₇And a section D₁₀₁～D₁₀₇Each of the sections (2).

The sections formed by the pattern format 38 in the continuous deformed pattern portion 47 are not limited to 49 sections. The arrangement interval D of the deformation may be arbitrarily set, and in the case where the arrangement interval D of the sections D connected to the auxiliary line x direction is continuously or discontinuously, sequentially becomes larger or smaller in stages or non-stages, and is continuously or discontinuously, and the arrangement interval D of the sections D connected to the auxiliary line x direction is gradually or non-stages larger and smaller, the pattern format 38 may be deformed in the auxiliary line x direction, and the repeating pattern 70 may be a continuously deformed pattern portion as a whole, or may be a continuously deformed pattern portion 47 which is partially one or plural, as in the continuously deformed pattern portion.

The repeating pattern 70B (not shown) including the continuous deformation pattern portion 48 shown in fig. 29 is also an example of the repeating pattern 70 on the continuous deformation pattern portion 48, and is similar to that shown in fig. 29 in the longitudinal direction along the pattern unit 31

The arrangement interval D of the pattern elements 31 in the section formed in the arrangement direction is different from the continuously deformed pattern portion 47 in that only the longitudinal arrangement direction of the pattern format 38 is deformed so that the pattern elements can be formed continuously or discontinuously, and that the pattern elements are sequentially reduced in stages or non-stages and then sequentially increased in size. Specifically, the continuous deformation pattern portion 48 is continuous with the extending direction of the auxiliary line x as shown in fig. 29, for example, so as to form a continuous deformation pattern portion along the section D₁₁～D₁₇Arrangement interval d in the x direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₁₇Unlike the arrangement interval D of the pattern units 31 adjacent to and connected to the auxiliary line x direction, more specifically, to form the section D₁₁～D₁₇Is arranged at an interval d₁₁～d₁₇Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the stages or non-stages to form a section D₁₄In the case of center symmetry, the pattern format 38 is deformed in the direction of the auxiliary line x to form an array of a plurality of pattern units 31. That is, in the section D₁₁～D₁₇Arrangement interval d of upper pattern unit₁₁～d₁₇Having a meaning of "d₁₁＝d₁₇＞d₁₂＝d₁₆＞d₁₃＝d₁₅＞d₁₄"the arrangement intervals are different in the same section adjacent to the auxiliary line x direction. In addition, an auxiliary line X shown on fig. 29₀～X₅And Y₀～Y₇The continuous deformation pattern portion 48 is not a solid body as in the auxiliary line in fig. 27.

The continuous deformation pattern section 48 has been described by taking the sections D11 to D17 as an example. However, as shown in fig. 29, all the continuous sections along the auxiliary line x are deformed in this manner. The arrangement interval d in the direction of the auxiliary line y of the pattern unit 31 in the section along the direction connecting the auxiliary line y is fixed in all the sections, and may be smaller or larger than this arrangement interval, as in the case of the pattern format 38.

The continuous deformed pattern portion 48 is deformed only in the direction of the auxiliary line x and then the pattern units 31 are arranged, as described below, so that a rectangular outline shape different from the outline shape of the pattern format 38 is formed. The density of the outer pattern elements 31 in the x direction of the auxiliary line is relatively small, and the density of the pattern elements 31 gradually increases toward the inner direction. As shown in fig. 29, the continuously deformed pattern portion 48 is connected to the section D in the x direction of the auxiliary line in order to form a contour shape slightly similar to the contour shape of the pattern format 38₅₁～D₅₇Connected and existing section D₆₁～D₆₇And a section D₇₁～D₇₇Will be eliminated.

In the continuously deformed pattern portion 48, the sections formed by the pattern format 38 are not limited to 49 sections. The arrangement interval d of the deformation may be arbitrarily set, and when the sections d connected to the auxiliary line x direction are continuously or discontinuously, and are sequentially increased or sequentially decreased in stages or without stages and are continuously or discontinuously, and the sections d are gradually increased or decreased in stages or without stages, the pattern format 38 may be deformed in the auxiliary line x direction, and the repetitive pattern 70B may be all the continuously deformed pattern portions 48, and one or a plurality of continuously deformed pattern portions 48 may be provided in part, as in the continuously deformed pattern portion 46.

As described above, in the continuously deformed pattern portion 47 and the continuously deformed pattern portion 48, since the arrangement intervals d of the pattern units 31 in the sections formed along the longitudinal arrangement direction of the pattern units 31 (the direction of the auxiliary line x) are in an opposite relationship to each other, only the longitudinal arrangement direction of the pattern format 38 is deformed, and therefore, when the repeated pattern 70A and the repeated pattern 70B each include one continuously deformed pattern portion 47 and one continuously deformed pattern portion 48, the repeated pattern 70A and the repeated pattern 70B form different patterns, but when the repeated pattern 70A and the repeated pattern 70B each include a plurality of continuously deformed pattern portions 47 and a plurality of continuously deformed pattern portions 48, the repeated pattern 70A and the repeated pattern 70B form the same repeated pattern.

