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GB2590511B - Hybrid CMP conditioning head - Google Patents

Hybrid CMP conditioning head Download PDF

Info

Publication number
GB2590511B
GB2590511B GB2000018.8A GB202000018A GB2590511B GB 2590511 B GB2590511 B GB 2590511B GB 202000018 A GB202000018 A GB 202000018A GB 2590511 B GB2590511 B GB 2590511B
Authority
GB
United Kingdom
Prior art keywords
conditioning head
cmp conditioning
hybrid cmp
hybrid
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2000018.8A
Other versions
GB2590511A (en
GB202000018D0 (en
Inventor
Earl Slutz David
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Best Engineered Surface Technologies LLC
Original Assignee
Best Engineered Surface Tech LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Best Engineered Surface Tech LLC filed Critical Best Engineered Surface Tech LLC
Publication of GB202000018D0 publication Critical patent/GB202000018D0/en
Publication of GB2590511A publication Critical patent/GB2590511A/en
Application granted granted Critical
Publication of GB2590511B publication Critical patent/GB2590511B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/003Devices or means for dressing or conditioning abrasive surfaces using at least two conditioning tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/12Dressing tools; Holders therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D2203/00Tool surfaces formed with a pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
GB2000018.8A 2019-11-20 2020-01-02 Hybrid CMP conditioning head Active GB2590511B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201962937921P 2019-11-20 2019-11-20

Publications (3)

Publication Number Publication Date
GB202000018D0 GB202000018D0 (en) 2020-02-19
GB2590511A GB2590511A (en) 2021-06-30
GB2590511B true GB2590511B (en) 2023-10-25

Family

ID=75981422

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2000018.8A Active GB2590511B (en) 2019-11-20 2020-01-02 Hybrid CMP conditioning head

Country Status (5)

Country Link
US (1) US20220410344A1 (en)
EP (1) EP4084929A4 (en)
GB (1) GB2590511B (en)
TW (1) TW202134004A (en)
WO (1) WO2021102190A1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015143278A1 (en) * 2014-03-21 2015-09-24 Entegris, Inc. Chemical mechanical planarization pad conditioner with elongated cutting edges

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6054183A (en) * 1997-07-10 2000-04-25 Zimmer; Jerry W. Method for making CVD diamond coated substrate for polishing pad conditioning head
KR20030015567A (en) * 2001-08-16 2003-02-25 에스케이에버텍 주식회사 Chemical mechanical polishing pad having wave grooves
US20050025973A1 (en) * 2003-07-25 2005-02-03 Slutz David E. CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same
US7134939B2 (en) * 2003-09-05 2006-11-14 Fricso Ltd. Method for reducing wear of mechanically interacting surfaces
US6951509B1 (en) * 2004-03-09 2005-10-04 3M Innovative Properties Company Undulated pad conditioner and method of using same
US7252582B2 (en) * 2004-08-25 2007-08-07 Jh Rhodes Company, Inc. Optimized grooving structure for a CMP polishing pad
US7066795B2 (en) * 2004-10-12 2006-06-27 Applied Materials, Inc. Polishing pad conditioner with shaped abrasive patterns and channels
US9180570B2 (en) * 2008-03-14 2015-11-10 Nexplanar Corporation Grooved CMP pad
US8951099B2 (en) * 2009-09-01 2015-02-10 Saint-Gobain Abrasives, Inc. Chemical mechanical polishing conditioner
US20110081848A1 (en) * 2009-10-05 2011-04-07 Chia-Pei Chen Grinding tool and method of manufacturing the grinding tool
US10875146B2 (en) * 2016-03-24 2020-12-29 Rohm And Haas Electronic Materials Cmp Holdings Debris-removal groove for CMP polishing pad
US12043785B2 (en) * 2017-07-11 2024-07-23 3M Innovative Properties Company Abrasive articles including conformable coatings and polishing system therefrom

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015143278A1 (en) * 2014-03-21 2015-09-24 Entegris, Inc. Chemical mechanical planarization pad conditioner with elongated cutting edges

Also Published As

Publication number Publication date
WO2021102190A1 (en) 2021-05-27
GB2590511A (en) 2021-06-30
US20220410344A1 (en) 2022-12-29
TW202134004A (en) 2021-09-16
EP4084929A1 (en) 2022-11-09
EP4084929A4 (en) 2024-05-22
GB202000018D0 (en) 2020-02-19

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Legal Events

Date Code Title Description
COOA Change in applicant's name or ownership of the application

Owner name: BEST ENGINEERED SURFACE TECHNOLOGIES, LLC

Free format text: FORMER OWNER: MORGAN ADVANCED CERAMICS INC.