HK1106064B - Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method - Google Patents

Description

Optical illumination device, adjustment method for optical illumination device, exposure device, and exposure method

Technical Field

The present invention relates to an illumination optical apparatus, an adjustment method of the illumination optical apparatus, an exposure apparatus, and an exposure method, and more particularly to an illumination optical apparatus suitable for an exposure apparatus for manufacturing microdevices such as semiconductor devices, imaging devices, liquid crystal display devices, thin film magnetic heads, and the like in a lithography (lithography) process.

Background

In a typical exposure apparatus, a light beam emitted from a light source is passed through fly's-eye lenses (or a microlens array) as an optical integrator to form a secondary light source as a substantial surface light source composed of a plurality of light sources. The light beam from the secondary light source is incident on a focusing lens (condenser lens).

The light beams condensed by the focusing lens are overlapped to illuminate a mask forming a predetermined pattern. The light transmitted through the pattern of the mask is imaged on the wafer through the projection optical system. Thus, the wafer of the photosensitive substrate is projected to expose (transfer) the mask pattern. Further, the pattern formed on the mask is highly integrated, and when this fine pattern is accurately transferred onto a wafer, it is essential to obtain a uniform illuminance distribution on the wafer.

A technique has been attracting attention in which a circular secondary light source is formed on the rear focal plane of a fly-eye lens, and the intensity of the secondary light source is varied to vary the coherence (coherence) σ of illumination (σ value is the aperture diameter/pupil diameter of a projection optical system, or σ value is the number of exit apertures of the illumination optical system/number of entrance apertures of the projection optical system). In addition, attention has been focused on a technique of forming a ring-shaped or 4-pole secondary light source on the rear focal plane of the fly-eye lens to improve the depth of focus or resolution of the projection optical system.

Disclosure of Invention

In this case, the minute pattern of the mask is faithfully transferred onto the wafer, and not only is it necessary to adjust the pupil luminance distribution having a predetermined light luminance distribution formed by the illumination pupil plane, which is the light intensity distribution of the secondary light source formed on the rear focal plane of the fly-eye lens, to a desired shape, but also it is necessary to adjust the pupil luminance distribution of each point on the wafer on the final irradiated surface to be approximately uniform. If the uniformity of the luminance distribution of each pupil on the wafer is dispersed, the line width of the pattern is dispersed for each position on the wafer, and the fine pattern of the mask cannot be faithfully transferred to the wafer with a desired line width over the entire range of the exposure field.

An object of the present invention is to provide an illumination optical device capable of maintaining or adjusting substantially uniform illumination distribution on an illuminated surface and adjusting substantially uniform pupil luminance distribution of each point on the illuminated surface. Further, the present invention has an object to provide an exposure apparatus and an exposure method which can faithfully transfer a fine pattern of a mask to a photosensitive substrate with a desired line width over the entire range of an exposure field by using an illumination optical system capable of maintaining or adjusting illuminance distribution of an irradiated surface to be substantially uniform and adjusting pupil luminance distribution of each point on the irradiated surface to be substantially uniform.

In order to solve the above problem, a 1 st aspect of the present invention is an illumination optical device for illuminating an irradiation surface with a light beam from a light source, comprising:

a pupil distribution forming section for forming a pupil luminance distribution having a predetermined luminance distribution on the illumination pupil surface;

an adjuster for independently adjusting pupil luminance distributions of the respective points on the illuminated surface;

the adjuster has a plurality of adjustment surfaces respectively arranged in optical paths between the pupil distribution forming section and the irradiated surface, and the adjuster has a plurality of adjustment surfaces arranged in the optical paths

Each of the adjustment surfaces emits light having a light intensity distribution different from that of the incident light.

Further, according to a 2 nd aspect of the present invention, there is provided an illumination optical apparatus for illuminating an irradiation surface with a light flux of a light source, comprising:

a pupil distribution forming part for forming a pupil luminance distribution having a predetermined luminance distribution on the illumination pupil surface,

an adjuster for independently adjusting the pupil luminance distribution of each point on the illuminated surface,

the adjuster has a plurality of adjustment surfaces which are arranged in an optical path between the pupil distribution forming section and the irradiated surface and have a predetermined transmittance distribution or reflectance distribution,

the adjustment surfaces are arranged at different positions along the optical axis direction of the illumination optical device.

The 3 rd aspect of the present invention provides an illumination optical system for illuminating an irradiated surface with a light beam of a light source, the illumination optical system including a 1 st adjustment surface and a 2 nd adjustment surface. The 1 st adjustment surface is disposed in an optical path between the illumination pupil surface of the illumination optical device and the surface to be irradiated, in an optical path closer to the light source than an optically conjugate surface of the surface to be irradiated, and has a 1 st transmittance distribution or a 1 st reflectance distribution of transmittance or reflectance that varies depending on an incident position. And a 2 nd adjustment surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution of transmittance or reflectance that varies depending on an incident position, the 2 nd adjustment surface being disposed in an optical path between the illumination pupil surface and the irradiated surface, the optical path being closer to the irradiated surface side than a conjugate surface of an optical conjugate of the irradiated surface.

The 4 th aspect of the present invention provides an illumination optical apparatus for illuminating an irradiated surface with a light beam of a light source, the illumination optical apparatus including a 1 st adjustment surface and a 2 nd adjustment surface. The 1 st adjustment surface is disposed in an optical path between an illumination pupil surface of the illumination optical device and the surface to be irradiated, the optical path being closer to the light source side than an optically conjugate surface of the surface to be irradiated, and has a 1 st transmittance distribution or a 1 st reflectance distribution of transmittance or reflectance that varies with an incident angle. The 2 nd adjustment surface is a 2 nd transmittance distribution or a 2 nd reflectance distribution having a transmittance or a reflectance that varies depending on an incident angle, in an optical path between the illumination pupil surface and the irradiated surface, the optical path being disposed closer to the irradiated surface side than a conjugate surface of an optical conjugate of the irradiated surface.

The 5 th aspect of the present invention provides an illumination optical apparatus for illuminating an irradiated surface with a light beam of a light source, the illumination optical apparatus including a 1 st adjustment surface and a 2 nd adjustment surface. Wherein the 1 st adjustment surface is disposed in an optical path between the illumination pupil surface of the illumination optical device and the illuminated surface, and has a 1 st transmittance distribution or a 1 st reflectance distribution of transmittance or reflectance that varies depending on an incident position. The 2 nd adjustment surface is a 2 nd transmittance distribution or a 2 nd reflectance distribution having a transmittance or a reflectance that varies depending on an incident position, and is disposed in an optical path between the illumination pupil surface and the illuminated surface. The size of the light beam that reaches a predetermined point on the surface to be irradiated when passing through the 1 st adjustment surface is different from the size of the light beam that reaches the predetermined point on the surface to be irradiated when passing through the 2 nd adjustment surface.

The present invention according to claim 6 provides an adjusting method for an illumination optical apparatus according to any one of claims 1 to 5, including a pupil luminance distribution calculating step, a distribution determining step, and an adjusting step. Wherein the pupil luminance distribution calculating step calculates the pupil luminance distribution at a plurality of points on the illuminated surface based on design data of the illumination optical apparatus. A distribution determining step of determining a desired transmittance distribution or reflectance distribution to be given to the plurality of adjustment surfaces so that pupil luminance distributions at the plurality of points are adjusted independently from each other. And an adjustment step of forming and arranging the plurality of adjustment surfaces each having the desired transmittance distribution or reflectance distribution.

The 7 th aspect of the present invention provides an adjusting method of the illumination optical apparatus according to the 1 st to 5 th aspects, including a pupil luminance distribution measuring step, a distribution determining step, and an adjusting step. Wherein the pupil luminance distribution measuring step measures the pupil luminance distribution at a plurality of points on the illuminated surface. The distribution determining step determines a desired transmittance distribution or reflectance distribution to be given to each of the plurality of adjustment surfaces, so that the pupil luminance components at the plurality of points are adjusted independently. The adjusting step is to form and arrange the plurality of adjusting surfaces having the desired transmittance distribution or reflectance distribution, respectively.

In an 8 th aspect of the present invention, there is provided a method of adjusting an illumination optical apparatus according to any one of the 1 st to 5 th aspects, including a pupil luminance distribution obtaining step, an approximating step, an evaluating step, a correlation obtaining step, a distribution determining step, and an adjusting step. Wherein, the pupil luminance distribution obtaining step obtains the pupil luminance distribution of a plurality of points on the illuminated surface. An approximation step of approximating the pupil luminance distribution of the plurality of points obtained in the pupil luminance distribution obtaining step by a predetermined polynomial using a pupil coordinate function on the illumination pupil plane. And an evaluation step of evaluating the pupil luminance distribution of the plurality of points by a pupil luminance distribution polynomial which is a function of the image plane coordinates and the pupil coordinates on the illuminated surface, based on the coefficients of the predetermined polynomial. A correlation obtaining step of obtaining a correlation between the transmittance distribution or reflectance distribution given to each of the plurality of adjustment surfaces and a change in pupil luminance distribution at the plurality of points. A distribution determining step of determining a desired transmittance distribution or reflectance distribution to be given to each of the plurality of adjustment surfaces, so as to independently adjust the pupil luminance distribution at each of the plurality of points, based on the evaluation result at the evaluating step and the correlation. And an adjustment step of forming and arranging the plurality of adjustment surfaces each having the desired transmittance distribution or reflectance distribution.

In the 9 th aspect of the present invention, there is provided an adjusting method for an illumination optical apparatus, in which a pupil luminance distribution having a predetermined luminance distribution on an illumination pupil plane is formed based on a light flux from a light source, and an illuminated plane is illuminated with the light flux from the pupil luminance distribution, the adjusting method comprising:

a pupil luminance distribution obtaining step of obtaining a pupil luminance distribution of a plurality of points on the illuminated surface,

a distribution determining step of determining a desired transmittance distribution or reflectance distribution at a plurality of positions in the optical path of the illumination optical device, and

and an adjustment step of forming a plurality of adjustment surfaces each having the desired transmittance distribution or reflectance distribution and disposing the adjustment surfaces at the plurality of positions.

In the 10 th aspect of the present invention, there is provided an exposure apparatus comprising an illumination optical apparatus adjusted by the illumination optical apparatus according to the 1 st to 5 th aspects or the adjustment method according to the 6 th to 9 th aspects, wherein a mask pattern illuminated by the illumination optical apparatus is exposed on a photosensitive substrate.