A repetitive pattern 70C (not shown) including the continuous deformation pattern portion 49 shown in fig. 30 is also an example of the repetitive pattern 70. The continuously deformed pattern portion 49 is different from the continuously deformed pattern portion 46 in that the pattern format 38 is deformed in the auxiliary line x direction and the auxiliary line y direction and then a plurality of pattern units 31 are arranged so that the arrangement interval d of the pattern units 31 in the section connected to the auxiliary line x direction and the auxiliary line y direction shown in fig. 30 is sequentially smaller and then sequentially larger in stages or non-stages so as to be continuous or discontinuous. That is, in the continuous deformed pattern portion 49, the deformation method of the auxiliary lines x direction and the auxiliary lines y direction in the pattern format 38 and the arrangement interval of the pattern units 31 and the deformation method and the arrangement interval of the continuous deformed pattern portion 46 are reversed. Specifically, the continuous deformation pattern portion 49 is continuous with the auxiliary line y direction as shown in fig. 30, and is formed along the auxiliary section D, for example₁₁～D₇₁Arrangement interval d in the y direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₇₁To form a section along the section D₁₁～D₇₁Arrangement interval d of pattern units 31 contained in each₁₁～d₇₁Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the stages or non-stages to form a section D₄₁Symmetrical about the center, and continuous with the auxiliary line X direction, e.g. to form a line along the section D₁₁～D₁₇Arrangement interval d in the x direction of the auxiliary lines of the pattern units 31 included in each₁₁～d₁₇Continuously or discontinuously, and sequentially increasing and then sequentially decreasing the stages or non-stages to form a section D₁₄In the case of central symmetry, the pattern format 38 is deformed in the direction of the auxiliary line y to form an array of a plurality of pattern units 31. Therefore, in the section D₁₁～D₇₁Arrangement interval d of upper pattern unit₁₁～d₇₁Having a meaning of "d₁₁＝d₇₁＞d₂₁＝d₆₁＞d₃₁＝d₅₁＞d₄₁"the arrangement interval in the above-mentioned direction is different in the same section adjacent to and connected to the auxiliary line y direction. In the section D₁₁～D₁₇Arrangement interval d of upper unit pattern₁₁～d₁₇Having a meaning of "d₁₁＝d₁₇＞d₁₂＝d₁₆＞d₁₃＝d₁₅＞d₁₄"the arrangement intervals are different in the same section adjacent to and connected to the auxiliary line x direction. The interval d between the sections formed by continuously deforming the pattern portion 49 is d₁₁＝d₇₁＝d₁₇、d₂₁＝d₆₁＝d₁₂＝d₁₆、d₃₁＝d₅₁＝d₁₃＝d₁₅、d₄₁＝d₁₄The relationship (2) of (c). Further, fig. 30 shows an auxiliary line x₀～x₇And an auxiliary line y₀～y₇Like the auxiliary lines in fig. 27, the continuous deformation pattern portion 49 is not a solid body.

The continuous deformation pattern section 49 is similarly deformed in the auxiliary line x direction and the auxiliary line y direction as described below, and the pattern units 31 are similarly arranged, so that the pattern format 38 has the pattern units 31 arranged thereinThe square outline has a low density of the pattern cells 31 at the outer part and a high density of the pattern cells 31 at the inner part, and is located in the 4-corner section D₁₁、D₁₇、D₇₁And D₇₇The cell of (1) is the smallest density, and the central section D₄₄The cell of (1) has the maximum density, and the sections arranged along the diagonal line of the continuous deformed pattern portion 49 have similar shapes.

In the continuous deformation pattern portion 49, the sections formed by the pattern format 38 are not limited to 49 sections. The arrangement interval D of the deformation may be arbitrarily set, and when the arrangement intervals D in the sections D are different from each other because of the different ratios to the auxiliary line x direction and the auxiliary line y direction, the pattern format 38 may be deformed. In the case where the arrangement interval d in the sections where the auxiliary lines x and y are connected is continuous or discontinuous, and is sequentially increased in stages or not, or sequentially decreased and continuous or discontinuous, and is increased in stages or not, the pattern format 38 may be deformed in the auxiliary lines x and y directions, and the repetitive pattern 70C may be a continuous deformed pattern portion 49 in its entirety, and one or a plurality of continuous deformed patterns 49 may be partially formed in the same manner as the continuous deformed pattern portion 46.

As described above, in the continuously deformed pattern portion 46 and the continuously deformed pattern portion 49, since the arrangement intervals d of the cell pattern 1 in the sections formed along the longitudinal arrangement direction of the cell pattern 1 (the auxiliary line x direction and the auxiliary line y direction) are in an opposite relationship with each other, the longitudinal and transverse arrangement directions of the pattern format 38 are deformed, and therefore, when the repeated pattern 70 and the repeated pattern 70C each include one continuously deformed pattern portion 46 and one continuously deformed pattern portion 49, the repeated pattern 70 and the repeated pattern 70C form different patterns, but when the repeated pattern 70 and the repeated pattern 70C each include a plurality of continuously deformed pattern portions 46 and a plurality of continuously deformed pattern portions 49, the repeated pattern 70 and the repeated pattern 70C form the same repeated pattern.

All of the continuously variable pattern portions 46 to 49 are formed by dividing the pattern format 38 at equal intervals in each arrangement direction of the pattern units 31 constituting that pattern format 38 to form a plurality of sections including the same number of pattern units 31, but the sections formed by the pattern format 38 do not need to be divided at equal intervals in each arrangement direction of the pattern units 31. For example, the division may be performed at random in each arrangement direction, at different distances in each arrangement direction, at equal distances, or at random.

The pattern format 38 may include pattern elements 31 of the same shape, or may include pattern elements 31 of a plurality of different shapes.

All of the continuously variable pattern portions 46 to 49 are formed by dividing the pattern units 31 constituting the pattern format 38 at equal intervals in the respective arrangement directions. A plurality of sections including the same number of pattern units 31 are formed, and the pattern is deformed when a plurality of pattern units formed along the 1 direction are included in sections formed along at least 1 direction among the arrangement directions at arrangement intervals different from arrangement intervals in the 1 direction in pattern units in other sections adjacent to and connected to the one direction of the section. Here, the auxiliary lines forming the above-described sections may be, for example, extended lines of 2 lines orthogonal to each other. As shown in fig. 26 to 30, the length of the formed section (the distance between the 2 auxiliary lines extending in the same direction as the formed section) may be set as the arrangement interval of the pattern units 31. Therefore, all of the continuous deformed pattern portions 46 to 49 are formed by dividing the pattern units 31 into 2 directions orthogonal to each other at equal distances in the plurality of pattern units 31 including the arrangement intervals d different from the arrangement intervals L of the convex lenses 21 constituting the convex lens assembly 20. When a plurality of sections D including the same number of pattern units 31 are formed and the section D formed along at least 1 of the 2 orthogonal directions is formed to have a length different from the length of the section in the 1 direction in at least 1 other section adjacent to and connected to the at least 1 direction of the section, it can be said that the section D is formed by deforming the pattern format 38. Here, the "2 directions orthogonal to each other" can be referred to as follows.

A repetitive pattern 70D (not shown) including the continuous deformation pattern portion 46 shown in fig. 31 is another example of the repetitive pattern 70. A portion of a repeating pattern 70 is shown in fig. 31. The repeating pattern 70D includes a plurality of the continuous deformation pattern portions 46 arranged continuously in the longitudinal direction and the transverse direction.

