HK1148825B - Pellicle frame and lithographic pellicle - Google Patents
Pellicle frame and lithographic pellicle Download PDFInfo
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- HK1148825B HK1148825B HK11102984.1A HK11102984A HK1148825B HK 1148825 B HK1148825 B HK 1148825B HK 11102984 A HK11102984 A HK 11102984A HK 1148825 B HK1148825 B HK 1148825B
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- pellicle frame
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- mask
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Description
Technical Field
The present invention relates to a pellicle (pellicle) and a pellicle frame (pellicle frame) for lithography, which are used as masks for lithography for blocking dust in the manufacture of semiconductor devices such as LSIs and super LSIs or liquid crystal display panels.
Background
In the manufacture of semiconductors such as LSI and super LSI, or in the manufacture of liquid crystal display panels, light is irradiated onto a semiconductor wafer or a liquid crystal master to form a pattern, but if dust adheres to an exposure master used in this case, the dust absorbs light or deflects light, and thus the pattern after transfer is deformed or the edges are roughened, and in addition to this, the substrate is contaminated and blackened, which causes problems such as deterioration in size, quality, and appearance. In the present invention, the term "exposure master" refers to a general term for a mask for lithography (also simply referred to as "mask") and a reticle (reticle). The mask is described as follows.
These operations are usually performed in a clean room, but it is difficult to always keep the exposure master clean even in a clean room, and therefore, a method of attaching a pellicle film for shielding dust, which allows exposure light to pass through the pellicle film well, to the surface of the exposure master is employed.
The basic structure of the protective film comprises a protective film frame and a protective film (pellicle film) attached on the protective film frame. The pellicle film is composed of nitrocellulose, cellulose acetate, fluorine-based polymer, and the like, which can transmit exposure light (g light, i light, 248nm, 193nm, and the like) well. The upper edge of the pellicle frame is coated with a soluble solvent of a pellicle film, and the pellicle film is air-dried and bonded, or bonded with an adhesive such as acrylic resin, epoxy resin, or fluororesin. Further, in order to mount the exposure master on the lower side portion of the pellicle frame, an adhesive layer made of polybutene resin, polyvinyl acetate resin, acrylic resin, silicone resin, or the like, and a mask adhesive protection liner for protecting the adhesive layer are provided.
The pellicle is disposed so as to surround a pattern area formed on the surface of the exposure master. The pellicle is provided for preventing dust from adhering to the exposure master, and therefore, the pattern region is isolated from the outside of the pellicle in such a manner that dust outside the pellicle does not adhere to the pattern surface.
In recent years, as the design rule of LSI is becoming finer on the order of 0.25 submicron (sub-micron), the exposure light source is also becoming shorter in wavelength, that is, gradually shifting from g light (436nm) and i light (365nm) of the mercury lamp which has been the mainstream so far to KrF excimer laser light (248nm), ArF excimer laser light (193nm), and the like. With the progress of miniaturization, flatness required for masks and silicon wafers is becoming more and more strict.
The pellicle is attached to the mask after the mask is completed in order to prevent dust from adhering to the pattern. When the pellicle is attached to the mask, the flatness of the mask may change. When the flatness of the mask is deteriorated, as described above, a problem such as a focus shift may occur. Further, when the flatness is changed, the shape of the pattern drawn on the mask is also changed, which may cause a problem in the overlay accuracy of the mask.
There are several main causes of the change in the flatness of the mask caused by the attachment of the pellicle, but the greatest of them is known to be the flatness of the pellicle frame.
In order to prevent deformation of the mask caused by deformation of the pellicle frame, the following method is disclosed in japanese patent laid-open No. 2009-25562: will protect the membrane frameThe cross-sectional area of the shelf is set to 6mm2Hereinafter, a material having a Young's modulus of 50GPa or less may be used for the pellicle frame.
As a pellicle frame, a cross-sectional shape is often rectangular, and japanese patent laid-open publication No. 9-68793 discloses a pellicle frame having a cross-sectional shape in which an upper end side of an inner peripheral surface protrudes inward further than a lower end side.