In the 11 th aspect of the present invention, there is provided an exposure method comprising an illumination step of illuminating a mask using the illumination optical device of the 1 st to 5 th aspects or the illumination optical device adjusted by the adjustment method of the 6 th to 9 th aspects, and an exposure step of exposing a pattern of the mask onto a photosensitive substrate.

In the illumination optical apparatus of the present invention, the adjuster for independently adjusting the pupil luminance distribution of each point on the surface to be illuminated has, for example, a plurality of adjustment surfaces for emitting light having a light intensity distribution different from that of the incident light. Therefore, by the action of the plurality of adjustment surfaces constituting the adjuster, the pupil luminance distribution at each point on the surface to be irradiated can be adjusted to be substantially uniform while the illuminance distribution on the surface to be irradiated is maintained or adjusted to be substantially uniform. The present invention can maintain or adjust the illuminance distribution of the illuminated surface to a desired distribution, and can adjust the pupil luminance distribution of each point on the illuminated surface to a desired distribution.

Further, the exposure apparatus and the exposure method of the present invention can faithfully transfer the fine pattern of the mask onto the photosensitive substrate with a desired line width over the entire range of the exposure field by using the relationship of the illumination optical apparatus in which the illuminance distribution of the irradiated surface can be maintained or adjusted to be substantially uniform and the pupil luminance distribution of each point on the irradiated surface can be adjusted to be substantially uniform, and can produce a good device with high accuracy. Further, the exposure apparatus and the exposure method of the present invention can maintain or adjust the illuminance distribution on the surface to be irradiated to a desired distribution, and can adjust the pupil luminance distribution at each point on the surface to be irradiated to a desired distribution, whereby the fine pattern of the mask can be faithfully transferred to the photosensitive substrate with a desired line width over the entire range of the exposure field.

In order to make the aforementioned and other objects, features and advantages of the invention comprehensible, preferred embodiments accompanied with figures are described in detail below.

Drawings

Fig. 1 is a schematic view showing the overall configuration of an exposure apparatus according to an embodiment of the present invention.

Fig. 2 is a schematic diagram showing the configuration and operation of a pair of correction filters according to the present embodiment.

Fig. 3A and 3B are schematic diagrams showing an example of transmittance distribution given to a pair of correction filters.

Fig. 4A and 4B are schematic diagrams showing different examples of transmittance distributions given to a pair of correction filters.

Fig. 5 is a schematic diagram showing a modification example of using a pair of correction filters having transmittance distributions different in transmittance according to an incident angle.

Fig. 6 is a schematic diagram showing a modification of the case where three correction filters having transmittance distributions different in transmittance depending on incident positions are used.

Fig. 7A, 7B, and 7C are cross-sectional views each showing an on-axis light flux and an off-axis light flux that pass through each correction filter in the modification of fig. 6.

Fig. 8 is a schematic flowchart showing steps of the method for adjusting the illumination optical device according to the present embodiment.

Fig. 9 is a schematic configuration diagram showing an apparatus for measuring pupil luminance distribution at a plurality of points on an irradiated surface.

Fig. 10 is a schematic diagram showing a configuration of an apparatus for measuring an illuminance distribution on an irradiated surface.

Fig. 11 is a schematic flowchart showing steps of an adjustment method according to a modification of the present embodiment.

Fig. 12 is an explanatory diagram showing a relationship between image plane coordinates and pupil coordinates of the projection optical system.

Fig. 13 is a flowchart of a method of obtaining a semiconductor device of a microdevice.

Fig. 14 is a flowchart of a method of obtaining a liquid crystal display element of a microelement.

1: light source 3: diffractive optical element

4: zoom lens 5: mini fly eye lens (fly eye lens)

6: the condensing optical system 7: light shield baffle

8. 8a, 9 a: correction filter 10: imaging optical system

20: distribution measurement device 25: illuminance measuring device

M: mask MS: photomask carrying platform

PL: projection optical system W: wafer

WS: wafer carrying platform

Detailed Description

Embodiments of the present invention are explained based on the attached drawings. Fig. 1 is a schematic view showing the overall configuration of an exposure apparatus according to an embodiment of the present invention. In fig. 1, a direction normal to the wafer W along the photosensitive substrate is a Z axis, a direction parallel to the paper surface of fig. 1 in the plane of the wafer W is a Y axis, and a direction perpendicular to the paper surface of fig. 1 in the plane of the wafer W is an X axis. In fig. 1, the illumination optical device is set to perform normal circular illumination.

Referring to fig. 1, the exposure apparatus of the present embodiment includes a light source 1 that supplies exposure light (illumination light). As the light source 1, for example, a KrF excimer laser source which supplies 248nm wavelength light, an ArF excimer laser source which supplies 193nm wavelength light, or the like can be used. The approximately parallel light flux emitted from the light source 1 in the + Z direction has a rectangular cross section extending in the X direction in a slender shape, and is incident on a beam expander (beam expander)2 constituted by a pair of lenses 2a and 2 b.

Each of the lenses 2a and 2b has negative refractive power and positive refractive power in the plane of paper (YZ plane) in fig. 1. Therefore, the light beam incident on the beam expander 2 is expanded in the paper of fig. 1 and shaped into a light beam having a predetermined rectangular cross section. The substantially parallel light flux passing through the beam expander 2 of the shaping optical system is deflected in the + Y direction by the optical path bending mirror, and then enters the zoom lens (zoom lens)4 through the diffractive optical element 3 for circular illumination. In the vicinity of the rear-side focal plane of the zoom lens 4, an incident plane of a micro-fly-eye lens (micro-eye lens)5 is positioned.

In general, a diffractive optical element is configured by forming a step on a substrate having a pitch of about the wavelength of exposure light (illumination light), and has an action of diffracting an incident beam at a desired angle. Specifically, the diffractive optical element 3 converts a rectangular parallel light flux incident along the optical axis AX into a divergent light flux having a circular cross section. The diffractive optical element 3 is configured to be freely insertable into and removable from the illumination optical path, and is configured to be exchangeable with a diffractive element for annular illumination or a diffractive optical element for 4-pole illumination.

The micro fly-eye lens 5 is an optical member composed of a plurality of micro lenses (optical elements) arranged in a vertical and horizontal direction and in a dense arrangement. In general, a micro fly-eye lens is constructed by simultaneously forming a plurality of micro optical surfaces by applying MEMS technology (lithography and etching, etc.) to a parallel plane glass plate, for example. In this way, the light flux passing through the diffractive optical element 3 passes through the zoom lens 4, and forms a circular field centered on the optical axis AX on the incident surface of the micro fly-eye lens 5 of the wavefront-dividing optical integrator.

The size of the field of view (i.e., the diameter) of the circle formed here varies depending on the focal length of the zoom lens 4. The light beam incident on the micro fly-eye lens 5 is divided into two dimensions by a plurality of micro lenses, and the rear focal planes of the micro lenses on which the light beam is incident are each formed as a light source. In this way, a substantially circular surface light source (hereinafter referred to as "secondary light source") having substantially the same light intensity distribution as the circular field formed by the incident light flux to the micro fly-eye lens 5 is formed on the rear focal plane of the micro fly-eye lens 5.

The light flux of the circular secondary light source formed from the rear focal plane of the micro fly-eye lens 5 is condensed by the condensing optical system 6, and then is superimposed on the illumination and the mask M (and further the wafer W) and optically arranged on the mask baffle 7 on the conjugate plane. In this way, a rectangular field similar to the shape of each microlens constituting the micro fly-eye lens 5 is formed on the mask shutter 7. Furthermore, a 1 st correction filter 8 is disposed on the front side (light source side) of the mask blank 7, and a 2 nd correction filter 9 is disposed on the rear side (mask side) of the mask blank 7. The configuration and operation of the 1 st and 2 nd correction filters 8 and 9 will be described later.

The light beam passing through the rectangular opening (light transmission section) of the mask stop 7 is deflected in the-Z direction by the optical path folding mirror by the light converging action of the imaging optical system 10, and then superimposed and illuminated to form a mask M of a predetermined pattern. In this way, the imaging optical system 10 forms an image of the rectangular opening of the mask blank 7 on the mask M supported by the mask stage MS. That is, the mask blank 7 is configured to define a field stop of an illumination region formed on the mask M (and further the wafer W).

The light beam transmitted through the pattern of the mask M forms a mask pattern image on the wafer W of the photosensitive substrate via the projection optical system PL. That is, a pattern image is formed in a rectangular region on the wafer W supported by the wafer stage WS so as to correspond to the rectangular illumination region on the mask M. In this way, the pattern of the mask M is sequentially exposed in each exposure region of the wafer W by performing collective exposure or scanning exposure while two-dimensionally driving and controlling the wafer W in a plane (XY plane) orthogonal to the optical axis AX of the projection optical system PL.

Further, the annular illumination can be realized by setting the diffractive optical element for annular illumination in the illumination light path instead of the diffractive optical element 3. A diffractive optical element for annular illumination converts a rectangular parallel light flux incident along an optical axis AX into a divergent light flux having an annular cross section. Therefore, the light flux passing through the diffractive optical element for annular illumination is formed into an annular field centered on the optical axis AX on the incident surface of the micro fly-eye lens 5. As a result, a secondary light source having a ring shape having substantially the same light intensity distribution as the ring-shaped field formed by the incident surface is formed on the rear focal plane of the micro fly-eye lens 5.

In addition, 4-pole illumination (generally, multipole illumination) can be performed by setting a diffractive optical element for 4-pole illumination (generally, for multipole illumination including 2-pole, 8-pole, and the like) in the illumination optical path instead of the diffractive optical element 3. A diffraction optical element for 4-pole illumination converts a rectangular parallel light flux incident along an optical axis AX into a divergent light flux having a 4-pole cross section. Therefore, the light flux passing through the 4-pole illumination diffractive optical element forms a 4-pole illumination field centered on the optical axis AX, for example, on the incident surface of the micro fly-eye lens 5. As a result, a 4-pole secondary light source having substantially the same light intensity distribution as the 4-pole field formed by the incident surface is also formed on the rear focal plane of the micro fly-eye lens 5.