The repeating pattern 70D includes only the same plurality of continuous deformed pattern portions 46. However, the repeating pattern may be formed of different continuous deformed pattern portions, for example, at least 2 kinds of deformed patterns selected from the group consisting of the continuous deformed pattern portions 46 to 49 may be formed in a fixed arrangement, or may be formed in a random arrangement.

Another pattern of the repetitive pattern 70 on the stereoscopic plate structure 5 is formed by dividing the pattern unit 31 into two or more patterns at equal intervals in 2 directions orthogonal to each other, the pattern unit including a plurality of pattern units 31 arranged at an arrangement interval d different from the arrangement interval L of the convex lenses 21 constituting the convex lens assembly 20. A plurality of sections D including the same number of pattern units 31 are formed, and when the sections D formed along at least 1 of the 2 orthogonal directions are formed to have lengths different from the lengths of the sections in the 1 direction in at least 1 other section adjacent to and connected to the at least 1 direction of the section, the sections D include a continuously deformed pattern portion formed by deforming the pattern. Here, the "2 directions orthogonal to each other" refers to a straight line extending in a direction passing through a certain pattern unit 31 and another pattern unit 31 existing around the certain pattern unit 31 (regardless of a distance between the certain pattern unit 31 and another certain pattern unit 31) and a straight line orthogonal to the straight line.

In other words, another pattern of the repetitive pattern 70 is a continuous deformed pattern portion formed by arranging a plurality of pattern units 31(a) at an arrangement interval d different from the arrangement interval L of the convex lenses 21 constituting the convex lens assembly 20, and (B) when the length of the 1-direction segment of the 1 segment is different from the length of the 1-direction segment of the at least 1 segment adjacent to and connected to the 1-direction segment in the 2 directions orthogonal to each other, that is, at least 1 direction of the vertical and horizontal directions in fig. 32, that is, the segments including the same number of pattern units 31. Examples of other patterns of the repetitive pattern 70 in the stereoscopic plate material structure 5 will be described with reference to fig. 32 to 37.

The repetitive pattern 70E including the continuous deformation pattern portion 46A shown in fig. 33 is another example of the repetitive pattern 70 in the stereoscopic plate structure 5 of the third pattern. As shown in fig. 33, in the continuously deformed pattern 46A, in the pattern including the plurality of pattern units 31 formed, the circular pattern units 31 are divided into a plurality of sections D including the same number of pattern units 31 by equal distances in a grid-like manner in 2 directions orthogonal to each other at the arrangement interval D different from the arrangement interval L of the convex lenses 21 constituting the convex lens assembly 20, and the sections D formed along at least 1 of the 2 directions orthogonal to each other are formed to have lengths different from the lengths of the sections in the 1 direction in at least 1 other section adjacent to the at least 1 direction of the section, the pattern is deformed. That is, the continuous deformed pattern portion 46A is formed by deforming the pattern unit 31 in the pattern format 39 arranged in the same arrangement as the convex lens combination 20, as shown in fig. 33.

The pattern format 39 is similar to the pattern format 38 in the arrangement similar to the arrangement of the convex lens assembly 20, as shown in FIG. 32, and specifically, is a pattern in which a plurality of convex lens assemblies 20 are arranged at different arrangement intervals L from the arrangement intervals L of the convex lens assemblies 20The circular pattern units 31 are arranged. More specifically, in another pattern of the repetitive pattern 70, the convex lens assembly 20 (lens body formation section 22) is formed in a square array rotated by 45 degrees as shown in fig. 4 on the right, and therefore, as shown in fig. 32, the plurality of circular pattern units 31 are formed in a square array rotated by 45 degrees. That is, the pattern format 39 is the same as the pattern format 38 except that the pattern format 38 in which the pattern units 31 are arranged in a square shape as shown in fig. 26 is rotated by 45 degrees. In addition, an auxiliary line X shown in FIG. 32₀～X₇And Y is₀～Y₇The auxiliary lines are lines each explaining a change state in which the pattern format 39 is changed, and do not constitute the pattern format 39.

The pattern format 39 is divided into a plurality of lattice-shaped sections containing the same number of pattern units 31 by equally dividing the pattern format into 2 directions orthogonal to each other at an angle of 45 degrees with respect to the arrangement direction of the pattern units 31, that is, in the vertical direction (extending direction of the auxiliary line X) and the horizontal direction (extending direction of the auxiliary line Y) in fig. 32. The lattice-like sections formed by the pattern 39 are based on equidistant auxiliary lines X in the vertical and horizontal directions of the pattern 39₀～X₇And Y₀～Y₇The pattern unit is formed by dividing the pattern unit into 7 pieces in a vertical and horizontal manner, and 49 pattern units 31 are provided in each division.

The continuous deformation pattern portion 46A is formed by deforming the pattern 39 formed by the 49 sections in the above-described manner. In other words, the continuous deformation pattern portion 46A is formed by arranging the plurality of pattern units 31(a) at the arrangement interval d different from the arrangement interval L of the convex lenses 21 constituting the convex lens assembly 20, and (B) arranging the pattern units 31 in a case where the auxiliary lines X and Y orthogonal to each other are continuously divided into a plurality of sections including the same number in a lattice shape, and the section lengths in the auxiliary line X direction and the auxiliary line Y direction in 1 section are different from the section lengths in the auxiliary line X direction and the auxiliary line Y direction in the section adjacent to each other along the section.

Specifically, the continuous deformation pattern portion 46A is continuous with the auxiliary line y direction (the direction in which the continuous deformation pattern portions 46A are arranged in the lateral direction in fig. 33) as shown in fig. 33, for example, so as to form a continuous deformation pattern portion along the section D₁₁～D₇₁The length of each section (the distance between 2 auxiliary lines extending in the same direction forming that section) is different from the length of the section of another section adjacent to and connected to the auxiliary line y, and more specifically, in the section D₁₁～D₇₁The length of the section D is continuously or discontinuously, and the section D is formed by sequentially increasing the length of the section in stages or non-stages and then sequentially decreasing the length of the section₄₁In the case of central symmetry, the pattern format 39 is deformed in the direction of the auxiliary line y. Therefore, the section D is a section having a length corresponding to the section length deformed in this manner₁₁～D₇₁The arrangement intervals in the respective arrangement directions are continuously or discontinuously, and the interval between the stages or non-stages is sequentially increased and then sequentially decreased to form a section D₄₁Is symmetric at the center, and is in the section D₁₁～D₇₁The angle formed by the above 2 arrangement directions is different, and an arrangement is formed by the plurality of pattern units 31. In addition, an auxiliary line X shown in FIG. 33₀～X₇And Y₀～Y₇Are respectively associated with the auxiliary lines X on the pattern format 39₀～X₇And Y₀～Y₇Correspondingly, the auxiliary lines describing the deformed state of the sections are not the entities constituting the continuous deformed pattern portion 46A.

