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GB2505685B - Method of coating and etching - Google Patents

Method of coating and etching

Info

Publication number
GB2505685B
GB2505685B GB1215996.8A GB201215996A GB2505685B GB 2505685 B GB2505685 B GB 2505685B GB 201215996 A GB201215996 A GB 201215996A GB 2505685 B GB2505685 B GB 2505685B
Authority
GB
United Kingdom
Prior art keywords
etching
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB1215996.8A
Other versions
GB201215996D0 (en
GB2505685A (en
Inventor
David W Sheel
John L Hodgkinson
James Walsh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Salford
Original Assignee
University of Salford
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Salford filed Critical University of Salford
Priority to GB1215996.8A priority Critical patent/GB2505685B/en
Publication of GB201215996D0 publication Critical patent/GB201215996D0/en
Priority to PCT/GB2013/052339 priority patent/WO2014037736A1/en
Publication of GB2505685A publication Critical patent/GB2505685A/en
Application granted granted Critical
Publication of GB2505685B publication Critical patent/GB2505685B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/12—Gaseous compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB1215996.8A 2012-09-07 2012-09-07 Method of coating and etching Expired - Fee Related GB2505685B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1215996.8A GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching
PCT/GB2013/052339 WO2014037736A1 (en) 2012-09-07 2013-09-06 Method of coating and etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1215996.8A GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching

Publications (3)

Publication Number Publication Date
GB201215996D0 GB201215996D0 (en) 2012-10-24
GB2505685A GB2505685A (en) 2014-03-12
GB2505685B true GB2505685B (en) 2015-11-04

Family

ID=47137103

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1215996.8A Expired - Fee Related GB2505685B (en) 2012-09-07 2012-09-07 Method of coating and etching

Country Status (2)

Country Link
GB (1) GB2505685B (en)
WO (1) WO2014037736A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016104852B4 (en) * 2016-03-16 2017-11-09 Leibniz - Institut Für Analytische Wissenschaften - Isas - E.V. Method for ionizing gaseous samples by means of dielectrically impeded discharge and for subsequent analysis of the generated sample ions in an analyzer

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308650A (en) * 1991-07-06 1994-05-03 Schott Glaswerke Process and apparatus for the ignition of CVD plasmas
US20040050685A1 (en) * 2000-11-14 2004-03-18 Takuya Yara Method and device for atmospheric plasma processing
EP1627934A2 (en) * 2004-08-13 2006-02-22 Ngk Insulators, Ltd. Thin films and a method for producing the same
US20070037408A1 (en) * 2005-08-10 2007-02-15 Hitachi Metals, Ltd. Method and apparatus for plasma processing
US20080124488A1 (en) * 2006-11-10 2008-05-29 Schott Ag Method and apparatus for plasma enhanced chemical vapor deposition
US20080197110A1 (en) * 2007-02-21 2008-08-21 Tae Won Kim Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
US20100075077A1 (en) * 2006-12-12 2010-03-25 Matthias Bicker Container having improved ease of discharge product residue, and method for the production thereof
US20120121817A1 (en) * 2009-07-13 2012-05-17 Ngk Insulators, Ltd. Method for producing diamond-like carbon film body

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5308650A (en) * 1991-07-06 1994-05-03 Schott Glaswerke Process and apparatus for the ignition of CVD plasmas
US20040050685A1 (en) * 2000-11-14 2004-03-18 Takuya Yara Method and device for atmospheric plasma processing
EP1627934A2 (en) * 2004-08-13 2006-02-22 Ngk Insulators, Ltd. Thin films and a method for producing the same
US20070037408A1 (en) * 2005-08-10 2007-02-15 Hitachi Metals, Ltd. Method and apparatus for plasma processing
US20080124488A1 (en) * 2006-11-10 2008-05-29 Schott Ag Method and apparatus for plasma enhanced chemical vapor deposition
US20100075077A1 (en) * 2006-12-12 2010-03-25 Matthias Bicker Container having improved ease of discharge product residue, and method for the production thereof
US20080197110A1 (en) * 2007-02-21 2008-08-21 Tae Won Kim Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
US20120121817A1 (en) * 2009-07-13 2012-05-17 Ngk Insulators, Ltd. Method for producing diamond-like carbon film body

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
1996 1st International Symposium on Plasma Process-Induced Damage, 13-14 May, 1996, Santa Clara, CA, USA, Cheung et al., "Sub-quarter micron poly-Si etching with positive pulse biasing technique", pages 234 - 236. *
Conference Record of the 1991 IEEE Industry Applications Society Annual Meeting, Vol. 1, 1991, New York, USA, Mizuno et al., "Structure of ultra-short pulsed discharge plasma", pages 708 - 712. *

Also Published As

Publication number Publication date
WO2014037736A1 (en) 2014-03-13
GB201215996D0 (en) 2012-10-24
GB2505685A (en) 2014-03-12

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20200907