Fig. 2 is a schematic view showing the configuration and operation of a pair of correction filters according to the present embodiment. In the present embodiment, as shown in fig. 2, the 1 st correction filter 8 is disposed on the front side (light source side) of the mask blank 7, and the 2 nd correction filter 9 is disposed on the rear side (mask side) of the mask blank 7, that is, the 1 st correction filter 8 and the 2 nd correction filter 9 are determined to be different in position from each other in the optical axis direction of the illumination optical device. The 1 st correction filter 8 and the 2 nd correction filter 9 are examples each having parallel plates, and have transmittance distributions whose transmittances differ depending on incident positions. That is, for example, a dense pattern of light-shielding dots (dots) made of chromium, chromium oxide, or the like is formed as an adjustment film on the optical surface of the 1 st correction filter 8 on the mask blank 7 side and the optical surface of the 2 nd correction filter 9 on the mask blank 7 side. That is, the optical surface of the 1 st correction filter 8 on the mask blank 7 side and the optical surface of the 2 nd correction filter 9 on the mask blank 7 side become adjustment surfaces.

Specifically, the 1 st correction filter 8 is, for example, a transmittance distribution having a quadratic concave pattern in which the transmittance is the lowest at the center of the effective region in the Y direction and monotonically increases toward the periphery according to a quadratic function of the distance from the center, as shown in fig. 3A. On the other hand, the 2 nd correction filter is, for example, a transmittance distribution having a quadratic convex pattern in which the transmittance is highest at the center of the effective region in the Y direction and decreases monotonously toward the periphery according to a quadratic function of the distance from the center, as shown in fig. 3B.

However, the difference between the maximum value of the transmittance around the effective region of the 1 st correction filter 8 and the minimum value of the transmittance at the center is set to, for example, 4%, and the difference between the minimum value of the transmittance around the effective region of the 2 nd correction filter 9 and the maximum value of the transmittance at the center is set to, for example, 4%, that is, the 1 st correction filter 8 has a transmittance distribution having a quadratic 4% concave pattern, and the 2 nd correction filter 9 has a quadratic 4% convex transmittance distribution. As a result, the 1 st correction filter 8 and the 2 nd correction filter 9 have complementary transmittance distributions.

In the present embodiment, the distance between the 1 st correction filter 8 (strictly, the optical surface of the adjustment film on the mask side) and the mask blank 7 and the distance between the 2 nd correction filter 9 (strictly, the optical surface of the adjustment film on the light source side) and the mask blank 7 are set to be equal to each other. Here, attention is paid to a light beam reaching a center point P1 intersecting the optical axis AX on the mask M on the irradiated surface (or the wafer W on the final irradiated surface), a light beam reaching a point P2 apart from the center point P1 by a predetermined distance in the + Y direction, and a light beam reaching a point P3 apart from the center point P1 by the same predetermined distance in the-Y direction.

However, in a state where the pupil luminance distribution at the center point P1, the pupil luminance distribution at the point P2, and the pupil luminance distribution at the point P3 are uniform, as indicated by the hatched portion above the 1 st correction filter 8 in fig. 2, without passing through the 1 st and 2 nd correction filters 8 and 9. In addition, the pupil luminance distribution at a certain point on the illuminated surface is uniform, and it is not unusual that the light intensity distribution of the light reaching this point on the illumination pupil surface (for example, on the rear focal surface of the micro fly-eye lens 5) is uniform.

Here, by the action of the 1 st correction filter 8 only through the 1 st correction filter 8 having the transmittance of the quadratic 4% concave pattern, as shown by the diagonal portions between the 1 st correction filter 8 and the mask blank 7 and between the mask blank 7 and the 2 nd correction filter 9 in fig. 2, the pupil luminance distribution with respect to the center point P1 changes from the uniform pattern to the concave pattern, the pupil luminance distribution with respect to the point P2 changes from the uniform pattern to the oblique pattern, and the pupil luminance distribution with respect to the point P3 changes from the uniform pattern to the oblique pattern in the direction opposite to the oblique direction of the oblique pattern of the point P2.

In short, the adjustment film of the 1 st correction filter 8 emits light having a light intensity distribution different from that of the incident light, the light intensity distribution when the light flux reaching the center point P1 passes through the adjustment film of the 1 st correction filter 8 changes from the uniform intensity distribution to the concave intensity distribution, the light intensity distribution when the light flux reaching the point P2 passes through the adjustment film of the 1 st correction filter 8 changes from the uniform intensity distribution to the inclined intensity distribution, and the light intensity distribution when the light flux reaching the point P3 passes through the adjustment film of the 1 st correction filter 8 changes from the uniform distribution to the inclined intensity distribution opposite to the inclined intensity distribution of the point P2.

Further, when the 1 st correction filter 8 is added through the 2 nd correction filter 9 having the transmittance distribution of the quadratic 4% convex pattern, the pupil luminance component with respect to the center point P1 is restored from the concave pattern to a uniform pattern and the inclination degree of the inclination pattern with respect to the pupil luminance components of the point P2 and the point P3 is changed to a more advanced inclination pattern as shown by the oblique line portions between the 2 nd correction filter 9 and the imaging optical system 10 (or the imaging optical system 10+ the projection optical system PL) and between the imaging optical system 10 (or the imaging optical system 10+ the projection optical system PL) and the mask M (or the wafer W) in fig. 2 by the action of the second correction filter 9.

In short, the adjustment film of the 2 nd correction filter 9 emits light having a light intensity distribution different from that of the incident light, the intensity distribution when the light flux reaching the center point P1 passes through the adjustment film of the 1 st correction filter 8 is changed from the concave intensity distribution to the uniform intensity distribution, the intensity distribution when the light flux reaching the point P2 passes through the adjustment film of the 2 nd correction filter 9 is changed from the oblique distribution to the more oblique intensity distribution, and the light flux reaching the point P3 passes through the adjustment film of the 2 nd correction filter 9 is changed from the oblique distribution to the more oblique intensity distribution.

In other words, due to the cooperation of the 1 st correction filter 8 and the 2 nd correction filter 9, the uniform pupil luminance distribution at the center point P1 (and the point having the same Y coordinate as P1) is unchanged, the uniform pupil luminance distribution at the point P2 (and the point having the same Y coordinate as P2) is changed in a linear inclination pattern, and the uniform pupil luminance distribution at the point P3 (and the point having the same Y coordinate as P3) is changed in a linear inclination pattern inclined in the opposite inclination direction to the inclination pattern at the point P2. The degree of tilt adjustment of the pupil luminance distribution of the points P2 and P3 depends on the distance in the Y direction from the center point P1 of the points P2 and P3.

That is, the farther from the center point P1 in the Y direction, the greater the degree of linear inclination adjustment of the pupil luminance distribution with respect to that point. As is clear from fig. 2, the size of the region (hereinafter referred to as "partial region") where the light beam reaching each point on the irradiated surface passes through each of the 1 st correction filter 8 and the 2 nd correction filter 9 is larger as the 1 st correction filter 8 and the 2 nd correction filter 9 are separated from the mask blank 7, and the degree of linear inclination adjustment of the pupil luminance distribution at each point is also larger. Of course, when the degree of change in the transmittance distribution of the 1 st correction filter 8 and the 2 nd correction filter (4% in the above example) is set to be larger, the degree of adjustment of the linear inclination of the pupil luminance distribution with respect to each point becomes larger.

As described above, in the present embodiment, the 1 st correction filter 8 and the 2 nd correction filter 9 have the complementary transmittance distributions, the 1 st correction filter 8 and the 2 nd correction filter 9 are set at the same distance from the mask shutter 7, and the positions and sizes of the partial regions of the respective points on the irradiated surface are roughly the same for the 1 st correction filter 8 and the 2 nd correction filter 9. As a result, the pupil luminance distribution of each point on the irradiated surface is adjusted on a point-by-point basis by the synergistic action of the 1 st correction filter 8 and the 2 nd correction filter 9, and the illuminance distribution on the irradiated surface is maintained substantially uniform without substantially changing.

As described above, in the present embodiment, when the light flux reaching the 1 st point (for example, the point P1) on the irradiation surface is the 1 st light flux, and the light flux reaching the 2 nd point (for example, the point P2 or the point P3) different from the 1 st point on the irradiation surface is the 2 nd light flux, the state of change of the light intensity distribution given by the 1 st correction filter and the 2 nd correction filter 9 with respect to the 1 st light flux passing through the 1 st correction filter 8 and the 2 nd correction filter 9 is different from the state of change of the light intensity distribution given by the 1 st correction filter 8 and the 2 nd correction filter 9 with respect to the 2 nd light flux passing through the 1 st correction filter 8 and the 2 nd correction filter 9. Thus, pupil luminance distributions of respective points (for example, the 1 st point and the 2 nd point) on the irradiated surfaces (M, W) can be independently adjusted.

That is, in the present embodiment, the 1 st correction filter 8 and the 2 nd correction filter 9 are configured as an adjuster for independently adjusting the pupil luminance distribution for each point on the irradiated surface (M, W). As a result, the exposure apparatus of the present embodiment can maintain the illuminance distribution of the irradiated surfaces (M, W) substantially uniform, and adjust the pupil luminance distribution of each point on the irradiated surface to substantially uniform, thereby faithfully transferring the fine pattern of the mask M onto the wafer W with a desired line width over the entire range of the exposure field.

In the above description, the same effects as those of the above embodiment can be obtained even when the 1 st and 2 nd correction filters 8 and 9 are set at equal distances from the mask plate 7 and from the conjugate plane of the optical conjugate of the wafer W with the final surface to be irradiated therebetween, specifically, for example, at equal distances from the mask M. In the above description, the same effects as those of the above embodiment can be obtained even when the 1 st correction filter 8 has a transmittance distribution of a secondary concave pattern and the 2 nd correction filter 9 has a transmittance distribution of a secondary convex pattern, and when the 1 st correction filter 8 has a transmittance distribution of a secondary convex pattern and the 2 nd correction filter 9 has a transmittance distribution of a secondary concave pattern.

In the above description, the 1 st and 2 nd correction filters 8 and 9 have the transmittance distribution of the secondary pattern, but the present invention is not limited thereto, and various modifications are possible for the pattern of the transmittance distribution given to the 1 st and 2 nd correction filters 8 and 9. Specifically, for example, as shown in fig. 4A, the 1 st correction filter 8 may have a variation of a transmittance distribution of a four-times M-shaped pattern in which the transmittance increases once from the center to the periphery and then decreases as a four-times function of the distance from the center of the effective region in the Y direction.