The continuous deformation pattern portion 46A is continuous with the auxiliary line x direction (the longitudinal arrangement direction of the continuous deformation pattern portion 46A in fig. 33), and is formed along the section D, for example₁₁～D₁₇Each section length and a section D having continuity with the auxiliary line y direction₁₁～D₇₁In the same proportion, more specifically, the section D₁₁～D₁₇The length of the upper section is continuous or discontinuous, andor sequentially increasing the size of the section D and then sequentially decreasing the size of the section D₁₄In the case of central symmetry, the pattern format 39 is deformed in the auxiliary line y direction. Therefore, in order to correspond to the section length deformed in this manner, the section D is divided into sections₁₁～D₁₇The arrangement intervals in the respective arrangement directions are continuously or discontinuously, and the interval between the stages or non-stages is sequentially increased and then sequentially decreased to form a section D₁₄Is symmetric at the center, and is in the section D₁₁～D₁₇The angle formed by the above 2 arrangement directions is different, and the arrangement of the plurality of pattern units 31 is formed.

In addition, a section D has already been formed₁₁～D₁₇And a section D₁₁～D₇₁The continuous deformation pattern portion 46A is explained as an example. However, as shown in fig. 33, all the continuous sections along the auxiliary line x direction and all the continuous sections and sections D along the auxiliary line y direction₁₁～D₁₇And a section D₁₁～D₇₁The same deformation is performed, and the arrangement of the pattern units 31 is also formed.

Since the continuously deformed pattern portion 46A is similarly deformed in the direction of the auxiliary line x and the direction of the auxiliary line y as described below and the pattern units 31 are similarly arranged, the pattern format 39 has a square outline, the density of the pattern units 31 on the outer side is high, the density of the pattern units 31 becomes low as the pattern units are located inside, and the division D at the 4 corners is formed₁₁、D₁₇、D₇₁And D₇₇Has the highest density of pattern elements 31, and is located in the central region D₄₄The density of the pattern units 31(a) is the minimum, and the sections arranged along the diagonal line of the continuous deformed pattern portion 46A have similar shapes.

Fig. 32 and 33 show an example of the continuous deformation pattern portion. When the partition length is continuously or discontinuously changed in stages or continuously changed in steps, the size of the partition length can be set arbitrarily.

The continuous deformation pattern portion 46A is formed by forming 49 sections into which the pattern unit 31 is equally divided by 7 in the longitudinal direction and the lateral direction on the pattern format 39 and deforming the pattern format 39 by the above-described method. However, the number of sections formed by the pattern is not limited to 49 sections, and may be set to any other number.

In the continuously deformed pattern portion 46A shown in fig. 32 and 33, when the section lengths of the sections D are different at the same ratio in the auxiliary line x direction and the auxiliary line y direction, the pattern format 39 is deformed in the auxiliary line x direction and the auxiliary line y direction, and then a plurality of pattern units 31 are arranged. However, when the section lengths of the sections D are different at different ratios in the auxiliary line x direction and the auxiliary line y direction, the pattern format 39 may be deformed in the auxiliary line x direction and the auxiliary line y direction, and then a plurality of pattern units 31 may be arranged.

In the continuously deformed pattern portion 46A shown in fig. 32 and 33, in order to form a plurality of continuous or discontinuous sections D, and to form a symmetrical pattern about the sections D41 and D14 by sequentially increasing the number of stages or non-stages and then sequentially decreasing the number of stages, the pattern format 39 is deformed in the direction of the auxiliary line x and the direction of the auxiliary line y to form an array of a plurality of pattern elements 31. However, it is not limited to such a modification and arrangement method. For example, the pattern format 39 may be modified in the auxiliary line x direction and the auxiliary line y direction so that a plurality of pattern units 31 may be arranged so that the division lengths of the sections continuous in the auxiliary line x direction and the auxiliary line y direction are continuous or discontinuous, are sequentially increased in stages or non-stages and then sequentially decreased in series or continuous or discontinuous, and are sequentially increased in stages or non-stages and decreased in series or discontinuous.

In the repeated pattern 70E, all of the continuous deformed pattern portions 46A may be present, and one or a plurality of continuous deformed pattern portions 46A may be present in part.

The repeating pattern 70F (not shown) including the continuous deformation pattern portion 47A shown in fig. 34 is an example of another pattern of the repeating pattern 70 of the three-dimensional plate structure 5 of the third pattern. As shown in fig. 34, the continuous deformed pattern portion 47A is formed by deforming the pattern format 39 in a case where the circular pattern unit 31 is divided into a plurality of sections D including the same number of pattern units 31 by 2 directions orthogonal to each other in a lattice-like equidistant manner in a pattern format including a plurality of pattern units 31 arranged at the arrangement interval D different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20, and the plurality of sections D including the same number of pattern units 31 are formed by dividing the section D formed in the vertical direction by a section length different from the section length of the vertical section in another section adjacent to the section D. That is, the continuous deformed pattern portions 46A are formed by deforming only the longitudinal arrangement direction of the pattern form 39, unlike the continuous deformed pattern portions 47A formed by deforming the longitudinal and transverse arrangement directions of the pattern units 31.

The continuous deformed pattern portion 47A is formed by deforming the pattern 39 formed by the 49 divisions in the above-described manner. In other words, the continuous deformation pattern portion 47A is formed by arranging the plurality of pattern units 31(a) at the arrangement interval d different from the arrangement interval L of the convex lenses 21 in the convex lens assembly 20, and (B) arranging the pattern units 31 in the case where the section length in the auxiliary line X direction of one section and the section length along the section adjacent to the auxiliary line X direction of that section are formed by continuously dividing the plurality of pattern units 31 in the lattice shape in the auxiliary line X direction and the auxiliary line Y direction so as to include the same number of sections.