In recent years, the flatness required of masks has become more and more strict than the requirement of 2 μm flatness on the pattern surface, and a requirement of 0.5 μm or less, preferably 0.25 μm, has been made after the 65nm node.
Generally, the flatness of the pellicle frame is about 20 to 80 μm, and when a pellicle using a pellicle frame having poor flatness is attached to a mask in this manner, the shape of the frame is transferred to the mask, and the mask is deformed. When bonding is performed, the pellicle is pressed against the mask with a large force of about 200 to 400N (20 to 40kg weight). Since the mask surface is more flat than the pellicle frame, the pellicle frame may deform the mask when the process of pressing the pellicle against the mask is completed because the pellicle frame may return to its original shape.
Disclosure of Invention
An object of the present invention is to provide a pellicle frame that can reduce deformation of an exposure master due to deformation of the pellicle frame even when the pellicle is attached to the exposure master. The second object of the present invention is to provide a pellicle for lithography, which has the pellicle frame.
The above object of the present invention is achieved by the following aspects (1) and (10). The following are listed together with (2) to (9) which are preferred embodiments.
(1) A pellicle frame characterized in thatThe section of the protective film frame rod is parallel to the upper side and the lower side and has an area of 20mm2At least one side of the following quadrangle has a shape of a concave portion including a curve.
(2) The pellicle frame according to (1), wherein the curve is selected from a convex curve consisting of a circle, an ellipse, a hyperbola, and a parabola.
(3) The pellicle frame according to (1) or (2), wherein the depression is constituted only by a convex curve.
(4) The pellicle frame of (1) or (2), wherein the depression comprises at least one straight line.
(5) The pellicle frame of (4), wherein the depression comprises at least one line parallel to the upper edge.
(6) The pellicle frame according to any of (1) to (5), wherein the pellicle frame bar has a cross-sectional area of 6mm2The following.
(7) The pellicle frame according to any one of (1) to (6), which is composed of a material having a Young's modulus of 1 to 80 GPa.
(8) The pellicle frame according to any one of (1) to (7), which is composed of an aluminum alloy.
(9) The pellicle frame according to any one of (1) to (8), wherein the flatness of the pellicle frame is 20 μm or less
(10) A pellicle for lithography, wherein a pellicle film is attached to one end surface of the pellicle frame described in any one of (1) to (9) with a pellicle film adhesive, and an exposure master adhesive is provided on the other end surface.
According to the present invention, it is possible to provide a pellicle frame and a pellicle for lithography, which can reduce deformation of an exposure master due to deformation of the pellicle frame.
Drawings
FIG. 1 is a schematic cross-sectional view showing an example of a configuration of a pellicle.
Fig. 2 is a view showing an example of a cross-sectional shape of the pellicle frame bar.
Fig. 3 is a diagram showing a modification of the cross-sectional shape of the pellicle frame bar.
Description of the symbols
1 protective adhesive film
2 adhesive layer
3 protective film frame
4 adhesive layer for adhesion
5 Exposure master
10 protective film
12 upper edge
13 upper edge part
14 lower edge
15 lower edge part
16 intermediate part
17 side edge
18 having a curved recess
19 side edge
Detailed Description
The protective film frame is characterized in that the section of the protective film frame rod is parallel to the upper side and the lower side and has the area of 20mm2At least one side of the following quadrangle has a shape of a concave portion including a curve.
The present invention will be described below with reference to the accompanying drawings.
As shown in the cross-sectional view of fig. 1, the pellicle 1 of the lithographic pellicle 10 of the present invention is attached to the upper end surface of the pellicle frame 3 via the pellicle-attaching adhesive layer 2, and therefore, in this case, the adhesive layer 4 for adhering the lithographic pellicle 10 to the exposure master (mask or reticle) 5 is usually formed on the lower end surface of the pellicle frame 3, and a liner (not shown) is releasably attached to the lower end surface of the adhesive layer 4. Further, the pellicle frame 3 may be provided with an air pressure adjusting hole (air vent hole), not shown, and a dust removing filter (not shown) may be provided in the air vent hole for removing fine particles.
