GB757703A - A method and apparatus for mixing and reacting gaseous fluids - Google Patents
A method and apparatus for mixing and reacting gaseous fluidsInfo
- Publication number
- GB757703A GB757703A GB635653A GB635653A GB757703A GB 757703 A GB757703 A GB 757703A GB 635653 A GB635653 A GB 635653A GB 635653 A GB635653 A GB 635653A GB 757703 A GB757703 A GB 757703A
- Authority
- GB
- United Kingdom
- Prior art keywords
- stream
- reactant
- seconds
- reaction zone
- air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012530 fluid Substances 0.000 title 1
- 239000000376 reactant Substances 0.000 abstract 11
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract 5
- 239000007789 gas Substances 0.000 abstract 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 3
- 239000007795 chemical reaction product Substances 0.000 abstract 3
- 230000001590 oxidative effect Effects 0.000 abstract 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 abstract 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 230000014759 maintenance of location Effects 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 229910052726 zirconium Inorganic materials 0.000 abstract 2
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 abstract 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 abstract 1
- 239000003570 air Substances 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical class Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 235000019270 ammonium chloride Nutrition 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910001507 metal halide Inorganic materials 0.000 abstract 1
- 150000005309 metal halides Chemical class 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000047 product Substances 0.000 abstract 1
- 230000003134 recirculating effect Effects 0.000 abstract 1
- 239000000779 smoke Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000000725 suspension Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000004408 titanium dioxide Substances 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 239000011701 zinc Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Inorganic Chemistry (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Silicon Compounds (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Abstract
<PICT:0757703/III/1> <PICT:0757703/III/2> <PICT:0757703/III/3> In the production of pigmentary metal oxides by mixing and reacting together a volatile metal halide and an oxidizing gas, one of the said reactants is charged to the reaction zone through an inlet or inlets circumferentially arranged in the walls of the reaction zone or discharged radially outwards from a centrally arranged reactant feed pipe, in the form of a sheet stream directly into and in a direction angular to the axis of flow of the other reactant which is separately and simultaneously charged into the reaction zone. Oxides of titanium, zirconium, aluminium, silicon, antimony, zinc and tin for example may be so prepared from their chloride, bromide or iodide employing air, oxygen, moisture enriched air or oxygen, or mixtures thereof with inert gases. As shown in Fig. 1 titanium tetrachloride vapour is charged to a reaction zone 4, through a pipe 12 leading into an annular chamber 11 which communicates with the reaction zone 4 through a slot or slots 7; humified air enters at 2; alternatively as in Fig. 2 the titanium tetrachloride reactant flows into reaction vessel 22 through a tube 19 surrounded by an annular space 20 through which moisture enriched air is fed, and a further quantity of moisture enriched air is passed into the reaction zone 22 as a sheeted stream through slots 16 and 17 from the annular chamber 25. In Fig. 3 one of the reactants is fed through the outer annulus 30 formed between the reactor walls 27 and an inner tube 28 whilst the other reactant is fed through passages 31 to be discharged as a sheeted stream into the other reactant from slots formed between the lower edge 34 of the wall 28 and the upper edge 35 of an element 33 closely adjacent to the end of tube 28. In Fig. 1 the oxidizing gas and titanium tetrachloride both at 350 DEG C. for example may be separately charged in amounts such that the mass velocity of the tetrachloride is 15 to 40 times the mass velocity of the oxidizing medium whereby reaction occurs at 1000 to 1350 DEG C. and the reaction is completed in from 0.1 to 10 seconds. The gasous reaction products are cooled quickly to below 900 and preferably below 600 DEG C. within 0.01 to 10 seconds and preferably within 0.05 to 5 seconds from the time of introduction of the reactants to the reaction zone. Such cooling may be effected by recirculating cooled product gases or by directly dispersing the titanium dioxide suspension, cold inert finely divided refractory solids such as silicon. The reactant injected as a sheeted stream may impinge upon the other reactant stream at from 45 to 135 DEG C. and if desired a swirling motion may be imparted to the sheeted stream by admitting the reactant to the manifold surrounding the slot through one or more tangential inlets. According to Examples (1) air a 865 DEG C. containing 0.95 per cent water by volume was charged to the reactor of Fig. 1 whilst simultaneously injecting a stream of vaporized titanium chloride at 865 DEG C. The reaction products at 1150 DEG C. after a retention time of .13 seconds were cooled in less than 2 seconds to 300 DEG C. by mixing cold chlorine gas therewith. (2) titanium tetrachloride and air containing 0.07 per cent water preheated to 950 DEG C. were introduced into the reactor shown in Fig. 2 which was maintained at a 1000 DEG C. in a furnace. The average retention time was 0.15 seconds and the reaction products were quenched to 300 DEG C. in less than 5 seconds by cold chlorine. Zirconium and aluminium chlorides may be similarly prepared. The effectiveness of the mixing occasioned by the invention is illustrated by feeding air containing about 1 per cent by volume of dry ammonia gas to the reactor shown in Fig. 1 whilst simultaneously feeding dry hydrogen chloride gas through the slot inlet as a sheeted stream into the air/ammonia stream to form a visible ammonium chloride smoke. Complete mixing occurred two inches downstream from the slot.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB635653A GB757703A (en) | 1953-03-07 | 1953-03-07 | A method and apparatus for mixing and reacting gaseous fluids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB635653A GB757703A (en) | 1953-03-07 | 1953-03-07 | A method and apparatus for mixing and reacting gaseous fluids |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB757703A true GB757703A (en) | 1956-09-26 |
Family
ID=9813020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB635653A Expired GB757703A (en) | 1953-03-07 | 1953-03-07 | A method and apparatus for mixing and reacting gaseous fluids |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB757703A (en) |
-
1953
- 1953-03-07 GB GB635653A patent/GB757703A/en not_active Expired
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