The continuous deformation pattern portion 47A is continuous with the auxiliary line x direction (the longitudinal arrangement direction of the continuous deformation pattern portion 47A in fig. 34), and is formed along the section D, for example₁₁～D₁₇And a continuous region D having continuity with the continuous deformation pattern portion 46A₁₁～D₁₇In the same manner, continuously or notSuccessively, successively larger stages or non-stages are successively smaller, and a division D is formed₁₄In the case of central symmetry, the pattern format 39 is distorted in the auxiliary line X direction. Therefore, in order to correspond to the section length deformed in this manner, the section D is divided into sections₁₁～D₁₇The arrangement intervals in the respective arrangement directions are continuously or discontinuously, and the interval between the stages or non-stages is sequentially increased and then sequentially decreased to form a section D₁₄Is symmetric at the center, and is in the section D₁₁～D₁₇In the case where the angle formed by the above 2 arrangement directions is different, the arrangement 31 of the plurality of pattern units is formed.

In addition, a section D has already been formed₁₁～D₁₇The continuous deformation pattern portion 47A is explained as an example. However, as shown in fig. 34, all the continuous sections along the auxiliary line x are deformed in this manner. The section length of the pattern unit 31 in the auxiliary line y direction in the sections continuing in the auxiliary line y direction is fixed in all the sections, and may be smaller or larger than the arrangement interval of the pattern format 39, as well as the arrangement interval.

The continuous deformed pattern portion 47A is deformed only in the direction of the auxiliary line x and then the pattern units 31 are arranged, as described below, so that a rectangular outline shape different from the outline shape of the pattern format 39 is formed. The density of the outer pattern elements 31 in the x direction of the auxiliary line is relatively large, and the density of the pattern elements 31 gradually decreases toward the inner direction. As shown in fig. 34, in order to form a contour shape slightly similar to the contour shape of the pattern format 39, the continuous deformed pattern portion 47A is formed into a continuous section D in the direction of the auxiliary line x₇₁～D₇₇A section D is continuously formed in the y direction of the auxiliary line₈₁～D₈₇Division D₉₁～D₉₇And a section D₈₁～D₈₇Each of the sections (2).

The sections formed by the pattern format 39 in the continuous deformed pattern portion 47A are not limited to 49 sections. The length of the deformed sections may be arbitrarily set, and when the lengths of the sections in the continuous sections in the direction of the auxiliary line x are continuously or discontinuously, and are sequentially increased or decreased in stages or without stages and are continuously or discontinuously, and when the lengths of the sections in the continuous sections in the direction of the auxiliary line x are increased or decreased in stages or without stages, the pattern form 39 may be deformed in the direction of the auxiliary line x, and the repeating pattern 70F may be all the continuously deformed pattern portions 46A, or a part of one or a plurality of the continuously deformed pattern portions 47A may be the same as the continuously deformed pattern portions 46A.

The repeating pattern 70G (not shown) including the continuous deformation pattern portion 48A shown in fig. 35 is another example of the repeating pattern 70 of the three-dimensional plate structure 5 of the third pattern. The continuously deformable pattern portion 48A and the continuously deformable pattern portion 47A have opposite formats, that is, when the compartment lengths of the compartments formed along the longitudinal direction are continuously or discontinuously, and are sequentially decreased in stages or non-stages and then sequentially increased, only the pattern format 39 is deformed in the longitudinal direction, which is different from the continuously deformable pattern portion 47A. Therefore, in order to correspond to the section length deformed in this manner, the section D is divided into sections₁₁～D₁₇The arrangement intervals in the respective arrangement directions are continuously or discontinuously, and the interval between the stages or non-stages is sequentially increased and then sequentially decreased to form a section D₁₄Is symmetric at the center, and is in the section D₁₁～D₁₇The angle formed by the above 2 arrangement directions is different, and the arrangement of the plurality of pattern units 31 is formed.

In addition, a section D has already been formed₁₁～D₁₇The continuous deformation pattern portion 48A is explained as an example. However, as shown in fig. 35, all the continuous sections along the auxiliary line x are deformed in this manner. The section lengths of the pattern units 31 in the auxiliary line y direction in the sections continuing in the auxiliary line y direction are fixed in all the sections, and are the same as the arrangement intervals of the pattern format 39The interval may be smaller or larger than this arrangement interval.

The continuous deformed pattern portion 48A is deformed only in the direction of the auxiliary line x and then the pattern units 31 are arranged, as described below, so that a rectangular outline shape different from the outline shape of the pattern format 39 is formed. The density of the outer pattern elements 31 in the x direction of the auxiliary line is relatively small, and the density of the pattern elements 31 gradually increases toward the inner direction. As shown in fig. 35, in order to form a contour shape slightly similar to the contour shape of the pattern format 39, the continuous deformed pattern portion 48A is formed into a continuous section D in the auxiliary line x direction₅₁～D₅₇Section D existing in the y direction of the auxiliary line of (a)₆₁～D₆₇And a section D₇₁～D₇₇(not shown) is eliminated.

In the continuously deformed pattern portion 48A, the sections formed by the pattern format 39 are not limited to 49 sections. The length of the deformed sections may be arbitrarily set, and when the lengths of the sections in the continuous sections in the direction of the auxiliary line x are continuously or discontinuously, and are sequentially increased or decreased in stages or without stages and are continuously or discontinuously, and when the lengths of the sections in the continuous sections in the direction of the auxiliary line x are increased or decreased in stages or without stages, the pattern format 39 may be deformed in the direction of the auxiliary line x, and the repeating pattern 70G may be all the continuously deformed pattern portions 48A, or a part of one or a plurality of the continuously deformed pattern portions 48A may be the same as the continuously deformed pattern portion 47A.

As described above, since the pattern format 39 is deformed when the section lengths of the sections formed along the longitudinal direction are different in the continuous deformed pattern portion 47A and the continuous deformed pattern portion 48A, when the repeated pattern 70F and the repeated pattern 70G include one continuous deformed pattern portion 47A and one continuous deformed pattern portion 48A, the repeated pattern 70F and the repeated pattern 70G form different patterns, but when the repeated pattern 70F and the repeated pattern 70G include a plurality of continuous deformed pattern portions 47A and one continuous deformed pattern portion 48A, the repeated pattern 70F and the repeated pattern 70G form the same repeated pattern.