In this modification, the 2 nd correction filter 9 has a transmittance distribution of a W-shaped pattern of four times, as shown in fig. 4B, in which the transmittance decreases once from the center to the periphery and then increases according to a fourth-order function of the distance from the center of the effective region in the Y direction. In this case, the same effects as those of the above embodiment can be obtained by setting the transmittance distribution of the 1 st correction filter 8 and the transmittance distribution of the 2 nd correction filter 9 to be complementary to each other. However, the 1 st correction filter 8 and the 2 nd correction filter 9 have a relation of transmittance distribution of a quartic pattern, and the inclination adjustment effect of the cubic function is obtained not by the linear inclination adjustment. The pattern transmittance distribution of the 1 st and 2 nd correction filters 8 and 9 may be four times or more. The pattern transmittance distribution of the 1 st and 2 nd correction filters 8 and 9 may contain an oblique component (primary component). For example, the transmittance distribution may be a transmittance distribution in which the gradient component and the second order component (or higher order component of four or more times) are synthesized. The pattern transmittance distribution of the 1 st and 2 nd correction filters 8 and 9 may be an odd-numbered component such as a tertiary component.

In the above description, although the 1 st and 2 nd correction filters 8 and 9 give the one-dimensional transmittance distribution in the Y direction, various modifications are possible in the direction of change of the one-dimensional transmittance distribution. The 1 st and 2 nd correction filters 8 and 9 may be given a two-dimensional transmittance distribution such as a rotationally symmetric transmittance distribution, for example. The transmittance distribution to be given to the 1 st and 2 nd correction filters 8 and 9 may be defined by other suitable functions. For example, the transmittance distributions of the 1 st and 2 nd correction filters 8 and 9 are defined by using zernike polynomials (zernike) as described later, and the pupil luminance distribution of each point on the surface to be irradiated can be adjusted for each point according to various embodiments.

However, in the above embodiment, when the transmittance distribution is given to the 1 st correction filter 8 and the 2 nd correction filter 9 using a dense pattern of light-shielding dots such as chrome dots, it is necessary to set the size of each dot or the distance between the 1 st correction filter 8 and the 2 nd correction filter 9 and the mask blank 7 in order to evaluate the influence of the transfer of each dot to the wafer W and the diffraction at each dot. In the above description, the transmittance distribution is given to the 1 st and 2 nd correction filters 8 and 9 using the dense pattern of the light-shielding dots, but the transmittance distribution is not limited to this, and may be given so as to continuously change by controlling the thickness of the thin film of the adjustment film. The transmittance distribution of the light transmitting member itself forming the 1 st and 2 nd correction filters 8 and 9 may be the transmittance distribution given. The transmittance distributions of the 1 st and 2 nd correction filters 8 and 9 are not limited to the transmittance distribution that changes continuously, and may be changed in stages.

In the above embodiment, the transmittance distribution of the 1 st correction filter 8 and the transmittance distribution of the 2 nd correction filter 9 are set so as to be complementary to each other, but the present invention is not limited thereto, and a modification may be made in which the transmittance distribution of the 1 st correction filter 8 is substantially different from the transmittance distribution compensated for, and the transmittance distribution is given to the 2 nd correction filter 9. In this modification, the illuminance distribution on the irradiation surface is adjusted according to the difference between the transmittance distribution compensated for by the transmittance distribution of the 1 st correction filter 8 and the transmittance distribution compensated for by the transmittance distribution of the 2 nd correction filter 9, and the pupil luminance distributions at the respective points on the irradiation surface can be adjusted to be substantially uniform while the illuminance distribution on the irradiation surface is adjusted to be substantially uniform.

Similarly, in a modification in which the illuminance distribution on the irradiated surface is adjusted positively, the 1 st and 2 nd correction filters 8 and 9 may be set at different distances from each other with the mask shutter 7 in between. In this case, the illuminance distribution on the irradiated surface can be adjusted according to the difference between the distance between the mask blank 7 and the 1 st correction filter 8 and the distance between the mask blank 7 and the 2 nd correction filter 9, and the pupil distributions of the respective points on the irradiated surface can be adjusted to be substantially uniform while the illuminance distribution on the irradiated surface is adjusted to be substantially uniform.

In the above-described embodiment, the 1 st correction filter 8 and the 2 nd correction filter 9 have transmittance distributions different in transmittance depending on the incident position, but the present invention is not limited thereto, and a variation in which transmittance distributions different in transmittance depending on the incident angle are given to a pair of correction filters is also possible. In this modification, for example, as shown in fig. 5, one of the correction filters 8a is disposed on the light source side with respect to the pupil plane 10a (conjugate plane optically conjugate with the illumination pupil plane) of the imaging optical system 10, and the other correction filter 9a is disposed on the mask side with respect to the pupil plane 10a of the imaging optical system 10.

In this case, when the light flux reaching the 1 st point on the irradiation surface is the 1 st light flux and the light flux reaching the 2 nd point different from the 1 st point on the irradiation surface is the 2 nd light flux, the incident angle when the 1 st light flux passes through the correction filters 8a and 9a and the incident angle when the 2 nd light flux passes through the correction filters 8a and 9a are different from each other, and the changing states of the light intensity distribution given to the 1 st light flux correction filters 8a and 9a and the changing states of the light intensity distribution given to the 2 nd light flux correction filters 8a and 9a are different from each other.

Therefore, even in such a case, the same effects as those of the above-described embodiment and the above-described modification can be obtained. That is, when the transmittance distributions of the pair of correction filters 8a and 9a are set to be complementary and the pair of correction filters 8a and 9a are set to be equal to each other across the pupil plane 10a of the imaging optical system 10, the pupil luminance distributions of the respective points on the irradiated surface can be adjusted to be substantially uniform while the illuminance distribution of the irradiated surface is maintained substantially uniform.

Further, by setting the transmittance distributions of the pair of correction filters 8a and 9a so as not to substantially compensate each other, or by setting the pair of correction filters 8a and 9a so as to have different distances from each other across the pupil plane 10a of the imaging optical system 10, the pupil luminance distributions of the respective points on the surface to be irradiated can be adjusted so as to be substantially uniform while the illuminance distribution of the surface to be irradiated is adjusted so as to be substantially uniform. Further, a correction filter having a transmittance distribution different in transmittance according to an incident position and a correction filter having a transmittance distribution different in transmittance according to an incident angle may be used in combination, or a pair of correction filters (8, 9) having a transmittance distribution different in transmittance according to an incident position and a pair of correction filters (8a, 9a) having a transmittance distribution different in transmittance according to an incident angle may be used in combination.

In the above description, the transmittance distribution is given to the pair of correction filters (8, 9; 8a, 9a), but the transmittance distribution is not limited to this, and the same effects as those of the above-described embodiment and the above-described modified examples can be obtained by using the 1 st adjustment film and the 2 nd adjustment film having the reflectance distributions different in reflectance according to the incident position, or by using the 1 st adjustment film and the 2 nd adjustment film having the reflectance distributions different in reflectance according to the incident angle. Further, an adjustment film (correction filter) having a transmittance distribution depending on the incident position or the incident angle and an adjustment film having a reflectance distribution depending on the incident position or the incident angle may be used in combination.

In the above description, by using a pair of correction filters (8, 9; 8a, 9a), in other words, by using a pair of adjustment films (adjustment surfaces), the pupil luminance distribution of each point on the surface to be irradiated can be adjusted to be substantially uniform while the illuminance distribution on the surface to be irradiated is maintained or adjusted substantially uniformly. However, the present invention is not limited to this, and the effects of the present invention can be obtained by using a regulator constituted by a plurality of regulating films (regulating surfaces) having a predetermined transmittance distribution or reflectance distribution. That is, various modifications are possible with respect to the number and arrangement of the adjustment surfaces (adjustment films) constituting the adjuster.

Specifically, for example, as shown in fig. 6, a modification example using three correction filters 11a to 11c having transmittance distributions different in transmittance depending on the incident position is also possible. In the modification of fig. 6, the 1 st correction filter 11a and the 2 nd correction filter 11b are disposed in order from the light source side in the optical path of the condensing optical system 6 between the micro fly-eye lens 5 and the mask blank 7, and the third correction filter 11c is disposed in the optical path between the condensing optical system 6 and the mask blank 7.

In this case, as shown in fig. 7A, 7B, and 7C, the correction filters 11a to 11C are arranged in a mutually different relationship in the optical axis direction of the illumination optical apparatus, and the on-axis light fluxes (light fluxes reaching the intersection of the mask blank 7 and the optical axis AX) pass through the correction filters 11a to 11C, that is, the on-axis partial regions 11aa, 11ba, and 11ca, respectively, are different for each of the correction filters 11a to 11C. Similarly, the regions of the off-axis light flux (light flux reaching a point on the reticle blind 7 away from the optical axis AX), i.e., the off-axis regions 11ab, 11bb, and 11cb, which are the regions where the off-axis light flux passes through the correction filters 11a to 11c are different for each of the correction filters 11a to 11 c.

In this modification, by appropriately setting the transmittance distribution of each of the correction filters 11a to 11c, the pupil luminance distribution at each point on the surface to be irradiated can be adjusted to be substantially uniform while the illuminance distribution on the surface to be irradiated is adjusted to be substantially uniform, such as the positions and sizes of the axially partial region and the axially outer partial region of each of the correction filters 11a to 11 c. More generally, the effects of the present invention can be obtained by appropriately setting the transmittance distribution (or reflectance distribution) of each adjustment surface (adjustment film) using an adjuster having a plurality of adjustment surfaces (adjustment films) having a predetermined transmittance distribution (or reflectance distribution) that varies according to the incident position or incident angle, and by appropriately setting the transmittance distribution (or reflectance distribution) of each adjustment surface (adjustment film) at the positions and sizes of the axially partial region and the axially outer partial region of each adjustment surface (adjustment film).

In this modification, all the correction filters 11a to 11c are arranged in the optical path between the micro fly-eye lens 5 of the optical integrator and the mask shutter 7, and these correction filters 11a to 11c may be arranged in the optical path between the mask shutter 7 and the surface to be irradiated, or only a part of the correction filters (for example, only the correction filter 11c) may be arranged in the optical path between the mask shutter 7 and the surface to be irradiated.

In the above-described embodiments and modifications, when the illuminance distribution of the irradiated surface is changed, the change in the illuminance distribution of the irradiated surface is compensated by using a variable slit device described in, for example, pamphlet of international patent publication No. 2005/048326 or an illuminance distribution control device described in U.S. patent No. 6771350.

