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GB2432038B - Ion beam monitoring arrangement - Google Patents

Ion beam monitoring arrangement

Info

Publication number
GB2432038B
GB2432038B GB0626029A GB0626029A GB2432038B GB 2432038 B GB2432038 B GB 2432038B GB 0626029 A GB0626029 A GB 0626029A GB 0626029 A GB0626029 A GB 0626029A GB 2432038 B GB2432038 B GB 2432038B
Authority
GB
United Kingdom
Prior art keywords
ion beam
monitoring arrangement
beam monitoring
arrangement
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0626029A
Other versions
GB2432038A (en
GB2432038A8 (en
GB0626029D0 (en
Inventor
Adrian John Murrell
Bernard Francis Harrison
Marvin Farley
Peter Kindersley
Peter Ivor Tudor Edwards
Takao Sakase
Geoffrey Ryding
Theodore H Smick
Robert Mitchell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to GB0626029A priority Critical patent/GB2432038B/en
Priority claimed from GB0618325A external-priority patent/GB2427508B/en
Publication of GB0626029D0 publication Critical patent/GB0626029D0/en
Publication of GB2432038A publication Critical patent/GB2432038A/en
Publication of GB2432038A8 publication Critical patent/GB2432038A8/en
Application granted granted Critical
Publication of GB2432038B publication Critical patent/GB2432038B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24405—Faraday cages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H01J2237/30477—Beam diameter
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31703—Dosimetry

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
GB0626029A 2004-01-06 2004-01-06 Ion beam monitoring arrangement Expired - Fee Related GB2432038B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0626029A GB2432038B (en) 2004-01-06 2004-01-06 Ion beam monitoring arrangement

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0626029A GB2432038B (en) 2004-01-06 2004-01-06 Ion beam monitoring arrangement
GB0618325A GB2427508B (en) 2004-01-06 2004-01-06 Ion beam monitoring arrangement

Publications (4)

Publication Number Publication Date
GB0626029D0 GB0626029D0 (en) 2007-02-07
GB2432038A GB2432038A (en) 2007-05-09
GB2432038A8 GB2432038A8 (en) 2007-05-23
GB2432038B true GB2432038B (en) 2008-10-01

Family

ID=37759143

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0626029A Expired - Fee Related GB2432038B (en) 2004-01-06 2004-01-06 Ion beam monitoring arrangement

Country Status (1)

Country Link
GB (1) GB2432038B (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06349441A (en) * 1993-06-14 1994-12-22 Hitachi Ltd Semiconductor manufacturing equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06349441A (en) * 1993-06-14 1994-12-22 Hitachi Ltd Semiconductor manufacturing equipment

Also Published As

Publication number Publication date
GB2432038A (en) 2007-05-09
GB2432038A8 (en) 2007-05-23
GB0626029D0 (en) 2007-02-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20100106