GB845527A - Antimony electroplating solutions and processes - Google Patents
Antimony electroplating solutions and processesInfo
- Publication number
- GB845527A GB845527A GB33128/56A GB3312856A GB845527A GB 845527 A GB845527 A GB 845527A GB 33128/56 A GB33128/56 A GB 33128/56A GB 3312856 A GB3312856 A GB 3312856A GB 845527 A GB845527 A GB 845527A
- Authority
- GB
- United Kingdom
- Prior art keywords
- antimony
- bath
- ammonium
- fluoride
- benzene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052787 antimony Inorganic materials 0.000 title abstract 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 title abstract 4
- 238000009713 electroplating Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 abstract 4
- -1 sulphonyl group Chemical group 0.000 abstract 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 2
- 229910000831 Steel Inorganic materials 0.000 abstract 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 abstract 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric Acid Chemical compound [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 abstract 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 abstract 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 abstract 2
- 238000007747 plating Methods 0.000 abstract 2
- 239000010959 steel Substances 0.000 abstract 2
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 abstract 2
- 229940124530 sulfonamide Drugs 0.000 abstract 2
- 229910021653 sulphate ion Inorganic materials 0.000 abstract 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 abstract 1
- DPZHKLJPVMYFCU-UHFFFAOYSA-N 2-(5-bromopyridin-2-yl)acetonitrile Chemical compound BrC1=CC=C(CC#N)N=C1 DPZHKLJPVMYFCU-UHFFFAOYSA-N 0.000 abstract 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 abstract 1
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 abstract 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-N Gluconic acid Natural products OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 abstract 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 229940061720 alpha hydroxy acid Drugs 0.000 abstract 1
- 150000001280 alpha hydroxy acids Chemical class 0.000 abstract 1
- 239000000908 ammonium hydroxide Substances 0.000 abstract 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 abstract 1
- 239000001166 ammonium sulphate Substances 0.000 abstract 1
- 235000011130 ammonium sulphate Nutrition 0.000 abstract 1
- SMWDFEZZVXVKRB-UHFFFAOYSA-N anhydrous quinoline Natural products N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 abstract 1
- 229910000410 antimony oxide Inorganic materials 0.000 abstract 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical group F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 abstract 1
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 150000001491 aromatic compounds Chemical group 0.000 abstract 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- WZJYKHNJTSNBHV-UHFFFAOYSA-N benzoquinoline Natural products C1=CN=C2C3=CC=CC=C3C=CC2=C1 WZJYKHNJTSNBHV-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 150000001721 carbon Chemical group 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Natural products OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 abstract 1
- 150000001879 copper Chemical class 0.000 abstract 1
- 229960000956 coumarin Drugs 0.000 abstract 1
- 235000001671 coumarin Nutrition 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- SMWDFEZZVXVKRB-UHFFFAOYSA-O hydron;quinoline Chemical compound [NH+]1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-O 0.000 abstract 1
- 239000004310 lactic acid Substances 0.000 abstract 1
- 235000014655 lactic acid Nutrition 0.000 abstract 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 abstract 1
- 229910052700 potassium Inorganic materials 0.000 abstract 1
- 239000011591 potassium Substances 0.000 abstract 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 abstract 1
- 229940081974 saccharin Drugs 0.000 abstract 1
- 235000019204 saccharin Nutrition 0.000 abstract 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 229910052708 sodium Inorganic materials 0.000 abstract 1
- 239000011734 sodium Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 150000003456 sulfonamides Chemical class 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 239000011135 tin Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/54—Electroplating: Baths therefor from solutions of metals not provided for in groups C25D3/04 - C25D3/50
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
845,527. Electroplating with antimony. HARSHAW CHEMICAL CO. Oct. 30, 1956 [Nov. 7, 1955], No. 33128/56. Class 41. Antimony is electrodeposited from an aqueous solution comprising antimony wholly or mainly as the soluble fluoride and at least two co-operating brighteners, one of which is a N-heteroaromatic compound having a benzenoid structure and the other is an aromatic compound containing a sulphonyl group linked to a nuclear carbon atom, typically a sulphonamide containing an -SO 2 NH 2 or an -SO 2 .NH.SO 2 - group, a sulphonate, or a sulphinate. Typical N-heteroaromatic compounds are pyridine, α-α<SP>1</SP>-bipyridyl, 5:6- benzoquinoline, 2 :6-dimethyl quinoline, and salts thereof and quinolinium methosulphates such as the N-methyl-, N-methyl-2-carboxy-,and2:N- dimethyl derivatives and N:N<SP>1</SP>-( oxydiethylene)- bis-isoquinoliniumsulphate. The preferred aromatic sulphonyl compounds are benzene and toluene sulphon-amide, di-benzene sulphonamide (C 6 H 5 SO 2 NH.SO 2 C 6 H 5 ), bi-(di-benzene sulphonamide) ether, and bi-(di-benzene sulphonamide) but saccharin may also be used although it is less satisfactory than the sulphonamides. To further increase the brightness small quantities of a soluble zinc or copper salt e.g. the fluoride, chloride or sulphate, and/or coumarin or a derivative thereof may be added to the bath. To avoid deposition of antimony fluoride, an α-hydroxy acid such as tartaric, citric, gluconic, glycolic, or lactic acid or an ammonium, sodium, potassium, or amine salt thereof or excess of halogen ion may be included in the bath. Preferably sulphate ion is included in the bath to avoid chemical plating. A typical bath to which the addition agents are added comprises antimonyoxide, ammonium bifluoride glycolic acid, ammonium sulphate adjusted to pH 4 with ammonium hydroxide and used at a temperature of 145F. with a current density of 40 amps./sq. ft. to plate on lead panels. Plating may also be effected on tin, silver, or alloys thereof with each other or with lead which may be coated on steel bases, or on roughened steel.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US545569A US2813065A (en) | 1955-11-07 | 1955-11-07 | Heterocyclic nitrogen compound containing antimony plating solutions and process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB845527A true GB845527A (en) | 1960-08-24 |
Family
ID=24176745
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB33128/56A Expired GB845527A (en) | 1955-11-07 | 1956-10-30 | Antimony electroplating solutions and processes |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US2813065A (en) |
| DE (1) | DE1039809B (en) |
| FR (1) | FR1170207A (en) |
| GB (1) | GB845527A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4840543B1 (en) * | 1970-04-24 | 1973-12-01 | ||
| WO2001002627A1 (en) * | 1999-07-06 | 2001-01-11 | Dunigan, Frank, C. | Method and electroplating solution for plating antimony and antimony alloy coatings |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2389131A (en) * | 1941-07-28 | 1945-11-20 | Mortimer C Bloom | Electrodeposition of antimony |
| US2711010A (en) * | 1952-05-01 | 1955-06-21 | Harshaw Chem Corp | Electrodeposition of antimony |
| US2721836A (en) * | 1952-08-07 | 1955-10-25 | Harshaw Chem Corp | Electrodeposition of antimony |
| US2683114A (en) * | 1952-12-04 | 1954-07-06 | Harshaw Chem Corp | Electrodeposition of antimony |
-
1955
- 1955-11-07 US US545569A patent/US2813065A/en not_active Expired - Lifetime
-
1956
- 1956-10-30 GB GB33128/56A patent/GB845527A/en not_active Expired
- 1956-11-06 FR FR1170207D patent/FR1170207A/en not_active Expired
- 1956-11-06 DE DEH28519A patent/DE1039809B/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE1039809B (en) | 1958-09-25 |
| US2813065A (en) | 1957-11-12 |
| FR1170207A (en) | 1959-01-12 |
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