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HK1187735B - 浸没曝光装置及方法以及制造设备的方法 - Google Patents

浸没曝光装置及方法以及制造设备的方法 Download PDF

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Publication number
HK1187735B
HK1187735B HK14100504.3A HK14100504A HK1187735B HK 1187735 B HK1187735 B HK 1187735B HK 14100504 A HK14100504 A HK 14100504A HK 1187735 B HK1187735 B HK 1187735B
Authority
HK
Hong Kong
Prior art keywords
liquid
substrate
optical system
exposure
projection
Prior art date
Application number
HK14100504.3A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1187735A (zh
Inventor
Hiroyuki Nagasaka
Takeshi Okuyama
Original Assignee
Nikon Corporation
Nikon Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation, Nikon Engineering Co., Ltd. filed Critical Nikon Corporation
Publication of HK1187735A publication Critical patent/HK1187735A/zh
Publication of HK1187735B publication Critical patent/HK1187735B/zh

Links

HK14100504.3A 2004-06-10 2014-01-17 浸没曝光装置及方法以及制造设备的方法 HK1187735B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004172569 2004-06-10
JP2004245260 2004-08-25
JP2004330582 2004-11-15

Publications (2)

Publication Number Publication Date
HK1187735A HK1187735A (zh) 2014-04-11
HK1187735B true HK1187735B (zh) 2018-02-23

Family

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