In the above description, although the adjustment surface (adjustment film) having the predetermined transmittance distribution (or reflectance distribution) is formed on the optical plane of the correction filter of the embodiment having the parallel flat plate, the adjustment surface (adjustment film) may be formed on the surface of the lens or the mirror, that is, on the convex lens surface, the concave lens surface, the convex reflecting surface, the concave reflecting surface, or the like. However, in general, it is easy to manufacture the optical member having a planar optical surface when forming an adjustment surface (adjustment film) on the optical plane of the optical member.

Fig. 8 is a schematic flowchart showing steps of the method for adjusting the illumination optical device according to the present embodiment. As shown in fig. 8, in the adjustment method for the illumination optical devices (1 to PL) according to the present embodiment, pupil luminance distributions at a plurality of points on the illuminated surface and illuminance distributions on the illuminated surface are acquired (S11). Specifically, in the distribution obtaining routine S11, the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated are calculated based on the design data of the illumination optical devices (1 to PL).

Here, as design data of the illumination optical devices (1 to PL), for example, data of optical systems (6 to PL) from the rear side of the micro fly-eye lens 5 to the front side of the wafer W, that is, data of the radius of curvature of each optical surface, the on-axis interval of each optical surface, the refractive index and the type of the optical material forming each optical member, the wavelength of light, the transmittance of each optical member, the incident angle characteristics of the antireflection film and the reflection film, and the like are used. Further, as a method for calculating the pupil luminance distribution at a plurality of points on the surface to be irradiated based on the design data, for example, refer to the pamphlet of international publication No. WO 02/031570. Further, a method of calculating an illuminance distribution on an irradiated surface based on design data is known, and for example, refer to japanese patent laid-open No. 3-216658.

Alternatively, in the distribution obtaining step S11, pupil luminance distributions at a plurality of points on the surface to be irradiated and illuminance distributions on the surface to be irradiated may be measured for each device actually manufactured. Specifically, the pupil luminance distribution at a plurality of points on the illuminated surface can be measured using, for example, the distribution measuring device 20 shown in fig. 9. Further, the measurement of the pupil luminance distribution by the distribution measuring device 20 is performed in a state where the wafer W is retracted from the optical path. The distribution measuring device 20 includes a pinhole member 20a, a condenser lens 20b, and a photodetector 20c such as a two-dimensional CCD.

The pinhole member 20a is disposed at the position of the image forming surface of the projection optical system PL (i.e., at the height position determined by the position of the exposed surface of the wafer W to be exposed). However, the pinhole member 20a is disposed at the front focal position of the condenser lens 20b, and the photodetector 20c is disposed at the rear focal position of the condenser lens 20 b. Therefore, the detection surface of the photodetector 20c is disposed at a position optically conjugate to the position of the aperture stop AS of the projection optical system PL. In the distribution measuring apparatus 20, the light passing through the projection optical system PL passes through the pinhole of the pinhole member 20a, is condensed by the condenser lens 20b, and then reaches the detection surface of the photodetector 20 c.

In this way, a light intensity distribution corresponding to the light intensity distribution at the position of the aperture stop AS is formed on the detection surface of the photodetector 20 c. That is, the distribution measuring device 20 measures the light intensity distribution at the position where the light flux reaching the pinhole of the pinhole member 20a is formed at the aperture stop AS (the position optically conjugate with the rear focal plane of the micro fly-eye lens 5), that is, the pupil luminance distribution at the pinhole point on the irradiated surface. As a result, the wafer stage WS is moved two-dimensionally along the plane orthogonal to the optical axis AX of the projection optical system PL, and the measurement is repeated while moving the pinhole position of the pinhole member 20a two-dimensionally. The pupil luminance distribution at a desired plurality of points on the illuminated surface can be measured.

The illuminance distribution on the surface to be irradiated can be measured, for example, by using an illuminance measuring device 25 shown in fig. 10. The wafer W is also moved out of the optical path in the illuminance distribution measurement by the illuminance measuring device 25. The illuminance measuring device 25 is a photodetector for measuring the illuminance distribution on the imaging surface (i.e., the irradiated surface) of the projection optical system PL, and includes, for example, a photodiode (photodiode)25a, and the output of the photodiode 25a is connected to the signal processing unit 25 b.

The illuminance measuring device 25 sequentially measures illuminance distribution data at each position on the image forming surface of the projection optical system PL via the photodiode 25a by two-dimensional movement of the wafer stage WS along the plane orthogonal to the optical axis AX of the projection optical system PL. Further, a configuration may be adopted in which the plurality of photodiodes 25a are arranged two-dimensionally, and illuminance distribution data on the image formation surface of the projection optical system PL is collectively measured without moving the wafer stage WS. Further, a configuration may be adopted in which a plurality of photodiodes 25a are arranged in a linear shape, and illuminance distribution data on the image formation surface of the projection optical system PL is measured by scanning by moving the wafer stage WS in one dimension.

Next, the adjustment method of the present embodiment determines (S12) whether or not the pupil luminance distribution and the illuminance distribution on the irradiated surface at a plurality of points on the irradiated surface calculated based on the design data or measured by using the devices 20 and 25 are substantially uniform to a desired degree. In the determination step S12, if it is determined that at least one of the pupil luminance distribution and the illuminance distribution is not substantially uniform to a desired degree (in the case of NO in the figure), the design step S13 of the correction filter is performed. On the other hand, in the determination step S12, when it is determined that both the pupil luminance distribution and the illuminance distribution are substantially uniform to a desired degree (YES in the figure), the process proceeds to a determination step S15 of correcting the filter dot density pattern.

In the designing step S13, the pupil luminance distribution at a plurality of points on the illuminated surface is adjusted independently from each other so that both the pupil luminance distribution and the illuminance distribution are substantially uniform to a desired degree, and a desired transmittance distribution to be given by each of the plurality of adjustment films is determined (calculated) as necessary for adjusting the illuminance distribution on the illuminated surface. Specifically, the number and positions of correction filters to be used are assumed in advance with reference to the information of the calculated or measured pupil luminance distribution and illuminance distribution, and the transmittance distribution to be given to each correction filter is determined so that the pupil luminance distribution at each point on the irradiated surface is substantially uniform while the illuminance distribution on the irradiated surface is maintained or adjusted to be substantially uniform.

Next, the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated are calculated with the state in which the plurality of correction filters having the assigned transmittance distribution determined in the designing step S13 are arranged at the assumed positions, that is, the mounting state of the correction filters (S14). Specifically, in the distribution calculating step S14, the pupil luminance distribution and the illuminance distribution are calculated by referring to the design data information and the information on the transmittance distribution and the position of each correction filter.

Next, it is determined whether or not the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated, which are calculated in the distribution calculating step S14, are substantially uniform to respective desired degrees (S12). In the determination step S12, when at least one of the pupil luminance distribution and the illuminance distribution is determined not to be substantially uniform to a desired degree (in the case of NO in the figure), the design step S13 of the correction filter is further performed. On the other hand, in the determination step S12, when it is determined that both the pupil luminance distribution and the illuminance distribution are substantially uniform to a desired degree (YES in the figure), the process proceeds to a determination step S15 of correcting the dot density pattern of the filter.

For example, the pattern determining step S15 performed in the designing step S13 and the distribution calculating step S14 is repeated by the successive approximation (try-and-error), and the dense pattern of light-shielding dots necessary for determining the required transmittance distribution (the transmittance distribution to be given to each correction filter) calculated in the designing step S13 is realized. Finally, a plurality of correction filters having the dot density pattern determined in the pattern determining step S15 are manufactured, and the manufactured correction filters are assembled at predetermined positions in the optical system (S16). As described above, the pattern determining step S15 and the manufacturing and mounting step S16 constitute an adjusting step of forming and arranging a plurality of adjusting films each having a desired transmittance distribution. Thus, the adjustment method of the present embodiment is ended.

Next, a modification of the present embodiment will be described with respect to an adjustment method by which a desired transmittance distribution to be given to each correction filter can be obtained easily and accurately without successive approximation. Fig. 11 is a schematic flowchart showing steps of an adjustment method according to a modification of the present embodiment. The adjustment method of the modification shown in fig. 11 is similar to the adjustment method shown in fig. 8, and pupil luminance distributions at a plurality of points on the surface to be irradiated and illuminance distributions on the surface to be irradiated are obtained (S21). Specifically, in the distribution obtaining step S21, the pupil luminance distribution of a plurality of points on the illuminated surface and the illuminance distribution on the illuminated surface are calculated based on the design data of the illumination optical devices (1 to PL). Alternatively, the pupil luminance distribution at a plurality of points on the irradiated surface of each device actually manufactured and the illuminance distribution on the irradiated surface are measured using the above-described devices 20 and 25.

Next, similarly to the adjustment method shown in fig. 8, it is determined whether or not the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated, which are calculated based on the design data or measured using the devices 20 and 25, are substantially uniform to the respective desired degrees (S22). In the determination step 22, when at least one of the pupil luminance distribution and the illuminance distribution is not substantially uniform to a desired degree (in the case of NO in the figure), the process proceeds to an approximation step 23 of the pupil luminance distribution. On the other hand, in the determination step 22, when it is determined that both the pupil luminance distribution and the illuminance distribution are substantially uniform to a desired degree (YES in the figure), the process proceeds to a determination step 27 for correcting the dot density pattern of the filter.

In the pupil luminance distribution approximation step S23, the pupil luminance distribution of each point on the illuminated surface obtained in the distribution obtaining step S21 is approximated by a predetermined polynomial as a function of the pupil coordinates of the illumination pupil plane. Specifically, for example, pupil luminance distributions of respective points on the image plane (illuminated plane) of the projection optical system PL are fitted (approximated) to each other by zernike polynomials including zernike cylindrical functions Zi (ρ, θ) using pupil polar coordinates (ρ, θ) of the illumination pupil plane of the coordinate system. Here, the relationship between the image plane coordinates and the pupil coordinates of the projection optical system PL, that is, the relationship between the image plane orthogonal coordinates (y, z) and the pupil orthogonal coordinates (ξ, η) and the image plane polar coordinates (h, α) and the pupil polar coordinates (ρ, θ) is schematically shown in fig. 12. Here, h and ρ are normalized radii (original: normalized), and α and θ are radial angles (original: dynamic radius angle) of polar coordinates.

The pupil luminance distribution I (ρ, θ) is developed by the following equation (1) for each point on the image plane of the projection optical system PL using the cylindrical function Zi (ρ, θ) of zernike.

