GB896934A - Improvements relating to diffraction gratings - Google Patents
Improvements relating to diffraction gratingsInfo
- Publication number
- GB896934A GB896934A GB1734559A GB1734559A GB896934A GB 896934 A GB896934 A GB 896934A GB 1734559 A GB1734559 A GB 1734559A GB 1734559 A GB1734559 A GB 1734559A GB 896934 A GB896934 A GB 896934A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- block
- strips
- chromium
- resist material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 8
- 229910052804 chromium Inorganic materials 0.000 abstract 8
- 239000011651 chromium Substances 0.000 abstract 8
- 239000000463 material Substances 0.000 abstract 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 5
- 229910052709 silver Inorganic materials 0.000 abstract 5
- 239000004332 silver Substances 0.000 abstract 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 abstract 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 abstract 2
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- 102000004142 Trypsin Human genes 0.000 abstract 1
- 108090000631 Trypsin Proteins 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 230000001476 alcoholic effect Effects 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 238000004140 cleaning Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000007654 immersion Methods 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 abstract 1
- 229910052703 rhodium Inorganic materials 0.000 abstract 1
- 239000010948 rhodium Substances 0.000 abstract 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
- 239000012588 trypsin Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
A reflecting phase diffraction grating comprises a base plate with an optically flat surface, several parallel sided strips of a first material on this surface, the strips being of equal width and adjacent strips being spaced apart by a distance equal to their width and the thickness of the strips being equal to one quarter of a wavelength of the light to be used with the grating; a reflecting layer of a second material covering the strips and the uncovered portions of the surface so as to form a reflecting surface with several parallel sided steps corresponding with the strips and a transparent layer of silicone monoxide covering the reflecting surface. The diffraction grating may be made by applying to the optically flat surface of a block, a layer of photo-sensitive resist material on which a diffraction grating pattern is contact printed so that on subsequent development a negative image of the grating in hardened resist material remains upon the surface of the block. The block is then placed inside a vacuum chamber and cleaned by means of a glow discharge whereupon the chromium is vaporised to form a layer over the uncovered part of the surface of the block and over the resist material. The chromium layer is deposited until its thickness is equal to one quarter of the wavelength of the light to be used. On removal of the block from the vacuum chamber it is rubbed with a pad soaked in hydrogen peroxide or nitric acid so as to remove the resist material and its overlying chromium layer. The block is then replaced in the vacuum chamber and cleaned again before a layer of aluminium, chromium or rhodium is deposited on the pattern of chromium and the uncovered portions of the surface of the block so as to result in a reflecting surface in the form of a series of steps, each of a thickness equal to one quarter of a wavelength of the light to be used with the grating. Finally, a layer of silicon monoxide is deposited over the second layer to form an abrasion resistant coating. In a modified method the block is first given a silver coating and this is overcoated with photo-sensitive resist material in which a negative image of the grating is formed as before. The uncovered portions of the silver layer are then etched away with an alcoholic ferric nitrate solution and resist material covering the remaining portions of the silver layer is removed as by weak acetic acid and immersion in a trypsin suspension to leave silver strips on the block. After cleaning, a chromium layer is deposited by evaporation in a vacuum and the silver strips with overlying chromium layer are removed as before. Thereupon a second reflecting coating and a silicon monoxide overcoat are applied as in the first method. Apparatus for measuring the thickness of the chromium layer is also described (see Group XL(b)).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1734559A GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1734559A GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB896934A true GB896934A (en) | 1962-05-23 |
Family
ID=10093549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1734559A Expired GB896934A (en) | 1959-05-21 | 1959-05-21 | Improvements relating to diffraction gratings |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB896934A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3334956A (en) * | 1963-06-17 | 1967-08-08 | Coleman Instr Corp | Selective diffraction grating system |
