GR1005410B - A method to deposit multitude polymer materials for chemically sensitive arrays - Google Patents
A method to deposit multitude polymer materials for chemically sensitive arraysInfo
- Publication number
- GR1005410B GR1005410B GR20060100040A GR20060100040A GR1005410B GR 1005410 B GR1005410 B GR 1005410B GR 20060100040 A GR20060100040 A GR 20060100040A GR 20060100040 A GR20060100040 A GR 20060100040A GR 1005410 B GR1005410 B GR 1005410B
- Authority
- GR
- Greece
- Prior art keywords
- polymer
- new method
- chemically sensitive
- deposition
- array
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 10
- 238000003491 array Methods 0.000 title abstract 3
- 239000002861 polymer material Substances 0.000 title abstract 3
- 229920000642 polymer Polymers 0.000 abstract 5
- 230000008021 deposition Effects 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000000126 substance Substances 0.000 abstract 2
- 238000005452 bending Methods 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 abstract 1
- 239000011231 conductive filler Substances 0.000 abstract 1
- 229920001940 conductive polymer Polymers 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229920006254 polymer film Polymers 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 230000026683 transduction Effects 0.000 abstract 1
- 238000010361 transduction Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
Abstract
A new method for the deposition of a multitude of polymer materials on the same transducer substrate, to be used as chemically sensitive layers using photolithographic techniques is described. The method can be used for the fabrication of chemicallysensitive arrays using polymer sensitive layers and different transduction principles. The process is a delicate balance between key lithographic parameters like exposure dose, material tone and developers used. The use of lithographic processes allows the deposition of polymer films at any selected pattern for a wide film thickness range (typically a few nanometers up to several micrometers). The new method is particularly useful in the fabrication of chemical sensing arrays where polymers with varying sensitivities and selectivities are required. In an example application, an array of conductive polymer chemical sensing devices may be fabricated by applying the new method to polymers which have been synthesized by adding conductive fillers. Using the same new method different polymer materials may be deposited and placed between a respective first and second electrode thus forming an array of capacitors acting as chemically sensitive devices. In another example application, the new method may be used for the deposition of polymer on flexible silicon members to form an array of silicon/polymer bimorph chemically sensitive devices operating either in resonance or static bending.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GR20060100040A GR1005410B (en) | 2006-01-20 | 2006-01-20 | A method to deposit multitude polymer materials for chemically sensitive arrays |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GR20060100040A GR1005410B (en) | 2006-01-20 | 2006-01-20 | A method to deposit multitude polymer materials for chemically sensitive arrays |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GR1005410B true GR1005410B (en) | 2007-01-31 |
Family
ID=36972780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GR20060100040A GR1005410B (en) | 2006-01-20 | 2006-01-20 | A method to deposit multitude polymer materials for chemically sensitive arrays |
Country Status (1)
| Country | Link |
|---|---|
| GR (1) | GR1005410B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1986001313A1 (en) * | 1984-08-13 | 1986-02-27 | Ncr Corporation | Process for forming a layer of patterned photoresist |
| US6178066B1 (en) * | 1998-05-27 | 2001-01-23 | Read-Rite Corporation | Method of fabricating an improved thin film device having a small element with well defined corners |
| EP0851295B1 (en) * | 1996-12-27 | 2001-10-24 | Mimotec SA | Process for the fabrication of microstructures by multilayer conformation of a photosensitive resin et microstructures obtained therewith |
| US20020122918A1 (en) * | 2001-03-05 | 2002-09-05 | Dentinger Paul Michael | Multiple wavelength photolithography for preparing multilayer microstructures |
