GB9811563D0 - Improvements in and relating to photomasks - Google Patents
Improvements in and relating to photomasksInfo
- Publication number
- GB9811563D0 GB9811563D0 GB9811563A GB9811563A GB9811563D0 GB 9811563 D0 GB9811563 D0 GB 9811563D0 GB 9811563 A GB9811563 A GB 9811563A GB 9811563 A GB9811563 A GB 9811563A GB 9811563 D0 GB9811563 D0 GB 9811563D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- photomasks
- photomask
- need
- silver halide
- relating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004519 manufacturing process Methods 0.000 abstract 2
- 229910052709 silver Inorganic materials 0.000 abstract 2
- 239000004332 silver Substances 0.000 abstract 2
- -1 silver halide Chemical class 0.000 abstract 2
- 108010010803 Gelatin Proteins 0.000 abstract 1
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 abstract 1
- 229920000159 gelatin Polymers 0.000 abstract 1
- 239000008273 gelatin Substances 0.000 abstract 1
- 235000019322 gelatine Nutrition 0.000 abstract 1
- 235000011852 gelatine desserts Nutrition 0.000 abstract 1
- 230000005019 pattern of movement Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
In the field of semiconductor photomask manufacture there is a need to produce photomasks more rapidly and with fewer flaws. There is also a need for photomasks capable of producing much finer resolution circuits than hitherto. There is disclosed a method of manufacturing a photomask (10) in which a substrate (11) is coated with an emulsion of gelatin (18) and a photosensitive silver halide (17). On exposure to an electron beam (15) or a laser beam, controlled to generate a desired pattern of movement, the silver halide reduces to create a photomask (10) after development and fixing.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9811563A GB9811563D0 (en) | 1998-05-30 | 1998-05-30 | Improvements in and relating to photomasks |
| JP2000552555A JP2002517785A (en) | 1998-05-30 | 1999-05-28 | Silver photo mask |
| PCT/GB1999/001484 WO1999063406A1 (en) | 1998-05-30 | 1999-05-28 | Silver based photomasks |
| EP99923736A EP1092173A1 (en) | 1998-05-30 | 1999-05-28 | Silver based photomasks |
| AU40501/99A AU4050199A (en) | 1998-05-30 | 1999-05-28 | Silver based photomasks |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9811563A GB9811563D0 (en) | 1998-05-30 | 1998-05-30 | Improvements in and relating to photomasks |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB9811563D0 true GB9811563D0 (en) | 1998-07-29 |
Family
ID=10832905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9811563A Ceased GB9811563D0 (en) | 1998-05-30 | 1998-05-30 | Improvements in and relating to photomasks |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP1092173A1 (en) |
| JP (1) | JP2002517785A (en) |
| AU (1) | AU4050199A (en) |
| GB (1) | GB9811563D0 (en) |
| WO (1) | WO1999063406A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102365584B (en) | 2009-01-29 | 2014-07-30 | 迪吉福来克斯有限公司 | Process for producing a photomask on a photopolymeric surface |
| ES2938578T3 (en) * | 2021-01-18 | 2023-04-12 | Longserving Tech Co Ltd | Process for manufacturing a picoscopic/nanoscopic scale circuit pattern |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1447607A1 (en) * | 1963-02-27 | 1969-01-02 | Noc Chemical Arts Inc Di | Photographic film |
| NL162215C (en) * | 1967-07-03 | Ibm | ||
| US3716363A (en) * | 1971-02-05 | 1973-02-13 | Gte Laboratories Inc | Method of making photomasks of the type used in the fabrication of microelectronic circuits |
| JPS5129877A (en) * | 1974-09-06 | 1976-03-13 | Fuji Photo Film Co Ltd | |
| JPS57139923A (en) * | 1981-02-21 | 1982-08-30 | Toshiba Corp | Forming method for pattern by electron beam |
-
1998
- 1998-05-30 GB GB9811563A patent/GB9811563D0/en not_active Ceased
-
1999
- 1999-05-28 EP EP99923736A patent/EP1092173A1/en not_active Withdrawn
- 1999-05-28 JP JP2000552555A patent/JP2002517785A/en active Pending
- 1999-05-28 AU AU40501/99A patent/AU4050199A/en not_active Abandoned
- 1999-05-28 WO PCT/GB1999/001484 patent/WO1999063406A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002517785A (en) | 2002-06-18 |
| EP1092173A1 (en) | 2001-04-18 |
| AU4050199A (en) | 1999-12-20 |
| WO1999063406A1 (en) | 1999-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AT | Applications terminated before publication under section 16(1) |