HK1072279A1 - Corona-generated chemical vapor deposition on a substrate - Google Patents
Corona-generated chemical vapor deposition on a substrate Download PDFInfo
- Publication number
- HK1072279A1 HK1072279A1 HK05103485.1A HK05103485A HK1072279A1 HK 1072279 A1 HK1072279 A1 HK 1072279A1 HK 05103485 A HK05103485 A HK 05103485A HK 1072279 A1 HK1072279 A1 HK 1072279A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- substrate
- gas
- electrode
- coating
- corona discharge
- Prior art date
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45565—Shower nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Organic Insulating Materials (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Claims (7)
- Kontinuierlicher Prozess zum Erstellen einer optisch durchsichtigen Beschichtung auf einem sich bewegenden Substrat, folgende Schritte umfassend: 1) Erzeugen einer Korona-Entladung in einem Bereich zwischen a) einer Elektrode, die mindestens einen Einlass und mindestens einen Auslass hat, und b) einer Gegenelektrode, die ein sich bewegendes Substrat trägt; und 2) Strömenlassen einer Mischung aus einem Balance-Gas, einem Arbeits-Gas, das ein Organosiloxan ist, und optional einem Trägergas für das Arbeitsgas durch die Elektrode und die Korona-Entladung, um eine im Plasma polymerisierende Beschichtung auf dem Substrat zu bilden, wobei das Balance-Gas eine Flussrate hat, so dass die Geschwindigkeit durch den mindestens einen Auslass nicht kleiner als 10 m/s und nicht größer als 200 m/s ist, wobei die Konzentration des Arbeitsgases auf der Basis der Gesamt-Gasmischung nicht kleiner als 5 ppm und nicht größer als 200 ppm ist, wobei die optisch durchsichtige Beschichtung eine optische Reinheit von mindestens 98 Prozent und eine Opazität von nicht mehr als 2 Prozent hat.
- Prozess aus Anspruch 1, wobei die Gegenelektrode eine rotierende Trommel ist, und wobei entweder die Trommel oder die Elektrode oder sowohl die Trommel, als auch die Elektrode mit einer dielektrischen Hülse ausgerüstet sind.
- Prozess aus einem der Ansprüche 1 bis 2, wobei das Balance-Gas Luft, Sauerstoff, Stickstoff, Helium, Argon oder eine Kombination daraus ist.
- Prozess aus einem der Ansprüche 1 bis 3, wobei der mindestens eine Auslass der Elektrode eine Vielzahl von Löchern oder Schlitzen ist, und wobei das Arbeitsgas Tetramethyldisiloxan, Hexamethyldisiloxan, Octamethyltrisiloxan, Tetraethylorthosilikat oder Kombinationen daraus ist.
- Prozess aus Anspruch 4, wobei das Substrat nach der Abscheidung der im Plasma polymerisierenden Beschichtung im Vergleich zu einem unbehandelten Substrat eine erhöhte Oberflächenenergie hat.
- Prozess aus Anspruch 4, wobei die Ablagerung eine Beschichtung bildet, die das Substrat chemisch widerstandsfähig macht.
- Prozess aus Anspruch 4, wobei die Ablagerung eine Beschichtung mit einer im Vergleich zu einem unbehandelten Substrat erhöhten Barriere für Gase ausbildet.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35490502P | 2002-02-05 | 2002-02-05 | |
| US354905P | 2002-02-05 | ||
| US40864002P | 2002-09-06 | 2002-09-06 | |
| US408640P | 2002-09-06 | ||
| PCT/US2003/003057 WO2003066932A1 (en) | 2002-02-05 | 2003-02-03 | Corona-generated chemical vapor deposition on a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| HK1072279A1 true HK1072279A1 (en) | 2005-08-19 |
| HK1072279B HK1072279B (en) | 2009-04-09 |
Family
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Also Published As
| Publication number | Publication date |
|---|---|
| JP2005533174A (ja) | 2005-11-04 |
| CN1628187A (zh) | 2005-06-15 |
| DE60322347D1 (de) | 2008-09-04 |
| US20040091637A1 (en) | 2004-05-13 |
| EP1472387A1 (de) | 2004-11-03 |
| US6815014B2 (en) | 2004-11-09 |
| EP1472387B1 (de) | 2008-07-23 |
| CN100432289C (zh) | 2008-11-12 |
| WO2003066932A1 (en) | 2003-08-14 |
| ATE402277T1 (de) | 2008-08-15 |
| JP4494792B2 (ja) | 2010-06-30 |
| AU2003207794A1 (en) | 2003-09-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20130203 |