The protective film frame can also be provided with a clamp hole. The shape of the jig hole in the depth direction is not particularly limited as long as it does not penetrate, and may be a concave portion having a tapered shape at the tip of the cylinder.
The cross-sectional shape of the portion where the air pressure adjusting hole and the jig hole are provided is preferably a quadrangle before the recess portion including a convex curve is provided, and more preferably a rectangle.
As shown in FIG. 2, in the pellicle frame of the present invention, the cross section of the pellicle frame is characterized by a shape in which the upper side 12 and the lower side 14 are parallel and have an area of 20mm2At least one of two opposing sides 17 and 19 of a basic quadrangle (hereinafter, also referred to as a "basic quadrangle". consisting of four sides 12, 17, 14, and 19) has a shape including a concave portion having a curve. The pellicle frame has a cross section in which an upper side portion 13 including an upper side 12 and a lower side portion 15 including a lower side 14 are connected to each other by an intermediate portion 16 formed by a concave portion including a convex curve in a substantially quadrangular shape.
As described above, the deformation of the mask due to the attachment of the pellicle to the mask is considered to be mainly due to the deformation of the pellicle frame of the pellicle. During the bonding, the pellicle frame deforms, and the mask deforms due to the deformation stress when the pellicle frame is going to recover. The deformation stress depends on the Young's modulus of the material constituting the pellicle frame and the amount of deformation thereof. According to the present invention, by reducing the cross-sectional area of the pellicle frame to be smaller than that of the basic quadrangle, a pellicle frame with less deformation stress can be manufactured. That is, since the pellicle is attached to the upper side of the pellicle frame and the lower side is bonded to the mask by providing an adhesive, the upper side and the lower side both need to have a certain width. However, the intermediate portion connecting the upper and lower side portions may be set to a width narrower than the upper and lower side portions.
In a frame having a shape with a substantially quadrangular cross section, such a pellicle frame bar may be manufactured by cutting out a shape having a concave portion including a curve from at least one side of opposing sides of the quadrangle. In addition, the portion of the pellicle frame where the air pressure adjusting hole and the jig hole are provided may be a portion of the pellicle frame where the jig hole is provided without forming the recessed portion, and it is preferable that a non-penetrating jig hole be formed without cutting.
In addition, as another method, the pellicle frame may be manufactured by injection molding an engineering plastic in a mold having a predetermined cross-sectional shape.
The shape of the basic quadrangle is not particularly limited as long as the upper side and the lower side are parallel, and the basic quadrangle includes a rectangle including a square, a trapezoid, and a parallelogram, and a rectangle is preferable. The upper side of the trapezoid may be shorter or longer than the lower side.
The area of the basic quadrangle is 20mm2The following. When it exceeds 20mm2In the case of increasing the height of the frame, there is a limitation in the apparatus, and therefore, the frame width becomes too large, and the inner dimension of the pellicle becomes too small, which causes a problem that the pattern region is greatly restricted.
Area of the basic quadrangle, preferably 15mm2Hereinafter, more preferably 12mm2The following. In addition, the area of the basic quadrangle is preferably 2mm2Above, more preferably 4mm2The above. When the amount falls within the above range, the frame can be suppressed finelyWidth, there is an advantage that a pattern region can be sufficiently obtained.
In the present invention, the recessed portion may have a shape including a curve having an unevenness, preferably a shape including a convex or concave curve in one direction, and the curve is more preferably selected from convex curves composed of a circle, an ellipse, a hyperbola, and a parabola.
The concave portion including the convex curve is preferably constituted only by the convex curve. Examples of the shape composed of only the convex curve include a semicircle, a partial circle, a semiellipse, a partial ellipse, a partial hyperbola, and a partial parabola. The partial shapes of elliptic, hyperbolic, and parabolic conical curves preferably include partial curves near the vertices thereof. The convex curve included in the concave part may be convex or concave from the side toward the inner side.