A repeating pattern 70H (not shown) including the continuous deformation pattern portion 49A shown in fig. 36 is another example of the repeating pattern 70 of the three-dimensional plate material structure 5 of the third form. As shown in fig. 36, the continuously deformed pattern portion 49A is different from the continuously deformed pattern portion 46A in that the pattern format 39 is deformed so that the section lengths of the sections D formed along at least 1 of the 2 directions orthogonal to each other are continuous or discontinuous, and the sections are sequentially reduced in steps or non-steps and then sequentially increased in steps. That is, the continuous deformation pattern portion 49A is, as illustrated in fig. 36, the method of deforming the auxiliary lines in the x direction and the auxiliary lines in the y direction on the pattern format 39 is opposite to the method of deforming the continuous deformation pattern portion 46A. Therefore, in order to correspond to the section length deformed in this manner, the section D is divided into sections₁₁～D₇₁And a section D₁₁～D₁₇The arrangement interval D in each arrangement direction is continuously or discontinuously, and the interval D is formed so that the interval D becomes smaller and larger in a stepwise or non-stepwise manner₄₁And a section D₁₄Is symmetric at the center, and is in the section D₁₁～D₇₁And a section D₁₁～D₁₇The angle formed by the above 2 arrangement directions is different, and the arrangement of the plurality of pattern units 31 is formed.

In addition, a section D has already been formed₁₁～D₁₇And a section D₁₁～D₇₁The continuous deformation pattern portion 49A is explained as an example. However, as shown in fig. 36, all the continuous sections along the auxiliary line y direction and all the continuous sections and sections D along the auxiliary line x direction₁₁～D₁₇And a section D₁₁～D₇₁The same deformation is performed, and the arrangement of the pattern units 31 is also formed.

The continuous deformation pattern portion 49A is similarly deformed in the auxiliary line x direction and the auxiliary line y direction as described below, and the same appliesSince the pattern cells 31 are arranged, the pattern 39 has a square outline, and the density of the pattern cells 31 outside the pattern cells is low, and the density of the pattern cells 31 increases toward the inside, and the section D located at 4 corners₁₁、D₁₇、D₇₁The density of the pattern elements 31 of D77 is the smallest, the density of the pattern elements 31 of the section D44 located at the center is the largest, and the sections arranged along the diagonal line of the continuously deformed pattern portion 49A have similar shapes.

In the continuously deformed pattern portion 49A, the sections formed by the pattern format 39 are not limited to 49 sections. The length of each section D to be deformed may be set arbitrarily, and the length of each section may be deformed at a ratio different from the ratio in the x direction of the auxiliary line and the y direction of the auxiliary line. When the segment lengths of the respective segments D are continuously or discontinuously, and the segments are sequentially increased or decreased in stages or without stages and are continuously or discontinuously, and the segments are gradually increased or decreased in stages or without stages, the pattern form 39 may be deformed in the direction of the auxiliary line x, and the pattern 70H may be formed of all of the continuously deformed pattern portions 49A, or a part of one or a plurality of the continuously deformed pattern portions 49A, as in the continuously deformed pattern portion 46A.

As described above, since the pattern format 39 is deformed when the section lengths of the sections formed in the 2 directions orthogonal to each other by the continuous deformation pattern portion 46A and the continuous deformation pattern portion 49A are opposite to each other, when the repeated pattern 70E and the repeated pattern 70H include one continuous deformation pattern portion 46A and one continuous deformation pattern portion 49A, respectively, the repeated pattern 70E and the repeated pattern 70H form different patterns, but when the repeated pattern 70E and the repeated pattern 70H include a plurality of continuous deformation pattern portions 46A and one continuous deformation pattern portion 49A, respectively, the repeated pattern 70E and the repeated pattern 70H form the same repeated pattern.

All of the continuously variable pattern portions 46A to 53 are formed by dividing the pattern format 39 at equal intervals in 2 directions orthogonal to each other to form a plurality of sections including the same number of pattern units 31, but the sections formed by the pattern format 39 do not need to be divided at equal intervals in 2 directions orthogonal to each other. For example, the division may be performed randomly in 2 directions forming a fixed angle, or may be performed equidistantly or randomly in 2 directions forming a fixed angle with different distances.

Although the pattern format 39 includes pattern elements 31 having the same shape, pattern elements 31 having different shapes may be included.

The repeating pattern 70I (not shown) including the plurality of continuous deformation pattern portions 46A shown in fig. 37 is an example of another pattern of the repeating pattern 70. Only a portion of the repeating pattern 70I is shown in fig. 37. The repeating pattern 70I includes the continuously deformable pattern portions 46A continuously arranged in the longitudinal direction and the transverse direction.

The repeating pattern 70I includes only the same continuous deformation pattern portions 46A, and the repeating pattern may be formed by arranging at least 2 kinds of continuous deformation pattern portions selected from the continuous deformation pattern portions, for example, 46A to 53 of the continuous deformation pattern portion group in a fixed pattern or in a random arrangement.

The principle that the three-dimensional wave patterns of the repeating patterns 70, 70A to 70I including the continuous deformed pattern portions 46 to 49A can be visually changed by changing the angle of observation in the three-dimensional plate structure 5 will be described by taking the continuous deformed pattern portion 46 as an example.

When the repeating pattern including the continuous deformed pattern portion 46 is observed through the convex lens assembly 20, the continuous deformed pattern portion 46 exhibits a three-dimensional pattern, and when the repeating pattern is observed by changing the angle, the three-dimensional moire pattern exhibits a changing visible state. In the three-dimensional plate structure 5, the three-dimensional visual effect of the continuous deformed pattern portion 46 is determined by the difference between the arrangement interval L of the convex lenses 21 in the convex lens combination 20 and the arrangement interval d of the pattern units 31 in the continuous deformed pattern portion 40, as in the three-dimensional plate structure 1. That is, if the arrangement interval L is greater than the arrangement interval d, the repetitive pattern 70 has a concave visual effect, and conversely, if the arrangement interval d is greater than the arrangement interval L, the repetitive pattern 70 has a convex visual effect. Thus, if the difference (absolute value) between the arrangement interval L and the arrangement interval d is relatively small, the amount of concavity or convexity appears to be relatively large.