I(ρ，θ)＝ΣCi.Zi(ρ，θ)

＝C1.Z1(ρ，θ)+C2.Z2(ρ，θ)

...+Cn.Zn(ρ，θ) (1)

Here, Ci is a coefficient of each term of zernike polynomials. Hereinafter, the functions of each term of zernike polynomials Zi (P, θ) are expressed in table (1) below as functions Z1 to Z36 of items 1 to 36.

Watch (1)

Z1：1

Z2：ρcosθ

Z3：ρsinθ

Z4：2ρ²-1

Z5：ρ²cos2θ

Z6：ρ²sin2θ

Z7：(3ρ²-2)ρcosθ

Z8：(3ρ²-2)ρsinθ

Z9：6ρ⁴-6ρ²+1

Z10：ρ³cos3θ

Z11：ρ³sin3θ

Z12：(4ρ²-3)ρ²cos2θ

Z13：(4ρ²-3)ρ²sin2θ

Z14：(10ρ⁴-12ρ²+3)ρcosθ

Z15：(10ρ⁴-12ρ²+3)ρsinθ

Z16：20ρ⁶-30ρ⁴+12ρ²-1

Z17：ρ⁴cos4θ

Z18：ρ⁴sin4θ

Z19：(5ρ²-4)ρ³cos3θ

Z20：(5ρ²-4)ρ³sin3θ

Z21：(15ρ⁴-20ρ²+6)ρ²con2θ

Z22：(15ρ⁴-20ρ²+6)ρ²sin2θ

Z23：(35ρ⁶-60ρ⁴+30ρ²-4)ρcosθ

Z24：(35ρ⁶-60ρ⁴+30ρ²-4)ρsinθ

Z25：70ρ⁸-140ρ⁶+90ρ⁴-20ρ²+1

Z26：ρ⁵cos5θ

Z27：ρ⁵sin5θ

Z28：(6ρ²-5)ρ⁴cos4θ

Z29：(6ρ²-5)ρ⁴sin4θ

Z30：(21ρ⁴-30ρ²+10)ρ³cos3θ

Z31：(21ρ⁴-30ρ²+10)ρ³sin3θ

Z32：(56ρ⁶-104ρ⁴+60ρ²-10)ρ²cos2θ

Z33：(56ρ⁶-104ρ⁴+60ρ²-10)ρ²sin2θ

Z34：(126ρ⁸-280ρ⁶+210ρ⁴-60ρ²+5)ρcosθ

Z35：(126ρ⁸-280ρ⁶+210ρ⁴-60ρ²+5)ρsinθ

Z36：252ρ¹0-630ρ⁸+560ρ⁶-210ρ⁴+30ρ²-1

Therefore, in the approximation step S23, pupil luminance distributions obtained at a plurality of points on the illuminated surface (the image plane of the projection optical system PL) are fitted with zernike polynomials, and each zernike coefficient Ci is calculated for each point. Further, the method of fitting zernike polynomials to pupil luminance distributions (pupil transmittance distributions) can be referred to the above-mentioned pamphlet of international publication WO02/031570 and japanese patent laid-open No. 2004-126010.

Next, in the adjustment method of the present modification, based on the coefficients Ci in the zernike polynomial obtained in the last step S23, the pupil luminance distribution of each point is evaluated by the pupil luminance distribution polynomial as a function of the image plane polar coordinates (h, α) and the pupil polar coordinates (ρ, θ) (S24). Specifically, in the evaluation step S24, a pupil luminance distribution polynomial in which the pupil luminance distribution of each point is expressed as a function of the image plane polar coordinates (h, α) and the pupil polar coordinates (ρ, θ) is set. Further, the setting of the pupil luminance distribution polynomial can be referred to the specifications and drawings of Japanese patent laid-open No. 2003-257812 or Japanese patent application No. 2004-149698.

In the above-mentioned publication and the like, although the aberration polynomial in which the wavefront aberration of the projection optical system is expressed by a function of the image plane polar coordinates (h, α) and the pupil polar coordinates (ρ, θ) is set, it is clear that the pupil luminance distribution polynomial can be set by the same method. In this manner, in the evaluation step S24, the coefficients of the terms in the pupil luminance distribution polynomial are determined based on the zernike coefficients Ci of the terms in the zernike polynomial obtained in the approximation step (S23), and the pupil luminance distribution at each point is expressed and evaluated by the pupil luminance distribution polynomial.

Specifically, as disclosed in the above-mentioned publication and the like, the zernike function Zi for the specific term is determined by using, for example, the least square method for determining the coefficient of the specific term in the pupil luminance distribution polynomial based on the in-image distribution (distribution of the coefficient Ci at each point) of the corresponding zernike coefficient Ci. Furthermore, the zernike functions Zi targeting other specific terms are sequentially determined by using, for example, the least square method, coefficients of other terms of the pupil luminance distribution polynomial based on the in-image distribution of the corresponding zernike coefficients Ci.

In this manner, in the evaluation step S24, a pupil luminance distribution polynomial is finally obtained which simultaneously expresses the intra-pupil distribution and the in-image plane distribution of the pupil luminance distribution. Thus, by using the pupil luminance distribution polynomial which expresses both the intra-pupil distribution and the intra-image distribution of the pupil luminance distribution, it is possible to analytically decompose the pupil luminance distribution, and it is possible to calculate the optical adjustment solution quickly and accurately compared to the numerical optimization method in which successive approximation is performed using a computer. In short, the relationship of the characteristics of the pupil luminance distribution state can be easily grasped by the pupil luminance distribution polynomial, and the optical adjustment can be easily expressed.

Next, in the correction filter designing step 25, the pupil luminance distributions at the plurality of points on the irradiated surface are adjusted independently from each other so that both the pupil luminance distribution and the illuminance distribution are substantially uniform to a desired extent, and a desired transmittance distribution to be given to each of the plurality of adjustment films is determined (calculated) as necessary for adjusting the illuminance distribution on the irradiated surface. Specifically, the illuminance distribution on the irradiated surface obtained in the distribution obtaining step S21 is approximated by zernike polynomials as a function of the image plane polar coordinates (h, α), as necessary.

The transmittance distribution to be given to each of the compensators is expressed by, for example, zernike polynomials using polar coordinates on the optical surface of the adjustment film. However, table 1 (table) T21 and table 2T 22 are prepared. The 1 st table T21 shows the relationship between the coefficients of zernike polynomials representing the transmittance distribution of the correction filters and the change in pupil luminance distribution at each point on the irradiated surface. Table 2T 22 shows the relationship between the coefficients of the zernike polynomials indicating the transmission filter distributions of the correction filters and the change in the illuminance distribution on the irradiated surface.

In this way, in the designing step S25, based on the evaluation result of the pupil luminance distribution obtained in the evaluation step S24 (specifically, based on the pupil luminance distribution polynomial expressing both the intra-pupil distribution and the intra-image distribution of the pupil luminance distribution), the transmittance distribution to be given to each correction filter is determined in order to make the pupil luminance distribution substantially uniform on the irradiated surface while maintaining or adjusting the luminance distribution on the irradiated surface, and the transmittance distribution to be given to each correction filter is determined in order to make the pupil luminance distribution at each point on the irradiated surface substantially uniform, in accordance with the luminance distribution information approximated by zernike polynomials as necessary, and the optimization method by linear combination of the correlation between the transmittance distribution of each correction filter and the change in the luminance distribution in table 1T 21 and the correlation between the transmittance distribution of each correction filter and the change in the luminance distribution in table 2T 22.

Next, the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated are calculated from the mounting state of the correction filter, which is the state in which each of the plurality of correction filters having the transmittance distribution determined in the designing step S25 is arranged at the assumed position (S26). Further, it is determined whether or not the pupil luminance distribution at a plurality of points on the surface to be irradiated and the illuminance distribution on the surface to be irradiated, which are calculated in the distribution calculating step S26, are substantially uniform to respective desired degrees (S22). The required transmittance distribution using the optimization method using linear combination is not a relationship that can be simply and accurately obtained by successive approximation, and both the pupil luminance distribution and the illuminance distribution are determined to be substantially uniform to a desired degree in the determination step S22, and the determination step S27 of correcting the dot density pattern of the filter is performed.

In the pattern determining step S27, a dense pattern of light-shielding dots necessary to achieve the desired transmittance distribution (transmittance distribution to be imparted to each correction filter) calculated in the designing step S25 is determined. Finally, a plurality of correction filters having a dot density pattern determined in the pattern determining step S27 are manufactured, and each of the manufactured correction filters is assembled at a predetermined position in the optical system (S28). Thus, the adjustment method of the modified example is completed.

In the above-described embodiments and modifications of the adjustment method, the method of actually measuring the pupil luminance distribution and the illuminance distribution is applied to the distribution obtaining steps S11 and S21, and is very useful for, for example, correcting the manufacturing error of an apparatus to be actually manufactured or correcting the aged deterioration of an apparatus in use.

In the above embodiments and modifications, the plurality of adjustment surfaces of the adjuster are not limited to have a predetermined transmittance distribution or reflectance distribution, and light having a light intensity distribution different from that of the incident light may be emitted by changing the density of the incident light beam using, for example, the diffraction action of the diffractive optical element.

In the above-described embodiments and modifications, the catadioptric projection optical system described in international patent publication No. 2004/019128 can be used as the projection optical system. Further, a catadioptric projection optical system described in U.S. patent publication No. 2004/107011 pamphlet or international patent publication No. 2005/59617, and U.S. patent publication No. 2005/0117224 may be used. Here, in the catadioptric projection optical system described in the pamphlet of international patent publication No. 2004/019128 or U.S. patent publication No. 2005/0117224, when the pupil luminance distribution on the wafer W of the irradiated surface has an inclined distribution by including one or more optical path folding mirrors, a component for correcting the inclined distribution of the pupil luminance distribution may be given to one or more of the plurality of adjustment surfaces of the adjuster in the above-described embodiments and modifications.

The exposure apparatus of the above embodiment can manufacture microdevices (semiconductor device, imaging device, liquid crystal display device, thin film magnetic head, etc.) by illuminating a mask (reticle) with an illumination optical device (illumination step) and exposing a transfer pattern formed on the mask to a photosensitive substrate using a projection optical system (exposure step). An example of a method for obtaining a semiconductor device as a micro device by forming a circuit pattern on a wafer of a photosensitive substrate or the like using the exposure apparatus of the above embodiment will be described below with reference to a flowchart of fig. 13.