In the present invention, the concave portion preferably includes the convex curve and at least one straight line. Examples of the shape of the recessed portion include an arcuate shape surrounded by a chord formed by the convex curve and a straight line intersecting the convex curve, and a shape including the convex curve and at least one straight line. Examples of the latter include a quarter circle and a quarter ellipse. The recess preferably comprises at least one straight line parallel to the upper side. Two straight lines parallel to the upper side and two concave parts protruding to the side edges can be used.
The shape of the basic quadrangle is such that the upper and lower sides are parallel. Such quadrangles include rectangles including squares, trapezoids, and parallelograms, and are preferably rectangles. As a trapezoid, its upper side may be shorter or longer than its lower side.
The pellicle frame of the present invention preferably has a predetermined thickness in the vertical direction on both sides of the upper and lower side portions.
Further, the pellicle frame bar of the present invention has a cross section having a concave portion including a convex curve, but a shape obtained by replacing a predetermined curved portion with a polygonal shape of 6 or more angles approximating the curve may be similarly used as an equivalent.
Referring to fig. 3, a cross-sectional shape of the pellicle frame bar is illustrated.
(a) Is a cross-sectional shape of the pellicle frame of the present invention, which is a shape in which the upper side and the lower side are parallel and the area is 20mm2The following rectangular basic shape has a partially circular recess in the approximate center of both sides of a longitudinal rectangle, and connects the upper side portion 13 and the lower side portion 15 via an intermediate portion 16 having a narrow middle.
(b) Has a semicircular recess portion only on one side of the rectangle of the basic quadrangle.
(c) Has a quarter-circular recess at one side of the rectangle, and the straight line portion is parallel to the upper side.
(d) The shape of (2) has partially circular recesses on both sides of the rectangle, and the straight line portions are parallel to the upper side.
(e) The shape of (2) has a recessed portion formed by 2 straight lines and a slightly concave curve from one side of the rectangle.
In the above cross-sectional shape example, (a) and (d) are preferable, and (d) is more preferable, from the viewpoint of reducing the deformation stress.
Further, the following shape may be deformed: a parallelogram or a trapezoid is used as a basic quadrangle, and a concave part containing a convex curve is arranged on two sides or one side of the basic quadrangle.
The intermediate portion is a region having a narrow width in the intermediate portion between the upper side portion and the lower side portion, but may have a wide width in the intermediate portion near the upper side portion or the lower side portion as illustrated in (c).
The pellicle frame of the present invention is appropriately designed according to the shape of the mask, and generally has a planar shape of a ring, a rectangular shape, or a square shape, and has a size and a shape capable of covering a circuit pattern portion provided on the mask. The corners of the rectangular (including square) pellicle frame may be rounded. The height of the pellicle frame is preferably about 1 to 10mm, more preferably about 2 to 7mm, and particularly preferably 3 to 6 mm. The upper and lower edges of the pellicle frame are preferably about 2mm wide.
The upper and/or lower side portions preferably have a thickness of at least 0.4mm, more preferably 0.4 to 0.8 mm.
The cross-sectional area of the protective film frame rod is preferably 6mm2Preferably 1 to 6mm below2More preferably 3mm2The above. Such a small cross-sectional area can be easily achieved by reducing the width of the middle portion of the pellicle frame as in the present invention. Thus, by reducing the cross-sectional area, the deformation stress can be reduced, with the result that the deformation of the mask can also be reduced.
It is preferable to set the area of the basic quadrangle to 100% because the smaller the ratio of the cross-sectional area of the pellicle frame bar, the more improved the flatness of the frame and the flatness of the mask. Specifically, the content is preferably 25 to 85%, more preferably 35 to 75%, and still more preferably 40 to 60%. When the value is within the above range, the frame and the mask are preferably flat while ensuring the strength required for the frame.
The pellicle frame of the present invention is preferably formed using a material having a Young's modulus of 1 to 80 GPa.