| US6509137B1 (en) * | 2000-02-10 | 2003-01-21 | Winbond Electronics Corp. | Multilayer photoresist process in photolithography |
| US20030215753A1 (en) * | 2002-05-17 | 2003-11-20 | Fan-Gang Tseng | Fabrication method of a three-dimensional microstructure |
-
2006
- 2006-01-20 GR GR20060100040A patent/GR1005410B/en not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1986001313A1 (en) * | 1984-08-13 | 1986-02-27 | Ncr Corporation | Process for forming a layer of patterned photoresist |
| EP0851295B1 (en) * | 1996-12-27 | 2001-10-24 | Mimotec SA | Process for the fabrication of microstructures by multilayer conformation of a photosensitive resin et microstructures obtained therewith |
| US6178066B1 (en) * | 1998-05-27 | 2001-01-23 | Read-Rite Corporation | Method of fabricating an improved thin film device having a small element with well defined corners |
| US6509137B1 (en) * | 2000-02-10 | 2003-01-21 | Winbond Electronics Corp. | Multilayer photoresist process in photolithography |
| US20020122918A1 (en) * | 2001-03-05 | 2002-09-05 | Dentinger Paul Michael | Multiple wavelength photolithography for preparing multilayer microstructures |
| US20030215753A1 (en) * | 2002-05-17 | 2003-11-20 | Fan-Gang Tseng | Fabrication method of a three-dimensional microstructure |
Non-Patent Citations (1)
| Title |
|---|
| C. T. HORNG ET AL.: "Superimposition of Photoresist Patterns", IBM TECHNICAL DISCLOSURE BULLETIN, vol. 26, no. 3B, 1 August 1983 (1983-08-01), New York, US, pages 1728, XP002400151 * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Pesquera et al. | Beyond substrates: strain engineering of ferroelectric membranes | |
| Kitsara et al. | Single chip interdigitated electrode capacitive chemical sensor arrays | |
| Graudejus et al. | Controlling the morphology of gold films on poly (dimethylsiloxane) | |
| EP3980740B1 (en) | Composite structure for a pressure sensor and pressure sensor | |
| US10138542B2 (en) | Mechanically gated electrical switches by creasing of patterned metal/elastomer bilayer films | |
| CN102646789A (en) | Method for manufacturing polymer composite for transducer | |
| JP2011505588A5 (en) | ||
| JP2020514760A (en) | A Method for Detecting Analytes Based on Detecting Changes in Mechanical Properties of Free-Standing Nanoparticle Composites | |
| US10746614B2 (en) | Stretchable multimodal sensor and method of fabricating of the same | |
| JP7512265B2 (en) | Piezoelectric Sensor | |
| Moni et al. | Ultrathin and conformal initiated chemical-vapor-deposited layers of systematically varied surface energy for controlling the directed self-assembly of block copolymers | |
| Closser et al. | Growth of a surface-tethered, all-carbon backboned fluoropolymer by photoactivated molecular layer deposition | |
| US20170003594A1 (en) | Elastomer-Assisted Manufacturing | |
| Meena et al. | Transfer‐Printed Wrinkled PVDF‐Based Tactile Sensor‐Nanogenerator Bundle for Hybrid Piezoelectric‐Triboelectric Potential Generation | |
| Vanhove et al. | Final capping passivation layers for long-life microsensors in real fluids | |
| GR1005410B (en) | A method to deposit multitude polymer materials for chemically sensitive arrays | |
| TW536748B (en) | Manufacturing method of semiconductor device and semiconductor manufacturing system | |
| Lu et al. | Wafer scale lead zirconate titanate film preparation by sol–gel method using stress balance layer | |
| Sohgawa et al. | Detection of amyloid beta fibril growth by liposome-immobilized micro-cantilever with NiCr thin-film strain gauge | |
| Nilsen et al. | Direct polymer microcantilever fabrication from free-standing dry film photoresists | |
| Peters et al. | Thermal stress accommodation in dip cast lead zirconate‐titanate ferroelectric films on flexible substrates | |
| Petruczok et al. | Fabrication of a microscale device for detection of nitroaromatic compounds | |
| Tipsawat et al. | Quantitative piezoelectric measurements of partially released Pb (Zr, Ti) O3 structures | |
| Ren et al. | A novel ferroelectric based microphone | |
| Dezest et al. | Multiplexed functionalization of nanoelectromechanical systems with photopatterned molecularly imprinted polymers |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PG | Patent granted | ||
| ML | Lapse due to non-payment of fees |