Therefore, the row interval d of the pattern elements 31 in the continuous section is continuous or discontinuous in each section, and when the continuous deformed pattern portion 46 formed by a stepwise or non-stepwise change is observed through the convex lens assembly 20, the amount of concavity or convexity of the pattern elements 31 in each section also varies continuously and visually. Therefore, the three-dimensional concave or convex appearance of the continuous deformed pattern portion 46 observed by the convex lens assembly 20 becomes relatively prominent, and the three-dimensional visual effect of the continuous deformed pattern portion 46 becomes large.

On the other hand, when the angle of view of the continuous deformed pattern portion 46 through the convex lens assembly 20 is changed from the upper side of the convex lenses 21 constituting the convex lens assembly 20 to the horizontal direction, the focal point of the convex lenses 21 is changed from the lower side of the convex lenses 21 to the horizontal direction. Therefore, when the continuous deformed pattern portion 46 is viewed from above the convex lens 21, the focal point of the convex lens 21 is located below the convex lens 21, and therefore, a partial section of the continuous deformed pattern portion 46 located below the convex lens 21 exhibits a three-dimensional visual effect due to the difference between the arrangement interval L and the arrangement interval d. On fig. 38, a three-dimensional moire pattern in this state can be observed. Next, when the continuous deformed pattern portion 46 is viewed in the horizontal direction from above the convex lens 21, the focal point of the convex lens 21 is located at a position shifted in the horizontal direction of the convex lens 21, and therefore, a three-dimensional visual effect is exhibited by a difference between the arrangement interval L and the arrangement interval d in a section of a part of the continuous deformed pattern portion 46 existing at a position where the convex lens 21 forms the focal point. Since the three-dimensional moire pattern in this state is visible through the lens body in a part of the continuous deformed pattern portions 46 having an arrangement interval different from the arrangement interval of the continuous deformed pattern portions 46 seen from above the convex lens 21, a three-dimensional moire pattern different from that of fig. 38 is formed. On fig. 39, a three-dimensional moire pattern in this state can be observed.

In this way, when the upper side of the convex lens 21 constituting the convex lens assembly 20 is changed to the horizontal direction, various sections of the continuous deformation pattern portion 46 can be observed through the convex lens assembly 20. The continuous deformation pattern portion 46 is formed to be continuous or discontinuous in the auxiliary line x direction and the auxiliary line y direction at the same ratio, and is deformed in the auxiliary line x direction and the auxiliary line y direction to form a pattern format 38 in a case where the pattern is formed to be symmetrical about the sections D41 and D14 after being sequentially increased in stages or without stages and then being sequentially decreased in stages. Therefore, if the angle of observation is changed, the shape, size, density, etc. of the pattern elements in the sections constituting the continuous deformed pattern portion 46 that can be observed at this angle are visually changed in accordance with the pattern format. Therefore, if the observation angle at which the continuous deformed pattern portion 46 is observed through the convex lens assembly 20 is changed, the three-dimensional moire pattern visually appears to be changed.

On the continuous deformed pattern portion 46, the three-dimensional moire pattern appears visually changed in the same manner as in the case where the angle of observation of the continuous deformed pattern portion 46 through the convex lens assembly 20 is changed from the upper side of the convex lenses 21 constituting the convex lens assembly 20 to the vertical direction and the case where the angle of observation of the continuous deformed pattern portion 46 through the convex lens assembly 20 is changed from the upper side of the convex lenses 21 constituting the convex lens assembly 20 to the horizontal direction.

In this way, the continuous deformation pattern portion 46 observed through the convex lens assembly 20 is not only three-dimensional and can produce a clear concave or convex visual effect, and the three-dimensional wave pattern can be visually changed by changing the observation angle regardless of the visual distance of the continuous deformation pattern portion 46 observed through the convex lens assembly 20.

As described above, the continuous deformation pattern portions 46A to 49A are different from the continuous deformation pattern portions 46 to 49, and the arrangement angle of the pattern unit 31 and the arrangement interval of the pattern unit 31 are changed together. The continuous patterns 46A to 53 more clearly exhibit the visual effect of the three-dimensional moire pattern than the continuous deformed pattern portions 46 to 49.

Therefore, the stereoscopic sheet structure 5 is suitable for use in, for example, a packaging box or the like in that it can produce a visual effect over a short distance, and suitable for use in, for example, a commercial signboard, a poster, an advertising tower, a guide signboard, or the like in that it can produce a visual effect over a long distance.

As for the continuously deformed pattern portion 47 described above, specifically, a three-dimensional wavy solid pattern having the same pattern as that of the continuously deformed pattern portion 46 can be observed only in the longitudinal arrangement direction of the pattern units 31. Further, as for the continuous deformed pattern portion 48, specifically, a three-dimensional wavy solid pattern opposite to the continuous deformed pattern portion 47 can be observed. Further, on the continuously deformed pattern portion 49, specifically, a three-dimensional wavy solid pattern opposite to the continuously deformed pattern portion 46 can be observed. In addition, as for the repeated pattern 70D, specifically, a three-dimensional corrugated solid pattern in which a plurality of connections are made to a three-dimensional corrugated solid pattern having the same pattern as the continuously deformed pattern portion 46 can be observed.

Specifically, the continuous deformation pattern portion 46 and the continuous deformation pattern portion 46A are different from each other in the arrangement direction of the pattern units 31, and the same three-dimensional corrugated solid pattern can be observed. As for the continuous deformation pattern portion 49A, specifically, a three-dimensional wavy solid pattern opposite to the continuous deformation pattern portion 46A of the continuous deformation pattern portion 46 can be observed. As for the continuously deformed pattern portion 47A described above, specifically, a three-dimensional wavy solid pattern having the same pattern as that of the continuously deformed pattern portion 46A of the continuously deformed pattern portion 46 can be observed only in the longitudinal direction. Further, on the continuously deformed pattern portion 48A, specifically, a three-dimensional wavy solid pattern opposite to the continuously deformed pattern portion 47A can be observed. In addition, as for the above-described repeated pattern 70E, specifically, a three-dimensional corrugated solid pattern in which a plurality of connections are made with a three-dimensional corrugated solid pattern having the same pattern as that of the continuously deformed pattern portion 46A can be observed.