The material constituting the pellicle frame is preferably aluminum, a magnesium alloy, a synthetic resin, or the like, more preferably aluminum, a magnesium alloy, or a polycarbonate resin, and particularly preferably aluminum.
The aluminum is preferably an aluminum alloy material that has been conventionally used, and more preferably a JIS a7075, JIS a6061, JIS a5052 material, or the like, and is not particularly limited as long as it has the above cross-sectional shape and can secure the strength as the pellicle frame. The pellicle frame surface is preferably roughened by sandblasting or chemical polishing before the polymer coating is provided. In the present invention, a conventionally known method can be used for roughening the surface of the frame. The aluminum alloy material is preferably subjected to a sand blast treatment using stainless steel, silicon carbide, glass beads, or the like, and then subjected to a chemical polishing using NaOH or the like to roughen the surface.
The pellicle frame of the present invention may be formed using a material having a Young's modulus of 1 to 50GPa, instead of a material having a Young's modulus of 69GPa, such as a conventional aluminum alloy material. Examples of the material having a Young's modulus within the above range include 44GPa for magnesium alloys, 3GPa for acrylic resins, and 2.5GPa for polycarbonate resins.
When these materials of low Young's modulus are used, even when the cross-sectional area exceeds 6mm212mm in diameter2In this case, the deformation stress can be reduced, and thus the deformation of the mask can be reduced.
The sectional area of the pellicle frame bar of the present invention is preferably 12mm2The following.
The sectional area of the pellicle frame is set to 1-6 mm2Preferably 3-6 mm2The more the material with a low young's coefficient is used, the more the deformation of the mask can be reduced by the multiplication effect.
In the present invention, the flatness of the pellicle frame is preferably set to 0 μm to 20 μm, and more preferably 0 μm to 10 μm. When the flatness of the pellicle frame is good, the deformation stress applied to the pellicle frame when the pellicle is attached to the mask can be reduced, and as a result, the amount of deformation of the mask can be reduced.
The "flatness" of the pellicle frame is a value calculated by measuring the height of 8 points at positions separated by an appropriate distance on the pellicle frame, preferably by calculating a virtual plane at the height of 8 points in total of 4 points at each corner of the pellicle frame and 4 points at the center of four sides, and subtracting the difference between the lowest points from the highest point among the distances from the virtual plane to each point. The flatness of the pellicle frame can be measured by a "laser displacement gauge with XY-axis program stage", using a self-made displacement machine in the present invention.
In the present invention, the corner portion formed by the exposure master adhesion surface and/or the pellicle adhesion surface and the inner and outer side surfaces of the pellicle frame is preferably chamfered, and more preferably C-chamfered, on the exposure master adhesion surface and/or the pellicle adhesion surface of the pellicle frame. The C chamfer is a machining performed by cutting a corner portion, which is a crossing surface portion, at an angle of 45 degrees.
In the present invention, in order to absorb stray light, the pellicle frame preferably has a black oxide film and/or a black polymer film. In addition, when the pellicle frame is made of an aluminum alloy, it is particularly preferable to use a pellicle frame made of an aluminum alloy having a black anodized film (black alumite film) and/or a plating coating film of a polymer.
As a method for forming a black anodized film on the pellicle frame surface, a method is generally employed in which a black oxide film is formed on the surface by anodizing in a dilute sulfuric acid aqueous solution after several tens of seconds of treatment in an alkaline treatment bath such as NaOH, and then performing black dyeing and sealing treatment.
The polymer coating film (polymer coating layer) can be formed by various methods, and examples thereof include spray coating, electrostatic coating, and electrodeposition coating. In the present invention, the polymer coating film is preferably provided by electrodeposition coating.
For electrodeposition coating, any of a thermosetting resin and an ultraviolet curable resin can be used. Further, the curable resins may be coated by either anionic electrodeposition coating or cationic electrodeposition coating. In the present invention, since ultraviolet ray resistance is also required, anionic electrodeposition coating of a thermosetting resin is preferable in view of stability, appearance and strength of the coating layer.