| US3981568A (en) | 1972-11-13 | 1976-09-21 | Optical Coating Laboratory, Inc. | Striped dichroic filter with butted stripes and dual lift-off method for making the same |
| EP0110184A1 (en) * | 1982-11-04 | 1984-06-13 | Sumitomo Electric Industries Limited | Process for fabricating integrated optics |
| GB2135776A (en) * | 1983-02-18 | 1984-09-05 | Boc Group Plc | Film thickness measurement |
| DE3412980A1 (en) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID |
| GB2200765A (en) * | 1986-10-27 | 1988-08-10 | Sharp Kk | A method for the production of an optical phase-shifting board |
| EP1674895A1 (en) * | 2004-12-24 | 2006-06-28 | Canon Kabushiki Kaisha | Surface reflection type phase grating |
| WO2016019071A1 (en) | 2014-07-29 | 2016-02-04 | Gentex Corporation | Laser ablation with reduced visual effects |
| US10185198B2 (en) | 2015-06-19 | 2019-01-22 | Gentex Corporation | Second surface laser ablation |
| US10610975B2 (en) | 2014-10-03 | 2020-04-07 | Gentex Corporation | Second surface laser ablation |
| US11009760B2 (en) | 2017-05-05 | 2021-05-18 | Gentex Corporation | Interleaving laser ablation |
-
1959
- 1959-05-21 GB GB1734559A patent/GB896934A/en not_active Expired
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3334956A (en) * | 1963-06-17 | 1967-08-08 | Coleman Instr Corp | Selective diffraction grating system |
| US3981568A (en) | 1972-11-13 | 1976-09-21 | Optical Coating Laboratory, Inc. | Striped dichroic filter with butted stripes and dual lift-off method for making the same |
| EP0110184A1 (en) * | 1982-11-04 | 1984-06-13 | Sumitomo Electric Industries Limited | Process for fabricating integrated optics |
| GB2135776A (en) * | 1983-02-18 | 1984-09-05 | Boc Group Plc | Film thickness measurement |
| DE3412980A1 (en) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | LIGHT PHASE GRID AND METHOD FOR PRODUCING A LIGHT PHASE GRID |
| US4708437A (en) * | 1984-04-06 | 1987-11-24 | Dr. Johannes Heidenhain Gmbh | Incident-light phase grid and method for making same |
| GB2200765A (en) * | 1986-10-27 | 1988-08-10 | Sharp Kk | A method for the production of an optical phase-shifting board |
| GB2200765B (en) * | 1986-10-27 | 1991-06-26 | Sharp Kk | A method for the production of an optical phase-shifting board |
| EP1674895A1 (en) * | 2004-12-24 | 2006-06-28 | Canon Kabushiki Kaisha | Surface reflection type phase grating |
| WO2016019071A1 (en) | 2014-07-29 | 2016-02-04 | Gentex Corporation | Laser ablation with reduced visual effects |
| EP3174662A4 (en) * | 2014-07-29 | 2018-05-02 | Gentex Corporation | Laser ablation with reduced visual effects |
| US11130195B2 (en) | 2014-07-29 | 2021-09-28 | Gentex Corporation | Laser ablation with reduced visual effects |
| US10610975B2 (en) | 2014-10-03 | 2020-04-07 | Gentex Corporation | Second surface laser ablation |
| US10185198B2 (en) | 2015-06-19 | 2019-01-22 | Gentex Corporation | Second surface laser ablation |
| US11275285B2 (en) | 2015-06-19 | 2022-03-15 | Gentex Corporation | Second surface laser ablation |
| US11009760B2 (en) | 2017-05-05 | 2021-05-18 | Gentex Corporation | Interleaving laser ablation |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB896934A (en) | Improvements relating to diffraction gratings | |
| EP0090924B1 (en) | Method of increasing the image resolution of a transmitting mask and improved masks for performing the method | |
| GB874462A (en) | Improvements relating to diffraction gratings | |
| JPS54134561A (en) | Pattern forming method | |
| JPS5672445A (en) | Production of photomask | |
| JPS53147531A (en) | Forming method for thin film pattern | |
| JPS56105478A (en) | Processing method of pattern for aluminum surface mirror | |
| GB2067784A (en) | Preparation of interference filters | |
| JPS5734506A (en) | Production of color filter | |
| US3146103A (en) | Method of contact printing | |
| NL7504118A (en) | PROCEDURE FOR APPLYING NEXT-TO-EACH OTHER DIFFERENT LAYERS ON A TRANSPARENT UNDERLAY. | |
| JPS633301B2 (en) | ||
| JPS5793348A (en) | Photoengraving method of screen process printing plate | |
| JPS5778140A (en) | Forming method for photoresist film | |
| JPS5997103A (en) | Manufacturing method of stepped relief type diffraction grating | |
| JPS57104106A (en) | Production of optical circuit | |
| JPS56165244A (en) | Manufacture of multilayer thin film electrode | |
| JPS55113046A (en) | Pattern forming method | |
| JPS5689741A (en) | Dryplate for photomasking | |
| JPS583540B2 (en) | Kankouseijiyushibanno Rokohouhou | |
| JPS5646315A (en) | Manufacture for surface elastic wave device | |
| JPS57112025A (en) | Formation of pattern | |
| JPS5396678A (en) | Method and apparatus for mask pattern exposure | |
| JPS6449693A (en) | Manufacture of portable medium | |
| JPH01192116A (en) | Pattern formation |