GB814364A - Improvements in and relating to electrolytic etching - Google Patents
Improvements in and relating to electrolytic etchingInfo
- Publication number
- GB814364A GB814364A GB31594/55A GB3159455A GB814364A GB 814364 A GB814364 A GB 814364A GB 31594/55 A GB31594/55 A GB 31594/55A GB 3159455 A GB3159455 A GB 3159455A GB 814364 A GB814364 A GB 814364A
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- electrolytic etching
- semi
- solution
- gold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/12—Etching of semiconducting materials
-
- H10P14/47—
-
- H10P50/613—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
Abstract
814,364. Electrolytic etching; semi-conductor devices &c. PHILCO CORPORATION. Nov. 4, 1955 [Dec. 22, 1954], No. 31594/55. Drawings to Specification. Classes 37 and 41. A method of electrolytic etching comprises coating a body of material with a metal having an electrical conductivity greater than that of the body and directing a flow of etchant to impinge upon a localized region of the body while passing a current therethrough to remove the coating locally and etch the material so exposed. Typically the body is of semi-conductive material, e.g. N-type germanium or silicon, and is coated with a noble metal, preferably gold or platinum. Thus to form a surface barrier transistor, a wafer of N-type germanium may be electroplated with gold from a solution of auric chloride in ethylene glycol acidified with hydro. chloric acid, and is then electrolytically etched from opposite faces of the wafer with a solution of indium trichloride followed by plating indium contacts into the etched cavities by reversal of polarity of the applied potential, using the apparatus of Specification 805,291. In a similar manner using a single jet of electrolyte to form a single cavity in the wafer; a germanium diode may be formed.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US477034A US2799637A (en) | 1954-12-22 | 1954-12-22 | Method for electrolytic etching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB814364A true GB814364A (en) | 1959-06-03 |
Family
ID=23894225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB31594/55A Expired GB814364A (en) | 1954-12-22 | 1955-11-04 | Improvements in and relating to electrolytic etching |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US2799637A (en) |
| GB (1) | GB814364A (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2963411A (en) * | 1957-12-24 | 1960-12-06 | Ibm | Process for removing shorts from p-n junctions |
| NL110575C (en) * | 1958-01-17 | 1965-02-15 | Philips Nv | |
| NL239732A (en) * | 1958-06-18 | |||
| US3012921A (en) * | 1958-08-20 | 1961-12-12 | Philco Corp | Controlled jet etching of semiconductor units |
| US3039514A (en) * | 1959-01-16 | 1962-06-19 | Philco Corp | Fabrication of semiconductor devices |
| US3039515A (en) * | 1959-02-24 | 1962-06-19 | Philco Corp | Fabrication of semiconductor devices |
| NL250075A (en) * | 1959-04-10 | 1900-01-01 | ||
| US3058478A (en) * | 1959-10-09 | 1962-10-16 | Carman Lab Inc | Fluid treatment apparatus |
| FR1260804A (en) * | 1960-03-31 | 1961-05-12 | Electronique & Automatisme Sa | Process for producing printed circuits |
| US3135638A (en) * | 1960-10-27 | 1964-06-02 | Hughes Aircraft Co | Photochemical semiconductor mesa formation |
| US3303085A (en) * | 1962-02-28 | 1967-02-07 | Gen Electric | Molecular sieves and methods for producing same |
| US3335278A (en) * | 1963-09-11 | 1967-08-08 | Gen Electric | High level radiation dosimeter having a sheet which is permeable to damage track producing particles |
| US3630795A (en) * | 1969-07-25 | 1971-12-28 | North American Rockwell | Process and system for etching metal films using galvanic action |
| US3867272A (en) * | 1970-06-30 | 1975-02-18 | Hughes Aircraft Co | Electrolytic anticompromise apparatus |
| US4497692A (en) * | 1983-06-13 | 1985-02-05 | International Business Machines Corporation | Laser-enhanced jet-plating and jet-etching: high-speed maskless patterning method |
| US4599154A (en) * | 1985-03-15 | 1986-07-08 | Atlantic Richfield Company | Electrically enhanced liquid jet processing |
| EP2560196A1 (en) * | 2011-08-15 | 2013-02-20 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method and system for forming a metallic structure |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1416929A (en) * | 1921-11-07 | 1922-05-23 | William E Bailey | Art of electrolysis |
-
1954
- 1954-12-22 US US477034A patent/US2799637A/en not_active Expired - Lifetime
-
1955
- 1955-11-04 GB GB31594/55A patent/GB814364A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US2799637A (en) | 1957-07-16 |
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