The pellicle of the present invention for lithography can be produced by attaching a pellicle film to one end face as an upper side via a pellicle film adhesive and providing an exposure master adhesive to the other end face as a lower side in any of the pellicle frames.
The type of the resist film is not particularly limited, and for example, amorphous fluoropolymers used in a known excimer laser can be used. Examples of the amorphous fluoropolymer include Cytop (trade name manufactured by asahi glass co., ltd.), Teflon (registered trademark) AF (trade name manufactured by dupont), and the like. These polymers may be dissolved in a solvent as needed for use in the production of a pellicle film, and may be dissolved in a fluorine-based solvent or the like as appropriate.
Examples
The present invention will be specifically illustrated and described below with reference to examples. Note that the "mask" in the examples and comparative examples is described as an example of the "exposure master", and it is needless to say that the same can be applied to a photomask (reticle).
The present invention will be described in detail below with reference to examples, but the present invention is not limited to only the following examples.
(example 1)
Cytop CTX-S (trade name of Asahi glass Co., Ltd.) was dissolved in perfluorotributylamine to obtain a 5% solution, which was dropped onto a silicon wafer, and the wafer was spread on the wafer by rotating the wafer at 830rpm by a spin coating method. Then, after drying at room temperature for 30 minutes, drying was further performed at 180 ℃ to form a uniform film. An aluminum frame coated with an adhesive was bonded to the film, and only the film was peeled off to prepare a pellicle film. A desired number of sheets of the above-mentioned Cytop CTX-S film were prepared and used in examples 1 to 8 and comparative examples.
An aluminum alloy (hereinafter referred to as "Al alloy") was produced, the outside dimensions of which were 149 mm. times.122 mm. times.3.5 mm, and the widths of the upper and lower sides of which were 2mm (the sectional shape was 4.33mm in cross-sectional area, as shown in FIG. 3 (a))2) The pellicle frame of (1). The cross-sectional shape was as follows, with a height of 3.5mm and a widthThe two side surfaces of the rectangle of 2.0mm are in a shape that the arc with the radius of 1.42mm is removed at the central part of the rectangle with the height of 2.5mm and the depth of 0.75 mm. The thickness of the upper and lower side portions was 0.5mm at their ends, and the width of the central band portion was also 0.5 mm. In addition, the four corners of the pellicle frame are subjected to a C-chamfering treatment.
The flatness of the frame was measured from the side coated with the mask adhesive and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The prepared pellicle was bonded to a 142mm square mask with a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask attached with the pellicle film was measured again, and the flatness became 0.27 μm. In addition, although the maximum deformation range of the mask was changed by 48nm, the maximum deformation range was suppressed to a very low value as compared with the comparative example. Table 1 summarizes the measurement results of the flatness and the maximum deformation range.
Note that the flatness of the mask was measured using UltraFlat of tropiel corporation. In addition, the flatness of the frame was measured using a laser displacement meter with an XY axis program stage.
The "maximum deformation range of the mask" is the sum of absolute values of maximum amounts of change on the positive and negative sides in the difference in height between each point of the mask, obtained by measuring the shape of the mask 2 times. In addition, when the mask is deformed by attaching the pellicle film, the maximum deformation range may be a large value even when the flatness is not changed, and therefore, the maximum deformation pattern is more effective than the flatness as an index of deformation/deformation of the mask.
