[go: up one dir, main page]

HK1178319A - 用於光子检测的半导体结构 - Google Patents

用於光子检测的半导体结构 Download PDF

Info

Publication number
HK1178319A
HK1178319A HK13105894.1A HK13105894A HK1178319A HK 1178319 A HK1178319 A HK 1178319A HK 13105894 A HK13105894 A HK 13105894A HK 1178319 A HK1178319 A HK 1178319A
Authority
HK
Hong Kong
Prior art keywords
contact area
semiconductor structure
substrate
structure according
photodetector
Prior art date
Application number
HK13105894.1A
Other languages
German (de)
English (en)
Other versions
HK1178319B (zh
Inventor
Martin Popp
Beat De Coi
Marco Annese
Original Assignee
Espros Photonics Ag
Filing date
Publication date
Application filed by Espros Photonics Ag filed Critical Espros Photonics Ag
Publication of HK1178319A publication Critical patent/HK1178319A/zh
Publication of HK1178319B publication Critical patent/HK1178319B/zh

Links

HK13105894.1A 2013-05-20 用於光子检测的半导体结构 HK1178319B (zh)

Publications (2)

Publication Number Publication Date
HK1178319A true HK1178319A (zh) 2013-09-06
HK1178319B HK1178319B (zh) 2021-04-09

Family

ID=

Similar Documents

Publication Publication Date Title
US8471293B2 (en) Array of mutually insulated Geiger-mode avalanche photodiodes, and corresponding manufacturing process
CN107403799B (zh) 半导体器件及其制造方法
US8871557B2 (en) Photomultiplier and manufacturing method thereof
US10522696B2 (en) Lateral single-photon avalanche diode and method of producing a lateral single-photon avalanche diode
US20100301442A1 (en) Optical semiconductor device
EP3206234B1 (en) Semiconductor element with a single photon avalanche diode and method for manufacturing such semiconductor element
US10978606B2 (en) Avalanche diode and method of manufacturing an avalanche diode
JP6476317B2 (ja) アバランシェフォトダイオード
US12324250B2 (en) Single-photon avalanche photodiode
US10672808B2 (en) Optical sensor having two taps for photon-generated electrons of visible and IR light
US10374114B2 (en) Lateral single-photon avalanche diode and method of producing a lateral single-photon avalanche diode
KR102114198B1 (ko) 광자 검출을 위한 반도체 구조체
US20210296377A1 (en) Spad pixel circuits and methods thereof for direct time of flight sensors
HK1178319A (zh) 用於光子检测的半导体结构
US20240097052A1 (en) Systems and methods for stacked sensors with electrical insulation
KR101768704B1 (ko) 포토멀티플라이어 및 그의 제조방법
US11145686B2 (en) Semiconductor photodetector device with protection against ambient back light
US20230042681A1 (en) Spad pixel for a backside illuminated image sensor
JP7455407B2 (ja) アバランシェ光検出器(変形形態)およびこれを製造するための方法(変形形態)
HK1178319B (zh) 用於光子检测的半导体结构
EP2555244A1 (en) A method of producing a photodiode device and a photodiode device comprising an etch stop layer