Basically, the stereoscopic plate structure 5 can be manufactured by the same method as the stereoscopic plate structures 1 to 3 of the first embodiment. The repetitive patterns 70, 70A to 70I including the continuous deformation pattern portions 46 to 49A can be made into desired image data by using the above-described editing software on a personal computer in the same manner as the repetitive pattern 30.

Like the stereoscopic plate structure 2 shown in fig. 18, the stereoscopic plate structure 5 may be formed by stacking 2 plate materials 10 and 11, or by stacking 3 or more plate materials to form a stacked body, as in the stereoscopic plate structure 1 of the first embodiment. Similarly, the stereoscopic plate structure 5 may be provided with another pattern and image 15 other than the repetitive pattern, as in the stereoscopic plate structure 3 shown in fig. 19.

The first pattern, the second pattern, and the third pattern are described as the stereoscopic plate structure of the present invention, and the stereoscopic plate structure of the present invention may be formed by combining these patterns. For example, the stereoscopic plate structure having the repeated pattern may be formed by selecting at least 2 of the continuous deformed pattern portions in the stereoscopic plate structure of the first pattern, the line segment set in the stereoscopic plate structure of the second pattern, and the continuous deformed pattern portions in the stereoscopic plate structure of the third pattern. Further, in the case where the interval between the line segments and the extending direction of the line segments are continuously changed in a stepwise manner or in a non-stepwise manner, as in the continuous deformed pattern portion of the stereoscopic plate structure of the first embodiment, a part or all of the line segment sets of the stereoscopic plate structure of the second embodiment may be formed as the stereoscopic plate structure having the repetitive pattern formed by the deformation, and/or in the case where the interval between the line segments is continuously changed in a stepwise manner or in a non-stepwise manner, as in the continuous deformed pattern portion of the stereoscopic plate structure of the third embodiment, a stereoscopic plate structure having the repetitive pattern formed by the deformation may be formed.

Claims (6)

1. A stereoscopic plate structure comprising:

a convex lens assembly formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, the convex lenses being focused on the other surface; and

a repetitive pattern in which a plurality of pattern units are arranged on the focal plane of the convex lens at an arrangement interval and/or in a direction different from that of the convex lens, and when any 3 adjacent pattern units are selected,spacing D between pattern element No. N and its adjacent pattern element No. N +1_N～N+1And the interval D between the pattern unit No. N +1 and the pattern unit No. N +2 adjacent to it_N+1～N+2Ratio of (D)_N～N+1/D_N+1～N+2) The pattern units are regularly changed within the range of 0.95 to 1.05, and the arrangement direction of the pattern units is regularly changed within the range of-1 degree to +1 degree, and a continuous deformation pattern part is formed, wherein the intersection angle formed by an extension line connecting the pattern unit N and the pattern unit N +1 adjacent to the pattern unit N +1 and a straight line connecting the pattern unit N +1 and the pattern unit N +2 adjacent to the pattern unit N +1 is formed.

2. A stereoscopic plate structure comprising:

a convex lens assembly formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, the convex lenses being focused on the other surface; and

a repetitive pattern in which a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from those of the convex lens, and in a pattern format including a plurality of pattern units arranged at different arrangement intervals from the convex lenses of the convex lens assembly, a plurality of sections each including the same number of pattern elements are formed by being equally divided in each arrangement direction of the pattern elements, and a section formed along at least 1 of the arrangement directions is arranged at an interval different from the arrangement interval in the 1 direction of the pattern elements in another section adjacent to the arrangement direction of the section, when a plurality of pattern units are arranged along the 1 direction, a continuous deformed pattern portion formed by deforming the pattern format is included.

3. A stereoscopic plate structure comprising:

a convex lens assembly formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, the convex lenses being focused on the other surface; and

a repeating pattern comprising:

a continuous deformation pattern part, wherein a plurality of pattern units are arranged on the focal plane of the convex lens according to the arrangement interval and/or direction different from the convex lens, and when any 3 adjacent pattern units are selected, the continuous deformation pattern part is used for forming the interval D between the N pattern unit and the adjacent N +1 pattern unit_N～N+1And the interval D between the pattern unit No. N +1 and the pattern unit No. N +2 adjacent to it_N+1～N+2Ratio of (D)_N～N+1/D_N+1～N+2) A continuous deformation pattern part is formed by regular change in the range of 0.95 to 1.05, wherein the arrangement direction of the pattern units is regularly changed in the range of-1 to +1 degrees at the crossing angle formed by the extension line connecting the pattern unit N and the adjacent pattern unit N +1 No. N +1 and the straight line connecting the pattern unit N +1 No. N +1 and the adjacent pattern unit N +2 No. N + 2; and

a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from those of the convex lens, and in a pattern format including a plurality of pattern units arranged at different arrangement intervals from the convex lenses of the convex lens assembly, a plurality of sections each including the same number of pattern elements are formed by being equally divided in each arrangement direction of the pattern elements, and a section formed along at least 1 of the arrangement directions is arranged at an interval different from the arrangement interval in the 1 direction of the pattern elements in another section adjacent to the arrangement direction of the section, when a plurality of pattern units are arranged along the 1 direction, a continuous deformed pattern portion formed by deforming the pattern format is included.

4. A stereoscopic plate structure comprising:

a convex lens assembly formed by arranging a plurality of convex lenses arranged in a predetermined interval and direction on one surface of a plate material, the convex lenses being formed by focusing on the other surface; and

and a repeating pattern in which a plurality of pattern units are arranged on the focal plane of the convex lens at different arrangement intervals and/or different directions from the convex lens, the pattern units being line segments, and a line segment collection unit including a plurality of line segments arranged at different arrangement intervals of the convex lens in the convex lens assembly is formed.

5. A stereoscopic vision plate structure according to claim 4, wherein the repetitive pattern comprises a plurality of line segment assemblies, and the extending direction of a plurality of line segments forming one of the line segment assemblies is different from the extending direction of the line segments forming the other line segment assemblies.

6. A stereoscopic vision plate structure characterized in that,

one side of the first sheet has the lenticular lens assembly of claim 1,

one side of the second sheet having a repeating pattern as claimed in any one of claims 1 to 5,

the focal plane of the first plate material and the second plate material having the repeating pattern are integrated to face each other, whereby the first plate material and the second plate material can be freely combined or fixed to form an integral structure.