(example 2)
An aluminum alloy was produced so as to have an outer dimension of 149mm × 115mm × 3.0mm and a width of the upper and lower sides of 2mm (the cross-sectional shape is 3.79mm in cross-sectional area, as shown in FIG. 3 (a))2) The pellicle frame of (1).The cross-sectional shape was a shape obtained by removing a circular arc having a radius of 1.042mm from both side surfaces of a rectangle having a height of 3.0mm and a width of 2.0mm at the center thereof in a size of 2.0mm and a depth of 0.75 mm. The thickness of the upper and lower edges was 0.5mm at their ends, and the width of the central band portion was also 0.5 mm. The flatness of the frame was measured from the side coated with the mask adhesive and was 10 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and the flatness became 0.26 μm. The maximum deformation range was changed by 36nm, but it was suppressed to a very low value as compared with the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 3)
A magnesium alloy (hereinafter referred to as "Mg alloy") was produced, having an outer dimension of 149 mm. times.122 mm. times.3.5 mm and an upper and lower width of 2mm (the sectional shape is shown in FIG. 3(a), and the sectional area is 4.33mm2) The cross-sectional shape of (2) is the same as that of the pellicle frame of example 1. The flatness of the frame was measured from the side coated with the mask adhesive and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the magnesium alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The prepared pellicle was bonded to a 142mm square mask with a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and the flatness became 0.24 μm. In addition, the maximum deformation range of the mask was changed by 38nm, but it was suppressed to a very low value as compared with the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 4)
A polycarbonate resin (hereinafter referred to as "PC resin") was produced, the outer dimensions of which were 149 mm. times.122 mm. times.3.5 mm, and the widths of the upper and lower sides of which were 2mm (the cross-sectional shape was 4.33mm in cross-sectional area, as shown in FIG. 3 (a))2) The cross-sectional shape of (2) is the same as that of the pellicle frame of example 1. The flatness of the frame was measured from the side coated with the mask adhesive and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the polycarbonate resin frame, and the film on the outer periphery of the frame was cut to prepare a pellicle.
The prepared pellicle was bonded to a 142mm square mask with a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and was unchanged at 0.25 μm. In addition, although the maximum deformation range of the mask was changed by 27nm, the maximum deformation range was suppressed to a very low value as compared with the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 5)
An aluminum alloy was produced, the outer dimensions of which were 149mm × 122mm × 3.5mm, and the widths of the upper and lower sides of which were 2mm (the sectional shape was 4.55mm in cross-sectional area as shown in FIG. 3 (b))2) The pellicle frame of (1). The cross-sectional shape was a shape obtained by removing a circular arc having a radius of 1.25mm from a side surface of a rectangle having a height of 3.5mm and a width of 2.0mm in the center of the rectangle with a height of 2.5mm and a depth of 1.25 mm. The thickness of the upper and lower side portions was 0.5mm at one end portion thereof, and the width of the central band portion was 0.75 mm. The flatness of this frame was measured from the side coated with the mask adhesive and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask attached with the pellicle film was measured again, and the flatness became 0.27 μm. The maximum deformation range was changed by 52nm, but it was suppressed to a lower value than that of the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 6)
An aluminum alloy was produced, the outer dimensions of which were 149mm × 122mm × 3.5mm, and the widths of the upper and lower sides of which were 2mm (the sectional shape was 5.23mm in cross-sectional area as shown in FIG. 3 (c))2) The pellicle frame of (1). The cross-sectional shape was a shape obtained by removing a quarter circle having a radius of 1.5mm from a side surface of a rectangle having a height of 3.5mm and a width of 2.0mm in a dimension having a height of 1.5mm and a depth of 1.5 mm. The thickness of the upper edge portion was 0.5mm at one end. The flatness of this frame was measured from the side where the mask adhesive was applied, and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and the flatness became 0.28 μm. In addition, although the maximum deformation range was changed by 63nm, the maximum deformation range was suppressed to a very low value as compared with the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 7)
An aluminum alloy was produced so as to have an outer dimension of 149mm × 122mm × 3.5mm and a width of the upper and lower sides of 2mm (the cross-sectional shape is shown in FIG. 3(d), and the cross-sectional area is 3.92mm2) The pellicle frame of (1). The cross-sectional shape was such that a sheet having a radius of 3.92mm was removed from a rectangular side surface having a height of 3.5mm and a width of 2.0mm in a size having a height of 2.5mm and a depth of 0.9mmA side circular arc, and a shape obtained by removing the same single side circular arc of 3.92mm from the opposite side face in the same size upside down. The thickness of the upper and lower edges was 0.5mm at their ends. The flatness of this frame was measured from the side where the mask adhesive was applied, and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum alloy frame, and the film on the outer periphery of the frame was cut to produce a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and the flatness was 0.26 μm. In addition, although the maximum deformation range was changed by 37nm, the maximum deformation range was suppressed to a lower value than that of the comparative example. In addition, table 1 summarizes the measurement results of flatness.