First, at stage 301 of fig. 13, a metal film is deposited on a batch of wafers. In a next stage 302, a photoresist is coated on a metal film on a batch of wafers. Thereafter, in step 303, the pattern image on the mask is sequentially exposed and transferred to the respective imaging areas on the batch of wafers via the projection optical system using the exposure apparatus of the above embodiment. Thereafter, at step 304, the resist on the batch of wafers is developed, and at step 305, the resist on the batch of wafers is etched using the resist as a mask to form circuit patterns corresponding to the patterns on the mask, and the circuit patterns are formed on the respective wafer. Thereafter, a circuit pattern is formed in an upper layer, thereby manufacturing a device such as a semiconductor device. According to the semiconductor device manufacturing method, a semiconductor device having an extremely fine circuit pattern can be obtained with good throughput (throughput).

The exposure apparatus of the above embodiment can also obtain a liquid crystal display device of a microdevice by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). An example of this method will be described below with reference to the flowchart of fig. 14. In fig. 14, in a pattern forming step 401, a mask pattern is transferred and exposed to a photosensitive substrate (a resist-coated glass substrate or the like) using the exposure apparatus of the above embodiment, and a so-called photolithography etching step is performed. In this photolithography etching step, a predetermined pattern including a plurality of electrodes and the like is formed on a photosensitive substrate. Thereafter, the exposed substrate is subjected to a developing step, an etching step, a resist stripping step, etc., to form a predetermined pattern on the substrate, and then the process proceeds to the next color filter forming step.

Next, in the color filter forming step 402, a plurality of three dot groups corresponding to red r (red), green g (green), and blue b (blue) are formed in an array, or a filter group of R, G, B three lines is formed in a plurality of horizontal scanning line directions. However, after the color filter forming step 402, a cell assembling step 403 is performed. In a cell assembly step 403, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern formation step 401, the color filter obtained in the color filter formation step 402, and the like.

In the cell assembling step 403, for example, liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step 401 and the color filter obtained in the color filter forming step 402 to manufacture a liquid crystal panel (liquid crystal cell). Then, in a module assembling step 404, a circuit for causing the assembled liquid crystal panel (liquid crystal cell) to perform a display operation is installed, and the liquid crystal display element is completed by irradiating light and other components. According to the method for manufacturing a liquid crystal display device, a liquid crystal display device having an extremely fine circuit pattern can be obtained with good throughput.

In the above-mentioned embodiments, the exposure light is not limited to KrF excimer laser (wavelength: 248nm) or ArF excimer laser (wavelength: 193nm), but other suitable laser sources such as F2 laser source supplying laser light with a wavelength of 157nm can be used. Further, although the above embodiments have been described with reference to the exposure apparatus including the illumination optical apparatus as an example, it is apparent that the present invention is applicable to a general illumination optical apparatus for illuminating an irradiated surface other than a mask or a wafer.

In the above-described embodiment, a method of filling the optical path between the projection optical system and the photosensitive substrate with a medium (typically, a liquid) having a refractive index larger than 1.1, so-called a liquid immersion method, may be applied. In this case, as a method for filling the optical path between the projection optical system and the photosensitive substrate with the liquid, there can be used a partial liquid filling method disclosed in International publication No. WO99/49504, a method for moving a stage holding the substrate to be exposed in a liquid bath disclosed in Japanese patent laid-open No. Hei 6-124873, a method for forming a liquid bath having a predetermined depth on the stage and holding the substrate therein disclosed in Japanese patent laid-open No. 10-303114, and the like.

Further, in the case of a liquid, it is preferable to use a refractive index as high as possible that is transmissive to exposure light and to stabilize a resist applied to a projection optical system or a substrate surface, for example, in the case of KrF excimer laser or ArF excimer laser as exposure light, pure water, deionized water or glycerol (CH) can be used for the liquid₂[OH]CH[OH]CH₂[OH]) Heptane (heptane) (C)₇H₁₆) Or with H⁺、Cs^-、K⁺、C1^-、SO₄ ^2-Water mixed with fine particles of aluminum oxide, isopropyl alcohol (isopropanol), hexane (hexane), decane (decane), etc. Further, F is used as the exposure light₂In the case of laser light, using transmissive F for the liquid₂The laser may be a fluorine-based liquid such as fluorine-based oil or Perfluoropolyether (PFPE).

Although the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

Claims (51)

1. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a pupil distribution forming part for forming a pupil luminance distribution having a predetermined luminance distribution on an illumination pupil plane; and

an adjuster for independently adjusting the pupil luminance distributions of the respective points on the illuminated surface; and is

The adjuster has a plurality of adjustment surfaces that are respectively arranged in optical paths between the pupil distribution forming section and the irradiated surface; and

each of the adjustment surfaces emits light having a light intensity distribution different from that of the incident light;

the plurality of adjusting surfaces comprise a 1 st adjusting surface and a 2 nd adjusting surface;

the size of a light beam reaching a predetermined point on the irradiated surface when passing through the 1 st adjustment surface is different from the size of a light beam reaching the predetermined point on the irradiated surface when passing through the 2 nd adjustment surface.

2. The illumination optical device according to claim 1, wherein when the light beam reaching a 1 st point on the illuminated surface is a 1 st light beam, and the light beam reaching a 2 nd point different from the 1 st point on the illuminated surface is a 2 nd light beam,

the amount of change in the light intensity distribution given when the 1 st light beam passes through the plurality of adjustment surfaces is different from the amount of change in the light intensity distribution given when the 2 nd light beam passes through the plurality of adjustment surfaces.

3. The illumination optical device according to claim 2, wherein the plurality of adjustment surfaces are arranged at mutually different positions along an optical axis direction of the illumination optical device.

4. The illumination optical apparatus according to claim 3, wherein each of the adjustment surfaces has a predetermined transmittance distribution or reflectance distribution.

5. The illumination optical apparatus according to claim 4, wherein the adjuster comprises:

a 1 st adjusting surface having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident positions; and

a 2 nd adjustment surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution being substantially complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

6. The illumination optical apparatus according to claim 5, characterized in that:

the 1 st adjustment surface is disposed closer to the light source than a conjugate surface of an optical conjugate of the irradiated surface, and the 2 nd adjustment surface is disposed closer to the irradiated surface than the conjugate surface.

7. The illumination optical apparatus according to claim 4, wherein the adjuster comprises:

a 1 st adjusting surface having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident angles; and

a 2 nd adjustment surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution being substantially complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

8. The illumination optical apparatus according to claim 7, characterized in that:

the 1 st adjustment surface is disposed closer to the light source than a conjugate surface of an optical conjugate of the illumination pupil surface, and the 2 nd adjustment surface is disposed closer to the irradiated surface than the conjugate surface.

9. The illumination optical apparatus according to claim 4, characterized in that:

the transmittance distribution or reflectance distribution of each adjustment surface is an even-numbered distribution.

10. The illumination optical apparatus according to claim 4, wherein the adjuster comprises:

a 1 st adjustment surface having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectivities depending on incident positions; and

a 2 nd adjusting surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution, wherein the 2 nd transmittance distribution or the 2 nd reflectance distribution has different transmittance or reflectance according to different incident angles.

11. The illumination optical apparatus according to claim 1, characterized in that:

the adjustment surface is formed on the plane of an optical member having a plane.

12. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a pupil distribution forming part for forming a pupil luminance distribution having a predetermined luminance distribution on an illumination pupil plane; and

an adjuster for independently adjusting the pupil luminance distributions of the respective points on the illuminated surface; and is

The adjuster has a plurality of adjustment surfaces arranged in an optical path between the pupil distribution forming section and the irradiated surface, the adjustment surfaces having a predetermined transmittance distribution or reflectance distribution; and

the adjustment surfaces are arranged at different positions along the optical axis direction of the illumination optical device;

the regulator includes:

a 1 st adjusting surface having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident positions; and

a 2 nd adjustment surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution being substantially different from a complementary transmittance distribution or reflectance distribution of the 1 st transmittance distribution or the 1 st reflectance distribution;

the first adjustment surface is disposed closer to the light source than a conjugate surface of an optical conjugate of the irradiated surface, and the 2 nd adjustment surface is disposed closer to the irradiated surface than the conjugate surface.

13. The illumination optical apparatus according to claim 12, characterized in that:

and the adjuster adjusts the illuminance distribution of the irradiation surface in accordance with a difference between the complementary transmittance distribution or reflectance distribution and the 2 nd transmittance or 2 nd reflectance distribution.

14. The illumination optical apparatus according to claim 12, characterized in that:

the distance between the 1 st adjustment surface and the conjugate surface is approximately equal to the distance between the 2 nd adjustment surface and the conjugate surface.

15. The illumination optical apparatus according to claim 12, characterized in that:

a 1 st distance between the first adjustment surface and the conjugate surface is substantially different from a 2 nd distance between the 2 nd adjustment surface and the conjugate surface.

16. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a pupil distribution forming part for forming a pupil luminance distribution having a predetermined luminance distribution on an illumination pupil plane; and

an adjuster for independently adjusting the pupil luminance distributions of the respective points on the illuminated surface; and is

The adjuster has a plurality of adjustment surfaces arranged in an optical path between the pupil distribution forming section and the irradiated surface, the adjustment surfaces having a predetermined transmittance distribution or reflectance distribution; and

the adjustment surfaces are arranged at different positions along the optical axis direction of the illumination optical device;

the regulator includes:

a 1 st adjusting surface having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident angles; and

a 2 nd adjustment surface having a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution being substantially different from a complementary transmittance distribution or reflectance distribution of the 1 st transmittance distribution or the 1 st reflectance distribution;

the 1 st adjustment surface is disposed closer to the light source than a conjugate surface of an optical conjugate of the illumination pupil surface, and the 2 nd adjustment surface is disposed closer to the irradiated surface than the conjugate surface.

17. The illumination optical apparatus according to claim 16, characterized in that:

the adjuster adjusts the illuminance distribution of the irradiation surface in accordance with a difference between the compensated transmittance distribution or reflectance distribution and the 2 nd transmittance distribution or the 2 nd reflectance distribution.

18. The illumination optical apparatus according to claim 16, characterized in that:

the distance between the 1 st adjusting surface and the conjugate surface is approximately equal to the distance between the 2 nd adjusting surface and the conjugate surface.

19. The illumination optical apparatus according to claim 16, characterized in that:

a1 st distance between the 1 st adjusting surface and the conjugate surface is substantially different from a 2 nd distance between the 2 nd adjusting surface and the conjugate surface.

20. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a 1 st adjustment surface, which is disposed in an optical path between an illumination pupil surface of the illumination optical device and the illuminated surface, in an optical path closer to the light source side than an optically conjugate surface of the illuminated surface, and has a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident positions; and

and a 2 nd adjustment surface that is disposed in an optical path between the illumination pupil surface and the illuminated surface, in an optical path closer to the illuminated surface side than the conjugate surface of the illuminated surface, and has a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution having different transmittances or reflectances depending on an incident position.

21. The illumination optical apparatus according to claim 20, characterized in that:

the 2 nd transmittance distribution or the 2 nd reflectance distribution is approximately complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

22. The illumination optical apparatus according to claim 20, characterized in that:

the 2 nd transmittance distribution or the 2 nd reflectance distribution is substantially different from the transmittance distribution or reflectance distribution that is substantially complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

23. The illumination optical apparatus according to claim 20, characterized in that:

the distance between the 1 st adjustment surface and the conjugate surface is approximately equal to the distance between the 2 nd adjustment surface and the conjugate surface.

24. The illumination optical apparatus according to claim 20, characterized in that:

a 1 st distance between the first adjustment surface and the conjugate surface is substantially different from a 2 nd distance between the 2 nd adjustment surface and the conjugate surface.

25. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a 1 st adjustment surface, which is disposed in an optical path between an illumination pupil surface of the illumination optical device and the illuminated surface, in an optical path closer to the light source side than an optically conjugate surface of the illuminated surface, and has a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident angles; and

and a 2 nd adjustment surface that is disposed in an optical path between the illumination pupil surface and the illuminated surface, in an optical path closer to the illuminated surface side than the conjugate surface of the illuminated surface, and has a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution having different transmittances or reflectances depending on incident angles.

26. The illumination optical apparatus according to claim 25, characterized in that:

the 2 nd transmittance distribution or the 2 nd reflectance distribution is approximately complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

27. The illumination optical apparatus according to claim 25, characterized in that:

the 2 nd transmittance distribution or the 2 nd reflectance distribution is substantially different from the transmittance distribution or reflectance distribution that is substantially complementary to the 1 st transmittance distribution or the 1 st reflectance distribution.

28. The illumination optical apparatus according to claim 25, characterized in that:

the distance between the 1 st adjustment surface and the conjugate surface is substantially equal to the distance between the 2 nd adjustment surface and the conjugate surface.

29. The illumination optical apparatus according to claim 25, characterized in that:

a 1 st distance between the 1 st adjustment surface and the conjugate surface is substantially different from a 2 nd distance between the 2 nd adjustment surface and the conjugate surface.

30. An illumination optical apparatus for illuminating an illuminated surface with a light beam of a light source, comprising:

a 1 st adjustment surface disposed in an optical path between an illumination pupil surface of the illumination optical device and the illuminated surface, and having a 1 st transmittance distribution or a 1 st reflectance distribution, the 1 st transmittance distribution or the 1 st reflectance distribution having different transmittances or reflectances depending on incident positions; and

a 2 nd adjustment surface disposed in an optical path between the illumination pupil surface and the illuminated surface, and having a 2 nd transmittance distribution or a 2 nd reflectance distribution, the 2 nd transmittance distribution or the 2 nd reflectance distribution having different transmittances or reflectances depending on incident positions; and

the size of a light beam reaching a predetermined point on the irradiated surface when passing through the 1 st adjustment surface and the size of a light beam reaching the predetermined point on the irradiated surface when passing through the 2 nd adjustment surface are different from each other.

31. The method for adjusting an illumination optical apparatus according to any one of claims 1 to 30, comprising:

a pupil luminance distribution calculating step of calculating pupil luminance distributions of a plurality of points on the illuminated surface based on design data of the illumination optical apparatus;

a distribution determining step of determining a required transmittance or reflectance to be provided by each of the plurality of adjustment surfaces to independently adjust the pupil luminance distribution of the plurality of points; and

and an adjusting step of forming and arranging the plurality of adjusting surfaces, respectively, the plurality of adjusting surfaces having the desired transmittance distribution or reflectance distribution, respectively.

32. The adjusting method according to claim 31, comprising an illuminance distribution calculating step of calculating an illuminance distribution of the irradiated surface based on the design data, and

in the distribution determining step, the illuminance distribution is adjusted by calculating a desired transmittance or reflectance to be possessed by each of the plurality of adjustment surfaces.

33. The method for adjusting an illumination optical apparatus according to any one of claims 1 to 30, comprising:

a pupil luminance distribution measuring step of measuring a pupil luminance distribution of a plurality of points on the illuminated surface;

a distribution determining step of determining a desired transmittance distribution or reflectance distribution to be possessed by each of the plurality of adjustment surfaces to individually and independently adjust the pupil luminance distribution of the plurality of points; and

and an adjusting step of forming and arranging the plurality of adjusting surfaces, respectively, the plurality of adjusting surfaces having the desired transmittance distribution or reflectance distribution, respectively.

34. The adjusting method of claim 33, comprising an illuminance distribution measuring step of measuring an illuminance distribution of the irradiated surface, and

in the distribution determining step, the illuminance distribution is adjusted by calculating a transmittance distribution or a reflectance distribution that each of the plurality of adjustment surfaces should have.

35. The method for adjusting an illumination optical apparatus according to any one of claims 1 to 30, comprising:

a pupil luminance distribution obtaining step of obtaining pupil luminance distributions of a plurality of points on the illuminated surface;

an approximation step of approximating the pupil luminance distribution of the plurality of points obtained in the pupil luminance distribution obtaining step by a predetermined polynomial as a function of pupil coordinates of the illumination pupil plane;

an evaluation step of evaluating pupil luminance distributions of the plurality of points using a pupil luminance distribution polynomial which is a function of the image plane coordinates of the illuminated surface and the pupil coordinates, based on coefficients of terms of the predetermined polynomial;

obtaining a correlation between a transmittance distribution or a reflectance distribution that each of the plurality of adjustment surfaces has and a change in pupil luminance distribution at the plurality of points;

a distribution determining step of determining a transmittance distribution or a reflectance distribution to be possessed by each of the plurality of adjustment surfaces, based on the evaluation result of the evaluating step and the correlation, to individually and independently adjust the pupil luminance distribution at the plurality of points; and

and an adjusting step of forming and arranging the plurality of adjusting surfaces, respectively, the plurality of adjusting surfaces having the desired transmittance distribution or reflectance distribution, respectively.

36. The method of adjusting of claim 35, comprising:

an illuminance distribution obtaining step of obtaining an illuminance distribution of the irradiated surface; and

obtaining a 2 nd correlation between a transmittance distribution or a reflectance distribution that each of the plurality of adjustment surfaces should have and a change in illuminance distribution on the surface to be irradiated;

in the distribution determining step, the illuminance distribution is adjusted by determining a desired transmittance distribution or reflectance distribution to be provided in each of the plurality of adjustment surfaces based on the 2 nd correlation.

37. The adjustment method according to claim 36, wherein in the pupil luminance distribution obtaining step, the pupil luminance distribution of the plurality of points on the illuminated surface is calculated based on design data of the illumination optical device.

38. The adjustment method according to claim 36, wherein in the pupil luminance distribution obtaining step, a pupil luminance distribution of a plurality of points on the illuminated surface is measured.

39. The adjustment method according to claim 36, wherein in the illuminance distribution obtaining step, the illuminance distribution of the illuminated surface is calculated based on design data of the illumination optical device.

40. The adjustment method according to claim 36, wherein in the illuminance distribution obtaining step, the illuminance distribution of the irradiated surface is measured.

41. An adjusting method of an illumination optical apparatus, the illumination optical apparatus forming a pupil luminance distribution having a predetermined luminance distribution on an illumination pupil plane according to a light beam from a light source, and illuminating an illuminated plane with the light beam from the pupil luminance distribution, the adjusting method comprising:

a pupil luminance distribution obtaining step of obtaining pupil luminance distributions of a plurality of points on the illuminated surface;

a distribution determining step of determining a transmittance distribution or a reflectance distribution required at a plurality of positions in an optical path of the illumination optical device to independently adjust pupil luminance distributions of the plurality of points, respectively; and

an adjustment step of forming a plurality of adjustment surfaces having the desired transmittance distribution or reflectance distribution, respectively, and disposing the adjustment surfaces at the plurality of positions;

in the pupil luminance distribution obtaining step, the pupil luminance distribution of a plurality of points on the illuminated surface is measured.

42. The adjusting method of claim 41, comprising an illuminance distribution obtaining step of obtaining an illuminance distribution of the irradiated surface, wherein the illuminance distribution is obtained by a computer

In the distribution determining step, a transmittance distribution or a reflectance distribution required for the plurality of positions in the optical path of the illumination optical device is calculated to adjust the illuminance distribution.

43. The adjustment method according to claim 42, wherein in the illuminance distribution obtaining step, an illuminance distribution of the illuminated surface is calculated based on design data of the illumination optical device.

44. The adjustment method according to claim 42, wherein in the illuminance distribution obtaining step, an illuminance distribution of the irradiated surface is measured.

45. The adjustment method according to claim 41, wherein in the pupil luminance distribution obtaining step, the pupil luminance distribution of a plurality of points on the illuminated surface is calculated based on design data of the illumination optical device.

46. An exposure apparatus characterized in that: comprising the illumination optics according to any one of claims 1 to 30,

a predetermined pattern illuminated by the illumination optical device is exposed on a photosensitive substrate.

47. The exposure apparatus according to claim 46, wherein:

the device further comprises a projection optical system, so that the predetermined pattern image is formed on the photosensitive substrate, and the irradiated surface is an image surface of the projection optical system.

48. The exposure apparatus according to claim 46, wherein:

the predetermined pattern surface is located on the irradiated surface.

49. An exposure method characterized by comprising:

an illumination step using the illumination optical device according to any one of claims 1 to 30; and

an exposure step, exposing the predetermined pattern on a photosensitive substrate.

50. The exposure method according to claim 49, wherein:

the exposure step further includes a projection step of forming the predetermined pattern image on the photosensitive substrate; and

the irradiated surface is a surface on which the pattern image is formed.

51. A method for manufacturing a device, comprising:

an exposure step of exposing the predetermined pattern onto the photosensitive substrate using the exposure apparatus according to claim 46; and

a developing step of developing the photosensitive substrate.