(example 8)
The polycarbonate was produced so as to have an outer dimension of 149 mm. times.122 mm. times.3.5 mm and a width of the upper and lower sides of 2mm (the cross-sectional shape is shown in FIG. 3(d), and the cross-sectional area is 3.92mm2) The cross-sectional shape of (a) was the same as that of the pellicle frame of example 7. The flatness of the frame was measured from the side on which the mask adhesive was applied, and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the polycarbonate frame, and the film on the outer periphery of the frame was cut to prepare a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and became 0.25 μm unchanged. In addition, although the maximum deformation range was changed by 26nm, the maximum deformation range was suppressed to a lower value than that of the comparative example. In addition, table 1 summarizes the measurement results of flatness.
Comparative example
Making ofAn aluminum alloy having an outer dimension of 149mm x 122mm x 3.5mm and a width of 2mm (a rectangular cross-sectional shape, a cross-sectional area of 7.00 mm)2) The pellicle frame of (1). The flatness of this frame was measured from the side coated with the mask adhesive and was 20 μm. A mask adhesive is applied to one end surface of the frame, and a film adhesive is applied to the other end surface. Then, the previously peeled pellicle film was bonded to the film adhesive side of the aluminum frame, and the film on the outer periphery of the frame was cut to prepare a pellicle.
The pellicle film thus prepared was attached to a square mask having a side length of 142mm and a flatness of 0.25 μm under a load of 20 kg. Then, the flatness of the mask with the pellicle film attached was measured again, and the flatness became 0.29 μm. In addition, the maximum deformation range varies by 100 nm.
The above results were summarized and shown in table 1 below.
Claims (12)
1. The protective film frame is characterized in that the section of the protective film frame rod is parallel to the upper side and the lower side, and the area of the section is 20mm2Both side edges of the following rectangle have a shape of a concave portion including a curve excluding the upper edge and the lower edge.
2. The pellicle frame of claim 1, wherein the curve is selected from a convex curve consisting of a circle, an ellipse, a hyperbola and a parabola.
3. The pellicle frame of claim 1, wherein the indentations consist of only convex curves.
4. The pellicle frame of claim 1, wherein the depression comprises at least one straight line.
5. The pellicle frame of claim 4, wherein the recess comprises at least one line parallel to the upper edge.
6. The pellicle frame of claim 1, wherein the pellicle frame bar has a cross-sectional area of 1mm2Above 6mm2The following.
7. The pellicle frame of claim 1, comprising a material with a Young's modulus of 1-80 GPa.
8. The pellicle frame of claim 1, comprised of a material selected from the group consisting of aluminum alloys, magnesium alloys, and polycarbonate resins.
9. The pellicle frame of claim 1, comprised of an aluminum alloy.
10. The pellicle frame of claim 1, wherein the quadrilateral has an area of 4mm2Above 20mm2The following.
11. The pellicle frame of claim 1, wherein the flatness of the pellicle frame is from 0 μ ι η to 20 μ ι η.
12. A pellicle for lithography, wherein a pellicle film is attached to one end surface of the pellicle frame according to any one of claims 1 to 11 with a pellicle film adhesive, and an exposure master adhesive is provided on the other end surface.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-149777 | 2009-06-24 | ||
| JP2009149777A JP5411596B2 (en) | 2009-06-24 | 2009-06-24 | Pellicle frame and lithography pellicle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| HK1148825A1 HK1148825A1 (en) | 2011-09-16 |
| HK1148825B true HK1148825B (en) | 2013-10-11 |
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